CN110359030A - Reaction chamber and chemical vapor deposition unit - Google Patents
Reaction chamber and chemical vapor deposition unit Download PDFInfo
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- CN110359030A CN110359030A CN201811167897.1A CN201811167897A CN110359030A CN 110359030 A CN110359030 A CN 110359030A CN 201811167897 A CN201811167897 A CN 201811167897A CN 110359030 A CN110359030 A CN 110359030A
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- Prior art keywords
- blind pipe
- chamber
- conveying
- conveying blind
- reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The present invention provides a kind of reaction chamber and chemical vapor deposition units, reaction chamber includes chamber ontology and conveying blind pipe, there is chamber in chamber ontology, the air inlet of connecting chamber is provided on chamber ontology, the open end of conveying blind pipe is connect with air inlet, the closed end of conveying blind pipe extends in chamber, the shunting nozzle of several tube walls through conveying blind pipe is provided on conveying blind pipe, the vent of connection conveying blind pipe and chamber is provided in shunting nozzle, axially spaced-apart distribution of the shunting nozzle along conveying blind pipe, and the cross section size of shunting nozzle is gradually increased along the direction of closed end to open end.The technical program, multiple shunting nozzles on conveying blind pipe are uniformly distributed the indoor gas of chamber, guarantee the uniformity of the deposition thickness of sample everywhere.In addition, the cross section size of shunting nozzle is gradually increased along the direction of closed end to open end, so that more reaction gas are first chemically reacted with sample, the utilization rate and deposition efficiency of reaction gas are improved.
Description
Technical field
The present invention relates to chemical vapour deposition technique field more particularly to a kind of reaction chambers and chemical vapor deposition unit.
Background technique
Chemical vapor deposition (Chemical Vapor Deposition) be by way of chemical reaction, using heating,
Perhaps the various energy such as light radiation make the chemical substance gas-solid interface of gaseous state or steam condition to plasma excitation in reactor
Upper after chemical reaction forms the technology of solid deposits.Reaction chamber is the core of chemical vapor depsotition equipment (CVD), is determined
The performance of whole equipment.In the prior art, the intake method of CVD equipment is in the top of cavity or bottom setting air inlet, sample
Product are then placed in the inside of cavity, and gas is vertically penetrated on sample by air inlet, on the one hand due to the limit of air inlet port size
System, chamber reaction gas throughout the room are unevenly distributed, and it is anti-that generation is first contacted with reaction gas close to the corresponding sample of air inlet
Ying Hou, other samples everywhere cannot adequately react the sample deposition thickness caused everywhere since the reaction gas scale of construction is small
It is uneven；On the other hand, reaction gas vertically sprays on sample in the prior art, be easy to cause part caused by air rebound rapid
Stream, influences the quality of deposition interface.
Therefore, it is necessary to provide one kind new reaction chamber and chemical vapor deposition unit to solve above-mentioned technical problem.
Summary of the invention
The main object of the present invention is to provide a kind of reaction chamber and chemical vapor deposition unit, it is intended to solve in the prior art
The air intake structure of reaction chamber the problem of being unfavorable for deposition quality.
To achieve the above object, reaction chamber proposed by the present invention, including chamber ontology and conveying blind pipe, the interior tool of the chamber ontology
Have chamber, be provided with the air inlet for being connected to the chamber at the top of the chamber ontology, the open end of the conveying blind pipe with it is described
The closed end of air inlet connection, the conveying blind pipe extends in the chamber, is provided with several on the conveying blind pipe and passes through
The shunting nozzle of the tube wall of the conveying blind pipe is worn, is provided with the row for being connected to the conveying blind pipe and the chamber in the shunting nozzle
Stomata road, the shunting nozzle are distributed along the axially spaced-apart of the conveying blind pipe, and the cross section size of the shunting nozzle is described in
The direction of closed end to the open end is gradually increased.
Preferably, the quantity of the vent in each shunting nozzle is multiple, and multiple gas vents
Road is simultaneously interconnected staggeredly between column distribution or multiple gas vents.
Preferably, the shunting nozzle includes trunk portion interconnected and semi-spherical portion, and the trunk portion and the conveying are blind
Pipe connection, the semi-spherical portion stretch out the conveying blind pipe.
Preferably, multiple shunting nozzles are evenly equipped with along the same circumference of the conveying blind pipe and form shunting nozzle layer, and
The shunting nozzle layer is evenly distributed with multilayer along the axial direction of the conveying blind pipe.
Preferably, the conveying blind pipe includes tube body and thermal insulation layer interconnected, and the thermal insulation layer is sheathed on described
The thermal insulation layer is filled in the outer wall of tube body or the tube body.
Preferably, the reaction chamber further includes the gas distributor being embedded in the air inlet, and the gas distributor includes and institute
It states the shell of chamber ontology connection and is set to the intracorporal bulkhead of the shell and driving assembly, be provided on the shell into gas
The inner wall far from the chamber of hole and mounting hole, the bulkhead and the shell, which encloses, to be set to form enclosure space, on the bulkhead
It is provided with venthole, the blowhole is connected to the enclosure space, and the conveying blind pipe and the mounting hole are rotatablely connected, described
Venthole is connected to the open end of the conveying blind pipe, and the driving component connect with conveying blind pipe and drives the conveying blind pipe
Rotation.
Preferably, step surface and the first groove, the outer wall set of the conveying blind pipe are provided on the hole wall of the mounting hole
Equipped with bearing, the lateral surface of the bearing is connect with the hole wall, and the end face of the bearing is abutted with the step surface, described
The rotating seal ring connecting with the conveying blind pipe is provided in first groove.
Preferably, the open end of the conveying blind pipe passes through the venthole and extends in the bulkhead, the venthole
Hole wall on be provided with the second groove, be provided in second groove and the rotating seal ring that connect of conveying blind pipe.
Preferably, the driving component includes driving motor, transmission shaft and the transmission gear with the transmission axis connection, institute
It states driving motor to connect with the shell, the output axis connection of the transmission shaft and the driving motor, the conveying blind pipe
Outer wall is provided with the external tooth engaged with the transmission gear.
Preferably, the outer surface of the shell is additionally provided with electric-controlled plate, the electric-controlled plate connect with the driving motor with
Control the movement of the driving motor.
In addition, the chemical vapor deposition unit includes as above the present invention also provides a kind of chemical vapor deposition unit
State the reaction chamber.
In the technical scheme, reaction gas is transported by setting conveying blind pipe, and passes through multiple points on conveying blind pipe
Reaction gas is discharged into chamber by stem bar, and reaction gas can be discharged into chamber from all directions, so that the indoor gas of chamber
It is more distributed more uniform, advantageously ensures that the uniformity of the deposition thickness of sample everywhere.It conveys on the outside of blind pipe equipped with heat-insulated
Layer, it is therefore an objective to avoid blind pipe internal temperature excessively high, prevent reaction gas in blind pipe with regard to chemically reacting.In addition, shunting nozzle
Cross section size be gradually increased along the direction of the closed end to the open end, i.e. the cross closer to the shunting nozzle of air inlet
Sectional dimension is bigger, and the reaction gas of shunting is more, so that more reaction gas first pass through sample and chemistry occurs with sample
It is excluded from gas outlet after reaction, can be improved the utilization rate of reaction gas, improve deposition efficiency.Further, since reaction gas
Horizontal gas flow is formed when being discharged from shunting nozzle, rather than vertical spray reduces vertical spray air-flow in sample surfaces significantly
The caused local turbulence of rebound reflux, advantageously ensures that deposition surface quality.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
The structure shown according to these attached drawings obtains other attached drawings.
Fig. 1 is the structural schematic diagram of reaction chamber in the embodiment of the present invention；
Fig. 2 is the cross-sectional view of A-A in Fig. 1；
Fig. 3 is the structural schematic diagram that blind pipe is conveyed in the embodiment of the present invention；
Fig. 4 is a kind of structural schematic diagram of the shunting nozzle in the embodiment of the present invention；
Fig. 5 is the cross-section diagram of reaction chamber in the embodiment of the present invention；
Fig. 6 is the partial enlarged view in Fig. 5 at B.
Drawing reference numeral explanation:
The embodiments will be further described with reference to the accompanying drawings for the realization, the function and the advantages of the object of the present invention.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiment is only a part of the embodiments of the present invention, instead of all the embodiments.Base
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts it is all its
His embodiment, shall fall within the protection scope of the present invention.
It is to be appreciated that the directional instruction (such as up, down, left, right, before and after ...) of institute is only used in the embodiment of the present invention
In explaining in relative positional relationship, the motion conditions etc. under a certain particular pose (as shown in the picture) between each component, if should
When particular pose changes, then directionality instruction also correspondingly changes correspondingly.
In addition, the description for being such as related to " first ", " second " in the present invention is used for description purposes only, and should not be understood as
Its relative importance of indication or suggestion or the quantity for implicitly indicating indicated technical characteristic.Define as a result, " first ",
The feature of " second " can explicitly or implicitly include at least one of the features.In the description of the present invention, " multiple " contain
Justice is at least two, such as two, three etc., unless otherwise specifically defined.
In the present invention unless specifically defined or limited otherwise, term " connection ", " fixation " etc. shall be understood in a broad sense,
For example, " fixation " may be a fixed connection, it may be a detachable connection, or integral；It can be mechanical connection, be also possible to
Electrical connection；It can be directly connected, the connection inside two elements or two can also be can be indirectly connected through an intermediary
The interaction relationship of a element, unless otherwise restricted clearly.It for the ordinary skill in the art, can basis
Concrete condition understands the concrete meaning of above-mentioned term in the present invention.
It in addition, the technical solution between each embodiment of the present invention can be combined with each other, but must be general with this field
Based on logical technical staff can be realized, it will be understood that when the combination of technical solution appearance is conflicting or cannot achieve this
The combination of technical solution is not present, also not the present invention claims protection scope within.
The present invention proposes a kind of reaction chamber and chemical vapor deposition unit, it is intended to solve reaction chamber in the prior art into
The problem of depressed structure is unfavorable for deposition quality.
Referring to Fig.1 and 2, reaction chamber 100 includes chamber ontology 110 and conveying blind pipe in a kind of embodiment of the invention
120, chamber ontology 110 is interior to have chamber 111, and the air inlet 113 of connecting chamber 111 is provided on chamber ontology 110, conveys blind pipe
120 open end is connect with air inlet 113, and the closed end of conveying blind pipe 120 extends in chamber 111, is conveyed and is set on blind pipe 120
It is equipped with the shunting nozzle 123 of several tube walls through conveying blind pipe 120, is provided with connection conveying blind pipe 120 and chamber in shunting nozzle 123
The vent 124 of room 111, the shunting nozzle 123 is distributed along the axially spaced-apart of conveying blind pipe 120, and shunting nozzle 123 is transversal
Face size is gradually increased along the direction of the closed end of conveying blind pipe 120 to the open end of conveying blind pipe 120.
It should be noted that one end of conveying blind pipe 120 is that open end is used for air inlet, the other end of conveying blind pipe 120 is
Closed end, the design of closed end advantageously reduce the generation of vertical spray air-flow, also avoid reaction gas directly from sealing end
It is evacuated machine to extract out from gas outlet, result in waste of resources.
The cross section size of shunting nozzle 123 is along the closed end of conveying blind pipe 120 to the direction of the open end of conveying blind pipe 120
It is gradually increased, refers to that the cross section of adjacent shunting nozzle 123 is of different sizes, and closer to the cross section ruler of closed end shunting nozzle 123
Very little bigger, the bigger shunting nozzle 123 of cross sectional dimensions can shunt more gas, the i.e. bigger shunting nozzle of cross sectional dimensions
The exhaust total amount of 123 vent 124 is bigger.It is understood that the cross section of multiple shunting nozzles overlaps.
In the technical scheme, reaction gas is transported by setting conveying blind pipe 120, and by conveying blind pipe 120
Reaction gas is discharged into chamber 111 by multiple shunting nozzles 123, and reaction gas can make from being discharged into chamber 111 in all directions
Gas in chamber 111 is more distributed more uniform, advantageously ensure that the uniformity of deposition thickness.In addition, shunting nozzle 123
Cross section size is gradually increased along the direction of the closed end to the open end, i.e., closer to the shunting nozzle 123 of air inlet 113
Cross sectional dimensions it is bigger, the reaction gas shunted through shunting nozzle 123 is more, so that more reaction gas first passes through sample simultaneously
It is excluded from gas outlet after being chemically reacted with sample, can be improved the utilization rate of reaction gas, improve deposition efficiency.This
Outside, due to forming horizontal gas flow when reaction gas is discharged from shunting nozzle 123, rather than vertical spray subtracts significantly in sample surfaces
The caused local turbulence of the rebound reflux of weak vertical spray air-flow, advantageously ensures that deposition surface quality.
It should be noted that shunting nozzle 123 can be for through the through-hole of conveying blind pipe, through-hole be also vent at this time
124, the cross section size of through-hole is the cross section size of shunting nozzle 123.Alternatively, shunting nozzle 123 is with vent
Object, sectional area of the vent 124 on the cross section of shunting nozzle 123 is directly proportional to the cross section size of shunting nozzle 123, i.e.,
The bigger shunting nozzle in cross section, sectional area of the vent 124 on cross section are bigger.When shunting nozzle 123 includes multiple rows
When stomata road, then sectional area of the vent 124 on cross section is the sum of multiple sectional areas.The exhaust of adjacent shunting nozzle 123
Duct 124 can be that pore size is equal and in varying numbers or aperture not etc. and quantity is equal.The cross section size of through-hole
Or the range of the sum of the sectional area size of one or more vents of same shunting nozzle on the cross section of shunting nozzle is preferred
For 28mm2To 314mm2.Preferably, when shunting nozzle 123 is a through-hole, the pore size range of through-hole is 5mm to 10mm.Separately
Outside, the axial line of adjacent shunting nozzle 123 is divided into 150mm to 250mm between the axial direction of conveying blind pipe 120, and preferably
200mm。
Further, referring to Fig. 2, conveying blind pipe 120 includes tube body 121 interconnected and thermal insulation layer 122,
In, the thermal insulation layer 122 is sheathed on the outer wall of the tube body 121, and thermal insulation layer 122 preferably has fine heat insulation at this time
And the asbestos layer or ceramic layer of Applied economy.Alternatively, the thermal insulation layer 122 is filled in the tube body 121, it is heat-insulated at this time
Layer 122 can be asbestos or ceramic packing layer or other material filled layers with good thermo-insulation properties.
In addition, heater element is provided in chamber ontology 110, by heater element to the reaction gas in heating chamber 111
It is heated simultaneously with sample.In other embodiments, directly sample can also be added using modes such as induction heating, infrared heatings
Heat, heating method is herein without limiting.Moreover, reaction chamber 100 further includes the exhaust outlet 112 for reaction gas to be discharged, and
Preferably, air inlet 113 is set to the top of reaction chamber 100, and sample is set to the reaction chamber 100 opposite with air inlet 113
Bottom, exhaust outlet 112 is set to the side of reaction chamber 100, and is arranged close to bottom, is conducive to being smoothly discharged for residual gas.
It is understood that the quantity of conveying blind pipe 120 can also be to be multiple, multiple conveying blind pipes 120 are set side by side.Convey blind pipe
120 and shunting nozzle 123 be preferably graphite product, graphite is a kind of good refractory material, is able to bear high temperature.
In a preferred embodiment, referring to Fig. 3, the quantity of the gas vent in each shunting nozzle 123 is multiple and multiple
Vent 124 and column distribution.The setting of multiple vents 124 can be by one big air-flow compared to a vent 124
It is divided into several little airflows, advantageously ensures that the uniformity of 111 reaction gases of chamber.Another preferred implementation as this programme
Example, the quantity of the gas vent in each shunting nozzle 123 be it is multiple, be interconnected between multiple gas vents staggeredly, i.e. gas vent
Intersect between road 124 and vent 124, formed three-dimensional network duct, reaction gas between three-dimensional network duct not
Disconnected to change direction of travel, reaction gas turns to each time can all allow the energy of reaction gas to reduce, so that the exhaust of shunting nozzle 123
The reaction gas energy in the exit in duct 124 reduces, and reduces the impact of the reaction gas to ambient gas in exit, favorably
In the uniformity for guaranteeing gas in chamber 111.
As a preferred embodiment of the present invention, please refer to Fig. 3 and Fig. 4, shunting nozzle 123 include trunk portion interconnected and
Semi-spherical portion, trunk portion are connect with conveying blind pipe 120, and semi-spherical portion stretches out conveying blind pipe 120.Preferably, it is connected to the outer of semi-spherical portion
The central axes of the vent 124 on surface are vertical with the tangent line of the intersection point of the central axes with the outer surface of semi-spherical portion.Say
Bright, the flow direction of reaction gas when coming out from vent 124 is different, is conducive to be further ensured that gas everywhere
Uniformity.
It should be noted that please refer to Fig. 3 and Fig. 5 shunting nozzle 123 along conveying blind pipe 120 same circumference along be evenly equipped with it is more
A, multiple shunting nozzles 123 form 123 layers of shunting nozzle, and 123 layers of the shunting nozzle axial direction along conveying blind pipes 120 be evenly distributed with it is more
Layer.Such as it is uniformly distributed there are three shunting nozzle 123 on same circumference, three shunting nozzles 123 axially simultaneously form six layers for array six
123 layers of shunting nozzle.Multiple shunting nozzles 123 are set on the same circumference, can be realized reaction gas everywhere in same level layer
It is evenly distributed, meanwhile, it is arranged 123 layers of multilayer shunting nozzle, the gas that can be realized in each level course is evenly distributed.In other implementations
In example, it can also be that the axial direction of the conveying blind pipe 120 of shunting nozzle 123 is in spiral distribution.
In addition, please referring to Fig. 2 and Fig. 5 as a specific embodiment of the invention, reaction chamber 100 further includes being embedded at
Gas distributor 140 in air inlet 113, gas distributor 140 include the shell 141 connecting with chamber ontology 110 and are set to shell
Bulkhead 142 and driving assembly 170 in 141 are provided with blowhole 144 and mounting hole 145 on shell 141.Bulkhead 142 and shell
The inner wall of 141 separate chamber 111, which encloses, to be set to form enclosure space, and blowhole 144 is connected to enclosure space for anti-by what is mixed
It answers gas to be delivered in bulkhead 142, venthole 143, the open end of venthole 143 and conveying blind pipe 120 is provided on bulkhead 142
The reaction gas in bulkhead 142 to be sent into conveying blind pipe 120, conveying blind pipe 120 rotatably connects with mounting hole 145 for connection
It connects.Driving assembly 170 connect with conveying blind pipe 120 and conveying blind pipe 120 is driven to rotate.It should be noted that mounting hole 145 is right
Answer the air inlet 113 of reaction chamber 100 to be arranged, i.e. the open end of conveying blind pipe 120 also cross air inlet 113 and mounting hole 145,
And it is connect with venthole 143.Meanwhile installation space, driving assembly are formed between bulkhead 142 and other inner walls of shell 141
170 are contained in installation space.In use, the extraneous reaction gas mixed, is entered in bulkhead 142 by blowhole 144, and
It is sent into conveying blind pipe 120 by venthole 143, the vent 124 through shunting nozzle 123 is discharged into chamber 111, meanwhile, it drives
Dynamic component 170 is able to drive conveying blind pipe 120 and rotates, and the gas being discharged from shunting nozzle 123 is enabled to cover 360 degree of range,
It can further guarantee gas homogeneity.
It is understood that when chamber ontology 110 is internally provided with multiple heater elements, shell 141 and chamber ontology 110 it
Between be provided with thermal insulator 130, influenced and damaged by heater element high temperature to avoid gas distributor 140, thermal insulation layer 122 preferably have
There are the asbestos layer or ceramic layer of fine heat insulation and Applied economy.
As a specific embodiment of the invention, referring to Fig. 5, being provided with step surface and on the hole wall of mounting hole 145
One groove, conveying blind pipe 120 outer wall be arranged with bearing 160, the lateral surface of bearing 160 is connect with hole wall, 160 end face of bearing and
Step surface abuts, and the rotating seal ring 150 connecting with conveying blind pipe 120 is provided in the first groove.The setting of bearing 160 can
Realize the rotation in installation of conveying blind pipe 120, rotating seal ring 150 is a kind of sealing ring of dynamic sealing, rotating seal ring
150 setting can either realize the rotation of conveying blind pipe 120 and can guarantee the leakproofness of chamber 111.It will be appreciated that sealing
The quantity of circle and the quantity of the first groove can be it is multiple, with multi-sealed.
Further, referring to Fig. 5, the open end of conveying blind pipe 120 extends in bulkhead 142 across venthole 143, out
It is provided with the second groove on the hole wall of stomata 143, the rotating seal ring connecting with conveying blind pipe 120 is provided in the second groove
150, rotating seal ring 150 is a kind of sealing ring of dynamic sealing, and the setting of rotating seal ring 150 can either realize conveying blind pipe
120 rotation can guarantee the leakproofness of chamber 111 again.It will be appreciated that the quantity of sealing ring and the quantity of the first groove can
Think it is multiple, with multi-sealed.
Referring to Fig. 6, driving assembly 170 includes driving motor 171, transmission shaft as a specific embodiment of the invention
172 and the transmission gear 173 that is connect with transmission shaft 172, driving motor 171 connect with shell 141, transmission shaft 172 and driving electricity
The outer wall of the output axis connection of machine 171, conveying blind pipe 120 is provided with the external tooth engaged with transmission gear 173.Specifically, shell
Fixing seat is provided in 141, driving motor 171 is set in fixing seat.In other embodiments, driving motor 171 can be with
Using motor in place.
In addition, the outer surface of shell 141 is additionally provided with electric-controlled plate (not shown), electric-controlled plate is electrically connected with driving motor 171
To control the movement of driving motor 171, the movement of driving motor 171 includes stopping, forward or reverse etc., can be according to practical need
It asks and is set, do not limited herein.
In addition, the embodiments of the present invention also provide a kind of chemical gaseous phase deposition device (not shown), the chemical vapor deposition
Shallow lake device includes that reaction chamber 100 as described above and the pedestal for being used to multiply setting-out product being set in reflection chamber 100 (are not schemed
Show), pedestal is oppositely arranged with air inlet 113.Since the chemical gaseous phase deposition device includes reaction chamber 100 as described above,
Therefore the chemical gaseous phase deposition device has all beneficial effects of above-mentioned reaction chamber 100, and this is no longer going to repeat them.
The above is only a preferred embodiment of the present invention, is not intended to limit the scope of the invention, all in the present invention
Inventive concept under, using equivalent structure transformation made by description of the invention and accompanying drawing content, or directly/be used in it indirectly
He is included in scope of patent protection of the invention relevant technical field.
Claims (10)
1. a kind of reaction chamber, which is characterized in that the reaction chamber includes chamber ontology and conveying blind pipe, has chamber in the chamber ontology
Room is provided with the air inlet for being connected to the chamber, the open end of the conveying blind pipe and the air inlet at the top of the chamber ontology
The closed end of mouth connection, the conveying blind pipe extends in the chamber, several are provided on the conveying blind pipe through institute
The shunting nozzle of the tube wall of conveying blind pipe is stated, the gas vent for being connected to the conveying blind pipe and the chamber is provided in the shunting nozzle
Road, the shunting nozzle is distributed along the axially spaced-apart of the conveying blind pipe, and the cross section size of the shunting nozzle is along the closing
End to the direction of the open end is gradually increased.
2. reaction chamber as described in claim 1, which is characterized in that the quantity of the vent in each shunting nozzle
It is multiple, and multiple vents are simultaneously interconnected staggeredly between column distribution or multiple gas vents.
3. reaction chamber as claimed in claim 2, which is characterized in that the shunting nozzle includes trunk portion interconnected and hemisphere
Portion, the trunk portion are connect with the conveying blind pipe, and the semi-spherical portion stretches out the conveying blind pipe.
4. reaction chamber as claimed in claim 3, which is characterized in that be evenly equipped with along the same circumference of the conveying blind pipe multiple
The shunting nozzle forms shunting nozzle layer, and the shunting nozzle layer is evenly distributed with multilayer along the axial direction of the conveying blind pipe.
5. reaction chamber as claimed in claim 4, which is characterized in that the conveying blind pipe include tube body interconnected and every
Thermosphere, the thermal insulation layer are sheathed on the outer wall of the tube body.
6. the reaction chamber as described in any one of claims 1 to 5, which is characterized in that the reaction chamber further includes being embedded at institute
The gas distributor in air inlet is stated, the gas distributor includes the shell connecting with the chamber ontology and is set in the shell
Bulkhead and driving assembly, be provided with blowhole and mounting hole on the shell, the bulkhead and the shell far from described
The inner wall of chamber, which encloses, to be set to form enclosure space, and venthole is provided on the bulkhead, and the blowhole is connected to the enclosure space,
The conveying blind pipe and the mounting hole are rotatablely connected, and the venthole is connected to the open end of the conveying blind pipe, the drive
Dynamic component connect with conveying blind pipe and the conveying blind pipe is driven to rotate.
7. reaction chamber as claimed in claim 6, which is characterized in that be provided with step surface and first on the hole wall of the mounting hole
The outer wall of groove, the conveying blind pipe is arranged with bearing, and the lateral surface of the bearing is connect with the hole wall, and the bearing
End face is abutted with the step surface, and the rotating seal ring connecting with the conveying blind pipe is provided in first groove.
8. reaction chamber as claimed in claim 7, which is characterized in that the open end of the conveying blind pipe passes through the venthole and prolongs
Extend in the bulkhead, the second groove be provided on the hole wall of the venthole, be provided in second groove with it is described defeated
The rotating seal ring for sending blind pipe to connect.
9. reaction chamber as claimed in claim 6, which is characterized in that the driving component include driving motor, transmission shaft and with
The transmission gear of the transmission axis connection, the driving motor are connect with the shell, the transmission shaft and the driving motor
Output axis connection, it is described conveying blind pipe outer wall be provided with the external tooth engaged with the transmission gear.
10. a kind of chemical vapor deposition unit, which is characterized in that the chemical vapor deposition unit includes as claimed in claim
Reaction chamber described in any one of 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811167897.1A CN110359030A (en) | 2018-10-08 | 2018-10-08 | Reaction chamber and chemical vapor deposition unit |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811167897.1A CN110359030A (en) | 2018-10-08 | 2018-10-08 | Reaction chamber and chemical vapor deposition unit |
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| CN110359030A true CN110359030A (en) | 2019-10-22 |
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| CN201811167897.1A Pending CN110359030A (en) | 2018-10-08 | 2018-10-08 | Reaction chamber and chemical vapor deposition unit |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021203764A1 (en) * | 2020-04-08 | 2021-10-14 | 厦门韫茂科技有限公司 | Gas delivery device of powder surface covering machine, and powder surface covering machine |
| CN115505896A (en) * | 2022-10-11 | 2022-12-23 | 江苏鹏举半导体设备技术有限公司 | Rotary inner wall film coating device |
Citations (2)
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2021203764A1 (en) * | 2020-04-08 | 2021-10-14 | 厦门韫茂科技有限公司 | Gas delivery device of powder surface covering machine, and powder surface covering machine |
| CN115505896A (en) * | 2022-10-11 | 2022-12-23 | 江苏鹏举半导体设备技术有限公司 | Rotary inner wall film coating device |
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