CN110341344A - A method of it is carried out using schemochrome anti-fake - Google Patents
A method of it is carried out using schemochrome anti-fake Download PDFInfo
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- CN110341344A CN110341344A CN201910594783.3A CN201910594783A CN110341344A CN 110341344 A CN110341344 A CN 110341344A CN 201910594783 A CN201910594783 A CN 201910594783A CN 110341344 A CN110341344 A CN 110341344A
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- schemochrome
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
- B42D25/373—Metallic materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
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Abstract
The invention belongs to optical material and applied technical fields, and in particular to a method of it is carried out using schemochrome anti-fake.The method includes based on the structure and its application method using schemochrome, the structure using schemochrome includes metal substrate and dielectric film from bottom to up；Or, nonmetallic substrate, metallic film and dielectric film from bottom to up, application method includes: to carry out illumination to the sample of the structure, observes the color change of sample with backscatter mode by interfering；If showing entirely different color change interfering under backscatter mode, then can determine that there are schemochromes in the structure sample based on this using schemochrome.Based on method provided by the invention, schemochrome can be observed visually and interfering and scattering the different variations of condition hypostome color, thus realize good antifalse effect, and party's subtraction unit is simple, operation is simple, while anti-fake grade is high.
Description
Technical field
The invention belongs to optical material and applied technical fields, and in particular to a kind of that anti-fake side is carried out using schemochrome
Method.
Background technique
Pure physical resource schemochrome is the important means of supplementary material inherent colour in nature.One of typical structure
Color is the big blue wing for dodging butterfly, and the generation of the color is a kind of physical phenomenon, rather than the result of blue pigment.The lively color
It can not often be obtained from dyestuff or pigment, the generation of above-mentioned color is attributed to by physical effect, and accurately relies on material
The permutation and combination on nanoscale micro-scale, therefore they are highly suitable for display and bank money, sensitive document, height
The antiforge function of value coupons and admission ticket etc..
Schemochrome is the physical phenomenon of light diffraction and interference in regular texture, and irregular structure is then the root of light scattering
Source.There is the material of selective absorbing to show observable color light, it can be with company the phenomenon that leading to schemochrome sometimes
With.However, the absorption to light is not belonging to schemochrome.
Existing many anti-counterfeiting technologies are realized using phenomena such as diffraction, refraction or interference mostly, are combined sometimes
The absorbing material of " damaging ".Usually by that forgery can be made more difficult being used in conjunction for above-mentioned phenomenon, to increase antifalse effect.
It is in the prior art it is so-called be used in conjunction be the zonule with different-effect is grouped together into multicolour pattern, or by these
Phenomenon is superimposed to change the color effects of this region generation.The patent in U.S. nanotechnology security firm (U.S.)
Above-mentioned technology is just used in US20100230615A1, but they have used luminescent material, thus can not be attributed to merely
Schemochrome is used.
Summary of the invention
In this patent, we have been put forward for the first time the method for generating color based on scattering and interference.Utilized by collaboration
Interference and its scattering phenomenon generate observable schemochrome, and when both not having, which will hide, therefore this
It is that anti-fraud functional ideal method can be achieved in one kind.
To achieve the goals above, the technical scheme adopted by the invention is that:
A method of carried out using schemochrome it is anti-fake, the method includes based on using schemochrome structure and its user
Method, the structure using schemochrome include metal substrate and dielectric film from bottom to up；Or, nonmetallic lining from bottom to up
Bottom, metallic film and dielectric film, application method include: to carry out illumination to the sample of the structure, pass through interference and backscatter mode
Observe the color change of sample；If showing entirely different color change, samples can interfering under backscatter mode
Labeled as there are schemochrome (genuine pieces).
The present invention provides a kind of completely new methods for generating schemochrome, that is, utilize interference and scattering phenomenon.We design
Schemochrome only interfere and scatter performance match and can observe.
It is A with the difference of maximum and minimum in spectrum under interference condition, maximum and pole in spectrum under the conditions of scattering
The difference of small value is B, and the structure using schemochrome meets A and is noticeably greater than B, or, A is significantly less than B.
The variation that can significantly observe color of image, identify it can significantly within the scope of naked eyes.
It is well known that the common phenomenon of interference can be observed in the film, for example, in daily life in soap bubble and oil
It can be seen that motley striped on film.From the technical point of view, there is lossless film coating (such as hot oxygen on the dielectric material
Change Si/SiO2Film, extinction coefficient k=0 in limit of visible spectrum, color is shown due to film interference.It is reflecting
In spectrum, there are maximum and minimum.Position of the minimum in spectrum is related with destructive interference, appears in δ=(2m-1)
π, wherein integer m >=1 refers to interference level.The π nd/ λ cos of δ=2 (θ), wherein n refers to the refractive index of dielectric, and d is dielectric
Film thickness, θ is incident light angle, and λ is lambda1-wavelength.When maximum and minimum differing greatly in visible-range
When, so that it may generate apparent interference color.
However, when film has very smooth reflecting surface, such as Au, Ag, the perfact conductors such as Cu or Al,
Reflectivity is very big, but there are very little differences between the minimum of reflected intensity and maximum.Therefore, surface and no painting
The metal of coating equally has metallic luster, and surface coloring is very unobvious.Fig. 1 a is that 100nm is deposited on polished silicon slice
Al film, then above deposit different-thickness Si3N4Film, and difference is deposited on the polished silicon slice of non-evaporating Al
The Si of thickness3N4Film, for corresponding reflectance spectrum as shown in Fig. 2 a, reflectance spectrum shows the vision effect for generating metallic luster
Fruit is as caused by its high reflectivity.
When substrate is no longer conductive metal, but when having the dielectric substance of different refractivity with coated film, Ke Yiqing
The interference color observed clearly.It is also seen that this point from Fig. 1 a.Its corresponding reflectance spectrum is shown as shown in Fig. 2 c
Selective reflecting and dielectric material film thickness have close relationship out, and can be tuned in visible-range.
Preferably, extinction coefficient k=0 of the dielectric film in limit of visible spectrum.
Preferably, the material of metal is aluminium, silver, gold or copper, the roughness of metal in the metal substrate or metallic film
In 0.5 ~ 10nm RMS.
Preferably, the material of dielectric film is Si3N4、TiO2、ZnO、SiO2, PS, PET or PMMA；The thickness of dielectric film
At 10nm to 5 μm；The roughness of dielectric film is in 0.5 ~ 10nm RMS.
Preferably, deposition is using electron beam evaporation, thermal evaporation, radio frequency and d.c. sputtering, pulse laser deposition, chemical gaseous phase
Deposition, spin-coating method, infusion process, frictioning method or adherography.
Preferably, it is patterned in the structure.Patterning is more conducive to observe and determine object.
Preferably, illumination uses visible light.
It is provided by the invention that anti-fake method is carried out using schemochrome, mainly by visible light in metal and dielectric film
It is upper to generate interference and scattering respectively, make the color of metal different from scattering color by above-mentioned phenomenon based on different material, into
Row fake certification.
Compared with prior art, the beneficial effects of the present invention are:
This method is used to realize antifalse effect method using interference and scatter control schemochrome the present invention provides a kind of
Check that the true and false is easy to operate, while anti-fake grade is high.
Detailed description of the invention
Fig. 1 a) it is in Al and deposited on silicon substrates different-thickness Si respectively3N4The photo of the reflection light color of film；b)
It is the photo of the scattering light color of identical sample.Although the silicon wafer that Al and polishing has been deposited can show almost ideal
Mirror-reflection, but deposit different-thickness Si3N4The sample of the Al substrate of coating can show the face of different scattering light
Color.However the sample of uncoated Al and the sample of all silicon bases all only show black in this case, this be by
Caused by it has lacked scattering light；It c) is the kangaroo pattern that different colours are observed under reflected light and (d) scattering light
Photo.The size of sample is about 15 mm of 15mm x.
Fig. 2 a) on aluminum substrates deposit Si3N4 film sample reflectance spectrum;B) Si is deposited on aluminum substrates3N4It applies
The scattering spectra of layer aluminium film sample;C) Si is deposited on a silicon substrate3N4The reflectance spectrum of film sample, d) it deposits on a silicon substrate
Si3N4The scattering spectra of coating aluminium film sample.
The flow chart of Fig. 3 manufacture concealed structure color.
The flow chart of Fig. 4 concealed structure color image making.
Fig. 5 uses the schematic diagram of concealed structure chromatic graph picture.
Specific embodiment
Specific embodiments of the present invention will be further explained below.It should be noted that for these implementations
The explanation of mode is used to help understand the present invention, but and does not constitute a limitation of the invention.In addition, invention described below
Technical characteristic involved in each embodiment can be combined with each other as long as they do not conflict with each other.
Above the embodiments of the present invention are described in detail, but the present invention is not limited to described embodiments.It is right
For those skilled in the art, in the case where not departing from the principle of the invention and spirit, these embodiments are carried out more
Kind change, modification, replacement and modification, still fall in protection scope of the present invention.
Embodiment 1
The present invention combines Fig. 1 and Fig. 2 more intuitively to be explained regarding to the issue above below:
From Fig. 1 a, it can be seen that when substrate is aluminium, in the case where interfering observing pattern, color is not distinct, when substrate is silicon
It waits, it can be observed that coloury color, causes the phenomenon Producing reason to see Fig. 2 a and 2c, be respectively aluminium substrate and silicon
The reflectance spectrum figure of substrate differs smaller between the emission spectrum maximum and minimum in 2a, and therefore, sample coloring is unknown
Aobvious, and when the substrate of sample is silicon, the maximum and minimum of reflectance spectrum differ greatly (minimum is about zero), therefore sample
The various colors of product, the color are since interference is formed, and the thickness of interference and film has direct relationship, therefore has difference
The color sample difference of the silicon nitride of thickness is larger.In the case where scattering observing pattern, it has been found that substrate is that the sample of aluminium is shown
Strikingly color, and the sample observation of silicon base is less than color before, this reason can find out by Fig. 2 b and 2d, difference
The spectral intensity that diffuses for the diffusing reflection spectrum of different base material, aluminium substrate sample is larger compared to silicon base sample, thing
In reality, the spectral intensity that diffuses of the sample of silicon base is almost negligible to be disregarded, therefore can not observe color.Further,
Present invention utilizes scatterings light (eliminating direct reflection), it can be observed that a kind of new schemochrome effect, is shown in that Fig. 1 b is identical
The photo of the scattering light of sample.Si is deposited in Al substrate3N4Sample color present out it is strong to dielectric material film thickness according to
The relationship of relying, dependence of angle is unobvious, and incident light angle has minor impact to color, but color is unrelated with viewing angle.
This is completely different with the color generated in conventional films interference, it is somewhat dependent on viewing angle.Compared to more existing
In technology, need to find out schemochrome existing for special angle, it is simpler in viewing angle, judge easier.Corresponding scattering
Spectrum is as shown in Fig. 2 b, the maximum and Si of scattering3N4The thickness of film is related, and can be tuned in visible-range.
Its scattered light intensity of the sample of pure metal surface and silicon base does not show maximum, and its image for scattering light is black
, bottom and Fig. 2 d such as Fig. 1 b) photo) in scattering spectrum.Pass through this new schemochrome and traditional film interference face
Form and aspect combine, us can be made to can be observed to change the photo of color in reflection and scattering.Fig. 1 c) and 1d) be kangaroo photo,
The aluminium film of kangaroo shape is deposited first on polished silicon slice, then in the Si of entire sample surfaces deposition 160nm thickness3N4Film.
In reflection, yellow (gold) is presented in the background of this picture, and metallochrome is presented in kangaroo.And in scattering, the back of this picture
Black is presented in scape, and blue is presented in kangaroo.
The production flow diagram of new construction color is as shown in Figure 3.It can be by being carried out at polishing to metal substrates such as Al, Ag, Au, Cu
Reason, obtains smooth surface, then deposited dielectric films on it, to obtain concealed structure color.It can also be by substrate
The metallic films such as smooth Al, Ag, Au, Cu are deposited, then with deposited dielectric films thereon, finally obtain concealed structure color.
The flow chart of Fig. 4 production concealed structure color image.It is illustrated in Fig. 5 and how in interference and scattering to check having
The schematic diagram of the image of concealed structure color (material is damaged in Fig. 5 to be not present).Sample with concealed structure color is applied
Illumination is observed the color of sample by interference pattern and backscatter mode, is verified to its true or false and examined using this method
It is easy to operate to look into the true and false, while anti-fake grade is high.
The present invention is based on anti-fake method is carried out using schemochrome, concrete operations are as follows:
Firstly, (can directly utilize fluorescent lamp or common sunlight) from the angle (reflected image) of interference under visible light
Schemochrome；
Secondly, carrying out front illuminated in darkroom for schemochrome, observing the schemochrome of (reflected image) under backscatter mode；
If changed in the color that backscatter mode flowering structure color is presented, it can be considered that sample is genuine piece；If interfering and dissipating
Under emission mode, difference does not occur for color, then the sample is not genuine piece.
Professional and operation without large-scale instrument and are related to using the method for the present invention, naked eyes can be real under visible light
It is existing, as shown in figure 5, Household handheld light source (flashlight).
In addition, the present invention directly passes through interference and the color change of scattering goes to judge the appearance of schemochrome, compared to more existing
In technology, need to find out schemochrome existing for special angle, it is simpler in viewing angle, judge easier.
And method processing of the invention is simple, using simple deposition, medal polish even can be manually implemented.
Meanwhile the present invention is handled without chemical ink etc., and it is environmentally protective, it is low in cost.
Claims (9)
1. a kind of carry out anti-fake method using schemochrome, which is characterized in that the method includes based on the knot using schemochrome
Structure and its application method, the structure using schemochrome include metal substrate and dielectric film from bottom to up；Or, from down toward
On nonmetallic substrate, metallic film and dielectric film, application method includes: to carry out illumination to the sample of the structure, by dry
Relate to the color change with backscatter mode observation sample；If become interfering and under backscatter mode, showing entirely different color
Change, sample can be labeled as there are schemochromes.
2. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that the dielectric film is visible
Extinction coefficient k=0 in spectral region.
3. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that the metal substrate or gold
The material for belonging to metal in film is aluminium, silver, gold or copper, and the roughness of metal is in 0.5 ~ 10nm RMS, and the thickness of metal is in 10nm
To 10 μm.
4. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that the material of dielectric film is
Si3N4、TiO2、ZnO、SiO2, PS, PET or PMMA；The thickness of dielectric film is at 10nm to 5 μm；The roughness of dielectric film
In 0.5 ~ 10nm RMS.
5. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that deposition is steamed using electron beam
Hair, thermal evaporation, radio frequency and d.c. sputtering, pulse laser deposition, chemical vapor deposition, spin-coating method, infusion process, frictioning method or offset printing
Method.
6. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that carry out pattern in the structure
Change, patterning is attached in schemochrome.
7. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that illumination uses visible light.
8. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that under normal lighting conditions,
Using interference observation reflected image or spectrum；Under dark room conditions, front illuminated is carried out, the reflected image or light of scattering are observed
Spectrum.
9. anti-fake method is carried out using schemochrome according to claim 1, which is characterized in that in spectrum under interference condition
The difference of maximum and minimum is A, and the difference of maximum and minimum is B in spectrum under the conditions of scattering, described to utilize structure
The structure of color meets A and is noticeably greater than B, or, A is significantly less than B.
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| CN201910594783.3A CN110341344B (en) | 2019-07-03 | 2019-07-03 | Method for anti-counterfeiting by using structural color |
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| CN113763801A (en) * | 2021-09-08 | 2021-12-07 | 中国科学院微电子研究所 | Anti-counterfeiting structure, preparation method of anti-counterfeiting structure and chip |
| CN114351236A (en) * | 2021-12-28 | 2022-04-15 | 哈尔滨工程大学 | Panchromatic domain structural color encryption module and preparation method thereof |
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| CN110341344B (en) | 2021-08-06 |
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