CN110319788A - Adjustable interference position test device and its test method - Google Patents

Adjustable interference position test device and its test method Download PDF

Info

Publication number
CN110319788A
CN110319788A CN201910552419.0A CN201910552419A CN110319788A CN 110319788 A CN110319788 A CN 110319788A CN 201910552419 A CN201910552419 A CN 201910552419A CN 110319788 A CN110319788 A CN 110319788A
Authority
CN
China
Prior art keywords
reflecting mirror
sensor
formula
displacement sensor
dimension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201910552419.0A
Other languages
Chinese (zh)
Other versions
CN110319788B (en
Inventor
吴伦哲
顿爱欢
徐学科
邵建达
杨明红
朱杰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Hengyi Optical Precision Machinery Co ltd
Shanghai Institute of Optics and Fine Mechanics of CAS
Original Assignee
Shanghai Hengyi Optical Precision Machinery Co ltd
Shanghai Institute of Optics and Fine Mechanics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Hengyi Optical Precision Machinery Co ltd, Shanghai Institute of Optics and Fine Mechanics of CAS filed Critical Shanghai Hengyi Optical Precision Machinery Co ltd
Priority to CN201910552419.0A priority Critical patent/CN110319788B/en
Publication of CN110319788A publication Critical patent/CN110319788A/en
Application granted granted Critical
Publication of CN110319788B publication Critical patent/CN110319788B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/025Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

A kind of adjustable interference position test device and method, including interferometer, MEMS reflecting mirror, spectroscope, Amici prism, position sensor and computer etc..The present invention can make the measuring head of the face shape of complicated optical surface, it is ensured that wider test scope, high measuring accuracy and bigger test visual field.

Description

Adjustable interference position test device and its test method
Technical field
The present invention relates to interference position testing field, specifically a kind of adjustable interference position test device and its test side Method, be particularly suitable for optical element it is complex-curved face shape test, it can be achieved that heavy caliber complicated optics face shape test, Test scope is wide, and precision is high, there is biggish visual field.
Background technique
The complex-curved work in-process of optical element needs to be repeated processing iteration.The test equipment of work in-process point at present For two classes, contact and contactless.Wherein contact mainly has contourgraph and three-coordinates measuring machine;Contactless having is dry Interferometer.The test probe of these equipment is difficult to meet wide test scope simultaneously, and high measuring accuracy and bigger visual field are to meet The complex-curved test of optical element.
In view of the above problems, the present invention is tested by the way of laser interference, thus guarantee measuring accuracy, collocation point Light prism and displacement sensor determine the light deflection in test process, pass through MEMS reflecting mirror regulating guarantee light Interferometer can be returned to, to complete position measurement.
Summary of the invention
The purpose of the present invention is overcoming the above-mentioned prior art insufficient, a kind of adjustable interference position test device and side are proposed Method, interferometer, MEMS reflecting mirror, spectroscope, Amici prism, position sensor, computer etc..The present invention can make optics The complex-curved test probe of element, during carrying out high precision measurement, guarantees biggish measurement range and biggish visual field.
The principle of the present invention is:
1, light deflection is detected using Amici prism collocation displacement sensor:
The part of detection light deflection is made of Amici prism, displacement sensor 1# and displacement sensor 2#, such as Fig. 1 institute Show, it is assumed that system is calibrated (i.e. for displacement sensor 1# and displacement sensor 2#, X-axis is identical with the relative direction of Y-axis). Displacement sensor 1#, displacement sensor 2# are D apart from Amici prism range difference.For displacement sensor 1#, test beams distance The relative position difference of reference beam is (X1,Y1);For displacement sensor 2#, the relative position of test beams distance reference light beam Difference is (X2,Y2), the unit twist vector of light beam is as shown in formula 5;
2, the adjusting of test light is completed using MEMS reflecting mirror, MEMS reflecting mirror can be along X-axis It is quickly adjusted with Y direction.To meet the Frequency Index requirement of test, after calibration, MEMS can control Reflecting mirror is deflected respectively along Y-axis and X-axis, and the deflection angle of test light is adjusted to original position;
3, test beams are issued using interferometer and received, obtained obtaining displacement difference, by error compensation, obtain in place Set test result.
The present invention can test complicated face shape process using MEMS reflecting mirror cooperation light deflection probe portion In obtain deflection and the correction of test light, equipment control and data processing are completed by computer, in the item of high-precision and high scope Position measurement result is obtained under part.
Technical solution of the invention is as follows:
A kind of adjustable interference position test device, it is characterized in that, comprising: laser interferometer, spectroscope, light splitting rib Mirror, computer, position sensor 1#, position sensor 2#, MEMS reflecting mirror;
It is described it is spectroscopical be coated with anti-reflection film on one side, another side is coated with semi-transparent semi-reflecting film;
The laser interferometer output light is incident on described micro electronmechanical after described spectroscopical anti-reflection film transmission System mirror, after MEMS reflecting mirror reflection, directive element surface to be tested is reflected through element surface to be tested Afterwards, along backtracking, the spectroscope is incident on after the reflection of MEMS reflecting mirror, it is spectroscopical semi-transparent semi-reflecting through this Film is divided into reflected light and transmitted light, and the transmitted light is received by laser interferometer, and the reflected light is incident on Amici prism, It is divided into the second reflected light and the second transmitted light through the Amici prism, second reflected light is received by position sensor 2#, institute The second transmitted light stated is received by position sensor 1#;
The spacing and position sensor 1# of the position sensor 2# and Amici prism and the spacing of Amici prism differ;
The output end of the laser interferometer is connected with computer input terminal, the output end of the position sensor 1# It is connected respectively with the input terminal of computer with the output end of position sensor 2#, MEMS reflecting mirror input terminal and computer Output end be connected.
The interferometer be general purpose type high accuracy laser interferometer, using single-frequency laser (operation wavelength: 633 ± 10nm), measurement range: 0~10m, beam diameter: 1~2mm, resolution ratio: 1nm, measurement accuracy: ± 0.5ppm;
The spectroscope is the otpical leaf (0.5~10mm of diameter range, 0.1~1mm of thickness) that plated film is distinguished on two sides, The depth of parallelism is less than 2 ", thin slice both sides are coated with semi-transparent semi-reflecting film respectively, and (mixed polarized, transmitance: 50% ± 3%) and anti-reflection film is (mixed Close polarization, transmitance > 99.8%);
The MEMS reflecting mirror can complete the quick deflection of light beam, 1~20kHz of response frequency, reflecting mirror 0.5~5.0mm of diameter, -10 ° of mechanical slewing area~10 °;
The Amici prism be polarization splitting prism, size 5mm × 5mm × 5mm, the face λ of shape PV < 1/4 (λ= 632.8nm), through parameter (Tp>95%, Ts<1%), reflection parameters (Rs>99%, Rp<5%);
The position sensor is transversal effect position sensor, and the resolution ratio of transversal effect position sensor is less than 2 μ m;
The computer includes and interferometer, the communication interface of MEMS reflecting mirror and position sensor and With the control interface of MEMS reflecting mirror.
According to the adjustable interference position test device, it is characterised in that the test light can be according to light splitting The test result of prism and position sensor, is adjusted by MEMS reflecting mirror, and Returning beam is adjusted back laser Interferometer receiving portion, to complete the complex-curved test of optics.
The adjustable interference position test device need using two-dimension adjustment frame (up and down, left and right range > 10mm, point Resolution < 0.001mm), two-dimension adjustment frame (pitching, 5 ° of range > of inclination, resolution ratio < 5 "), two dimension electronic arc pendulum regulating platform (adjust 10 ° of adjusting range >, uniaxial repetitive positioning accuracy is less than 0.002 °), ruler (range > 500mm, resolution ratio < 1mm) and plane Reflecting mirror cooperation calibration;
The test of optical element complex surface is carried out using the adjustable interference position test device, is characterized in that the party Method includes the following steps:
Step 1: zeroing, calibration.Using the electronic arc pendulum regulating platform of translation stage collocation two dimension and flat normal microscope group at standard Reflection calibration component, is reflected back interferometer for reflection measurement light beam, adjusts displacement sensor 1# and displacement sensor 2# at this time, make Test beams are by displacement sensor 1#, the center displacement sensor 2#, using the electronic arc pendulum regulating platform of two dimension respectively along X-direction It turns an angle with Y-direction, and test beams is adjusted into go back to interferometer receiving portion using MEMS reflecting mirror, according to It is obtained by the rotational angle that the obtained rotational angle of displacement sensor 1# and displacement sensor 2# and MEMS reflecting mirror input To regulation coefficient matrix;
Step 2: installation testing element.Testing element is installed to and adjusted installation elements position, guarantees that Returning beam returns to Interferometer receiving portion, all devices are in running order;
Step 3: starting to test.Testing element guarantees that interferometer has always valid data during the test, and programs Record the facula position of the record of displacement sensor 1#, 2#, the survey of the adjusting position and interferometer of MEMS reflecting mirror Measure result.
Step 4: data processing.Using computer by calibration result, displacement sensor record position result and micro-electro-mechanical systems The adjusting position result of system reflecting mirror compensates interferometer test result, obtains the face shape result of actual test.
The advantages of the invention patent, is:
The present invention can test the complex-curved face shape of optical element, and the test scope of the device is wide, and measuring accuracy is high, Visual field is big, can satisfy in optical manufacturing and tests the complex-curved face shape of optical element.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of adjustable interference position test device;
In figure: 1- interferometer;2- spectroscope;3- Amici prism;4- computer;5- position sensor 1#;6- position sensing Device 2#;7- MEMS reflecting mirror;
Fig. 2 is installation process structural schematic diagram;
In figure: 8- standard reflection mirror;
Fig. 3 is calibration process structural schematic diagram;
Specific embodiment
Below with reference to embodiment, the invention will be further described, but should not be limited the scope of the invention with this.
Refering to fig. 1, Fig. 1 is the structural schematic diagram of adjustable interference position test device, and as can be seen, the present invention is adjustable Interference position test device, comprising: laser interferometer 1, spectroscope 2, Amici prism 3, computer 4, position sensor 1#5, position Set sensor 2#6, MEMS reflecting mirror 7.The laser interferometer 1 is fixed on two-dimension adjustment frame, and (pitching, inclination are adjusted It is whole), the output end of laser interferometer 1 is connected with 4 input terminal of computer, the position that when test in real time tests laser interferometer 1 As a result it is transferred to computer 4;The spectroscope 2 is fixed on two-dimension adjustment frame (pitching, tilt adjustments);The Amici prism is solid It is scheduled on two-dimension adjustment frame (pitching, tilt adjustments);The position sensor 1# and position sensor 2# is separately fixed at two tune Whole frame (up and down, left and right adjustment), the output end of position sensor 1# and position sensor 2# respectively with the input terminal phase of computer 4 Even, the position result of position sensor 1# and position sensor 2# light spot received are transferred to computer 4 in real time when test;Microcomputer Electric system reflecting mirror 7 is fixed on two-dimension adjustment frame, and 7 input terminal of MEMS reflecting mirror is connected with the output end of computer 4, Pose adjustment signal is transferred to MEMS reflecting mirror 7 in real time by computer 4 when test.
Using the method for the above-mentioned measuring device measurement complex-curved face shape of optical element, comprising the following steps:
1) light output direction referring to fig. 2, which is tested, in the laser interferometer 1 is sequentially placed spectroscope 2, microelectromechanical-systems Reflecting mirror 7 and reflecting mirror 8, spectroscope 2 tilt 44 ° to 46 ° placements, and anti-reflection film 2 (a) is located at interferometer side, semi-transparent semi-reflecting Film 2 (b) is located at electric system reflecting mirror side, and the reflecting mirror 8 is fixed on electronic arc pendulum regulating platform, laser interferometer 1 Output end is connected with the input terminal of computer 4, and the input terminal of microelectromechanical-systems reflecting mirror 7 is connected with the output end of computer 4, adjusts The fixed two-dimension adjustment frame of whole reflecting mirror 8 guarantees that the light returned can be received by laser interferometer 1;
2) referring to Fig. 3, on the direction of the output light of the semi-transparent semi-reflecting film 2 (b), Amici prism 3, Amici prism are placed Placement location sensor 1#5 and position sensor 2#6 is distinguished on 3 two outbound courses, uses ruler measurement position sensor 2#6 and 3 distance of Amici prism and measurement position sensor 1#5 and 3 distance of Amici prism, and calculate range difference D;
3) referring to Fig. 3, the fixed two-dimension adjustment frame of the displacement sensor 1#5 is adjusted, so that the hot spot of test is located at It adjusts displacement sensor 1#5 and tests center sensor, and record current position signal (Xo1,Y01), similarly adjust displacement sensor 2#6 fixed two-dimension adjustment frame, and record current position signal (Xo2,Y02);
4) referring to Fig. 3, the electronic arc pendulum regulating platform of the fixed two dimension of the reflecting mirror 8 rotates θ along X-directionx, record The current location displacement sensor 1#5 and (Xo1,Y01) relative position deflection (Xx1,Yx1), record the current location displacement sensor 2#6 With (Xo2,Y02) at relative position deflect (Xx2,Yx2), according to 1 unit of account twist vector of formula3 times turns Move different deflection angle thetasx1、θx2、θx3And calculate separately unit twist vectorDue to unit twist vector And θxRelationship is as shown in formula 2, is fitted to obtain deflection factor (A using least square methodx,Bx,Cx);
5) referring to Fig. 3, the electronic arc pendulum regulating platform of the fixed two dimension of the reflecting mirror 8 rotates θ along Y directiony, record The current location displacement sensor 1#5 and (Xo1,Y01) relative position deflection (Xy1,Yy1), record the current location displacement sensor 2#6 With (Xo2,Y02) at relative position deflect (Xy2,Yy2), unit of account twist vectorIt is calculated according to formula 3 Unit twist vectorRotate different deflection angle thetas 3 timesy1、θy2、θy3And calculate separately unit twist vectorDue to unit twist vectorAnd θyRelationship is as shown in formula 4, is fitted to obtain partially using least square method Transfer from one department to another number (Ay,By,Cy);
6) referring to Fig. 3, the electronic arc pendulum regulating platform of the fixed two dimension of the reflecting mirror 8 turns respectively along X-axis and Y direction Dynamic θxAnd θy.Record the current location displacement sensor 1#5 and (Xo1,Y01) relative position deflection (X1,Y1), record displacement sensor The current location 2#6 and (Xo2,Y02) at relative position deflect (X2,Y2), according to 5 unit of account twist vector of formulaThe MEMS reflecting mirror 7 is first rotated along after X-axis along Y-axis, and records relative swing position And unit of account twist vector againUntilMEMS reflecting mirror 7 is along X-axis rotational angle at this timeAlong Y-axis rotational angleThe unit turn vector of MEMS reflecting mirror 7 is calculated according to formula 6
7) it is repeated 3 times step 6 and obtains 3 groups of unit turn vectorsWith unit twist vector It is fitted according to formula 7 using least square method, is adjusted coefficient matrix E;
8) referring to Fig. 1, the reflecting mirror 8 is removed into optical path, and testing element surface, table are placed at 8 position of reflecting mirror Face normal direction is opposite with output test light direction, and the fixed two-dimension adjustment frame of testing element guarantees that the light returned can be swashed Optical interferometer 1 receives, and records displacement sensor 1#5 current position signal (Xeo1,Yeo1), record displacement sensor 2#6 present bit Confidence number (Xeo2,Yeo2), measurement testing element and displacement sensor 1#5 distance K;
9) along measurement direction moving element, the record of computer 4 this moment the current position signal of displacement sensor 1#5 with (Xeo1,Yeo1) relative position defection signal (Xe1,Ye1), record current location and the (X of displacement sensor 2#6eo2,Yeo2) Relative position defection signal (Xe2,Ye2), according to 8 unit of account twist vector of formulaMEMS is calculated according to formula 9 7 rotational angle of reflecting mirrorAnd rotational angleComputer 4 controls MEMS reflecting mirror 7 along X-axis rotational angle Along Y-axis rotational angleAnd record present laser interferometer 1 test displacement variable Δ Z, according to formula 2, formula 4 and Unit twist vectorCalculate deflection angle thetaxAnd θy
10) referring to Fig. 1, test terminates, and is fitted component side shape, fit procedure according to element movement and displacement variable Δ Z In need to calibrate test point position, actual coordinate x, y and coordinates of motion x0、y0Relationship it is as shown in formula 10;
11) referring to Fig. 1, testing practical face shape S is using rotational angleIt is tied after being calibrated to displacement variation delta Z Fruit.It tests practical face shape S and displacement variable Δ Z relationship is as shown in formula 11.
Experiment shows the present invention using laser interference principle, tests visual field < 20 °, test scope < 1m, test repeatability < 100nm, precision < 0.1 μm realize the complex-curved face shape test of optical element.

Claims (8)

1. a kind of adjustable interference position test device characterized by comprising laser interferometer (1), spectroscope (2), light splitting Prism (3), computer (4), position sensor 1# (5), position sensor 2# (6), MEMS reflecting mirror (7);
The spectroscope (2) is coated with anti-reflection film (2 (a)) on one side, and another side is coated with semi-transparent semi-reflecting film (2 (b));
Laser interferometer (1) output light is incident on described after the transmission of the anti-reflection film (2 (a)) of the spectroscope (2) MEMS reflecting mirror (7), through the MEMS reflecting mirror (7) reflection after, directive element surface to be tested, through to be measured After trying element surface reflection, along backtracking, it is incident on the spectroscope (2) after MEMS reflecting mirror (7) reflection, Semi-transparent semi-reflecting film (2 (b)) through the spectroscope (2) is divided into reflected light and transmitted light, and the transmitted light is by laser interferometer (1) It receiving, the reflected light is incident on Amici prism (3), is divided into the second reflected light and the second transmitted light through the Amici prism (3), Second reflected light is received by position sensor 2# (6), and second transmitted light is received by position sensor 1# (5);
The spacing and position sensor 1# (5) of the position sensor 2# (6) and Amici prism (3) and Amici prism (3) Spacing etc.;
The output end of the laser interferometer (1) is connected with computer (4) input terminal, the position sensor 1#'s (5) The output end of output end and position sensor 2# (6) are connected with the input terminal of computer (4) respectively, MEMS reflecting mirror (7) input terminal is connected with the output end of computer (4).
2. adjustable interference position test device according to claim 1, which is characterized in that the spectroscope (2) is put Angle setting degree is 44 °~46 °.
3. adjustable interference position test device according to claim 1 or 2, which is characterized in that the spectroscope (2) The otpical leaf of plated film is distinguished for two sides, 0.5~10mm of diameter range, 0.1~1mm of thickness, the depth of parallelism is less than 2 ", thin slice both sides It is coated with semi-transparent semi-reflecting film (mixed polarized, transmitance: 50% ± 3%) and anti-reflection film (mixed polarized, transmitance > respectively 99.8%).
4. adjustable interference position test device according to claim 1, which is characterized in that the Amici prism (3) For polarization splitting prism, 1/4 λ (λ=632.8nm) of face shape PV <, through parameter (Tp > 95%, Ts < 1%), reflection parameters (Rs > 99%, Rp < 5%).
5. adjustable interference position test device according to claim 1, which is characterized in that the position sensor 1# (5) and position sensor 2# (6) is transversal effect position sensor, and the resolution ratio of transversal effect position sensor is less than 2 μm.
6. adjustable interference position test device according to claim 1, which is characterized in that the MEMS is anti- The quick deflection of light beam, 1~20kHz of response frequency, 0.5~5.0mm of mirror diameter, machinery rotation can be completed by penetrating mirror (7) - 10 ° of range~10 °.
7. adjustable interference position test device according to claim 1, which is characterized in that the laser interferometer (1), position sensor 1# (5), position sensor 2# (6) and MEMS reflecting mirror (7) are both placed on two-dimension adjustment frame.
8. the measurement method of interference position is carried out using the adjustable interference position test device as claimed in claim 1 to 7, It is characterized in that, method includes the following steps:
1) reflecting mirror (8) is fixed on the electronic arc pendulum regulating platform of two dimension, and the electronic arc pendulum regulating platform of the two dimension and computer (4) It is connected, adjusts the electronic arc of two dimension and put regulating platform, guarantee laser interferometer (1) output light successively through spectroscope (2), MEMS After reflecting mirror (7) and reflecting mirror (8), received along backtracking, and by laser interferometer (1);
2) using ruler measurement position sensor 2# (6) and Amici prism (3) distance and measurement position sensor 1# (5) and light splitting Prism (3) distance, and calculate range difference D;
3) the two-dimension adjustment frame of displacement sensor 1# (5) is placed in adjustment, and the displacement sensor 1# (5) received hot spot is made to be located at position The center of displacement sensor 1# (5) records current position signal (Xo1, Y01);The two dimension that displacement sensor 2# (6) are placed in adjustment is adjusted Whole frame makes the displacement sensor 2# (6) received hot spot be located at the center of displacement sensor 2# (6), and records present bit confidence Number (Xo2, Y02);
4) the electronic arc of rotation two dimension puts regulating platform, it is made to rotate θ along the X-direction of the electronic arc pendulum regulating platform of the two dimensionx, record The current position signal of displacement sensor 1# (5) and (X this momento1, Y01) relative position defection signal (Xx1, Yx1), record displacement The current location of sensor 2# (6) and (Xo2, Y02) relative position defection signal (Xx2, Yx2);
Calculate X-axis unit twist vectorFormula is as follows:
In formula,
N times rotate different deflection angles and calculate separately unit twist vector, and n >=3, due to unit twist vectorAnd θxRelationship As follows, n group data can be used least square method and be fitted to obtain deflection factor (Ax, Bx, Cx);
Ax·xx+Bx·yx+Cx·zxx (2)
5) the electronic arc of rotation two dimension puts regulating platform, it is made to rotate θ along the Y direction of the electronic arc pendulum regulating platform of the two dimensiony, record (5) current location displacement sensor 1# and (X this momento1, Y01) relative position defection signal (Xy1, Yy1), displacement passes record this moment (6) current location sensor 2# and (Xo2, Y02) place relative position deflection (X this momenty2, Yy2);
Calculate Y-axis unit twist vectorFormula is as follows:
In formula,
N times rotate different deflection angles and calculate separately unit twist vector, and n >=3, due to unit twist vectorAnd θxRelationship As follows, n group data can be used least square method and be fitted to obtain deflection factor (Ay, By, Cy);
Ay·xy+By·yy+Cy·zyy (4)
6) the electronic arc of rotation two dimension puts regulating platform, turns it respectively along the X-axis and Y direction of the electronic arc pendulum regulating platform of the two dimension Dynamic θxAnd θy, record (5) current location displacement sensor 1# this moment and (Xo1, Y01) relative position defection signal (X1, Y1), record (6) current location displacement sensor 2# and (X this momento2, Y02) at relative position defection signal (X2, Y2);
Calculate X-axis and Y-axis unit twist vectorFormula is as follows:
In formula,
7) it is rotated using computer (4) control MEMS reflecting mirror (7), makes its elder generation along MEMS reflecting mirror (7) X-direction rotationFurther along the Y direction rotation of MEMS reflecting mirror (7)And record displacement sensor this moment 1# (5) relative position defection signal and this moment the relative position defection signal of displacement sensor 2# (6), recalculate X according to formula 5 Axis and Y-axis unit twist vectorUntil
Calculate the unit turn vector of MEMS reflecting mirror (7)Formula is as follows:
In formula,
N times rotate different deflection angles and calculate separately unit turn vector, and n >=3, due to unit turn vectorIt is inclined with unit Steering volumeRelationship is shown below, and E is regulation coefficient matrix in formula, indicates by unit twist vectorInverse unit turn to AmountInstitute's multiplying factor is adjusted coefficient matrix E with least square method fitting is all,
8) reflecting mirror (8) are removed into optical path, and places element to be tested at reflecting mirror (8) position, keep the element to be tested solid It is scheduled on two-dimension adjustment frame, and the testing element surface normal direction is opposite with the output light direction of laser interferometer (1), Guarantee that the light returned can be received by laser interferometer (1), records displacement sensor 1# (5) current position signal (Xeo1, Yeo1), Record displacement sensor 2# (6) current position signal (Xeo2, Yeo2), measure the light of element to be tested Yu displacement sensor 1# (5) Road distance K;
9) along measurement direction moving element, computer (4) record this moment the current position signal of displacement sensor 1# (5) with (Xeo1, Yeo1) relative position defection signal (Xe1, Ye1), record current location and the (X of displacement sensor 2# (6)eo2, Yeo2) Relative position defection signal (Xe2, Ye2);
Calculate X-axis and Y-axis unit twist vectorFormula is as follows:
In formula,
Calculate MEMS reflecting mirror (7) rotational angleAnd rotational angleFormula is as follows:
10) computer (4) control MEMS reflecting mirror (7) is along X-axis rotational angleAlong Y-axis rotational angleAnd The displacement variable Δ Z for recording present laser interferometer (1) test, according to formula 2, formula 4 and unit twist vectorMeter Calculate deflection angle thetaxAnd θy
11) move to obtain element test position x in test process according to element0、y0, practical test points are obtained according to formula fitting Position xr、yr, formula is as follows:
12) rotational angle is usedDisplacement variation delta Z is calibrated to obtain and tests practical face shape S, test practical face shape S and Displacement variable Δ z relationship is as follows:
CN201910552419.0A 2019-06-25 2019-06-25 Adjustable interference position testing device and testing method thereof Active CN110319788B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910552419.0A CN110319788B (en) 2019-06-25 2019-06-25 Adjustable interference position testing device and testing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910552419.0A CN110319788B (en) 2019-06-25 2019-06-25 Adjustable interference position testing device and testing method thereof

Publications (2)

Publication Number Publication Date
CN110319788A true CN110319788A (en) 2019-10-11
CN110319788B CN110319788B (en) 2021-11-30

Family

ID=68120110

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910552419.0A Active CN110319788B (en) 2019-06-25 2019-06-25 Adjustable interference position testing device and testing method thereof

Country Status (1)

Country Link
CN (1) CN110319788B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111060143A (en) * 2019-12-18 2020-04-24 重庆大学 Rotor axial distance, rotating speed and inclination angle synchronous measurement method based on sweep frequency interference

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08105711A (en) * 1994-10-05 1996-04-23 Kosaka Kenkyusho:Kk Optical interference length measuring apparatus
CN203908500U (en) * 2014-05-26 2014-10-29 唐山学院 Laser tracking measurement device
CN104142179A (en) * 2014-07-28 2014-11-12 奉化市宇创产品设计有限公司 Static fixed mirror interferometer
CN204064260U (en) * 2014-06-16 2014-12-31 浙江大学 A kind of optics self-focusing for free form surface topography measurement is popped one's head in

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08105711A (en) * 1994-10-05 1996-04-23 Kosaka Kenkyusho:Kk Optical interference length measuring apparatus
CN203908500U (en) * 2014-05-26 2014-10-29 唐山学院 Laser tracking measurement device
CN204064260U (en) * 2014-06-16 2014-12-31 浙江大学 A kind of optics self-focusing for free form surface topography measurement is popped one's head in
CN104142179A (en) * 2014-07-28 2014-11-12 奉化市宇创产品设计有限公司 Static fixed mirror interferometer

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
MANOUCHEHR E.MOTAMEDI: "《微光机电系统》", 31 January 2010, 国防工业出版社 *
冀伟: "激光束位置及角度偏差测量系统", 《中国优秀硕士学位论文全文数据库 信息科技辑》 *
黄一帆 等: "《光学设计教程(第2版)》", 31 August 2018, 北京理工大学出版社 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111060143A (en) * 2019-12-18 2020-04-24 重庆大学 Rotor axial distance, rotating speed and inclination angle synchronous measurement method based on sweep frequency interference
CN111060143B (en) * 2019-12-18 2021-07-20 重庆大学 Rotor axial distance, rotating speed and inclination angle synchronous measurement method based on sweep frequency interference

Also Published As

Publication number Publication date
CN110319788B (en) 2021-11-30

Similar Documents

Publication Publication Date Title
US4725144A (en) Optic element testing method and apparatus
US3885875A (en) Noncontact surface profilometer
CN101377414B (en) Apparatus and method for measuring two-dimensional small angle based on light beam angle drift dynamic compensation
CN104330039A (en) High-numerical-aperture optical fiber point diffraction interference device used for three-coordinate measurement and method thereof
CN110174054B (en) High-stability four-optical-path laser interferometry system
JP2018116058A (en) Measuring device and method for measuring at least one length measurement amount
CN107250714B (en) Method and apparatus for interferometric detection
CN102788563A (en) Device and method for adjusting tilt of measured mirror in matching measurement of flat sub-aperture
CN110455226B (en) Calibration system and method for laser collimation transceiving integrated straightness measurement
CN112596259B (en) High-precision off-axis aspheric reflector optical axis leading-out method and system
JP2014098690A (en) Calibration apparatus, calibration method, and measurement apparatus
CN110567400A (en) low-nonlinearity angle measuring device and method based on laser interference
CN114252028B (en) Compact four-facula two-dimensional corner detection device combined with laser triangulation method
CN111928788A (en) Bidirectional correlation spectrum confocal flat plate thickness detection system and double-optical-axis calibration method thereof
CN110319788A (en) Adjustable interference position test device and its test method
CN105737758B (en) A kind of long-range profile measuring instrument
Ren et al. A novel enhanced roll-angle measurement system based on a transmission grating autocollimator
CN113203553A (en) Lens center error measuring system and measuring method
CN108332686B (en) A kind of detection device and method of conical mirror cone angle
CN109458959A (en) A kind of change inclination angle phase shift grazing-incidence interferometer measuring device and method
CN110440710A (en) The surface testing system and detection method of the recessed axial cone mirror of high reflectance
JP6800442B2 (en) 3D shape measurement system
Saito et al. A single lens micro-angle sensor
TW200949192A (en) Measurement method for parallelism verification of two plane mirrors by Fabry-Perot interferometric principle
US6721056B1 (en) Surface shape measuring apparatus and method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant