CN110308617A - Photosensitive composition, colour filter and image display device comprising it - Google Patents

Photosensitive composition, colour filter and image display device comprising it Download PDF

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Publication number
CN110308617A
CN110308617A CN201910117834.3A CN201910117834A CN110308617A CN 110308617 A CN110308617 A CN 110308617A CN 201910117834 A CN201910117834 A CN 201910117834A CN 110308617 A CN110308617 A CN 110308617A
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Prior art keywords
chemical formula
photosensitive composition
methyl
photoepolymerizationinitiater initiater
mentioned
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Chinese (zh)
Inventor
李宪熙
李光镐
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Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides photosensitive composition, colour filter and image display device comprising it.Photosensitive composition includes Photoepolymerizationinitiater initiater A, the Photoepolymerizationinitiater initiater a1 of 0.1% or more absorptivity when Photoepolymerizationinitiater initiater A includes 365nm wavelength, it is compound represented by chemical formula 1 or 2, to prevent from leading to the problem of in manufacturing process by the form for being shaped as positive bevel of pattern before the rear baking process in colour filter manufacturing process, prevent from generating hole in the pattern to be formed.In chemical formula 1 and 2, R1It is indicated by chemical formula 3, R2For alkyl, molecular weight is 50~150, R3For substituted or non-substituted diphenylsulfide base etc..In chemical formula 3, R4For C1~C8 alkylidene, C6~C20 arlydene etc., R5For CN, C1~C8 alkyl, the ring structure of C3~C8, C6~C20 aryl or C7~C25 aralkyl.Chemical formula 1Chemical formula 2Chemical formula 3-R4‑R5。

Description

Photosensitive composition, colour filter and image display device comprising it
Technical field
Colour filter and figure the present invention relates to photosensitive composition, comprising the photosensitive composition As display device.
Background technique
As the method for forming colour filter using photosensitive composition, following methods are mainly used: in substrate Or be pre-formed desired pattern light shield layer substrate on formed photosensitive composition film, by having The photomask irradiation light (hereinafter referred to as exposing) of scheduled pattern, develops and makes non-exposed portion dissolution removal, after then carrying out It dries, to obtain the pixel of each color.
In addition, in recent years, in the technical field of colour filter, shorten to reduce light exposure production away from the time and in order to The requirement of the high color purity of the image display device required recently is coped with, trend is increased in photosensitive composition The content (ratio) of shared colorant, thus with the reduction of the content of the ingredient other than colorant, it may occur however that manufacture filter When color device the problems such as adaptation decline, generation residue.
In this regard, Ebrean Registered Patent the 10-0875269th discloses a kind of colour filter photosensitive polymer combination and benefit With the colour filter of the photosensitive polymer combination, which is characterized in that above-mentioned photosensitive polymer combination includes alkali soluble resins, third Olefin(e) acid system photopolymerization monomer, Photoepolymerizationinitiater initiater, pigment and solvent, above-mentioned alkali soluble resins is represented by a) specified chemical formula The ethylene unsaturated monomer comprising more than one double bond, b) ethylene with more than one carboxyl is unsaturated single The copolymer of body and the ethylene unsaturated monomer that can c) be copolymerized with above-mentioned monomer b), it is residual so as to be made without Slag, excellent adhesion and the high-resolution colour filter being made of ultra micro small pixel are still manufactured using such composition When colour filter, it is poor to generate in process with being shaped as reverse slope form of pattern before subsequent heat treatment process (rear to dry) Wrong problem.
Existing technical literature
Patent document
Patent document 1: Ebrean Registered Patent the 10-0875269th (2018.12.15.)
Summary of the invention
Project to be solved
The present invention is proposed to solve the problems, such as described above, it is intended that providing a kind of in progress colour filter Before the rear baking process for belonging to high-temperature heat treatment in device manufacturing process can by the form for being shaped as positive bevel of pattern from Without lead to the problem of in process photosensitive composition, comprising the colour filter of the photosensitive composition And image display device.
The method to solve the problem
Photosensitive composition of the invention for achieving the above object is characterized in that, is drawn comprising photopolymerization It sends out agent (A), the Photoepolymerizationinitiater initiater that absorptivity when above-mentioned Photoepolymerizationinitiater initiater (A) includes 365nm wavelength is 0.1% or more (a1), above-mentioned Photoepolymerizationinitiater initiater (a1) is compound represented by following chemical formula 1 or chemical formula 2,
[chemical formula 1]
[chemical formula 2]
(in above-mentioned chemical formula 1 and chemical formula 2,
R1It is indicated each independently by following chemical formula 3,
R2For alkyl, molecular weight is each independently 50~150,
R3Be each independently substituted or non-substituted diphenylsulfide base, substituted or non-substituted carbazyl, replace or Non-substituted fluorenyl)
[chemical formula 3]
-R4-R5
(in above-mentioned chemical formula 3,
R4For the sub- aralkyl of the alkylidene of C1~C8, the arlydene of C6~C20 or C7~C25,
R5It is each independently CN, C1~C8 alkyl, the ring structure of C3~C8, the aryl of C6~C20 or C7~C25 Aralkyl).
In addition, colour filter of the invention is characterized in that, the solidfied material comprising above-mentioned photosensitive composition.
In addition, image display device of the invention is characterized in that, include above-mentioned colour filter.
Invention effect
Photosensitive composition of the invention has can before the rear baking process in colour filter manufacturing process By the shape for being shaped as positive bevel of pattern to do not lead to the problem of in manufacturing process the advantages of.
Colour filter of the invention has the advantages that identical as above advantages.
Image display device of the invention has the advantages that identical as above advantages.
Detailed description of the invention
FIG. 1 to FIG. 3 is by the figure of manufacturing process's diagramization of colour filter
Fig. 4 is the figure for showing the measuring method of the chamfer length for distinguishing positive bevel and reverse slope.
Symbol description
10: substrate
11: color layers
11R: multicolour pattern
20: photomask
30: light
Specific embodiment
It not only include a certain component and another structure when pointing out that a certain component is located at another component "upper" in the present invention The case where part contacts, also includes the case where there are other components between two components.
In the present invention, when pointing out a certain constituent element of certain a part of "comprising", as long as no especially opposite record, then It, which means, can further include other constituent elements, rather than other constituent elements are excluded.
Hereinafter, the present invention is described in more detail.
<photosensitive composition>
The photosensitive composition of a mode of the invention is characterized in that, includes Photoepolymerizationinitiater initiater (A), on The Photoepolymerizationinitiater initiater (a1) that absorptivity when Photoepolymerizationinitiater initiater (A) includes 365nm wavelength is 0.1% or more is stated, it is above-mentioned Photoepolymerizationinitiater initiater (a1) is compound represented by following chemical formula 1 or chemical formula 2, so as in colour filter manufacturing process In rear baking process before by the form for being shaped as positive bevel (taper) of pattern, thus have can prevent after The final products of baking form reverse slope and generate light leakage etc. bad, and can prevent from being formed by and generate hole (hole) in pattern Advantage.
[chemical formula 1]
[chemical formula 2]
(in above-mentioned chemical formula 1 and chemical formula 2,
R1It is indicated each independently by following chemical formula 3,
R2For alkyl, molecular weight is each independently 50~150,
R3Be each independently substituted or non-substituted diphenylsulfide base, substituted or non-substituted carbazyl, replace or Non-substituted fluorenyl)
[chemical formula 3]
-R4-R5
(in above-mentioned chemical formula 3,
R4For the sub- aralkyl of the alkylidene of C1~C8, the arlydene of C6~C20 or C7~C25,
R5It is each independently CN, C1~C8 alkyl, the ring structure of C3~C8, the aryl of C6~C20 or C7~C25 Aralkyl).
The alkyl of above-mentioned C1~C8 includes straight chain type or branched chain type, it may for example comprise methyl, ethyl, n-propyl, isopropyl, Normal-butyl, isobutyl group, tert-butyl, n-pentyl, n-hexyl or n-octyl etc..
The aryl of above-mentioned C6~C20 includes phenyl, xenyl, terphenyl, stilbene radicals, naphthalene, anthryl, phenanthryl or pyrenyl Deng.
The aralkyl of above-mentioned C7~C25 includes benzyl, phenethyl, 2- phenyl-propane -2- base, diphenyl methyl, triphenyl Methyl, styryl or cinnamyl etc..
Photoepolymerizationinitiater initiater (A)
The photosensitive composition of a mode of the invention is characterized in that, includes Photoepolymerizationinitiater initiater (A), on The Photoepolymerizationinitiater initiater (a1) that absorptivity when Photoepolymerizationinitiater initiater (A) includes 365nm wavelength is 0.1% or more is stated, it is above-mentioned Photoepolymerizationinitiater initiater (a1) is compound represented by following chemical formula 1 or chemical formula 2, so as in colour filter manufacturing process In rear baking process before by the form for being shaped as positive bevel (taper) of pattern, thus have can prevent manufacture work It goes wrong in sequence, and can prevent from being formed by the advantages of generating hole (hole) in pattern.
About above-mentioned Photoepolymerizationinitiater initiater (a1), the those skilled in the art with organic chemistry knowledge can pass through routine Method synthesis after use, or can also buy commercially available product come using.
The photosensitive composition of one embodiment of the present invention can further include above-mentioned photopolymerization and draw Send out the Photoepolymerizationinitiater initiater (a2) other than agent (a1).
At this point it is possible to the Photoepolymerizationinitiater initiater (a2) further included as long as can make the alkali soluble resins for including together and Above-mentioned photopolymerizable compound polymerization is just not particularly limited, for example, it can be cited for example that acetophenone system, benzoin system, hexichol Ketone system, thioxanthones system, triazine system, oxime system,Salt system, nitrobenzyl tosylat system or benzoin tosylate system Deng.As currently preferred acetophenone based compound, there are diethoxy acetophenone, 2- methyl -2- morpholino -1- (4- methyl Thio-phenyl) propane -1- ketone, 2- hydroxy-2-methyl -1- phenyl-propane -1- ketone, benzil dimethyl ketal, 2- hydroxyl -2- first Base -1- [4- (2- hydroxyl-oxethyl) phenyl] propane -1- ketone, 1- hydroxycyclohexylphenylketone, 2- hydroxy-2-methyl -1- [4- (1- methyl ethylene) phenyl] propane -1- ketone oligomer etc., more preferably 2- methyl -2- morpholino -1- (4- methyl thio Phenyl) propane -1- ketone.In addition it is also possible to which a variety of acetophenone based compounds and other Photoepolymerizationinitiater initiaters are applied in combination.As Photoepolymerizationinitiater initiater other than acetophenone based compound, the living radical that can be enumerated irradiation light and generate living radical produce Raw agent, sensitizer, acid agent etc..As above-mentioned living radical producing agent, benzoin based compound, benzophenone can be enumerated Based compound, thioxanthones based compound, triazine based compound or oxime compound etc..As benzoin based compound, for example, can To enumerate benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether etc..As two Benzophenone based compound, for example, benzophenone, methyl o-benzoylbenzoate, 4- phenyl benzophenone, 4- benzene first can be enumerated Acyl -4'- dimethyl diphenyl sulfide, 3,3', 4,4'- tetra- (tert-butyl hydroperoxide carbonyl) benzophenone, 2,4,6- trimethyl hexichol Ketone etc..As thioxanthones based compound, for example, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4- diethyl can be enumerated Base thioxanthones, bis- clopenthixal ketone of 2,4-, the chloro- 4- propoxythioxanthone of 1- etc..As triazine based compound, for example, can enumerate Bis- (trichloromethyl) -6- (4- the methoxyphenyl) -1,3,5- triazines of 2,4-, bis- (trichloromethyl) -6- (the 4- methoxynaphthalenes of 2,4- Base) -1,3,5- triazine, bis- (trichloromethyl) -6- (4- the methoxyl-styrene) -1,3,5- triazines of 2,4-, bis- (three chloromethanes of 2,4- Base) -6- [2- (5- methylfuran -2- base) ethylidene] -1,3,5- triazine, bis- (trichloromethyl) -6- [2- (furans -2- of 2,4- Base) ethylidene] -1,3,5- triazine, bis- (the trichloromethyl) -6- of 2,4- [2- (4- diethylamino -2- aminomethyl phenyl) ethylidene] - Bis- (the trichloromethyl) -6- of 1,3,5- triazine, 2,4- [2- (3,4- Dimethoxyphenyl) ethylidene] -1,3,5- triazine etc..As Oxime compound can enumerate 2- (o-benzoyl oxime) -1- [4- (thiophenyl) phenyl] -1,2- acetyl caproyl, 1- (4- sulfonyloxy methyl Base-phenyl)-butane -1,2- butane -2- oxime-O- acetic acid esters, 1- (4- methanesulfonyl-phenyl)-butane -1- ketoxime-O- acetic acid Ester, oxyimino-(4- methanesulfonyl-phenyl)-ethyl acetate-O- acetic acid esters, oxyimino-(4- methyl sulphonyl- Phenyl)-ethyl acetate-O- benzoic ether etc..As sensitizer, for example, 2,4,6- trimethylbenzoyl diphenyl can be enumerated Bis- (Chloro-O-Phenyl) -4,4', 5,5'- tetraphenyl-the 1,2'- bisglyoxalines of phosphine oxide, 2,2-, 10- butyl -2- chloro-acridine ketone, 2- second Base anthraquinone, benzil, 9,10- phenanthrenequione, camphorquinone, phenylglyoxalates methyl esters, titanocenes compound etc..As acid agent, for example, 4- hydroxy phenyl dimethyl disulfide can be enumeratedTosilate, 4- hydroxy phenyl dimethyl disulfideHexafluoro antimonate, 4- second Phenyl dimethyl disulfideTosilate, 4- acetoxyl group phenyl methyl dibenzylsulfideHexafluoro antimonate, triphenyl SulphurTosilate, triphenyl sulphurHexafluoro antimonate, diphenyl iodineTosilate, diphenyl iodineHexafluoro Stibate etc.Salt or nitrobenzyl tosylat class, benzoin tosylate class etc..In addition, in above compound, Also there is while generating the compound of living radical and acid.For example, above-mentioned triazine system Photoepolymerizationinitiater initiater is also used as producing acid Agent.
According to an embodiment of the present invention, the content of above-mentioned Photoepolymerizationinitiater initiater (a1) is relative to the photopolymerization comprising it Whole 100 parts by weight of initiator (A) can be 70~100 parts by weight, preferably can be to be more than 90 parts by weight.In above-mentioned photopolymerization In the case that the content of initiator (a1) is met the above range, have the advantages that preferably form positive bevel form.
According to an embodiment of the present invention, the content of above-mentioned Photoepolymerizationinitiater initiater (A) relative to comprising its color sensation Whole 100 parts by weight of solid component in photosensitive resin composition can be 0.1~30 parts by weight, preferably can be 0.5~20 Parts by weight.The content of above-mentioned Photoepolymerizationinitiater initiater (A) within the above range in the case where, have comprising its colored photosensitive Property resin combination high-sensitivity and shorten the time for exposure thereby increasing productivity, and the advantages of be able to maintain that high-resolution.
Photosensitive composition of the invention can also further include photopolymerization initiator.Above-mentioned photopolymerization Cause auxiliary agent to be applied in combination with Photoepolymerizationinitiater initiater (A) sometimes, can be used for promoting to be photopolymerized initiator (A) and cause polymerization The polymerization of photopolymerizable compound.As above-mentioned photopolymerization initiator, amine compound, alkoxy anthracene system chemical combination can be enumerated Object, thioxanthones based compound etc..As amine compound, for example, triethanolamine, methyl diethanolamine, three isopropyls can be enumerated Hydramine, 4- dimethylaminobenzoic acid methyl esters, ethyl 4-dimethylaminobenzoate, 4- dimethylaminobenzoic acid isopentyl ester, Benzoic acid 2- dimethylamino ethyl ester, 4- dimethylaminobenzoic acid 2- ethylhexyl, N, N- dimethyl-p-toluidine, 4,4'- Bis- (diethylamino) benzophenone of bis- (dimethylamino) benzophenone, 4,4'-, bis- (ethylmethylamino) hexichol of 4,4'- Ketone etc., wherein preferably bis- (diethylamino) benzophenone of 4,4'-.As alkoxy anthracene based compound, for example, can be with Enumerate 9,10- dimethoxy anthracene, 2- ethyl -9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2- ethyl -9,10- diethoxy Base anthracene etc..As thioxanthones based compound, for example, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4- diethyl can be enumerated Base thioxanthones, bis- clopenthixal ketone of 2,4-, the chloro- 4- propoxythioxanthone of 1- etc..Above-mentioned photopolymerization initiator can individually or It is used in combination of two or more.
In addition, commercially available product also can be used as above-mentioned photopolymerization initiator, cause as commercially available photopolymerization Auxiliary agent, for example, there is EAB-F (Baotugu Chemical Industrial Co., Ltd's product) etc..As coloring phototonus resin group of the invention The combination for closing preferred Photoepolymerizationinitiater initiater and photopolymerization initiator in object, it is bis- can to enumerate diethoxy acetophenone/4,4'- (diethylamino) benzophenone, 2- methyl -2- morpholino -1- (4- methylthiophenyi) propane -1- ketone/bis- (diethyls of 4,4'- Base amino) benzophenone, 2- hydroxy-2-methyl-bis- (diethylamino) benzophenone of phenyl-propane -1- ketone/4,4'-, 2- hydroxyl Base-2- methyl-1-[4- (2- hydroxyl-oxethyl) phenyl] bis- (diethylamino) benzophenone of propane-1- ketone/4,4'-, 1- hydroxyl Bis- (diethylamino) benzophenone of butylcyclohexyl phenyl ketone/4,4'-, 2- hydroxy-2-methyl -1- [4- (1- methyl ethylene) Phenyl] propane -1- ketone bis- (diethylamino) benzophenone of oligomer/4,4'-, 2- benzyl -2- dimethylamino -1- (4- Morphlinophenyl) bis- (diethylamino) benzophenone of butane -1- ketone/4,4'- combination etc., more preferably have 2- methyl -2- Quinoline generation -1- (4- methylthiophenyi) propane -1- ketone/4,4'- bis- (diethylamino) benzophenone combination.Such as it is above-mentioned that In the case that sample uses Photoepolymerizationinitiater initiater (A) and photopolymerization initiator simultaneously, photopolymerization initiator usage amount preferably with Every 1 mole of Photoepolymerizationinitiater initiater (A) is calculated as 10 moles hereinafter, more preferably 0.01~5 mole.
The photosensitive composition of one embodiment of the present invention is other than above-mentioned Photoepolymerizationinitiater initiater (A) It can also be comprising selected from one of the group being made of alkali soluble resins, photopolymerizable compound, colorant, solvent and additive More than.
Alkali soluble resins
As above-mentioned alkali soluble resins, it can be cited for example that carboxyl group-containing monomer and above-mentioned carboxyl group-containing monomer and can be with it The copolymer etc. of the other monomers of copolymerization.
As above-mentioned carboxyl group-containing monomer, it can be cited for example that unsaturated monocarboxylic or unsaturated dicarboxylic, unsaturated tricarboxylic Unsaturated carboxylic acids such as the unsaturated polybasic carboxylic acid in the molecules such as acid with more than one carboxyl etc..Here, as unsaturated single Carboxylic acid, it can be cited for example that acrylic acid, methacrylic acid, crotonic acid, α-chloroacrylic acid, cinnamic acid etc..As unsaturated dicarboxyl Acid, it can be cited for example that maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid etc..Unsaturated polybasic carboxylic acid may be acid Acid anhydride, specifically, maleic anhydride, itaconic anhydride, citraconic anhydride etc. can be enumerated.In addition, unsaturated polybasic carboxylic acid may be Its single (2- methacryloxyalkyl) ester, it can be cited for example that mono succinate (2- acryloyl-oxyethyl) ester, succinic acid Single (2- methacryloxyethyl) ester, phthalic acid list (2- acryloyl-oxyethyl) ester, phthalic acid list (2- first Base acryloyl-oxyethyl) ester etc..In addition, unsaturated polybasic carboxylic acid can also be the list (first of its two ends dicarboxyl based polyalcohol Base) acrylate, it can be cited for example that ω-carboxy-polycaprolactone mono acrylic ester, ω-carboxy-polycaprolactone monomethacrylate Ester etc..Above-mentioned carboxyl group-containing monomer can respectively individually or be use mixing two or more.
As the above-mentioned other monomers that can be copolymerized with carboxyl group-containing monomer, it is unsaturated that the double bond containing ethylene of packet can be enumerated Monomer, for example, styrene, α-methylstyrene, adjacent vinyltoluene, vinyltoluene, to vinyltoluene, to chlorobenzene second Alkene, o-methoxystyrene, meta-methoxy styrene, to methoxy styrene, adjacent vinyl benzyl methyl ether, vinyl benzyl Ylmethyl ether, to vinyl benzyl methyl ether, adjacent vinylbenzyl glycidyl base ether, vinylbenzyl glycidyl base Ether, to aromatic ethenyl compounds such as vinylbenzyl glycidyl base ether, indenes；Methyl acrylate, methyl methacrylate, Ethyl acrylate, ethyl methacrylate, n-propyl, n propyl methacrylate, isopropyl acrylate, metering system Isopropyl propionate, n-butyl acrylate, n-BMA, isobutyl acrylate, Isobutyl methacrylate, acrylic acid are secondary The secondary butyl ester of butyl ester, methacrylic acid, tert-butyl acrylate, Tert-butyl Methacrylate, acrylic acid 2- hydroxy methacrylate, metering system Sour 2- hydroxy methacrylate, acrylic acid 2- hydroxy propyl ester, methacrylic acid 2- hydroxy propyl ester, acrylic acid 3- hydroxy propyl ester, metering system Sour 3- hydroxy propyl ester, acrylic acid 2- hydroxybutyl, methacrylic acid 2- hydroxybutyl, acrylic acid 3- hydroxybutyl, metering system Sour 3- hydroxybutyl, acrylic acid 4- hydroxybutyl, methacrylic acid 4- hydroxybutyl, allyl acrylate, methacrylic acid alkene Propyl ester, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, methyl Phenyl acrylate, acrylic acid 2- methoxy acrylate, methacrylic acid 2- methoxy acrylate, acrylic acid 2- phenoxy ethyl, methyl Acrylic acid 2- phenoxy ethyl, methoxyl group diethylidene methacrylate, isobornyl acrylate, methacrylic acid isoborneol Ester, acrylic acid bicyclopentadiene ester, methacrylic acid bicyclopentadiene ester, acrylic acid 2- hydroxyl -3- phenoxy-propyl, methyl-prop The unsaturated carboxylate types such as olefin(e) acid 2- hydroxyl -3- phenoxy-propyl, glycerol mono-acrylate, glycerin monomethyl acrylic ester；Third Olefin(e) acid 2- amino ethyl ester, methacrylic acid 2- amino ethyl ester, acrylic acid 2- dimethylamino ethyl ester, methacrylic acid 2- dimethyl Amino ethyl ester, acrylic acid 2- amino propyl ester, methacrylic acid 2- amino propyl ester, acrylic acid 2- dimethylamino propyl ester, methyl-prop Olefin(e) acid 2- dimethylamino propyl ester, acrylic acid 3- amino propyl ester, methacrylic acid 3- amino propyl ester, acrylic acid 3- dimethylamino The unsaturated carboxylic acids aminoalkyl esters such as propyl ester, methacrylic acid 3- dimethylamino propyl ester；Glycidyl acrylate, methyl The unsaturated carboxylic acids glycidol esters such as glycidyl acrylate；Vinyl acetate, vinyl propionate, vinyl butyrate, benzene The generating vinyl carboxylates esters such as vinyl formate；The unsaturations such as vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether Ethers；The vinyl cyanides based compound such as acrylonitrile, methacrylonitrile, α-chloro-acrylonitrile, vinylidene cyanide；Acrylamide, first The unsaturations such as base acrylamide, α-chloroacrylamide, N-2- hydroxyethyl acrylamide, N-2- hydroxyethyl methacrylamide Amides；The unsaturated acyls imines such as maleimide, N-phenylmaleimide, N- N-cyclohexylmaleimide；1,3- fourth The aliphatic conjugated dienes class such as diene, isoprene, chlorobutadiene；Polystyrene, polymethyl acrylate, poly-methyl methacrylate Ester, polyacrylic acid N-butyl, Vinalac 5920, polysiloxanes the end of polymer molecular chain there is single acryloyl Base or the polymeric monomer class of monomethacrylate acyl group etc..These monomers can respectively individually or be use mixing two or more.
The content of carboxyl group-containing monomer unit in above-mentioned alkali soluble resins relative to the whole 100 weight % of alkali soluble resins, Typically 10~50 weight % in terms of mass fraction preferably can be 15~40 weight %, more preferably can be 25~40 Weight %.The content of carboxyl group-containing monomer unit within the above range in the case where, for the favorable solubility of developer solution, show Pattern can be properly formed when shadow.
As above-mentioned alkali soluble resins, it can be cited for example that (methyl) acrylic acid/(methyl) methyl acrylate copolymer, (methyl) acrylic acid/(methyl) benzyl acrylate copolymer, (methyl) acrylic acid/(methyl) acrylic acid 2- hydroxy methacrylate/(first Base) benzyl acrylate copolymer, (methyl) acrylic acid/(methyl) methyl acrylate/polystyrene macromer copolymer, (methyl) Acrylic acid/(methyl) methyl acrylate/poly- methyl (methyl) acrylate polymeric monomer copolymer, (methyl) acrylic acid/(methyl) Benzyl acrylate/polystyrene macromer copolymer, (methyl) acrylic acid/(methyl) benzyl acrylate/poly- methyl (methyl) third Olefin(e) acid ester polymeric monomer copolymer, (methyl) acrylic acid/(methyl) acrylic acid 2- hydroxy methacrylate/(methyl) benzyl acrylate/polyphenyl Ethylene polymeric monomer copolymer, (methyl) acrylic acid/(methyl) acrylic acid 2- hydroxy methacrylate/(methyl) benzyl acrylate/poly- (first Base) methyl acrylate polymeric monomer copolymer, (methyl) acrylic/styrene/(methyl) benzyl acrylate/N- benzyl maleimide Amine copolymer object, (methyl) acrylic acid/mono succinate (2- acryloxy)/styrene/(methyl) benzyl acrylate/N- phenyl horse Come imide copolymer, (methyl) acrylic acid/mono succinate (2- acryloyl-oxyethyl)/styrene/(methyl) acrylic acid alkene Propyl ester/N-phenylmaleimide copolymer, (methyl) acrylic acid/(methyl) benzyl acrylate/N-phenylmaleimide/benzene Ethylene/glycerol list (methyl) acrylate copolymer etc..
Wherein, (methyl) acrylic acid/(methyl) benzyl acrylate copolymer, (methyl) acrylic acid/(first preferably can be used Base) benzyl acrylate/styrol copolymer, (methyl) acrylic acid/(methyl) methyl acrylate copolymer, (methyl) acrylic acid/ (methyl) methyl acrylate/styrol copolymer.
In this specification, so-called (methyl) acrylate means acrylate and (or) methacrylate.
According to an embodiment of the present invention, the acid value of above-mentioned alkali soluble resins can be 20~200 (㎎ KOH/g).Such as Tartaric acid value is in above range, then dissolubility in developer solution improves, and non-exposed portion is easy dissolution and sensitivity increases, as a result on The pattern of exposure portion leaves in development and can improve membrane left rate (film remaining ratio).Here, so-called acid value It is the value that measures as the amount (mg) of required potassium hydroxide when neutralizing acrylic acid series polymeric compounds 1g, hydrogen-oxygen usually can be used Change aqueous solutions of potassium to be titrated to acquire.
In addition, according to an embodiment of the present invention, above-mentioned alkali soluble resins by gel permeation chromatography (GPC；By tetrahydro Furans is as eluting solvent) measurement polystyrene conversion weight average molecular weight (hreinafter referred to as " weight average molecular weight ") can be 3,000~200,000, preferably 5,000~100,000.If weight average molecular weight within the above range, can be improved firmly Degree, raising membrane left rate, and the dissolubility of the non-exposed portion in developer solution improve and resolution ratio can become good.
According to an embodiment of the present invention, the content of above-mentioned alkali soluble resins is relative to the coloring phototonus tree comprising it Whole 100 parts by weight of solid component in oil/fat composition can be 10~80 parts by weight, preferably can be 20~70 parts by weight.? The content of above-mentioned alkali soluble resins within the above range in the case where, be capable of forming pattern, and can be improved resolution ratio and stay Film rate.
Photopolymerizable compound
As long as above-mentioned photopolymerizable compound can be by the irradiation of light by the activity generated by Photoepolymerizationinitiater initiater The compound that free radical, acid etc. are polymerize just is not particularly limited in the present invention, can be with according to the number of functional groups Enumerate a function, two functions, multifunctional polymerizable compound more than trifunctional etc..
As the concrete example of above-mentioned function polymerizable compound, nonyl phenyl carbitol acrylate, third can be enumerated Olefin(e) acid 2- hydroxyl -3- phenoxy-propyl, 2- ethylhexyl carbitol acrylate, acrylic acid 2- hydroxy methacrylate, N- vinylpyridine Pyrrolidone etc..
As the concrete example of above-mentioned two functions polymerizable compound, can enumerate 1,6- hexylene glycol (methyl) acrylate, Ethylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, triethylene glycol two (methyl) acrylate, bis-phenol Bis- (acryloyl-oxyethyl) ethers of A, 3- methyl pentanediol two (methyl) acrylate, butanediol dimethylacrylate, oneself Glycol two (methyl) acrylate, diethylene glycol two (methyl) acrylate, triethylene glycol two (methyl) acrylate, tetrem two Alcohol two (methyl) acrylate, polyethylene glycol two (methyl) acrylate, dipropylene glycol diacrylate, two propylene of tripropylene glycol Acid esters, ethoxylated neopentyl, ethoxylated neopentylglycol diacrylate etc..
As the concrete example of multifunctional polymerizable compound more than above-mentioned trifunctional, trimethylolpropane tris can be enumerated (methyl) acrylate, pentaerythrite three (methyl) acrylate, ethoxylated trimethylolpropane three (methyl) acrylate, Propoxylation trimethylolpropane tris (methyl) acrylate, glycerol propoxylate triacrylate, three propylene of isocyanuric acid ester The trifunctionals polymerizable compound such as acid esters；Pentaerythrite four (methyl) acrylate, dihydroxy methylpropane four (methyl) acrylic acid The tetrafunctionals polymerizable compound such as ester；Dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate Deng five function polymerizable compounds etc..
Wherein, above-mentioned photopolymerizable compound can respectively individually or be use mixing two or more, specifically, can be with It is preferable to use multifunctional polymerizable compounds more than two functions, it is particularly possible to which it is preferable to use multifunctional polymerizations more than five functions Property compound, but not limited thereto.
According to an embodiment of the present invention, the content of above-mentioned photopolymerizable compound is relative to the colored photosensitive comprising it Property resin combination in whole 100 parts by weight of solid component can be 5~50 parts by weight, preferably can be 7~45 parts by weight. In the case where the content of above-mentioned photopolymerizable compound is in above range, intensity or flatness with pixel portion become good Advantage.
Colorant
Above-mentioned colorant is as the composition that can carry out diversified application according to the purposes of colour filter, the present invention In, its type is not particularly limited.
Above-mentioned colorant can be any one of pigment, dyestuff or natural pigment, and as above-mentioned pigment, color can be used Pigment is classified as in index (dyeing association, family (The Society of Dyers and Colourists) is published) (Pigment) compound.It, can be preferred from the aspect of heat resistance and excellent color reproducing performance as colorant of the invention For organic pigment.
As the concrete example for the preferred pigments that can be used in the present invention, can enumerate:
C.I. pigment yellow 1, C.I. pigment yellow 3, C.I. pigment Yellow 12, C.I. pigment yellow 13, C.I. pigment Yellow 14, C.I. face Expect yellow 15, C.I. pigment yellow 16, C.I. pigment yellow 17, C.I. pigment yellow 20, C.I. pigment yellow 24, C.I. pigment yellow 31, C.I. Pigment yellow 53, C.I. pigment yellow 83, C.I. pigment yellow 86, C.I. pigment yellow 93, C.I. pigment yellow 94, C.I. pigment yellow 109, C.I. pigment yellow 110, C.I. pigment yellow 117, C.I. pigment Yellow 12 5, C.I. pigment Yellow 12 8, C.I. pigment yellow 13 7, C.I. face Expect yellow 138, C.I. pigment yellow 13 9, C.I. pigment yellow 147, C.I. pigment Yellow 14 8, C.I. pigment yellow 150, C.I. pigment yellow 153, the Huangs such as C.I. pigment yellow 154, C.I. pigment yellow 166, C.I. pigment yellow 17 3, C.I. pigment yellow 194, C.I. pigment yellow 214 Color pigment；
C.I. pigment orange 13, C.I. pigment orange 31, C.I. pigment orange 38, C.I. pigment orange 40, C.I. pigment orange 42, C.I. Pigment orange 43, C.I. pigment orange 51, C.I. pigment orange 55, C.I. pigment orange 59, C.I. pigment orange 61, C.I. pigment orange 64, C.I. the orange pigments such as pigment orange 65, C.I. pigment orange 71, C.I. pigment orange 73；
C.I. Pigment Red 9, C.I. Pigment Red 97, C.I. paratonere 105, C.I. pigment red 122, C.I. pigment red 123, C.I. paratonere 144, C.I. pigment red 149, C.I. paratonere 166, C.I. paratonere 168, C.I. paratonere 176, C.I. face Expect red 177, C.I. paratonere 180, C.I. paratonere 192, C.I. paratonere 209, C.I. pigment red 21 5, C.I. paratonere 216, C.I. paratonere 224, C.I. paratonere 242, C.I. paratonere 254, C.I. paratonere 264, C.I. paratonere 265 etc. are red Color pigment；
C.I. pigment blue 15, C.I. pigment blue 15: 3, C.I. pigment blue 15: 4, C.I. pigment blue 15: 6, C.I. pigment blue 60 equal blue pigments；
C.I. pigment violet 1, C.I. pigment violet 19, C.I. pigment Violet 23, C.I. pigment violet 29, C.I. pigment violet 32, C.I. The violet pigments such as pigment violet 36, C.I. pigment violet 38；
C.I. the viridine greens such as pigment Green 7, C.I. pigment green 36, C.I. naphthol green 58；
C.I. the browns such as pigment brown 23, C.I. pigment brown 25；
C.I. black pigments such as pigment black 1, C.I. pigment black 7 etc..
Wherein it is possible to preferably comprise selected from C.I. pigment yellow 13 8, C.I. pigment yellow 13 9, C.I. pigment yellow 150, C.I. face Expect red 177, C.I. paratonere 209, C.I. paratonere 254, C.I. pigment Violet 23, C.I. pigment blue 15: 6 and C.I. pigment green 36 One or more of pigment.
Above-mentioned organic pigment and inorganic pigment can respectively be used alone, and can also be use mixing two or more.Example Such as, when forming red pixel, contain containing C.I. paratonere 254 and C.I. pigment yellow 13 9 when forming green pixel C.I. naphthol green 58, C.I. pigment yellow 150 or C.I. pigment yellow 13 8 contain C.I. pigment blue 15 when forming blue pixel: 6, it is preferably that but not limited thereto for improving color reproduction power.
As long as above-mentioned dyestuff, which has, unlimitedly uses more than one for the dissolubility of organic solvent.It is preferred that making With both with dissolubility and heat resistance, the solvent resistance that can also ensure that for the dissolubility of organic solvent for alkaline developer Etc. reliabilities dyestuff.As above-mentioned dyestuff, can be used acid dyes selected from the acidic-group with sulfonic acid or carboxylic acid etc., The salt of acid dyes and nitrogenous compound, the sulfonamide body etc. of acid dyes and the dyestuff in their derivative, except this with Outside, the acid dyes and their derivative of azo system, xanthenes system, phthalocyanine system also be can choose.It, can be with as above-mentioned dyestuff It enumerates in colour index (dyeing association, family (The Society of Dyers and Colourists) is published) and is classified as dyestuff The well known dyestuff recorded in compound, or dyeing handbook (Se Ran society).
As the concrete example of above-mentioned dyestuff, for C.I. solvent dye, can enumerate:
C.I. the welds such as solvent yellow 4,14,15,21,23,24,38,62,63,68,82,94,98,99,162；
C.I. the orchils such as solvent red 8,45,49,122,125,130；
C.I. the oranges such as solvent orange 2,7,11,15,26,45,56,62；
C.I. the blue dyes such as solvent blue 35,37,45,59,67；
C.I. green green dyes such as 1,3,4,5,7,28,29,32,33,34,35 of solvent etc..
In addition, can be enumerated for C.I. acid dyes:
C.I. Indian yellow 1,3,7,9,11,17,23,25,29,34,36,38,40,42,54,65,72,73,76,79,98, 99、111、112、113、114、116、119、123、128、134、135、138、139、140、144、150、155、157、160、 161、163、168、169、172、177、178、179、184、190、193、196、197、199、202、203、204、205、207、 212, the welds such as 214,220,221,228,230,232,235,238,240,242,243,251；
C.I. azogeramine, 4,8,14,17,18,26,27,29,31,34,35,37,42,44,50,51,52,57,66, 73、80、87、88、91、92、94、97、103、111、114、129、133、134、138、143、145、150、151、158、176、 182、183、198、206、211、215、216、217、227、228、249、252、257、258、260、261、266、268、270、 274、277、280、281、195、308、312、315、316、339、341、345、346、349、382、383、394、401、412、 417, the orchils such as 418,422,426；
C.I. acid orange 6,7,8,10,12,26,50,51,52,56,62,63,64,74,75,94,95,107,108, 169, the oranges such as 173；
C.I. Blue VRS, 7,9,15,18,23,25,27,29,40,42,45,51,62,70,74,80,83,86,87, 90、92、96、103、112、113、120、129、138、147、150、158、171、182、192、210、242、243、256、259、 267,278,280,285,290,296, the 315, blue dyes such as 324:1,335,340；
C.I. the cudbears such as acid violet 6B, 7,9,17,19；
C.I. the green dyes such as acid green 1,3,5,9,16,25,27,50,58,63,65,80,104,105,106,109 Deng.
In addition, can be enumerated for C.I. direct dyes:
C.I. directly Huang 2,33,34,35,38,39,43,47,50,54,58,68,69,70,71,86,93,94,95,98, 102, the welds such as 108,109,129,136,138,141；
C.I. directly red 79,82,83,84,91,92,96,97,98,99,105,106,107,172,173,176,177, 179,181,182,184,204,207,211,213,218,220,221,222,232,233,234,241,243,246,250 etc. Orchil；
C.I. direct orange 34,39,41,46,50,52,56,57,61,64,65,68,70,96,97,106,107 etc. is orange Dyestuff；
C.I. directly indigo plant 38,44,57,70,77,80,81,84,85,86,90,93,94,95,97,98,99,100,101, 106、107、108、109、113、114、115、117、119、137、149、150、153、155、156、158、159、160、161、 162、163、164、166、167、170、171、172、173、188、189、190、192、193、194、196、198、199、200、 207、209、210、212、213、214、222、228、229、237、238、242、243、244、245、247、248、250、251、 252, the blue dyes such as 256,257,259,260,268,274,275,293；
C.I. direct purple 47,52,54,59,60,65,66,79,80,81,82,84,89,90,93,95,96,103,104 Equal cudbears；
C.I. the green dyes such as direct green 25,27,31,32,34,37,63,65,66,67,68,69,72,77,79,82 Deng.
In addition, can be enumerated for C.I. mordant dyes:
C.I. the welds such as medium Huang 5,8,10,16,20,26,30,31,33,42,43,45,56,61,62,65；
C.I. medium red 1,2,3,4,9,11,12,14,17,18,19,22,23,24,25,26,30,32,33,36,37, 38, the orchils such as 39,41,43,45,46,48,53,56,63,71,74,85,86,88,90,94,95；
C.I. medium orange 3,4,5,8,12,13,14,20,21,23,24,28,29,32,34,35,36,37,42,43,47, 48 equal oranges；
C.I. medium indigo plant 1,2,3,7,8,9,12,13,15,16,19,20,21,22,23,24,26,30,31,32,39, 40, the blue dyes such as 41,43,44,48,49,53,61,74,77,83,84；
C.I. the purples such as medium purple 1,2,4,5,7,14,22,24,30,31,32,37,40,41,44,45,47,48,53,58 Color dyestuff；
C.I. green green dyes such as 1,3,4,5,10,15,19,26,29,33,34,35,41,43,53 of medium etc..
The content of above-mentioned colorant is relative to the solid component whole 100 in the photosensitive composition comprising it Parts by weight can be 10~70 parts by weight, preferably can be 20~60 parts by weight.Above-mentioned model is in the content of above-mentioned colorant In the case where in enclosing, colour saturation when colour filter is made is abundant, is capable of forming the sufficient pattern of mechanical strength.
In the present invention, the solid component of so-called coloring photosensitive combination means the total of the ingredient after removal solvent With.
Following processing can be implemented in organic pigment in above-mentioned pigment as needed: using having imported acidic-group or alkalinity The surface treatment of the pigment derivative of group etc.；It is handled using the grafting of the surface of pigments of polymer compound etc.；Utilize sulfuric acid The micronized of micronized method (refinement) etc. is handled；The washup of organic solvent or water etc. is utilized in order to remove impurity Reason；Or the removal processing etc. using the ion-exchange of ionic impurity etc..Colorant preferable particle size is uniform.It is face in colorant In the case where material, implements decentralized processing by adding pigment dispersing agent, pigment evenly dispersed shape in the solution can be obtained The dispersible pigment dispersion of state.
Above-mentioned pigment is preferably used in the form of the dispersible pigment dispersion of its uniform particle sizes dispersion.As for making the grain of pigment An example of the evenly dispersed method of diameter can enumerate the method etc. for carrying out decentralized processing by adding pigment dispersing agent, according to This method can obtain the dispersible pigment dispersion of pigment evenly dispersed state in the solution.
As the concrete example of above-mentioned pigment dispersing agent, can enumerate cationic system, anionic system, nonionic system, both sexes system, The surfactant etc. of Polyester, polyamine system etc., they can respectively individually or be used in combination of two or more.
Above-mentioned pigment dispersing agent is added in order to which the solution of pigment is solidifying and maintains stability, this can be unlimitedly used The usually used pigment dispersing agent in field.It is preferred that can be used comprising BMA (butyl methacrylate) or DMAEMA (metering system Sour N, N- dimethylamino ethyl ester) acrylic ester dispersing agent (hereinafter referred to as dispersant containing acrylic).At this point, above-mentioned third Olefin(e) acid system dispersing agent can be preferably using being controlled as referred in KR published patent 2004-0014311 by activity The dispersing agent of method manufacture processed can as the commercially available product of the acrylic ester dispersing agent by above-mentioned active control method manufacture To enumerate DISPER BYK-2000, DISPER BYK-2001, DISPER BYK-2070, DISPER BYK-2150 etc., but not It is defined in this, they can respectively individually or be used in combination of two or more.
The pigment dispersing agent of other resin types other than above-mentioned dispersant containing acrylic also can be used in above-mentioned dispersing agent. As the pigment dispersing agent of other above-mentioned resin types, can enumerate well known resin-bonded pigment dispersing agent, especially polyurethane, with Polyacrylate is the ammonium of the polycarboxylate of representative, unsaturation polyamide, polycarboxylic acids, (part) amine salt of polycarboxylic acids, polycarboxylic acids Salt, the alkylamine salt of polycarboxylic acids, polysiloxanes, long-chain polyaminoamide phosphate, the ester of hydroxyl polycarboxylic acids and changing for they Property product or there is freely reacting for the polyester and poly- (low-grade alkylidene imines) of (free) carboxyl and the amide formed or it Salt as oil dispersing agent；(methyl) acrylic-styrene copolymer, (methyl) acrylic acid-(methyl) acrylate Water-soluble resin as copolymer, styrene-maleic acid copolymer, polyvinyl alcohol or polyvinylpyrrolidone or water-soluble poly Chelate compound；Polyester；Modified polyacrylate；The addition product of ethylene oxide/propylene oxide and phosphate etc..As upper The commercially available product for stating resin type dispersing agent, for cationic system pitch dispersant, it can be cited for example that BYK (Bi Ke) chemistry is public The trade name of department: DISPER BYK-160, DISPER BYK-161, DISPER BYK-162, DISPER BYK-163, DISPER BYK-164,DISPER BYK-166,DISPER BYK-171,DISPER BYK-182,DISPER BYK-184；BASF (Bath Husband) company trade name: EFKA-44, EFKA-46, EFKA-47, EFKA-48, EFKA-4010, EFKA-4050, EFKA- 4055、EFKA-4020、EFKA-4015、EFKA-4060、EFKA-4300、EFKA-4330、EFKA-4400、EFKA-4406、 EFKA-4510,EFKA-4800；The trade name of Lubrizol (Lu Borun) company: SOLSPERS-24000, SOLSPERS- 32550,NBZ-4204/10；Grind the trade name for the company of refining: HINOACT T-6000, HINOACT T-7000, HINOACT in river T-8000；The trade name of aginomoto company: AJISPUR PB-821, AJISPUR PB-822, AJISPUR PB-823；Common prosperity society The trade name of chemical company: FLORENE DOPA-17HF, FLORENE DOPA-15BHF, FLORENE DOPA-33, FLORENE DOPA-44 etc..The pigment dispersing agent of other resin types other than above-mentioned dispersant containing acrylic can be respectively individually or by two Kind combination of the above uses, and can also be used in combination with dispersant containing acrylic.
In the case where above-mentioned photosensitive composition further includes pigment dispersing agent, content to wrap together The every 1 parts by weight meter of the colorant contained can be 1 parts by weight hereinafter, more preferably can be 0.05 parts by weight or more, 0.5 parts by weight with Under.If the usage amount of above-mentioned pigment dispersing agent is within the above range, the pigment of evenly dispersed state can be obtained.
Solvent
As long as solvent of the invention is when dispersing or dissolving other constituents for including together effectively without spy Not Xian Zhi ground use it is preferable to use such as ethers, aromatic hydrocarbon, ketone, alcohols, esters or amides etc..
As above-mentioned ethers, for example, tetrahydrofuran, oxinane, Isosorbide-5-Nitrae-two can be enumeratedAlkane, ethylene glycol monomethyl Ether, ethylene glycol monomethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol list second Base ether, diethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethyl Glycol dibutyl, methyl proxitol, propylene glycol monomethyl ether, propylene glycol monoethyl acetic acid esters, propylene glycol list Propyl ether acetic acid esters, methylcellosolve acetate, ethyl cellosolve acetate, ethylcarbitol acetate, butyl carbitol second Acid esters, methyl proxitol acetate, methoxybutyl acetic acid esters, methoxypentyl acetic acid esters, methyl phenyl ethers anisole, phenetole or methyl Methyl phenyl ethers anisole etc..
As above-mentioned aromatic hydrocarbon, for example, benzene,toluene,xylene or mesitylene etc. can be enumerated.
As above-mentioned ketone, for example, acetone, 2- butanone, 2-HEPTANONE, 3- heptanone, 4- heptanone, 4- methyl -2- can be enumerated Pentanone, cyclopentanone or cyclohexanone etc..
As above-mentioned alcohols, for example, methanol, ethyl alcohol, propyl alcohol, butanol, hexanol, cyclohexanol, ethylene glycol or sweet can be enumerated Oil etc..
As above-mentioned esters, for example, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, second can be enumerated Isoamyl valerate, isobutyl acetate, butyl propionate, isopropyl isobutyrate, ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, Ethyl lactate, fluoroacetic acid methyl esters, fluoroacetic acid ethyl ester, fluoroacetic acid butyl ester, methoxy menthyl acetate, ethyl methoxyacetate, methoxy Guanidine-acetic acid butyl ester, ethoxy acetate, ethoxy ethyl acetate, 3- oxygen methyl propionate, 3- oxygen ethyl propionate, 3- methoxy propyl Sour methyl esters, 3- methoxypropionate, 3- ethoxypropanoate, 3- ethoxyl ethyl propionate, 2- oxygen methyl propionate, 2- oxygen third Acetoacetic ester, 2- oxygen propyl propionate, 2- methoxy methyl propionate, 2- methoxypropionate, 2- methoxy propyl propyl propionate, 2- ethoxy Base methyl propionate, 2- ethoxyl ethyl propionate, 2- oxygen -2 Methylpropionic acid methyl esters, 2- oxygen -2 Methylpropionic acid ethyl ester, 2- methoxyl group - 2 Methylpropionic acid methyl esters, 2- ethyoxyl -2 Methylpropionic acid ethyl ester, methyl pyruvate, ethyl pyruvate, Propyl pyruvate, acetyl Methyl acetate, ethyl acetoacetate, 2- oxy butyrate methyl esters, 2- oxy butyrate ethyl ester, 3- methoxybutyl acetic acid esters, 3- methyl -3- Methoxybutyl acetic acid esters or gamma-butyrolacton etc..
As above-mentioned amides, for example, n,N-Dimethylformamide or n,N-dimethylacetamide etc. can be enumerated.
As other solvents, for example, N-Methyl pyrrolidone or dimethyl sulfoxide etc. can be enumerated.
Above-mentioned solvent can respectively individually or be use mixing two or more, wherein 3- ethyoxyl preferably can be used Ethyl propionate, propylene glycol monomethyl ether or methyl proxitol, the content of above-mentioned solvent relative to comprising its Whole 100 parts by weight of color sensation photosensitive resin composition can be 10~90 parts by weight.If the content of solvent is in above range, Flatness is good when then having coating photosensitive composition, and colour saturation sufficiently display characteristic when formation colour filter Good advantage can be become.
Additive
Above-mentioned photosensitive composition can also include defoaming agent, table other than above-mentioned ingredient as needed The additives such as face activating agent, thermal cross-linking agent, tackifier, antioxidant are to improve performance.
Above-mentioned surfactant is the ingredient that can be improved the adaptation of substrate and photosensitive composition, example Such as, fluorine-containing surfactant, nonionic surfactant, cationic surfactant, anionic surfactant can be used With the various surfactants of organic silicon surfactant etc.They can be used in mixed way alone or in any combination.
As the concrete example of fluorine-containing surfactant, can enumerate MAGAFAC F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780 and F781 (trade name, DIC corporation Product)；FLUORAD FC430, FC431 and FC171 (trade name, Sumitomo 3M Co., Ltd product)；SURFLON S-382,SC- 101, (trade name, Asahi Glass glass have by SC-103, SC-104, SC-105, SC1068, SC-381, SC-383, S393 and KH-40 Limit company product)；SOLSPERSE 20000 (trade name, Co., Ltd, Lu Borun Japan product) etc..
As the concrete example of nonionic surfactant, glycerol, trimethylolpropane and trimethylolethane can be enumerated And their ethoxylate or propoxylate (for example, propoxylated glycerol or ethoxylated glycerol)；PLURONIC L10, L31, L61, L62,10R5,17R2 and 25R2 and TETRONIC 304,701,704,901,904 and 150R1 (commodity Name, BASF product) etc polyoxyethylene lauryl ether, polyoxyethylene stearyl base ether, polyoxyethylene oleyl ether, polyoxyethylene Octyl phenyl ether, ethylene nonyl phenyl ether, polyethylene glycol dilaurate, polyglycol distearate, Sorbitan Alcohol fatty acid ester etc..
As the concrete example of cationic surfactant, EFKA-745 (trade name, Sen Xia Co., Ltd system can be enumerated Product) etc phthalocyanine modified compound, the organosiloxane of KP341 (trade name, Chemical Co., Ltd., SHIN-ETSU HANTOTAI product) etc it is poly- Close object；(methyl) third of POLYFLOW No.75, No.90, No.95 (trade name, Chemical Co., Ltd., common prosperity society product) etc Olefin(e) acid system (co) polymer, W001 (trade name, Yu Shang Co., Ltd product) etc..
As the concrete example of anionic surfactant, W004, W005, W017 (trade name, the abundant limited public affairs of quotient can be enumerated Take charge of product) etc..
As the concrete example of organic silicon surfactant, can enumerate TORAY SILICONE DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA and SH8400 (trade name, DOW CORNING Dong Li Co., Ltd product), TSF-4440,4300,4445,4460 and 4452 (trade name, Mai Tu high performance material Co., Ltd product), KP341, KF6001 With KF6002 (trade name, Chemical Co., Ltd., SHIN-ETSU HANTOTAI product), BYK307,323 and 330 (trade name, Bi Ke chemicals) etc..
Above-mentioned thermal cross-linking agent can make when forming film by photosensitive composition through UV irradiation and heat The cross-linking reaction of reason successfully occurs, and is the ingredient that can be improved heat resistance.For example, polyacrylate resin, ring can be enumerated Oxygen resin, phenolic resin, melamine resin, organic acid, amine compounds, anhydrous compound etc..
Above-mentioned tackifier have the inorganic matter that can be improved and can become substrate, for example, the silicon such as silicon, silica, silicon nitride Compound, the adaptation of the metals such as gold, copper, aluminium, and the advantages of can be improved the ability of cone angle of adjusting and substrate.For example, can To enumerate silane coupling agent or mercaptan based compound, silane coupling agent preferably can be used.
The type of above-mentioned silane coupling agent is not particularly limited, and as concrete example, can enumerate gamma-amino propyl trimethoxy Base silane, γ aminopropyltriethoxy silane, γ-glycidoxypropyl group trialkoxy silane, γ-glycidoxy third Base alkyl-dialkoxysilanes, γ-methacryloxypropyl trialkoxy silane, γ-methacryloxypropyl alkane Base dialkoxy silicane, γ-chloropropyl trialkoxy silane, γ-mercaptopropyi trialkoxy silane, β-(3,4- epoxy hexamethylene Base) ethyltrialkoxysilanes, vinyl trialkyl oxysilane etc., preferably γ-glycidoxypropyl group trialkoxy silane Or γ-methacryloxypropyl trialkoxy silane, more preferably γ-glycidoxypropyl group trialkoxy silane.It Can be used in mixed way alone or in any combination.
As the example of above-mentioned antioxidant, 2-TBP, 2,6- DI-tert-butylphenol compounds, 2,4- can be generally enumerated DI-tert-butylphenol compounds, 2- sec-butyl phenol, 2,6- di sec-butylphenol, 2,4- di sec-butylphenol, 2- isopropyl-phenol, 2,6- Diisopropyl phenol, 2,4- diisopropyl phenol, 2- tert-octyl phenol, bis- tert-octyl phenol of 2,6-, bis- tert-octyl phenol of 2,4-, 2- cyclopentylphenol, 2,6- bicyclopentyl phenol, 2,4- bicyclopentyl phenol, 2- t-butyl-p-cresol, bis- tert-amyl benzene of 2,6- Phenol, 2,4- di-tert-pentyl phenol, 6- tert-butyl o-cresol, the tertiary dodecyl phenol of 2,6- bis-, the tertiary detergent alkylate of 2,4- bis- Phenol, 2- sec-butyl-paracresol, bis- tert-octyl phenol of 2,6-, bis- tert-octyl phenol of 2,4-, 6- sec-butyl-o-cresol, 2- are tertiary pungent Tertiary dodecyl-the paracresol of base-paracresol, 2-, 2- tert-butyl -6- isopropyl-phenol, 6- t-octyl-o-cresol, uncle 6- 12 Alkyl-o-cresol, 4,4' butylidene biss (3 methy 6 tert butyl phenol), octadecyl -3- (3,5- di-t-butyl -4- hydroxyl Base phenyl) propionic ester, 4,4' butylidene biss (6- tetra--butyl -3- methylphenol), thio-bis- (the 3- methyl-6-tert-butyl of 4,4'- Base phenol), triethylene glycol-bis- [3- (3- tert-butyl -5- methyl -4- hydroxy phenyl) propionic esters], 1,6-HD-it is bis- [3- (3, 5- di-tert-butyl-hydroxy phenyl) propionic ester], pentaerythrite-four [3- (3,5- di-tert-butyl-hydroxy phenyl) propionic ester], 1,3,5- trimethyl -2,4,6- three (3,5- di-tert-butyl-4-hydroxyl benzyl) benzene, 2,6- di-t-butyl -4- ethyl -phenol, 2, 2'- di-2-ethylhexylphosphine oxide (4- methyl-6-tert-butylphenol), 1,1,3- tri- (2- methyl -4- hydroxyl -5- tert-butyl-phenyl) butane, 1, 3,5- tri- (4- hydroxybenzyl) benzene and four [methylene -3- (3,5'- di-t-butyl -4'- hydroxy-phenylpropionic acid ester)] methane etc., it One or more can be used.
The manufacturing method of photosensitive composition of the invention can be unlimitedly usually used using this field Method, for example, can manufacture by the following method.Colorant is mixed with solvent in advance and is dispersed to using ball mill etc. The average grain diameter of coloured material reaches 0.2 μm or less degree.At this point, pigment dispersing agent can be used as needed, in addition, sometimes Also it can cooperate part or all of alkali soluble resins.To reach in obtained dispersion liquid (hereinafter, otherwise referred to as mill base) The mode of scheduled concentration further adds remaining alkali soluble resins, photopolymerizable compound and Photoepolymerizationinitiater initiater, addition Agent, other ingredients used as needed, the solvent added as needed is simultaneously mixed, so as to obtain target coloration Photosensitive polymer combination.
<colour filter>
The colour filter of other modes of the invention includes the solidfied material of above-mentioned photosensitive composition, to have The shape of pattern can be manufactured before the post-baking step in manufacturing process into the form of positive bevel to prevent manufacture work by having The advantages of hole (hole) is generated when leading to the problem of in sequence, and can prevent from being formed pattern in pattern.
Colour filter of the invention can be manufactured unlimitedly using manufacturing method commonly used in the art, as one Example, is referred to FIG. 1 to FIG. 3 to be illustrated, specific as follows.
In order to manufacture colour filter using photosensitive composition of the invention, colored pattern is needed to form, is This, carries out pattern processing for above-mentioned photosensitive composition.Specifically, referring to Fig.1, make by color sensation of the invention The color layers 11 that photosensitive resin composition is formed are formed in 10 top of substrate.At this point, the type of aforesaid substrate 10 does not limit especially It is fixed, it can be colour filter itself substrate, or position locating for colour filter in display device etc..Aforesaid substrate 10 can be The modeling such as glass plate, silicon wafer and polyether sulfone (Poly Ether Sulfone, PES), polycarbonate (Poly Carbonate, PC) Flitch etc..It that is, aforesaid substrate 10 can be silicon (Si), Si oxide (SiOx) or glass substrate, or can be polymer-based Plate.In this way, in order to be formed in the color layers being made of photosensitive composition 11 on substrate 10, such as will be by solvent Diluted photosensitive composition passes through spin coating, slit spin coating, slit coating, roller coating, spraying, ink-jet mode etc. Coating method is coated on substrate, and the volatile components such as solvent is then made to volatilize.It is formed as a result, by coloring phototonus resin combination The color layers 11 that object is constituted, above-mentioned color layers 11 are made of the solid component of photosensitive composition, are practically free of Volatile component.The application conditions such as viscosity, the concentration of solid component, coating speed of the thickness of film surface according to composition come true It is fixed, using composition of the invention, the color layers 11 of 0.5~5 μm of available thickness.
Then, referring to Fig. 2, the color layers formed on substrate 10 by photosensitive composition 11 is made to be exposed to light 30 (exposures).In order to expose, for example, by above-mentioned color layers 11 by photomask 20 with predetermined pattern irradiation light 30.At this point, conduct Light 30, usually using the g line (wavelength: 436nm), h line, i line (wavelength: 365nm) etc. of ultraviolet light.Light 30 is according to photomask 20 Pattern passes through.Above-mentioned photomask 20 provides the light shield layer to shut out the light in a predetermined pattern on the surface of glass plate.30 meeting of light It is blocked by light shield layer.The part for not providing the glass plate of the light shield layer is the transmittance section of transmitted light.According to such light transmission The pattern in portion exposes above-mentioned color layers 11.The exposure of light 30 is carried out according to used photosensitive composition Appropriate selection.
Part through the irradiation of above-mentioned light 30 solubility compared with not by part that light 30 irradiates significantly becomes smaller, the two it is molten Solution degree very different, therefore development operation is carried out using such difference.In order to develop, for example, make after exposure color sensation Photosensitive resin composition layer is impregnated in developer.As developer, alkali cpd, such as sodium carbonate, sodium hydroxide, hydrogen-oxygen are used Change the aqueous solution of potassium, potassium carbonate, tetramethylammonium hydroxide etc..Referring to Fig. 3, development in this way be will be formed on substrate 10 Color layers 11 in 30 non-irradiated regions of light do not irradiated by light 30 remove.In contrast, the light 30 irradiated through light 30 irradiates Region remains and constitutes colored pattern 11R.After development, above-mentioned layer and drying are usually washed with water, obtains scheduled colored pattern 11R.In addition, heat treatment also can be implemented after dry.Colored pattern 11R that is heat-treated and being formed is cured, thus Improve mechanical strength.In this way, due to the mechanical strength that can improve colored pattern 11R by heat treatment, it is preferable to use Coloring photosensitive combination containing curing agent.Heating temperature is usually 180 DEG C or more, and preferably 200~250 DEG C.
<image display device>
The image display device of another mode of the invention includes above-mentioned colour filter, is not sent out in manufacturing process to have Raw problem and bad generate few advantage.Above-mentioned image display device can specifically enumerate liquid crystal display (liquid crystal display device； LCD), organic el display (organic EL display device), liquid crystal projection apparatus, display device for game computer, portable phone etc. are portable Display devices such as terminal display device, digital camera display device, automobile navigation display device etc. are especially suitable for colour Display device.
Above-mentioned image display device may include the light emitting device such as light source or the like, light guide plate, comprising filter of the invention Other compositions that usual image display device as liquid crystal display part of color device etc. may include, the present invention do not limit this.
Hereinafter, providing preferred embodiment in order to help understanding of the invention, showing for a person skilled in the art And be clear to, following embodiments are only to illustrate the present invention, can be carried out within the scope of scope of the invention and technical idea Various changes and modification, certainly such change and modification also belong to the range of appended claims.Reality below It applies in example and comparative example, as long as without specifically mentioned, then it represents that " % " and " part " of content is weight basis.
Embodiment and comparative example
Such constitute of table 1 is mixed with content to manufacture photosensitive composition as follows.
[table 1]
[chemical formula 4]
[chemical formula 5]
[chemical formula 6]
[chemical formula 7]
[chemical formula 8]
[chemical formula 9]
The absorptivity of 1. Photoepolymerizationinitiater initiater of experimental example and the molecular weight determination of R2
By each Photoepolymerizationinitiater initiater used in above-described embodiment and comparative example in propylene glycol monomethyl ether Be diluted according to 0.001wt%, using UV-Vis spectrometer (UV-VIS Spectrophotometer, model name: UV-2550, manufacturing company: Shimadzu (SHIMADZU)) measurement 365nm wavelength when absorptivity, and record the result in following table 2 In, while calculating and recording the R for chemical formula 1 or 2 of the invention in each Photoepolymerizationinitiater initiater2Point of corresponding part Son amount.
[table 2]
A-1 A-2 A-3 A-4 A-5 A-6 A-7 A-8
R2Molecular weight 78.1 120.2 98.2 58.1 16.0 178.2 16.0 16.0
Absorptivity 0.16 0.15 0.15 0.16 0.15 0.17 0.07 0.22
It can be confirmed referring to above-mentioned table 2, the Photoepolymerizationinitiater initiater that the embodiment of the present invention is included i.e. A-1~A-4 In the case of, the absorptivity when molecular weight and 365nm wavelength of part corresponding to R2 is included in range disclosed by the invention It is interior.
Production Example: the manufacture of colour filter
The each photosensitive composition manufactured in above-described embodiment and comparative example is coated on by spin-coating method On glass substrate, it is then placed into the temperature in heating plate at 100 DEG C and maintains 3 minutes and form film.Then, in above-mentioned film It is upper to place lines/space pattern test photomask with 1 μm~50 μm and 100 μm are set as with the interval of test photomask Irradiate ultraviolet light.At this point, ultraviolet light source uses the high-pressure sodium lamp for the 1KW for all including by g, h, i line, with 50mJ/cm2Photograph Degree is irradiated, and does not use special optical filter.By it is above-mentioned through ultraviolet light irradiation film pH 10.5 KOH water It impregnates 1 minute and develops in solution development solution.The glass plate for being covered with film is made after being washed with distilled water, nitrogen blowing into Row drying, and heated 30 minutes in 220 DEG C of heated oven, to manufacture colour filter.The film thickness of the colour filter of above-mentioned manufacture Degree is 2.0 μm.
Experimental example 2. pattern inclined-plane (taper) form
It is measured as shown in Figure 4 using scanning electron microscope (SEM) oblique before 220 DEG C of heating processes in above-mentioned Production Example The length in face, and record the result in following Table 3.
3. pattern line-width of experimental example (sensitivity) evaluation
The line width of the pattern formed in above-mentioned Production Example is measured using scanning electron microscope (SEM).In the line width of pattern In the case where being measured as the line width (100 μm) of photomask or more, the sensitivity for being construed to photosensitive composition is abundant And line width expands.At this point, the widened line width (μm) relative to photomask is recorded in following Table 3.
[table 3]
It referring to above-mentioned table 3, does not confirm in the case where meeting the Examples 1 to 4 of all conditions of the invention, and at least not The case where meeting comparative example 1~4 of one of condition of the invention, is compared, and sensitivity is excellent, and is capable of forming positive bevel form.
Specifically, using R2Molecular weight be detached from range disclosed by the invention Photoepolymerizationinitiater initiater comparative example 1, In the case where 2 and 4, can be confirmed formed reverse slope form and generate it is bad in process, especially be more than the present invention disclose R2In the case where the comparative example 2 of the range of molecular weight, can be confirmed pattern formation be in itself it is impossible, using It, can be true in the case where comparative example 3 of the absorptivity lower than the Photoepolymerizationinitiater initiater of range disclosed by the invention when 365nm wavelength Recognize and be similarly formed reverse slope form, sensitivity is also bad.

Claims (10)

1. a kind of photosensitive composition, which is characterized in that include Photoepolymerizationinitiater initiater A, the Photoepolymerizationinitiater initiater A The Photoepolymerizationinitiater initiater a1, the Photoepolymerizationinitiater initiater a1 that absorptivity when comprising 365nm wavelength is 0.1% or more are following Compound represented by chemical formula 1 or chemical formula 2,
Chemical formula 1
Chemical formula 2
In the chemical formula 1 and chemical formula 2,
R1It is indicated each independently by following chemical formula 3,
R2For alkyl, molecular weight is each independently 50~150,
R3It is each independently substituted or non-substituted diphenylsulfide base, substituted or non-substituted carbazyl, substituted or non-substituted Fluorenyl,
Chemical formula 3
-R4-R5
In the chemical formula 3,
R4For the sub- aralkyl of the alkylidene of C1~C8, the arlydene of C6~C20 or C7~C25,
R5It is each independently the aralkyl of CN, C1~C8 alkyl, the ring structure of C3~C8, the aryl of C6~C20 or C7~C25 Base.
2. photosensitive composition according to claim 1, which is characterized in that the coloring phototonus resin group Closing object also includes selected from by Photoepolymerizationinitiater initiater a2, the alkali soluble resins, optical polymerism other than the Photoepolymerizationinitiater initiater a1 Close one or more of object, solvent and group of additive composition.
3. photosensitive composition according to claim 1, which is characterized in that the Photoepolymerizationinitiater initiater a1's Content is 70~100 parts by weight relative to the whole Photoepolymerizationinitiater initiater A100 parts by weight comprising it.
4. photosensitive composition according to claim 1, which is characterized in that the Photoepolymerizationinitiater initiater A's Content is 0.1~30 weight relative to whole 100 parts by weight of solid component in the photosensitive composition comprising it Part.
5. photosensitive composition according to claim 2, which is characterized in that the acid value of the alkali soluble resins For 20~200mgKOH/g.
6. photosensitive composition according to claim 2, which is characterized in that the weight of the alkali soluble resins is equal Molecular weight is 3,000~200,000.
7. photosensitive composition according to claim 2, which is characterized in that the content of the alkali soluble resins It is 10~80 parts by weight relative to whole 100 parts by weight of solid component in the photosensitive composition comprising it.
8. photosensitive composition according to claim 2, which is characterized in that the photopolymerizable compound Content is 5~50 parts by weight relative to whole 100 parts by weight of solid component in the photosensitive composition comprising it.
9. a kind of colour filter, which is characterized in that include coloring phototonus resin combination according to any one of claims 1 to 8 The solidfied material of object.
10. a kind of image display device, which is characterized in that include colour filter as claimed in claim 9.
CN201910117834.3A 2018-03-20 2019-02-15 Photosensitive composition, colour filter and image display device comprising it Pending CN110308617A (en)

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Application publication date: 20191008