CN110286435A - A kind of ultraviolet polarization splitting prism and preparation method thereof - Google Patents
A kind of ultraviolet polarization splitting prism and preparation method thereof Download PDFInfo
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- CN110286435A CN110286435A CN201910487168.2A CN201910487168A CN110286435A CN 110286435 A CN110286435 A CN 110286435A CN 201910487168 A CN201910487168 A CN 201910487168A CN 110286435 A CN110286435 A CN 110286435A
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- Prior art keywords
- prism
- ultraviolet
- film
- cuboid
- polarization splitting
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- 230000010287 polarization Effects 0.000 title claims abstract description 47
- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 230000003287 optical effect Effects 0.000 claims abstract description 40
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 37
- 238000010276 construction Methods 0.000 claims abstract description 19
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 14
- 230000001681 protective effect Effects 0.000 claims abstract description 12
- 238000004026 adhesive bonding Methods 0.000 claims abstract description 9
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 8
- 238000005530 etching Methods 0.000 claims abstract description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 19
- 239000004568 cement Substances 0.000 claims description 17
- 238000007747 plating Methods 0.000 claims description 10
- 238000005498 polishing Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 4
- 235000013312 flour Nutrition 0.000 claims description 3
- 239000005350 fused silica glass Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 2
- 229910001634 calcium fluoride Inorganic materials 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 2
- 238000000206 photolithography Methods 0.000 claims description 2
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 241000790917 Dioxys <bee> Species 0.000 claims 1
- 229910003978 SiClx Inorganic materials 0.000 claims 1
- 238000001259 photo etching Methods 0.000 claims 1
- 230000008033 biological extinction Effects 0.000 abstract description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
A kind of ultraviolet polarization splitting prism and preparation method thereof; it is characterized in that; the cuboid prism cementing identical and of same size by two block lengths forms, and the cemented surface of one of cuboid prism is successively coated with the polarization beam splitter and silicon dioxide protective film for introducing optical grating construction.The polarization beam splitter for introducing optical grating construction dielectric grating as made of gluing, exposure, development etching and film structure are deposited to obtain.The present invention has many advantages, such as that extinction ratio is high, ranges of incidence angles is big, stability is good, is mainly used in ultraviolet, deep ultraviolet band.
Description
Technical field
The invention belongs to optical device fields, and in particular to a kind of ultraviolet polarization splitting prism and preparation method thereof.
Technical background
Incident light can be divided into the mutually perpendicular linearly polarized light of two beams by polarization splitting prism: S light and P light, wherein P luminous energy is complete
Full by, and S light is reflected with 45 degree of angles, to achieve the purpose that be polarized and be divided.Compared with crystal beam splitter, polarization
Amici prism has big, insensitive to the incident angle advantage of the light beam angle of departure, and be widely used in high power laser light occasion with
And precision optical instrument.
A kind of first technology [1] " polarization splitting prism of High Extinction Ratio " (CN202362476U) proposes a kind of polarization spectro rib
Mirror plates polarizing beam splitting film on the inclined-plane of two right-angle prisms, with optical glue by inclined-plane edge-jointing adhesive altogether, remaining light pass surface
Plate anti-reflection film.The inventive structure is simple, at low cost, but can not be applied to ultraviolet, deep ultraviolet band, because optical glue is in purple
Wave section transmitance is very low, can also generate pollution.
A kind of first technology [2] " ultraviolet high-performance polarization light splitting prism " (CN102495437A) proposes a kind of ultraviolet polarization point
The angle of a pair of of triangular prism is processed into Brewster's angle by light prism, is coated with polarization spectro on a pair of of Brewster face
Film, two faces are docked using air-gap.The invention can be applied to ultraviolet, but extinction ratio is not high, and ranges of incidence angles is small.
Summary of the invention
It is an object of the invention in view of the above shortcomings of the prior art, provide a kind of ultraviolet polarization splitting prism and its system
Preparation Method can be applied to ultraviolet, deep ultraviolet band, and extinction ratio is higher than general the Ultraviolet Polarizing, and ranges of incidence angles is big, property
It can stablize.
For above-mentioned goal of the invention, the technical solution adopted by the present invention are as follows:
A kind of ultraviolet polarization splitting prism, it is characterized in that, by including the identical and of same size cuboid of two block lengths
Prism cementing forms, and the cemented surface of one of cuboid prism is successively coated with the polarization beam splitter and two for introducing optical grating construction
Silica protective film.
The polarization beam splitter for introducing optical grating construction dielectric grating and membrane system as made of gluing, exposure, development etching
Structure is deposited to obtain.
The film structure is successively alternately made of lanthanum fluoride layer and magnesium fluoride layer.
The material of the cuboid prism is ultraviolet vitreous silica, CaF2。
The present invention also provides a kind of preparation methods of ultraviolet polarization splitting prism, it is characterized in that, include the following steps:
The cuboid prism that step 1) selects two block lengths identical and of same size, chooses two pieces of cuboid prism area phases
Same any surface is polished;
Step 2) plated on the wherein burnishing surface of one piece of cuboid prism set introduce optical grating construction polarization beam splitter, and
The outer applying silicon oxide protective film of polarization beam splitter;
The burnishing surface of another piece of cuboid prism is contacted placement with silicon dioxide protective film by step 3) relatively, and is removed and connect
The bubble of contacting surface carries out optical cement, makes two pieces of cuboid prism cementings;
Part after gluing is put into high temperature furnace and is bonded by step 4), and bonding temperature is 200~300 DEG C, after being bonded
Natural cooling.
The preparation method of the ultraviolet polarization splitting prism, which is characterized in that further include:
The cuboid prism that gluing is integrated by step 5) is respectively cut up and down using cemented surface as diagonal plane as right-angle prism
Shape polishes two pairs of right-angle surfaces.
Step 6) is according to use demand, and plating sets anti-reflection film in two pairs of right-angle surfaces of polished processing, or only selects wherein one
Anti-reflection film is set to right-angle surface plating.
Further, plating sets the polarization beam splitter for introducing optical grating construction on burnishing surface in the step 2), and detailed process is such as
Under:
Step 2.1) cleaning polishing face, photoresist is spun on burnishing surface, forms photoresist layer;
Step 2.2) is exposed using ultraviolet light by mask plate photolithography film surface, is then removed exposed
Photoresist layer retains the photoresist layer of unexposed portion;
Step 2-3) to unglazed photoresist covering fused quartz prism perform etching after, remove photoresist, obtain dielectric grating
(102);
Step 2-4) film structure (103) are finally vertically deposited on dielectric grating, obtain the polarization for introducing optical grating construction
Spectro-film (101).
Further, in the step 3) in the unsuccessful situation of optical cement, silica is protected with silica flour solubilizer
Film surface carries out manual fine polishing to improve surface smoothness, to increase the optical cement probability of success.
Compared with prior art, technical effect of the invention are as follows:
By introducing nanometer grating structure in polarization beam splitter, Film Design freedom degree is increased, can effectively be increased
The extinction ratio of big polarization splitting prism, the problem of improving the incidence angle limitation of common ahrens prism;Introducing the inclined of optical grating construction
It is coated with silica dioxide medium film outside vibration spectro-film, not only can protect optical grating construction, it can also be by being carried out by hand to coated surface
Fine polishing processing improves surface smoothness, increases optical cement success rate, to improve yield rate;Thermal bonding work is used in optical cement process
Skill is having vibration, the temperature difference so that bonding face is able to maintain long-term good air-tightness and firmness, and independent of temperature variations
Larger, high-power occasion is equally able to maintain compared with stable performance.
Detailed description of the invention
Fig. 1 is the flow chart for carrying out plated film to one piece of cuboid prism and introducing optical grating construction
Fig. 2 is that the prism after plated film is carried out optical cement with another cuboid prism to be bonded and be cut into finished product, plating anti-reflection film
Schematic diagram
Fig. 3 is the structural schematic diagram of the ultraviolet polarization splitting prism of the present invention
Specific embodiment
Below with reference to embodiment and attached drawing, the invention will be further described, but protection model of the invention should not be limited with this
It encloses.
A kind of ultraviolet polarization splitting prism the production method is as follows:
Fig. 1 is the flow chart for carrying out plated film to cuboid prism 10 and introducing optical grating construction.
The cuboid prism 10 and 20 that step 1) selects two block lengths identical and of same size, material are ultraviolet tekite
English respectively polishes the opposite face of prism 10 and prism 20, to reach the surface figure accuracy and smoothness requirements of optical cement needs;
After step 2) cleans the burnishing surface of prism 10, photoresist is spun on formation photoresist layer 105 on face;Using ultraviolet
Light is exposed photoresist by mask plate irradiation light photoresist surface, then removes exposed photoresist layer, and reservation does not expose
The photoresist layer of light part;Then after being performed etching to the fused quartz prism of unglazed photoresist covering, photoresist is removed, medium is obtained
Grating 102;Film structure 103 is finally vertically deposited on dielectric grating, has obtained the polarization beam splitter for introducing optical grating construction
101, and in the outer applying silicon oxide protective film 104 of polarization beam splitter 101.
Fig. 2 is that the prism after plated film is carried out optical cement with another cuboid prism, is bonded and is cut into finished product, plating anti-reflection film
Schematic diagram.
The burnishing surface of cuboid prism 20 is contacted placement relatively with silicon dioxide protective film by step 3), removes contact surface
Bubble carries out optical cement.In the unsuccessful situation of optical cement, manual fine polishing is carried out to photo-adhesive surface with silica flour solubilizer to improve surface
Finish, it is thin by hand because being coated with silicon dioxide protective film 104 outside polarization beam splitter 101 to increase optical cement success rate
Throwing will not destroy film structure 103.
Monolith part is placed in high temperature furnace after the completion of step 4) optical cement and is bonded, temperature is set, to increase by tens every time
Temperature is slowly increased to 280 DEG C, after the completion of heating by the mode of degree, is closed heating device and is carried out natural cooling, whole process is held
Continue four day time.In the case where high-temperature heating, molecular motion accelerates, and the molecule of silicon dioxide layer interpenetrates, and reaches secured
In conjunction with purpose.The setting of bonding temperature be not it is unalterable, if sample is more sensitive to high temperature, can reduce temperature interval,
Baking maximum temperature is reduced, baking time is increased.
Part is taken out from high temperature furnace after step 5) natural cooling, using cemented surface as diagonal plane, be respectively cut up and down for
Right-angle prism shape polishes two pairs of right-angle surfaces, obtains four light pass surfaces: the first right-angle surface, the second right-angle surface, and third is straight
Edged surface, the 4th right-angle surface.
Step 6) is according to use demand, and plating sets anti-reflection film in four light pass surfaces.The anti-reflection film that four light pass surfaces are coated with
Under the incident wavelength of 193.368nm, single side transmitance Tp﹥ 99.5%.
The structural schematic diagram of the ultraviolet polarization splitting prism of the present invention is as shown in figure 3, by the identical and width including two block lengths
Identical cuboid prism cementing forms, and the cemented surface of cuboid prism 10 is successively coated with the polarization spectro for introducing optical grating construction
Film 101 and silicon dioxide protective film 104;The polarization beam splitter 101 for introducing optical grating construction is etched by gluing, exposure, development
Made of dielectric grating 102 and film structure 103 vapor deposition obtain.
The present invention uses above-mentioned technical solution, by introducing nanometer grating structure in polarization beam splitter, increases film
It is design freedom, can effectively increases the extinction ratio of polarization splitting prism, improves the incidence angle limitation of common ahrens prism
The problem of;Coated surface is bonded by optical cement and is fixed, and can be applied in ultraviolet, deep ultraviolet band, and sets silica guarantor by plating
Cuticula can effectively improve optical cement yield rate, and after high-temperature process, bonding face is able to maintain long-term good air-tightness and jail
Soundness, and independent of temperature variations, vibration, the temperature difference be larger, high-power occasion is equally able to maintain compared with stable performance having.
Claims (8)
1. a kind of ultraviolet polarization splitting prism, which is characterized in that by including the identical and of same size cuboid rib of two block lengths
Mirror gluing forms, and the cemented surface of one of cuboid prism is successively coated with the polarization beam splitter and dioxy for introducing optical grating construction
SiClx protective film.
2. a kind of ultraviolet polarization splitting prism according to claim 1, it is characterised in that: described to introduce the inclined of optical grating construction
Vibration spectro-film (101) dielectric grating as made of gluing, exposure, development, etching (102) is obtained with film structure (103) vapor deposition.
3. a kind of ultraviolet polarization splitting prism according to claim 2, it is characterised in that: the film structure (103) by
Lanthanum fluoride layer and magnesium fluoride layer are successively alternately constituted.
4. a kind of ultraviolet polarization splitting prism according to claim 1, it is characterised in that: the material of the cuboid prism
For ultraviolet vitreous silica, CaF2。
5. a kind of preparation method of ultraviolet polarization splitting prism, which comprises the steps of:
The cuboid prism that step 1) selects two block lengths identical and of same size, it is identical to choose two pieces of cuboid prism areas
Any surface is polished;
Step 2) plates the polarization beam splitter for setting and introducing optical grating construction on the wherein burnishing surface of one piece of cuboid prism, and is polarizing
The outer applying silicon oxide protective film (104) of spectro-film (101);
The burnishing surface of another piece of cuboid prism is contacted placement relatively with silicon dioxide protective film by step 3), and removes contact surface
Bubble, carry out optical cement, make two pieces of cuboid prism cementings;
Part after gluing is put into high temperature furnace and is bonded by step 4), and bonding temperature is 200~300 DEG C, natural after being bonded
It is cooling.
6. the preparation method of ultraviolet polarization splitting prism according to claim 5, which is characterized in that further include
The cuboid prism that gluing is integrated by step 5) is respectively cut up and down using cemented surface as diagonal plane as right-angle prism shape
Shape polishes right-angle surface.
Step 6) is according to use demand, and plating sets anti-reflection film in two pairs of right-angle surfaces of polished processing, or only selection one pair of them are straight
Edged surface plating sets anti-reflection film.
7. the preparation method of ultraviolet polarization splitting prism according to claim 5, which is characterized in that in the step 2)
Plating sets the polarization beam splitter for introducing optical grating construction on burnishing surface, and detailed process is as follows:
Step 2.1) cleaning polishing face, photoresist is spun on burnishing surface, is formed photoresist layer (105);
Step 2.2) is exposed using ultraviolet light by mask plate photolithography film surface, and exposed photoetching is then removed
Glue-line retains the photoresist layer of unexposed portion;
Step 2-3) to unglazed photoresist covering fused quartz prism perform etching after, remove photoresist, obtain dielectric grating
(102);
Step 2-4) film structure (103) are finally vertically deposited on dielectric grating, obtain the polarization spectro for introducing optical grating construction
Film (101).
8. the preparation method of ultraviolet polarization splitting prism according to claim 5, which is characterized in that in the step 3) when
In the unsuccessful situation of optical cement, manual fine polishing is carried out to silicon dioxide protective film face with silica flour solubilizer to improve any surface finish
Degree, to increase the optical cement probability of success.
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112764149A (en) * | 2021-01-08 | 2021-05-07 | 中国科学院上海光学精密机械研究所 | Deep ultraviolet flat plate polarization spectroscope and design method thereof |
CN114853355A (en) * | 2022-04-08 | 2022-08-05 | 常州市万华激光科技有限公司 | Preparation method of ultraviolet 193nm antireflection film |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112764149A (en) * | 2021-01-08 | 2021-05-07 | 中国科学院上海光学精密机械研究所 | Deep ultraviolet flat plate polarization spectroscope and design method thereof |
CN114853355A (en) * | 2022-04-08 | 2022-08-05 | 常州市万华激光科技有限公司 | Preparation method of ultraviolet 193nm antireflection film |
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Application publication date: 20190927 |