CN110284107A - Supporting strip and supporting device for display panel and evaporation method for display panel - Google Patents
Supporting strip and supporting device for display panel and evaporation method for display panel Download PDFInfo
- Publication number
- CN110284107A CN110284107A CN201910580335.8A CN201910580335A CN110284107A CN 110284107 A CN110284107 A CN 110284107A CN 201910580335 A CN201910580335 A CN 201910580335A CN 110284107 A CN110284107 A CN 110284107A
- Authority
- CN
- China
- Prior art keywords
- support bar
- occlusion part
- deposited
- supportive body
- exposure mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 25
- 239000000758 substrate Substances 0.000 claims description 77
- 230000003319 supportive effect Effects 0.000 claims description 70
- 238000007740 vapor deposition Methods 0.000 claims description 24
- 230000008020 evaporation Effects 0.000 claims description 23
- 230000004580 weight loss Effects 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 11
- 230000001105 regulatory effect Effects 0.000 claims description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims 2
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims 1
- 235000017557 sodium bicarbonate Nutrition 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 19
- 238000005530 etching Methods 0.000 abstract description 5
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 20
- 230000005484 gravity Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000010276 construction Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000000116 mitigating effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 230000018199 S phase Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 210000003205 muscle Anatomy 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The embodiment of the invention provides a support strip and a support device for a display panel and an evaporation method for the display panel, relates to the technical field of display, and not only reduces the manufacturing difficulty of a mask sheet, but also improves the accuracy of film coating. The support strip comprises: a support body; the shielding part is protruded from the first side of the supporting main body on the plane where the orthographic projection of the supporting main body is located, and the shielding part is provided with a half etching groove. The support bars are used for supporting the mask sheet.
Description
[technical field]
The present invention relates to field of display technology more particularly to a kind of for the support bar of display panel, support device and aobvious
Show the evaporation coating method of panel.
[background technique]
Traditional display panel is mostly rectangular configuration, however as display technology continuous development and user to display surface
The diversified demand of plate shape, special-shaped display panel are more and more widely used.
For the display panel of abnormity, when the luminescent layer to substrate to be deposited is deposited, need to use and its
The identical exposure mask piece of shape, exposure mask piece are placed on support bar, are aligned with substrate to be deposited, and evaporation source is through exposure mask piece
Opening vapor deposition arrives the open region of substrate to be deposited, forms luminescent layer.
But substrate to be deposited is deposited using the exposure mask piece of abnormity, it not only will increase the manufacture difficulty of exposure mask piece,
The production precision of exposure mask piece is caused to be difficult to ensure, moreover, during throwing the net, pair of exposure mask piece and substrate to be deposited at abnormity
Position precision is difficult to control, and the position of the luminescent layer of vapor deposition is made deviation occur, and then causes display panel that mixed color phenomenon occurs.
[summary of the invention]
In view of this, the embodiment of the invention provides a kind of for the support bar of display panel, support device and display surface
The evaporation coating method of plate reduces the manufacture difficulty of exposure mask piece, improves the production precision of exposure mask piece, and improves the accurate of plated film
Property.
On the one hand, the embodiment of the invention provides a kind of support bars for display panel, comprising:
Supportive body；
Occlusion part, supportive body orthographic projection institute in the plane, the occlusion part is raised in the supportive body
First side, the occlusion part are equipped with and etch partially slot.
Optionally, described to etch partially slot difference position where perpendicular to the supportive body orthographic projection on the direction of plane
In the two sides of the occlusion part.
Optionally, further includes:
Balanced structure, the balanced structure are arranged on the supportive body；
Supportive body orthographic projection institute in the plane, the supportive body has central axes, and the central axes are prolonged
It is identical as the extending direction of the supportive body to stretch direction, the central axes are put down perpendicular to where the supportive body orthographic projection
The side in face is upwardly formed middle axial plane, and the support bar is divided into first part and second part, the support by the middle axial plane
Item is identical with the second part weight in the first part.
Optionally, the balanced structure includes position balance portion；
Supportive body orthographic projection institute in the plane, the position balance portion is raised in the second of the supportive body
Side, described second side are the side opposite with first side, and in a first direction, the orthographic projection in the position balance portion covers
The orthographic projection of the occlusion part, the first direction are direction of the described second side towards first side.
Optionally, the balanced structure includes weight loss groove；
Along the central axes, the weight loss groove is located at the supportive body close to the side of the occlusion part.
Optionally, the width of the position balance portion in said first direction is L1,0.1mm≤L1≤3mm.
Optionally, along the central axes, the supportive body is equipped with regulating tank in the side close to the occlusion part.
Optionally, the supportive body includes multiple interval settings first area, and each first area is used to support
One exposure mask piece group, an exposure mask piece group include multiple exposure mask pieces；
The occlusion part includes multiple block units, and the position balance portion includes multiple balancing units, and each described
The two sides in one region are respectively arranged with the n block units and a balancing unit, n >=2, wherein the balance is single
One end of member is aligned with the 1st block unit, and the other end of the balancing unit is aligned with n-th of block unit.
Optionally, the block unit includes that subelement is blocked and/or subelement is blocked in grooving in turning.
Optionally, the occlusion part, the position balance portion and the supportive body are integrally formed.
Optionally, the quantity of the weight loss groove is multiple, and multiple weight loss grooves are uniformly distributed.
Optionally, the supportive body in a first direction of same size, the first direction are the first side court
To the direction of side corresponding thereto.
On the other hand, the embodiment of the invention provides a kind of support devices, comprising:
Frame；
Such as the described in any item support bars of claim 1~12.
In another aspect, the embodiment of the invention provides a kind of evaporation coating methods of display panel, comprising:
During vapor deposition, substrate to be deposited is blocked using such as above-mentioned support bar, is made in the substrate to be deposited
Film layer is not vapor-deposited with by the region that the occlusion part of the support bar blocks.
Optionally, substrate to be deposited is blocked using the support bar, is made in the substrate to be deposited by the branch
The region that the occlusion part of stay blocks is not vapor-deposited with film layer
Exposure mask piece is placed on the support bar, by the support bar and the exposure mask piece, the exposure mask piece and it is described to
Vapor deposition substrate is aligned, and is hidden using the occlusion part of the support bar and the blocked area of the exposure mask piece to evaporation source
Gear, makes not to be vapor-deposited with film layer in the substrate to be deposited region corresponding with the occlusion part and the blocked area.
A technical solution in above-mentioned technical proposal has the following beneficial effects:
Using technical solution provided by the embodiment of the present invention, support bar supports exposure mask piece, by by support bar, exposure mask piece
With substrate to be deposited align, make occlusion part in substrate to be deposited abnormity preset place it is corresponding, during vapor deposition, evaporation source from
Under supreme ejection evaporation material, the occlusion part that evaporation material is supported item blocks, and can not pass through occlusion part and exposure mask piece vapor deposition arrive
On substrate to be deposited, substrate to be deposited is made not to be vapor-deposited with film layer at abnormity, to form polymorphic structure on substrate to be deposited.
As it can be seen that blocking by the occlusion part using support bar to the default place of abnormity in substrate to be deposited, it is used cooperatively conventional shape
Exposure mask piece be also able to achieve the vapor deposition of the substrate to be deposited to abnormity, exposure mask piece is not necessarily to and the default place's phase of the abnormity of substrate to be deposited
Matching, reduces the manufacture difficulty of exposure mask piece, improves the production precision of exposure mask piece；Also, since no setting is required for exposure mask on piece
The irregular shaped regions such as turning, grooving, moreover it is possible to increase the aligning accuracy of exposure mask piece Yu substrate to be deposited, improve the accurate of plating film location
Property, it is effectively improved mixed color phenomenon.In addition, exposure mask piece is adsorbed on magnetic sheet before vapor deposition, vapor deposition chamber is transmitted to by magnetic sheet drive
In, if the shape of exposure mask piece is not necessarily to match with the shape of substrate to be deposited, only need to adsorb large-sized conventional shape on magnetic sheet
Exposure mask piece, realize reasonable effective typesetting rate of the exposure mask piece on magnetic sheet.
In embodiments of the present invention, it is also further provided on occlusion part and etches partially slot, to mitigate the weight of occlusion part
Amount when stretching to support bar, makes the gravity of occlusion part and shrinks dynamic balance, avoid occlusion part from bending or tilt, to have
Effect, which avoids, to be bent caused plated film colour mixture by occlusion part and is tilted by occlusion part caused to exposure mask piece and substrate to be deposited
The problem of scuffing.
To sum up, using technical solution provided by the present invention, by the occlusion part using itself to different in substrate to be deposited
The default place of shape is blocked, and it is not necessary that the shape of exposure mask piece is additionally designed as abnormity, is reduced the manufacture difficulty of exposure mask piece, is improved
The production precision of exposure mask piece, and improve the aligning accuracy of exposure mask piece Yu substrate to be deposited；Further, it is drawn to support bar
When stretching, moreover it is possible to using the stress for etching partially slot balance occlusion part, occlusion part be avoided to bend or tilt.
[Detailed description of the invention]
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below will be to needed in the embodiment attached
Figure is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for this field
For those of ordinary skill, without creative efforts, it can also be obtained according to these attached drawings other attached drawings.
Fig. 1 is the structural schematic diagram of support bar provided by the embodiment of the present invention；
Fig. 2 is the vapor deposition schematic diagram of single substrate to be deposited provided by the embodiment of the present invention；
Fig. 3 is stress diagram when support bar provided by the embodiment of the present invention stretches；
Fig. 4 is another structural schematic diagram of support bar provided by the embodiment of the present invention；
Fig. 5 is the deformation schematic diagram of support bar provided by the embodiment of the present invention；
Fig. 6 is the yet another construction schematic diagram of support bar provided by the embodiment of the present invention；
Fig. 7 is another structural schematic diagram of support bar provided by the embodiment of the present invention；
Fig. 8 is another structural schematic diagram of support bar provided by the embodiment of the present invention；
Fig. 9 is the yet another construction schematic diagram of support bar provided by the embodiment of the present invention；
Figure 10 is the structural schematic diagram of support device provided by the embodiment of the present invention.
[specific embodiment]
For a better understanding of the technical solution of the present invention, being retouched in detail to the embodiment of the present invention with reference to the accompanying drawing
It states.
It will be appreciated that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Base
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts it is all its
Its embodiment, shall fall within the protection scope of the present invention.
The term used in embodiments of the present invention is only to be not intended to be limiting merely for for the purpose of describing particular embodiments
The present invention.In the embodiment of the present invention and the "an" of singular used in the attached claims, " described " and "the"
It is also intended to including most forms, unless the context clearly indicates other meaning.
It should be appreciated that term "and/or" used herein is only a kind of incidence relation for describing affiliated partner, indicate
There may be three kinds of relationships, for example, A and/or B, can indicate: individualism A, exist simultaneously A and B, individualism B these three
Situation.In addition, character "/" herein, typicallys represent the relationship that forward-backward correlation object is a kind of "or".
The embodiment of the invention provides a kind of support bars for display panel, and as shown in FIG. 1, FIG. 1 is the present invention to implement
Example provided by support bar structural schematic diagram, the support bar 100 include supportive body 1 and occlusion part 2, supportive body 1 just
In the plane, occlusion part 2 is raised in the first side of supportive body 1 for projection institute, and occlusion part 2 is equipped with and etches partially slot 3.
It is put down locating for the supportive body 1 under depression angle it should be noted that plane where 1 orthographic projection of supportive body refers to
Face etches partially slot 3 and refers to the groove formed using technique is etched partially.
By taking the shape of substrate 5 to be deposited is the round rectangle with grooving as an example, using provided by the embodiment of the present invention
Substrate 5 to be deposited is deposited in support bar 100, as shown in Fig. 2, Fig. 2 is single substrate to be deposited provided by the embodiment of the present invention
Vapor deposition schematic diagram, support bar 100 support exposure mask piece 4 made by aligning support bar 100, exposure mask piece 4 and substrate to be deposited 5
Occlusion part 2 is corresponding with turning in substrate 5 to be deposited and the default place of grooving, and during vapor deposition, evaporation source 6 sprays from bottom to up
Evaporation material out, the occlusion part 2 that evaporation material is supported item 100 block, can not pass through occlusion part 2 and exposure mask piece 4 vapor deposition to
It is deposited on substrate 5, so that substrate 5 to be deposited is not vapor-deposited with film layer at turning and grooving, turned to be formed on substrate 5 to be deposited
Angle and grooving structure.As it can be seen that by the occlusion part 2 using support bar 100 to the default place at turning and grooving in substrate 5 to be deposited
It is blocked, the vapor deposition of the substrate to be deposited 5 to abnormity, 4 nothing of exposure mask piece is also able to achieve with the use of the exposure mask piece 4 of conventional shape
It need to match with the special-shaped place of substrate 5 to be deposited, reduce the manufacture difficulty of exposure mask piece 4, improve the production essence of exposure mask piece 4
Degree；Also, due to no setting is required on exposure mask piece 4 irregular shaped regions such as turning, grooving, moreover it is possible to increase exposure mask piece 4 and substrate 5 to be deposited
Aligning accuracy, improve plating film location accuracy, be effectively improved mixed color phenomenon.In addition, exposure mask piece 4 is adsorbed on before vapor deposition
It on magnetic sheet, is transmitted in vapor deposition chamber by magnetic sheet drive, if the shape of exposure mask piece 4 is without the shape phase with substrate 5 to be deposited
Match, the exposure mask piece 4 for adsorbing large-sized conventional shape is only needed on magnetic sheet, realizes rationally the having on magnetic sheet of exposure mask piece 4
The typesetting rate of effect.
It should be noted that needing to stretch support bar 100, such as Fig. 3 when support bar 100 is fixed on frame
Shown, Fig. 3 is stress diagram when support bar provided by the embodiment of the present invention stretches, and the both ends of supportive body 1 are applied X
Pulling force on direction, which conducts along the extending direction of supportive body 1, and then generates the convergent force in Y-direction.For hiding
For stopper 2, occlusion part 2 not will receive the pulling force in X-direction, but deposit convergent force in the Y direction, since occlusion part 2 is in the side Z
There are certain gravity on (perpendicular to the direction of plane where 1 orthographic projection of supportive body, being not shown in the figure), when occlusion part 2 is in Y
When convergent force on direction and gravity unbalance in z-direction, following problems will be generated:
When the convergent force of occlusion part 2 in the Y direction is less than the gravity of occlusion part 2 in z-direction, occlusion part 2 can backwards
Exposure mask piece 4 is bent, and causes occlusion part 2 not to be bonded with exposure mask piece 4, during vapor deposition, evaporation source 6 will be via 2 He of occlusion part
The gap of exposure mask piece 4 is transmitted to substrate 5 to be deposited, causes film layer to be vaporized on the region that substrate 5 to be deposited is not required to plated film, increases
The plated film area of luminescent layer makes display panel that mixed color phenomenon occur；When the convergent force of occlusion part 2 in the Y direction is greater than occlusion part 2
When gravity in z-direction, end of the occlusion part 2 far from supportive body 1 can be tilted towards exposure mask piece 4, scratch exposure mask piece 4 and to
Substrate 5 is deposited, causes the waste of material, and influence the yield rate of display panel.
And for support bar 100, since the size of support bar 100 is smaller, thus provided in the X direction when stretching
Pulling force is smaller, so that the convergent force in Y-direction is also just smaller, at this point, the gravity of occlusion part 2 in z-direction will be to occlusion part 2
Deformation produce bigger effect.
Based on this, in embodiments of the present invention, also further it is provided on occlusion part 2 and etches partially slot 3, hidden to mitigate
The weight of stopper 2 makes the contraction dynamic balance on the gravity and Y-direction of occlusion part 2 in z-direction when stretching to support bar 100,
Occlusion part 2 is avoided to bend or tilt, to effectively prevent plated film colour mixture caused by being bent by occlusion part 2 and by hiding
Stopper 2 tilt caused by exposure mask piece 4 and 5 fragmentation of substrate to be deposited the problem of.
To sum up, using support bar 100 provided by the embodiment of the present invention, by the occlusion part 2 using itself to be deposited
The default place of abnormity is blocked in substrate 5, it is not necessary that the shape of exposure mask piece 4 is additionally designed as abnormity, reduces the system of exposure mask piece 4
Make difficulty, improve the production precision of exposure mask piece 4, and improves the aligning accuracy of exposure mask piece 4 Yu substrate 5 to be deposited；Further
, when being stretched to support bar 100, moreover it is possible to using the stress for etching partially the balance occlusion part 2 of slot 3, occlusion part 2 be avoided to bend
Or it tilts.
Optionally, it where perpendicular to 1 orthographic projection of supportive body on the direction of plane, etches partially slot 3 and is located at and block
It is drawn at this point, the center of gravity of occlusion part 2 and the center of gravity of supportive body 1 are generally aligned in the same plane to support bar 100 two sides in portion 2
When stretching can better force balance, avoid occlusion part 2 be bent or tilt.
Optionally, as shown in figure 4, Fig. 4 is another structural schematic diagram of support bar provided by the embodiment of the present invention, branch
Stay 100 further includes balanced structure 7, and balanced structure 7 is arranged on supportive body 1.In plane where 1 orthographic projection of supportive body
On, supportive body 1 has central axes 8, and the extending direction of central axes 8 is identical as the extending direction of supportive body 1, and central axes 8 exist
It is upwardly formed middle axial plane perpendicular to the side of plane where 1 orthographic projection of supportive body, support bar 100 is divided into first by middle axial plane
Divide and second part, support bar 100 are identical with second part weight in first part.
It should be noted that along different directions, there are multiple planes perpendicular to plane where 1 orthographic projection of supportive body,
It is middle axial plane by the plane definition where central axes 8 in multiple planes.
It is illustrated so that occlusion part 2 is located at 100 first part of support bar as an example in the embodiment of the present invention, in supportive body 1
The first side setting occlusion part 2 after, the weight of 100 first part of support bar is greater than the weight of second part, to support bar 100 into
When row stretches, as shown in figure 5, Fig. 5 is the deformation schematic diagram of support bar provided by the embodiment of the present invention, drawing in the X direction
Under the action of power, the discontinuity of support bar 100 will appear " W " type deformation on the whole, cause occlusion part 2 to base to be deposited
Plate 5 blocks inaccuracy, occurs blocking the region that 5 script of substrate to be deposited is not necessarily to block, or to substrate 5 to be deposited
Originally the case where needing the region blocked that can not block causes plating film location deviation occur, so that display panel display is occurred bad
The problem of.And by being arranged balanced structure 7 on supportive body 1, balanced structure 7 support bar 100 can be made in first part and
Second part weight is identical, and two sides stress is balanced when stretching, reduces the deformation of support bar 100, improves the accuracy of plating film location.
Optionally, referring again to Fig. 4, balanced structure 7 includes position balance portion 9.It is put down where 1 orthographic projection of supportive body
On face, position balance portion 9 is raised in second side of supportive body 1, and second side is the side opposite with the first side, in a first direction
On, the orthographic projection of the orthographic projection covering occlusion part 2 in position balance portion 9, first direction is direction of the second side towards the first side.?
Position occlusion part 2 is arranged in the opposite side of occlusion part 2, by way of increasing weight to second part, makes support bar 100 the
" W " type deformation of support bar 100 is effectively reduced when stretching for the weight balancing of a part and second part.
Optionally, it as shown in fig. 6, Fig. 6 is the yet another construction schematic diagram of support bar provided by the embodiment of the present invention, puts down
The structure 7 that weighs includes weight loss groove 10, and along central axes 8, weight loss groove 10 is located at supportive body 1 close to the side of occlusion part 2.It is supporting
Weight loss groove 10 is arranged close to the side of occlusion part 2 in main body 1, by way of mitigating first part's weight, makes support bar 100 the
A part and second part weight balancing, " W " type deformation of support bar 100 is effectively reduced when stretching.
Further, referring again to Fig. 4, when balanced structure 7 includes position balance portion 9, position balance portion 9 is first
Width on direction is L1,0.1mm≤L1≤3mm.0.1mm is set by the minimum value of L1, can guarantee that position balance portion 9 has
There are enough width, it is sufficient to balance the weight of occlusion part 2；3mm is set by the maximum value of L1, is in order to avoid position balance portion
9 is wide, avoids causing to block to the exposure mask piece 4 being supported on support bar 100, influences film-forming accuracy.
Further, when balanced structure 7 includes position balance portion 9, as shown in fig. 7, Fig. 7 is mentioned by the embodiment of the present invention
Another structural schematic diagram of the support bar of confession, along central axes 8, supportive body 1 is equipped in the side close to occlusion part 2 and adjusts
Slot 11.It at forming position balance portion 9, is influenced by fabrication error, the actual size and pre-set dimension meeting in position balance portion 9
There are certain deviations, and the weight in position balance portion 9 is caused to be slightly less than the weight of occlusion part 2, by further leaning in supportive body 1
Regulating tank 11 is arranged in the side of nearly occlusion part 2, can mitigate support bar 100 in the weight of first part, be further ensured that support
Item 100 is in first part and second part weight balancing.
It should be noted that regulating tank 11 is merely to balance is led by fabrication error factor unlike weight loss groove 10
The position balance portion 9 of cause part weight less than normal, refers to the micro-recesses being finely adjusted to weight.
Be understood that when, in an evaporation process, need that multiple substrates 5 to be deposited are deposited simultaneously, that is to say, that branch
Multiple exposure mask pieces 4 are supported by stay 100.Based on this, as shown in figure 8, Fig. 8 is support bar provided by the embodiment of the present invention
Another structural schematic diagram, supportive body 1 include that first area 12 is arranged in multiple intervals, and each first area 12 is used to support one
A exposure mask piece group 13, an exposure mask piece group 13 include multiple exposure mask pieces 4.Occlusion part 2 includes multiple block units 14, position balance
Portion 9 includes multiple balancing units 15, and the two sides of each first area 12 are respectively arranged with n block unit 14 and a balance is single
First 15, n >=2, wherein one end of balancing unit 15 is aligned with the 1st block unit 14, the other end of balancing unit 15 and n-th
A block unit 14 is aligned.
15 weight of balancing unit, one timing, length of the balancing unit 15 on 1 extending direction of supportive body is longer, and balance is single
The width of member 15 in a first direction is narrower, when the both ends of balancing unit 15 hide with the 1st block unit 14 and n-th respectively
When keeping off unit 14 and being aligned, balancing unit 15 has biggish length, at this point, the width of balancing unit 15 is with regard to settable smaller, from
And avoid that balancing unit 15 is wide to be caused to block to exposure mask piece 4.
Currently, the display panel of abnormity usually has turning and groove, correspondingly, referring again to Fig. 8, block unit 14
Subelement 16 is blocked at turning including being blocked for the turning to display panel, and/or, for the grooving to display panel
Subelement 17 is blocked in the grooving blocked.
Optionally, occlusion part 2, position balance portion 9 and supportive body 1 are integrally formed, so set, not only simplifying support bar
100 manufacture craft, moreover it is possible to keep the connective stability of occlusion part 2, position balance portion 9 and supportive body 1, improve to be deposited
The reliability that substrate 5 blocks.
Certainly, in other embodiments of the present invention, occlusion part 2 and position balance portion 9 can also by such as grafting, the side such as screw
Formula is fixed on supportive body 1.
Optionally, when balanced structure 7 includes weight loss groove 10, referring again to Fig. 6, the quantity of weight loss groove 10 be it is multiple,
Also, to realize that support bar 100 in the uniformity of weight of different zones, reduces the force difference of each region, multiple weight loss grooves
10 can be uniformly distributed in supportive body 1.
Optionally, in a first direction of same size of supportive body 1, first direction are the first side towards corresponding thereto
The direction of side.It enables 1 width of supportive body uniform, can reduce the weight differential at 100 different zones of support bar, more
Reduction support bar 100 deformation.
In addition, as shown in figure 9, Fig. 9 is the structural schematic diagram of drawing bend provided by the embodiment of the present invention, support bar 100
It may also include a plurality of drawing bend 18, the first end of drawing bend 18 is connect with the occlusion part 2 of place support bar 100, drawing bend 18
Second end connect with the supportive body 1 of adjacent supports item 100 or connect with frame 200.
Illustratively, referring again to Fig. 9, in actual evaporation process, when being placed with 2n support bar on frame 200
When 100, the occlusion part 2 of the 1st~n-th support bar 100 is towards the first side of frame 200, (n+1)th~the 2n support bar
Towards second side of frame 200, the first side and second side of frame 200 be oppositely arranged 100 occlusion part 2.The 1st~n-th
In a support bar 100, the second end of drawing bend 18 is connect with frame 200 in the 1st support bar 100, in i-th of support bar 100
The second end of drawing bend 18 is connect with the supportive body 1 of (i-1)-th support bar 100,2≤i≤n.It is propped up at (n+1)th~the 2n
In stay 100, the second end of drawing bend 18 is connect with frame 200 in the 2n support bar 100, is stretched in x-th of support bar 100
The second end of muscle 18 is connect with the supportive body 1 of (x+1)th support bar 100, n≤x≤2n-1.
When stretching to support bar 100, along 1 first side of supportive body towards the direction of second side, occlusion part 2 be will receive
Convergent force, by the way that drawing bend 18 is arranged on support bar 100, drawing bend 18 can provide one and the convergent force to occlusion part 2
Reversed pulling force balances the convergent force, reduces by 2 deformation of occlusion part.Meanwhile drawing bend 18 can also " W " type to support bar 100
Deformation carries out opposite direction stretching, so that the extending direction of support bar 100 tends to be horizontal, enables the deformation quantity of support bar 100 smaller, mentions
Plated film accuracy at high 5 abnormity of substrate to be deposited, optimizes coating effects.
Further, referring again to Fig. 9, when occlusion part 2 includes that subelement 16 is blocked and subelement is blocked in grooving in turning
When 17, drawing bend 18 blocks subelement 16 with turning and connect.So, support bar 100, exposure mask piece 4 and substrate to be deposited 5 are right
Behind position, drawing bend 18 corresponds to the position between two neighboring substrate 5 to be deposited, and during vapor deposition, drawing bend 18 will not be treated
Coating film area in vapor deposition substrate 5 causes to block, and ensure that plated film accuracy.
Further, referring again to Fig. 9, supportive body orthographic projection institute in the plane, the extending direction of drawing bend 18
It is parallel with first direction.Be obliquely extended compared to drawing bend 18, drawing bend 18 enabled to extend in a first direction, drawing bend 18 with wait steam
The extending direction of the side of plated substrate 5 is identical, can cause to hide to the vapor deposition region in substrate 5 to be deposited to avoid drawing bend 18
Gear, guarantees the normal vapor deposition of luminescent layer.
Optionally, drawing bend 18 can be connect by dismountable mode with occlusion part 2, supportive body 1 or frame 200.
Illustratively, the first end of drawing bend 18 is fixedly connected on occlusion part 2, the second end of drawing bend 18 by the modes such as grafting with
Frame 200 is fixed；Alternatively, the first end of drawing bend 18 is solid by the occlusion part 2 of the modes such as grafting and place support bar 100
Fixed, the second end of drawing bend 18 is fixed by the supportive body 1 of the modes such as grafting and adjacent supports item 100, this kind of connection type
Can make drawing bend 18 using more flexible, improve the flexibility of operation.
In addition, can also be adjusted to the shape of occlusion part 2 to reduce the deformation of occlusion part 2, such as reduce occlusion part
2 length and/or the corresponding chamfering of increase 2 curved edge of occlusion part in a first direction, and then production and 2 shape phase of occlusion part
Matched display panel.
The embodiment of the invention also provides a kind of support devices, and as shown in Figure 10, Figure 10 is provided by the embodiment of the present invention
Support device structural schematic diagram, which includes frame 200 and above-mentioned support bar 100.
The support device as provided by the embodiment of the present invention includes above-mentioned support bar 100, it is filled using the support
It sets, the irregular shaped region of substrate 5 to be deposited is blocked using the occlusion part 2 of support bar 100 itself, has both reduced exposure mask piece 4
Manufacture difficulty, improve the aligning accuracy of exposure mask piece 4 Yu substrate 5 to be deposited；Also, it can also be hidden using the balance of slot 3 is etched partially
The stress of stopper 2 avoids occlusion part 2 from occurring to tilt or be bent.
It should be noted that having been carried out in the above-described embodiments using the principle for etching partially balance 2 stress of occlusion part of slot 3 detailed
Describe in detail bright, details are not described herein again.
The embodiment of the invention also provides a kind of evaporation coating methods of display panel, in conjunction with Fig. 2, the evaporation coating method include:
During vapor deposition, substrate 5 to be deposited is blocked using above-mentioned support bar 100, makes to be supported item 100 in substrate 5 to be deposited
The region blocked of occlusion part 2 be not vapor-deposited with film layer.
In the evaporation coating method, by the occlusion part 2 using support bar 100 to the abnormity of substrate 5 to be deposited preset place into
Row blocks, and the vapor deposition of the substrate to be deposited 5 to abnormity is also able to achieve with the use of the exposure mask piece 4 of conventional shape, and exposure mask piece 4 is not necessarily to
Place is preset with the abnormity of substrate 5 to be deposited to match, reduces the manufacture difficulty of exposure mask piece 4, improves the production essence of exposure mask piece 4
Degree, and the aligning accuracy of exposure mask piece 4 Yu substrate 5 to be deposited can also be improved, and then improve the accuracy of plating film location, it improves
Display performance.
In addition, for support bar 100, moreover it is possible to using the weight for etching partially the mitigation occlusion part 2 of slot 3, to support bar 100
When stretching, the stress of occlusion part 2 is balanced, avoids occlusion part 2 from bending or tilt, to effectively prevent curved by occlusion part 2
Plated film colour mixture caused by song and the problem of scratched to exposure mask piece 4 and substrate to be deposited 5 caused by being tilted by occlusion part 2.
Optionally, substrate 5 to be deposited is blocked using support bar 100, makes to be supported item 100 in substrate 5 to be deposited
Not to be vapor-deposited with film layer include: the placement exposure mask piece 4 on support bar 100 to the region blocked of occlusion part 2, by support bar 100 and cover
Diaphragm 4, exposure mask piece 4 and substrate to be deposited 5 are aligned, and the occlusion part 2 of support bar 100 and the blocked area of exposure mask piece 4 are utilized
Evaporation source 6 is blocked, makes not to be vapor-deposited with film layer in substrate 5 to be deposited region corresponding with occlusion part 2 and blocked area.
Specifically, occlusion part 2 presets place to the abnormity of substrate 5 to be deposited, such as turning and/or grooving in mask process
Default place is blocked, and the non-open region of substrate 5 to be deposited is blocked in the blocked area of exposure mask piece 4, the steaming that evaporation source 6 sprays
Material is plated through the opening delivery of exposure mask piece 4 to substrate 5 to be deposited, luminescent layer is formed in the open region of substrate 5 to be deposited, at it
Film layer is not deposited in region in he, ensure that the accuracy of plated film.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, any modification, equivalent substitution, improvement and etc. done be should be included within the scope of the present invention.
Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention., rather than its limitations；To the greatest extent
Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to
So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into
Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution
The range of scheme.
Claims (15)
1. a kind of support bar for display panel characterized by comprising
Supportive body；
Occlusion part, supportive body orthographic projection institute in the plane, the occlusion part is raised in the first of the supportive body
Side, the occlusion part are equipped with and etch partially slot.
2. support bar according to claim 1, which is characterized in that
Where perpendicular to the supportive body orthographic projection on the direction of plane, the slot that etches partially is located at the occlusion part
Two sides.
3. support bar according to claim 1, which is characterized in that further include:
Balanced structure, the balanced structure are arranged on the supportive body；
Supportive body orthographic projection institute in the plane, the supportive body has central axes, the extension side of the central axes
To, the central axes perpendicular to the supportive body orthographic projection where plane identical as the extending direction of the supportive body
Side is upwardly formed middle axial plane, and the support bar is divided into first part and second part by the middle axial plane, and the support bar exists
The first part is identical with the second part weight.
4. support bar according to claim 3, which is characterized in that the balanced structure includes position balance portion；
Supportive body orthographic projection institute in the plane, the position balance portion is raised in second side of the supportive body,
Described second side is the side opposite with first side, and in a first direction, the orthographic projection in the position balance portion covers institute
The orthographic projection of occlusion part is stated, the first direction is direction of the described second side towards first side.
5. support bar according to claim 3, which is characterized in that the balanced structure includes weight loss groove；
Along the central axes, the weight loss groove is located at the supportive body close to the side of the occlusion part.
6. support bar according to claim 4, which is characterized in that the width of the position balance portion in said first direction
Degree is L1,0.1mm≤L1≤3mm.
7. support bar according to claim 4, which is characterized in that along the central axes, the supportive body is close
The side of the occlusion part is equipped with regulating tank.
8. support bar according to claim 4, which is characterized in that the supportive body includes that the firstth area is arranged in multiple intervals
Domain, each first area are used to support an exposure mask piece group, and an exposure mask piece group includes multiple exposure mask pieces；
The occlusion part includes multiple block units, and the position balance portion includes multiple balancing units, each firstth area
The two sides in domain are respectively arranged with the n block units and a balancing unit, n >=2, wherein the balancing unit
One end is aligned with the 1st block unit, and the other end of the balancing unit is aligned with n-th of block unit.
9. support bar according to claim 8, which is characterized in that the block unit include turning block subelement and/
Or subelement is blocked in grooving.
10. support bar according to claim 4, which is characterized in that the occlusion part, the position balance portion and the branch
Main body is supportted to be integrally formed.
11. support bar according to claim 5, which is characterized in that the quantity of the weight loss groove be it is multiple, it is multiple described to subtract
Baking soda is uniformly distributed.
12. support bar according to claim 1, which is characterized in that the width phase of the supportive body in a first direction
Together, the first direction is direction of first side towards side corresponding thereto.
13. a kind of support device characterized by comprising
Frame；
Such as the described in any item support bars of claim 1~12.
14. a kind of evaporation coating method of display panel characterized by comprising
During vapor deposition, substrate to be deposited is blocked using the described in any item support bars of such as claim 1~12, is made
Film layer is not vapor-deposited with by the region that the occlusion part of the support bar blocks in the substrate to be deposited.
15. evaporation coating method according to claim 14, which is characterized in that carried out using the support bar to substrate to be deposited
Block, make not being vapor-deposited with film layer by the region that the occlusion part of the support bar blocks in the substrate to be deposited include:
Exposure mask piece is placed on the support bar, by the support bar and the exposure mask piece, the exposure mask piece and described to be deposited
Substrate is aligned, and is blocked, is made to evaporation source using the occlusion part of the support bar and the blocked area of the exposure mask piece
The substrate to be deposited is not vapor-deposited with film layer in region corresponding with the occlusion part and the blocked area.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910580335.8A CN110284107A (en) | 2019-06-28 | 2019-06-28 | Supporting strip and supporting device for display panel and evaporation method for display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910580335.8A CN110284107A (en) | 2019-06-28 | 2019-06-28 | Supporting strip and supporting device for display panel and evaporation method for display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110284107A true CN110284107A (en) | 2019-09-27 |
Family
ID=68020094
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910580335.8A Pending CN110284107A (en) | 2019-06-28 | 2019-06-28 | Supporting strip and supporting device for display panel and evaporation method for display panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110284107A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112662993A (en) * | 2020-12-03 | 2021-04-16 | 武汉华星光电半导体显示技术有限公司 | Mask plate, evaporation device and evaporation method |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170207390A1 (en) * | 2016-01-15 | 2017-07-20 | Samsung Display Co., Ltd. | Mask frame assembly, apparatus and method for manufacturing a display apparatus |
| CN206692714U (en) * | 2017-04-14 | 2017-12-01 | 信利（惠州）智能显示有限公司 | A kind of accurate mask plate framework |
| CN107740040A (en) * | 2017-09-08 | 2018-02-27 | 上海天马有机发光显示技术有限公司 | Mask plate component and evaporation coating device |
| CN107994054A (en) * | 2017-11-07 | 2018-05-04 | 上海天马有机发光显示技术有限公司 | A kind of organic EL display panel, its production method and display device |
| CN108365134A (en) * | 2018-02-11 | 2018-08-03 | 京东方科技集团股份有限公司 | Mask plate and its manufacturing method, mask set, evaporation coating method |
| CN108914058A (en) * | 2018-08-20 | 2018-11-30 | 武汉华星光电半导体显示技术有限公司 | A kind of precision metallic mask plate, evaporation coating device and vapor deposition processing procedure |
| CN108998756A (en) * | 2018-07-27 | 2018-12-14 | 京东方科技集团股份有限公司 | Support bar |
| CN109321880A (en) * | 2018-10-18 | 2019-02-12 | 京东方科技集团股份有限公司 | A kind of mask plate |
-
2019
- 2019-06-28 CN CN201910580335.8A patent/CN110284107A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170207390A1 (en) * | 2016-01-15 | 2017-07-20 | Samsung Display Co., Ltd. | Mask frame assembly, apparatus and method for manufacturing a display apparatus |
| CN206692714U (en) * | 2017-04-14 | 2017-12-01 | 信利（惠州）智能显示有限公司 | A kind of accurate mask plate framework |
| CN107740040A (en) * | 2017-09-08 | 2018-02-27 | 上海天马有机发光显示技术有限公司 | Mask plate component and evaporation coating device |
| CN107994054A (en) * | 2017-11-07 | 2018-05-04 | 上海天马有机发光显示技术有限公司 | A kind of organic EL display panel, its production method and display device |
| CN108365134A (en) * | 2018-02-11 | 2018-08-03 | 京东方科技集团股份有限公司 | Mask plate and its manufacturing method, mask set, evaporation coating method |
| CN108998756A (en) * | 2018-07-27 | 2018-12-14 | 京东方科技集团股份有限公司 | Support bar |
| CN108914058A (en) * | 2018-08-20 | 2018-11-30 | 武汉华星光电半导体显示技术有限公司 | A kind of precision metallic mask plate, evaporation coating device and vapor deposition processing procedure |
| CN109321880A (en) * | 2018-10-18 | 2019-02-12 | 京东方科技集团股份有限公司 | A kind of mask plate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112662993A (en) * | 2020-12-03 | 2021-04-16 | 武汉华星光电半导体显示技术有限公司 | Mask plate, evaporation device and evaporation method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103672614B (en) | Backlight module for curved face liquid crystal display device and curved face liquid crystal display device | |
| CN105590605B (en) | The Mura phenomenon compensation method of curved surface liquid crystal panel | |
| CN104977752B (en) | Display device | |
| CN101373570B (en) | Display device | |
| US20210165139A1 (en) | Prism film, backlight module and display device | |
| CN105700214A (en) | Backboard structure and curved surface display | |
| US20040263969A1 (en) | Lenticular antireflection display | |
| CN109306448A (en) | Mask assembly, evaporation coating device, evaporation coating method, array substrate and display panel | |
| JP2007148413A (en) | Method for manufacturing light guiding plate | |
| CN110284107A (en) | Supporting strip and supporting device for display panel and evaporation method for display panel | |
| CN101929640A (en) | Backlight and liquid crystal indicator | |
| US20120006266A1 (en) | Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same | |
| CN102013214A (en) | Flat panel display and assembling method thereof | |
| KR100403772B1 (en) | The Flat CRT(Cathode-ray Tube) Having The Improved Coating | |
| CN102890347A (en) | Liquid crystal display device including side supporting means and method of fabricating the same | |
| US8325294B2 (en) | Backlight unit including lamp guide | |
| WO2013149410A1 (en) | Liquid crystal display device | |
| US20060270243A1 (en) | Alignment shield for evaporator used in thin film deposition | |
| CN105132881B (en) | Optical thin film system design method for large-caliber lens with curvature radius ratio | |
| CN110187545A (en) | Color membrane substrates and display panel | |
| CN108251795A (en) | Evaporation device and evaporation method thereof | |
| CN101743508B (en) | Light guide panel comprising symmetric front prism and asymmetric front prism for back light unit of LCD | |
| TW201939134A (en) | Backlight module with light modulation device | |
| CN205331987U (en) | Backlight unit , backlight and display device | |
| CN104166272A (en) | Electronic device with perspective display function and display device thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20190927 |