CN110277426A - A kind of AMOLED display panel and preparation method thereof - Google Patents
A kind of AMOLED display panel and preparation method thereof Download PDFInfo
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- CN110277426A CN110277426A CN201810209347.5A CN201810209347A CN110277426A CN 110277426 A CN110277426 A CN 110277426A CN 201810209347 A CN201810209347 A CN 201810209347A CN 110277426 A CN110277426 A CN 110277426A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Abstract
The present invention relates to field of display technology, disclose a kind of AMOLED display panel and preparation method thereof, the display panel includes the anode layer formed along bottom to top layer direction, organic luminous layer, cathode layer, coating and encapsulated layer TFE, TFE includes at least one by organic film and inorganic film along bottom to the stacked stacked structure formed in top layer direction, and the film layer that stacked structure is contacted with coating is the first inorganic film, first inorganic film includes plasma resistant barrier, three sub- film layers of clad and water blocking layer, wherein: plasma resistant barrier, three sub- film layers of clad and water blocking layer are set gradually along bottom to top layer direction.Therefore, the display panel is excellent by changing TFE structure, can not only enhance block-water effect, but also can avoid the organic luminous layer in TFE preparation process and be damaged, conducive to the service life for extending organic luminous layer, improve the luminous efficiency of AMOLED display panel.
Description
Technical field
The present invention relates to field of display technology, in particular to a kind of AMOLED display panel and preparation method thereof.
Background technique
In recent years, flat panel display has obtained development by leaps and bounds, while consumer is to display device color and light degree
Demand is also higher and higher.Active matrix organic light-emitting diode (Active-matrix organic light emitting
Diode, abbreviation AMOLED) display has many advantages, such as flexible, low energy consumption, ultra-thin and healthy eyeshield, has become next
For the trend of display technology development.At present for industry, in the field AMOLED, thin film encapsulation technology be its core technology it
One.
Since AMOLED is very sensitive to vapor and oxygen, thus penetrate into the vapor of device inside and oxygen is
Influence the principal element in AMOLED service life.Therefore, carrying out effective thin-film package to organic luminous layer can prevent water oxygen invasion from leading
Cause the failure of device.The structure of flexible organic luminous layer traditional at present is that " 1/ organic luminous layer of anode layer, 2/ cathode layer 3/ covers
The sandwich type sandwich (as shown in Figure 1) that 4/ encapsulated layer TFE5 " of cap rock is formed, wherein organic luminous layer 2,3 and of cathode layer
Coating 4 is mainly the method preparation by vapor deposition, and TFE5 is the lamination knot that inorganic film 51 and organic film 52 are staggeredly accumulated
Structure mainly passes through the vapour deposition process of plasma enhanced chemical (Plasma Enhanced Chemical
VaporDeposition, abbreviation PECVD) equipment preparation, and the ion in PECVD processing procedure can cause to damage to organic luminous layer 2
Wound causes organic luminous layer luminous efficiency to reduce the problem of even failing.
Summary of the invention
The present invention provides a kind of AMOLED display panel and preparation method thereof, above-mentioned AMOLED display panel passes through optimization
The structure of TFE can not only enhance block-water effect, but also can avoid the organic luminous layer in TFE preparation process and be damaged, conducive to prolonging
The service life of long organic luminous layer improves the luminous efficiency of AMOLED display panel.
In order to achieve the above objectives, the present invention the following technical schemes are provided:
A kind of AMOLED display panel is formed with anode layer along bottom to top layer direction, organic luminous layer, cathode layer, covers
Cap rock and encapsulated layer TFE, the TFE include at least one by organic film and inorganic film along the bottom to top layer direction
The stacked stacked structure formed, and the film layer that the stacked structure is contacted with the coating is the first inorganic film, described the
One inorganic film includes three plasma resistant barrier, clad and water blocking layer film layers, in which:
Three plasma resistant barrier, clad and water blocking layer film layers are successively set along the bottom to top layer direction
It sets, and the material for preparing of the plasma resistant barrier is the material with blocking plasma effect, the clad prepares material
Material is the good material of cladding ability, and the material for preparing of the water blocking layer is the material for having water-resisting ability.
In AMOLED display panel provided by the invention, which includes being arranged along bottom to top layer direction
Anode layer, organic luminous layer, cathode layer, coating and encapsulated layer TFE, and TFE includes at least one by organic film and
Inorganic film is stacked the stacked structure formed along bottom to top layer direction, and in the stacked structure: stacked structure and coating
The film layer of contact is the first inorganic film, which includes the plasma resistance along bottom to top layer direction stacked arrangement
Barrier, clad and water blocking layer.In said structure, since plasma resistant barrier is set to the side that coating deviates from bottom,
And plasma resistant barrier prepare material be with stop plasma effect material, then plasma resistant barrier can reduce itself at
It is damaged caused by ion pair organic luminous layer during shape in PECVD, extends the service life of organic luminous layer, improved
The luminous efficiency of AMOLED display panel；Moreover, because being set to plasma resistant barrier away from the preparation of the clad of bottom side
Material is the good material of cladding ability, then clad can be improved to the particle for deviating from one side surface of bottom positioned at plasma resistant barrier
Cladding ability, reduce the intrusion path of hydrone, the waterproofing protection to organic luminous layer formed, so as to further extend
The service life of organic luminous layer improves the luminous efficiency of AMOLED display panel；Further, since being set to clad deviates from bottom
The material for preparing of the water blocking layer of side is the material for having water-resisting ability, then water blocking layer further improves the first inorganic film
Block-water effect.
AMOLED display panel provided by the invention by plasma resistant barrier in the first inorganic film, clad and
Each of water blocking layer film layer gives full play to respective effect, so that the first inorganic film is being reduced to organic layer luminescent layer damage
Multiple tracks protective barrier can also be provided to obstruct the invasion of steam while wound, to guarantee and extend shining for organic luminous layer
Efficiency and service life；Moreover, in AMOLED display panel provided by the invention first inorganic film three sub- film layers
It is prepared in PECVD device, without introducing other process apparatus, convenient for improving production efficiency, reducing production cost.
Therefore, above-mentioned AMOLED display panel not only increases block-water effect, and avoid by the structure of optimization TFE
Organic luminous layer is damaged in the TFE preparation process, conducive to the service life for extending organic luminous layer, is improved AMOLED and is shown
The luminous efficiency of panel.
Preferably, described that there is the material for stopping plasma effect also to have resistance effect.
Preferably, the plasma resistant barrier and the water blocking layer to prepare material identical；Alternatively,
The plasma resistant barrier prepares material difference with the water blocking layer.
Preferably, the material for preparing of the plasma resistant barrier is in silicon nitride, titanium oxide, aluminium oxide and silica
It is one or more kinds of；And/or
The material for preparing of the water blocking layer is one or more of silicon nitride, titanium oxide, aluminium oxide and silica.
Preferably, the clad prepare material be silicon oxynitride, silica, silicon carbide, silicon oxide carbide, aluminium oxide with
And one or more of zirconium oxide.
Preferably, the thickness range of the plasma resistant barrier is 50~200nm；And/or；
The thickness range of the clad is 300~1000nm；And/or；
The thickness range of the water blocking layer is 500~1000nm.
The present invention also provides a kind of preparation methods of AMOLED display panel, comprising:
Anode layer, organic luminous layer, cathode layer, coating and encapsulated layer TFE are sequentially formed along bottom to top layer direction；
The TFE includes at least one by organic film and inorganic film along the bottom to the stacked stacking knot formed in top layer direction
Structure, and the film layer that the stacked structure is contacted with the coating is the first inorganic film, forms first inorganic film
Method includes:
It deposits to form plasma resistant barrier with low-pressure on the coating, and the plasma resistant barrier prepares material
Material is with the material for stopping plasma effect；
Clad is formed on the plasma resistant barrier, and the material for preparing of the clad is the good material of cladding ability
Material；
Water blocking layer is formed on the clad, and the material for preparing of the water blocking layer is the material for having water-resisting ability.
Preferably, the pressure limit of the low-pressure deposition is 1000~1500mtorr.
Detailed description of the invention
Fig. 1 is AMOLED display panel structure figure in the prior art；
Fig. 2 is AMOLED display panel structure schematic diagram provided in an embodiment of the present invention；
Fig. 3 is the first inorganic film preparation flow in AMOLED display panel preparation method provided in an embodiment of the present invention
Figure.
Icon: 1- anode layer；2- organic luminous layer；3- cathode layer；4- coating；5-TFE；51- inorganic film；52- has
Machine film layer；The first inorganic film of 53-；531- plasma resistant barrier；532- clad；533- water blocking layer.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Referring to FIG. 2, the present invention provides a kind of AMOLED display panel, along bottom to top layer direction be formed with anode layer 1,
Organic luminous layer 2, cathode layer 3, coating 4 and encapsulated layer TFE5, TFE5 include at least one by organic film 52 and inorganic
Film layer 51 is along bottom to the stacked stacked structure formed in top layer direction, and the film layer that stacked structure is contacted with coating 4 is first
Inorganic film 53, the first inorganic film 53 include 533 3 plasma resistant barrier 531, clad 532 and water blocking layer films
Layer, in which:
533 3 plasma resistant barrier 531, clad 532 and water blocking layer film layers along bottom to top layer direction successively
Setting, and the material for preparing of plasma resistant barrier 531 is the material with blocking plasma effect, clad 532 prepares material
Material is the good material of cladding ability, and the material for preparing of water blocking layer 533 is the material for having water-resisting ability.
In AMOLED display panel provided by the invention, which includes being arranged along bottom to top layer direction
Anode layer 1, organic luminous layer 2, cathode layer 3, coating 4 and encapsulated layer TFE5, and TFE5 includes at least one by organic
Film layer 52 and inorganic film 51 are stacked the stacked structure formed along bottom to top layer direction, and in the stacked structure: stacking knot
The film layer that structure is contacted with coating 4 is the first inorganic film 53, which includes along bottom to top layer direction heap
Plasma resistant barrier 531, clad 532 and the water blocking layer 533 of stack arrangement.In said structure, due to plasma resistant barrier
531 are set to the side that coating 4 deviates from bottom, and the material for preparing of plasma resistant barrier 531 is with blocking plasma effect
Material, then caused by plasma resistant barrier 531 can reduce the ion pair organic luminous layer 2 in itself forming process in PECVD
Damage extends the service life of organic luminous layer 2, improves the luminous efficiency of AMOLED display panel；Moreover, because be set to it is equal from
Sub- barrier layer 531 is the good material of cladding ability away from the material for preparing of the clad 532 of bottom side, then clad 532 can
It improves to plasma resistant barrier 531 is located at away from the cladding ability of the particle of one side surface of bottom, reduces the invasion road of hydrone
Diameter forms the waterproofing protection to organic luminous layer 2, so as to further extend the service life of organic luminous layer 2, improves
The luminous efficiency of AMOLED display panel；Further, since being set to clad 532 away from the preparation of the water blocking layer 533 of bottom side
Material is the material for having water-resisting ability, then water blocking layer 533 further improves the block-water effect of the first inorganic film 53.
AMOLED display panel provided by the invention passes through the plasma resistant barrier 531 in the first inorganic film 53, cladding
Layer each of 532 and water blocking layer 533 film layer give full play to respective effect, so that the first inorganic film 53 is in reduction pair
Organic layer luminescent layer can also provide multiple tracks protective barrier while damage to obstruct the invasion of steam, to guarantee and extend
The luminous efficiency and service life of machine luminescent layer 2；Moreover, the first inorganic film 53 in AMOLED display panel provided by the invention
Three sub- film layers can be prepared in PECVD device, without introducing other process apparatus, convenient for improving production efficiency, reducing
Production cost.
Therefore, above-mentioned AMOLED display panel can not only enhance block-water effect, but also can keep away by the structure of optimization TFE5
Exempt from the organic luminous layer 2 in TFE5 preparation process to be damaged, conducive to the service life for extending organic luminous layer 2, improves AMOLED
The luminous efficiency of display panel.
In addition, the TFE5 in AMOLED display panel provided by the invention further includes being set to the first inorganic film 53 bottom of away from
The organic film 52 and other inorganic films 51 of layer side, which can be completely by particle Bao Li produced during the preparation process
Any vacancy is not stayed in face, to provide multiple tracks protective barrier for organic luminous layer 2.
Based on the above technical solution, in order to further enhance the block-water effect of the first inorganic film 53, as one
Kind preferred embodiment, there is the material for stopping plasma effect also to have resistance effect.
It should be noted that the effect for preparing material and can also having blocking plasma of water blocking layer 533, if using the material
Material can make water blocking layer 533 obtain in preparation process and further decrease damage of the PECVD intermediate ion to organic luminous layer 2, and extension has
The service life of machine luminescent layer 2.
Based on the above technical solution, it should be noted that when the system of plasma resistant barrier 531 and water blocking layer 533
When standby material is provided with the effect of blocking plasma and resistance effect, the plasma resistant barrier 531 of selection prepares material and blocks water
The material for preparing of layer 533 may be the same or different.
Specifically, the material for preparing of plasma resistant barrier 531 can be in silicon nitride, titanium oxide, aluminium oxide and silica
One or more；And/or
The material for preparing of water blocking layer 533 can be one of silicon nitride, titanium oxide, aluminium oxide and silica or more
Kind.
Based on the above technical solution, it should be noted that clad 532 prepare material can for silicon oxynitride,
One or more of silica, silicon carbide, silicon oxide carbide, aluminium oxide and zirconium oxide.
Based on the above technical solution, in order to avoid film layer it is excessively thin caused by film layer effectiveness weaken and film layer
The larger problem of stress caused by blocked up is chosen as a preferred implementation manner:
The thickness range of plasma resistant barrier 531 is 50~200nm；And/or；
The thickness range of clad 532 is 300~1000nm；And/or；
The thickness range of water blocking layer 533 is 500~1000nm.
The present invention also provides a kind of preparation methods of AMOLED display panel, comprising:
Anode layer 1, organic luminous layer 2, cathode layer 3, coating 4 and encapsulated layer are sequentially formed along bottom to top layer direction
TFE5；TFE5 includes at least one by organic film 52 and inorganic film 51 along bottom to the stacked stacking knot formed in top layer direction
Structure, and the film layer that stacked structure is contacted with coating 4 is the first inorganic film 53, forms the method packet of the first inorganic film 53
It includes, please refers to Fig. 3:
Step S101: it deposits to form plasma resistant barrier 531 with low-pressure on coating 4, and plasma resistant barrier 531
Prepare material be with stop plasma effect material；
Step S102: clad 532 is formed on plasma resistant barrier 531, and the material for preparing of clad 532 is cladding
The good material of ability；
Step S103: water blocking layer 533 is formed on clad 532, and the material for preparing of water blocking layer 533 is to have the energy that blocks water
The material of power.
It include: along bottom to top layer using display panel prepared by AMOLED display panel preparation method provided by the invention
Anode layer 1, organic luminous layer 2, cathode layer 3, coating 4 and the encapsulated layer TFE5 of direction setting, and TFE5 includes at least one
It is a to be stacked the stacked structure formed along bottom to top layer direction by organic film 52 and inorganic film 51, and in the stacked structure
In: the film layer that stacked structure is contacted with coating 4 is the first inorganic film 53, which includes along bottom to top
Plasma resistant barrier 531, clad 532 and the water blocking layer 533 of layer direction stacked arrangement.In said structure, due to it is equal from
Sub- barrier layer 531 is set to the side that coating 4 deviates from bottom, and the material for preparing of plasma resistant barrier 531 is with blocking etc.
The material of ionization, then plasma resistant barrier 531 can reduce the ion pair organic luminous layer in itself forming process in PECVD
It is damaged caused by 2, extends the service life of organic luminous layer 2, improve the luminous efficiency of AMOLED display panel；Moreover, because
The material for preparing for deviating from the clad 532 of bottom side set on plasma resistant barrier 531 is the good material of cladding ability, then coats
Layer 532 can be improved to plasma resistant barrier 531 is located at away from the cladding ability of the particle of one side surface of bottom, reduce hydrone
Intrusion path forms the waterproofing protection to organic luminous layer 2, so as to further extend the service life of organic luminous layer 2,
Improve the luminous efficiency of AMOLED display panel；Further, since deviating from the water blocking layer 533 of bottom side set on clad 532
Preparing material is the material for having water-resisting ability, then water blocking layer 533 further improves the effect that blocks water of the first inorganic film 53
Fruit.
Display panel using AMOLED display panel preparation method provided by the invention preparation passes through the first inorganic film
Each of plasma resistant barrier 531, clad 532 and water blocking layer 533 in 53 film layer gives full play to respective effect,
So that the first inorganic film 53 can also provide multiple tracks while reducing and damaging to organic layer luminescent layer to obstruct the invasion of steam
Protective barrier, to guarantee and extend the luminous efficiency and service life of organic luminous layer 2；Moreover, being provided using the present invention
The preparation of AMOLED display panel preparation method display panel in three sub- film layers of the first inorganic film 53 can be in PECVD
It is prepared in equipment, without introducing other process apparatus, convenient for improving production efficiency, reducing production cost.
Based on the above technical solution, specifically, the pressure limit of low-pressure deposition is 1000~1500mtorr.
Obviously, those skilled in the art can carry out various modification and variations without departing from this hair to the embodiment of the present invention
Bright spirit and scope.In this way, if these modifications and changes of the present invention belongs to the claims in the present invention and its equivalent technologies
Within the scope of, then the present invention is also intended to include these modifications and variations.
Claims (8)
1. a kind of AMOLED display panel is formed with anode layer, organic luminous layer, cathode layer, covering along bottom to top layer direction
Layer and encapsulated layer TFE, which is characterized in that the TFE include at least one by organic film and inorganic film along the bottom
It is stacked the stacked structure formed to top layer direction, and the film layer that the stacked structure is contacted with the coating is the first inoranic membrane
Layer, first inorganic film includes three plasma resistant barrier, clad and water blocking layer film layers, in which:
Three plasma resistant barrier, clad and water blocking layer film layers are set gradually along the bottom to top layer direction,
And the material for preparing of the plasma resistant barrier is the material with blocking plasma effect, the material for preparing of the clad is
The material for preparing of the good material of cladding ability, the water blocking layer is the material for having water-resisting ability.
2. AMOLED display panel according to claim 1, which is characterized in that described that there is the material for stopping plasma effect
Material also has resistance effect.
3. AMOLED display panel according to claim 2, which is characterized in that the plasma resistant barrier and described block water
Layer to prepare material identical；Alternatively,
The plasma resistant barrier prepares material difference with the water blocking layer.
4. AMOLED display panel according to claim 3, which is characterized in that the plasma resistant barrier prepares material
For one or more of silicon nitride, titanium oxide, aluminium oxide and silica；And/or
The material for preparing of the water blocking layer is one or more of silicon nitride, titanium oxide, aluminium oxide and silica.
5. AMOLED display panel according to claim 4, which is characterized in that the material for preparing of the clad is nitrogen oxygen
One or more of SiClx, silica, silicon carbide, silicon oxide carbide, aluminium oxide and zirconium oxide.
6. AMOLED display panel according to claim 1-5, which is characterized in that the plasma resistant barrier
Thickness range is 50~200nm；And/or；
The thickness range of the clad is 300~1000nm；And/or；
The thickness range of the water blocking layer is 500~1000nm.
7. a kind of preparation method of AMOLED display panel characterized by comprising
Anode layer, organic luminous layer, cathode layer, coating and encapsulated layer TFE are sequentially formed along bottom to top layer direction；It is described
TFE includes at least one by organic film and inorganic film along the bottom to the stacked stacked structure formed in top layer direction, and
The film layer that the stacked structure is contacted with the coating is the first inorganic film, forms the method packet of first inorganic film
It includes:
It deposits to form plasma resistant barrier with low-pressure on the coating, and the material for preparing of the plasma resistant barrier is
With the material for stopping plasma effect；
Clad is formed on the plasma resistant barrier, and the material for preparing of the clad is the good material of cladding ability；
Water blocking layer is formed on the clad, and the material for preparing of the water blocking layer is the material for having water-resisting ability.
8. preparation method according to claim 7, which is characterized in that the pressure limit of low-pressure deposition is 1000~
1500mtorr。
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| CN201810209347.5A CN110277426A (en) | 2018-03-14 | 2018-03-14 | A kind of AMOLED display panel and preparation method thereof |
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| CN201810209347.5A CN110277426A (en) | 2018-03-14 | 2018-03-14 | A kind of AMOLED display panel and preparation method thereof |
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| CN106449707A (en) * | 2016-10-31 | 2017-02-22 | 上海天马微电子有限公司 | Organic light emitting display panel and manufacture method thereof |
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| CN101730949A (en) * | 2007-05-16 | 2010-06-09 | Otb太阳能有限公司 | Method for applying a thin-film encapsulation layer assembly to an organic device, and an organic device provided with a thin-film encapsulation layer assembly preferably applied with such a method |
| US20160260929A1 (en) * | 2013-02-14 | 2016-09-08 | Samsung Display Co., Ltd. | Organic electroluminescent device having thin film encapsulation structure and method of fabricating the same |
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Application publication date: 20190924 |