CN110265324A - A kind of wafer detecting apparatus - Google Patents

A kind of wafer detecting apparatus Download PDF

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Publication number
CN110265324A
CN110265324A CN201910474761.3A CN201910474761A CN110265324A CN 110265324 A CN110265324 A CN 110265324A CN 201910474761 A CN201910474761 A CN 201910474761A CN 110265324 A CN110265324 A CN 110265324A
Authority
CN
China
Prior art keywords
wafer
sensors
controller
sensor
slot position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910474761.3A
Other languages
Chinese (zh)
Inventor
郭文海
钟艾东
甘凯杰
翁佩雪
林锦伟
赵玉会
邓丹丹
林伟铭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UniCompound Semiconductor Corp
Original Assignee
UniCompound Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UniCompound Semiconductor Corp filed Critical UniCompound Semiconductor Corp
Priority to CN201910474761.3A priority Critical patent/CN110265324A/en
Publication of CN110265324A publication Critical patent/CN110265324A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67259Position monitoring, e.g. misposition detection or presence detection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67288Monitoring of warpage, curvature, damage, defects or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present invention discloses a kind of wafer detecting apparatus, including controller, two sensors and sensor fixed mechanism, two sensors are arranged on sensor fixed mechanism, plane where two center sensors is parallel with cassette slot position, two sensors and sensor fixed mechanism are connect with controller, controller controls the lifting of sensor fixed mechanism so that two sensors successively scan the slot position inside cassette, two sensors scan the two sides of same slot position respectively every time, and controller is used to export wafer oblique cutting information when the signal that two sensors acquire is inconsistent.This programme corresponds to slot position to cassette by two sensors and is scanned, it can be determined that wafer whether there is the abnormal conditions of oblique cutting, avoid generating the fragmentation exception because of caused by wafer oblique cutting in production process.

Description

A kind of wafer detecting apparatus
Technical field
The present invention relates to automation equipment field more particularly to a kind of wafer detecting apparatus.
Background technique
Wafer machines carry out the crawl of wafer by the arm of solid mechanical formula, automatically grab wafer in mechanical arm Before, the scanning for needing first to carry out wafer state information is read, and is believed with the cassette slot position etc. for obtaining the quantity of wafer and being placed Breath carries out accurate wafer crawl to mechanical arm to feed back by control terminal and assign instruction.Industry is common single at present The sub-scannings device such as sensor scans the cassette to operation, so that the analysis of data feedback control terminal is obtained pair that wafer is placed Slot position is answered, instruction is precisely assigned to mechanical arm and carries out wafer crawl.But board only scans whether cassette corresponds to slot position at present There is wafer, can not judge that wafer whether there is the abnormal conditions of oblique cutting.When oblique cutting occurs, grabbing wafer at this time will lead to wafer It is broken.
Summary of the invention
For this reason, it may be necessary to provide a kind of wafer detecting apparatus, wafer oblique cutting feelings can not be obtained by solving existing wafer machines The problem of condition.
To achieve the above object, a kind of wafer detecting apparatus, including controller, two sensors and biography are inventor provided Sensor fixed mechanism, two sensors are arranged on sensor fixed mechanism, plane and cassette slot where two center sensors Bit parallel, two sensors and sensor fixed mechanism are connect with controller, and controller control sensor fixed mechanism lifting makes It obtains two sensors and successively scans the slot position inside cassette, two sensors scan the two sides of same slot position respectively every time, control Device is used to export wafer oblique cutting information when the signal that two sensors acquire is inconsistent.
It further, further include the mechanical arm of rotary type, controller is connect with mechanical arm, and controller is used in crystalline substance When circle oblique cutting, control mechanical arm rotation one grabs wafer after adjusting the angle.
Further, the controller is used to recycle trigonometric function to calculate according to the width and difference in height of oblique cutting wafer oblique Limb angle value is to adjust the angle.
Further, the controller has crystalline substance for when all collecting signal according to two sensors, exporting the slot position Round information.
Further, the controller is for exporting the slot position and not having when all not collecting signal according to two sensors There is the information of wafer.
Further, the sensor is camera or distance measuring sensor.
It is different from the prior art, above-mentioned technical proposal corresponds to slot position to cassette by two sensors and is scanned, can be with Judge that wafer whether there is the abnormal conditions of oblique cutting, avoids generating the fragmentation exception because of caused by wafer oblique cutting in production process.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of wafer detecting apparatus described in specific embodiment;
Fig. 2 is the structural schematic diagram of wafer normal storage in cassette described in specific embodiment;
Fig. 3 is the structural schematic diagram of wafer oblique cutting in cassette described in specific embodiment;
Fig. 4 is the structural schematic diagram of wafer oblique cutting angle calculation in cassette described in specific embodiment;
Fig. 5 is the structural schematic diagram of wafer oblique cutting angle calculation in cassette described in specific embodiment.
Description of symbols:
10, sensor;
11, sensor fixed mechanism;
12, cassette;
13, slot position.
Specific embodiment
Technology contents, construction feature, the objects and the effects for detailed description technical solution, below in conjunction with specific reality It applies example and attached drawing is cooperated to be explained in detail.
Fig. 1 to Fig. 5 is please referred to, the present embodiment provides a kind of wafer detecting apparatus, including controller, controller be can be set Perhaps setting such as can be computer, PLC controller or embedded Control in wafer machines in wafer detecting apparatus Device etc..It further include two sensors 10 and sensor fixed mechanism 11, two sensors are arranged on sensor fixed mechanism, and two Plane where a center sensor is parallel with 12 slot position 13 of cassette, when such wafer is normally placed in slot position, two sensings Plane where device center can be parallel with wafer.Two sensors and sensor fixed mechanism are connect with controller, controller control Sensor fixed mechanism is gone up and down so that two sensors successively scan the slot position inside cassette, can scan from top to bottom or from Under up scan.Two sensors scan the two sides of same slot position respectively every time, what controller was used to acquire in two sensors Wafer oblique cutting information is exported when signal is inconsistent.When normal, more wafers are placed in cassette, as shown in Fig. 2, wafer is horizontally It is placed in each slot position.Controller control sensor fixed mechanism center sensor is risen to it is parallel with each slot position, and If having wafer in slot position afterwards, then two sensors can all collect wafer information, if can all collect not without wafer There is wafer information.
Specifically when acquisition judges, Fig. 2 and Fig. 3 are please referred to, Fig. 2 is the schematic diagram that each wafer is all normally placed, then passes When sensor fixed mechanism drives sensor to scan from top to bottom, in the slot position for having wafer, such as slot position 1,2,4,5,7, two Sensor can scan the two sides of wafer, and two sensors can all collect wafer, and collected information is consistent.In no wafer Slot position, such as slot position 3,6, sensor can scan empty situation, and collected information is consistent, then wafer does not have oblique cutting.Fig. 3 is There is the case where wafer oblique cutting schematic diagram, then when sensor fixed mechanism drives sensor to scan from top to bottom, in scanning slot When position 5, the case where it is empty information that the sensor in left side, which collects wafer, and the sensor on right side has collected wafer, Then the collected information of the sensor of two sides is inconsistent, and being judged as has wafer oblique cutting.When scanning slot position 6, the biography on right side The case where it is empty information that sensor, which collects wafer, and the sensor on right side has collected wafer, then the sensor acquisition of two sides The information arrived is inconsistent, and being judged as has wafer oblique cutting.Have tiltedly so as to board, avoid this information conveyance directly to grab The slot position for inserting wafer avoids generating the fragmentation exception because of caused by wafer oblique cutting in production process.
In order to realize the crawl to oblique cutting wafer, the present apparatus further includes the mechanical arm of rotary type, and mechanical arm is to grab The mechanical arm of wafer is taken, front end has rotating mechanism, the handgrip of mechanical arm can be driven to rotate, so as to grab inclination Wafer.Controller is connect with mechanical arm, and controller is used in wafer oblique cutting, and control mechanical arm rotation one adjusts the angle After grab wafer.Adjustment angle can be pre-stored in controller, if cassette is fixed type, then its inclination angle of the wafer of oblique cutting It spends substantially stationary, it is only necessary to know turn left inclined downward or inclined downward of turning right.By scanning from top to bottom, if The collected information of two side sensers is inconsistent for the first time and is that right sensor has wafer, as shown in figure 4, then illustrating on the left of wafer Downward oblique cutting, then wafer is turned left inclined downward, then controller drives mechanical arm to rotate an adjustment angle toward lower left.If The collected information of two side sensers is inconsistent for the first time and is that left sensor has wafer, as shown in figure 5, then illustrating on the right side of wafer Downward oblique cutting, then wafer is turned right inclined downward, then controller drives mechanical arm to rotate an adjustment angle toward lower right.
In certain embodiments, tilt angle can also be calculated automatically by controller, the controller is used for root It recycles trigonometric function to calculate oblique cutting angle value according to the width and difference in height of oblique cutting wafer to be to adjust the angle, may be implemented so certainly Dynamic angle calculation.In certain embodiments, the height of oblique cutting wafer can also be calculated automatically by sensor fixed mechanism It is poor to spend, and specifically, the time of oblique cutting wafer is collected by the up and down motion speed and sensor of sensor fixed mechanism The two multiplication is calculated the difference in height of oblique cutting wafer two sides by difference, then sharp again according to difference in height and two sensor spacing Calculating oblique cutting angle value with trigonometric function is adjustment angle.The time difference of oblique cutting wafer is side scanning to wafer to the other side Scan the time difference of wafer.So as to realize the automatic calculating of wafer oblique cutting angle.It is high to can be adapted for different slot positions Degree.Generally, the rotating mechanism of mechanical arm is all in the position of center, is also to grab in middle position when taking wafer It takes, then the height at its center of the wafer of oblique cutting can decline, and controller is collecting oblique cutting crystalline substance by obtaining sensor fixed mechanism Two round side positions take median according to two side positions, it can get the middle position of wafer, then controller can drive Dynamic mechanical arm rotates an adjustment angle to the position, it can crawl.
And which slot position having wafer to make board available, which slot position does not have wafer, and the controller is used When all collecting signal according to two sensors, the information that the slot position has wafer is exported.And it can control device and obtain this When sensor fixed mechanism position, i.e. the position of wafer then can control mechanical arm to the position and carry out crawl wafer. The controller is for when all not collecting signal according to two sensors, exporting the slot position not to have the information of wafer.
Two sensors can be identical structure, can only can get wafer situation, and such as sensor is camera shooting Head or distance measuring sensor.Then it can judge whether image specific position has by way of Image Acquisition if it is camera Wafer.If it is distance measuring sensor, such as laser or infrared, can be judged as there is wafer by measuring relatively short distance, measure compared with No wafer is judged over long distances.
It should be noted that being not intended to limit although the various embodiments described above have been described herein Scope of patent protection of the invention.Therefore, it based on innovative idea of the invention, change that embodiment described herein is carried out and is repaired Change, or using equivalent structure or equivalent flow shift made by description of the invention and accompanying drawing content, it directly or indirectly will be with Upper technical solution is used in other related technical areas, is included within scope of patent protection of the invention.

Claims (6)

1. a kind of wafer detecting apparatus, it is characterised in that: including controller, two sensors and sensor fixed mechanism, two Sensor is arranged on sensor fixed mechanism, and plane where two center sensors is parallel with cassette slot position, two sensors It is connect with sensor fixed mechanism with controller, controller controls the lifting of sensor fixed mechanism so that two sensors are successively swept The slot position inside cassette is retouched, two sensors scan the two sides of same slot position respectively every time, and controller is used in two sensors Wafer oblique cutting information is exported when the signal of acquisition is inconsistent.
2. a kind of wafer detecting apparatus according to claim 1, it is characterised in that: further include the manipulator of rotary type Arm, controller are connect with mechanical arm, and controller is used in wafer oblique cutting, and control mechanical arm rotation one is grabbed after adjusting the angle Take wafer.
3. a kind of wafer detecting apparatus according to claim 2, it is characterised in that: the controller is used for according to oblique cutting crystalline substance It is to adjust the angle that round width and difference in height, which recycle trigonometric function to calculate oblique cutting angle value,.
4. a kind of wafer detecting apparatus according to claim 1, it is characterised in that: the controller is used to be passed according to two When sensor all collects signal, the information that the slot position has wafer is exported.
5. a kind of wafer detecting apparatus according to claim 1, it is characterised in that: the controller is used to be passed according to two When sensor does not all collect signal, exporting the slot position does not have the information of wafer.
6. a kind of wafer detecting apparatus according to claim 1, it is characterised in that: the sensor is camera or survey Away from sensor.
CN201910474761.3A 2019-06-03 2019-06-03 A kind of wafer detecting apparatus Pending CN110265324A (en)

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Application Number Priority Date Filing Date Title
CN201910474761.3A CN110265324A (en) 2019-06-03 2019-06-03 A kind of wafer detecting apparatus

Publications (1)

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CN110265324A true CN110265324A (en) 2019-09-20

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111180378A (en) * 2019-12-31 2020-05-19 中芯集成电路(宁波)有限公司 Method and device for detecting wafer oblique insertion in wafer boat
CN112729181A (en) * 2020-12-25 2021-04-30 上海广川科技有限公司 Device and method for carrying out wafer positioning detection

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02154105A (en) * 1988-12-05 1990-06-13 Nec Corp Inspection instrument for wafer cassette distortion
JPH06211320A (en) * 1993-01-12 1994-08-02 Sony Corp Wafer carrying-in and out device
JPH10173030A (en) * 1996-12-10 1998-06-26 Canon Inc Substrate carrier and exposure apparatus using the same
CN1242753A (en) * 1997-10-17 2000-01-26 奥林巴斯光学工业株式会社 Waffer transport device
JP2002270674A (en) * 2001-03-14 2002-09-20 Disco Abrasive Syst Ltd Carry-out device
JP2002305224A (en) * 2001-04-05 2002-10-18 Oki Electric Ind Co Ltd Wafer storage unit
CN103346098A (en) * 2013-05-14 2013-10-09 上海集成电路研发中心有限公司 System and method for static scanning of silicon chip position information

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02154105A (en) * 1988-12-05 1990-06-13 Nec Corp Inspection instrument for wafer cassette distortion
JPH06211320A (en) * 1993-01-12 1994-08-02 Sony Corp Wafer carrying-in and out device
JPH10173030A (en) * 1996-12-10 1998-06-26 Canon Inc Substrate carrier and exposure apparatus using the same
CN1242753A (en) * 1997-10-17 2000-01-26 奥林巴斯光学工业株式会社 Waffer transport device
JP2002270674A (en) * 2001-03-14 2002-09-20 Disco Abrasive Syst Ltd Carry-out device
JP2002305224A (en) * 2001-04-05 2002-10-18 Oki Electric Ind Co Ltd Wafer storage unit
CN103346098A (en) * 2013-05-14 2013-10-09 上海集成电路研发中心有限公司 System and method for static scanning of silicon chip position information

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111180378A (en) * 2019-12-31 2020-05-19 中芯集成电路(宁波)有限公司 Method and device for detecting wafer oblique insertion in wafer boat
CN111180378B (en) * 2019-12-31 2023-12-29 中芯集成电路(宁波)有限公司 Method and device for detecting wafer oblique insertion in wafer boat
CN112729181A (en) * 2020-12-25 2021-04-30 上海广川科技有限公司 Device and method for carrying out wafer positioning detection

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Application publication date: 20190920

RJ01 Rejection of invention patent application after publication