CN110241397A - A kind of compound CVD equipment of horizontal multi-layer magnetic control film coating and its working method - Google Patents
A kind of compound CVD equipment of horizontal multi-layer magnetic control film coating and its working method Download PDFInfo
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- CN110241397A CN110241397A CN201910672540.7A CN201910672540A CN110241397A CN 110241397 A CN110241397 A CN 110241397A CN 201910672540 A CN201910672540 A CN 201910672540A CN 110241397 A CN110241397 A CN 110241397A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Abstract
The present invention discloses a kind of compound CVD equipment of horizontal multi-layer magnetic control film coating and its working method, is related to roll-to-roll CVD film growth apparatus field.The CVD equipment includes device framework, and the top of device framework is equipped with unreeling structure, structure valve three, structure valve two, structure valve one, rolling-up mechanism, the first radio frequency cavity, the second radio frequency cavity, warm area one, warm area two；It is linked when work using Scroll and unreeling shaft, by the magnetron sputtering of the first radio frequency cavity and the second radio frequency cavity, target excitation is first splashed to one layer of metallic film of formation on substrate by radio frequency control instrument, it deposits to form the nano thin-film as made from unstrpped gas through two warm areas again, can on substrate continuous overlay film, the laminated film of metallic film folder nano thin-film form is obtained, which can continuously, fast and efficiently prepare the laminated film of large area, high-test metal film folder nano thin-film form.
Description
Technical field
The present invention relates to roll-to-roll CVD film growth apparatus fields, and in particular to a kind of horizontal multi-layer magnetic control film coating is compound
CVD equipment and its working method.
Background technique
CVD film is grown in conventional gas phase sedimentation overlay film, deposited by single temperature zone or multi-temperature zone to be formed single side or
The two-sided film of person and be all single thin film.Plasma enhanced CVD overlay film can not equally prepare practicability and demand is higher more
The laminated film of layer characteristic metallic film folder nano thin-film form.The THIN COMPOSITE of production metallic film folder nano thin-film form at present
The equipment of film is not easily achieved the intracorporal gas of chamber not interfereing with each other in each autonomous working chamber.
Existing film growth techniques mainly use vapour deposition process or plasma enhanced chemical vapor deposition method
(PECVD), large area, the film of high quality and CVD overlay film can continuously and quickly be prepared, by by required unstrpped gas into
Enter in cavity, after warm area heating is cooling, the film of high quality, large area is quickly prepared on substrate.Plasma enhancing
Vapour deposition process is learned, makes the gas ionization containing thin film composition atom by microwave or radio frequency etc., is being partially formed plasma,
And plasma chemistry activity is very strong, it is easy to react, go out desired film in deposition on substrate.The advantages of this method
It is that cardinal temperature is low, deposition rate is fast, and quality of forming film is good, and pin hole is less, is not easily cracked.
But two methods of vapour deposition process and PECVD prepare overlay film molding, are all single side or two-sided single thin film, if
The laminated film that metallic film folder nano thin-film form need to be prepared, is unable to reach desired effect；And prepare such film need
Multiple autonomous working chambers are wanted to cooperate jointly, in the work of multiple work chamber, each cavity is passed through unstrpped gas and protective gas
It is not quite similar, is not easily achieved not interfereing with each other for gas in each cavity.
Summary of the invention
In order to solve the above technical problems, the purpose of the present invention is to provide a kind of horizontal multi-layer magnetic control film coating is compound
CVD equipment and its working method.
The purpose of the present invention can be achieved through the following technical solutions:
The present invention provides a kind of compound CVD equipment of horizontal multi-layer magnetic control film coating, including device framework, the device framework
Top is equipped with unreeling structure, structure valve three, structure valve two, structure valve one, rolling-up mechanism, the first radio frequency cavity, the second radio-frequency cavity
Body, warm area one, warm area two；
The unreeling structure includes unreeling cabin, unreeling shaft, unreeling shaft be located at unreel cabin it is central axial on, unreel the one of cabin
End is connect by first flange with one end of the first radio frequency cavity；
The other end of the first radio frequency cavity is connect with one end of structure valve three, the other end and warm area two of structure valve three
One end connection, the other end of warm area two connect with one end of structure valve two, the other end of structure valve two and one end of warm area one
Connection, the other end of warm area one are connect with one end of structure valve one, one end of the other end of structure valve one and the second radio frequency cavity
Connection；
The structure valve three, warm area one, structure valve two, warm area two, structure valve one inside all have the circle of same diameter
Cylindrical cavity, cylindrical cavity are interior through equipped with quartz ampoule；
The rolling-up mechanism include winding cabin, Scroll, Scroll be located at winding cabin it is central axial on；Winding cabin passes through
Second flange is connect with the other end of the second radio frequency cavity；
The first emission electrode, the first target, the first grounding electrode are equipped in the first radio-frequency cavity body, the first target is symmetrical
Set on the bottom of the first emission electrode and the top of the first grounding electrode；
The second emission electrode, the second target, the second grounding electrode are equipped in the second radio-frequency cavity body, the second target is symmetrical
Set on the bottom of the second emission electrode and the top of the second grounding electrode.
As a further solution of the present invention, described to unreel the rotating electric machine being equipped in cabin for driving unreeling shaft to rotate；
The rotating electric machine for driving Scroll to rotate is equipped in the winding cabin.
As a further solution of the present invention, the warm area one, be equipped with heating furnace in warm area two.
As a further solution of the present invention, first emission electrode be located at the first radio frequency cavity inner cavity top and its
It is in inverted T-shape in longitudinal section, the first grounding electrode is located at the intracavity bottom of the first radio frequency cavity and its longitudinal section is in T shape, the
The roof of one radio frequency cavity is connected with the first compound vacuum gauge.
As a further solution of the present invention, second emission electrode be located at the second radio frequency cavity inner cavity top and its
It is in inverted T-shape in longitudinal section, the second grounding electrode is located at the intracavity bottom of the second radio frequency cavity and its longitudinal section is in T shape, the
The roof of two radio frequency cavitys is connected with the second compound vacuum gauge.
As a further solution of the present invention, the bottom of the first flange is equipped with bleeding point four；The second flange
Top is equipped with air inlet one.
As a further solution of the present invention, the top and bottom of the structure valve one are respectively equipped with air inlet two, pumping
Mouth one；The top and bottom of the structure valve two are respectively equipped with air inlet three, bleeding point two；The top and bottom of the structure valve three
Portion is respectively equipped with air inlet four, bleeding point three.
As a further solution of the present invention, the inside of the device framework is equipped with mechanical pump, on the outer wall of device framework
Equipped with radio frequency control instrument, flow quantity control instrument.
The present invention also provides a kind of working methods of compound CVD equipment of horizontal multi-layer magnetic control film coating, are suitable for above-mentioned sleeping
The compound CVD equipment of formula multilayer magnetic control film coating, comprising the following steps:
1) inert gas Ar is passed through in the cabin Xiang Fangjuan, the substrate of unreeling shaft top plug dress package unreels the rotating electric machine in cabin
Scrolling substrate；
2) radio frequency control instrument control system opens radio-frequency power supply, intracorporal first emission electrode of the first radio-frequency cavity, the first target, the
The work of one grounding electrode, excites target body；Target body sputtering of materials to substrate overlay film is promoted to form metallic film；
3) as the scrolling of rotating electric machine in winding cabin acts on, substrate is advanced past warm area two, warm area one, the second radio-frequency cavity
Intracorporal second emission electrode, the second target, the work of the second grounding electrode, excite target body, promote target body sputtering of materials
Cover nano thin-film, metallic film again to substrate, the substrate after apposition growth film forming is continuous as the rotary tightening of Scroll acts on
It is wound into；
4) after Scroll continue working collect growing film after substrate, close mechanical pump, air inlet one, air inlet two, into
Port three, air inlet four is continually fed into Ar maintains quartzy tube chamber under atmospheric pressure, opens winding cabin, takes out receipts coated with film
Spool collects film.
Beneficial effects of the present invention:
1, the compound CVD equipment of horizontal multi-layer magnetic control film coating of the invention uses Scroll and unreels on the basis of roll-to-roll
Axis linkage, substrate pass through the magnetron sputtering of the first radio frequency cavity and the second radio frequency cavity, first swash target by radio frequency control instrument
Hair is splashed to one layer of metallic film of formation on substrate, then deposits to form the nano thin-film as made from unstrpped gas through two warm areas, can
The continuous overlay film on substrate obtains the laminated film of metallic film folder nano thin-film form, by two radio frequency cavitys, two
Warm area both ends are respectively arranged an air inlet, a bleeding point, and air inlet, bleeding point work reach dynamic equilibrium when work, so that
Gas reaches non-interfering effect at work in each cavity.The CVD equipment can continuously, fast and efficiently prepare big face
The laminated film of product, high-test metal film folder nano thin-film form.
2, the present invention increases base in no carrier by the way that substrate level is crossed connection unreeling shaft, Scroll
Material overlay film area；First radio frequency cavity is excited through radio frequency control instrument, one layer of metallic film is sputtered first on substrate, in Scroll
Rotating electric machine effect is lower to move ahead, and by warm area one, continues to cover one layer of nano thin-film on front layer Membranous Foundations；By warm area two,
Improve nanometer thin film layer again on the basis of front layer nano thin-film, then through the second radio frequency cavity, target as sputter covers one layer of metal foil again
After last Scroll continues rotary tightening, the laminated film of metallic film folder nano thin-film form is made in film on substrate.
Detailed description of the invention
The present invention will be further described below with reference to the drawings.
Fig. 1 is the structural schematic diagram of the compound CVD equipment of horizontal multi-layer magnetic control film coating of the present invention.
In figure: 1, mechanical pump；2, cabin is wound；3, Scroll；4, substrate；5, the second radio frequency cavity；6, second flange；7, into
Port one；8, the second compound vacuum gauge；9, the second emission electrode；10, the second target；11, the second grounding electrode；12, bleeding point
One；13, structure valve one；14, air inlet two；15, warm area one；16, bleeding point two；17, structure valve two；18, air inlet three；19,
Warm area two；20, quartz ampoule；21, bleeding point three；22, structure valve three；23, air inlet four；24, the first emission electrode；25, first
Target；26, the first grounding electrode；27, the first radio frequency cavity；28, bleeding point four；29, unreeling shaft；30, cabin is unreeled；31, radio frequency
Controller；32, flow quantity control instrument；33, touch control panel；34, device framework；35, first flange；36, first is composite evacuated
Meter.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts all other
Embodiment shall fall within the protection scope of the present invention.
Embodiment 1
As shown in fig.1, the present embodiment provides a kind of compound CVD equipment of horizontal multi-layer magnetic control film coating, including device framework
34, the top of device framework 34 is equipped with unreeling structure, structure valve 3 22, structure valve 2 17, structure valve 1, rolling-up mechanism, the
One radio frequency cavity 27, the second radio frequency cavity 5, warm area 1, warm area 2 19.
Specifically, unreeling structure includes unreeling cabin 30, unreeling shaft 29, unreels cabin 30 for being passed through inert gas Ar, unreels
Axis 29 is used to match the substrate 4 of dress package.Unreel the rotating electric machine being equipped in cabin 30 for driving unreeling shaft 29 to rotate.Unreeling shaft 29
Positioned at unreel cabin 30 it is central axial on, unreel the one end in cabin 30 and pass through one end of first flange 35 and the first radio frequency cavity 27 company
It connects.
The other end of first radio frequency cavity 27 is connect with one end of structure valve 3 22, the other end and warm area of structure valve 3 22
2 19 one end connection, the other end of warm area 2 19 are connect with one end of structure valve 2 17, the other end and temperature of structure valve 2 17
The one end in area 1 connects, and the other end of warm area 1 is connect with one end of structure valve 1, the other end of structure valve 1 and
One end of second radio frequency cavity 5 connects.
Rolling-up mechanism includes winding cabin 2, Scroll 3, and the electric rotating for driving Scroll 3 to rotate is equipped in winding cabin 2
Machine, Scroll 3 be located at winding cabin 2 it is central axial on.Wind the other end that cabin 2 passes through second flange 6 and the second radio frequency cavity 5
Connection.Structure valve 3 22, warm area 1, structure valve 2 17, warm area 2 19, structure valve 1 inside all have same diameter
Cylindrical cavity, cylindrical cavity are interior through equipped with quartz ampoule 20.Heating furnace is equipped in warm area 1, warm area 2 19.
It is equipped with the first emission electrode 24, the first target 25, the first grounding electrode 26 in the first radio frequency cavity 27, first
Emission electrode 24 is located at the inner cavity top of the first radio frequency cavity 27 and it is in inverted T-shape, the first grounding electrode 26 in longitudinal section
In the first radio frequency cavity 27 intracavity bottom and its longitudinal section it is in T shape, the first target 25 is symmetrically set in the first emission electrode 24
Bottom and the first grounding electrode 26 top.The roof of first radio frequency cavity 27 is connected with the first compound vacuum gauge 36.
The second emission electrode 9, the second target 10, the second grounding electrode 11, the second hair are equipped in the second radio frequency cavity 5
Radio pole 9 be located at the inner cavity top of the second radio frequency cavity 5 and its in longitudinal section in inverted T-shape, the second grounding electrode 11 is located at the
The intracavity bottom of two radio frequency cavitys 5 and its longitudinal section is in T shape, the second target 10 is symmetrically set in the bottom of the second emission electrode 9
With the top of the second grounding electrode 11.The roof of second radio frequency cavity 5 is connected with the second compound vacuum gauge 8.
The bottom of the first flange 35 is equipped with bleeding point 4 28；The top of the second flange 6 is equipped with air inlet 1.
The top and bottom of the structure valve 1 are respectively equipped with air inlet 2 14, bleeding point 1.The top of the structure valve 2 17
Air inlet 3 18, bleeding point 2 16 are respectively equipped with bottom.The top and bottom of the structure valve 3 22 are respectively equipped with air inlet
4 23, bleeding point 3 21.The design of multiple bleeding points and air inlet extracts vacuum to 20 inner chamber body of quartz ampoule for mechanical pump 1,
Guarantee demand when equipment is passed through unstrpped gas and required other gases used for vacuum degree.Simultaneously at the top of each working cavity
One end air inlet one end is evacuated when working with air inlet, the bleeding point of bottom, is reached the dynamic equilibrium of gas, is made each working chamber whereby
Gas is not interfere with each other body in cavity at work.
The inside of device framework 34 is equipped with mechanical pump 1, and the outer wall of device framework 34 is equipped with radio frequency control instrument 31, flow control
Instrument 32 processed, touch control panel 33.
Embodiment 2
As shown in fig.1, the present embodiment provides a kind of working method of compound CVD equipment of horizontal multi-layer magnetic control film coating, packet
Include following steps:
1) inert gas Ar is passed through in the cabin Xiang Fangjuan 30, the substrate 4 of 29 top plug of unreeling shaft dress package unreels the rotation in cabin 30
Rotating motor scrolling substrate；
2) radio-frequency power supply, the first emission electrode 24, first in the first radio frequency cavity 27 are opened in the control of radio frequency control instrument 31
Target 25, the work of the first grounding electrode 26, excite target body；Target body sputtering of materials to 4 overlay film of substrate is promoted to form metal
Film；
3) as the scrolling of rotating electric machine in winding cabin 2 acts on, substrate is advanced past warm area 2 19, warm area 1, and second
The second emission electrode 9, the second target 10, the work of the second grounding electrode 11 in radio frequency cavity 5, excite target body, promote
Target body sputtering of materials to substrate 4 covers nano thin-film, metallic film again, the substrate after apposition growth film forming with Scroll 3 rotation
Turn tightening effect to be constantly wound into；
4) substrate after collecting growing film is continued working after Scroll 3, closes mechanical pump 1, air inlet 1, air inlet two
14, air inlet 3 18, air inlet 4 23, which are continually fed into Ar, makes 20 cavity of quartz ampoule maintain under atmospheric pressure, to open winding cabin 2, take
Scroll 3 coated with film out collects film.
The working method of the above-mentioned compound CVD equipment of horizontal multi-layer magnetic control film coating, specific work process are as follows:
S1, the plug of substrate 4 of package is attached on unreeling shaft 29, traction copper foil is by being connected to Scroll 3 after quartz ampoule 20
On, closing structure valve 1, structure valve 2 17, structure valve 3 22 start mechanical pump 1, after sealed silica envelope 20, start vacuum pump
Each cavity is evacuated down to 10-1Pa；
S2, warm area 1, the heating furnace temperature programming in warm area 2 19 are to after 800 DEG C, air inlet 1, air inlet 4 23
It is continually fed into protective gas, air inlet 2 14, air inlet 3 18 are passed through the mixed gas of protective gas and unstrpped gas, take out simultaneously
Port 1, bleeding point 2 16, bleeding point 3 21, bleeding point 4 28 keep equal-wattage pumping, make gas in each working cavity
It does not interfere with each other；
S3, starting radio frequency control instrument 31, excitation the first radio frequency cavity 27 and the second radio frequency cavity 5 excite target body to unreeling
One layer of metallic film is covered in sputtering on substrate under the effect of axis 29, before then substrate continues under rotating electric machine effect in winding cabin 2
Row, warm area 1, warm area 2 19 cool down；Substrate passes through warm area 2 19, continues to cover one layer of nano thin-film on front layer Membranous Foundations,
By warm area 1, nanometer thin film layer is improved again on the basis of front layer nano thin-film, using the second radio frequency cavity 5, excites target
One layer of metallic film is covered after body again, apposition growth metallic film presss from both sides the substrate after the laminated film of nano thin-film form, with receipts
The rotary tightening effect of spool 3 is constantly wound into；
S4, the substrate after obtaining laminated film is persistently rotated after Scroll 3, closes mechanical pump 1, air inlet 1, air inlet
2 14, air inlet 3 18, air inlet 4 23, which are continually fed into Ar, makes 20 inner chamber body of quartz ampoule maintain under atmospheric pressure, to open winding cabin
Spool coated with film is taken out after 2, collects film.
In the description of this specification, the description of reference term " one embodiment ", " example ", " specific example " etc. means
Particular features, structures, materials, or characteristics described in conjunction with this embodiment or example are contained at least one implementation of the invention
In example or example.In the present specification, schematic expression of the above terms may not refer to the same embodiment or example.
Moreover, particular features, structures, materials, or characteristics described can be in any one or more of the embodiments or examples to close
Suitable mode combines.
Above content is only citing made for the present invention and explanation, affiliated those skilled in the art are to being retouched
The specific embodiment stated does various modifications or additions or is substituted in a similar manner, and without departing from invention or surpasses
More range defined in the claims, is within the scope of protection of the invention.
Claims (9)
1. a kind of compound CVD equipment of horizontal multi-layer magnetic control film coating, including device framework (34), which is characterized in that the equipment frame
The top of frame (34) is equipped with unreeling structure, structure valve three (22), structure valve two (17), structure valve one (13), rolling-up mechanism, first
Radio frequency cavity (27), the second radio frequency cavity (5), warm area one (15), warm area two (19)；
The unreeling structure includes unreeling cabin (30), unreeling shaft (29), and unreeling shaft (29), which is located at, unreels the central axial of cabin (30)
On, the one end for unreeling cabin (30) is connect by first flange (35) with one end of the first radio frequency cavity (27)；
The other end of the first radio frequency cavity (27) is connect with one end of structure valve three (22), the other end of structure valve three (22)
It is connect with one end of warm area two (19), the other end of warm area two (19) is connect with one end of structure valve two (17), structure valve two
(17) the other end is connect with one end of warm area one (15), and the other end of warm area one (15) and one end of structure valve one (13) connect
It connects, the other end of structure valve one (13) is connect with one end of the second radio frequency cavity (5)；
The structure valve three (22), warm area one (15), structure valve two (17), warm area two (19), the inside of structure valve one (13) are equal
Cylindrical cavity with same diameter, cylindrical cavity are interior through equipped with quartz ampoule (20)；
The rolling-up mechanism include winding cabin (2), Scroll (3), Scroll (3) be located at winding cabin (2) it is central axial on；It receives
Volume cabin (2) is connect by second flange (6) with the other end of the second radio frequency cavity (5)；
The first emission electrode (24), the first target (25), the first grounding electrode (26) are equipped in the first radio frequency cavity (27),
First target (25) is symmetrically set in the bottom of the first emission electrode (24) and the top of the first grounding electrode (26)；
The second emission electrode (9), the second target (10), the second grounding electrode (11) are equipped in the second radio frequency cavity (5), the
Two targets (10) are symmetrically set in the bottom of the second emission electrode (9) and the top of the second grounding electrode (11).
2. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that described to unreel cabin
(30) rotating electric machine for driving unreeling shaft (29) to rotate is equipped in；It is equipped in the winding cabin (2) for driving Scroll
(3) rotating electric machine rotated.
3. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that the warm area one
(15), heating furnace is equipped in warm area two (19).
4. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that first transmitting
Electrode (24) is located at the inner cavity top of the first radio frequency cavity (27) and it is in inverted T-shape, the first grounding electrode (26) in longitudinal section
Positioned at the first radio frequency cavity (27) intracavity bottom and its longitudinal section it is in T shape, the roof of the first radio frequency cavity (27) is connected with
First compound vacuum gauge (36).
5. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that second transmitting
Electrode (9) is located at the inner cavity top of the second radio frequency cavity (5) and it is in inverted T-shape, the second grounding electrode (11) position in longitudinal section
In the second radio frequency cavity (5) intracavity bottom and its longitudinal section it is in T shape, the roof of the second radio frequency cavity (5) is connected with second
Compound vacuum gauge (8).
6. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that the first flange
(35) bottom is equipped with bleeding point four (28)；The top of the second flange (6) is equipped with air inlet one (7).
7. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that the structure valve one
(13) air inlet two (14), bleeding point one (12) are respectively equipped at the top and bottom of；The top and bottom of the structure valve two (17)
Portion is respectively equipped with air inlet three (18), bleeding point two (16)；Air inlet is respectively equipped at the top and bottom of the structure valve three (22)
Mouth four (23), bleeding point three (21).
8. the compound CVD equipment of horizontal multi-layer magnetic control film coating according to claim 1, which is characterized in that the device framework
(34) inside is equipped with mechanical pump (1), and the outer wall of device framework (34) is equipped with radio frequency control instrument (31), flow quantity control instrument
(32)。
9. it is described in any item to be suitable for claim 1-8 for a kind of working method of the compound CVD equipment of horizontal multi-layer magnetic control film coating
The compound CVD equipment of horizontal multi-layer magnetic control film coating, which comprises the following steps:
1) inert gas Ar is passed through in the cabin Xiang Fangjuan (30), the substrate (4) of unreeling shaft (29) top plug dress package unreels in cabin (30)
Rotating electric machine scrolling substrate；
2) radio-frequency power supply is opened in radio frequency control instrument (31) control, the first emission electrode (24) in the first radio frequency cavity (27), the
One target (25), the first grounding electrode (26) work, excite target body；Promote target body sputtering of materials to substrate (4) overlay film
Form metallic film；
3) as the scrolling of winding cabin (2) interior rotating electric machine acts on, substrate is advanced past warm area two (19), warm area one (15), the
The second emission electrode (9), the second target (10), the second grounding electrode (11) work in two radio frequency cavitys (5), carry out target body
Excitation promotes target body sputtering of materials to substrate (4) to cover nano thin-film, metallic film again, the substrate after apposition growth film forming with
The rotary tightening effect of Scroll (3) is constantly wound into；
4) substrate after collecting growing film is continued working after Scroll (3), closed mechanical pump (1), air inlet one (7), air inlet
Two (14), air inlet three (18), air inlet four (23), which are continually fed into Ar, makes quartz ampoule (20) cavity maintain under atmospheric pressure, to open
It winds cabin (2), takes out Scroll coated with film (3), collect film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910672540.7A CN110241397B (en) | 2019-07-24 | 2019-07-24 | Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910672540.7A CN110241397B (en) | 2019-07-24 | 2019-07-24 | Horizontal multilayer magnetic control coating composite CVD equipment and working method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110241397A true CN110241397A (en) | 2019-09-17 |
| CN110241397B CN110241397B (en) | 2023-06-23 |
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| CN111826633A (en) * | 2020-06-10 | 2020-10-27 | 合肥百思新材料研究院有限公司 | Continuous carbon fiber composite graphene preparation equipment |
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| CN111826633A (en) * | 2020-06-10 | 2020-10-27 | 合肥百思新材料研究院有限公司 | Continuous carbon fiber composite graphene preparation equipment |
| CN111807714B (en) * | 2020-06-10 | 2022-09-27 | 合肥百思新材料研究院有限公司 | Continuous self-cleaning glass substrate growth equipment |
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