CN110174718A - Plated film lens and optical imaging device - Google Patents
Plated film lens and optical imaging device Download PDFInfo
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- CN110174718A CN110174718A CN201910575982.XA CN201910575982A CN110174718A CN 110174718 A CN110174718 A CN 110174718A CN 201910575982 A CN201910575982 A CN 201910575982A CN 110174718 A CN110174718 A CN 110174718A
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- 238000012634 optical imaging Methods 0.000 title claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims description 29
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 8
- 229910052681 coesite Inorganic materials 0.000 claims description 8
- 229910052593 corundum Inorganic materials 0.000 claims description 8
- 229910052906 cristobalite Inorganic materials 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 229910052682 stishovite Inorganic materials 0.000 claims description 8
- 229910052905 tridymite Inorganic materials 0.000 claims description 8
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 8
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 6
- 229910009815 Ti3O5 Inorganic materials 0.000 claims description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 3
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims description 3
- 101150059062 apln gene Proteins 0.000 claims description 3
- 229910052796 boron Inorganic materials 0.000 claims description 3
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 3
- 238000005984 hydrogenation reaction Methods 0.000 claims description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 3
- 229910003465 moissanite Inorganic materials 0.000 claims description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 3
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 3
- 150000003346 selenoethers Chemical class 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 239000011848 phosphorous-based material Substances 0.000 claims description 2
- 238000002834 transmittance Methods 0.000 description 14
- 238000002310 reflectometry Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 238000002366 time-of-flight method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 description 3
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Abstract
The embodiment of the present application provides a kind of plated film lens and optical imaging device.Plated film lens include: lens substrate；Multiple high refractive index layers, refractive index are greater than or equal to 2.0；And multiple low-index films, refractive index are less than or equal to 1.6, wherein total thicknesses of layers D of the multiple high refractive index layerH is totalWith total thicknesses of layers D of the multiple low-index filmL is totalMeet 0.50 < DH is total/DL is total<1.50。
Description
Technical field
This application involves optical element fields, and in particular, to a kind of plated film lens and optical imaging device.
Background technique
Usual antireflective coating is coated on the surface of the optical components such as lens, prism, is made of to improve multiple lens
Optical element transmissivity, especially by inhibit visible spectrum reflection, make image brightness and improved optics instrument
Device becomes easy visible.However general existing antireflective coating is low to visible light region reflectivity, but near infrared region,
Reflectivity is increased with the increase of wavelength.Therefore the plated film lens for developing a kind of reflection for considering near infrared region just seem
It is very necessary.
Summary of the invention
The embodiment of the present application provides a kind of plated film lens and optical imaging device.
The one side of the application provides a kind of plated film lens, and the plated film lens include: lens substrate；Multiple high refractive indexes
Film layer, refractive index are greater than or equal to 2.0；And multiple low-index films, refractive index are less than or equal to 1.6, wherein described more
Total thicknesses of layers D of a high refractive index layerH is totalWith total thicknesses of layers D of the multiple low-index filmL is totalSatisfaction 0.50 <
DH is total/DL is total<1.50。
According to the application embodiment, from the lens substrate, the multiple high refractive index layer and the multiple low
Sequence stacks refractivity film layer one of in the following order: (H-L) m；(H-L)m-H；(L-H)m；And L- (H-L) m,
In, H indicates high refractive index layer, and L indicates low-index film, and m indicates duplicate number.
According to the application embodiment, the high refractive index layer includes any one of following material: nitride material,
Fluoride materials, sulfide material, selenide material, silane, hydrogenation SiGe, SiC, Nb2O5、Ta2O5And the oxidation of Ti
Object.
According to the application embodiment, the low-index film includes any one of following material: SiO2、Al2O3、
TiO2、Nb2O5、Ta2O5、MgF2、NbTiOx、ZrO2、Y2O3、HfO2、S3N4、NbTiOx, Boron Based Materials and phosphorous-based materials.
According to the application embodiment, the high refractive index layer is by Ti3O5Be made, and the low-index film by
Al2O3And SiO2It is made.
According to the application embodiment, the refractive index n (H) of the high refractive index layer meets 2.2≤n (H)≤2.3；Institute
The refractive index n (L) for stating low-index film meets 1.4≤n (L)≤1.6.
According to the application embodiment, the lens substrate is made by least one of EP, APEL, Zeonex and PMMA
At.
According to the application embodiment, the refractive index n (sub) of the material of the lens substrate meet 1.5≤n (sub)≤
1.7。
According to the application embodiment, the plated film lens have stacked gradually the first high refractive index from the lens substrate
Film layer, the first low-index film, the second high refractive index layer and the second low-index film, wherein the described first high refraction
The thickness ratio of rate film layer to second low-index film is 3:3:12:10.
According to the application embodiment, the thicknesses of layers range of the first high refractive index layer is 30~50nm；First low folding
The thicknesses of layers range for penetrating rate film layer is 30~40nm；The thicknesses of layers range of second high refractive index layer is 90~120nm；With
And second low-index film thicknesses of layers range be 100~150nm.
According to the application embodiment, the plated film lens have stacked gradually the first high refractive index from the lens substrate
Film layer, the first low-index film, the second high refractive index layer, the second low-index film, third high refractive index layer, third
Low-index film, the 4th high refractive index layer and the 4th low-index film, wherein first high refractive index layer is extremely
The thickness ratio of 4th low-index film is 1:5:3:2:7:1:3:9.
According to the application embodiment, the thicknesses of layers range of the first high refractive index layer is 10~15nm；First low folding
The thicknesses of layers range for penetrating rate film layer is 40~50nm；The thicknesses of layers range of second high refractive index layer is 30~40nm；The
The thicknesses of layers range of two low-index films is 10~20nm；The thicknesses of layers range of third high refractive index layer be 70~
90nm；The thicknesses of layers range of third low-index film is 10~20nm；The thicknesses of layers range of 4th high refractive index layer
For 20~30nm；And the 4th low-index film thicknesses of layers range be 90~110nm.
According to the application embodiment, maximum reflection of the plated film lens in the wave-length coverage of 830nm to 1050nm
Rate RmaxMeet: Rmax≤ 0.8%.
According to the application embodiment, average reflectance of the plated film lens in the wave-length coverage of 920nm to 980nm
RaveMeet: Rave≤ 0.3%.
According to the application embodiment, the reflectance peak of the plated film lens falls in the wave-length coverage of 430nm to 570nm
It is interior, and peak reflectivity RpeakMeet: Rpeak≤ 32%.
According to the application embodiment, maximum reflectivity of the plated film lens in the wave-length coverage of 430nm to 630nm
RmaxWith average reflectance RaveMeet: Rmax≤ 3% and Rave≤ 1.8%；Wavelength of the plated film lens in 630nm to 900nm
Maximum reflectivity R in rangemaxWith average reflectance RaveMeet: Rmax≤ 2% and Rave≤ 1.6%；And the mirror coating
Maximum reflectivity R of the piece in the wave-length coverage of 900nm to 980nmmaxWith average reflectance RaveMeet: Rmax≤ 0.7%, Rave
≤ 0.5%.
The one side of the application provides a kind of optical imaging device, which is characterized in that the optical imaging device includes extremely
Few four above-mentioned plated film lens.Average transmittance T of the optical imaging device in the wave-length coverage of 430nm to 900nmave≥
88% and minimum transmittance Tmin>=74.5%；Average transmittance T in the wave-length coverage of 900nm to 1050nmave≥
97.4%.
Plated film lens and optical imaging device provided by the present application have transmission effect well to visible light and near infrared light
Fruit reduces the reflection of light.
Detailed description of the invention
By reading a detailed description of non-restrictive embodiments in the light of the attached drawings below, the application's is other
Feature, objects and advantages will become more apparent upon:
Fig. 1 is the structural schematic diagram of the plated film lens of the embodiment of the present application 1；
Fig. 2A is the corresponding plated film lens reflectance curve relationship signal of different lambda1-wavelengths of the embodiment of the present application 1
Figure；
Fig. 2 B is the transmittance graph relationship of the corresponding optical imaging device of different lambda1-wavelengths of the embodiment of the present application 1
Schematic diagram；
Fig. 3 is the structural schematic diagram of the plated film lens of the embodiment of the present application 2；
Fig. 4 A is the corresponding plated film lens reflectance curve relationship signal of different lambda1-wavelengths of the embodiment of the present application 2
Figure；
Fig. 4 B is the transmittance graph relationship of the corresponding optical imaging device of different lambda1-wavelengths of the embodiment of the present application 2
Schematic diagram.
Specific embodiment
Various aspects of the reference attached drawing to the application are made more detailed description by the application in order to better understand.It answers
Understand, the only description to the illustrative embodiments of the application is described in detail in these, rather than limits the application in any way
Range.In the specification, the identical element of identical reference numbers.Stating "and/or" includes associated institute
Any and all combinations of one or more of list of items.
It should be noted that in the present specification, first, second, third, etc. statement is only used for a feature and another spy
Sign distinguishes, without indicating any restrictions to feature.
In the accompanying drawings, for ease of description, thickness, the size and shape of film layer are slightly exaggerated.Specifically, attached drawing
Shown in spherical surface or aspherical shape be illustrated by way of example.That is, spherical surface or aspherical shape are not limited to attached drawing
Shown in spherical surface or aspherical shape.Attached drawing is merely illustrative and and non-critical drawn to scale.
It will also be appreciated that term " comprising ", " including ", " having ", "comprising" and/or " including ", when in this theory
It indicates there is stated feature, element and/or component when using in bright book, but does not preclude the presence or addition of one or more
Other feature, component, assembly unit and/or their combination.In addition, ought the statement of such as at least one of " ... " appear in institute
When after the list of column feature, entire listed feature is modified, rather than modifies the individual component in list.In addition, when describing this
When the embodiment of application, " one or more embodiments of the application " are indicated using "available".Also, term " illustrative "
It is intended to refer to example or illustration.
Unless otherwise defined, otherwise all terms (including technical terms and scientific words) used herein all have with
The application one skilled in the art's is generally understood identical meaning.It will also be appreciated that term (such as in everyday words
Term defined in allusion quotation) it should be interpreted as having and their consistent meanings of meaning in the context of the relevant technologies, and
It will not be explained with idealization or excessively formal sense, unless clear herein so limit.
It should be noted that in the absence of conflict, the features in the embodiments and the embodiments of the present application can phase
Mutually combination.The application is described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
The feature of the application, principle and other aspects are described in detail below.
In order to meet transmission of the sensor to visible light and near infrared light, the embodiment of the present application provides a kind of mirror coating
Piece.The plated film lens include lens substrate, multiple high refractive index layers and multiple low-index films.High refractive index layer
Refractive index is greater than or equal to 2.0, and the refractive index of low-index film is less than or equal to 1.6, and multiple high refractive index layers
Total thicknesses of layers DH is totalWith total thicknesses of layers D of multiple low-index filmsL is totalMeet 0.50 < DH is total/DL is total<1.50。
Specifically, plated film lens provided by the embodiments of the present application are successively alternately coated with multiple high on the basis of lens substrate
Refractivity film layer and multiple low-index films are formed.For example, in one embodiment, one can be first coated in lens substrate
Layer high refractive index layer, is then coated with one layer of low-index film on high refractive index layer.Then, in this low-index film
On be coated with one layer of high refractive index layer again, be finally coated with one layer of low refraction again on the outermost high refractive index layer being coated with
Rate film layer, and so on, to obtain the plated film lens needed.The refractive index of high refractive index layer is all larger than or is equal to 2.0, low folding
The refractive index for penetrating rate film layer is respectively less than or is equal to 1.6.Total thicknesses of layers D of all high refractive index layersH is totalWith all low-refractions
Total thicknesses of layers D of film layerL is totalMeet 0.50 < DH is total/DL is total< 1.50, so that the plated film lens that plating is formed with above-mentioned film layer structure are obtained,
So that the plated film lens have good transmission effects to visible light and near infrared light, light reflection is reduced.
According to the application embodiment, multiple high refractive index layers and multiple low-index films in plated film lens are from mirror
Piece substrate plays one of in the following order sequence and stacks: (H-L) m, (H-L) m-H, (L-H) m and L- (H-L) m, wherein
H indicates high refractive index layer, and L indicates low-index film, and m indicates duplicate number.It is (H-L) m's in plated film sequence
In the case of, high refractive index layer is successively alternateed with low-index film and is coated with, and it is m times that alternating, which is coated with number,.It is suitable in plated film
In the case that sequence is (H-L) m-H, high refractive index layer and low-index film are successively alternateed after being coated with m times, are finally plated again
Make one layer of high refractive index layer.In the case where plated film sequence is (L-H) m, low-index film and high refractive index layer are successively
It alternates and is coated with, it is m times that alternating, which is coated with number,.In the case where plated film sequence is L- (H-L) m, first plated in lens substrate
One layer of low-index film is made, then successively alternates again and is coated with m high refractive index layer and low-index film.
According to the application embodiment, the high refractive index layer in plated film lens includes any one of following material: nitrogen
Compound material, fluoride materials, sulfide material, selenide material, silane, hydrogenation SiGe, SiC, Nb2O5、Ta2O5And
The oxide of Ti.According to the application embodiment, the low-index film in plated film lens includes any one of following material:
SiO2、Al2O3、TiO2、Nb2O5、Ta2O5、MgF2、NbTiOx、ZrO2、Y2O3、HfO2、S3N4、NbTiOx, Boron Based Materials and phosphorus base
Material.
According to the application embodiment, the high refractive index layer in plated film lens is by Ti3O5It is made, and low refractive index film
Layer is by Al2O3And SiO2It is made.
According to the application embodiment, the refractive index n (H) of the high refractive index layer in plated film lens meets 2.2≤n (H)
≤2.3；The refractive index n (L) of low-index film meets 1.4≤n (L)≤1.6.
According to the application embodiment, lens substrate in plated film lens by EP, APEL, Zeonex and PMMA extremely
Few one kind is made.According to the application embodiment, the refractive index n (sub) of the material of the lens substrate in plated film lens meets 1.5
≤n(sub)≤1.7。
According to the application embodiment, the plated film lens in plated film lens have stacked gradually the first high folding from lens substrate
Penetrate rate film layer, the first low-index film, the second high refractive index layer and the second low-index film, wherein the first high refraction
The thickness ratio of rate film layer to the second low-index film is 3:3:12:10.Plated film lens provided by the embodiments of the present application can lead to
It crosses 4 tunic layers and is coated with acquisition, and each film layer physical thickness has certain proportionate relationship.The proportionate relationship is rationally set, can be had
Effect improves plated film lens to the transmissivity of visible light and near infrared light.
According to the application embodiment, the thicknesses of layers range of the first high refractive index layer in plated film lens is 30~
50nm；The thicknesses of layers range of first low-index film is 30~40nm；The thicknesses of layers range of second high refractive index layer
For 90~120nm；And second low-index film thicknesses of layers range be 100~150nm.
According to the application embodiment, the plated film lens in plated film lens have stacked gradually the first high folding from lens substrate
Penetrate rate film layer, the first low-index film, the second high refractive index layer, the second low-index film, third high refractive index layer,
Third low-index film, the 4th high refractive index layer and the 4th low-index film, wherein the first high refractive index layer is extremely
The thickness ratio of 4th low-index film is 1:5:3:2:7:1:3:9.Plated film lens i.e. provided by the embodiments of the present application can lead to
It crosses 8 tunic layers and is coated with acquisition, each film layer physical thickness has certain proportionate relationship.It, can by the way that the proportionate relationship is rationally arranged
Plated film lens are effectively improved to the transmissivity of visible light and near infrared light.
According to the application embodiment, in plated film lens: the thicknesses of layers range of the first high refractive index layer be 10~
15nm；The thicknesses of layers range of first low-index film is 40~50nm；The thicknesses of layers range of second high refractive index layer
For 30~40nm；The thicknesses of layers range of second low-index film is 10~20nm；The film layer of third high refractive index layer is thick
Degree range is 70~90nm；The thicknesses of layers range of third low-index film is 10~20nm；4th high refractive index layer
Thicknesses of layers range is 20~30nm and the thicknesses of layers range of the 4th low-index film is 90~110nm.
According to the application embodiment, maximum reflectivity R of the plated film lens in the wave-length coverage of 830nm to 1050nmmax
Meet Rmax≤ 0.8%.According to the application embodiment, plated film lens are average anti-in the wave-length coverage of 920nm to 980nm
Penetrate rate RaveMeet Rave≤ 0.3%.
According to the application embodiment, the reflectance peak of plated film lens is fallen in the wave-length coverage of 430nm to 570nm,
And peak reflectivity RpeakMeet Rpeak≤ 32%.
According to the application embodiment, maximum reflectivity R of the plated film lens in the wave-length coverage of 430nm to 630nmmax
With average reflectance RaveMeet: Rmax≤ 3% and Rave≤ 1.8%；Plated film lens are in the wave-length coverage of 630nm to 900nm
Maximum reflectivity RmaxWith average reflectance RaveMeet: Rmax≤ 2% and Rave≤ 1.6%；And plated film lens 900nm extremely
Maximum reflectivity R in the wave-length coverage of 980nmmaxWith average reflectance RaveMeet: Rmax≤ 0.7%, Rave≤ 0.5%.
The application also provides a kind of optical imaging device, which includes that at least four the various embodiments described above mention
The plated film lens of confession.Optical imaging device provided by the present application can make full use of plated film lens to the good of visible light and near infrared light
Good transmissivity is to realize the optical imagery of high quality.
Optimization eyeglass has benifit under many application scenarios for the transmissivity near infrared light region.For example, in 3D
Camera field, this plated film lens have a good application prospect.3D camera is used as transmitting light using infrared ray, can
Solve the problems, such as that the ambient lighting of visible light influences.At present in industry there are three types of used mainstream 3D vision techniques: structure light skill
Art, time-of-flight method (TOF) and the polygonal three-dimensional imaging of binocular.TOF scheme due to its is easy to use, cost is relatively low the advantages that most
Tool prospect.Wherein, TOF scheme captures near infrared light from the received flight time is emitted to, to judge by sensor special
Object distance.This sensor is generally near infrared sensor, needs to receive and transmits near infrared light.It is provided by the present application
This plated film lens can meet its application demand well.
To be further elaborated with plated film lens structure provided by the embodiments of the present application, now specifically with following embodiment
It is bright.
Embodiment 1
Fig. 1 is the structural schematic diagram of the plated film lens of the embodiment of the present application 1.As shown in Figure 1, provided by the embodiments of the present application
Plated film lens include lens substrate 100 and four film structures.Details are as follows for four film structure.Since lens substrate side
First layer be the first high refractive index layer 201, the second layer is the first low-index film 202, and third layer is the second high refraction
Rate film layer 203, the 4th layer is the second low-index film 204.The material of each high refractive index layer is Ti3O5, each low refractive index film
The material of layer is Al2O3And SiO2Mixture.Here each film layer physical thickness ratio of four layer series structure is 3:3:12:10,
Its thickness unit is nm.First high refractive index layer 201 with a thickness of 30~50nm.The thickness of first low-index film 202
For 30~40nm.Second high refractive index layer 203 with a thickness of 90~120nm.Second low-index film 204 with a thickness of
100~150nm.
Fig. 2A is the corresponding plated film lens reflectance curve relationship signal of different lambda1-wavelengths of the embodiment of the present application 1
Figure.As shown in Figure 2 A, using the film structure make its plated film lens within the scope of near infrared band 830nm~1050nm most
Big reflectivity Rmax≤ 0.8%, within the scope of visible light wave range 430nm~570nm, the peak reflectivity R of the plated film lenspeak
≤ 32%.
Fig. 2 B be the embodiment of the present application 1 the corresponding optics comprising at least four above-mentioned eyeglasses of different lambda1-wavelengths at
As the transmittance graph relation schematic diagram of device.As shown in Figure 2 B, the optical imaging device comprising at least four above-mentioned eyeglasses exists
Average transmittance T within the scope of near infrared band 830nm~1050nmave>=98%, the minimum within the scope of 430nm~570nm
Transmissivity Tmin>=19.6%.
Plated film lens and optical imaging device that the embodiment of the present application 1 provides meet the use demand of near infrared band, and
It ensure that the color appearance requirement of eyeglass.
Embodiment 2
Fig. 3 is the structural schematic diagram of the plated film lens of the embodiment of the present application 2, as shown in figure 3, mirror coating provided by the present application
Piece includes lens substrate 100 and eight film structures.Details are as follows for eight film structure.Since 100 side of lens substrate, the
One layer is the first high refractive index layer 201, and the second layer is the first low-index film 202, and third layer is the second high refractive index film
Layer 203, the 4th layer is the second low-index film 204, and layer 5 is third high refractive index layer 205, and layer 6 is that third is low
Refractivity film layer 206, layer 7 are the 4th high refractive index layer 207, and the 8th layer is the 4th low-index film 208.Each high folding
The film material for penetrating rate film layer is Ti3O5, the film material of each low-index film is Al2O3And SiO2Mixture.Here
Each film layer physical thickness ratio of eight tunic architectures is 1:5:3:2:7:1:3:9, and thickness unit is nm.First high refractive index film
Layer 201 with a thickness of 10~15nm.First low-index film 202 with a thickness of 40~50nm.Second high refractive index layer 203
With a thickness of 30~40nm, the second low-index film 204 with a thickness of 10~20nm, the thickness of third high refractive index layer 205
Degree is 70~90nm, third low-index film 206 with a thickness of 10~20nm, the 4th high refractive index layer 207 with a thickness of
20~30nm, the 4th low-index film 208 with a thickness of 90~110nm.
Fig. 4 A is the corresponding plated film lens reflectance curve relationship signal of different lambda1-wavelengths of the embodiment of the present application 2
Figure.As shown in Figure 4 A, which makes average transmission of the plated film lens within the scope of near infrared band 830nm~1050nm
Rate Rave≤ 0.8%；Average transmittance R within the scope of 920nm~980nmave≤ 0.3%；Visible light wave range 430nm~
Maximum transmission rate R within the scope of 630nmmax≤ 3%, average transmittance Rave≤ 1.8%；Within the scope of 630nm~900nm most
Big transmissivity Rmax≤ 2%, average transmittance Rave≤ 1.6%.
Fig. 4 B be the embodiment of the present application 2 the corresponding optics comprising at least four above-mentioned eyeglasses of different lambda1-wavelengths at
As the transmittance graph relation schematic diagram of device, as shown in Figure 4 B, the optical imaging device comprising at least four eyeglasses is close
Average transmittance T within the scope of infrared band 900nm~1050nmave>=97.4%；In visible light wave range 430nm~900nm,
Average transmittance Tave>=88% and minimum transmittance Tmin>=74%.
Plated film lens and optical imaging device that the embodiment of the present application 2 provides meet the use demand of near infrared band, and
The optical imaging lens reach the requirement of transparency in visible light and near infrared band.
Above description is only the preferred embodiment of the application and the explanation to institute's application technology principle.Those skilled in the art
Member is it should be appreciated that invention scope involved in the application, however it is not limited to technology made of the specific combination of above-mentioned technical characteristic
Scheme, while should also cover in the case where not departing from inventive concept, it is carried out by above-mentioned technical characteristic or its equivalent feature any
Other technical solutions of combination and formation.Such as features described above and (but being not limited to) disclosed herein have similar functions
Technical characteristic is replaced mutually and the technical solution that is formed.
Claims (10)
1. a kind of plated film lens, which is characterized in that the plated film lens include:
Lens substrate；
Multiple high refractive index layers, refractive index are greater than or equal to 2.0；And
Multiple low-index films, refractive index are less than or equal to 1.6, wherein
Total thicknesses of layers D of the multiple high refractive index layerH is totalWith total thicknesses of layers D of the multiple low-index filmL is totalIt is full
0.50 < D of footH is total/DL is total<1.50。
2. plated film lens according to claim 1, which is characterized in that from the lens substrate, the multiple high refraction
Sequence stacks one of in the following order for rate film layer and the multiple low-index film:
(H-L)m；
(H-L)m-H；
(L-H)m；And
L- (H-L) m,
Wherein, H indicates high refractive index layer, and L indicates low-index film, and m indicates duplicate number.
3. plated film lens according to claim 1, which is characterized in that the high refractive index layer includes in following material
It is any:
Nitride material, fluoride materials, sulfide material, selenide material, silane, hydrogenation SiGe, SiC, Nb2O5、Ta2O5
And the oxide of Ti.
4. plated film lens according to claim 1, which is characterized in that the low-index film includes in following material
It is any:
SiO2、Al2O3、TiO2、Nb2O5、Ta2O5、MgF2、NbTiOx、ZrO2、Y2O3、HfO2、S3N4、NbTiOx, Boron Based Materials and
Phosphorous-based materials.
5. plated film lens according to claim 1, which is characterized in that the high refractive index layer is by Ti3O5It is made, and
The low-index film is by Al2O3And SiO2It is made.
6. plated film lens according to claim 1, which is characterized in that the refractive index n (H) of the high refractive index layer meets
2.2≤n(H)≤2.3；The refractive index n (L) of the low-index film meets 1.4≤n (L)≤1.6.
7. plated film lens according to claim 1, which is characterized in that the lens substrate by EP, APEL, Zeonex and
At least one of PMMA is made.
8. plated film lens according to claim 7, which is characterized in that the refractive index n (sub) of the material of the lens substrate
Meet 1.5≤n (sub)≤1.7.
9. plated film lens according to claim 1, which is characterized in that the plated film lens from the lens substrate successively
It is stacked with the first high refractive index layer, the first low-index film, the second high refractive index layer and the second low-index film,
In, the thickness ratio of first high refractive index layer to second low-index film is 3:3:12:10.
10. a kind of optical imaging device, which is characterized in that the optical imaging device include at least four according to claim 1-
Plated film lens described in any one of 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910575982.XA CN110174718A (en) | 2019-06-28 | 2019-06-28 | Plated film lens and optical imaging device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910575982.XA CN110174718A (en) | 2019-06-28 | 2019-06-28 | Plated film lens and optical imaging device |
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|---|---|
| CN110174718A true CN110174718A (en) | 2019-08-27 |
Family
ID=67699355
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910575982.XA Pending CN110174718A (en) | 2019-06-28 | 2019-06-28 | Plated film lens and optical imaging device |
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| CN (1) | CN110174718A (en) |
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| CN112558192A (en) * | 2019-09-25 | 2021-03-26 | 深圳市融光纳米科技有限公司 | Optical film, nano-structure color crystal, mixture of nano-structure color crystal and preparation method of nano-structure color crystal |
| CN113009601A (en) * | 2021-03-10 | 2021-06-22 | 浙江舜宇光学有限公司 | Antireflection film system, optical element, and method for producing film system |
| CN113050208A (en) * | 2021-03-10 | 2021-06-29 | 浙江舜宇光学有限公司 | Resin prism lens, film coating method thereof and long-focus camera |
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