CN110161595B - Optical lens plated with antireflection film system and optical lens - Google Patents
Optical lens plated with antireflection film system and optical lens Download PDFInfo
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- CN110161595B CN110161595B CN201910574391.0A CN201910574391A CN110161595B CN 110161595 B CN110161595 B CN 110161595B CN 201910574391 A CN201910574391 A CN 201910574391A CN 110161595 B CN110161595 B CN 110161595B
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- 230000003287 optical effect Effects 0.000 title claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 46
- 239000000463 material Substances 0.000 claims description 42
- 238000002834 transmittance Methods 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 7
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 5
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 5
- 229920001577 copolymer Polymers 0.000 claims description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 229920000098 polyolefin Polymers 0.000 claims description 3
- -1 cyclic olefin Chemical class 0.000 claims description 2
- 229920001038 ethylene copolymer Polymers 0.000 claims description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims description 2
- 238000001579 optical reflectometry Methods 0.000 abstract description 7
- 238000002310 reflectometry Methods 0.000 description 9
- 230000003667 anti-reflective effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- JIMODRYHNQDMSX-UHFFFAOYSA-N [GeH2].[Si] Chemical compound [GeH2].[Si] JIMODRYHNQDMSX-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910052990 silicon hydride Inorganic materials 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/001—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras
- G02B13/008—Miniaturised objectives for electronic devices, e.g. portable telephones, webcams, PDAs, small digital cameras designed for infrared light
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Optical Filters (AREA)
Abstract
The invention relates to an optical lens plated with an antireflection film system, comprising: a substrate (1), an antireflection film (2) and a lens; the antireflection film (2) is composed of a plurality of alternately laminated first refractive index film layers (H) and second refractive index film layers (L); the film layer of the antireflection film (2) plated on the surface of the substrate (1) is a first refractive index film layer (H) or a second refractive index film layer (L); the film layer of the antireflection film (2) far away from the outermost side of the substrate (1) is a first refractive index film layer (H) or a second refractive index film layer (L); wherein the refractive index n1 of each of the first refractive index film layers (H) satisfies: 2.0.ltoreq.n1.ltoreq.4.0, the refractive index n2 of each of the second refractive index film layers (L) satisfying: n2 is more than or equal to 1.4 and less than or equal to 2.0. The anti-reflection film system structure can reduce the light reflectivity of the visible light region and simultaneously fully reduce the light reflectivity of the near infrared region.
Description
Technical Field
The invention relates to an optical lens plated with an antireflection film system and an optical lens.
Background
The 3D camera adopts infrared rays as emission light rays, so that the problem of influence of visible light on ambient illumination can be solved. Currently, three main stream 3D vision techniques are used in the industry: structured light technology, time of flight (TOF), binocular multi-angle stereo imaging. The TOF scheme has the most prospect due to the advantages of convenient use, lower cost and the like. The TOF scheme captures the flight time of near infrared rays from transmitting to receiving through a special sensor, and judges the object distance. An antireflection film is applied to the surface of an optical member such as a lens or a prism, and is mainly intended to improve the transmittance of an optical element composed of a plurality of lenses, and in particular to make the brightness of an image and an improved optical instrument easily visible by suppressing reflection in the visible spectrum. Since the light reflectivity in the near infrared region increases with the increase of the light wavelength, the antireflection film in the prior art can only reduce the reflection in the visible light region of the spectrum, and the effect of reducing the reflection in the near infrared region is not obvious.
Disclosure of Invention
The present invention has been made to solve the above problems, and an object of the present invention is to provide an antireflection film-coated optical lens capable of sufficiently reducing the light reflectance in the near infrared region while reducing the light reflectance in the visible region, and an optical lens including the same.
In order to achieve the above object, the present invention provides an optical lens coated with an antireflection film system, comprising:
a substrate, an antireflection film, and a lens; the antireflection film is composed of a plurality of alternately laminated first refractive index film layers and second refractive index film layers;
the film layer of the antireflection film plated on the surface of the substrate is a first refractive index film layer or a second refractive index film layer;
the film layer of the antireflection film far away from the outermost side of the substrate is a first refractive index film layer or a second refractive index film layer;
wherein the refractive index n1 of each of the first refractive index film layers satisfies: n1 is more than or equal to 2.0 and less than or equal to 4.0, and the refractive index n2 of each second refractive index film layer meets the following conditions: n2 is more than or equal to 1.4 and less than or equal to 2.0.
According to one aspect of the present invention, the material of the first refractive index film layer is: silicon hydride, silicon germanium hydride, siC, nb 2 O 5 、Ta 2 O 5 And at least one of oxides of Ti.
According to one aspect of the present invention, the second refractive index film layer is made of: al, ti, si, sn, hf, ta, Y, and at least one of an oxide, a nitride, and an oxynitride.
According to one aspect of the invention, the material of the first refractive index film layer is Ti 3 O 5 The material of the second refractive index film layer is Al 2 O 3 And SiO 2 Is a mixture of (a) and (b).
According to one aspect of the invention, the material of the substrate is a mixture comprising one or more of the following materials:
a polymethyl methacrylate material, the material being a poly (methyl methacrylate),
an epoxy resin material is used as the material,
a polyolefin material having a high molecular weight,
a cycloolefin copolymer which is prepared by the process of the present invention,
the cyclic olefin material is used as a material,
an ethylene copolymer;
and the substrate refractive index n satisfies: n is more than or equal to 1.5 and less than or equal to 1.7.
According to one aspect of the invention, at least one surface of the substrate is plated with the anti-reflection film.
According to one aspect of the present invention, the total thickness ratio of the first refractive index film layer to the second refractive index film layer is h:l=1:1 to 1:3.
According to one aspect of the present invention, the maximum reflectance Rmax and the average reflectance Rave of the optical lens in each band satisfy the following conditions:
rmax is less than or equal to 5% and Rave is less than or equal to 3% at 430nm-630 nm;
rmax is less than or equal to 3 percent between 850nm and 1050nm.
According to one aspect of the invention, the optical lens has a reflectivity R < 0.5% at 850nm or 940nm in the near infrared range.
According to one aspect of the present invention, the average transmittance Tave and the minimum transmittance Tmin of the optical lens in each band satisfy the following conditions:
at 850nm-1050nm, tave is more than or equal to 95%;
at 430nm-900nm, tave is more than or equal to 88%, and Tmin is more than or equal to 74.5%.
According to one aspect of the present invention, when the antireflection films are arranged in the order of (H-L) n, the film layer of one surface of the joining substrate is a first refractive index film layer, and the outermost film layer far from the substrate is a second refractive index film layer; when arranged in the order of (L-H) n, the film layer on one surface of the bonded substrate is a second refractive index film layer, and the outermost film layer far from the substrate is a first refractive index film layer. The two setting methods can enable the refractive indexes of the film layers at the two sides of the antireflection film to be different, so that the light in the near infrared region can be fully antireflection when passing through the antireflection film, and the light transmittance of the optical lens in the near infrared region is increased.
According to one aspect of the present invention, when the antireflection film is arranged in the order of (H-L) n-H, the film layer of one surface thereof that engages the substrate and the outermost film layer that is away from the substrate are both first refractive index film layers; when arranged in the order (L-H) n-L, the film layer that engages one surface of the substrate and the outermost film layer that is remote from the substrate are both second refractive index film layers. The two setting methods can enable the refractive indexes of the film layers at the two sides of the antireflection film to be the same, so that the light in the near infrared region can be fully antireflection when passing through the antireflection film, and the light transmittance of the optical lens in the near infrared region is increased.
According to one aspect of the present invention, an antireflection film includes two film systems bonded to two surfaces of a substrate, respectively. The mode can strengthen the interference effect of light rays in the antireflection film system, so that the light rays in the near infrared region are more fully antireflection when passing through the antireflection film, and the light transmittance of the optical lens in the near infrared region is effectively increased.
According to the antireflection film system structure, the optical lens plated with the antireflection film system structure and the optical lens, the light reflectivity in a visible light region can be effectively reduced, meanwhile, the light transmittance in a near infrared region is enabled to be sufficient, and the light reflectivity in the near infrared region is effectively reduced.
Drawings
FIG. 1 is a schematic representation of a pattern of antireflective film systems plated on a lens according to a first embodiment of the invention;
fig. 2 is a schematic view schematically showing the reflectivity of an optical lens coated with an antireflection film system according to a first embodiment of the present invention in the visible and near infrared bands;
fig. 3 is a schematic view schematically showing transmittance of an optical lens according to a first embodiment of the present invention;
FIG. 4 is a schematic representation of a pattern of antireflective film systems plated on a lens according to a second embodiment of the invention;
FIG. 5 is a schematic representation of a pattern of antireflective film systems plated on a lens according to a third embodiment of the invention;
FIG. 6 is a schematic representation of a pattern of antireflective film systems plated on a lens according to a fourth embodiment of the invention;
fig. 7 is a schematic view schematically showing the reflectivity of an optical lens coated with an antireflection film system in the visible and near infrared bands according to a fourth embodiment of the present invention;
fig. 8 is a schematic representation of a pattern of antireflective film system plated on a lens according to a fifth embodiment of the invention.
Detailed Description
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings that are required to be used in the embodiments will be briefly described below. It is apparent that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained from these drawings without inventive effort for a person of ordinary skill in the art.
In describing embodiments of the present invention, the terms "longitudinal," "transverse," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like are used in terms of orientation or positional relationship shown in the drawings for convenience of description and simplicity of description only, and do not denote or imply that the devices or elements in question must have a particular orientation, be constructed and operated in a particular orientation, so that the above terms are not to be construed as limiting the invention.
The present invention will be described in detail below with reference to the drawings and the specific embodiments, which are not described in detail herein, but the embodiments of the present invention are not limited to the following embodiments.
Figure 1 schematically illustrates a pattern of antireflective film systems plated onto a lens according to the present invention. The optical lens according to the present invention includes a base material 1, an antireflection film 2, and a lens, and since the invention is to plate the antireflection film system structure on the lens, the antireflection film system structure is only schematically shown in the drawings, that is, the antireflection film 2 is plated on the base material 1, and the lens is not shown. The antireflection film 2 is constituted of a plurality of alternately laminated first refractive index film layers H and second refractive index film layers L. The antireflection film 2 is plated on one surface of the substrate 1, or two film systems of the antireflection film 2 including two film systems are plated on both surfaces of the substrate 1, respectively, and then the substrate 1 or the outermost film layer of either one of the antireflection films 2 including two film systems is plated on the lens. The film layer of the antireflection film 2 plated on the surface of the substrate 1 is a first refractive index film layer H or a second refractive index film layer L, and the film layer of the antireflection film 2 far away from the plated surface of the substrate 1 is a first refractive index film layer H or a second refractive index film layer L.
In the present invention, the material of the first refractive index film layer H is: silicon hydride (Si: H), silicon germanium hydride (SiGe: H), siC, nb 2 O 5 、Ta 2 O 5 And at least one of oxides of Ti; the second refractive index film layer L is made of the following materials: al, ti, si, sn, hf, ta, Y, and at least one of an oxide, a nitride, and an oxynitride. First refractive index film layer H: the refractive index of the hydrogenated silicon film material is 1.46-3.7 in the wavelength range of 800-1100nm, the refractive index of the SiC film material is 2.57-3.13, ti 3 O 5 The refractive index of the film material is 2.23-2.60, nb 2 O 5 The refractive index of the film material at 550nm is 2.30. Second refractive index film layer L: siO (SiO) 2 The refractive index of the film material is 1.43-1.54, al 2 O 3 The refractive index of the film material is 1.73-1.83, hfO 2 The refractive index of the film layer is 1.89-2.12, and the refractive index of the TiN film layer material is 1.20-2.69. In order to ensure the light transmittance of the antireflection film 2 in the near infrared region, the antireflection film system of the invention adopts Ti 3 O 5 As a material of the first refractive index film layer H; while the material of the second refractive index film layer L adopts SiO 2 And Al 2 O 3 Can achieve a smooth transmission spectrum.
In the present invention, it is necessary to set appropriate reflectivities for the first refractive index film layer H, the second refractive index film layer L, and the base material 1 to achieve antireflection. In the invention, the refractive index n1 of the material with high refractive index at the wavelength of 550nm is more than or equal to 2.0 and less than or equal to 4.0; the refractive index n2 of the material with low refractive index at the wavelength of 550nm is more than or equal to 1.4 and less than or equal to 2.0; the refractive index n of the base material at the wavelength of 550nm is more than or equal to 1.5 and less than or equal to 1.7. Since the substrate 1 is a supporting surface of the anti-reflection film 2 and is also a light-transmitting surface, the substrate 1 should have sufficient light transmittance and stable chemical properties and sufficient rigidity, and thus the material should be a mixture of one or more of polymethyl methacrylate, epoxy resin, polyolefin, cycloolefin copolymer, copolymer of cycloolefin and ethylene.
Fig. 1 schematically shows a pattern of antireflection film system plated on a lens according to a first embodiment of the present invention, in which the film layers in the antireflection film 2 are arranged in accordance with (H-L) n, where n is 4, the antireflection film 2 is composed of eight alternately laminated first refractive index film layers H and second refractive index film layers L, the film layer of one surface of the antireflection film 2 bonded to the substrate 1 is the first refractive index film layer H, and then the second refractive index film layer L, the first refractive index film layer H, and the second refractive index film layer L are sequentially stacked in this order, light is preferentially passed through the second refractive index film layer L, light reflection is preliminarily reduced, then sequentially passed through the alternately laminated refractive index film layers H, and finally passed through the substrate 1 and then enters the lens. In this embodiment, the physical thickness ratio of each film layer of the eight-layer film structure is 1:5:2:2:7:1:3:9, the total thickness ratio of the first refractive index film layer H to the second refractive index film layer L is between 1:1 and 1:3, wherein the first film layer is Ti 3 O 5 The thickness of the layer is 10-15 nm, and the thickness of the mixture layer of the second film layer is 40-50 nm; ti of the third film layer 3 O 5 The thickness of the layer is 20-40 nm, the thickness of the mixture layer of the fourth film layer is 10-20 nm, the Ti of the fifth film layer 3 O 5 The thickness of the layer is 70-90 nm, and the thickness of the mixture layer of the sixth film layer is 10-20 nm; ti of seventh film layer 3 O 5 The thickness of the layer is 20-30 nm, and the thickness of the mixture layer of the eighth film layer is 90-110 nm. The reflection reducing film system of the embodiment ensures that the refraction times of light in the reflection reducing film 2 are more, the light in the visible light region with shorter wavelength is fully reflected, and the reflectivity in the near infrared region can be reduced simultaneously by matching with the arrangement of the stacking sequence and the thickness of each film layer of the embodiment, so that the optical lens is ensured to have enough light transmittance in the visible light region and the near infrared region, and the transparency of the optical lens in the visible light region and the near infrared region can meet the transparency requirement.
FIG. 2 is a schematic view showing the reflectivity of an optical lens coated with an antireflection film system in the visible and near infrared bands according to a first embodiment of the present invention; fig. 3 shows a schematic transmittance diagram of an optical lens according to a first embodiment of the present invention. As can be seen from fig. 2 and 3, the antireflection coating structure of the present embodiment is coated to make the optical lens have a maximum reflectance R in the near infrared band of 850nm to 1050nm max Less than or equal to 3 percent, and average reflectivity R between 920nm and 980nm ave Less than or equal to 0.3 percent; and an optical lens comprising at least four lenses having an average transmittance T in the near infrared range of 850nm to 1050nm ave Not less than 95%, and the antireflection film structure, the optical lens and the optical lens of the embodiment meet the use requirement in the near infrared band. In addition, the maximum reflectance R in the visible light band of 430nm to 630nm max Less than or equal to 5 percent, average reflectivity R ave Less than or equal to 3 percent; maximum reflectance R at 630nm to 900nm max Less than or equal to 2 percent, average reflectivity R ave Less than or equal to 1.6 percent. An optical lens comprising at least four lenses having an average transmittance T in the visible light range of 430nm to 900nm ave Not less than 88% and minimum transmittance T min More than or equal to 74.5 percent. Therefore, the optical lens with the optical lens coated with the antireflection film system of the embodiment meets the use requirement of transparency in both visible light and near infrared bands.
According to the antireflection film structure coated on a lens according to the second embodiment of the present invention, in the present embodiment, the film layers of the antireflection film 2 are arranged in the order of (L-H) n, where n is 4, the antireflection film 2 is composed of eight alternately laminated first refractive index film layers H and second refractive index film layers L, the film layer joining one surface of the substrate 1 may also be the second refractive index film layer L, and the outermost film layer away from the substrate 1 is the first refractive index film layer H. As shown in fig. 4, the rest film layers of the anti-reflection film 2 are still alternately stacked, and the specific number of alternating layers can be determined according to specific product requirements. The setting method can realize that the light in the near infrared region is fully anti-reflected when passing through the anti-reflection film, thereby increasing the light transmittance of the optical lens in the near infrared region.
According to the antireflection film system structure plated on a lens of the third embodiment of the present invention, in the present embodiment, the film layers of the antireflection film 2 are arranged in the order of (H-L) n-H, where n is 4, and the antireflection film 2 is composed of nine first refractive index film layers H and second refractive index film layers L alternately laminated. As shown in fig. 5, the film layer of one surface of the antireflection film 2 bonded to the substrate 1 is a first refractive index film layer H, and the outermost film layer away from the substrate 1 is also a first refractive index film layer H, and the other film layers of the antireflection film 2 are still alternately laminated. The refractive indexes of the film layers at the two sides of the antireflection film 2 are the same, so that the light rays in the near infrared region can be fully antireflection when passing through the antireflection film 2, and the light transmittance of the optical lens in the near infrared region is increased.
According to the antireflection film system structure plated on a lens of the fourth embodiment of the present invention, in the present embodiment, the film layers of the antireflection film 2 are arranged in the order of (L-H) n-L, where n is 4, and the antireflection film 2 is composed of nine first refractive index film layers H and second refractive index film layers L alternately laminated. As shown in fig. 6, the film layer of one surface of the antireflection film 2 bonded to the substrate 1 is a second refractive index film layer L, the outermost film layer away from the substrate 1 is also a second refractive index film layer L, and the remaining film layers are still alternately laminated. Light preferentially passes through the second refractive index film layer L, light reflection is primarily reduced, then the light passes through the refractive index film layers which are alternately stacked in sequence, and finally the light still passes through the second refractive index film layer L and then enters the lens through the base material 1. In the present embodiment, the thickness ratio of the first refractive index film layer H and the second refractive index film layer L is 15:1:5:3:3:6:1:3:9. the total thickness ratio of the first refractive index film layer H to the second refractive index film layer L is between 1:1 and 1:3. Fig. 7 shows a schematic view of the reflectance of the optical lens coated with the antireflection film system according to the present embodiment in the visible and near infrared bands. From this, it can be seen that the reflectance parameter of the optical lens coated with the antireflection film system of the present embodiment is the same as that of the first embodiment of the present invention. Also, the transmittance parameter of an optical lens including at least four lenses is the same as that of the first embodiment of the present invention. Therefore, the technical effects obtained in this embodiment are also the same as those in the first embodiment of the present invention.
According to the antireflection film system structure plated on a lens according to the fifth embodiment of the present invention, the antireflection film 2 is composed of eight first refractive index film layers H and second refractive index film layers L alternately laminated. As shown in fig. 8, the antireflection film 2 includes two film systems, in which each film system is alternately laminated, and the film system above the substrate 1 includes five film layers, wherein the film layer bonded to the upper surface of the substrate 1 is a second refractive index film layer L, and the outermost film layer far from the substrate 1 is also a second refractive index film layer L; the film system below the substrate 1 comprises three films, wherein the film bonded to the upper surface of the substrate 1 is a second refractive index film L, and the outermost film far from the substrate 1 is also a second refractive index film L. The mode can strengthen the interference effect of light rays in the antireflection film system, so that the light rays in the near infrared region are more fully antireflection when passing through the antireflection film, and the light transmittance of the optical lens in the near infrared region is effectively increased. According to the inventive concept, the number of film layers of the film system respectively located on the upper and lower sides of the substrate 1 and the stacking sequence and the layer thickness setting of each film layer can be adjusted accordingly according to the setting modes in the first to fourth embodiments of the invention and in combination with the actual product requirements.
According to the optical lens and the optical lens provided by the invention, the light reflectivity of the visible light region can be effectively reduced, meanwhile, the light transmittance in the near infrared region is enabled to be sufficient, and the light reflectivity in the near infrared region is effectively reduced.
The foregoing is merely exemplary of embodiments of the present invention and, as for devices and structures not explicitly described herein, it should be understood that they may be implemented using general purpose devices and general purpose methods known in the art.
The above description is only one embodiment of the present invention and is not intended to limit the present invention, and various modifications and variations of the present invention will be apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (7)
1. An optical lens coated with an antireflection film system, comprising: a substrate (1), an antireflection film (2) and a lens; the antireflection film (2) is composed of a plurality of alternately laminated first refractive index film layers (H) and second refractive index film layers (L);
the film layer of the antireflection film (2) plated on the surface of the substrate (1) is a first refractive index film layer (H) or a second refractive index film layer (L);
the film layer of the antireflection film (2) far away from the outermost side of the substrate (1) is a first refractive index film layer (H) or a second refractive index film layer (L);
wherein the refractive index n1 of each of the first refractive index film layers (H) satisfies: 2.0.ltoreq.n1.ltoreq.4.0, the refractive index n2 of each of the second refractive index film layers (L) satisfying: n2 is more than or equal to 1.4 and less than or equal to 2.0;
the material of the first refractive index film layer (H) is Ti 3 O 5 The material of the second refractive index film layer (L) is Al 2 O 3 And SiO 2 Is a mixture of (a) and (b);
the antireflection film (2) is composed of eight alternately laminated film layers, the Ti of the first film layer 3 O 5 The thickness of the layer is 10-15 nm, and the thickness of the mixture layer of the second film layer is 40-50 nm; ti of the third film layer 3 O 5 The thickness of the layer is 20-40 nm, the thickness of the mixture layer of the fourth film layer is 10-20 nm, the Ti of the fifth film layer 3 O 5 The thickness of the layer is 70-90 nm, and the thickness of the mixture layer of the sixth film layer is 10-20 nm; ti of seventh film layer 3 O 5 The thickness of the layer is 20-30 nm, and the thickness of the mixture layer of the eighth film layer is 90-110 nm.
2. An optical lens coated with an antireflection film system according to claim 1, characterized in that the material of the substrate (1) is a mixture comprising one or more of the following materials:
a polymethyl methacrylate material, the material being a poly (methyl methacrylate),
an epoxy resin material is used as the material,
a polyolefin material having a high molecular weight,
a cycloolefin copolymer which is prepared by the process of the present invention,
the cyclic olefin material is used as a material,
an ethylene copolymer;
and the refractive index n of the substrate (1) satisfies: n is more than or equal to 1.5 and less than or equal to 1.7.
3. Optical lens coated with an anti-reflection film system according to claim 1, characterized in that at least one surface of the substrate (1) is coated with the anti-reflection film (2).
4. Optical lens coated with an antireflection film system according to claim 1, characterized in that the total thickness ratio of the first refractive index film layer (H) to the second refractive index film layer (L) is h:l=1:1-1:3.
5. The antireflection film-coated optical lens according to any one of claims 1 to 4, wherein the maximum reflectance Rmax and the average reflectance Rave of the optical lens in each band satisfy the following conditions:
rmax is less than or equal to 5% and Rave is less than or equal to 3% at 430nm-630 nm;
rmax is less than or equal to 3 percent between 850nm and 1050nm.
6. The optical lens coated with an antireflection film system according to any one of claims 1 to 4, wherein the optical lens has a reflectance R < 0.5% at 850nm or 940nm in the near infrared band range.
7. An optical lens comprising the antireflection film-coated optical lens of any one of claims 1 to 6, wherein the average transmittance Tave and the minimum transmittance Tmin of the optical lens in each wavelength band satisfy the following conditions:
at 850nm-1050nm, tave is more than or equal to 95%;
at 430nm-900nm, tave is more than or equal to 88%, and Tmin is more than or equal to 74.5%.
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CN112437222A (en) * | 2020-12-15 | 2021-03-02 | 维沃移动通信有限公司 | Camera shooting assembly and electronic equipment |
CN115308820A (en) * | 2022-08-12 | 2022-11-08 | 江苏斯迪克新材料科技股份有限公司 | Semi-transparent semi-reflective waterproof film, optical lens and imaging device |
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WO1991008106A1 (en) * | 1989-12-01 | 1991-06-13 | Viratec Thin Films, Inc. | Antireflection layer system with integral uv blocking properties |
CN107957600A (en) * | 2018-01-17 | 2018-04-24 | 江苏康耐特光学有限公司 | A kind of anti-reflection anti-infrared plated film resin lens and preparation method thereof |
CN108761582A (en) * | 2018-07-10 | 2018-11-06 | 浙江舜宇光学有限公司 | Film layer structure and lens barrel comprising the film layer structure |
CN210347972U (en) * | 2019-06-28 | 2020-04-17 | 浙江舜宇光学有限公司 | Optical lens plated with antireflection film system and optical lens |
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WO1991008106A1 (en) * | 1989-12-01 | 1991-06-13 | Viratec Thin Films, Inc. | Antireflection layer system with integral uv blocking properties |
CN107957600A (en) * | 2018-01-17 | 2018-04-24 | 江苏康耐特光学有限公司 | A kind of anti-reflection anti-infrared plated film resin lens and preparation method thereof |
CN108761582A (en) * | 2018-07-10 | 2018-11-06 | 浙江舜宇光学有限公司 | Film layer structure and lens barrel comprising the film layer structure |
CN210347972U (en) * | 2019-06-28 | 2020-04-17 | 浙江舜宇光学有限公司 | Optical lens plated with antireflection film system and optical lens |
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