CN110141983A - Photoresist dilution automatically configures device and photoresist dilution automatically configures component - Google Patents
Photoresist dilution automatically configures device and photoresist dilution automatically configures component Download PDFInfo
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- CN110141983A CN110141983A CN201910448410.5A CN201910448410A CN110141983A CN 110141983 A CN110141983 A CN 110141983A CN 201910448410 A CN201910448410 A CN 201910448410A CN 110141983 A CN110141983 A CN 110141983A
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- Prior art keywords
- valve
- solenoid valve
- pneumatic operated
- photoresist
- operated valve
- Prior art date
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/40—Mixing liquids with liquids; Emulsifying
- B01F23/49—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2112—Level of material in a container or the position or shape of the upper surface of the material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/71—Feed mechanisms
- B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
- B01F35/71805—Feed mechanisms characterised by the means for feeding the components to the mixer using valves, gates, orifices or openings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/83—Forming a predetermined ratio of the substances to be mixed by controlling the ratio of two or more flows, e.g. using flow sensing or flow controlling devices
- B01F35/833—Flow control by valves, e.g. opening intermittently
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
Abstract
Device is automatically configured the present invention provides a kind of dilution of photoresist and photoresist dilution automatically configures component, it is related to the technical field that semicon industry is sprayed glue spreader, including control mechanism, inert gas inleting pipe, compressed air inlet pipe, glue feed mechanism, liquid supplying device, first pneumatic operated valve, first solenoid valve, second pneumatic operated valve, second solenoid valve, third pneumatic operated valve, third solenoid valve, 4th pneumatic operated valve, 4th solenoid valve and collecting mechanism, operator is not necessarily to whole manual operation and configures glue, it greatly reduced the time contacted with photoresist and diluent, the generation for the case where worker is injured by harmful substance when effectively reducing human configuration glue, and save the labour of operator.
Description
Technical field
The present invention relates to semicon industries to be sprayed glue spreader technical field, matches automatically more particularly, to a kind of dilution of photoresist
It sets device and photoresist dilution automatically configures component.
Background technique
Spraying glue spreader is that the machinery that photoresist can be evenly coated on the bottom liners such as silicon wafer, glass or metal by one kind is set
It is standby, using very extensive in semicon industry.
The spraying glue spreader of the prior art needs human configuration glue, that is, need worker by photoresist and diluent according to
Certain ratio is mixed to produce available glue.
But the harmful substance that photoresist and diluent give out during human configuration glue can cause to hurt to human body
Evil, and the labor intensity of human configuration glue is larger.
Summary of the invention
Device is automatically configured the purpose of the present invention is to provide a kind of dilution of photoresist and photoresist dilution automatically configures group
The generation of the case where part, worker is injured by harmful substance when effectively reducing human configuration glue, while saving operator
Labour.
Photoresist dilution provided by the invention automatically configures device, including control mechanism, inert gas inleting pipe, compression sky
Gas air inlet pipe, glue feed mechanism, liquid supplying device, the first pneumatic operated valve, the first solenoid valve, the second pneumatic operated valve, second solenoid valve, third gas
Dynamic valve, third solenoid valve, the 4th pneumatic operated valve, the 4th solenoid valve and collecting mechanism；Control mechanism for control the first solenoid valve,
Second solenoid valve, third solenoid valve and the 4th solenoid valve open or close；Inert gas inleting pipe is pneumatic with first respectively
Valve is connected to third pneumatic operated valve, compressed air inlet pipe respectively with the first solenoid valve, second solenoid valve, third solenoid valve and
The connection of four solenoid valves；First solenoid valve is connected to the first pneumatic operated valve, and second solenoid valve is connected to the second pneumatic operated valve, third solenoid valve
It is connected to third pneumatic operated valve, the 4th solenoid valve is connected to the 4th pneumatic operated valve；First pneumatic operated valve is connected to glue feed mechanism, and third is pneumatic
Valve is connected to liquid supplying device, and the second pneumatic operated valve is connected to glue feed mechanism and collecting mechanism respectively, the 4th pneumatic operated valve respectively with confession
Liquid mechanism and collecting mechanism connection；Glue feed mechanism is for accommodating photoresist, and liquid supplying device is for accommodating diluent, collecting mechanism
For accommodating photoresist and diluent.
Further, first throttle valve is provided between the first solenoid valve and the first pneumatic operated valve；First throttle valve respectively with
First solenoid valve and the connection of the first pneumatic operated valve；Second throttle, the second section are provided between second solenoid valve and the second pneumatic operated valve
Stream valve is connected to second solenoid valve and the second pneumatic operated valve respectively.
Further, third throttle valve is provided between third solenoid valve and third pneumatic operated valve；Third throttle valve respectively with
Third solenoid valve is connected to third pneumatic operated valve；It is provided with the 4th throttle valve between 4th solenoid valve and the 4th pneumatic operated valve, Section four
Stream valve is connected to the 4th solenoid valve and the 4th pneumatic operated valve respectively.
Further, first flowmeter is provided between the 4th pneumatic operated valve and collecting mechanism；First flowmeter is for detecting
The flow of diluent, when the flow of diluent reaches the first preset value, first flowmeter can will test signal and pass to control
Mechanism processed, and control mechanism can control third solenoid valve and the 4th solenoid valve is closed.
Further, second flowmeter is provided between the second pneumatic operated valve and collecting mechanism；Second flowmeter is for detecting
The flow of photoresist, when the flow of photoresist reaches the second preset value, second flowmeter can will test signal and pass to control
Mechanism processed, and control mechanism can control the first solenoid valve and second solenoid valve is closed.
Further, the first check valve is provided between the 4th pneumatic operated valve and collecting mechanism；First check valve is for preventing
Diluent and mixing liquid in collecting mechanism flow into liquid supplying device.
Further, second one-way valve is provided between the second pneumatic operated valve and collecting mechanism；Second one-way valve is for preventing
Photoresist and mixing liquid in collecting mechanism flow into glue feed mechanism.
Further, the present invention also provides a kind of photoresist dilution automatically configure component, including waste gas recovery mechanism with
And photoresist dilution automatically configures device；Waste gas recovery mechanism is used to collect remaining in glue feed mechanism and liquid supplying device give up
Gas.
Further, it further includes first manual valve and first sensor that photoresist dilution, which automatically configures component,；It is first-hand
For dynamic valve respectively with glue feed mechanism and waste gas recovery mechanism connection, first sensor is used to detect containing for photoresist in glue feed mechanism
Amount, when the photoresist in glue feed mechanism is used up, first sensor can will test signal and pass to control mechanism, and control machine
Structure can control the first solenoid valve and second solenoid valve is closed.
Further, it further includes the second hand-operated valve and second sensor that photoresist dilution, which automatically configures component,；Second-hand
For dynamic valve respectively with glue feed mechanism and waste gas recovery mechanism connection, second sensor is used to detect containing for diluent in liquid supplying device
Amount, when the diluent in liquid supplying device is used up, second sensor can will test signal and pass to control mechanism, and control machine
Structure can control third solenoid valve and the 4th solenoid valve is closed.
Photoresist dilution provided by the invention automatically configures device, and operator is not necessarily to whole manual operation and configures glue, greatly
Big reduces the time contacted with photoresist and diluent, and worker is by harmful substance when effectively reducing human configuration glue
The generation of the case where injury, and save the labour of operator.
Photoresist dilution provided by the invention automatically configures component, including waste gas recovery mechanism, realizes to inert gas
With the recycling of remaining harmful liquid, the inert gas for avoiding abundant residues is dissipated to phenomenon in air, protects environment.
Detailed description of the invention
It, below will be to specific in order to illustrate more clearly of the specific embodiment of the invention or technical solution in the prior art
Embodiment or attached drawing needed to be used in the description of the prior art be briefly described, it should be apparent that, it is described below
Attached drawing is some embodiments of the present invention, for those of ordinary skill in the art, before not making the creative labor
It puts, is also possible to obtain other drawings based on these drawings.
Fig. 1 is the structural schematic diagram that photoresist provided in an embodiment of the present invention dilution automatically configures device；
Fig. 2 is the structural schematic diagram that photoresist provided in an embodiment of the present invention dilution automatically configures component.
Icon: the dilution of 1- photoresist automatically configures device；2- inert gas inleting pipe；3- compressed air inlet pipe；4- is supplied
Gluing mechanism；5- liquid supplying device；The first pneumatic operated valve of 6-；The first solenoid valve of 7-；The second pneumatic operated valve of 8-；9- second solenoid valve；10- third
Pneumatic operated valve；11- third solenoid valve；The 4th pneumatic operated valve of 12-；The 4th solenoid valve of 13-；14- collecting mechanism；15- first throttle valve；
16- second throttle；17- third throttle valve；The 4th throttle valve of 18-；19- first flowmeter；20- second flowmeter；21- first
Check valve；22- second one-way valve；23- waste gas recovery mechanism；24- first manual valve；The second hand-operated valve of 25-；26- photoresist is dilute
It releases and automatically configures component.
Specific embodiment
Technical solution of the present invention is clearly and completely described below in conjunction with embodiment, it is clear that described reality
Applying example is a part of the embodiment of the present invention, instead of all the embodiments.Based on the embodiments of the present invention, the common skill in this field
Art personnel every other embodiment obtained without making creative work belongs to the model that the present invention protects
It encloses.
Fig. 1 is the structural schematic diagram that photoresist provided in an embodiment of the present invention dilution automatically configures device, as shown in Figure 1,
Photoresist dilution provided in an embodiment of the present invention automatically configures device 1, including control mechanism, inert gas inleting pipe 2, compression sky
Gas air inlet pipe 3, glue feed mechanism 4, liquid supplying device 5, the first pneumatic operated valve 6, the first solenoid valve 7, the second pneumatic operated valve 8, second solenoid valve
9, third pneumatic operated valve 10, third solenoid valve 11, the 4th pneumatic operated valve 12, the 4th solenoid valve 13 and collecting mechanism 14；Control mechanism
For controlling opening or closing for the first solenoid valve 7, second solenoid valve 9, third solenoid valve 11 and the 4th solenoid valve 13；Inertia
Gas inlet pipe 2 is connected to the first pneumatic operated valve 6 and third pneumatic operated valve 10 respectively, compressed air inlet pipe 3 respectively with the first electromagnetism
Valve 7, second solenoid valve 9, third solenoid valve 11 and the connection of the 4th solenoid valve 13；First solenoid valve 7 and the first pneumatic operated valve 6 connect
Logical, second solenoid valve 9 is connected to the second pneumatic operated valve 8, and third solenoid valve 11 is connected to third pneumatic operated valve 10, the 4th solenoid valve 13 and
The connection of 4th pneumatic operated valve 12；First pneumatic operated valve 6 is connected to glue feed mechanism 4, and third pneumatic operated valve 10 is connected to liquid supplying device 5, and second
Pneumatic operated valve 8 is connected to glue feed mechanism 4 and collecting mechanism 14 respectively, the 4th pneumatic operated valve 12 respectively with liquid supplying device 5 and collect
Mechanism 14 is connected to；Glue feed mechanism 4 is for accommodating photoresist, and liquid supplying device 5 is for accommodating diluent, and collecting mechanism 14 is for accommodating
Photoresist and diluent.
Wherein, control mechanism can be controller, and controller model can be KV-N60AT；First solenoid valve 7, second solenoid valve
9, the type of third solenoid valve 11 and the 4th solenoid valve 13 is two-bit triplet solenoid valve, and model is VK332-5H-M5；The
One pneumatic operated valve 6, the second pneumatic operated valve 8, third pneumatic operated valve 10 and 12 type of the 4th pneumatic operated valve are pneumatic diaphragm valve, and model is
C504D7730510A1HPW。
Secondly, glue feed mechanism 4 can include the first staving and the first bung for glue bucket, liquid supplying device 5 can be confession for for glue bucket
Liquid bucket, liquid-supplying bucket include the second staving and second lid；First pneumatic operated valve 6 passes through the first through hole on the first bung by pipeline
It being connected to the first staving, third pneumatic operated valve 10 passes through the second through-hole in second lid by pipeline and is connected to the second staving, the
Two pneumatic operated valves 8 pass through the third through-hole on the first bung by pipeline and are connected to the first staving, and the 4th pneumatic operated valve 12 passes through pipeline
Fourth hole in second lid is connected to the second staving.
Then, inert gas inleting pipe 2 can introduce nitrogen.Nitrogen, which is not easy to be formed with other substances, to be chemically reacted, and nitrogen
The extractive technique of gas is more mature, is commonly used in semicon industry, and using effect is good and is easily obtained.
In addition, collecting mechanism 14 can be vertical mixer, this setup, when photoresist and diluent all flow into it is vertical
When blender, operator can start vertical mixer and be stirred, to obtain the more uniform glue of ingredient, and time saving province
Power.
In the present embodiment, photoresist dilution automatically configures device 1, including control mechanism, inert gas inleting pipe 2, compression
Air intake duct 3, glue feed mechanism 4, liquid supplying device 5, the first pneumatic operated valve 6, the first solenoid valve 7, the second pneumatic operated valve 8, the second electromagnetism
Valve 9, third pneumatic operated valve 10, third solenoid valve 11, the 4th pneumatic operated valve 12, the 4th solenoid valve 13 and collecting mechanism 14；Control machine
Structure is for controlling opening or closing for the first solenoid valve 7, second solenoid valve 9, third solenoid valve 11 and the 4th solenoid valve 13；It is lazy
Property gas inlet pipe 2 be connected to respectively with the first pneumatic operated valve 6 and third pneumatic operated valve 10, compressed air inlet pipe 3 respectively with first electricity
Magnet valve 7, second solenoid valve 9, third solenoid valve 11 and the connection of the 4th solenoid valve 13；First solenoid valve 7 and the first pneumatic operated valve 6 connect
Logical, second solenoid valve 9 is connected to the second pneumatic operated valve 8, and third solenoid valve 11 is connected to third pneumatic operated valve 10, the 4th solenoid valve 13 and
The connection of 4th pneumatic operated valve 12；First pneumatic operated valve 6 is connected to glue feed mechanism 4, and third pneumatic operated valve 10 is connected to liquid supplying device 5, and second
Pneumatic operated valve 8 is connected to glue feed mechanism 4 and collecting mechanism 14 respectively, the 4th pneumatic operated valve 12 respectively with liquid supplying device 5 and collect
Mechanism 14 is connected to；Glue feed mechanism 4 is for accommodating photoresist, and liquid supplying device 5 is for accommodating diluent, and collecting mechanism 14 is for accommodating
Photoresist and diluent.When work, operator opens control mechanism, and control mechanism is enabled to control the first solenoid valve 7, second solenoid valve
9, third solenoid valve 11 and the 4th solenoid valve 13 are opened, then compressed air passes through the first solenoid valve 7 by compressed air inlet pipe 3
The first pneumatic operated valve 6 is flowed to open the first pneumatic operated valve 6, inert gas passes through the first air inlet by inert gas inleting pipe 2 at this time
Enter in glue feed mechanism 4 after valve；Again because compressed air is equally also flowed to by compressed air inlet pipe 3 by second solenoid valve 9
Second pneumatic operated valve 8 with by the second inlet open, so, when entering inert gas in glue feed mechanism 4, pressed in glue feed mechanism 4
Become larger by force, photoresist can be flowed into collecting mechanism 14 by the second pneumatic operated valve 8 at this time.Similarly, compressed air also can be by third gas
Dynamic valve 10 and the 4th pneumatic operated valve 12 are opened, then inert gas can also enter in liquid supplying device 5, and the pressure in liquid supplying device 5 is enabled to become
Greatly, diluent can be flowed into collecting mechanism 14 by the 4th pneumatic operated valve 12 at this time.Last operation person will obtain in collecting mechanism 14 again
To liquid cement agitation required glue uniformly can be obtained.
This photoresist dilution automatically configures device 1, and operator is not necessarily to whole manual operation and configures glue, greatly reduces
The time contacted with photoresist and diluent, worker is injured by harmful substance when effectively reducing human configuration glue feelings
The generation of condition, and save the labour of operator.
As shown in Figure 1, on the basis of the above embodiments, further, between the first solenoid valve 7 and the first pneumatic operated valve 6
It is provided with first throttle valve 15；First throttle valve 15 is connected to the first solenoid valve 7 and the first pneumatic operated valve 6 respectively；Second solenoid valve 9
And second be provided with second throttle 16 between pneumatic operated valve 8, second throttle 16 respectively with second solenoid valve 9 and the second pneumatic operated valve
8 connections.
Wherein, first throttle valve 15 and 16 model of second throttle are AS1002F-04.
In the present embodiment, before photoresist dilution automatically configures the work of device 1, the adjustable first throttle valve of operator
15 and second throttle 16 aperture, with play adjustment the first pneumatic operated valve 6 and the second pneumatic operated valve 8 open speed purpose, with
It is applicable in different duty requirements.
The set-up mode of first throttle valve 15 and second throttle 16, it is easy to operate, it increases photoresist dilution and matches automatically
The usage scenario of device 1 is set, the photoresist dilution that can be suitable for different configuration requirements automatically configures device 1, improves glue
The efficiency of configuration.
As shown in Figure 1, on the basis of the above embodiments, further, third solenoid valve 11 and third pneumatic operated valve 10 it
Between be provided with third throttle valve 17；Third throttle valve 17 is connected to third solenoid valve 11 and third pneumatic operated valve 10 respectively；4th electricity
Be provided with the 4th throttle valve 18 between magnet valve 13 and the 4th pneumatic operated valve 12, the 4th throttle valve 18 respectively with the 4th solenoid valve 13 and
The connection of four pneumatic operated valves 12.
Wherein, third throttle valve 17 and 18 model of the 4th throttle valve are AS1002F-04.
In the present embodiment, before photoresist dilution automatically configures the work of device 1, the adjustable third throttle valve of operator
17 and the 4th throttle valve 18 aperture, with play adjustment third pneumatic operated valve 10 and the 4th pneumatic operated valve 12 open speed purpose,
To be applicable in different duty requirements.
The set-up mode of third throttle valve 17 and the 4th throttle valve 18, it is easy to operate, it increases photoresist dilution and matches automatically
The usage scenario of device 1 is set, the photoresist dilution that can be suitable for different configuration requirements automatically configures device 1, improves glue
The efficiency of configuration.
As shown in Figure 1, on the basis of the above embodiments, further, between the 4th pneumatic operated valve 12 and collecting mechanism 14
It is provided with first flowmeter 19；First flowmeter 19 is used to detect the flow of diluent, when the flow of diluent reaches first in advance
If first flowmeter 19 can will test signal and pass to control mechanism, and control mechanism can control third solenoid valve when value
11 and the 4th solenoid valve 13 close.
Wherein, the concept of the first preset value are as follows: when the flow of the diluent by first flowmeter 19 reaches preset value,
First flowmeter 19 can will test signal and pass to control mechanism to enable control mechanism close third solenoid valve 11 and the 4th electromagnetism
Valve 13.
In addition, the model PF3W704 of first flowmeter 19.
In the present embodiment, when first flowmeter 19 detects that the flow of diluent reaches the first preset value, first flowmeter
19, which will test signal, passes to control mechanism, and control mechanism issues instruction after receiving the signal, controls 11 He of third solenoid valve
4th solenoid valve 13 is closed, then does not have inert gas entrance in liquid supplying device 5, there will not be diluent from liquid supplying device 5
Flow into collecting mechanism 14.
The set-up mode of first flowmeter 19 can make quantitative diluent flow into collecting mechanism 14, make to configure glue institute
The amount of the diluent needed controls more accurate, improves the efficiency of glue configuration.
As shown in Figure 1, on the basis of the above embodiments, further, being set between the second pneumatic operated valve 8 and collecting mechanism 14
It is equipped with second flowmeter 20；Second flowmeter 20 is used to detect the flow of photoresist, presets when the flow of photoresist reaches second
When value, second flowmeter 20 can will test signal and pass to control mechanism, and control mechanism can control 7 He of the first solenoid valve
Second solenoid valve 9 is closed.
Wherein, the concept of the second preset value are as follows: when the flow of the photoresist by second flowmeter 20 reaches preset value,
Second flowmeter 20 can will test signal and pass to control mechanism to enable control mechanism close the first solenoid valve 7 and second solenoid valve
9。
In addition, the model PF3W704 of second flowmeter 20.
In the present embodiment, when second flowmeter 20 detects that the flow of photoresist reaches the second preset value, second flowmeter
20, which will test signal, passes to control mechanism, and control mechanism issues instruction after receiving the signal, controls the first solenoid valve 7 and the
Two solenoid valves 9 are closed, then do not have inert gas entrance in glue feed mechanism 4, there will not be photoresist and flow into from glue feed mechanism 4
Collecting mechanism 14.
The set-up mode of second flowmeter 20 can make quantitative photoresist flow into collecting mechanism 14, make to configure glue institute
The amount of the photoresist needed controls more accurate, improves the efficiency of glue configuration.
As shown in Figure 1, on the basis of the above embodiments, further, between the 4th pneumatic operated valve 12 and collecting mechanism 14
It is provided with the first check valve 21；The diluent and mixing liquid that first check valve 21 is used to prevent in collecting mechanism 14 flow into feed flow
Mechanism 5.
Wherein, the model CV-1-6644 of the first check valve 21.
In the present embodiment, the diluent in liquid supplying device 5 successively passes through the second pneumatic operated valve 8 and the first check valve 21, finally
It flows into collecting mechanism 14.
The setting of first check valve 21 effectively prevents the diluent in collecting mechanism 14 and blows back into showing for liquid supplying device 5
The generation of elephant enables the amount of the diluent entered in collecting mechanism 14 more accurate, improves the efficiency of glue configuration.
As shown in Figure 1, on the basis of the above embodiments, further, being set between the second pneumatic operated valve 8 and collecting mechanism 14
It is equipped with second one-way valve 22；The photoresist and mixing liquid that second one-way valve 22 is used to prevent in collecting mechanism 14 flow into glue supply machine
Structure 4.
Wherein, the model CV-1-6644 of second one-way valve 22.
In the present embodiment, the photoresist in glue feed mechanism 4 successively passes through the second pneumatic operated valve 8 and second one-way valve 22, finally
It flows into collecting mechanism 14.
The setting of second one-way valve 22 effectively prevents the photoresist in collecting mechanism 14 and blows back into showing for glue feed mechanism 4
The generation of elephant enables the amount of the photoresist entered in collecting mechanism 14 more accurate, improves the efficiency of glue configuration.
Fig. 2 is the structural schematic diagram that photoresist provided in an embodiment of the present invention dilution automatically configures component, as shown in Fig. 2,
On the basis of the above embodiments, further, the embodiment of the invention also provides a kind of dilutions of photoresist to automatically configure component
26, including waste gas recovery mechanism 23 and photoresist dilution automatically configure device 1；Waste gas recovery mechanism 23 is for collecting glue supply machine
Remaining exhaust gas in structure 4 and liquid supplying device 5.
In the present embodiment, since inert gas can enter in glue feed mechanism 4 and liquid supplying device 5, operator can be by useless
Gas recovering mechanism 23 is by the waste gas recovery in glue feed mechanism 4 and liquid supplying device 5.
The setting of waste gas recovery mechanism 23 realizes the recycling to inert gas and remaining harmful liquid, avoids a large amount of
Remaining inert gas is dissipated to the phenomenon in air, protects environment.
As shown in Fig. 2, on the basis of the above embodiments, further, photoresist dilution automatically configures component 26 and also wraps
Include first manual valve 24 and first sensor；First manual valve 24 connects with glue feed mechanism 4 and waste gas recovery mechanism 23 respectively
Logical, first sensor is used to detect the content of photoresist in glue feed mechanism 4, when the photoresist in glue feed mechanism 4 is used up, first
Sensor can will test signal and pass to control mechanism, and control mechanism can control the first solenoid valve 7 and the second electromagnetism
Valve 9 is closed.
Wherein, the type of first manual valve 24 is manual diaphragm valve, model C 514D7730500A1HPW.
In addition, first sensor can be connect with glue feed mechanism 4, when glue feed mechanism 4 is for glue bucket, first sensor can be with
The outer wall of first staving is bonded.
In the present embodiment, when first sensor detects that the photoresist in glue feed mechanism 4 is finished, first sensor is to control
Mechanism processed issues detection signal, after sensor receives the detection signal, issues instruction the first solenoid valve 7 of control and the second electromagnetism
Valve 9 is closed, then the first pneumatic operated valve 6 and the second pneumatic operated valve 8 are closed at this time, and no inert gas continues to flow into glue feed mechanism 4, so
Operator opens first manual valve 24 afterwards, then the residual gas in glue feed mechanism 4 is collected by waste gas recovery mechanism 23, then grasps
Author can replace the glue feed mechanism 4 equipped with photoresist, in case the configuration of subsequent glue uses.
This setup can also accurately know photoetching under the premise of ensure that residual gas can be recovered
When glue is being used up, and convenient for the timely replacement for glue bucket, improves the efficiency of glue configuration.
As shown in Fig. 2, on the basis of the above embodiments, further, photoresist dilution automatically configures component 26 and also wraps
Include the second hand-operated valve 25 and second sensor；Second hand-operated valve 25 connects with glue feed mechanism 4 and waste gas recovery mechanism 23 respectively
Logical, second sensor is used to detect the content of diluent in liquid supplying device 5, when the diluent in liquid supplying device 5 is used up, second
Sensor can will test signal and pass to control mechanism, and control mechanism can control third solenoid valve 11 and the 4th electromagnetism
Valve 13 is closed.
Wherein, the type of the second hand-operated valve 25 is manual diaphragm valve, model C 514D7730500A1HPW.
In addition, second sensor can be connect with glue feed mechanism 4, when glue feed mechanism 4 is for glue bucket, second sensor can be with
The outer wall of second staving is bonded.
In the present embodiment, when second sensor detects that the diluent in liquid supplying device 5 is finished, second sensor is to control
Mechanism processed issues detection signal, after sensor receives the detection signal, issues instruction control third solenoid valve 11 and the 4th electricity
Magnet valve 13 is closed, then the 4th pneumatic operated valve 12 and third pneumatic operated valve 10 are closed at this time, and no inert gas continues to flow into flow feeder
Structure 5, then operator opens the second hand-operated valve 25, then the residual gas in liquid supplying device 5 is collected by waste gas recovery mechanism 23,
Then operator can replace the liquid supplying device 5 equipped with diluent, in case the configuration of subsequent glue uses.
This setup can also accurately know dilution under the premise of ensure that residual gas can be recovered
When agent is being used up, and convenient for the timely replacement of liquid-supplying bucket, improves the efficiency of glue configuration.
Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the present invention., rather than its limitations；To the greatest extent
Pipe present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: its according to
So be possible to modify the technical solutions described in the foregoing embodiments, or to some or all of the technical features into
Row equivalent replacement；And these are modified or replaceed, various embodiments of the present invention technology that it does not separate the essence of the corresponding technical solution
The range of scheme.
Claims (10)
1. a kind of photoresist dilution automatically configures device characterized by comprising control mechanism, inert gas inleting pipe, compression
Air intake duct, glue feed mechanism, liquid supplying device, the first pneumatic operated valve, the first solenoid valve, the second pneumatic operated valve, second solenoid valve, third
Pneumatic operated valve, third solenoid valve, the 4th pneumatic operated valve, the 4th solenoid valve and collecting mechanism；
The control mechanism is for controlling first solenoid valve, the second solenoid valve, the third solenoid valve and described
4th solenoid valve opens or closes；
The inert gas inleting pipe is connected to first pneumatic operated valve and the third pneumatic operated valve respectively, the compressed air into
Tracheae is connected to first solenoid valve, the second solenoid valve, the third solenoid valve and the 4th solenoid valve respectively；
First solenoid valve is connected to first pneumatic operated valve, and the second solenoid valve is connected to second pneumatic operated valve, institute
It states third solenoid valve to be connected to the third pneumatic operated valve, the 4th solenoid valve is connected to the 4th pneumatic operated valve；
First pneumatic operated valve is connected to the glue feed mechanism, and the third pneumatic operated valve is connected to the liquid supplying device, and described
Two pneumatic operated valves are connected to the glue feed mechanism and the collecting mechanism respectively, the 4th pneumatic operated valve respectively with the flow feeder
Structure and collecting mechanism connection；
The glue feed mechanism is for accommodating photoresist, and the liquid supplying device is for accommodating diluent, and the collecting mechanism is for holding
Receive photoresist and diluent.
2. photoresist dilution according to claim 1 automatically configures device, which is characterized in that first solenoid valve and institute
It states and is provided with first throttle valve between the first pneumatic operated valve；
The first throttle valve is connected to first solenoid valve and first pneumatic operated valve respectively；
Be provided with second throttle between the second solenoid valve and second pneumatic operated valve, the second throttle respectively with institute
Second solenoid valve is stated to be connected to second pneumatic operated valve.
3. photoresist dilution according to claim 1 automatically configures device, which is characterized in that the third solenoid valve and institute
It states and is provided with third throttle valve between third pneumatic operated valve；
The third throttle valve is connected to the third solenoid valve and the third pneumatic operated valve respectively；
Be provided with the 4th throttle valve between 4th solenoid valve and the 4th pneumatic operated valve, the 4th throttle valve respectively with institute
The 4th solenoid valve is stated to be connected to the 4th pneumatic operated valve.
4. photoresist dilution according to claim 1 automatically configures device, which is characterized in that the 4th pneumatic operated valve and institute
It states and is provided with first flowmeter between collecting mechanism；
The first flowmeter is used to detect the flow of diluent, when the flow of diluent reaches the first preset value, described the
Flow meters can will test signal and pass to the control mechanism, and the control mechanism can control the third solenoid valve
It is closed with the 4th solenoid valve.
5. photoresist dilution according to claim 1 automatically configures device, which is characterized in that second pneumatic operated valve and institute
It states and is provided with second flowmeter between collecting mechanism；
The second flowmeter is used to detect the flow of photoresist, when the flow of photoresist reaches the second preset value, described the
Two flowmeters can will test signal and pass to the control mechanism, and the control mechanism can control first solenoid valve
It is closed with the second solenoid valve.
6. photoresist dilution according to claim 1 automatically configures device, which is characterized in that the 4th pneumatic operated valve and institute
It states and is provided with the first check valve between collecting mechanism；
The diluent and mixing liquid that first check valve is used to prevent in the collecting mechanism flow into the liquid supplying device.
7. photoresist dilution according to claim 1 automatically configures device, which is characterized in that second pneumatic operated valve and institute
It states and is provided with second one-way valve between collecting mechanism；
The photoresist and mixing liquid that the second one-way valve is used to prevent in the collecting mechanism flow into the glue feed mechanism.
8. a kind of photoresist dilution automatically configures component, which is characterized in that appoint including waste gas recovery mechanism and claim 1-7
The dilution of photoresist described in one automatically configures device；
The waste gas recovery mechanism is for collecting exhaust gas remaining in the glue feed mechanism and the liquid supplying device.
9. photoresist dilution according to claim 8 automatically configures component, which is characterized in that the photoresist dilution is automatic
Configuration component further includes first manual valve and first sensor；
The first manual valve respectively with the glue feed mechanism and the waste gas recovery mechanism connection, use by the first sensor
In the content for detecting photoresist in the glue feed mechanism, when the photoresist in the glue feed mechanism is used up, first sensing
Device can will test signal and pass to the control mechanism, and the control mechanism can control first solenoid valve and institute
State second solenoid valve closing.
10. photoresist dilution according to claim 8 automatically configures component, which is characterized in that the photoresist dilution is certainly
Dynamic configuration component further includes the second hand-operated valve and second sensor；
Second hand-operated valve respectively with the glue feed mechanism and the waste gas recovery mechanism connection, use by the second sensor
In the content for detecting diluent in the liquid supplying device, when the diluent in the liquid supplying device is used up, second sensing
Device can will test signal and pass to the control mechanism, and the control mechanism can control the third solenoid valve and institute
State the closing of the 4th solenoid valve.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910448410.5A CN110141983A (en) | 2019-05-27 | 2019-05-27 | Photoresist dilution automatically configures device and photoresist dilution automatically configures component |
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| CN201910448410.5A CN110141983A (en) | 2019-05-27 | 2019-05-27 | Photoresist dilution automatically configures device and photoresist dilution automatically configures component |
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| CN110141983A true CN110141983A (en) | 2019-08-20 |
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| CN201910448410.5A Pending CN110141983A (en) | 2019-05-27 | 2019-05-27 | Photoresist dilution automatically configures device and photoresist dilution automatically configures component |
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| CN111489959A (en) * | 2020-05-22 | 2020-08-04 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment |
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