CN110129747B - 一种用于团簇束流源的电转向器 - Google Patents

一种用于团簇束流源的电转向器 Download PDF

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CN110129747B
CN110129747B CN201910131442.2A CN201910131442A CN110129747B CN 110129747 B CN110129747 B CN 110129747B CN 201910131442 A CN201910131442 A CN 201910131442A CN 110129747 B CN110129747 B CN 110129747B
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CN110129747A (zh
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曹路
宋凤麒
步海军
张敏昊
张同庆
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Nanjing University
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    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • HELECTRICITY
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    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32697Electrostatic control

Abstract

用于团簇束流源的电转向器,设有8个1/8金属球体安装于立方体框架的顶点处,正方体框架为陶瓷或者聚四氟乙烯材质的绝缘体;正方体框架边长为60±10cm。8个1/8球体相互独立,能够单独加上不同电压。8个1/8金属球体的球心在六面体的8个顶点上。本发明采用8个1/8球形电极上同时加上正或负电压,可以方便控制经过本发明控制体的离子束流,可以正以直线或发生偏转,可以按任意方式控制,尤其是电极的形状精确,施加的电压均衡,电控制束流的性能好。

Description

一种用于团簇束流源的电转向器
技术领域
本发明涉及一种对原子团簇束流源的控制装置。
背景技术
近年来,随着原子制造的快速发展,团簇、单原子单分子器件等新材料以及新器件的需求日益扩大,通过束流源制备团簇成为了满足原子制造材料需求的主要手段。比如我们可以通过磁控溅射方式溅射出团簇原子气,通过气相冷凝使原子气冷凝为簇,再通过超声膨胀和离子光学系统将团簇聚焦成为束流。在飞行过程中对适合加工的团簇进行转向,进行不同方式的处理。
发明内容
本发明目的是,提出一种对原子团簇束流源的控制装置。即一种用于团簇束流源的电转向器。
本发明技术方案是,用于团簇束流源的电转向器,8个1/8金属球体安装于立方体框架的顶点处,正方体框架为陶瓷或者聚四氟乙烯材质的绝缘体;正方体框架边长为60 ±10cm。8个1/8球体相互独立,能够单独加上不同电压。8个1/8金属球体的球心在六面体的8个顶点上。
球体半径为20±5cm,加工孔洞为4±2mm螺纹孔。
有益效果,本发明采用8个1/8球形电极上同时加上正或负电压,可以方便控制经过本发明控制体的离子束流,可以正以直线或发生偏转,可以按任意方式控制,尤其是电极的形状精确,施加的电压均衡,电控制束流的性能好。
附图说明
图1为本发明电转向器结构示意图。
具体实施方式
入射离子束流为金100团簇,束流能量为100eV,每个团簇粒子带一个正电荷,在 4个1/8球形电极(红色)上同时加上-500V电压,在4个1/8球形电极(黄色)上同时加上+500V电压,离子束流向下偏转90度射出。
每个电极为1/8球体,1/8球体半径为25cm,1/8球体上设有加工孔洞为3mm直径螺纹孔,用于安装以及加装电极。
方案如下,采用8个1/8的球体,单个球体采用304不锈钢金属制成,圆弧面做抛光,并可以加工孔洞以利安装。图纸如图1所示,球体半径为25cm,加工孔洞为3mm 螺纹孔,用于安装以及加装电极。
按照图1所示对零件进行装配。8个1/8球体安装于正方体框架的顶点处,正方体框架为陶瓷或者聚四氟乙烯材质,为绝缘体。正方体框架边长为60cm。8个1/8球体相互独立,能够单独加上不同电压。
对零件进行装配。8个1/8球体安装于正方体框架的顶点处,正方体框架为陶瓷或者聚四氟乙烯材质,为绝缘体。正方体框架边长为60cm。8个1/8球体相互独立,能够单独加上不同电压。
通过对各个1/8球型电极加以不同的电压,可以使穿过该转向器的离子束流偏转,偏转角度为90度,偏转方向为5个方向,红色部分为8个1/8球形电极,灰色部分为陶瓷支架,蓝色为离子束流。
通过对各个1/8球型电极加以不同的电压,可以使穿过该转向器的离子束流偏转,偏转角度为90度,偏转方向为5个方向。红色部分为8个1/8球形电极,灰色部分为陶瓷支架,离子束流在六面体表面物垂直或以一定角度射出。
使用实例如下:入射离子束流为金100团簇,束流能量为100eV,每个团簇粒子带一个正电荷,在8个1/8球形电极上同时加上-500V电压,离子束流不发生偏转,平行射出。
离子束流在六面体的平面上垂直或成一定角度射入或射出。
在8个1/8球形电极上同时加上-500V电压,离子束流不发生偏转,平行射出。即从ABE面向DCG面射出。
入射离子束流为金100团簇,束流能量为100eV,每个团簇粒子带一个正电荷,在 4个1/8球形电极(红色即ABFG四个电极)上同时加上-500V电压,在4个1/8球形电极 (黄色,另外四个电极)上同时加上+500V电压,离子束流向下偏转90度射出。即从ABE 面向向EDF面射出。
入射离子束流为金100团簇,束流能量为100eV,每个团簇粒子带一个正电荷,在4个1/8球形电极(红色)上同时加上-500V电压,在4个1/8球形电极(黄色)上同时加上+500V电压,离子束流向右偏转90度射出。
在4个1/8球形电极(红色即ADHF四电极)上同时加上-500V电压,在4个1/8球形电极(黄色,另外四个电极)上同时加上+500V电压,离子束流向右偏转90度射出。即 ABE进入ADE面射出。

Claims (4)

1.用于团簇束流源的电转向器,其特征是,设有8个1/8金属球体安装于立方体框架的顶点处,正方体框架为陶瓷或者聚四氟乙烯材质的绝缘体;正方体框架边长为60±10cm;8个1/8球体相互独立,能够单独加上不同电压;8个1/8金属球体的球心在六面体的8个顶点上;
1/8金属球体半径为20±5cm,1/8金属球体平面上加工孔洞为4±2mm螺纹孔。
2.根据权利要求1所述的用于团簇束流源的电转向器,其特征是,1/8金属球体采用不锈钢制成,圆弧面抛光,并加工孔洞。
3.根据权利要求2所述的用于团簇束流源的电转向器,其特征是,1/8金属球体半径为25cm,孔洞为3mm螺纹孔。
4.根据权利要求1所述的用于团簇束流源的电转向器,其特征是,正方体框架边长为60cm。
CN201910131442.2A 2019-02-22 2019-02-22 一种用于团簇束流源的电转向器 Active CN110129747B (zh)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6215576B1 (en) * 1997-03-27 2001-04-10 Matsuhshita Electric Industrial Co., Ltd. Method for making a second-order nonlinear optical material, the material obtained by the method, and an optical modulation device comprising the material
CN1906728A (zh) * 2003-12-04 2007-01-31 日新意旺机械股份公司 离子束装置
CN205680654U (zh) * 2012-10-23 2016-11-09 珀金埃尔默健康科技有限公司 离子导引设备
CN208521894U (zh) * 2015-05-26 2019-02-19 珀金埃尔默健康科学股份有限公司 双转向离子导向器和使用它们的装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891157B2 (en) * 2002-05-31 2005-05-10 Micromass Uk Limited Mass spectrometer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6215576B1 (en) * 1997-03-27 2001-04-10 Matsuhshita Electric Industrial Co., Ltd. Method for making a second-order nonlinear optical material, the material obtained by the method, and an optical modulation device comprising the material
CN1906728A (zh) * 2003-12-04 2007-01-31 日新意旺机械股份公司 离子束装置
CN205680654U (zh) * 2012-10-23 2016-11-09 珀金埃尔默健康科技有限公司 离子导引设备
CN208521894U (zh) * 2015-05-26 2019-02-19 珀金埃尔默健康科学股份有限公司 双转向离子导向器和使用它们的装置

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