CN110095947B - 一种di机投图控制系统及对曝光位置进行补偿的方法 - Google Patents
一种di机投图控制系统及对曝光位置进行补偿的方法 Download PDFInfo
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- CN110095947B CN110095947B CN201910373535.6A CN201910373535A CN110095947B CN 110095947 B CN110095947 B CN 110095947B CN 201910373535 A CN201910373535 A CN 201910373535A CN 110095947 B CN110095947 B CN 110095947B
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- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000006073 displacement reaction Methods 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 4
- 101100517651 Caenorhabditis elegans num-1 gene Proteins 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
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CN201910373535.6A CN110095947B (zh) | 2019-05-07 | 2019-05-07 | 一种di机投图控制系统及对曝光位置进行补偿的方法 |
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CN201910373535.6A CN110095947B (zh) | 2019-05-07 | 2019-05-07 | 一种di机投图控制系统及对曝光位置进行补偿的方法 |
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CN110095947A CN110095947A (zh) | 2019-08-06 |
CN110095947B true CN110095947B (zh) | 2020-08-28 |
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Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111983901A (zh) * | 2020-08-28 | 2020-11-24 | 合肥众群光电科技有限公司 | 一种基于平台位置信号的拼接调试装置及方法 |
CN115309008B (zh) * | 2022-08-29 | 2024-06-04 | 深圳市鑫浩自动化技术有限公司 | 一种直接成像曝光机的镜头倾斜误差补偿方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008250072A (ja) * | 2007-03-30 | 2008-10-16 | Fujifilm Corp | 描画装置及び方法 |
CN101480880B (zh) * | 2008-11-25 | 2011-09-28 | 深圳市大族激光科技股份有限公司 | 成像装置以及曝光影像偏差的校正方法 |
CN105093856A (zh) * | 2015-09-09 | 2015-11-25 | 合肥芯碁微电子装备有限公司 | 一种激光直接成像设备成像位置误差的检测方法 |
CN206292526U (zh) * | 2016-11-25 | 2017-06-30 | 天津津芯微电子科技有限公司 | Ldi设备及其拼接调试系统 |
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2019
- 2019-05-07 CN CN201910373535.6A patent/CN110095947B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008250072A (ja) * | 2007-03-30 | 2008-10-16 | Fujifilm Corp | 描画装置及び方法 |
CN101480880B (zh) * | 2008-11-25 | 2011-09-28 | 深圳市大族激光科技股份有限公司 | 成像装置以及曝光影像偏差的校正方法 |
CN105093856A (zh) * | 2015-09-09 | 2015-11-25 | 合肥芯碁微电子装备有限公司 | 一种激光直接成像设备成像位置误差的检测方法 |
CN206292526U (zh) * | 2016-11-25 | 2017-06-30 | 天津津芯微电子科技有限公司 | Ldi设备及其拼接调试系统 |
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Effective date of registration: 20210528 Address after: 5162, A2 / F, Jianghai Zhihui garden, 266 New Century Avenue, high tech Zone, Nantong City, Jiangsu Province, 226000 Patentee after: Yuanzhuo Microelectronics (Nantong) Co.,Ltd. Address before: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192 Patentee before: ADVANCED MICRO OPTICS.INC |
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Effective date of registration: 20240617 Address after: 215026 Room 102, building C5, No. 192, Tinglan lane, Suzhou Industrial Park, Jiangsu Province Patentee after: Yuanzhuo Micro Nano Technology (Suzhou) Co.,Ltd. Country or region after: China Address before: 5162, A2 / F, Jianghai Zhihui garden, 266 New Century Avenue, high tech Zone, Nantong City, Jiangsu Province, 226000 Patentee before: Yuanzhuo Microelectronics (Nantong) Co.,Ltd. Country or region before: China |