CN110042353A - A kind of nano-stack aluminum matrix composite and preparation method - Google Patents
A kind of nano-stack aluminum matrix composite and preparation method Download PDFInfo
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- CN110042353A CN110042353A CN201910269098.3A CN201910269098A CN110042353A CN 110042353 A CN110042353 A CN 110042353A CN 201910269098 A CN201910269098 A CN 201910269098A CN 110042353 A CN110042353 A CN 110042353A
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- aluminum matrix
- matrix composite
- preparation
- alloy foil
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- 239000002131 composite material Substances 0.000 title claims abstract description 40
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 33
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 33
- 239000011159 matrix material Substances 0.000 title claims abstract description 22
- 238000002360 preparation method Methods 0.000 title claims abstract description 19
- 239000011888 foil Substances 0.000 claims abstract description 23
- 239000000919 ceramic Substances 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 238000003475 lamination Methods 0.000 claims abstract description 9
- 238000000151 deposition Methods 0.000 claims abstract description 7
- 230000008021 deposition Effects 0.000 claims abstract description 6
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 21
- 239000000956 alloy Substances 0.000 claims description 21
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 12
- 239000004411 aluminium Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 230000001476 alcoholic effect Effects 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 6
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 238000007731 hot pressing Methods 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 239000008187 granular material Substances 0.000 claims description 2
- 229910000846 In alloy Inorganic materials 0.000 claims 1
- 230000014759 maintenance of location Effects 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 7
- 238000009792 diffusion process Methods 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 5
- 239000002245 particle Substances 0.000 abstract description 5
- 229910010293 ceramic material Inorganic materials 0.000 abstract description 4
- 150000001875 compounds Chemical group 0.000 abstract description 4
- 239000012535 impurity Substances 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 3
- 238000005457 optimization Methods 0.000 abstract description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 3
- 238000000137 annealing Methods 0.000 abstract description 2
- 238000009826 distribution Methods 0.000 abstract description 2
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- 239000012300 argon atmosphere Substances 0.000 abstract 1
- 239000004615 ingredient Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000002648 laminated material Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/38—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling sheets of limited length, e.g. folded sheets, superimposed sheets, pack rolling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
- B21B2003/001—Aluminium or its alloys
Abstract
The invention discloses a kind of nano-stack aluminum matrix composite and preparation methods, belong to aluminum matrix composite preparation field, the design is first with physical gas phase deposition technology, magnetic control co-sputtering Al and ceramic material under argon atmosphere respectively form the 2 μ m-thick composite layers that ceramic particle is nano-scale in Al Alloy Foil substrate double layer surface;Then High temperature diffusion bonding technology is recycled to prepare lamination Al base roller lifting hanging arm guiding mechanism for intaglio press;The advantages of invention: magnetic control co-sputtering Al and ceramic material are used on Al alloy foil sheet, so that ceramic phase is reached nanoscale and is uniformly distributed in Al matrix, in addition the defects of avoiding stomata common in composite material, impurity simultaneously can control ceramic phase particles size and distribution by high annealing also to change the performance of material;Using High temperature diffusion bonding technology, to the lamination period after optimization, thickness, when lamination number is bonded, and the compound structure film intensity that vapor deposition can be made to obtain further increases, and has expanded it significantly in the application of macroscopic arts.
Description
Technical field
The present invention relates to a kind of technology of field of compound material, be specifically related to a kind of nano-stack aluminum matrix composite and
Preparation method.
Background technique
Aluminum matrix composite is because its performance is by aluminium alloy substrate, particulates reinforcements co-determination, to have both metal material
High tenacity and ceramic material high rigidity, high-wearing feature, become modern material development important directions, aerospace, hand over
The fields such as logical transport, electronic apparatus have a wide range of applications and huge prospect.
By the development of many years, the preparation of aluminum matrix composite has been graduallyd mature, but there are ceramic enhancement phases for prior art
Particle size is big, and microstructure is uneven, and the problems such as be often mixed into bubble, impurity during the preparation process, this is mainly due to
Ceramic phase can not accomplish uniform and high-quality addition under conventional preparation techniques, although ceramics may be implemented in gas phase (chemistry) deposition
The addition of phase atomic level, but it is narrow due to film space scale, it is extremely limited again in application field method.
Laminated material can be obtained by modulation period between different constituent elements and Thickness ratio with this more compound than ingredient of the same race
The superior performance of material, but the optimization and connection of lamination, it is numerous and become complicated due to being related to influence factor, so really
Laminated material makes its performance dispersibility very big because of preparation process difference.
Summary of the invention
The purpose of the present invention is to provide a kind of nano-stack aluminum matrix composite and preparation methods, can be realized ceramic phase
The uniformity and size Control of addition, and can realize the combination of polynary thin layer;Wherein TiN ceramic phase divides in film in preparation process
Cloth is uniform, while ingredient ratio and film layer in control composite membrane being convenient for be tightly combined with substrate;Improve the performance of composite material;This
The defects of being also avoided that stomata common in composite material, impurity outside;It is to greatly promote composite wood in addition there are a bit
Expect the soaking time of prefabricated board.
Nano-stack TiN/aluminum matrix composite is achieved through the following technical solutions:
A kind of preparation of the nano-stack aluminum matrix composite based on gas phase deposition technology and High temperature diffusion bonding technology.Specific packet
Include following steps:
Step 1: first cleaning alloy foil surface, is successively cleaned by ultrasonic 10min in alcohol, acetone, alcoholic solution
Afterwards, then the dirt for clearing up substrate surface dries up;Alloy foil after cleaning is fixed on the indoor workbench of vacuum;
Step 2: under vacuum or protective gas atmosphere, using 99.99% raffinal and high purity Ti N ceramics as target.It is logical
Crossing control magnetron sputtering power makes in film TiN granule content between 5~10at.%;
Step 3: when equipment base vacuum reaches 2 × 10-3After Pa, it is work that the argon gas that purity is 99.99% is passed through in vacuum chamber
Make gas.Later on rf magnetron sputtering power supply carries out aluminium to alloy foil and TiN ceramics cosputtering deposits;
Step 4: the bilayer film of alloy foil surface 2 μm of TiN of each plating and aluminium composition, as composite precast plate;
Step 5: cleaning obtained composite precast plate in alcoholic solution, clears up surface smut, is dried;
Step 6: it will at least composite precast plate made from step 5 described in two panels be placed in vacuum hotpressing stove, using pressure
Head applies the pressure of 8MPa to sample, and heats under conditions of keeping this pressure, until temperature reaches 450 DEG C, temperature is kept
Power-off is cooled below 80 DEG C of taking-ups and obtains high performance micro-nano lamination aluminum matrix composite after time 1h.
Preferably, the alloy foil in the step 1 is using commercial double smooth surfaces with a thickness of 30 μm of alloy foils.
Preferably, in the alloy foil, the content of aluminium is higher than 80%, and alloy content is less than 20%.
Preferably, the process conditions deposited in the step 2 are air pressure 0.4Pa, substrate bias 250V.
Preferably, the Thickness ratio of the bilayer film in the step 4 and alloy foil is 0.13.
Preferably, the nano-stack aluminum matrix composite number of plies in the step 6 is 12 layers.
The beneficial effects of the present invention are magnetic control co-sputtering aluminium and ceramic material is used in alloy foil on piece, make ceramic phase
The defects of reaching nanoscale and be uniformly distributed in aluminum substrate, while avoiding stomata common in composite material, impurity, in addition
Ceramic phase particles size and distribution can be also controlled by high annealing, and then change the performance of material;It is bonded using High temperature diffusion
To the lamination period after optimization, thickness, when lamination number bonds technology, the compound structure film that vapor deposition can be made to obtain
Intensity further increases, and has expanded it significantly in the application of macroscopic arts.
During the preparation process, convenient for control composite membrane in ingredient ratio and film layer be tightly combined with substrate;Simultaneously using high
Multilayer film can be effectively bonded together by warm diffusion technique, can also control TiN particle size during the bonding process, be improved
The performance of composite material;The combination of polynary thin layer is formed into composite board, has expanded the application range of film.
Detailed description of the invention
Fig. 1 is process flow diagram of the invention.
Fig. 2 is nano-stack vertical structure schematic diagram of the invention.
Fig. 3 is nano-stack transverse structure of the invention.
Specific embodiment
Embodiment 1
(1) it being pre-processed to a thickness of 30 μm of commercial double smooth surface alloy foils surface, it is desirable that the content of aluminium is higher than 80%,
Alloy content is less than 20%, after being successively cleaned by ultrasonic 10min in alcohol, acetone, alcoholic solution, clears up the dirt of substrate surface
Then dirt dries up, be fixed on the indoor workbench of vacuum, and machine is dry.
(2) under vacuum or protective gas atmosphere, using the ceramics of 99.99% raffinal and high purity Ti N as target.
(3) when equipment base vacuum reaches 2 × 10-3After Pa, it is work that the argon gas that purity is 99.99% is passed through in vacuum chamber
Make gas.Later on rf magnetron sputtering power supply carries out aluminium and TiN ceramics cosputtering deposition, the process conditions of deposition are as follows: gas
Press 0.4Pa, substrate bias 250V.
(4) after depositing, the TiN of 2 μm of each plating in foil surface and the bilayer film of aluminium composition are enabled aluminum alloy to, as composite material
Prefabricated board.
(5) obtained multiple composite precast plates are cleaned in alcoholic solution, clears up surface smut, and do
Dry processing.
(6) since composite layer is the alloy foil for being coated with certain gradient components, so can be carried out under ar gas environment to it
The prefabricated board that 12 two sides are coated with TiN/ aluminium bilayer film alloy foil is placed in vacuum hotpressing stove by diffusion bonding, is used
Pressure head applies the pressure of 8MPa to sample, and heats under conditions of keeping this pressure, until temperature reaches 450 DEG C.Temperature is protected
Power-off is cooled below 80 DEG C of high performance micro-nano lamination aluminum matrix composites of taking-ups acquisition after holding time 1h.
Claims (6)
1. a kind of nano-stack aluminum matrix composite and preparation method, which comprises the following steps:
Step 1: first cleaning alloy foil surface, is successively cleaned by ultrasonic 10min in alcohol, acetone, alcoholic solution
Afterwards, then the dirt for clearing up substrate surface dries up;Alloy foil after cleaning is fixed on the indoor workbench of vacuum;
Step 2: under vacuum or protective gas atmosphere, using 99.99% raffinal and high purity Ti N ceramics as target, lead to
Crossing control magnetron sputtering power makes in film TiN granule content between 5~10at.%;
Step 3: when equipment base vacuum reaches 2 × 10-3After Pa, it is work that the argon gas that purity is 99.99% is passed through in vacuum chamber
Make gas,
Later on rf magnetron sputtering power supply carries out aluminium to alloy foil and TiN ceramics cosputtering deposits;
Step 4: the bilayer film of alloy foil surface 2 μm of TiN of each plating and aluminium composition, as composite precast plate;
Step 5: cleaning obtained composite precast plate in alcoholic solution, clears up surface smut, is dried;
Step 6: it will at least composite precast plate made from step 5 described in two panels be placed in vacuum hotpressing stove, using pressure
Head applies the pressure of 8-10MPa to sample, and heats under conditions of keeping this pressure, until temperature reaches 400-450 DEG C, temperature
Power-off is cooled below 80 DEG C of high performance micro-nano lamination aluminum matrix composites of taking-ups acquisition after spending retention time 1h.
2. nano-stack aluminum matrix composite according to claim 1 and preparation method, it is characterised in that: the step 1
In alloy foil using commercial double smooth surfaces with a thickness of 30 μm of alloy foils.
3. nano-stack aluminum matrix composite according to claim 2 and preparation method, it is characterised in that: the aluminium alloy
In foil, the content of aluminium is higher than 80%, and alloy content is less than 20%.
4. nano-stack aluminum matrix composite according to claim 1 and preparation method, it is characterised in that: the step 2
The process conditions of middle deposition are air pressure 0.4Pa, substrate bias 250V.
5. nano-stack aluminum matrix composite according to claim 1 and preparation method, it is characterised in that: the step 4
In bilayer film and alloy foil Thickness ratio be 0.13.
6. nano-stack aluminum matrix composite according to claim 1 and preparation method, it is characterised in that: the step 6
In the nano-stack aluminum matrix composite number of plies be 12 layers.
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CN110042353B CN110042353B (en) | 2020-11-27 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112934964A (en) * | 2021-01-25 | 2021-06-11 | 太原理工大学 | Physical vapor deposition and laser energy field assisted metal composite strip rolling method |
CN113025962A (en) * | 2021-03-23 | 2021-06-25 | 内蒙古科技大学 | Silicon-based porous anodic alumina template and preparation method thereof |
CN114318258A (en) * | 2020-09-27 | 2022-04-12 | 上海交通大学 | Al-coated AlN nanoparticles and preparation method thereof |
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CN113025962A (en) * | 2021-03-23 | 2021-06-25 | 内蒙古科技大学 | Silicon-based porous anodic alumina template and preparation method thereof |
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