CN110023727A - Minimize waveguide imaging spectrometer - Google Patents
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- CN110023727A CN110023727A CN201780056865.1A CN201780056865A CN110023727A CN 110023727 A CN110023727 A CN 110023727A CN 201780056865 A CN201780056865 A CN 201780056865A CN 110023727 A CN110023727 A CN 110023727A
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0256—Compact construction
- G01J3/0259—Monolithic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/2803—Investigating the spectrum using photoelectric array detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/45—Interferometric spectrometry
- G01J3/453—Interferometric spectrometry by correlation of the amplitudes
- G01J3/4531—Devices without moving parts
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4287—Optical modules with tapping or launching means through the surface of the waveguide
- G02B6/4291—Optical modules with tapping or launching means through the surface of the waveguide by accessing the evanescent field of the light guide
Abstract
Invention disclosed is made of waveguide spectrometer (1), the waveguide spectrometer includes at least one basal layer (10) at least one waveguide, each waveguide extends to reflecting element (13) by the inlet face (12) of basal layer (10) from part, wherein, multiple photodetectors (14) are arranged on the front side (I) of basal layer (10), while be electrically connected to should lightweight and the electrical readout system that is easy to manufacture for photodetector (14).This is by being formed as surface duct (11 for waveguide, 11 ', 11 ", 11 " ') and realize, surface duct all has the longitudinal opening (110) that the width between inlet face (12) and reflecting element (13) towards the front side (I) of basal layer (10) is (D), photodetector (14 simultaneously, 14 ', 14 ", 14 " ') printing be distributed at the front side on the top of basal layer (10) (I), it is at least partly overlapped along the total length (ls) of sampling area and the longitudinal opening (110) of surface duct (11), and photodetector (14 is realized by multiple printing electric conductors (15), 14 ', 14 ", 14 " ') be electrically connected with electrical readout system.
Description
Technical field
The present invention describes a kind of waveguide imaging spectrometer, which includes having at least one waveguide
At least one basal layer, each waveguide extend to reflecting element by the inlet face of basal layer from part, wherein multiple light detections
Device is arranged on the front side of basal layer, allows to couple (out-coupling) outside each waveguide at the position of photodetector hidden
It loses field (evanescent field), while photodetector can be used as the evanescent field sampling for being each coupled electrically to electronics read-out system
Device, and describe a kind of method for manufacturing this waveguide spectrometer.
Background technique
Spectroscopy is the general Physical Analysis Methods for studying interaction of laser with material.Contemporary imaging spectrometer is worked as
Preceding trend shows to be in divergent paths: on the one hand, having to the dedicated spectral region for generating target product and increasingly increases
Interest；And on the other hand, there is growing interest to the big SPECTRAL REGION for general advanced scientific purpose.
Development effort to the instrument of new generation for meeting the accuracy requirement increased is significant.It is expected that upcoming system
With bigger time coverage rate, finer spatial resolution and better radiancy performance.In addition, for wherein matter
Amount, volume and energy consumption are for all applications of driving factors of cost or application power, it is therefore highly desirable to the miniaturization of system.Light
The miniaturization of spectrometer system is the following milestone looked forward to for 10 to 15 years, to reduce task/project cost in spaceborne application,
It maximizes recurrent cost and allows to be integrated in the micro-satellite for strategic task.It is compact integrated for spaceborne application
Spectrometer has a direct impact the payload of instrument.In addition, monolithically integrated system will reduce the alignment requirements of integrated period, and
Enhance stability [P.Kern, " On-chip spectro-detection for fully during instrument service life
Integrated coherent beam combiners., " Opt.Express 17 (2009), pp.1976-1987,2009].
It is had existed from UV to IR using the spectroscopy of various instrument.Pass through applying for single pixel detector instrument
Many fields are in occupation of leading position.On the other hand, the imaging spectrometer with sequential frequency band and narrow spectral resolution is (in quotient
Brand in industry is also referred to as " hyperspectral imager (hyperspectral imagers) ") it is exclusively used in measuring collected radiation
Spectral content, cover imaging the ratio of width to height (imaging aspect, imaging aspect) of spectral measurement.Currently, for covering UV
Dominant technology to the imaging spectrometer of the spectral region between SWIR is the dispersing instrument in push-broom pattern.FTS system is imaged
Commercially mainly the region IR operate and anticipate 2018 the first instrument (MTG-IRS instrument) start running.However, it is necessary to
, it is noted that all these instruments, although they have a high-performance, but it is sizable and there is quality requirement.For example, such as
Imaging spectrometer of the fruit for very wide spectral region is designed based on total reflection mirror system, then they are in precision aspect
Best.This leads to system large-scale, that quality is very big, complicated and expensive in turn.
To miniaturization Spectrometry device research be actually global effort, cover different research institutions just
In a variety of distinct methods of research.For example, [L.Keesey, " the NASA's Goddard of NASA Ge Dade (Goddard) group
Space Flight Center (Ge Dade space flight center), Greenbelt, Md., " 2012., http: //
Www.nasa.gov/topics/technology/features/chip-spectromete r.html] it is committed to proving:
Miniaturization spectrometer (its synthesis infrared spectrometer (CIRS) class airborne with Cassini Mission in 1997 on chip
Seemingly) possible centering infrared band is sensitive.
Potential equipment be typically used for the spectrum of research planet and celestial body and identify they chemical component and other objects
The version of Michelson's (Michelson) type FTS of rationality matter being substantially reduced.In order to understand everybody, a new generation FTS's is compact
Property, say so and be sufficient: the airborne CIRS of Cassini spaceship is big as dish-washing machine, but its it is very powerful and
With valuable discovery.However, the equipment studied at NASA Ge Dade can may only measure single pixel, and
Its design cannot achieve scalable to develop as imaging spectrometer.
Univ Delft Tech (Technical University of Delft) has developed based on chromatic dispersion principle
Compact spectrometer architecture, operation and based single aluminized coating chip glass in VIS NIR range.They, which rise to push away, clears off spectrum
The effect of instrument, but it is limited to the market needs of limited spectral resolution ratio.The company of such as Imec (Hai Fulai, Belgium) starts to make
The commercialization of snapshot imaging spectrometer, snapshot imaging spectrometer are characterized in the Fabry-Perot in front of the pixel of imaging sensor
(Fabry Perot) filter array.They are characterized in sizable wave spectrum FWHM (in the range of 5 to 15nm).In addition, should
Method, which is applicable only to push away, to clear off spectrometer and is applied to snapshot spectrometer, is presently limited to VIS NIR application, the fast irradiation
Spectrometer application processing technique carrys out the spectrum of each pixel of artificial reconstruction.
Utilize photonics and near field optic, Le Coarer et al. [E.Le Coarer, " Wavelength-scale
stationary-wave integrated Fourier-transform spectrometry.,"Nature Photonics
1.8, pp.473-478,2007] it is integrated Fourier transform spectroscopy (SWIFTS) that a kind of standing wave was described in 2007, wherein
The hidden direct sampling for losing standing wave is realized using the acquisition of the optical nano probe according to patent document EP1825312.
In SWIFTSTMIn lineament, the single mode waveguide by terminating at fixed mirror creates standing wave.Sampling institute is carried out to standing wave
The Energy extraction needed samples evanescent wave in the side of waveguide by using the nanometer scattering point being located in evanescent field and is obtained
?.Light is scattered in and the propagation in waveguide by these nano dots (it is characterized in that poor with the optical index of medium locating for evanescent field)
The vertical axis of axis.For each nano dot, the light that is scattered is by the pixel detection that is aligned with the axis.Therefore, it examines
The intensity measured is proportional to the intensity of the waveguide of the accurate location of nano dot.Referred to as Lippmann (Lippmann) transformation (with
Fourier transformation is similar) mathematical function all calibration data are taken into account, and be applied to linear image when, provide light
Spectrum.In these construction, back reflection element (mirror) is fixed and without introducing a possibility that scanning.Due to the original
Cause, commercialized SWIFTS spectrometer, which can be used in signal, to be had in the application of quite long coherence length, for example, for measuring not
The high speed wavelength tuning of the quick characterization and laser of stable laser source, multi-mode laser.However, in these commercialized SWIFTS
There are still significant differences between product and the miniaturized products suitable for space flight/business application.The another of the construction lacks
Point is that intrinsic construction allows to analyze the spectral range by Nyquist theorem (Nyquist principle) bandwidth limited
(usually 5 to 10nm).
In recent years, it has been disclosed that can be applied to the breakthrough core technology of spectroscopy.In 2010, based on Lee in waveguide
Pu Man and Gai Bai (Gabor) standing wave, have had been introduced into the novel concepts of spectroscopy, referred to as " focal plane arrays (FPA) spectrometer (FPAS) "
[G.B.and K.S.,"Focal Plane Array Spectrometer:miniaturization effort for
space optical instruments.,"Proc.of SPIE,vol.Vol7930,pp.01-14,2010].FPAS is to stay
The broadband imaging that wave integrates Fourier transform spectrometer, is implemented, and target is spaceborne application.FPAS is better than the advantage previously implemented
It is, it allows to execute Fourier transform spectroscopy in minimum volume, and allows to expand by interference pattern scanning theory and feel
The spectral region of interest collected again.The two-dimensional array of FPAS (highly integrated instrument design) based on waveguide, wherein light exists
One boundary is injected.In each waveguide, the incident light in one end of waveguide is propagated along the waveguide, and by the another of waveguide
Borderline mirror reflection.This generates static (or standing wave) interference patterns.The standing wave pattern is by being geometrically fixed on
Evanescent field sampler in waveguide and detector is sampled.It is similar in Fourier transform spectrometer, observe the light of scene
Spectrum content is generating specific interference pattern, referred to as interference pattern in standing wave.For sampled interference patterns, light is on the top of waveguide
It is outer at different locations to couple (out-coupled).By the interference pattern pattern of evanescent field sampler samples (by the waveguide forward
With the photogenerated of back-propagation) it is guided the pixel that (for example, by image transmitting optical device) arrives matrix detector.For head
Expand the spectral bandwidth for the spectrum collected again and first in order to which the interference pattern in the coherence length of collecting signal is collected, using sweeping
Retouch mirror.The optical transport of collection to electric signal, and is sent it to processing unit (DSP or FPGA) by matrix detector.It is this
FPAS spectrometer can be assembled with small size, and form the compact package of single spectrometer.When the coke of object lens is arranged in the system
When in plane, it will allow to observe the imaging spectrography of surface (object).
FPAS is strictly the miniaturization design of imaging spectrometer.However, its performance is especially by being geometrically fixed on waveguide
On Model of Interferogram Sampling device limitation.Nyquist criterion (Nyquist criterion, Nyquist can not be arranged in sampler
Criterion) needed for space length at, otherwise the sub-micron distance between them may extract data between cause crosstalk
(crosstalk).Crosstalk is as caused by the reflex reflection of bootmode and their propagation in the waveguide.In addition to this, commonly
Detection technique either needs for the heavy optical device from samplers sample sampled data or needs complicated electronic device.
Say to overview, disadvantage of the prior art is that, make to assemble using the independent waveguide manufacturing technology of ordinary photolithographic technique
It is extremely complex, on the other hand, the detection technique including graphics transport optical device and detector matrix expend very much space and
It is unsuitable for stacking pixel.
Summary of the invention
The purpose of the present invention is it is a kind of can lightweight simply manufacture and the waveguide imaging spectrometer of highly compact comprising
Waveguide with corresponding detector array.
It is another object of the present invention to a kind of simplification manufacturing technology of waveguide spectrometer, waveguide spectrometer can be very small
It is stacked in volume.
The solution for realizing compact waveguide imaging spectrometer proposed includes that surface duct is carved into substrate,
The substrate and the thin detector array being fabricated directly in waveguide surface are integrated.
Detailed description of the invention
The preferred illustrative embodiment of present subject matter is described with reference to the accompanying drawing.
Fig. 1 shows the perspective view of single pixel waveguide spectrometer, which includes the wave of substrate, inscription
Lead (inscribed waveguide), graphene photodetector, metallic conductor and reflecting surface.
Fig. 2 shows the perspective bottom views of substrate, have light-absorbing coating on the bottom of the substrate comprising waveguide.
Fig. 3 shows the solid of the waveguide imaging spectrometer of the waveguide array with 4 pixels in single substrate setting (1D)
Figure.
Fig. 4 shows the perspective view of the waveguide imaging spectrometer of the refracting films of four waveguide spectrometers, has single base
The waveguide array including 4 pixels in the setting of bottom, the submatrix with the 4x4 pixel in compact imaging spectrometer construction (2D)
Column.
Fig. 5 is the front view of intermediate basal layer and the anti-reflection coating on its bottom side.
Fig. 6 is the subarray of the 4x4 pixel in compact imaging spectrometer construction, which includes intermediate base bottom, antireflection
(shadow (dark back) on the bottom of the substrate with waveguide) layer and absorbed layer.
Fig. 7 shows the lateral side view of the imaging spectrometer according to Fig. 6, shows the conductor for stretching to electrical readout device, the electricity
Reader includes that intermediate base bottom, antireflection (shadow on the bottom of the substrate with waveguide) layer and absorbed layer (are located at intermediate base
On the bottom of bottom).
Specific embodiment
Fig. 1 shows waveguide spectrometer 1, including a basal layer 10 with a surface duct 11.Surface duct 11
Reflecting element 13 is extended to from part by the inlet face 12 of basal layer 10.In the region of the surface duct 11 of inscription, refraction
Rate changes and is different from the base material of not laser emission.Single pixel waveguide spectrometer 1 is shown in FIG. 1 comprising
One basal layer 10 and a surface duct 11.It is D that each surface duct 11, which is shown towards the width of the front side I of basal layer 10,
Longitudinal opening 110.Longitudinal opening 110 shows flat surfaces at the I of front side.Surface duct 11 is directly scribed at basal layer 10
In, it is intended to the propagation of single mode wave is carried out with design wavelength.
Basal layer 10 shows base length l, base widths w1 and substrate level t1, and in the centre on the front side surface I, table
Surface wave is led 11 and is extended along the direction of base length l, stretches to reflecting element 13 partially by basal layer 10.
Multiple photodetectors 14,14 ', 14 ", 14 " ' be connected to multiple conductors 15, these conductors are at least partially along base
At least one surface duct 11 arrangement on the front side I of bottom 10.Conductor 15 is printed on the surface of front side I, to examine for light
Survey device 14,14 ', 14 ", 14 " ' electrical connection.The specially conductor 15 of metal is by electric signal transmission to electrical readout device, the electrical readout
Device is arranged at the rear side B of 14 array of photodetector, back to 12 side of inlet face of basal layer 10.
Photodetector 14 is distributed on the front side I of basal layer 10, at least partly bridges or overlap the vertical of surface duct 11
To opening 110.Herein, it is exemplarily illustrated the photodetector 14 of eight disposed at equal distance, but quantity is changeable.Each light detection
Device 14 has along the distance between the direction width f outstanding of base length l and adjacent detector 14 p.Photodetector 14,
14 ', 14 ", 14 " ' array in the first photodetector 14 (or first sampler) with the reflecting element 13 of reflecting surface
Standoff distance m.
We talk of carbon-based nano structure (specially graphene) as photodetector 14,14 ', 14 ", 14 " '
Material.Photodetector 14,14 ', 14 ", 14 " ' and it is profiled sheeting, there is at least one graphene layer, including known Two-dimensional Carbon list
Layer.Graphene single layer can be combined with quantum dot (nano dot), to increase the Photosensitivity of graphene detector.
Graphene-based 14 array of photodetector is based on the photoelectric effect in graphene come work.The width in graphene channel
F comes from guide wavelength, for example, the width f in graphene channel is less than 85nm, to guided wave wave under the guide wavelength of 1550nm
Long is about that the standing wave of 350nm suitably samples.
The bandwidth of the distance between adjacent light detector 14 (graphene channel or sampler) p restriction spectrometer.Sample region
The entire length ls in domain limits the spectral resolution of spectrometer.
Since main energetic is stored closer to the plane of refraction at zero optical path difference (ZPD) in wide-band applications,
Reflecting element 13 or corresponding reflecting surface 13 and the distance between the first photodetector or sampler 14 m minimize.
Depending on interested spectral region, suitable transparent substrate material is used.For example, for from visible light to medium wave
The application of long infrared (MWRI, 4 μm) can be used niobic acid lithium material as 10 material of basal layer, or for visible light/NIR, can
Use Pyrex as 10 material of basal layer, wherein introducing surface duct 11.
The depth capacity d of surface duct 11 and width D by the wavelength that operates and the technology limiting for inscribing waveguide 11,
That is, for the application from visible light to NIR, by the single waveguide 11 of the refractive index localized variation generation along substrate, or for
The application of short-wave infrared (SWIR) and medium wavelength infrared (MWIR), by being generated in the base layer 10 with laterally spaced multiple
The surface coverings waveguide 11 of parallel damage track.
For example, at 1550, for the best single mode propagation in lithium niobate (LiNbO3) crystal, needing diameter less than 30
μm femtosecond pulse inscribe surface coverings waveguide 11.Optimize the depth d of waveguide 11, to get enter into basal layer 10
Evanescent field on the top surface of front side I.
Can be used (for example) focused ion beam (FIB) milling technology will act as the reflecting element 13 of reflecting mirror as close to
First graphene channel 14 is machined out, and is filled by the reflecting material under design wavelength.
Signal interference in order to prevent especially will there is the basal layer 10 of surface duct 11 to be stacked as two or three d
When array, light-absorbing coating 100 is coated on the rear side II of basal layer 10.The used light-absorbing coating 100 is based on carbon or carbon is received
Mitron, for example, blacker-than-black material or known black paint can be used.
Fig. 3 show introduced tool there are four independent surface duct 11,11 ', 11 ", 11 " ' a basal layer 10.
Spectrometer 1 ' (waveguide array of 4 pixels in single substrate setting (1D)) includes row's surface duct in a basal layer 10
11.Array of the opening 110 with photodetector 14, the photodetector longitudinally in each of each surface duct 11 are led with correlation
Body 15.Along the direction of 10 width w of basal layer, the distance between adjacent surface waveguide 11 is dw.Single pixel shown in FIG. 1
Setting repeats in the base layer 10.The distance between pixel dw is based on interval needed for electrical readout device and metallic conductor 15 (from several μ
M is limited to several mm).
As depicted in fig. 4, building includes multiple basal layers 10,10 ', 10 ", 10 " ' (each basal layer includes multiple
Surface duct 11,11 ', 11 ", 11 " ' and at least in intermediate basal layer 10,10 ', 10 " rear side II on include light-absorbing coating 100)
Spectrometer lamination 1 " be feasible.Lamination 1 " has height t and stack width W.Basal layer bonding or glued together.Bonding
Can by by absorber coatings, to be optimized for include adhesive function, by additional thin adhesive phase or by solid outside the addition of outside
Determine device and realizes.
In order to be further improved waveguide spectrometer 1 " ', with the 10 material class of basal layer with the waveguide 11 being scribed in it
As intermediate basal layer 16 the front side I of each basal layer 10 with surface duct 11 is set, to prevent the guided wave in stacking
Distortion and crosstalk with adjacent upper basal layer 10 '.The thickness of intermediate basal layer 16 should be less than the thickness t1 of basal layer 10.?
This " ' form of lamination 1 is depicted in Fig. 6 in a manner of the perspective view that the side of the inlet face 12 from surface duct 11 looks over
Waveguide spectrometer.
The bottom of intermediate basal layer 16 is coated by the anti-reflection coating 160 of antireflection material.
In the lamination 1 of Fig. 7 " ' side view in, show conductor 15 and stretch to the end face of basal layer 10 and therefore stretch to folded
Layer 1 " ' end face, wherein conductor 15 is connected to electrical readout system.
Due to all presentations waveguide spectrometer 1,1 ', 1 ", 1 " ' conductor 15 stretch to basal layer 10,10 ', 10 ",
10 " ' end face the fact that, can easily and directly complete being electrically connected for conductor 15 and electrical readout system.
We talk of the solutions of two kinds of innovations of very compact waveguide imaging spectrometer 1.First scheme is improved
Basal layer 10 with surface duct 11 and its manufacturing process stacked, thus to sweep with realizing to push away in a manner of cost-efficient
Construction.
This includes that waveguide 11 is directly scribed in covering substrate, for example, femto-second laser pulse waveguide manufacturing technology.
In extensive manufacture, this architecture provides it is strong, there is cost-efficient solution, it is heavy to be directly entered
Evanescent field on the smooth surface of substrate needed for product sampling structure and detector matrix.
Alternative plan is related to for photodetector array being fabricated directly on the surface of substrate, by converting photons into
It is used subsequently to the signal of retrieval spectral information and directly detects evanescent wave.This is feasible now due to the waveguide manufacturing technology of innovation
, smooth wide surface is provided on the top of waveguide 11 of the waveguide manufacturing technology at the front side I of basal layer 10.
Detector 14 (for example, array of graphene nano detector 14) is directly printed on the front side I of basal layer 10, with
The evanescent field of the communication mode of waveguide 11 directly contacts.The great advantage of this method is, does not need any for collecting by hidden
Lose the image transmitting optical device for the signal that quarry sampling device extracts；Data are by the local electric signal be converted to for data processing.
Before on the front side I that multiple photodetectors 14 and electric conductor 15 are printed onto basal layer 10, along basal layer
After at least one surface duct 11 is inscribed using laser beam in the direction of 10 length l in the base layer 10, by reflecting element 13
It is placed directly on surface duct 11 or in surface duct.
These new technologies manufacture stacked structure for cost efficiency and have paved road, which is that ultraphotic composes (2D) biography
Needed in the research and development of sensor (expected key breakthrough will be represented).
Compared with the SWIFTS technology for providing single pixel solution, equipment described herein is to push away the pixel swept in construction
Array.On the other hand, due to do not have the prior art propose image transmitting optical device and common detector matrix (CCS,
CMOS etc.), which can be stacked with very small volume.
Optionally, reflecting element 13 may be structured to move in the longitudinal opening 110 of surface duct 11, to change
The propagation property of the optical signal of the backpropagation of reflection and the interference pattern for therefore changing generation.Moveable reflecting element 13
It can be manufactured such that MEMS (MEMS) structure for directly etching or being milled into waveguide and statically move, it is such as current
Other MEMS structures.
List of reference numerals
1 waveguide spectrometer
1 ' has the spectrometer of row's waveguide in a basal layer
1 " spectrometer of the lamination with several basal layers
1 " ' spectrometer with several basal layers/centre basal layer lamination
10 basal layers
On front side of I
II rear side/absorption side
100 light-absorbing coatings
L base length
W1 base widths
T1 substrate level
11 surface ducts
110 longitudinal openings
D depth capacity
D width
The total length of ls sampling area
The distance between m reflecting surface and the first sampler/photodetector
Dw along base widths the distance between the adjacent waveguide in direction
12 inlet faces
13 reflecting elements with reflecting surface
14 photodetectors/graphene channel
The width in f graphene channel
The distance between p adjoining graphite alkene channel
The rear side of B photodetector array
15 conductors (metal)
16 intermediate basal layers
160 anti-reflection coating
Claims (15)
1. waveguide spectrometer (1), including at least one basal layer (10) at least one waveguide, each waveguide is logical from part
The inlet face (12) for crossing the basal layer (10) extends to reflecting element (13),
Wherein, multiple photodetectors (14) are arranged on the front side (I) of the basal layer (10), allow in the photodetector
(14) evanescent field is coupled at position outside each waveguide, while it is evanescent field sampler that the photodetector (14), which can be applied,
The evanescent field sampler is each coupled electrically to electrical readout system,
Wherein,
The waveguide is surface duct (11,11 ', 11 ", 11 " '), is shown positioned at the inlet face (12) and the reflection
Between element (13) towards the basal layer (10) front side (I) the longitudinal opening (110) with width (D),
The photodetector front side that (14,14 ', 14 ", 14 " '), printing was distributed on the top of the basal layer (10) simultaneously
(I) it at, is at least partly handed over along the total length (ls) of sampling area and the longitudinal opening (110) of the surface duct (11)
It is folded,
And photodetector (14,14 ', 14 ", 14 " ') and the electrical readout system are realized by the electric conductor of multiple printings (15)
Electrical connection.
2. waveguide spectrometer (1) according to claim 1, wherein the conductor (15) is before the basal layer (10)
Side (I) is prominent, stretches to the end face of the basal layer (10), is electrically connected with improving with the simple of electrical readout system.
3. waveguide spectrometer (1) according to one of the preceding claims, wherein the photodetector (14) is sheet
Property, the thickness at least one monolayer material.
4. waveguide spectrometer (1) according to claim 3, wherein the photodetector (14,14 ', 14 ", 14 " ') includes
The carbon-based nano structure that can be printed, especially graphene.
5. waveguide spectrometer (1) according to one of the preceding claims, wherein the basal layer (10) includes
LiNbO3 or Pyrex.
6. waveguide spectrometer (1) according to one of the preceding claims, wherein at least one described surface duct
(11,11 ', 11 ", 11 " ') are directly carved into the basal layer (10).
7. waveguide spectrometer (1) according to one of the preceding claims, wherein light-absorbing coating (100) is coated in institute
It states on the rear side (II) of basal layer (10).
8. waveguide spectrometer (1) according to one of the preceding claims, wherein behind include anti-reflective coating on side
The intermediate basal layer (16) of layer (160) is fixed on the basal layer (10) using the front side (I) of the basal layer (10).
9. waveguide spectrometer (1) according to one of the preceding claims, wherein multiple in a basal layer (10)
Surface duct (11,11 ', 11 ", 11 " ') is arranged to building surface wave guide, each surface duct show be located at it is described
Between inlet face (12) and the reflecting element (13) towards the basal layer (10) front side (I) longitudinal opening (110), together
Shi Suoshu photodetector (14,14 ', 14 ", 14 " ') is distributed at the front side on the top of the basal layer (10) (I), at least portion
The longitudinal opening (110) for dividing ground to bridge the surface duct (11), and the light is realized by multiple printing electric conductors (15)
Detector (14,14 ', 14 ", 14 " ') is electrically connected with the electrical readout system.
10. waveguide spectrometer (1) according to one of the preceding claims, wherein respectively include multiple surface ducts
Multiple n basal layers (14,14 ', 14 ", 14 " ') of (11,11 ', 11 ", 11 " ') by by n-1 basal layer (10,10 ', 10 ",
10 " ') rear side (II) and n-1 adjacent substrate layer (10,10 ', 10 ", 10 " ') front side (I) connect and stack, if building has
The lamination (1 ") of dry basal layer (10,10 ', 10 ", 10 " ').
11. according to waveguide spectrometer (1) described in previous claim, wherein spectrometer lamination (1 " ') be built as, including
Multiple basal layers (10) of intermediate basal layer (16) according to claim 9 with connection.
12. the method for manufacturing waveguide spectrometer (1) according to one of the preceding claims, including following step
It is rapid:
At least one table is inscribed in the basal layer (10) using laser beam along the direction of the length (l) of basal layer (10)
Surface wave leads (11),
Reflecting element (13) is placed directly on the surface duct (11) or in the surface duct, prior to
Multiple photodetectors (14) and electric conductor (15) are directly printed on the front side (I) of the basal layer (10).
13. according to method described in previous claim, wherein the reflecting element (13) is arranged by photoetching or milling technology
Into at least one described surface duct (11), reflecting surface is generated at or near milling position.
14. method described in one in 2 or 13 according to claim 1, wherein the inscription of the surface duct (11) is to utilize
What femto-second laser pulse was completed.
15. method described in one in 2 to 14 according to claim 1, wherein there is at least one surface duct in manufacture
(11) basal layer (10), setting reflecting element (13) and after printing multiple photodetectors (14) and electric conductor (15), pass through
It repeats and constructs lamination (1 ", 1 " ').
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP16179718.8 | 2016-07-15 | ||
| EP16179718.8A EP3270127A1 (en) | 2016-07-15 | 2016-07-15 | Miniaturized waveguide imaging spectrometer |
| PCT/EP2017/066784 WO2018011035A1 (en) | 2016-07-15 | 2017-07-05 | Miniaturized waveguide imaging spectrometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110023727A true CN110023727A (en) | 2019-07-16 |
| CN110023727B CN110023727B (en) | 2021-12-03 |
Family
ID=56557494
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780056865.1A Active CN110023727B (en) | 2016-07-15 | 2017-07-05 | Miniaturized waveguide imaging spectrometer |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US11067442B2 (en) |
| EP (2) | EP3270127A1 (en) |
| CN (1) | CN110023727B (en) |
| WO (1) | WO2018011035A1 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3270128A1 (en) | 2016-07-15 | 2018-01-17 | Micos Engineering GmbH | Waveguide spectrometer to carry out the integrated interferogram scanning |
| US11092546B2 (en) * | 2017-12-22 | 2021-08-17 | Samsung Electronics Co., Ltd. | Spectrometer utilizing surface plasmon |
| KR102572203B1 (en) * | 2018-10-05 | 2023-08-30 | 한국전자통신연구원 | Pressure Sensor |
| US11099084B2 (en) * | 2018-10-05 | 2021-08-24 | Electronics And Telecommunications Research Institute | Pressure sensor |
| CN109540807B (en) * | 2018-10-23 | 2020-06-30 | 京东方科技集团股份有限公司 | Spectrometer and micro total analysis system |
| US11125618B1 (en) | 2020-06-26 | 2021-09-21 | Scidatek Inc. | Photonic integrated spectrometer with tunable dispersive element and method of using same |
| EP4261506A1 (en) | 2022-04-12 | 2023-10-18 | Eidgenössische Materialprüfungs- und Forschungsanstalt | Component for building a miniaturized spectrometer and method for using it |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20190219445A1 (en) | 2019-07-18 |
| EP3270127A1 (en) | 2018-01-17 |
| WO2018011035A1 (en) | 2018-01-18 |
| US11067442B2 (en) | 2021-07-20 |
| CN110023727B (en) | 2021-12-03 |
| EP3485243A1 (en) | 2019-05-22 |
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