CN110021652A - Quantum dot flexibility OLED display and preparation method - Google Patents
Quantum dot flexibility OLED display and preparation method Download PDFInfo
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- CN110021652A CN110021652A CN201910265683.6A CN201910265683A CN110021652A CN 110021652 A CN110021652 A CN 110021652A CN 201910265683 A CN201910265683 A CN 201910265683A CN 110021652 A CN110021652 A CN 110021652A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/115—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
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Abstract
A kind of quantum dot flexibility OLED display and preparation method, comprising: the first barrier layer, the first flexible substrate, TFT layer, Nan dian Yao luminescent layer, the first encapsulation film layer, adhesive phase, the second encapsulation film layer and quantum dot color membrane substrates;The quantum dot color membrane substrates include the second barrier layer, the second flexible substrate, color filter film, black matrix" and quantum dot film layer, the black matrix" and the quantum dot film layer is completely covered in the second encapsulation film layer, and the topmost edge of described adhesive layer and second flexible substrate bond and the second encapsulation film layer are completely covered.Quantum dot flexibility OLED display and preparation method provided by the present invention, the encapsulation film layer of OLED device and the encapsulation film layer of quantum dot are used into dual face seals glue bond, to make OLED device and quantum dot enhance the obstructing capacity of water oxygen, the risk that quantum dot flexibility OLED display internal components are oxidized is reduced, the service life of quantum dot flexibility OLED display is improved.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of quantum dot flexibility OLED displays and preparation method.
Background technique
At present since high color purity, spectrum possessed by quanta point material (Quantum Dot, QD) itself are continuously adjustable etc.
Excellent properties become 21 century the most outstanding luminescent material, can increase substantially available liquid crystal in display colour gamut
The color representation of display, therefore its display application is widely studied in recent years.OLED (organic electroluminescent device) possesses spontaneous
The characteristics such as light, ultra-thin, fast response time, wide viewing angle, Nan dian Yao device (BOLED) are ideal quantum dot excitation light sources.
Therefore the advantages of panel of combination (QD-BOLED) production of quantum dot Nan dian Yao device will possess quantum dot and OLED simultaneously,
To promote properties of product.
But quantum dot and OLED are easy to be influenced by steam, it is necessary to be packaged.Quantum dot liquid crystal display at present
Mainstream encapsulation is that the flaky material that quantum dot is accompanied between film is attached between backlight and liquid crystal display panel, but in QD-BOLED
In panel, quanta point material is in panel itself, therefore this packaging method is not particularly suited for the encapsulation of QD-BOLED.Due to quantum dot
It is all easy to be influenced by steam with OLED, it is difficult to face very big technology for its encapsulation technology for large scale flexible OLED panel
Point.Therefore need to develop new packaging method and structure to be packaged to QD-BOLED television panels.
In conclusion existing quantum dot flexibility OLED display, since quantum dot film layer and OLED device are easy
It is influenced by steam, quantum dot film layer and OLED device is caused to be oxidized, further result in quantum dot flexibility OLED display
Service life reduction.
Summary of the invention
The present invention provides a kind of quantum dot flexibility OLED display and preparation method, can protect quantum dot film layer and
OLED device leads to service life reduction from vapour corrosion, to solve existing quantum dot flexibility OLED display, quantum dot
Film layer and OLED device are easy to be influenced by steam, cause quantum dot film layer and OLED device to be oxidized, the amount of further resulting in
Son puts the technical issues of service life reduction of flexible OLED display.
To solve the above problems, technical solution provided by the invention is as follows:
The present invention provides a kind of quantum dot flexibility OLED display, comprising: the first barrier layer, the first flexible substrate, TFT
Layer, Nan dian Yao luminescent layer, the first encapsulation film layer and adhesive phase;
Wherein, quantum dot color membrane substrates are provided with above described adhesive layer, the quantum dot color membrane substrates include the
Two barrier layers, the second flexible substrate, color filter film, black matrix" and quantum dot film layer, on the quantum dot color membrane substrates
It is provided with the second encapsulation film layer, the black matrix" and the quantum dot film layer, institute is completely covered in the second encapsulation film layer
It states the topmost edge of adhesive phase and second flexible substrate bonds and the second encapsulation film layer is completely covered.
According to one preferred embodiment of the present invention, the first encapsulation film layer include be stacked from bottom to top it is first inorganic
Water blocking layer, buffer layer and the second inorganic water blocking layer, the second inorganic water blocking layer are located at the table of the described first inorganic water blocking layer
Simultaneously the buffer layer is completely covered in face;Described adhesive layer is dual face seals glue, and the second encapsulation film layer is the inorganic resistance of third
Water layer.
According to one preferred embodiment of the present invention, the lower surface of described adhesive layer is completely covered described first and inorganic blocks water
Layer, the inorganic water blocking layer of the third is completely covered in the upper surface of described adhesive layer.
According to one preferred embodiment of the present invention, the described first inorganic water blocking layer, the second inorganic water blocking layer and described
The material of the inorganic water blocking layer of third is SiNx、SiON、SiOx、Al2O3And SiO2At least one of.
According to one preferred embodiment of the present invention, the material of the quantum dot film layer includes polymer substrate and is scattered in polymerization
Quantum dot in object matrix.
According to one preferred embodiment of the present invention, the polymer substrate is resin transparent material, the resin transparent material
Including one of acrylic resin, epoxy resin, cyclic olefin polymer, organosilan resinoid and cellulose ester or more
Kind.
According to one preferred embodiment of the present invention, the black matrix" includes multiple sub- black matrix"s, and adjacent two son is black
The color filter film is provided between colour moment battle array.
According to one preferred embodiment of the present invention, the color filter film is the color film of red son, the color film of green and blue
Any one in sub- coloured silk film.
The present invention also provides a kind of preparation methods of quantum dot flexibility OLED display, which comprises
S10 provides a glass substrate, and the first flexible substrate and TFT layer are sequentially prepared on the glass substrate, is formed
Flexible TFT substrate makes ultra-blue-light device by vapor deposition or inkjet printing in the flexible TFT substrate, forms blue light
OLED luminescent layer;
The indigo plant is completely covered in S20, the first encapsulation of preparation film layer on the surface of the TFT layer, the first encapsulation film layer
Light OLED luminescent layer;
S30 provides a glass cover-plate, is sequentially prepared the second flexible substrate, colorized optical filtering on the surface of the glass cover-plate
Film, black matrix" and quantum dot film layer;
S40, prepares the second encapsulation film layer in second flexible substrate, and the second encapsulation film layer is completely covered described
Color filter film, the black matrix" and the quantum dot film layer;
S50 is bonded the first encapsulation film layer and the second encapsulation film layer using dual face seals glue, described two-sided close
Sealing forms adhesive phase after heater is heating and curing, and first encapsulation is completely covered in the lower surface of described adhesive layer
The second encapsulation film layer is completely covered in film layer, the upper surface of described adhesive layer;
S60 separates first flexible substrate with the glass substrate, is bonded on the surface of first flexible substrate
One barrier film forms the first barrier layer, second flexible substrate is separated with the glass cover-plate, in second flexible liner
The surface at bottom is bonded another barrier film and forms the second barrier layer, finally obtains the quantum dot flexibility OLED display.
According to one preferred embodiment of the present invention, in the S20, the first encapsulation film layer includes being stacked from bottom to top
The first inorganic water blocking layer, buffer layer and the second inorganic water blocking layer, the second inorganic water blocking layer is located at described first inorganic
Simultaneously the buffer layer is completely covered in the surface of water blocking layer.
The invention has the benefit that quantum dot flexibility OLED display provided by the present invention and preparation method, it will
The encapsulation film layer of OLED device and the encapsulation film layer of quantum dot use dual face seals glue bond, to make OLED device and quantum
Point enhances the obstructing capacity of water oxygen, reduces the risk that quantum dot flexibility OLED display internal components are oxidized, raising amount
Son puts the service life of flexible OLED display.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of embodiment or technical solution in the prior art
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only some of invention
Embodiment for those of ordinary skill in the art without creative efforts, can also be attached according to these
Figure obtains other attached drawings.
Fig. 1 is quantum dot flexibility OLED display structural schematic diagram of the present invention.
Fig. 2 is the preparation method flow chart of quantum dot flexibility OLED display of the present invention.
Fig. 2A -2F is the preparation method schematic diagram of quantum dot flexibility OLED display described in Fig. 2.
Specific embodiment
The explanation of following embodiment is referred to the additional illustration, the particular implementation that can be used to implement to illustrate the present invention
Example.The direction term that the present invention is previously mentioned, such as [on], [under], [preceding], [rear], [left side], [right side], [interior], [outer], [side]
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the present invention, rather than to
The limitation present invention.The similar unit of structure is with being given the same reference numerals in the figure.
The present invention is directed to existing quantum dot flexibility OLED display, since quantum dot film layer and OLED device are easy
It is influenced by steam, quantum dot film layer and OLED device is caused to be oxidized, further result in quantum dot flexibility OLED display
Service life reduction the technical issues of, the present embodiment is able to solve the defect.
As shown in Figure 1, being quantum dot flexibility OLED display structural schematic diagram of the present invention.Wherein, the present invention provides one
Kind quantum dot flexibility OLED display, comprising: the first barrier layer 11, the first flexible substrate 12, TFT layer 13, Nan dian Yao hair
Photosphere 14, first encapsulates film layer 15 and adhesive phase 16;
Wherein, the top of described adhesive layer 16 is provided with quantum dot color membrane substrates 18, the quantum dot color membrane substrates 18
Including the second barrier layer 181, the second flexible substrate 182, color filter film 183, black matrix" 184 and quantum dot film layer 185,
The second encapsulation film layer 17 is provided on the quantum dot color membrane substrates 18, the black is completely covered in the second encapsulation film layer 17
Matrix 184 and the quantum dot film layer 185, the topmost edge of described adhesive layer 16 and second flexible substrate 182 are viscous
The second encapsulation film layer 17 is completely covered in merging.
Specifically, the first encapsulation film layer 15 includes the first inorganic water blocking layer 151 being stacked from bottom to top, buffering
Layer 152 and the second inorganic water blocking layer 153, the second inorganic water blocking layer 153 are located at the table of the described first inorganic water blocking layer 151
Simultaneously the buffer layer 152 is completely covered in face;Described adhesive layer 16 is dual face seals glue, and the second encapsulation film layer 17 is third
Inorganic water blocking layer.
Specifically, the described first inorganic water blocking layer 151, described adhesive is completely covered in the lower surface of described adhesive layer 16
The inorganic water blocking layer of the third is completely covered in the upper surface of layer 16.
Specifically, the first inorganic water blocking layer 151, the second inorganic water blocking layer 153 and the inorganic resistance of the third
The material of water layer is SiNx、SiON、SiOx、Al2O3And SiO2At least one of.
Specifically, the material of the quantum dot film layer 185 includes polymer substrate and the amount that is scattered in polymer substrate
Sub- point;The polymer substrate be resin transparent material, the resin transparent material include acrylic resin, epoxy resin,
One of cyclic olefin polymer, organosilan resinoid and cellulose ester are a variety of.
Specifically, the black matrix" 184 includes multiple sub- black matrix"s 1841, the adjacent two sub- black matrix" 1841
Between be provided with the color filter film 183;The color filter film 183 is the color film of red son, the color film of green and blue
Any one in sub- coloured silk film.
As shown in Fig. 2, the present invention also provides a kind of preparation method process of quantum dot flexibility OLED display, the side
Method includes:
S10 provides a glass substrate 201, be sequentially prepared on the glass substrate 201 first flexible substrate 202 and
TFT layer 203 forms flexible TFT substrate, makes ultra-blue-light device by vapor deposition or inkjet printing in the flexible TFT substrate
Part forms Nan dian Yao luminescent layer 204.
Specifically, the S10 further include:
Firstly, providing a glass substrate 201, the glass substrate 201 is cleaned using the cleaning solutions such as pure water or hot sulfuric acid,
It is coated with polyimide solution on the glass substrate 201 later, and is prepared into after depositing nitrogen silicon compound or oxynitrides
First flexible substrate 202;Then TFT layer 203 is made in first flexible substrate 202, flexible TFT substrate is formed, in institute
It states and ultra-blue-light device is made by vapor deposition or inkjet printing in flexible TFT substrate, form Nan dian Yao luminescent layer 204, such as scheme
Shown in 2A.
S20, the first encapsulation of preparation film layer 205 on the surface of the TFT layer 203, the first encapsulation film layer 205 are covered completely
Cover the Nan dian Yao luminescent layer 204.
Specifically, the S20 further include:
The first encapsulation film layer 205 includes the first inorganic water blocking layer 2051, the buffer layer being stacked from bottom to top
2052 and the second inorganic water blocking layer 2053, the second inorganic water blocking layer 2053 be located at the described first inorganic water blocking layer 2051
Simultaneously the buffer layer 2052 is completely covered in surface;Nonthermal plasma chemistry gas phase is used in the top of the TFT layer 203 first
Sedimentation or atomic layer deposition method make the first inorganic water blocking layer 2051, and the material of the first inorganic water blocking layer is
SiNx、SiON、SiOx、Al2O3And SiO2At least one of;It is sprayed later in the top of the described first inorganic water blocking layer 2051
Black printing type makes the buffer layer 2052, and solidifies the buffer layer 2052 by ultraviolet illumination;Then described
The top of buffer layer 2052 is inorganic using nonthermal plasma chemistry vapour deposition process or atomic layer deposition method production described second
Water blocking layer 2053, the material of the second inorganic water blocking layer are SiNx、SiON、SiOx、Al2O3And SiO2At least one of,
As shown in Figure 2 B.
S30 provides a glass cover-plate 2061, is sequentially prepared the second flexible substrate on the surface of the glass cover-plate 2061
2062, color filter film 2063, black matrix" 2064 and quantum dot film layer 2065.
Specifically, the S30 further include:
Firstly, providing a glass cover-plate 2061, the glass cover-plate 2061 is washed using the cleaning solutions such as pure water or hot sulfuric acid
Only, it is coated with polyimide solution on the glass cover-plate 2061 later, and is made after depositing nitrogen silicon compound or oxynitrides
For at the second flexible substrate 2062;Then the color filter film 2063 and institute are made in second flexible substrate 202
Black matrix" 2064 is stated, the black matrix" 2064 includes multiple sub- black matrix"s 20641, the adjacent two sub- black matrix"
Be provided with the color filter film 2063 between 20641, the color filter film 2063 be the color film of red son, the color film of green with
And any one in the color film of blue;Later, pass through on the color filter film 2063 and the black matrix" 2064
Yellow light process is first coated with the resin containing quanta point material, then allows the resin containing quanta point material by prebake conditions, baking etc.
Solidification, forms quantum dot layer 2065, and the material of the quantum dot film layer 2065 includes polymer substrate and is scattered in polymer matrix
Quantum dot in matter, the polymer substrate are resin transparent material, and the resin transparent material includes acrylic resin, ring
One of oxygen resin, cyclic olefin polymer, organosilan resinoid and cellulose ester are a variety of, as shown in Figure 2 C.
S40, prepares the second encapsulation film layer 207 in second flexible substrate 2062, and the second encapsulation film layer 207 is complete
Color filter film 2063, the black matrix" 2064 described in all standing and the quantum dot film layer 2065.
Specifically, the S40 further include:
Nonthermal plasma chemistry vapour deposition process or atomic layer deposition are used in the top of second flexible substrate 2062
Area method production the second encapsulation film layer 207, i.e., the material of the described inorganic water blocking layer of third, the inorganic water blocking layer of third are
SiNx、SiON、SiOx、Al2O3And SiO2At least one of;The colored filter is completely covered in the second encapsulation film layer 207
Light film 2063, the black matrix" 2064 and the quantum dot film layer 2065, as shown in Figure 2 D.
S50 is bonded the first encapsulation film layer 205 and the second encapsulation film layer 207 using dual face seals glue, described
Dual face seals glue forms adhesive phase 208 after heater is heating and curing, and the lower surface of described adhesive layer 208 is completely covered
The second encapsulation film layer 207 is completely covered in the first encapsulation film layer 205, the upper surface of described adhesive layer 208.
Specifically, the S50 further include:
One two-sided sealant is provided first, the protective film of dual face seals glue lower surface side is removed, is pasted by vacuum
The lower surface of the dual face seals glue is attached in first flexible substrate 202 by conjunction mode;The dual face seals are removed later
The upper surface of the dual face seals glue is attached to second flexibility by vacuum abutted mode by the protective film of glue upper surface side
On substrate 2062;Then heating pressurization or baking oven heating by heater makes the dual face seals adhesive curing, forms the bonding
The first encapsulation film layer 205 is completely covered in oxidant layer 208, the lower surface of described adhesive layer 208, described adhesive layer 208
The second encapsulation film layer 207 is completely covered in upper surface, as shown in Figure 2 E.
S60 separates first flexible substrate 202 with the glass substrate 201, in first flexible substrate 202
Surface be bonded a barrier film and form the first barrier layer 209, will second flexible substrate 2062 and the glass cover-plate 2061
Separation is bonded another barrier film on the surface of second flexible substrate 2062 and forms the second barrier layer 2010, finally obtains institute
State quantum dot flexibility OLED display.
Specifically, the S60 further include:
The glass substrate 201 is cut first, then divides first flexible substrate 202 and the glass substrate 201
From, it is bonded barrier film on the surface of first flexible substrate 202, solidifies glue material by heating or pressurizeing, the first resistance of formation
Barrier 209;Second flexible substrate 2062 is separated with the glass cover-plate 2061 later, in second flexible substrate
2062 surface is bonded another barrier film, solidifies glue material by heating or pressurizeing, and the second barrier layer 2010 is formed, to complete
Encapsulation finally obtains the quantum dot flexibility OLED display, as shown in Figure 2 F.
The present invention first makes first flexible substrate 202 and the TFT layer 203 in 201 side of glass substrate, so
After make the Nan dian Yao luminescent layer 204, finally with it is described first encapsulation film layer 205 to the Nan dian Yao luminescent layer 204
It is packaged;In 2061 side of glass cover-plate, second flexible substrate 2062 and color membrane substrates 206 are first made, then
Quantum dot film layer 2065 is made by yellow light process on the color membrane substrates 206, it is finally right with the second encapsulation film layer 207
The quantum dot film layer 2065 is packaged;Then dual face seals glue glue material is encapsulated with vacuum abutted mode by described first
Film layer 205 fits together with the second encapsulation film layer 207, this encapsulating structure packaging effect is good, can meet large scale simultaneously
Encapsulation requirement of the flexible TV to quanta point material and OLED device.
The invention has the benefit that quantum dot flexibility OLED display provided by the present invention and preparation method, it will
The encapsulation film layer of OLED device and the encapsulation film layer of quantum dot use dual face seals glue bond, to make OLED device and quantum
Point enhances the obstructing capacity of water oxygen, reduces the risk that quantum dot flexibility OLED display internal components are oxidized, raising amount
Son puts the service life of flexible OLED display.
In conclusion although the present invention has been disclosed above in the preferred embodiment, but above preferred embodiment is not to limit
The system present invention, those skilled in the art can make various changes and profit without departing from the spirit and scope of the present invention
Decorations, therefore protection scope of the present invention subjects to the scope of the claims.
Claims (10)
1. a kind of quantum dot flexibility OLED display characterized by comprising
First barrier layer;
First flexible substrate is located on first barrier layer;
TFT layer is located in first flexible substrate;
Nan dian Yao luminescent layer is located on the TFT layer;
First encapsulation film layer, on the TFT layer and covers the Nan dian Yao luminescent layer;
Adhesive phase on the TFT layer and covers the first encapsulation film layer;
Wherein, quantum dot color membrane substrates are provided with above described adhesive layer, the quantum dot color membrane substrates include the second resistance
Barrier, the second flexible substrate, color filter film, black matrix" and quantum dot film layer are arranged on the quantum dot color membrane substrates
There is the second encapsulation film layer, the black matrix" and the quantum dot film layer is completely covered in the second encapsulation film layer, described viscous
The topmost edge of mixture layer and second flexible substrate bond and the second encapsulation film layer are completely covered.
2. quantum dot flexibility OLED display according to claim 1, which is characterized in that the first encapsulation film layer packet
Include the inorganic water blocking layer of first be stacked from bottom to top, buffer layer and the second inorganic water blocking layer, described second inorganic blocks water
Layer is located at the surface of the described first inorganic water blocking layer and the buffer layer is completely covered;Described adhesive layer is dual face seals glue,
The second encapsulation film layer is the inorganic water blocking layer of third.
3. quantum dot flexibility OLED display according to claim 2, which is characterized in that the following table of described adhesive layer
The described first inorganic water blocking layer is completely covered in face, and the inorganic water blocking layer of the third is completely covered in the upper surface of described adhesive layer.
4. quantum dot flexibility OLED display according to claim 2, which is characterized in that described first inorganic blocks water
The material of layer, the second inorganic water blocking layer and the inorganic water blocking layer of the third is SiNx、SiON、SiOx、Al2O3And SiO2
At least one of.
5. quantum dot flexibility OLED display according to claim 1, which is characterized in that the material of the quantum dot film layer
Material includes polymer substrate and the quantum dot being scattered in polymer substrate.
6. quantum dot flexibility OLED display according to claim 5, which is characterized in that the polymer substrate is tree
Rouge transparent material, the resin transparent material include acrylic resin, epoxy resin, cyclic olefin polymer, organosilicon alkanes
One of resin and cellulose ester are a variety of.
7. quantum dot flexibility OLED display according to claim 1, which is characterized in that the black matrix" includes more
A sub- black matrix" is provided with the color filter film between the adjacent two sub- black matrix".
8. quantum dot flexibility OLED display according to claim 7, which is characterized in that the color filter film is red
Any one in dice coloured silk film, the color film of green and the color film of blue.
9. a kind of preparation method of quantum dot flexibility OLED display, which is characterized in that the described method includes:
S 10 provides a glass substrate, and the first flexible substrate and TFT layer are sequentially prepared on the glass substrate, is formed soft
Property TFT substrate, ultra-blue-light device is made by vapor deposition or inkjet printing in the flexible TFT substrate, forms Nan dian Yao
Luminescent layer;
The blue light is completely covered in S20, the first encapsulation of preparation film layer on the surface of the TFT layer, the first encapsulation film layer
OLED luminescent layer;
S30 provides a glass cover-plate, is sequentially prepared the second flexible substrate, color filter film, black on the surface of the glass cover-plate
Colour moment battle array and quantum dot film layer;
S40, prepares the second encapsulation film layer in second flexible substrate, and the colour is completely covered in the second encapsulation film layer
Filter coating, the black matrix" and the quantum dot film layer;
S50 is bonded the first encapsulation film layer and the second encapsulation film layer using dual face seals glue, the dual face seals glue
Adhesive phase is formed after heater is heating and curing, first encapsulating film is completely covered in the lower surface of described adhesive layer
The second encapsulation film layer is completely covered in layer, the upper surface of described adhesive layer;
S60 separates first flexible substrate with the glass substrate, one resistance of fitting on the surface of first flexible substrate
Diaphragm forms the first barrier layer, second flexible substrate is separated with the glass cover-plate, in second flexible substrate
Surface is bonded another barrier film and forms the second barrier layer, finally obtains the quantum dot flexibility OLED display.
10. the preparation method of quantum dot flexibility OLED display according to claim 9, which is characterized in that the S20
In, the first encapsulation film layer includes the first inorganic water blocking layer, buffer layer and the second inorganic resistance being stacked from bottom to top
Water layer, the second inorganic water blocking layer are located at the surface of the described first inorganic water blocking layer and the buffer layer are completely covered.
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