CN110018533A - A kind of optical thin film design and manufacturing method of ultra-low reflectance - Google Patents
A kind of optical thin film design and manufacturing method of ultra-low reflectance Download PDFInfo
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- CN110018533A CN110018533A CN201910427201.2A CN201910427201A CN110018533A CN 110018533 A CN110018533 A CN 110018533A CN 201910427201 A CN201910427201 A CN 201910427201A CN 110018533 A CN110018533 A CN 110018533A
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- film
- layer
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- thin film
- optical thin
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Abstract
The invention discloses a kind of optical thin film design of ultra-low reflectance and manufacturing methods, more particularly to the manufacturing technology field of optical thin film, it include glass substrate, the glass substrate side is provided with mesopelagic layer, the mesopelagic layer includes M layers and H layers, and the two quantity is each provided with six layers, the M layer on the mesopelagic layer is alternately stacked setting with H layers, and the mesopelagic layer is provided with outer membrane far from one end of glass substrate.The present invention is by forming optical thin film by multiple M layers of mesopelagic layers for being alternately stacked setting with H layers and outer membrane, in visible wavelength range, the low rank of the common anti-reflection film of its luminance factor, greatly limit visible light can not only be reduced in the reflectivity of dielectric surface, mitigate the influence of ghost, moreover it is possible to visible light be made to be up to 99.7% in the transmitance of dielectric surface.
Description
Technical field
The present invention relates to the manufacturing technology fields of optical thin film, it is more particularly related to a kind of ultralow anti-
Penetrate the optical thin film design and manufacturing method of rate.
Background technique
The present optical lens of market and the anti-reflection film (abbreviation AR film) of optical component, generally plate 5-9 tunic, right
Wavelength is the visible light within the scope of 420-700nm, and the reflection maximum of AR film is 0.5%, and average value is lower than 0.4%.Measurement
The instrument of reflectivity usually uses the reflecting spectrographs such as Olympus USPM-RU-W.
In common optical lens, often by multi-disc lens combination, some camera lenses are even more than 20 eyeglasses, and light exists
Multiple reflections can be generated between face and face, are finally converged in imaging surface and are generated ghost (ghost), bad body is brought to user
It tests.Common AR film, 0.4% or so, is not avoided that the generation of ghost to the reflectivity of visible light, and reflected light influences camera lens
Image quality.
Summary of the invention
In order to overcome the drawbacks described above of the prior art, the embodiment of the present invention provides a kind of optical thin film of ultra-low reflectance
Design and manufacturing method, by optically thin to form by multiple M layers of mesopelagic layers for being alternately stacked setting with H layers and outer membrane
Film, in visible wavelength range, the low rank of the common anti-reflection film of luminance factor greatly limit can not only reduce visible light
In the reflectivity of dielectric surface, mitigate the influence of ghost, moreover it is possible to so that visible light is up to 99.7% in the transmitance of dielectric surface, with
Solve the problems mentioned above in the background art.
To achieve the above object, the invention provides the following technical scheme: a kind of optical thin film of ultra-low reflectance, includes
Glass substrate, the glass substrate side are provided with mesopelagic layer, and the mesopelagic layer includes M layers and H layers, and the two quantity is respectively set
Six layers are equipped with, the M layer on the mesopelagic layer is alternately stacked setting with H layers, and the mesopelagic layer is arranged far from one end of glass substrate
There is outer membrane.
In a preferred embodiment, described H layers by TiO2, Ti2O5, Ta2O5, OH-5 and NB2O5It is a kind of or more
Kind high-index material is mixed, and described M layers by SiO2Material is made, the outer membrane by low-refraction MgF2Material system
At.
In a preferred embodiment, the mesopelagic layer combines to form film with outer membrane, and by mesopelagic layer and outside
Tunic is formed by the visible light that film is 420-700nm suitable for wavelength.
In a preferred embodiment, it is sensitivity that the mesopelagic layer, which combines with outer membrane and to form the second layer of film,
Layer, and its physical thickness is greater than 20nm, by MgF2The physical thickness of the outer membrane made of material is greater than 90nm.
In a preferred embodiment, the present invention also provides a kind of optical thin film design of ultra-low reflectance and systems
Method is made, following making step is specifically included:
S1: the ultrasonic cleaning by glass substrate Jing Guo multiple-grooved after drying, is put on the dedicated umbrella stand of coating machine, and
And it carries into coating machine；
S2: fast pump is carried out to the vacuum chamber of coating machine using mechanical pump and diffusion pump, makes vacuum chamber in coating machine
Vacuum degree reaches 10-5Pa；
S3: the method using APC control is stablized come auxiliary gas flow amount；
S4: using high-pressure electronic rifle, and the method for ion source auxiliary makes high refractive index substance TiO2, Ti2O5, Ta2O5, OH-5
And NB2O5Refractive index become higher, stability is more preferable；
S5: controlling the electric current of electron gun, makes high-index material TiO2, Ti2O5, Ta2O5, OH-5 and NB2O5Evaporation
Speed control can get the more stable uniform refractive index of refractive index and surface in 0.3nm/s or so in this way；
S6: controlling the electric current of electron gun, makes middle low-index material SiO2Evaporation rate control in 1.2nm/s or so,
Middle low-index material is set also to obtain good stability and compactness；
S7: the temperature of substrate is set between 220-250 DEG C, to obtain higher film-strength；
S8: making the Ar gas of ionization using ion source, under big electric field action, is hit with ultraspeed toward glass substrate,
I.e. Coating Materials reaches rapidly glass substrate and carries out plated film, to improve the compactness of film plating layer；
S9: control place the coating machine Special umbrella holder of film glass to be plated or eyeglass in coating process coating umbrella at the uniform velocity from
Turn, the Coating Materials of glass or eyeglass is made to be evenly distributed；
S10: 3 kinds of the layer of the M on mesopelagic layer and H layers and outer membrane are corresponded to using 3 different special baffles respectively
Coating Materials keeps plated film refractive index more evenly and more accurate to obtain the uniformity and consistency of full umbrella.
S11: after the completion of plated film, glass or eyeglass continue to stay in coating machine, take out after twenty minutes, and it is steady to obtain low stress
Qualitative high film.
In a preferred embodiment, in the S1 multiple-grooved ultrasonic cleaning with cleaning solution be followed successively by DC-8, IPA,
In industrial alcohol and pure water.
In a preferred embodiment, the boost voltage of the ion source in the S8 is controlled in 500-1000V range
It is interior, to obtain the stability and compactness of film layer.
In a preferred embodiment, the coating machine Special umbrella holder of film glass or eyeglass to be plated is placed in the S9
Rotational velocity is greater than 15RPS, obtains the refractive index that surface is evenly distributed.
Technical effect and advantage of the invention:
The present invention passes through optically thin to form with 6 H layers of mesopelagic layers for being alternately stacked setting and outer membrane by 6 M layers
Film, and that M layer choosing is SiO2Coating Materials, H layers using TiO2, Ti2O5, Ta2O5, OH-5, NB2O5Etc. high refractive indexes plating
Membrane material, and outer membrane is using MgF2Coating Materials, it is anti-to further decrease to be coated with ultralow reflectance coating using lens surface
Rate is penetrated, to mitigate ghost influence, for ordinary optical film, optical thin film of the invention can drop the intensity of multipath reflection
Low 50% or more, the generation of ghost can be inhibited to the maximum extent, even face the point light source of sunlight or high brightness, also
The multipath reflection between camera lens inside face and face can effectively be inhibited, and the glass substrate used in the present invention is by common light
Glass material composition is learned, the glass of specific glass or specially treated is not needed, production cost can be greatlyd save.
Detailed description of the invention
Fig. 1 is optical lens multiple reflection inside schematic diagram of the invention.
Fig. 2 is the index path on light incident medium surface of the invention.
Fig. 3 is the optical thin film design spectral results figure of case study on implementation 1 of the invention.
Fig. 4 is that case study on implementation 1 of the invention prepares result actual measurement spectrogram.
Fig. 5 is the optical thin film design spectral results figure of case study on implementation 2 of the invention.
Fig. 6 is that case study on implementation 2 of the invention prepares result actual measurement spectrogram.
Appended drawing reference are as follows: 1 glass substrate, 2 mesopelagic layers, 3 outer membranes.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Referring to Figure of description 1-2, it to include glass substrate that the present invention provides a kind of optical thin films of ultra-low reflectance
1,1 side of glass substrate is provided with mesopelagic layer 2, and the mesopelagic layer 2 includes M layers and H layers, and the two quantity is each provided with
Six layers, the M layer on the mesopelagic layer 2 is alternately stacked setting with H layers, and the mesopelagic layer 2 is provided with far from one end of glass substrate 1
Outer membrane 3.
Further, described H layers by TiO2, Ti2O5, Ta2O5, OH-5 and NB2O5One or more high-index materials
It is mixed, described M layers by SiO2Material is made, the outer membrane 3 by low-refraction MgF2Material is made.
Further, the mesopelagic layer 2 combines to form film with outer membrane 3, and is formed by mesopelagic layer 2 and outer membrane 3
Film be suitable for wavelength be 420-700nm visible light.
Further, it is sensitive layer that the mesopelagic layer 2, which combines with outer membrane 3 and to form the second layer of film, and its physics is thick
Degree is greater than 20nm, by MgF2The physical thickness of the outer membrane 3 made of material is greater than 90nm.
The present invention also provides a kind of optical thin film design of ultra-low reflectance and manufacturing methods, specifically include following system
Make step:
S1: the ultrasonic wave that glass substrate 1 is followed successively by DC-8, IPA, industrial alcohol and pure water by multiple-grooved cleaning solution is clear
It washes, after drying, is put on the dedicated umbrella stand of coating machine, and carry into coating machine；
S2: fast pump is carried out to the vacuum chamber of coating machine using mechanical pump and diffusion pump, makes vacuum chamber in coating machine
Vacuum degree reaches 10-5Pa；
S3: the method using APC control is stablized come auxiliary gas flow amount；
S4: using high-pressure electronic rifle, and the method for ion source auxiliary makes high refractive index substance TiO2, Ti2O5, Ta2O5, OH-5
And NB2O5Refractive index become higher, stability is more preferable；
S5: controlling the electric current of electron gun, makes high-index material TiO2, Ti2O5, Ta2O5, OH-5 and NB2O5Evaporation
Speed control can get the more stable uniform refractive index of refractive index and surface in 0.3nm/s or so in this way；
S6: controlling the electric current of electron gun, makes middle low-index material SiO2Evaporation rate control in 1.2nm/s or so,
Middle low-index material is set also to obtain good stability and compactness；
S7: the temperature of substrate is set between 220-250 DEG C, to obtain higher film-strength；
S8: making the Ar gas of ionization using ion source, under big electric field action, is hit with ultraspeed toward glass substrate 1,
I.e. Coating Materials reaches rapidly glass substrate 1 and carries out plated film, to improve the compactness of film plating layer, wherein the auxiliary electricity of ion source
Voltage-controlled system is within the scope of 500-1000V, to obtain the stability and compactness of film layer；
S9: control place the coating machine Special umbrella holder of film glass to be plated or eyeglass in coating process coating umbrella to be greater than
The at the uniform velocity rotation of the revolving speed of 15RPS, makes the Coating Materials of glass or eyeglass be evenly distributed, to obtain the folding that surface is evenly distributed
Penetrate rate；
S10: the 3 of M layer on mesopelagic layer 2 and H layers and outer membrane 3 are corresponded to using 3 different special baffles respectively
Kind Coating Materials keeps plated film refractive index more evenly and more accurate to obtain the uniformity and consistency of full umbrella.
S11: after the completion of plated film, glass or eyeglass continue to stay in coating machine, take out after twenty minutes, and it is steady to obtain low stress
Qualitative high film.
Based on the above-mentioned technical proposal, the technical solution can be carried out further by following two case study on implementation
It is bright:
Case study on implementation 1:(unit: nm)
As seen from the above table, the optical thin film of ultra-low reflectance, first layer to Floor 12 is alternately stacked by M and H
, TiO can be selected in H2, Ti2O5, Ta2O5, OH-5, NB2O5Etc. high-index materials, M select SiO2, but outermost layer selects MgF2,
Because of MgF2It is both low-index material, comparatively robust itself, and be protection materials.
For the spectrum of design as shown in Figure of description 3, abscissa is wavelength, and unit is nm, and ordinate is the hundred of reflectivity
Point ratio, to the visible light within the scope of wavelength 420-680nm, its reflectivity of ultra-low reflectance film of the invention 0.1% hereinafter,
It is the visible light within the scope of 420-720nm to wavelength, reflectivity is below 0.3% gauge wire.Specific refractive index data
It see the table below.
In conjunction with the refractive index data of upper table, 1 optical thin film design of case study on implementation as shown in Figure of description 4 can be drawn out
Measured light spectrogram.
By experiment, the conclusion such as Figure of description 4 can be obtained, abscissa is wavelength, and unit is nm, and ordinate is reflectivity
Percentage, to the visible light within the scope of wavelength 420-680nm, the glass substrate that refractive index is 1.5168, of the invention is ultralow
The reflectivity of reflection efficiency thin film is 0.1% hereinafter, being the visible light within the scope of 420-720nm to wavelength, reflectivity is below
0.3% gauge wire.Measured light spectrogram with design spectrogram be consistent, it was demonstrated that the ultra-low reflectance that the present invention designs it is optically thin
Film is feasible.
Case study on implementation 2
For the spectrogram of the film design of case study on implementation 2 as shown in Figure of description 5, abscissa is wavelength, and unit is nm, is indulged
Coordinate is the percentage of reflectivity, and to the visible light within the scope of wavelength 420-680nm, it is ultra-low reflectance film of the invention anti-
Rate is penetrated 0.1% hereinafter, being the visible light within the scope of 420-720nm to wavelength, reflectivity is below 0.3% gauge wire.
Specific refractive index data see the table below.
In conjunction with the refractive index data of upper table, 2 optical thin film design of case study on implementation as shown in Figure of description 6 can be drawn out
Measured light spectrogram.
By experiment, the conclusion such as Figure of description 6 can be obtained, abscissa is wavelength, and unit is nm, and ordinate is reflectivity
Percentage, to the visible light within the scope of wavelength 420-680nm, the glass substrate that refractive index is 1.59, of the invention is ultralow anti-
The reflectivity of rate film is penetrated 0.1% hereinafter, being the visible light within the scope of 420-720nm to wavelength, reflectivity is below
0.3% gauge wire, measured light spectrogram with design spectrogram be consistent, it was demonstrated that the ultra-low reflectance that the present invention designs it is optically thin
Film is feasible.
The several points that should finally illustrate are: firstly, the present invention discloses in embodiment attached drawing, relating only to and the embodiment of the present disclosure
The structure being related to, other structures, which can refer to, to be commonly designed, under not conflict situations, the same embodiment of the present invention and different implementations
Example can be combined with each other；
Last: the foregoing is only a preferred embodiment of the present invention, is not intended to restrict the invention, all in the present invention
Spirit and principle within, any modification, equivalent replacement, improvement and so on, should be included in protection scope of the present invention it
It is interior.
Claims (8)
1. a kind of optical thin film of ultra-low reflectance includes glass substrate (1), it is characterised in that: the glass substrate (1) one
Side is provided with mesopelagic layer (2), and the mesopelagic layer (2) includes M layers and H layers, and the two quantity is each provided with six layers, the middle layer
M layer on film (2) is alternately stacked setting with H layers, and the mesopelagic layer (2) is provided with outer membrane far from the one end of glass substrate (1)
(3)。
2. a kind of optical thin film of ultra-low reflectance according to claim 1, it is characterised in that: described H layers by TiO2,
The one or more high-index materials of Ti2O5, Ta2O5, OH-5 and NB2O5 are mixed, and described M layers by SiO2 material system
At the outer membrane (3) is made of the MgF2 material of low-refraction.
3. a kind of optical thin film of ultra-low reflectance according to claim 1, it is characterised in that: the mesopelagic layer (2) with
Outer membrane (3) combination forms film, and being formed by film suitable for wavelength by mesopelagic layer (2) and outer membrane (3) is 420-
The visible light of 700nm.
4. a kind of optical thin film of ultra-low reflectance according to claim 2, it is characterised in that: the mesopelagic layer (2) with
The second layer that outer membrane (3) combination forms film is sensitive layer, and its physical thickness is greater than 20nm, the institute made of MgF2 material
The physical thickness for stating outer membrane (3) is greater than 90nm.
5. the optical thin film design and manufacturing method of a kind of ultra-low reflectance according to any one of claims 1-4,
Specifically include following making step:
S1: the ultrasonic cleaning by glass substrate (1) Jing Guo multiple-grooved after drying, is put on the dedicated umbrella stand of coating machine, and
It carries into coating machine；
S2: fast pump is carried out to the vacuum chamber of coating machine using mechanical pump and diffusion pump, makes the vacuum of vacuum chamber in coating machine
Degree reaches 10-5Pa；
S3: the method using APC control is stablized come auxiliary gas flow amount；
S4: use high-pressure electronic rifle, ion source auxiliary method, make high refractive index substance TiO2, Ti2O5, Ta2O5, OH-5 with
And the refractive index of NB2O5 becomes higher, stability is more preferable；
S5: controlling the electric current of electron gun, makes the evaporation speed of high-index material TiO2, Ti2O5, Ta2O5, OH-5 and NB2O5
Degree control can get the more stable uniform refractive index of refractive index and surface in 0.3nm/s or so in this way；
S6: controlling the electric current of electron gun, controls the evaporation rate of middle low-index material SiO2 in 1.2nm/s or so, makes
Low-index material also obtains good stability and compactness；
S7: the temperature of substrate is set between 220-250 DEG C, to obtain higher film-strength；
S8: making the Ar gas of ionization using ion source, under big electric field action, is hit with ultraspeed toward glass substrate (1), i.e.,
Coating Materials reaches rapidly glass substrate (1) and carries out plated film, to improve the compactness of film plating layer；
S9: coating machine Special umbrella holder coating umbrella at the uniform velocity rotation in coating process of film glass or eyeglass to be plated is placed in control,
The Coating Materials of glass or eyeglass is set to be evenly distributed；
S10: the 3 of M layer on mesopelagic layer (2) and H layers and outer membrane (3) are corresponded to using 3 different special baffles respectively
Kind Coating Materials keeps plated film refractive index more evenly and more accurate to obtain the uniformity and consistency of full umbrella.
S11: after the completion of plated film, glass or eyeglass continue to stay in coating machine, take out after twenty minutes, can obtain low stress stability
High film.
6. the optical thin film design and manufacturing method of a kind of ultra-low reflectance according to claim 5, it is characterised in that: institute
The ultrasonic cleaning for stating multiple-grooved in S1 is followed successively by DC-8, IPA, industrial alcohol and pure water with cleaning solution.
7. the optical thin film design and manufacturing method of a kind of ultra-low reflectance according to claim 5, it is characterised in that: institute
The boost voltage for stating the ion source in S8 controls within the scope of 500-1000V, to obtain the stability and compactness of film layer.
8. the optical thin film design and manufacturing method of a kind of ultra-low reflectance according to claim 5, it is characterised in that: institute
The coating machine Special umbrella holder rotational velocity for placing film glass or eyeglass to be plated in S9 is stated greater than 15RPS, it is equal to obtain surface distribution
Even refractive index.
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| CN110333561A (en) * | 2019-07-30 | 2019-10-15 | 威海世高光电子有限公司 | Antireflective coating and preparation method thereof, micro projection system |
| CN112198581A (en) * | 2020-10-20 | 2021-01-08 | 重庆盛泰光电有限公司 | Ultralow-reflection infrared filter and manufacturing process thereof |
| CN113009601A (en) * | 2021-03-10 | 2021-06-22 | 浙江舜宇光学有限公司 | Antireflection film system, optical element, and method for producing film system |
| CN114864728A (en) * | 2022-04-27 | 2022-08-05 | 浙江合特光电有限公司 | High printing opacity coffee glass and coffee solar energy component |
| CN115061226A (en) * | 2022-04-19 | 2022-09-16 | 深圳菲比特光电科技有限公司 | Large-angle ultralow-reflection film forming method |
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| CN114864728A (en) * | 2022-04-27 | 2022-08-05 | 浙江合特光电有限公司 | High printing opacity coffee glass and coffee solar energy component |
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