CN110016322A - Micron order magnetic coupling abrasive material and water-base magnetic rheology polishing liquid - Google Patents
Micron order magnetic coupling abrasive material and water-base magnetic rheology polishing liquid Download PDFInfo
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- CN110016322A CN110016322A CN201910383451.0A CN201910383451A CN110016322A CN 110016322 A CN110016322 A CN 110016322A CN 201910383451 A CN201910383451 A CN 201910383451A CN 110016322 A CN110016322 A CN 110016322A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention belongs to polishing material technical fields, and in particular to micron order magnetic coupling abrasive material and water-base magnetic rheology polishing liquid.Micron order magnetic coupling abrasive material provided by the invention, the raw material including following mass parts: 5~15 parts of bortz powder, 25~35 parts of magnetic powder, 8~28 parts of silica 1,30~40 parts of boron oxide, 10~20 parts and 5~10 parts of calcium oxide of zinc oxide.Embodiment the result shows that, glass specimen is polished using the polishing fluid of the micron order magnetic coupling abrasive material provided containing this programme, the roughness for the sheet glass that surface roughness is 100nm can be reduced to 1nm hereinafter, polishing efficiency has is obviously improved in 25min.
Description
Technical field
The invention belongs to polishing material technical fields, and in particular to micron order magnetic coupling abrasive material and water-base magnetic rheology polishing
Liquid.
Background technique
Polishing is an essential procedure in component of machine and optical component preparation process, especially for tool
Have for the workpiece of curved surface, polishing is even more to influence a committed step of finished workpart rate.For curve surface work pieces, tradition is finished to
Curve flexibility polishing, principle is that the hanging drop containing fine abrasive is added in processed sample surfaces, with flexible cladding or
Hairbrush wraps up sample surfaces in sample surfaces high velocity effect, cladding or hairbrush, in addition the effect of abrasive material, the surface of sample curved surface
Roughness gradually decreases.In use process, this processing method there are the drawbacks of be that the region of cladding or hairbrush contact surface has
Limit, and during running at high speed abrasive suspension can centrifugalization and thrown away, cause abrasive grain to be unevenly distributed, because
This polishing effect is undesirable.
Magnetorheological Polishing be using Magnetorheologicai polishing liquid rheology occurs in gradient magnetic and formed have stick modeling behavior
Flexibility " small abrasive nose " and workpiece between have quick relative motion, make workpiece surface by very big shearing force, to make
Workpiece surface excess stock is removed, and then reaches polishing effect.To make the polishing particles and magnetic fluid in Magnetorheologicai polishing liquid
It moves synchronously, needs to carry out strict control to the partial size of polishing particles, generally by size controlling in nanometer or several micron orders
Not, this results in the polishing operation time longer, affects polishing efficiency.
Summary of the invention
The purpose of the present invention is to provide a kind of micron order magnetic coupling abrasive materials, magnetic using micron order provided by the invention
Abrasive compound is polished, and can improve polishing efficiency on the basis of not influencing polishing effect.
To achieve the goals above, the invention provides the following technical scheme:
The present invention provides a kind of micron order magnetic coupling abrasive material, the raw material including following mass parts: bortz powder 5~15
Part, 25~35 parts of magnetic powder, 8~28 parts of silica 1,30~40 parts of boron oxide, 10~20 parts of zinc oxide and calcium oxide 5~10
Part.
Preferably, the partial size of the micron order magnetic coupling abrasive material is 150~180 μm.
Preferably, the material of the bortz powder is single-crystal diamond and/or polycrystalline diamond.
Preferably, the magnetic powder includes one or more of carbonyl iron, ferroso-ferric oxide and nickel.
Preferably, the magnetic powder further includes di-iron trioxide.
The present invention provides the preparation methods of the micron order magnetic coupling abrasive material described in above-mentioned technical proposal, including following step
It is rapid:
The raw material of the micron order magnetic coupling abrasive material is mixed with water, obtains slurry；
The slurry is solidified, blank is obtained；
The blank is successively sintered and fragmentation, micron order magnetic coupling abrasive material is obtained.
Preferably, the cured mode includes:
The slurry is coated on hot substrate, is heated.
Preferably, the temperature of the sintering is 800~1000 DEG C, and soaking time is 10~30min.
The present invention separately provides a kind of water-base magnetic rheology polishing liquid, the component including following mass parts: micron order magnetism is multiple
Close 20~40 parts of abrasive material, 3~10 parts of surfactant, 2~5 parts of stabilizer, 2~5 parts and 50~70 parts of water of defoaming agent；
The micron order magnetic coupling abrasive material is micron order magnetic coupling abrasive material or above-mentioned skill described in above-mentioned technical proposal
The micron order magnetic coupling abrasive material that preparation method described in art scheme is prepared.
Preferably, the surfactant include one of glycerine, polyethylene glycol and alkyl phenol polyoxyethylene ether or
It is several；
The stabilizer includes organic amine and carbonate；
The defoaming agent includes paraffin.
Micron order magnetic coupling abrasive material provided by the invention, the raw material including following mass parts: 5~15 parts of bortz powder,
25~35 parts of magnetic powder, 8~28 parts of silica 1,30~40 parts of boron oxide, 10~20 parts and 5~10 parts of calcium oxide of zinc oxide.This
Diamond, magnetic powder, silica, boron oxide, zinc oxide and calcium oxide are used in compounding by invention according to above-mentioned dosage, in titanium dioxide
Under the action of silicon, boron oxide, zinc oxide and calcium oxide, diamond can be evenly dispersed, and can preferably bond with magnetic powder, into
And there is high rigidity and magnetic abrasive compound simultaneously, after gained abrasive compound is used in water-base magnetic rheology polishing liquid,
Abrasive compound can carry out high-speed motion under magnetic fields, the bortz powder and workpiece sample table in motion process, in abrasive compound
Face contact polishes workpiece；And micron-sized particle, then it can increase the action intensity between abrasive material and workpiece, improve and throw
Light efficiency.Embodiment the result shows that, using this programme provide micron order magnetic coupling abrasive material glass specimen is polished,
The roughness for the sheet glass that surface roughness is 100nm can be reduced to 1nm hereinafter, polishing efficiency has obviously in 25min
It is promoted.
Specific embodiment
The present invention provides a kind of micron order magnetic coupling abrasive material, the raw material including following mass parts: bortz powder 5~15
Part, 25~35 parts of magnetic powder, 8~28 parts of silica 1,30~40 parts of boron oxide, 10~20 parts of zinc oxide and calcium oxide 5~10
Part.
In terms of mass parts, the raw material of micron order magnetic coupling abrasive material provided by the invention includes 5~15 parts of bortz powder, excellent
6~13 parts are selected as, is further preferably 7~12 parts.In the present invention, the material of the bortz powder is preferably single-crystal diamond
And/or polycrystalline diamond, when the bortz powder is the mixture of two kinds of materials, the present invention is to each component in the mixture
Content ratio does not have particular/special requirement.In the present invention, the partial size of the bortz powder is preferably 1~3 μm, and more preferably 1~2 μm.
On the basis of the mass parts of the bortz powder, the raw material of micron order magnetic coupling abrasive material of the present invention includes magnetic
25~35 parts of powder, preferably 25~34 parts are further preferably 25~32 parts.In the present invention, the magnetic powder preferably include carbonyl iron,
One or more of ferroso-ferric oxide and nickel, more preferably ferroso-ferric oxide；It is also preferable to include di-iron trioxides for the magnetic powder.
In the present invention, when the magnetic powder is the mixture of several components, the present invention does not have the mass ratio of each component in the mixture
There is particular/special requirement.The present invention preferably adds di-iron trioxide in magnetic powder, can promote the dispersion and combination of magnetic powder and diamond, right
It is advantageous to obtain the stable abrasive compound of performance.
On the basis of the mass parts of the bortz powder, the raw material of micron order magnetic coupling abrasive material of the present invention includes two
18~28 parts of silica, preferably 19~27 parts are further preferably 20~26 parts.Silica of the present invention is preferably that gas phase is heavy
Product silica, purity is preferably 99.5% or more.
On the basis of the mass parts of the bortz powder, the raw material of institute's art micron order magnetic coupling abrasive material of the present invention includes oxygen
Change 30~40 parts of boron, preferably 31~39 parts, be further preferably 32~38 parts.
On the basis of the mass parts of the bortz powder, the raw material of micron order magnetic coupling abrasive material of the present invention includes oxygen
Change 10~20 parts of zinc, preferably 12~19 parts, be further preferably 13~18 parts.
On the basis of the mass parts of the bortz powder, the raw material of micron order magnetic coupling abrasive material of the present invention includes oxygen
Change 5~10 parts of calcium, preferably 6~9 parts, be further preferably 7~8 parts.
The present invention, for main functional material, utilizes silica, boron oxide, zinc oxide and oxidation with magnetic powder and bortz powder
Calcium makes magnetic powder and bortz powder composite integrated, can not only prevent the reunion of bortz powder and magnetic powder, moreover it is possible to improve between the two
Combination, to be firmly combined, performance it is stable, and there is magnetic and polishing performance abrasive compound to provide advantageous item simultaneously
Part.
In the present invention, the partial size of the micron order magnetic coupling abrasive material is preferably 150~180 μm, more preferably 160~
170μm.The present invention further can guarantee abrasive compound suspension preferably by the size controlling of abrasive compound in above range
On the basis of energy, the partial size of particulate material is made to reach maximization, is conducive to the machinability for improving abrasive compound, preparation is thrown
The preferable water-base magnetic rheology polishing liquid of optical property is advantageous.
The present invention provides the preparation methods of the micron order magnetic coupling abrasive material described in above-mentioned technical proposal, including following step
It is rapid:
The raw material of the micron order magnetic coupling abrasive material is mixed with water, obtains slurry；
The slurry is solidified, blank is obtained；
The blank is successively sintered and fragmentation, micron order magnetic coupling abrasive material is obtained.
The present invention mixes the raw material of the micron order magnetic coupling abrasive material with water, obtains slurry.In the present invention, described
The gross mass of raw material and the mass ratio of water are preferably 7: (2~4), more preferably 7: (2.5~3.5) are further preferably 7: 3.This hair
The bright hybrid mode to the raw material and water does not have particular/special requirement, using mode well known to those skilled in the art.
After obtaining slurry, the slurry is dried the present invention, obtains blank.In the present invention, the side of the drying
Formula is preferably dried, and the mode of the drying is preferred are as follows: the slurry is coated on hot substrate, is heated.The present invention is to institute
The material for stating hot substrate does not have particular/special requirement, is resistant to 100 DEG C of high temperature.In the specific embodiment of the invention, the substrate
Preferably stainless steel plate.In the present invention, the temperature of the hot substrate is preferably 60~80 DEG C, more preferably 65~75 DEG C, is added
The time of heat is can make the water removal in the slurry being coated on hot substrate.
After drying, the present invention preferably removes substrate, obtains sintered blank.Removing method of the present invention to the substrate
There is no particular/special requirement, using mode known to skilled person.
After obtaining blank, the blank is successively sintered and fragmentation by the present invention, obtains micron order magnetic coupling abrasive material.
In the present invention, the sintering preferably carries out under vacuum conditions, such as is sintered using vacuum drying oven.In the present invention, institute
The temperature for stating sintering is preferably 800~1000 DEG C, and more preferably 820~970 DEG C, be further preferably 830~950 DEG C；Soaking time
Preferably 10~30min, more preferably 15~28min.In the present invention, the sintering temperature preferably uses 5~10 DEG C/min
Heating rate reach, more preferably 6~8 DEG C/min；In sintering process, vacuum degree is preferably controlled in≤20Pa, more preferably 1
~20Pa；After the completion of sintering, it is preferred to use the mode of furnace cooling cools down, to avoid outside air or vapor to the shadow of material
It rings.
After cooling, the present invention carries out fragmentation to the material after cooling, and the fragmentation carries out preferably in fragmentation machine.This
Invention does not have particular/special requirement to the design parameter of the fragmentation, using well known to those skilled in the art.After fragmentation, this hair
It is bright that the material progress ball milling after fragmentation is preferably improved into the qualification rate of material so that the material particular diameter after fragmentation homogenizes.Ball milling
Afterwards, the material after the ball milling is sieved by the present invention, and sieve mesh number is can obtain micron order (such as 150~180 μm)
Particulate material, screenings are required micron order magnetic coupling abrasive material.
The present invention separately provides a kind of water-base magnetic rheology polishing liquid, the component including following mass parts: micron order magnetism is multiple
Close 20~40 parts of abrasive material, 3~10 parts of surfactant, 2~5 parts of stabilizer, 2~5 parts and 50~70 parts of water of defoaming agent；
The micron order magnetic coupling abrasive material is micron order magnetic coupling abrasive material or above-mentioned skill described in above-mentioned technical proposal
The micron order magnetic coupling abrasive material that preparation method described in art scheme is prepared.
In terms of mass parts, water-base magnetic rheology polishing liquid of the present invention includes 20~40 parts of micron order magnetic coupling abrasive material,
Preferably 21~39 parts, be further preferably 24~38 parts.
On the basis of the mass parts of the micron order magnetic coupling abrasive material, water-base magnetic rheology polishing liquid of the present invention includes
3~10 parts of surfactant, preferably 4~9 parts are further preferably 5~8 parts.In the present invention, the surfactant preferably wraps
Include one or more of glycerine, polyethylene glycol and alkyl phenol polyoxyethylene ether, more preferably glycerine, polyethylene glycol or alkane
Base phenol polyethenoxy ether；When the surfactant is the mixture of several components, the present invention is to each group in the mixture
The mass ratio divided does not have particular/special requirement.
On the basis of the mass parts of the micron order magnetic coupling abrasive material, water-base magnetic rheology polishing liquid of the present invention includes
2~5 parts of stabilizer, preferably 2.5~4.5 parts are further preferably 3~4 parts.In the present invention, the stabilizer is preferably surrounded by machine
Amine and carbonate；The organic amine preferably includes ethylenediamine and/or triethylamine；Carbonate preferably includes sodium carbonate and/or carbonic acid
Potassium, more preferably sodium carbonate；When organic amine or carbonate are the mixture of two kinds of components, the present invention is in two class mixtures
The mass ratio of each component does not have particular/special requirement.
On the basis of the mass parts of the micron order magnetic coupling abrasive material, water-base magnetic rheology polishing liquid of the present invention includes
2~5 parts of defoaming agent, preferably 2.5~4.5 parts are further preferably 3~4 parts.In the present invention, the defoaming agent preferably includes stone
Wax.
On the basis of the mass parts of the micron order magnetic coupling abrasive material, water-base magnetic rheology polishing liquid of the present invention includes
50~70 parts of water, preferably 52~68 parts are further preferably 54~65 parts.
The present invention improves the outstanding of micron order magnetic coupling abrasive material using water as decentralized medium, using surfactant and stabilizer
Buoyancy energy has excellent stability gained water-base magnetic rheology polishing liquid and rheological property, is micron order magnetic coupling abrasive material
It plays rheological property and polishing performance provides necessary condition.
The present invention does not have particular/special requirement to the preparation method of the water-base magnetic rheology polishing liquid, preferably mixes each component,
It stirs evenly.In specific implementation process of the present invention, preferably micron order magnetic coupling abrasive material is mixed with stabilizer and water,
Then it is mixed again with surfactant and defoaming agent.
In order to further illustrate the present invention, below with reference to embodiment to micron order magnetic coupling abrasive material provided by the invention and
Water-base magnetic rheology polishing liquid is described in detail, but they cannot be interpreted as limiting the scope of the present invention.
Part refers to mass parts in the substance dosage of following embodiment.
Embodiment 1
Bortz powder (monocrystalline), magnetic powder (ferroso-ferric oxide), silicon dioxide powder, boron oxide, zinc oxide and calcium oxide is mixed
It closes, is mixed after ball milling with water, gained slurry is subjected to ball milling, is then transferred to on flat plate heat (60 DEG C of stainless steel plates), is dried,
Blank is obtained after separation；Gained blank is placed in crucible, is placed into vacuum drying oven, is evacuated to 20Pa hereinafter, then carrying out
Temperature programming, control heating rate are 6 DEG C/min, are warming up to 900 DEG C, keep the temperature 15min, stop heat preservation, furnace cooling is burnt
Ramming material；
Fragmentation is carried out to gained sintering feed using crusher, is sieved with 100 mesh sieve, screenings is required micron order magnetic coupling
Abrasive material (abbreviation magnetic-particle).
By 30 parts of magnetic-particle, 4 parts of polyethylene glycol, 2 parts of paraffin, 3 parts of sodium carbonate, 61 parts of water after mixing, in 800r/
10min is stirred under conditions of min, obtains water-base magnetic rheology polishing liquid.
Embodiment 2
The magnetic-particle being prepared using embodiment 1, the difference is that each component of water-base magnetic rheology polishing liquid
Type and dosage difference, specific as follows:
By 25 parts of magnetic-particle, 5 parts of glycerine, 2 parts of paraffin, 4 parts of sodium bicarbonate, 64 parts of water after mixing, obtains water
Based magnetic rheologic polishing fluid.
Embodiment 3
The magnetic-particle being prepared using embodiment 1, the difference is that each component of water-base magnetic rheology polishing liquid
Type and dosage difference, specific as follows:
By 37 parts of magnetic-particle, 7 parts of alkyl phenol polyoxyethylene ether, 2.5 parts of paraffin, 3 parts of sodium carbonate, 50.5 parts of water mixing are equal
After even, 20min is stirred under the conditions of 800r/min, obtains water-base magnetic rheology polishing liquid.
Embodiment 4~5
Magnetic-particle is prepared in the way of embodiment 1, the difference is that raw material components, dosage and preparation process are not
Together, wherein the magnetic powder of embodiment 4 is the mixture of the mass ratioes such as iron powder, nickel powder and ferroso-ferric oxide；The magnetic powder of embodiment 5 is
The mixture that ferroso-ferric oxide and di-iron trioxide are made into according to 4: 1 mass ratioes.The specific dosage of each component is listed in Table 1 below.
The preparation method is the same as that of Example 1 for water-base magnetic rheology polishing liquid.
The raw material and preparation process of 1 embodiment 1,4 of table and 5 micron order magnetic coupling abrasive materials
Comparative example 1
By 25 parts of ferroso-ferric oxide (1 μm), 10 parts of bortz powder (partial size be 0.8 μm), 4 parts of polyethylene glycol, 2 parts of paraffin,
3 parts of sodium carbonate, 56 parts of water after mixing, stirs 10min under conditions of 800r/min, obtains water-base magnetic rheology polishing liquid.
The performance characterization and result of water-base magnetic rheology polishing liquid
(1) 1 gained water-base magnetic rheology polishing liquid of NDJ-1 type rotational viscometer testing example 1~5 and comparative example is utilized
Viscosity performance, for characterizing the rheological characteristic of polishing fluid, characterization result is listed in table 2 (the 2nd row)；
(2) Examples 1 to 5 and 1 gained water-base magnetic rheology polishing liquid of comparative example are stood into 72h, sees whether to be layered or has
Precipitating, for characterizing the stability of polishing fluid, characterization result is listed in table 2 (the 3rd row)；
(3) polishing performance of 1 gained water-base magnetic rheology polishing liquid of testing example 1~5 and comparative example as follows:
To be process object with a batch of 6 blocks of sheet glass, (250mT) is polished under identical magnetic fields, is surveyed every 5min
The roughness of sheet glass is reduced to 1nm the following are up to standard by the polishing effect for trying sheet glass, record the required time up to standard and
The roughness of sheet glass, test result are listed in table 2 (the 4th and 5 row)；
(4) Examples 1 to 5 and 1 gained water dispenser Magnetorheologicai polishing liquid of comparative example are subjected to centrifugal test in centrifuge,
It is centrifuged 20min under 1000r/min revolving speed, then stirs, carries out above-mentioned polishing test after uniformly.When test, when control polishes
Between be reaching standard time, the roughness of sheet glass is then tested, when the roughness of sheet glass is equal to or less than corresponding test knot in (3)
When fruit, it is considered as no influence, when roughness is more than to correspond to test result in (3), is considered as polishing effect reduction.For example, embodiment 1
The roughness of sheet glass can be reduced to 0.9nm in 25min by polishing fluid, after carrying out centrifugal test, be carried out under the same conditions
Polishing test, can be reduced to≤0.9nm for the roughness of sheet glass, then is considered as centrifugation to the performance of polishing fluid without influence, conversely,
It is considered as the reduced performance of polishing fluid.Test result is listed in table 2 (the 6th row).
The performance test results of 1 water-base magnetic rheology polishing liquid of 2 Examples 1 to 5 of table and comparative example
By the test result of table 2 it is found that micron order magnetic coupling abrasive material provided by the invention is used to prepare water-base magnetic rheology
When polishing fluid, viscosity performance is consistent with the viscosity of water-base magnetic rheology polishing liquid prepared by conventional method, illustrates provided by the invention
Scheme maintains the rheological property of material, can be used as polishing fluid use；And the roughness of sheet glass can be dropped in 25min
Down to achievement level, for the 35min that traditional polishing fluid uses, polishing efficiency, which has, to be obviously improved.In addition, of the invention
The water-base magnetic rheology polishing liquid of offer stand 72h it is not stratified, without precipitating, after centrifugal test, polishing performance is substantially unchanged, explanation
The stability of polishing fluid is good, can use for a long time.
As seen from the above embodiment, micron order magnetic composite provided by the invention is on the basis of influencing magnetism,
Make material that there is polishing performance, for the polishing fluid that tradition is simply mixed, the stability of polishing performance is more preferable.
Traditional water-base magnetic rheology polishing liquid needs to mix polishing material and magnetic material uniformly to polishing material
Partial size carries out strict control, needs using the polishing material compared with small particle, to ensure polishing material proper motion in rheological body,
It contacts polishing material with workpiece surface, plays the polishing function of material.The present invention is then to answer polishing material and magnetic material
It is integrated, solves motion problems of the polishing material in magnetic fluid, the partial size of magnetic material can be magnified in this way, and
The magnetism expanded-polishing composite material also increases the active force of workpiece, and therefore, polishing efficiency gets a promotion.
Although above-described embodiment is made that detailed description to the present invention, it is only a part of the embodiment of the present invention,
Rather than whole embodiments, people can also obtain other embodiments under the premise of without creativeness according to the present embodiment, these
Embodiment belongs to the scope of the present invention.
Claims (10)
1. a kind of micron order magnetic coupling abrasive material, the raw material including following mass parts: 5~15 parts of bortz powder, magnetic powder 25~35
Part, 8~28 parts of silica 1,30~40 parts of boron oxide, 10~20 parts and 5~10 parts of calcium oxide of zinc oxide.
2. micron order magnetic coupling abrasive material as described in claim 1, which is characterized in that the micron order magnetic coupling abrasive material
Partial size is 150~180 μm.
3. micron order magnetic coupling abrasive material as claimed in claim 1 or 2, which is characterized in that the material of the bortz powder is
Single-crystal diamond and/or polycrystalline diamond.
4. micron order magnetic coupling abrasive material as described in claim 1, which is characterized in that the magnetic powder includes carbonyl iron, four oxygen
Change one or more of three-iron and nickel.
5. micron order magnetic coupling abrasive material as claimed in claim 4, which is characterized in that the magnetic powder further includes three oxidations two
Iron.
6. the preparation method of the described in any item micron order magnetic coupling abrasive materials of Claims 1 to 5, comprising the following steps:
The raw material of the micron order magnetic coupling abrasive material is mixed with water, obtains slurry；
The slurry is solidified, blank is obtained；
The blank is successively sintered and fragmentation, micron order magnetic coupling abrasive material is obtained.
7. preparation method as claimed in claim 6, which is characterized in that the cured mode includes:
The slurry is coated on hot substrate, is heated.
8. preparation method as claimed in claims 6 or 7, which is characterized in that the temperature of the sintering is 800~1000 DEG C, is protected
The warm time is 10~30min.
9. a kind of water-base magnetic rheology polishing liquid, the component including following mass parts: 20~40 parts of micron order magnetic coupling abrasive material, table
3~10 parts of face activating agent, 2~5 parts of stabilizer, 2~5 parts and 50~70 parts of water of defoaming agent；
The micron order magnetic coupling abrasive material is the described in any item micron order magnetic coupling abrasive materials of claim 1~6 or right
It is required that the micron order magnetic coupling abrasive material that 7 or 8 preparation methods are prepared.
10. water-base magnetic rheology polishing liquid as claimed in claim 9, which is characterized in that the surfactant include glycerine,
One or more of polyethylene glycol and alkyl phenol polyoxyethylene ether；
The stabilizer includes organic amine and carbonate；
The defoaming agent includes paraffin.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110628385A (en) * | 2019-10-24 | 2019-12-31 | 清远市简一陶瓷有限公司 | Composite diamond particles for magnetorheological polishing and preparation method thereof |
| CN112760040A (en) * | 2020-12-08 | 2021-05-07 | 杭州电子科技大学 | Magnetic polishing solution suitable for die-casting aluminum alloy material and preparation method thereof |
| CN113150695A (en) * | 2020-12-31 | 2021-07-23 | 广东电网有限责任公司电力科学研究院 | Environment-friendly stainless steel polishing solution |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1359322A (en) * | 1999-07-09 | 2002-07-17 | 3M创新有限公司 | Metal bond abrasive article comprising porous ceramic abrasive composites and method of using same to abrade a workpiece |
| CN105856089A (en) * | 2016-06-01 | 2016-08-17 | 东莞市中微纳米科技有限公司 | Grinding composite body and preparation method thereof |
| CN105856078A (en) * | 2016-04-19 | 2016-08-17 | 南京航空航天大学 | Preparation method and use of self-sharpening sintered abrasive material |
| CN107245301A (en) * | 2017-06-14 | 2017-10-13 | 合肥市惠科精密模具有限公司 | A kind of efficient polishing fluid for TFT LCD glass substrates |
| CN108148505A (en) * | 2016-12-06 | 2018-06-12 | 江苏天超细金属粉末有限公司 | A kind of manufacturing method of Magnetorheological Polishing compound particle |
-
2019
- 2019-05-09 CN CN201910383451.0A patent/CN110016322A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1359322A (en) * | 1999-07-09 | 2002-07-17 | 3M创新有限公司 | Metal bond abrasive article comprising porous ceramic abrasive composites and method of using same to abrade a workpiece |
| CN105856078A (en) * | 2016-04-19 | 2016-08-17 | 南京航空航天大学 | Preparation method and use of self-sharpening sintered abrasive material |
| CN105856089A (en) * | 2016-06-01 | 2016-08-17 | 东莞市中微纳米科技有限公司 | Grinding composite body and preparation method thereof |
| CN108148505A (en) * | 2016-12-06 | 2018-06-12 | 江苏天超细金属粉末有限公司 | A kind of manufacturing method of Magnetorheological Polishing compound particle |
| CN107245301A (en) * | 2017-06-14 | 2017-10-13 | 合肥市惠科精密模具有限公司 | A kind of efficient polishing fluid for TFT LCD glass substrates |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110628385A (en) * | 2019-10-24 | 2019-12-31 | 清远市简一陶瓷有限公司 | Composite diamond particles for magnetorheological polishing and preparation method thereof |
| CN112760040A (en) * | 2020-12-08 | 2021-05-07 | 杭州电子科技大学 | Magnetic polishing solution suitable for die-casting aluminum alloy material and preparation method thereof |
| CN113150695A (en) * | 2020-12-31 | 2021-07-23 | 广东电网有限责任公司电力科学研究院 | Environment-friendly stainless steel polishing solution |
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