CN110000211A - Target milling method - Google Patents
Target milling method Download PDFInfo
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- CN110000211A CN110000211A CN201810011222.1A CN201810011222A CN110000211A CN 110000211 A CN110000211 A CN 110000211A CN 201810011222 A CN201810011222 A CN 201810011222A CN 110000211 A CN110000211 A CN 110000211A
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- 238000003801 milling Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 79
- 238000003490 calendering Methods 0.000 claims abstract description 77
- 230000008569 process Effects 0.000 claims abstract description 71
- 238000010438 heat treatment Methods 0.000 claims abstract description 41
- 238000005096 rolling process Methods 0.000 claims abstract description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 16
- 239000007789 gas Substances 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 16
- 229910052786 argon Inorganic materials 0.000 claims description 8
- 229910052727 yttrium Inorganic materials 0.000 claims description 8
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 7
- 229910000695 Aluminium-scandium alloy Inorganic materials 0.000 claims description 6
- 229910052706 scandium Inorganic materials 0.000 claims description 3
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 abstract description 18
- 230000000694 effects Effects 0.000 description 9
- 238000003466 welding Methods 0.000 description 8
- 208000037656 Respiratory Sounds Diseases 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000011112 process operation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/02—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
- B21B1/026—Rolling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
- B21B1/02—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
- B21B1/06—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing in a non-continuous process, e.g. triplet mill, reversing mill
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B45/00—Devices for surface or other treatment of work, specially combined with or arranged in, or specially adapted for use in connection with, metal-rolling mills
- B21B45/004—Heating the product
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21B—ROLLING OF METAL
- B21B3/00—Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
- B21B2003/001—Aluminium or its alloys
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A kind of target milling method, comprising: target blank is provided；The target blank is heated to the first temperature；After the target blank is heated to the first temperature, calendering process is carried out to the target blank；During the calendering process, when the target blank temperature is reduced to second temperature, target blank is heated, carries out the calendering process after the target blank is heated to the first temperature；The alternately described heat treatment and the calendering process, until target is made in the target blank.It is cracked during carrying out the calendering process that the present invention can prevent the target blank, so that the rolling quality of the target can be improved, improves the sputtering performance of the target.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors more particularly to a kind of target milling methods.
Background technique
Sputter coating is belonged to physical gas-phase deposite method and prepares one of technique of film, in particular to banged using high energy particle
Target material surface is hit, so that target atom or molecule obtain enough energy evolutions, and substrate or workpiece surface are deposited on, thus shape
At film.
Target can be divided into semiconductor field application target, recording medium target, display film according to the difference of the application
With target, optics target, superconducting target etc..Wherein semiconductor field application target, recording medium target and display target are
The maximum three classes target of market scale.
Using high purity metal as raw material, the techniques such as forged, rolling, heat treatment and machining make described high-purity target
The reduction of metal inside crystallite dimension, consistency increase are spent, to form the satisfactory target of sputtering performance.The sputtering of target
The mechanical property of plated film can be restrict, coating quality is influenced.
However, the sputtering performance of existing target is to be improved.
Summary of the invention
Problems solved by the invention is to provide a kind of target milling method, can prevent the target blank described in the progress
It is cracked during calendering process, so that the rolling quality of the target can be improved, improve the sputtering performance of the target.
To solve the above problems, the present invention provides a kind of target milling method, comprising: provide target blank；By the target
Material blank heating is to the first temperature；After the target blank is heated to the first temperature, the target blank is rolled
Processing；During the calendering process, when the target blank temperature is reduced to second temperature, target blank is added
Heat treatment, carries out the calendering process after the target blank is heated to the first temperature；Alternately it is described heat treatment and
The calendering process, until target is made in the target blank.
Optionally, first temperature is 850 DEG C~950 DEG C.
Optionally, the second temperature is 700 DEG C~800 DEG C.
Optionally, the number of the heat treatment is greater than or equal to 2, and is less than or equal to 8.
Optionally, calendering process described in single includes that the rolling of at least two passages is carried out to the target blank.
Optionally, after carrying out single passes to the target blank, the thickness deformation rate of the target blank is
4%~6%.
Optionally, the shape of the target blank provided is cuboid, and length is 100mm~400mm, width 50mm
~300mm is highly 20mm~40mm.
Optionally, the method heated to the target blank includes: offer constant temperature oven, by the target blank
It is placed in the constant temperature oven and heats；The target blank is being carried out to be passed through protection in Xiang Suoshu constant temperature oven in heating process
Gas.
Optionally, the protective gas includes argon gas, and the mass percent of the argon gas is greater than or equal to 99.9993%.
Optionally, the time of heat treatment described in single is 15min~180min.
Optionally, the material of the target blank is metallic yttrium, and the purity of the metallic yttrium is greater than or equal to 99.9%.
Optionally, the material of the target blank is aluminium-scandium alloy, in the aluminium-scandium alloy, the mass percent of scandium element
It is 5%~15%.
Compared with prior art, technical solution of the present invention has the advantage that
In the technical solution of target milling method provided by the invention, target blank is heated to the first temperature first；So
Calendering process is carried out to the target blank afterwards；During the calendering process, when the target blank temperature is reduced to
When two temperature, target blank is heated, is carried out at the calendering after the target blank is heated to the first temperature
Reason；The alternately described heat treatment and the calendering process, until target is made in the target blank.By to the target
The alternately described heat treatment of material blank and the calendering process, make during the calendering process, the target blank
Temperature be between first temperature and second temperature, to guarantee the target blank during calendering process
Hardness is appropriate, is conducive to avoid the target blank cracked, to improve the rolling quality of the target, improves the target
The sputtering performance of material.
In optinal plan, first temperature is 850 DEG C~950 DEG C, and first temperature is appropriate, facilitates described in reduction
The hardness of target blank, improves the plasticity of the target blank, to reduce the target blank in subsequent calendering process mistake
Cracked probability in journey；And it can be avoided that the target blank is excessively soft to cause the calendering process operation difficulty big.
In optinal plan, the second temperature is 700 DEG C~800 DEG C, during the calendering process, with the target
Material blank is reduced to second temperature by first temperature, and the hardness of the target blank gradually increases, and the second temperature is suitable
When, with the target blank hardness become it is excessive before suspend the calendering process in time, help avoid the target blank
It is cracked during the calendering process, in addition, the second temperature suitably helps to ensure that each area of the target blank
The calendering effect that domain is subject to is uniform, so as to improve the target being subsequently formed internal structure uniformity.
In optinal plan, the number of the heat treatment is greater than or equal to 2, and is less than or equal to 8, by the target blank
Before target is made, the heat treatment number for being subject to the target blank is appropriate, helps to ensure that the target blank exists
Hardness is appropriate during the calendering process, to reduce the cracked risk of the target blank；In addition, at the heating
Reason number is appropriate, advantageously reduces the probability that oxidation reaction occurs for the target blank surface described in the heat-treatment process,
To which the purity for the target being subsequently formed can be improved.
In optinal plan, calendering process described in single includes that the rolling of at least two passages is carried out to the target blank,
Each region of the target blank is helped to ensure that by uniform calendering effect, so as to improve the internal junction for the target being subsequently formed
The uniformity of structure.
In optinal plan, after carrying out single passes to the target blank, the thickness deformation of the target blank
Rate is 4%~6%, and the thickness deformation rate of the target blank is appropriate, to prevent the plastic history mistake of the target blank
In strong, to avoid the target blank cracked during the calendering process；And help to ensure that the pressure
Prolong processing to the thinning effect of crystal grain in target blank, so as to improve film of the target being subsequently formed in sputter coating
Deposition rate；In addition, the thickness deformation rate of the target blank suitably facilitates to improve the interior tissue of target blank, target is reduced
Defect existing for material blank interior tissue, improves the mechanical property for the target being subsequently formed.
In optinal plan, the time of heat treatment described in single is 15min~180min, makes the heat treatment each time
Time it is appropriate, help to prevent the grain growth in the target blank, to avoid crystallite dimension is excessive from leading to subsequent shape
At target coated film deposition rate it is low；And it advantageously ensures that the target blank is integrally heated evenly, helps to prevent institute
It is cracked during the calendering process to state target blank.
Detailed description of the invention
Fig. 1 to Fig. 4 is the corresponding structural schematic diagram of each step of target milling method that one embodiment of the invention provides.
Specific embodiment
It can be seen from background technology that the sputtering performance of existing target is still to be improved.
It is analyzed now in conjunction with a kind of target milling method, the processing step of the target milling method, which specifically includes that, to be mentioned
For target blank；The target blank is heated；After heating to the target blank, to the target
Blank carries out calendering process, until target is made in the target blank.
The sputtering performance of the target of above method rolling is poor, analyzes its reason and is: although the heat treatment energy
The hardness of the target blank is enough reduced, but during the calendering process, as the temperature of the target blank gradually drops
Low, the hardness of the target blank gradually increases, and the target blank is caused to be easy to appear during the calendering process
Crackle influences the rolling quality of the target blank, causes the sputtering performance of the target poor.
For this purpose, the present invention provides a kind of target milling method, comprising: provide target blank；The target blank is heated
To the first temperature；After the target blank is heated to the first temperature, calendering process is carried out to the target blank；Described
During calendering process, when the target blank temperature is reduced to second temperature, target blank is heated, by institute
It states after target blank is heated to the first temperature and carries out the calendering process；At the alternately described heat treatment and the calendering
Reason, until target is made in the target blank.
The target blank is alternately heated and calendering process, is made during the calendering process, it is described
The temperature of target blank is between first temperature and second temperature, to guarantee the target blank at the calendering
Hardness is appropriate during reason, helps avoid that the target blank is cracked, to improve the rolling quality of the target, changes
It is apt to the sputtering performance of the target.
To make the above purposes, features and advantages of the invention more obvious and understandable, with reference to the accompanying drawing to the present invention
Specific embodiment be described in detail.
Fig. 1 to Fig. 4 is the corresponding structural schematic diagram of each step of target milling method that one embodiment of the invention provides.
With reference to Fig. 1, target blank 100 is provided.
In the present embodiment, the shape of the target blank 100 is cuboid.Specifically, the length of the target blank 100
L1 is 100mm~400mm；Width L2 is 50mm~300mm；The height of the target blank 100 is the target blank 100
Thickness H, be 20mm~40mm.In other embodiments, the shape of the target blank can also for square, it is cylindric or
Irregular shape.
One bottom surface of the target blank 100 is sputter face 110, and another bottom surface opposite with the sputter face 110 is weldering
Junction (not shown).In the present embodiment, the direction of the thickness H of the target blank 100 perpendicular to the sputter face 110 and
Welding surface.
In the present embodiment, the material of the target blank 100 is metallic yttrium, and the purity of the metallic yttrium is greater than or equal to
99.9%.Wherein, the purity of the metallic yttrium is mass percent of the yttrium in 100 material of target blank.At it
In his embodiment, the material of the target blank can also be aluminium-scandium alloy, the quality percentage of scandium element in the aluminium-scandium alloy
Than being 5%~15%.
With reference to Fig. 2, the target blank 100 is heated to the first temperature.
The target blank 100 is heated, the target blank 100 is heated to the first temperature, to make
The hardness of the target blank 100 is appropriate, is conducive to subsequent to the target blank 100 progress calendering process.In addition, described
In heat-treatment process, the surface of metal particles in the target blank 100 is by uniform surface tension, the metallic particles
Between gap be gradually reduced by shapes such as diamond shape, wedge angle types to circle, circular gap can make in the target blank 100
Portion's homogeneous grain size helps to improve the uniformity of 100 internal structure of target blank, so as to improve the target being subsequently formed
The sputtering performance of material.
In the present embodiment, the method heated to the target blank 100 includes: to provide constant temperature oven 200, described
Temperature in constant temperature oven 200 is equal to first temperature, and the target blank 100 is placed in the constant temperature oven 200 and is heated；
The target blank 100 is being carried out to be passed through protective gas in Xiang Suoshu constant temperature oven 200 in heating process.
The effect of the protective gas be prevent in particular during a heating process 100 surface of target blank be oxidized, have
Help improve the purity of the target blank 100.If not being passed through the protective gas, since the temperature of the heat treatment is high,
100 surface of target blank is easy to chemically react with the oxygen in air, leads to 100 surfacing of target blank
It is interior mixed with oxygen element impurity, cause the purity of the target blank 100 low.In the present embodiment, the protective gas includes argon gas.
If the mass percent of the argon gas is too low, influences the argon gas and the protection on 100 surface of target blank is imitated
Fruit, so that 100 surface of the target blank is oxidized easily；In the present embodiment, the mass percent of the argon gas is greater than or waits
In 99.9993%.
If first temperature is too low, after the heat treatment, the hardness of the target blank 100 is big, subsequent
Calendering process is carried out to the target blank 100, the target blank 100 is easy to appear crackle.If first temperature is excessively high,
Then after the heat treatment, the target blank 100 is excessively soft, causes subsequent to carry out at calendering the target blank 100
The operation difficulty of reason is big.In the present embodiment, first temperature is 850 DEG C~950 DEG C.
If the heating treatment time is too long, the crystal grain in 100 material of target blank is easy growth, leads to the crystalline substance
Particle size is excessive, causes film deposition rate of the target being subsequently formed in sputter coating too low；If when the heat treatment
Between it is too short, the whole uneven heating of the target blank 100 is even, and surface and internal temperature difference are big, subsequent to the target blank
100 carry out calendering process, and the target blank 100 is easy to appear crack.In the present embodiment, the heating treatment time is
15min~180min.
With reference to Fig. 3 and Fig. 4, after the target blank 100 is heated to the first temperature, to the target blank 100 into
Row calendering process；During the calendering process, when 100 temperature of target blank is reduced to second temperature, to target
Blank 100 is heated, and carries out the calendering process after the target blank 100 is heated to the first temperature；Alternately into
The row heat treatment and the calendering process, until target is made in the target blank 100.
The effect of the calendering process including the following three aspects: on the one hand, the calendering process can refine target base
Expect the crystal grain in 100 materials, reduce the crystallite dimension, it is thin in sputter coating to be conducive to the target that raising is subsequently formed
Film deposition rate；On the other hand, the calendering process can eliminate the defect of 100 interior tissue of target blank, make described
100 dense internal organization of target blank facilitates the mechanical property for improving the target blank 100；In addition, at the calendering
Reason can also reduce the thickness H (with reference to Fig. 1) of the target blank 100, increase the target blank 100 sputter face 110 and
The area of welding surface, so that carrying out finishing for the subsequent target to formation provides machining allowance.
During the calendering process, the temperature of the target blank 100 is gradually decreased, with the target blank
100 temperature reduces, and the hardness of the target blank 100 gradually increases, correspondingly, the target blank 100 is cracked
Risk increases.When the temperature of the target blank 100 is reduced to second temperature, suspend the calendering process, again to target
Blank 100 is heated, to improve the hardness of the target blank 100, so that the generation of target blank 100 be avoided to split
Line facilitates the sputtering performance for improving the target being subsequently formed.
If the second temperature is excessively high, the pressure that causes the target blank 100 to be subject between the first temperature and second temperature
Prolong processing the time it is too short, the calendering effect for be easy to causeing each region of the target blank 100 to be subject to is uneven, influences to be subsequently formed
Target rolling quality；If the second temperature is too low, before suspending the calendering process, the target blank 100 it is hard
Degree is gradually increased, and the target blank 100 is caused to be easy to appear crackle.In the present embodiment, the second temperature be 700 DEG C~
800℃。
With reference to Fig. 3, the mode of the calendering process is the roller 310 and roller that the target blank 100 is placed on to calender
It is squeezed between cylinder 320, C1 is 310 direction of advance of roller, and C2 is 320 direction of advance of roller.The roller 310 and roller
320 squeeze the sputter face 110 and welding surface, reduce the thickness H (with reference to Fig. 1) of the target blank 100, and make described splash
The area for penetrating face 110 and welding surface increases.
If the passage for the rolling carried out to target blank 100 that calendering process described in single includes is very few, it is difficult to guarantee institute
Each region of target blank 100 is stated by uniform calendering effect, causes each area uniformity of the target blank 100 poor.This reality
It applies in example, calendering process described in single includes that the rolling of at least two passages is carried out to the target blank.
If before carrying out single passes to the target blank 100, the original depth of the target blank 100 is
H1, after the passes, the target blank 100 with a thickness of h, then single passage is carried out to the target blank 100
After rolling, the thickness deformation rate of the target blank 100 is indicated with △ H1, then △ H1=| h1-h |/h1.
If after carrying out single passes to the target blank 100, the thickness deformation rate mistake of the target blank 100
Greatly, then the target blank 100 is easy to produce crackle in strong plastic history；If to the target blank 100
After carrying out single passes, the thickness deformation rate of the target blank 100 is too small, and the calendering process is to the target blank
The refining effect of crystal grain is weak in 100 materials, causes the crystallite dimension for the target being subsequently formed big, influences the target and plates in sputtering
Film deposition rate when film；In addition, influencing the calendering process pair if the thickness deformation rate of the target blank 100 is too small
The improvement of 100 interior tissue of target blank makes the 100 interior tissue existing defects of target blank.The present embodiment
In, after carrying out single passes to the target blank 100, the thickness deformation rate of the target blank 100 is 4%~
6%.
To keep each region for the target being subsequently formed relatively uniform and consistent, one of progress every to the target blank 100
After secondary rolling, the target blank 100 is rotated so that target blank 100 rotates identical predetermined angular, is then carried out again next
The rolling of passage, wherein the rotary shaft of the rotation process is perpendicular to the sputter face 110 and welding surface.
With reference to Fig. 4,1~4 indicated in Fig. 4 is to set for convenience of explanation to the rotation process that target blank 100 carries out
Fixed label, wherein described 1~4 surrounds the sputter face 110 of the target blank 100；Double-head arrow direction C1C2 is to target base
When material 100 carries out calendering process, the direction of advance of roller 310 and roller 320, single arrow direction A1 is indicated to target blank 100
After carrying out single passes, direction that target blank 100 is rotated.In the present embodiment, to the every progress of target blank 100
After a time rolling, the angle for rotating the target blank 100 is equal to 90 °.For example, before rotation, the target blank 100
On two points be respectively at 1 position and 3 position, then rotation 90 ° after, described two points are in 4 position and 2 position
On the line set.
In the present embodiment, after progress a time rolling every to the target blank 100, the target blank 100 is being rotated
Before, further include overturning the target blank 100, keeps the position of the relatively described welding surface of the sputter face 110 reversed.Citing comes
It says, in a time operation of rolling, the roller 310 squeezes the sputter face 110, and the roller 320 squeezes the welding surface,
Then after completing the passes to target blank 100, the target blank 100 is overturn, makes to carry out down target blank 100
In a time operation of rolling, the roller 310 squeezes the welding surface, and the roller 320 squeezes the sputter face 110.
The roller 310 and roller 320 have difference to the amount of force that target blank 100 applies, and overturn the target
Material blank 100 helps to ensure that on vertical 110 direction of sputter face, the calendering that each region of the target blank 100 is subject to
Effect is consistent, is conducive to the uniformity for further increasing 100 internal structure of target blank.
Before target is made in the target blank 100, if the number mistake of the heat treatment carried out to the target blank 100
More, 100 surface of target blank is easy to happen oxidation reaction, causes 100 material surface of target blank mixed with oxygen element
Impurity influences the purity of the target blank 100；If the number of the heat treatment is very few, it is difficult to guarantee the target blank
100 during calendering process hardness be in proper range, thus the target blank 100 is easy to appear crackle.The present embodiment
In, the number of the heat treatment is greater than or equal to 2, and is less than or equal to 8.
By carrying out heating for multiple times processing to the target blank 100, make the target during calendering process
The temperature of blank 100 is in always between first temperature and second temperature, to guarantee the target blank 100 described
Hardness is appropriate during calendering process, helps to prevent the target blank 100 cracked, to improve rolling for the target
Quality processed.
To sum up, target blank 100 is heated to the first temperature；Calendering process is carried out to the target blank 100；Described
During calendering process, when 100 temperature of target blank is reduced to second temperature, target blank 100 is carried out at heating
Reason, carries out the calendering process after the target blank 100 is heated to the first temperature；The alternately described heat treatment and institute
Calendering process is stated, until target is made in the target blank 100.By adding to the target blank 100 is alternately described
Heat treatment and the calendering process, make during the calendering process, and the temperature of the target blank 100 is in described first
Between temperature and second temperature, to guarantee that the target blank 100 hardness during the calendering process is appropriate, be conducive to keep away
It is cracked to exempt from the target blank 100, to improve the rolling quality of the target, improves the sputtering performance of the target.
Although present disclosure is as above, present invention is not limited to this.Anyone skilled in the art are not departing from this
It in the spirit and scope of invention, can make various changes or modifications, therefore protection scope of the present invention should be with claim institute
Subject to the range of restriction.
Claims (12)
1. a kind of target milling method characterized by comprising
Target blank is provided；
The target blank is heated to the first temperature；
After the target blank is heated to the first temperature, calendering process is carried out to the target blank；
During the calendering process, when the target blank temperature is reduced to second temperature, target blank is added
Heat treatment, carries out the calendering process after the target blank is heated to the first temperature；
The alternately described heat treatment and the calendering process, until target is made in the target blank.
2. target milling method as described in claim 1, which is characterized in that first temperature is 850 DEG C~950 DEG C.
3. target milling method as described in claim 1, which is characterized in that the second temperature is 700 DEG C~800 DEG C.
4. target milling method as described in claim 1, which is characterized in that the number of the heat treatment is greater than or equal to 2,
And it is less than or equal to 8.
5. target milling method as described in claim 1, which is characterized in that calendering process described in single includes to the target
Blank carries out the rolling of at least two passages.
6. target milling method as claimed in claim 5, which is characterized in that rolled carrying out single passage to the target blank
After system, the thickness deformation rate of the target blank is 4%~6%.
7. target milling method as described in claim 1, which is characterized in that the shape of the target blank of offer is rectangular
Body, length are 100mm~400mm, and it is highly 20mm~40mm that width, which is 50mm~300mm,.
8. target milling method as described in claim 1, which is characterized in that the side heated to the target blank
Method includes: offer constant temperature oven, and the target blank is placed in the constant temperature oven and is heated；Add to the target blank
In thermal process, protective gas is passed through in Xiang Suoshu constant temperature oven.
9. target milling method as claimed in claim 8, which is characterized in that the protective gas includes argon gas, the argon gas
Mass percent be greater than or equal to 99.9993%.
10. target milling method as described in claim 1, which is characterized in that the time of heat treatment described in single is 15min
~180min.
11. target milling method as described in claim 1, which is characterized in that the material of the target blank is metallic yttrium, institute
The purity for stating metallic yttrium is greater than or equal to 99.9%.
12. target milling method as described in claim 1, which is characterized in that the material of the target blank is aluminium-scandium alloy,
In the aluminium-scandium alloy, the mass percent of scandium element is 5%~15%.
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