CN109991770A - Display panel and its manufacturing method - Google Patents
Display panel and its manufacturing method Download PDFInfo
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- CN109991770A CN109991770A CN201711477336.7A CN201711477336A CN109991770A CN 109991770 A CN109991770 A CN 109991770A CN 201711477336 A CN201711477336 A CN 201711477336A CN 109991770 A CN109991770 A CN 109991770A
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- groove
- display panel
- frame glue
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- upper substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The invention discloses a kind of display panel and its manufacturing methods.Display panel has active region and peripheral region and includes lower substrate, upper substrate, black-matrix layer, flatness layer and frame glue.Lower substrate is to be arranged oppositely with upper substrate.Black-matrix layer is set on upper substrate, has opening in peripheral region.Flatness layer is set on black-matrix layer and upper substrate and fills up opening, and this flatness layer has groove in peripheral region, this groove is located in peripheral region in the overlook direction of display panel and and superposition of end gap.Frame glue is set between lower substrate and flatness layer, and a part of this frame glue is in the grooves.The thickness of liquid crystal layer can be effectively reduced in the case where maintaining the glue amount of width and fixation of frame glue in the present invention.
Description
Technical field
The present invention relates to a kind of display panels, and more particularly to the manufacturer of a kind of display panel and this display panel
Method.
Background technique
In general, lower substrate (or thin film transistor base plate) and upper substrate (or the colorized optical filtering base of display panel
Plate) be by the frame glue in peripheral region to group to group.In the technique for forming frame glue, the glue amount control of frame glue must be accurate,
If the glue amount to form frame glue can not be controlled effectively, being unevenly distributed for frame glue will be made, it is more serious there may be disconnected glue problem,
Lead to the production yield for reducing display panel.On the other hand, the reaction time of liquid crystal layer is positively correlated with its thickness, if can be into one
Step reduces the thickness of liquid crystal layer, then can correspond to the reaction time for reducing liquid crystal layer.
Summary of the invention
The purpose of the invention is to provide the manufacturing methods of a kind of display panel and this display panel, can maintain frame
The thickness of liquid crystal layer is effectively reduced under the width of glue and the glue amount of fixation, and then shortens the reaction time of liquid crystal layer, while can phase
To the usage amount for reducing liquid crystal, so that liquid crystal also can avoid such as water ripples by can more rapidly return back to script state when extruding
Etc. display problems generation.
Above-mentioned purpose according to the present invention proposes a kind of display panel, this display panel have active region and peripheral region and
Include lower substrate, upper substrate, black-matrix layer, flatness layer and frame glue.Lower substrate is to be arranged oppositely with upper substrate.Black-matrix layer
It is set on upper substrate, there is opening in peripheral region.Flatness layer is set on black-matrix layer and upper substrate and fills up out
Mouthful, and this flatness layer in peripheral region have groove, this groove in the overlook direction of display panel be located at peripheral region in and with
Superposition of end gap.Frame glue is set between lower substrate and flatness layer, and a part of this frame glue is in the grooves.
An embodiment according to the present invention, projection of the above-mentioned groove in the overlook direction of display panel cover above-mentioned frame glue
Projection in the overlook direction of display panel.
Another embodiment according to the present invention, the width of above-mentioned groove are the 100% to 130% of the width of above-mentioned frame glue.
Another embodiment according to the present invention, the depth of above-mentioned groove are the 2.5% to 15% of the thickness of above-mentioned frame glue.
Above-mentioned purpose according to the present invention, separately proposes a kind of method for manufacturing display panel, this display panel has
Active region and peripheral region, and the method comprises the steps of the lower substrate and upper substrate for providing and being arranged oppositely；The shape on upper substrate
At black-matrix layer；Lithography process is carried out to black-matrix layer, to form opening in black-matrix layer, this opening is located at display
In the peripheral region of panel；Flatness layer is formed in black-matrix layer and upper substrate, this flatness layer fills up opening and in peripheral region
With groove；And frame glue is being formed in peripheral region and between lower substrate and flatness layer, with by this frame glue by lower substrate with
Upper substrate is to group.With above-mentioned superposition of end gap in the overlook direction of display panel, a part of above-mentioned frame glue is located at above-mentioned groove
In above-mentioned groove, and above-mentioned frame glue in overlook direction with above-mentioned superposition of end gap.
Above-mentioned purpose according to the present invention separately proposes a kind of display panel, this display panel has active region and peripheral region
It and include lower substrate, upper substrate, black-matrix layer, flatness layer and frame glue.Lower substrate is to be arranged oppositely with upper substrate.Black square
Battle array layer is set on upper substrate, has the first groove in peripheral region.Flatness layer is set in black-matrix layer and upper substrate
And the first groove is filled up, and this flatness layer has the second groove in peripheral region, this second groove is in the vertical view side of display panel
It is located at upwards in peripheral region and Chong Die with the first groove.Frame glue is set between lower substrate and flatness layer, a part of this frame glue
In the second groove.
An embodiment according to the present invention, projection covering of above-mentioned second groove in the overlook direction of display panel are above-mentioned
Projection of the frame glue in the overlook direction of display panel.
Another embodiment according to the present invention, the width of above-mentioned second groove be the width of above-mentioned frame glue 100% to
130%.
Another embodiment according to the present invention, the depth of above-mentioned second groove be the thickness of above-mentioned frame glue 2.5% to
15%.
Above-mentioned purpose according to the present invention, separately proposes a kind of method for manufacturing display panel, this display panel has
Active region and peripheral region, and the method comprises the steps of the lower substrate and upper substrate for providing and being arranged oppositely；The shape on upper substrate
At black-matrix layer；Lithography process, to form the first groove in black-matrix layer, this first groove are carried out to black-matrix layer
In the peripheral region of display panel；Flatness layer is formed in black-matrix layer and upper substrate, this flatness layer fills up the first groove
And there is the second groove in peripheral region；And frame glue is being formed in peripheral region and between lower substrate and flatness layer, to pass through
This frame glue is by lower substrate and upper substrate to group.Above-mentioned second groove is Chong Die and above-mentioned with above-mentioned first groove in the vertical direction
A part of frame glue is located in above-mentioned second groove.
The thickness of liquid crystal layer can be effectively reduced in technical characteristic through the invention under the width and fixed glue amount for maintaining frame glue
Degree, and then shorten the reaction time of liquid crystal layer and avoid the generation of the display problem such as water ripples.In addition, according to the present invention
Some embodiments can more increase the lower substrate of display panel and the attachment degree of upper substrate, and then promote the reliable of display panel
Degree.
Detailed description of the invention
In order to more completely understand embodiment and its advantage, referring now to following description in conjunction with the accompanying drawings, in which:
Fig. 1 is the partial cutaway schematic of the display panel of some embodiments according to the present invention；
Fig. 2 is the partial cutaway schematic of the peripheral region of the display panel of Fig. 1；
Fig. 3 is the flow chart of the method for manufacturing display panel of some embodiments according to the present invention；And
Fig. 4 is painted the other embodiments of the peripheral region of the display panel of Fig. 1.
Specific embodiment
The embodiment of the present invention is hashed out below.It is understood, however, that embodiment offer is many applicable general
It reads, may be implemented in miscellaneous specific content.It discusses, revealed embodiment only for illustrating, is not limited to this
The range of invention.
Although it is to be understood that can be used herein " first ", the terms such as " second " come describe various elements, part,
Region and/or part, but these terms should not limit these elements, part, region and/or part.These terms are only to area
An other element, part, region and/or part and another element, part, region and/or part.
Fig. 1 is please referred to, Fig. 1 is the partial cutaway schematic of the display panel 100 of some embodiments according to the present invention.Display
Panel 100 can be such as horizontal handoff (in-plane switching；IPS) type or fringe field switch (fringe-
field switching；FFS) the horizontal component of electric fields such as type formula liquid crystal display panel, but invention is not limited thereto.In other implementations
In example, display panel 100 can be such as vertical orientation (Vertical Alignment；VA) type or twisted nematic (twisted
nametic；TN) the vertical electric fields such as type liquid crystal display panel formula liquid crystal display panel.As shown in Figure 1, display panel 100 includes pair
To the lower substrate 110 (or thin film transistor base plate) and upper substrate 120 (or colored optical filtering substrates) of setting.
In addition, as shown in Figure 1, display panel 100 has active region AA and peripheral region PA.In active region AA, lower substrate
110 include active member layer 111 (including the elements such as thin film transistor (TFT), gate lines, data lines and pixel electrode), and upper substrate
120 include black-matrix layer 121, chromatic filter layer 122 and flatness layer 123.Display panel 100 is in active region AA also comprising altogether
Same electrode (figure is not painted).In the embodiment that display panel 100 is horizontal component of electric field formula liquid crystal display panel, common electrode is located at
It is staggered in active member layer 111 and with pixel electrode, and is vertical electric field formula liquid crystal display panel in display panel 100
In embodiment, common electrode is located on upper substrate 120 and is located at the two sides up and down of liquid crystal layer 130 with pixel electrode.Liquid crystal
Layer 130 is between active member layer 111 and flatness layer 123.Liquid crystal layer 130 includes multiple liquid crystal molecules LC, these liquid crystal point
The effect for the internal electric field that sub- LC is generated by pixel electrode and common electrode and correspond to torsion.Black-matrix layer 121 is by actively
Area AA extends to peripheral region PA, to shield lights.Chromatic filter layer 122 may include the color blocking of a variety of different colours, so that
It is converted into the light of different colours by the filtration of these color blockings by the light of liquid crystal layer 130 from lower substrate 110.It is flat
Smooth layer 123 is located in black-matrix layer 121 and chromatic filter layer 122, and the inside to increase upper substrate 120 (has black
The side of color matrix layer 121 and chromatic filter layer 122) flatness.Identical as black-matrix layer 121, flatness layer 123 is also by leading
Dynamic area AA extends to peripheral region PA.Frame glue 140 is located in the PA of peripheral region and between flatness layer 123 and lower substrate 110, uses
With by 120 pairs of groups of lower substrate 110 and upper substrate and avoid outside moisture enter and corrode element.
Fig. 2 is the partial cutaway schematic of the peripheral region PA of the display panel 100 of Fig. 1.As shown in Fig. 2, black-matrix layer
121 have opening 121A in the PA of peripheral region, and flatness layer 123 fills up opening 121A and has groove 123A in peripheral region PA, and
A part of frame glue 140 is located in groove 123A.In the Z-axis direction (i.e. in the overlook direction of display panel 100), opening
121A is Chong Die with groove 123A, and the width W of groove 123A123ASubstantially with opening 121A width W121AIt is identical.In some implementations
In example, the projection of projection covering frame glue 140 in the Z-axis direction of groove 123A in the Z-axis direction.The width W of groove 123A123A
It can be the width W of frame glue 140140100% to 130%.As the width W of groove 123A123AWith the width W of frame glue 140140Phase
Meanwhile the side wall of groove 123A conforms to frame glue 140, so that the contact area of flatness layer 123 and frame glue 140 increases, that is, increases
The attachment degree of flatness layer 123 and frame glue 140, and then promote the reliability of display panel 100.
In addition, the width W of opening 121A121AIt can be the width W of frame glue 140140100% to 130%.Groove 123A
Depth D123AThe about thickness T of frame glue 1401402.5% to 15%.In some embodiments, the thickness T of frame glue 140140
It is 3.2 microns to 4.0 microns, and the depth D of groove 123A123AIt is 0.1 micron to 0.5 micron.In general, black-matrix layer
The 121 thickness T in the PA of peripheral region121It is identical as thickness of the black-matrix layer 121 in active region AA, but the present invention is not with this
It is limited.
It should be noted that above-described embodiment be with X-direction come illustrate black-matrix layer 121, opening 121A, flatness layer
123, the relationship between groove 123A and frame glue 140.Those skilled in the art can directly understand these according to above description
Relationship between element is suitable for any direction (such as Y direction) perpendicular to Z axis.For example, if display panel 100
For rectangle, then the relationship between above-mentioned black-matrix layer 121, opening 121A, flatness layer 123, groove 123A and frame glue 140 is suitable
Two long sides (such as X-direction) and two short sides (such as Y direction) in the PA of peripheral region.
Fig. 3 is the flow chart of the method 200 for manufacturing display panel of some embodiments according to the present invention.Below with system
It makes and carrys out illustration method 200 for display panel 100.In method 200, progress step S210 first is provided and is arranged oppositely down
Substrate 110 and upper substrate 120.Display panel 100 is become after 120 pairs of groups of lower substrate 110 and upper substrate.Display panel 100 has
There are active region AA and peripheral region PA.In active region AA, active member layer 111 (includes thin film transistor (TFT), gate lines, data lines
With the elements such as pixel electrode) it is formed on lower substrate 110.If display panel 100 is horizontal component of electric field formula liquid crystal display panel, lead
Dynamic element layer 111 also includes common electrode.
Then, step S220 is carried out, forms black-matrix layer 121 on upper substrate 120.Black-matrix layer 121 is by actively
Area AA extends to peripheral region PA.Thickness T of the black-matrix layer 121 in the PA of peripheral region121It can be with black-matrix layer 121 actively
Thickness in area AA is identical or not identical.
Later, step S230 is carried out, lithography process is carried out to black-matrix layer 121, to be formed in black-matrix layer 121
Be open 121A, this opening 121A is located in the PA of peripheral region.In addition, also being formed in black-matrix layer 121 by this lithography process
Multiple openings in the active region AA, these openings in active region AA respectively correspond multiple pixel lists of lower substrate 110
Member (figure is not painted).The opening of black-matrix layer 121 (includes the opening 121A in the PA of peripheral region and opening in active region AA
Mouthful) full stepwise light shield (full tone mask) can be used to be formed.
Later, step S240 is carried out, is formed in active region AA and on upper substrate 120 and black-matrix layer 121 colored
Filter layer 122.Chromatic filter layer 122 may include the color blocking of a variety of different colours, and these color blockings fill up black-matrix layer respectively
121 opening being located in active region AA.
Then, step S250 is carried out, is formed on upper substrate 120, black-matrix layer 121 and chromatic filter layer 122 flat
Layer 123, with increase upper substrate 120 the inside side of black-matrix layer 121 and chromatic filter layer 122 (i.e. with) it is flat
Degree, and fill up the opening 121A of peripheral region PA and form corresponding groove 123A.121A and groove 123A be open in the Z-axis direction
Overlapping.
Later, step S260 is carried out, forms frame glue 140 between lower substrate 110 and flatness layer 123, to pass through frame glue 140
By lower substrate 110 and 120 pairs of groups of upper substrate.Specifically, first in the PA of peripheral region, frame glue 140 is formed in lower substrate 110
On, so that active region AA is located in the region that frame glue 140 is surrounded.If using the formula injection method that drips (one drop fill；
ODF liquid crystal layer 130) is formed, then first can be instilled liquid crystal molecule into active region AA after forming frame glue 140, then through
Frame glue 140 is by 120 pairs of groups of lower substrate 110 and upper substrate.After the completion of group, opening 121, groove 123 and frame glue 140 are in display surface
It is respectively positioned in the overlook direction of plate 100 in the peripheral region PA of display panel 100, and a part of frame glue 140 is located at groove 123A
In.The width W of groove 123A123ACan substantially with opening 121A width W121AIt is identical, the width W of groove 123A123AIt can be frame
The width W of glue 140140100% to 130%.As the width W of groove 123A123AWith the width W of frame glue 140140It is recessed when identical
The side wall of slot 123A is bonded with frame glue 140, so that the contact area of flatness layer 123 and frame glue 140 increases, that is, increases flatness layer
123 with the attachment degree of frame glue 140, and then promote the reliability of display panel 100.
It is worth noting that step S230 is variable more using half stepwise light shield (half tone mask) to black matrix"
Layer 121 carries out lithography process, and to form groove in black-matrix layer, this groove replaces opening 121A shown in Fig. 2, in detail
Structure will with following Fig. 4 explanation.
Fig. 4 is painted the other embodiments of the peripheral region PA of the display panel 100 of Fig. 1.In Fig. 4, black-matrix layer 121 '
Respectively there is groove 121A ', 123A ' be overlapped each other in the overlook direction of display panel 100 with flatness layer 123 '.Frame glue
140 ' a part is located in groove 123A '.Compared to black matrix" in the opening 121A, Fig. 4 of black-matrix layer 121 in Fig. 2
The groove 121A ' of layer 121 ' is to carry out lithography process to black-matrix layer 121 ' using half stepwise light shield (half tone mask)
It is formed.The width W of groove 121A '121A’With the width W of groove 123A '123A’It is roughly the same, the width W of groove 123 '123’It can
To be the width W of frame glue 140 '140’100% to 130%.Remaining black-matrix layer 121 ', flatness layer 123 ' and frame glue 140 '
Feature (include width W121A’、W123A’、W140’, thickness T121’、T123’、T140’With depth D123A’Deng) respectively with the black of Fig. 2
Matrix layer 121, flatness layer 123 are identical with the feature of frame glue 140, therefore this will not be repeated here.
In conclusion technical characteristic through the invention, can effectively drop in the case where maintaining the glue amount of width and fixation of frame glue
The thickness of low liquid crystal layer, and then shorten the reaction time of liquid crystal layer, and avoid the generation of the display problem such as water ripples.This
Outside, some embodiments according to the present invention can more increase the lower substrate of display panel and the attachment degree of upper substrate, and then be promoted
The reliability of display panel.
Although the present invention is disclosed as above with embodiment, however, it is not to limit the invention, any technical field
In technical staff, without departing from the spirit and scope of the present invention, when can make some changes and embellishment, therefore guarantor of the invention
Subject to shield range ought be defined depending on claim.
Claims (10)
1. a kind of display panel, which is characterized in that the display panel has active region and peripheral region, and the display panel packet
Contain:
Lower substrate；
Upper substrate, the upper substrate are arranged oppositely with the lower substrate；
Black-matrix layer is set on the upper substrate, and the black-matrix layer has opening in the peripheral region；
Flatness layer is set on the black-matrix layer and the upper substrate and fills up the opening, and the flatness layer has
Groove, the groove in the overlook direction of the display panel be located at the peripheral region in and with the superposition of end gap；And
Frame glue is set between the lower substrate and the flatness layer, and a part of the frame glue is located in the groove.
2. display panel as described in claim 1, which is characterized in that projection covering of the groove in the overlook direction
Projection of the frame glue in the overlook direction.
3. display panel as claimed in claim 2, which is characterized in that the width of the groove is the width of the frame glue
100% to 130%.
4. display panel as described in claim 1, which is characterized in that the depth of the groove is the thickness of the frame glue
2.5% to 15%.
5. a kind of method for manufacturing display panel, which is characterized in that the display panel has active region and peripheral region, and
The method comprises the steps of
Lower substrate is provided and upper substrate, the lower substrate are arranged oppositely with the upper substrate；
Black-matrix layer is formed on the upper substrate；
Lithography process is carried out to the black-matrix layer, to form opening in the black-matrix layer, the opening is located at institute
It states in peripheral region；
Flatness layer is formed in the black-matrix layer and the upper substrate and fills up the opening, and the flatness layer is described
There is groove in peripheral region；And
Frame glue is being formed in the peripheral region and between the lower substrate and the flatness layer, with will be described by the frame glue
Lower substrate and the upper substrate are to group, wherein a part of the frame glue is located in the groove；
Wherein, the groove is with the superposition of end gap in the overlook direction of the display panel, and the frame glue is bowed described
In apparent direction with the superposition of end gap.
6. a kind of display panel, which is characterized in that the display panel has active region and peripheral region, and the display panel packet
Contain:
Lower substrate；
Upper substrate, the upper substrate are arranged oppositely with the lower substrate；
Black-matrix layer is set on the upper substrate, and the black-matrix layer has the first groove in the peripheral region；
Flatness layer is set on the black-matrix layer and the upper substrate and fills up first groove, and the flatness layer
With the second groove, second groove is located in the peripheral region in the overlook direction of the display panel and with described the
The overlapping of one groove；And
Frame glue is set between the lower substrate and the flatness layer, and a part of the frame glue is located in second groove.
7. display panel as claimed in claim 6, which is characterized in that projection of second groove in the overlook direction
Cover projection of the frame glue in the overlook direction.
8. display panel as claimed in claim 7, which is characterized in that the width of second groove is the width of the frame glue
100% to 130%.
9. display panel as claimed in claim 6, which is characterized in that the depth of second groove is the thickness of the frame glue
2.5% to 15%.
10. a kind of method for manufacturing display panel, which is characterized in that the display panel has active region and peripheral region,
And the method comprises the steps of
Lower substrate is provided and upper substrate, the lower substrate are arranged oppositely with the upper substrate；
Black-matrix layer is formed on the upper substrate；
Lithography process is carried out to the black-matrix layer, to form the first groove in the black-matrix layer, described first is recessed
Slot position is in the peripheral region；
Flatness layer is formed in the black-matrix layer and the upper substrate and fills up first groove, and the flatness layer exists
There is the second groove in the peripheral region；And
Frame glue is being formed in the peripheral region and between the lower substrate and the flatness layer, with will be described by the frame glue
Lower substrate and the upper substrate are to group, wherein a part of the frame glue is located in second groove；
Wherein, second groove is Chong Die with first groove in the overlook direction of the display panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711477336.7A CN109991770A (en) | 2017-12-29 | 2017-12-29 | Display panel and its manufacturing method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711477336.7A CN109991770A (en) | 2017-12-29 | 2017-12-29 | Display panel and its manufacturing method |
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| CN109991770A true CN109991770A (en) | 2019-07-09 |
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| CN201711477336.7A Pending CN109991770A (en) | 2017-12-29 | 2017-12-29 | Display panel and its manufacturing method |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111367113A (en) * | 2020-04-09 | 2020-07-03 | 深圳市华星光电半导体显示技术有限公司 | Display panel and display device |
| CN111766733A (en) * | 2020-07-31 | 2020-10-13 | 京东方科技集团股份有限公司 | Transparent display panel, preparation method thereof and display device |
| CN112764276A (en) * | 2021-01-12 | 2021-05-07 | 武汉华星光电技术有限公司 | Display panel and display device |
| WO2021259247A1 (en) * | 2020-06-22 | 2021-12-30 | 京东方科技集团股份有限公司 | Display substrate and manufacturing method therefor, panel, display device, and mask plate |
Citations (2)
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| CN111367113A (en) * | 2020-04-09 | 2020-07-03 | 深圳市华星光电半导体显示技术有限公司 | Display panel and display device |
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| CN112764276A (en) * | 2021-01-12 | 2021-05-07 | 武汉华星光电技术有限公司 | Display panel and display device |
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