CN109979998B - Integrated gate commutated thyristor device with high current surge tolerance - Google Patents
Integrated gate commutated thyristor device with high current surge tolerance Download PDFInfo
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- CN109979998B CN109979998B CN201811616848.1A CN201811616848A CN109979998B CN 109979998 B CN109979998 B CN 109979998B CN 201811616848 A CN201811616848 A CN 201811616848A CN 109979998 B CN109979998 B CN 109979998B
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- 238000006243 chemical reaction Methods 0.000 claims description 21
- 239000013307 optical fiber Substances 0.000 claims description 7
- 238000001914 filtration Methods 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 238000002955 isolation Methods 0.000 claims description 3
- 230000000630 rising effect Effects 0.000 abstract description 5
- 238000000034 method Methods 0.000 description 12
- 230000008569 process Effects 0.000 description 8
- 239000000969 carrier Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000002508 compound effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42356—Disposition, e.g. buried gate electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/744—Gate-turn-off devices
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thyristors (AREA)
Abstract
Description
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201811616848.1A CN109979998B (en) | 2018-12-27 | 2018-12-27 | Integrated gate commutated thyristor device with high current surge tolerance |
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CN201811616848.1A CN109979998B (en) | 2018-12-27 | 2018-12-27 | Integrated gate commutated thyristor device with high current surge tolerance |
Publications (2)
Publication Number | Publication Date |
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CN109979998A CN109979998A (en) | 2019-07-05 |
CN109979998B true CN109979998B (en) | 2024-02-09 |
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CN201811616848.1A Active CN109979998B (en) | 2018-12-27 | 2018-12-27 | Integrated gate commutated thyristor device with high current surge tolerance |
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Families Citing this family (1)
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CN111293113B (en) * | 2020-02-21 | 2023-01-10 | 电子科技大学 | SGTO device adopting single-layer metal process and layout structure and manufacturing method thereof |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4155155A (en) * | 1977-01-19 | 1979-05-22 | Alsthom-Atlantique | Method of manufacturing power semiconductors with pressed contacts |
CN102214686A (en) * | 2011-04-28 | 2011-10-12 | 株洲南车时代电气股份有限公司 | Cathode patterns of electric semiconductor device and patterned arrangement method of cathode fingers thereof |
CN204172712U (en) * | 2014-10-28 | 2015-02-25 | 株洲时代装备技术有限责任公司 | A kind of city rail medium-pressure type with circulation elimination function can present electric supply installation |
CN104600101A (en) * | 2015-02-03 | 2015-05-06 | 清华大学 | Dual-gate-electrode contact ring cathode surface layer structure of integrated gate electrode commutation thyristor chip |
CN104795439A (en) * | 2015-03-18 | 2015-07-22 | 清华大学 | Gate commutated thyristor chip applied to hybrid direct-current circuit breakers |
CN108490331A (en) * | 2018-04-17 | 2018-09-04 | 西安派瑞功率半导体变流技术股份有限公司 | GCT chips door/cathodal block characteristic three figure method testboard |
CN209561414U (en) * | 2018-12-27 | 2019-10-29 | 清华大学 | The integrated gate commutated thyristor device for having high current impact tolerance |
-
2018
- 2018-12-27 CN CN201811616848.1A patent/CN109979998B/en active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4155155A (en) * | 1977-01-19 | 1979-05-22 | Alsthom-Atlantique | Method of manufacturing power semiconductors with pressed contacts |
CN102214686A (en) * | 2011-04-28 | 2011-10-12 | 株洲南车时代电气股份有限公司 | Cathode patterns of electric semiconductor device and patterned arrangement method of cathode fingers thereof |
CN204172712U (en) * | 2014-10-28 | 2015-02-25 | 株洲时代装备技术有限责任公司 | A kind of city rail medium-pressure type with circulation elimination function can present electric supply installation |
CN104600101A (en) * | 2015-02-03 | 2015-05-06 | 清华大学 | Dual-gate-electrode contact ring cathode surface layer structure of integrated gate electrode commutation thyristor chip |
CN104795439A (en) * | 2015-03-18 | 2015-07-22 | 清华大学 | Gate commutated thyristor chip applied to hybrid direct-current circuit breakers |
CN108490331A (en) * | 2018-04-17 | 2018-09-04 | 西安派瑞功率半导体变流技术股份有限公司 | GCT chips door/cathodal block characteristic three figure method testboard |
CN209561414U (en) * | 2018-12-27 | 2019-10-29 | 清华大学 | The integrated gate commutated thyristor device for having high current impact tolerance |
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CN109979998A (en) | 2019-07-05 |
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Inventor after: Zeng Rong Inventor after: Liu Jiapeng Inventor after: Zhou Wenpeng Inventor after: Zhao Biao Inventor after: Yu Zhanqing Inventor after: Chen Zhengyu Inventor before: Liu Jiapeng Inventor before: Zeng Rong Inventor before: Zhou Wenpeng Inventor before: Zhao Biao Inventor before: Yu Zhanqing Inventor before: Chen Zhengyu |
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