CN109976017A - Display panel and preparation method thereof - Google Patents
Display panel and preparation method thereof Download PDFInfo
- Publication number
- CN109976017A CN109976017A CN201910282747.3A CN201910282747A CN109976017A CN 109976017 A CN109976017 A CN 109976017A CN 201910282747 A CN201910282747 A CN 201910282747A CN 109976017 A CN109976017 A CN 109976017A
- Authority
- CN
- China
- Prior art keywords
- pixel electrode
- electrode layer
- layer
- substrate
- adsorption
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Liquid Crystal (AREA)
Abstract
This application provides a kind of display panel and preparation method thereof, the display panel includes substrate；Pixel electrode layer on the substrate；Both alignment layers on the pixel electrode layer；And the adsorption layer between the pixel electrode layer and the both alignment layers.The application so that the both alignment layers can ignore landform and uniformly be spread on the pixel electrode layer, eliminates twill Mura, improves the yield of product by forming an adsorption layer before forming the both alignment layers.
Description
Technical field
This application involves display panel manufacturing field, in particular to a kind of display panel and preparation method thereof.
Background technique
In LCD display board industry, alignment film PI (polyimides) is used to make liquid crystal in no-voltage LCD alignment
Have certain pre-tilt angle when state, plays the role of important Induction Control for the normal work of liquid crystal.
Alignment film generally after the completion of upper and lower base plate processing procedure, before liquid crystal drip-injection ODF, forms a film on upper and lower base plate.Due to existing
There is alignment film usually to be formed in the way of inkjet printing, therefore there are the region of many contact holes on upper and lower base plate, it can not
PI drop is uniformly formed in the contact bore region, causes the region twill Mura occur, reduces the yield of product.
Therefore, a kind of display panel is needed at present to solve the above technical problems.
Summary of the invention
This application provides a kind of display panels and preparation method thereof, to solve existing display panel alignment film crawling
Even technical problem.
To solve above scheme, technical solution provided by the present application is as follows:
The application provides a kind of production method of display panel comprising:
One substrate is provided, forms pixel electrode layer over the substrate；
Adsorption layer is formed on the pixel electrode layer；
Both alignment layers are formed on the adsorption layer.
In the production method of the application,
A substrate is provided, the step of formation pixel electrode layer includes: over the substrate
One substrate is provided；
Tft layer is formed over the substrate；
The pixel electrode layer is formed on the tft layer；
Wherein, the tft layer includes multiple film crystal pipe units, and the film crystal pipe unit is etching
Stop stratotype, back one of channel etch type or top-gate thin-film transistors type.
In the production method of the application,
Include: in the step of forming adsorption layer on the pixel electrode layer
Adsorption liquid is coated on the pixel electrode layer；
The adsorption liquid is formed to the adsorption layer being made of multiple miniature droplets using preset device.
In the production method of the application, the diameter of the miniature droplets is less than 20 microns.
In the production method of the application, the preset device includes that ultrasonic wave hazes device.
In the production method of the application, the ingredient of the adsorption layer include polyimides, ethyl alcohol, ethylene glycol, isopropanol,
At least one of ring ethyl alcohol.
The application also proposed a kind of display panel comprising:
Substrate；
Pixel electrode layer on the substrate；
Both alignment layers on the pixel electrode layer；And
Adsorption layer between the pixel electrode layer and the both alignment layers.
In the display panel of the application, the adsorption layer includes multiple miniature droplets, and the liquid crystal micro is formed uniformly
In on the pixel electrode layer.
In the display panel of the application, the diameter of the miniature droplets is less than 20 microns.
In the display panel of the application, the ingredient of the adsorption layer include polyimides, ethyl alcohol, ethylene glycol, isopropanol,
At least one of ring ethyl alcohol.
The utility model has the advantages that the display panel includes substrate this application provides a kind of display panel and preparation method thereof；Position
Pixel electrode layer on the substrate；Both alignment layers on the pixel electrode layer；And it is located at the pixel electrode layer
With the adsorption layer between the both alignment layers.The application is by forming an adsorption layer before forming the both alignment layers, so that described
Both alignment layers can ignore landform and uniformly be spread on the pixel electrode layer, eliminate twill Mura, improve the yield of product.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of embodiment or technical solution in the prior art
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only some of invention
Embodiment for those of ordinary skill in the art without creative efforts, can also be attached according to these
Figure obtains other attached drawings.
The step of Fig. 1 is the application display panel production method is schemed；
Fig. 2A~2D is the process sequence diagram of the application display panel production method；
Fig. 3 is the structure chart of the application display panel.
Specific embodiment
The explanation of following embodiment is referred to the additional illustration, the particular implementation that can be used to implement to illustrate the application
Example.The direction term that the application is previously mentioned, such as [on], [under], [preceding], [rear], [left side], [right side], [interior], [outer], [side]
Deng being only the direction with reference to annexed drawings.Therefore, the direction term used be to illustrate and understand the application, rather than to
Limit the application.The similar unit of structure is with being given the same reference numerals in the figure.
Referring to Fig. 1, Fig. 1 schemes the step of being the application display panel production method.
Fig. 2A~2D is please referred to, Fig. 2A~2D is the process sequence diagram of the application display panel production method.
Embodiments herein is illustrated by taking COA substrate as an example, and the production method of the display panel 100 includes step
It is rapid:
S10, a substrate 10 is provided, forms pixel electrode layer 20 on the substrate 10；
Step S10 can specifically include:
S101, a substrate 10 is provided；
Fig. 2A is please referred to, the raw material of the substrate 10 can be one in glass substrate, quartz base plate, resin substrate etc.
Kind.When the substrate 10 is flexible base board, the material of the flexible base board can be PI (polyimides).The substrate 10
Type the application does not limit specifically.
S102, tft layer 30 is formed on the substrate 10；
The tft layer 30 of the application includes multiple film crystal pipe units, and the film crystal pipe unit can
Think etch stop layer type, back channel etch type, bottom gate thin film transistor type or top-gate thin-film transistors type etc., the present embodiment tool
There is no limit for body.
Fig. 2A is please referred to, the application is illustrated by taking bottom gate thin film transistor type as an example.
Fig. 2A is please referred to, step S102 is specifically included:
Grid layer 301 is formed on the substrate 10；
Gate insulation layer 302 is formed on the grid layer 301；
Source-drain electrode layer 303 is formed on the gate insulation layer 302；
The first passivation layer 304 is formed on the source-drain electrode layer 303.
Further, since the substrate of the application is COA substrate, further comprise the steps of:
Color blocking layer 305 is formed on first passivation layer 304；
The second passivation layer 306 is formed in the color blocking layer 305.
S103, the pixel electrode layer 20 is formed on the tft layer 30；
Fig. 2 B is please referred to, forms pixel electrode layer 20 on second passivation layer 306, the pixel electrode layer 20 passes through
Via hole is electrically connected with the grid layer 301 and the source-drain electrode layer 303.
In the present embodiment, the pixel electrode layer 20 can be transparent electrode layer.The material of the pixel electrode layer 20
Can be tin indium oxide (ITO).
S20, adsorption layer 40 is formed on the pixel electrode layer 20；
Fig. 2 C is please referred to, step S20 can specifically include:
S201, adsorption liquid is coated on the pixel electrode layer 20；
S202, the adsorption liquid is formed to the adsorption layer 40 being made of multiple miniature droplets 401 using preset device.
This step predominantly increases by a pre-treating technology before forming the both alignment layers 50, i.e., in the pixel electrode layer
Adsorption layer 40 is formed on 20.The adsorption layer 40 handles adsorption liquid by the preset device and is formed.
In the present embodiment, the ingredient of the adsorption layer 40 includes polyimides, ethyl alcohol, ethylene glycol, isopropanol, ring ethyl alcohol
Deng at least one of, or with other the same or similar organic solvents of said components polarity, the application do not limit specifically
System.
In the present embodiment, the preset device can be but be not limited to ultrasonic oscillation and haze device.
In the present embodiment, the adsorption liquid can be formed in the pixel electrode layer 20 by techniques such as inkjet printings
On, the adsorption liquid simultaneously is atomized to form multiple miniature droplets 401, the miniature droplets by the ultrasonic oscillation device that hazes
401 it is random be deposited in the pixel defining layer, and do not influenced by landform.
In the prior art due to uneven and via hole the presence of pixel electrode layer 20, so that both alignment layers 50 can not be
The biggish region of the gradient is deposited, and portioned product partial region is caused twill Mura occur.And herein described miniature droplets
401 presence can drain the solution when forming the both alignment layers 50, enable 50 solution of both alignment layers uniform
It is distributed on the pixel electrode layer 20, and is not limited by landform, improve the uniformity of alignment film, avoid going out for twill Mura
It is existing.
In the present embodiment, the diameter of the miniature droplets 401 is less than 20 microns.
S30, both alignment layers 50 are formed on the adsorption layer 40；
Fig. 2 D is please referred to, the both alignment layers 50 can be formed by techniques such as inkjet printings.The material of the both alignment layers 50
It can be PI solution.
In the present embodiment, above-mentioned implementation method can be applied equally on color membrane substrates.The shape i.e. in common electrode layer
At the adsorption layer 40, the printing of the both alignment layers 50 is then carried out.
The application is by forming an adsorption layer 40 before forming the both alignment layers 50, so that the both alignment layers 50 can be ignored
Landform is uniformly spread on the pixel electrode layer 20, eliminates twill Mura, improves the yield of product.
Referring to Fig. 3, Fig. 3 is the structure chart of the application display panel.
The display panel 100 is including array substrate, color membrane substrates and is located at the array substrate and the color membrane substrates
Between liquid crystal layer.Embodiments herein is illustrated by taking COA substrate as an example.
The array substrate includes substrate 10, the pixel electrode layer 20 on the substrate 10, is located at the pixel electricity
Both alignment layers 50 on pole layer 20 and the adsorption layer 40 between the pixel electrode layer 20 and the both alignment layers 50.
In the present embodiment, the raw material of the substrate 10 can be in glass substrate, quartz base plate, resin substrate etc.
It is a kind of.When the substrate 10 is flexible base board, the material of the flexible base board can be PI (polyimides).The substrate 10
Type the application do not limit specifically.
In the present embodiment, the array substrate further includes between the substrate 10 and the pixel electrode layer 20
Tft layer 30.
The tft layer 30 of the application includes multiple film crystal pipe units, and the film crystal pipe unit can
Think etch stop layer type, back channel etch type, bottom gate thin film transistor type or top-gate thin-film transistors type etc., the present embodiment tool
There is no limit for body.
The film crystal pipe unit may include being located on the substrate 10 form grid layer 301, be located at the grid
Gate insulation layer 302 is formed on layer 301, is located at formation source-drain electrode layer 303 on the gate insulation layer 302, is located at the source-drain electrode layer
The first passivation layer 304 is formed on 303.
Further, since the substrate of the application is COA substrate, the array substrate further includes being located at first passivation layer
Color blocking layer 305 is formed on 304, the second passivation layer 306 is formed in the color blocking layer 305.
In the present embodiment, the pixel electrode layer 20 passes through via hole and the grid layer 301 and the source-drain electrode layer 303
Electrical connection.
In the present embodiment, the pixel electrode layer 20 can be transparent electrode layer.The material of the pixel electrode layer 20
Can be tin indium oxide (ITO).
Referring to Fig. 3, the adsorption layer 40 includes multiple miniature droplets 401, the liquid crystal micro is uniformly formed in institute
It states on pixel electrode layer 20.
In the present embodiment, by being coated with adsorption liquid on the pixel electrode layer 20, and will be described using preset device
Adsorption liquid forms the adsorption layer 40 being made of multiple miniature droplets 401.
In the present embodiment, the ingredient of the adsorption layer 40 includes polyimides, ethyl alcohol, ethylene glycol, isopropanol, ring ethyl alcohol
Deng at least one of, or with other the same or similar organic solvents of said components polarity, the application do not limit specifically
System.
In the present embodiment, the preset device can be but be not limited to ultrasonic oscillation and haze device.
In the present embodiment, the adsorption liquid can be formed in the pixel electrode layer 20 by techniques such as inkjet printings
On, the adsorption liquid simultaneously is atomized to form multiple miniature droplets 401, the miniature droplets by the ultrasonic oscillation device that hazes
401 it is random be deposited in the pixel defining layer, and do not influenced by landform.
In the prior art due to uneven and via hole the presence of pixel electrode layer, so that both alignment layers can not be in the gradient
Biggish region is deposited, and portioned product partial region is caused twill Mura occur.And herein described miniature droplets 404
In the presence of can be drained to the solution when forming the both alignment layers 50, both alignment layers solution is enabled to be evenly distributed in institute
It states on pixel electrode layer 20, and do not limited by landform, improves 50 layers of orientation of uniformity, avoid the appearance of twill Mura.
In the present embodiment, the diameter of the miniature droplets 401 is less than 20 microns.
In the present embodiment, the both alignment layers 50 can be formed by techniques such as inkjet printings.The material of the both alignment layers 50
Material can be PI solution.
In the present embodiment, above-mentioned implementation method can be applied equally on color membrane substrates.The shape i.e. in common electrode layer
At the adsorption layer 40, the printing of the both alignment layers 50 is then carried out.
The application also proposed a kind of display module, and the display module includes above-mentioned display panel and is located at the display
Layer of polarizer and cover layer on panel.The working principle of the display module is same or similar with the display panel, this
Application is not repeating.
This application provides a kind of display panel and preparation method thereof, the display panel includes substrate；Positioned at the lining
Pixel electrode layer on bottom；Both alignment layers on the pixel electrode layer；And match positioned at the pixel electrode layer with described
To the adsorption layer between layer.The application is by forming an adsorption layer before forming the both alignment layers, so that the both alignment layers energy
Ignore landform to be uniformly spread on the pixel electrode layer, eliminate twill Mura, improves the yield of product.
Although above preferred embodiment is not to limit in conclusion the application is disclosed above with preferred embodiment
The application processed, those skilled in the art are not departing from spirit and scope, can make various changes and profit
Decorations, therefore the protection scope of the application subjects to the scope of the claims.
Claims (10)
1. a kind of production method of display panel characterized by comprising
One substrate is provided, forms pixel electrode layer over the substrate；
Adsorption layer is formed on the pixel electrode layer；
Both alignment layers are formed on the adsorption layer.
2. manufacturing method according to claim 1, which is characterized in that
A substrate is provided, the step of formation pixel electrode layer includes: over the substrate
One substrate is provided；
Tft layer is formed over the substrate；
The pixel electrode layer is formed on the tft layer；
Wherein, the tft layer includes multiple film crystal pipe units, and the film crystal pipe unit is that etching stops
Stratotype, back one of channel etch type or top-gate thin-film transistors type.
3. manufacturing method according to claim 1, which is characterized in that
Include: in the step of forming adsorption layer on the pixel electrode layer
Adsorption liquid is coated on the pixel electrode layer；
The adsorption liquid is formed to the adsorption layer being made of multiple miniature droplets using preset device.
4. production method according to claim 3, which is characterized in that
The diameter of the miniature droplets is less than 20 microns.
5. production method according to claim 3, which is characterized in that
The preset device includes that ultrasonic wave hazes device.
6. manufacturing method according to claim 1, which is characterized in that
The ingredient of the adsorption layer includes at least one of polyimides, ethyl alcohol, ethylene glycol, isopropanol, ring ethyl alcohol.
7. a kind of display panel characterized by comprising
Substrate；
Pixel electrode layer on the substrate；
Both alignment layers on the pixel electrode layer；And
Adsorption layer between the pixel electrode layer and the both alignment layers.
8. display panel according to claim 7, which is characterized in that
The adsorption layer includes multiple miniature droplets, and the liquid crystal micro is uniformly formed on the pixel electrode layer.
9. display panel according to claim 8, which is characterized in that
The diameter of the miniature droplets is less than 20 microns.
10. display panel according to claim 7, which is characterized in that
The ingredient of the adsorption layer includes at least one of polyimides, ethyl alcohol, ethylene glycol, isopropanol, ring ethyl alcohol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910282747.3A CN109976017B (en) | 2019-04-10 | 2019-04-10 | Display panel and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910282747.3A CN109976017B (en) | 2019-04-10 | 2019-04-10 | Display panel and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109976017A true CN109976017A (en) | 2019-07-05 |
| CN109976017B CN109976017B (en) | 2021-09-24 |
Family
ID=67083854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910282747.3A Active CN109976017B (en) | 2019-04-10 | 2019-04-10 | Display panel and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109976017B (en) |
Citations (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04240620A (en) * | 1991-01-24 | 1992-08-27 | Matsushita Electric Ind Co Ltd | Liquid crystal oriented film |
| US5539553A (en) * | 1993-04-09 | 1996-07-23 | Canon Kabushiki Kaisha | Liquid crystal device with an electrically neutral interface between the liquid crystal and orientation layer |
| JP2001188233A (en) * | 1999-12-27 | 2001-07-10 | Casio Comput Co Ltd | Liquid crystal display device |
| US20020182346A1 (en) * | 2001-04-25 | 2002-12-05 | Kwon Soon Bum | Liquid crystal display with alignment film of polyphenylenphthalamide-based material and method for fabricating the same |
| CN1605043A (en) * | 2001-12-17 | 2005-04-06 | 触媒化成工业株式会社 | Liquid crystal display cell |
| JP2005274640A (en) * | 2004-03-23 | 2005-10-06 | Sony Corp | Liquid crystal panel and method for manufacturing liquid crystal panel |
| CN101118350A (en) * | 2006-08-02 | 2008-02-06 | 精工爱普生株式会社 | Method for forming functional film and method for manufacturing liquid crystal display |
| CN101285968A (en) * | 2007-04-13 | 2008-10-15 | Nec液晶技术株式会社 | Liquid crystal display device and method of fabricating the same |
| JP2009288436A (en) * | 2008-05-28 | 2009-12-10 | Sharp Corp | Liquid crystal display device |
| CN203444196U (en) * | 2013-08-28 | 2014-02-19 | 京东方科技集团股份有限公司 | Substrate and display device provided with same |
| JP2014044430A (en) * | 2013-10-24 | 2014-03-13 | Japan Display Inc | Liquid crystal display device, and alignment film material for photo-alignment film |
| CN105467653A (en) * | 2015-12-08 | 2016-04-06 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and quantum rod polaroid manufacturing method |
| US20160161804A1 (en) * | 2008-05-15 | 2016-06-09 | Seiko Epson Corporation | Method for manufacturing liquid crystal device |
| CN106200133A (en) * | 2016-09-12 | 2016-12-07 | 上海中航光电子有限公司 | Display panels |
| CN106444187A (en) * | 2016-08-22 | 2017-02-22 | 京东方科技集团股份有限公司 | Array substrate and display device |
| CN106950769A (en) * | 2017-03-20 | 2017-07-14 | 深圳市华星光电技术有限公司 | Array base palte, display device |
| CN107463029A (en) * | 2017-08-25 | 2017-12-12 | 深圳市华星光电技术有限公司 | Auto-orientation liquid crystal display panel and preparation method thereof |
| CN107479292A (en) * | 2017-09-28 | 2017-12-15 | 武汉华星光电技术有限公司 | Array base palte, the preparation method of array base palte and liquid crystal display panel |
| JP2018004811A (en) * | 2016-06-29 | 2018-01-11 | Dic株式会社 | Material for aligning liquid crystal and liquid crystal display element using the same |
| CN107861295A (en) * | 2017-11-24 | 2018-03-30 | 深圳市华星光电技术有限公司 | A kind of array base palte and preparation method thereof, display panel |
| US20180120643A1 (en) * | 2016-10-28 | 2018-05-03 | Citizen Electronics Co., Ltd. | Side edge planar lighting unit |
| CN108181746A (en) * | 2018-03-05 | 2018-06-19 | 深圳市华星光电技术有限公司 | A kind of production method of liquid crystal display panel |
| CN108254974A (en) * | 2018-01-12 | 2018-07-06 | 深圳市华星光电技术有限公司 | A kind of method for processing surface of substrate, substrate and liquid crystal display panel |
| US20180362850A1 (en) * | 2017-06-20 | 2018-12-20 | Samsung Display Co., Ltd. | Curved liquid crystal display |
-
2019
- 2019-04-10 CN CN201910282747.3A patent/CN109976017B/en active Active
Patent Citations (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04240620A (en) * | 1991-01-24 | 1992-08-27 | Matsushita Electric Ind Co Ltd | Liquid crystal oriented film |
| US5539553A (en) * | 1993-04-09 | 1996-07-23 | Canon Kabushiki Kaisha | Liquid crystal device with an electrically neutral interface between the liquid crystal and orientation layer |
| JP2001188233A (en) * | 1999-12-27 | 2001-07-10 | Casio Comput Co Ltd | Liquid crystal display device |
| US20020182346A1 (en) * | 2001-04-25 | 2002-12-05 | Kwon Soon Bum | Liquid crystal display with alignment film of polyphenylenphthalamide-based material and method for fabricating the same |
| CN1605043A (en) * | 2001-12-17 | 2005-04-06 | 触媒化成工业株式会社 | Liquid crystal display cell |
| JP2005274640A (en) * | 2004-03-23 | 2005-10-06 | Sony Corp | Liquid crystal panel and method for manufacturing liquid crystal panel |
| CN101118350A (en) * | 2006-08-02 | 2008-02-06 | 精工爱普生株式会社 | Method for forming functional film and method for manufacturing liquid crystal display |
| CN101285968A (en) * | 2007-04-13 | 2008-10-15 | Nec液晶技术株式会社 | Liquid crystal display device and method of fabricating the same |
| US20160161804A1 (en) * | 2008-05-15 | 2016-06-09 | Seiko Epson Corporation | Method for manufacturing liquid crystal device |
| JP2009288436A (en) * | 2008-05-28 | 2009-12-10 | Sharp Corp | Liquid crystal display device |
| CN203444196U (en) * | 2013-08-28 | 2014-02-19 | 京东方科技集团股份有限公司 | Substrate and display device provided with same |
| JP2014044430A (en) * | 2013-10-24 | 2014-03-13 | Japan Display Inc | Liquid crystal display device, and alignment film material for photo-alignment film |
| CN105467653A (en) * | 2015-12-08 | 2016-04-06 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and quantum rod polaroid manufacturing method |
| JP2018004811A (en) * | 2016-06-29 | 2018-01-11 | Dic株式会社 | Material for aligning liquid crystal and liquid crystal display element using the same |
| CN106444187A (en) * | 2016-08-22 | 2017-02-22 | 京东方科技集团股份有限公司 | Array substrate and display device |
| CN106200133A (en) * | 2016-09-12 | 2016-12-07 | 上海中航光电子有限公司 | Display panels |
| US20180120643A1 (en) * | 2016-10-28 | 2018-05-03 | Citizen Electronics Co., Ltd. | Side edge planar lighting unit |
| CN106950769A (en) * | 2017-03-20 | 2017-07-14 | 深圳市华星光电技术有限公司 | Array base palte, display device |
| US20180362850A1 (en) * | 2017-06-20 | 2018-12-20 | Samsung Display Co., Ltd. | Curved liquid crystal display |
| CN107463029A (en) * | 2017-08-25 | 2017-12-12 | 深圳市华星光电技术有限公司 | Auto-orientation liquid crystal display panel and preparation method thereof |
| CN107479292A (en) * | 2017-09-28 | 2017-12-15 | 武汉华星光电技术有限公司 | Array base palte, the preparation method of array base palte and liquid crystal display panel |
| CN107861295A (en) * | 2017-11-24 | 2018-03-30 | 深圳市华星光电技术有限公司 | A kind of array base palte and preparation method thereof, display panel |
| CN108254974A (en) * | 2018-01-12 | 2018-07-06 | 深圳市华星光电技术有限公司 | A kind of method for processing surface of substrate, substrate and liquid crystal display panel |
| CN108181746A (en) * | 2018-03-05 | 2018-06-19 | 深圳市华星光电技术有限公司 | A kind of production method of liquid crystal display panel |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109976017B (en) | 2021-09-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10658397B2 (en) | Flexible display panel, manufacturing method of flexible display panel and display apparatus | |
| US9612497B2 (en) | Array substrate and manufacturing method thereof and liquid crystal display panel using the array substrate | |
| US10175514B2 (en) | Method for manufacturing display panel | |
| KR20130003997A (en) | Separation-combination method of carrier substrate and slim glass | |
| US8707544B2 (en) | Method of manufacturing in-plane switching mode liquid crystal display | |
| CN106684100B (en) | A kind of array substrate and preparation method thereof, display device | |
| US10495912B2 (en) | Method of manufacturing liquid crystal display panel and liquid crystal display panel manufactured by the same | |
| WO2013139192A1 (en) | Touch liquid crystal display device, liquid crystal display panel and upper substrate | |
| CN105116620A (en) | Friction alignment method for display substrate | |
| US20120129285A1 (en) | Methods for manufacturing display panel and display apparatus | |
| CN106952583A (en) | The preparation method of flexible array substrate | |
| CN108008582A (en) | A kind of tft array substrate, production method and liquid crystal display panel | |
| KR20120126675A (en) | Method of fabricating lightweight and thin liquid crystal display device | |
| CN106654062A (en) | Method for separating polarizer from flexible OLED display panel | |
| WO2020186565A1 (en) | Substrate manufacturing method and substrate | |
| KR20130061485A (en) | Method of fabricating lightweight and thin liquid crystal display device | |
| US9535276B2 (en) | Liquid crystal panel motherboard needing slicing and manufacturing method thereof | |
| US20170160613A1 (en) | Tft substrates, tft transistors and the manufacturing methods thereof | |
| WO2020186542A1 (en) | Manufacturing method of alignment film, and alignment film | |
| KR20150105532A (en) | Method for manufacturing display apparatus | |
| CN107688258A (en) | Display panel and preparation method thereof | |
| CN109976017A (en) | Display panel and preparation method thereof | |
| CN102707477B (en) | Manufacturing method for liquid crystal display panel | |
| US10928685B1 (en) | Manufacturing method for ITO common electrode on CF substrate side | |
| CN107797353A (en) | A kind of liquid crystal display panel and liquid crystal display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |