CN109975319B - Device and method for rapidly detecting surface quality of planar optical element - Google Patents
Device and method for rapidly detecting surface quality of planar optical element Download PDFInfo
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- G—PHYSICS
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
- G01N21/474—Details of optical heads therefor, e.g. using optical fibres
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9511—Optical elements other than lenses, e.g. mirrors
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
- G01N2021/9583—Lenses
Abstract
The invention relates to a device and a method for rapidly detecting the surface quality of a planar optical element, wherein the device comprises the following steps: the photoelectric detector 1 is combined with the beam splitter and arranged in a detection light path to measure the energy of incident light; the photoelectric detector 2 is fixed at the detection hole in the integrating sphere to measure the scattered light energy; and the two-dimensional rotating system is used for fixing the element to be detected and is arranged on the XY guide rail so as to realize multi-axis linkage of the element to be detected. The measurement principle of the invention is as follows: the detection light beam emitted by the laser light source sequentially passes through the beam splitter, the laser beam expander and the high reflector, enters the perforation through the integrating sphere and is projected onto the element to be detected, and scattered light is formed; the mirror part of the scattered light leaves the integrating sphere through the integrating sphere exit hole/sample hole and is collected by a light collector; the diffusely scattered part of the scattered light is reflected multiple times in the integrating sphere to form uniform light, which is measured by the photodetector 2. The detection device can realize the rapid detection of the defect grade number of the surface of the plane optical element.
Description
Technical Field
The invention relates to the technical field of optical detection, in particular to a device and a method for rapidly detecting the surface quality of a planar optical element based on total scattering measurement.
Background
Due to the limitation of modern processing technology, various defects which are macroscopically randomly distributed on the surface are inevitably left after the optical element is polished, wherein the defects comprise pits, bubbles, scratches, broken edges, broken points and the like. In precision optical systems, optical element surface defects can cause light scattering, which can produce background noise and degrade system performance. In addition, in high power laser systems, surface defects can also absorb large amounts of light energy, creating thermal stresses that can have a damaging effect on the proper operation of the optical components and even the entire optical system. At present, visual inspection is mainly adopted for detecting the surface defects of the planar optical element, namely, the type, the size and the distribution of the defects are judged by using an optical magnifier or directly observing with naked eyes under the dark field illumination condition by utilizing the scattering characteristic of light. However, the visual method is easily affected by human factors, and has the disadvantages of strong subjectivity and low detection efficiency. Compared with manual judgment, in recent years, automatic detection methods based on objective and accurate digital judgment have been rapidly developed, such as: microscopy, laser spectroscopy, coherent filter imaging, and the like. The detection precision of the methods reaches micron level, and the methods are more suitable for detecting the surface defects of the precise optical elements, but the detection process usually takes much time, and the methods cannot meet the actual requirements for the rapid detection of large-scale planar optical elements.
In summary, the existing surface defect detection technology has the problem that the surface defect grade number of a large batch of planar optical elements cannot be obtained in a short time.
Disclosure of Invention
In order to solve the problem that the surface defect information of a large quantity of planar optical elements cannot be acquired in a short time in the existing surface defect detection technology, the invention provides a device for quickly detecting the surface quality of the planar optical elements based on total scattering measurement, which specifically comprises a laser light source, a beam splitter, a laser beam expander, an aperture diaphragm, a high reflector, an integrating sphere, a CMOS image sensor, a light collector, a diffuse reflection plate, a photoelectric detector 1, a photoelectric detector 2, an XY two-dimensional guide rail, a two-dimensional rotating system, a Z guide rail and a planar optical element; the planar optical element is fixed on the two-dimensional rotating system, and the two-dimensional rotating system is arranged on the XY guide rails, so that multi-axis linkage of the planar optical element is realized; the CMOS image sensor is connected to an external image processor and fixed at the bottom of the integrating sphere, the integrating sphere is fixed on the Z-direction guide rail and translates along the Z-direction guide rail along the Z-axis direction, and the photoelectric detector 2 is fixed at a detection hole of the integrating sphere; the photoelectric detector 1 is arranged in a detection light path and is combined with a laser beam splitter to realize real-time monitoring of the energy of a detection light beam.
The detection device is based on the light scattering principle and is specifically represented as follows: the detection light beam emitted by the laser light source sequentially passes through the beam splitter, the laser beam expander and the high reflector and is projected on the measured plane optical element through the integrating sphere incident hole to form scattered light; the specular reflection part of the scattered light leaves the integrating sphere through the integrating sphere exit hole/sample hole and is collected by a light collector; the diffusely scattered part of the scattered light is reflected multiple times in the integrating sphere to form uniform light, which is measured by the photodetector 2.
Wherein the detection light beam is a planar monochromatic light wave; the coating material of the inner wall of the integrating sphere is highly diffuse-scattered at the wavelength of the detection light; a baffle is arranged near the detection hole in the integrating sphere, and the surface coating of the baffle is consistent with the coating material of the inner wall of the integrating sphere; the bottom of the integrating sphere is provided with a CMOS image sensor which is connected with an external image processor; a diffuse scattering plate is arranged in front of a light sensitive area of the photoelectric detector 1; the photoelectric detector 1 can select a photodiode, a photomultiplier and the like; the photodetector 2 is typically a photomultiplier tube; an aperture diaphragm is arranged in the detection light path to eliminate the stray light of the system.
The method for rapidly detecting the surface quality of the planar optical element based on total scattering measurement comprises the following steps:
step 1: the standard plate with the known surface total scattering value moves to a sample hole of the integrating sphere along with an XY guide rail, the relative positions of the standard plate and the integrating sphere in the X/Y/Z direction are adjusted, so that the centers of the standard plate and the sample hole are overlapped in the X/Y/Z direction, and an air gap between the bottom of the integrating sphere and the surface of the standard plate to be detected is observed through a CMOS image sensor, so that physical collision is avoided.
Step 2: the detection light is projected on the surface of the standard plate to generate light scattering, the energy of the detection light and the scattered light is monitored in real time through the photoelectric detector 1 and the photoelectric detector 2 and recorded as Vst1And Vst2(ii) a And then, the integrating sphere is lifted by translating the Z guide rail, and the standard plate is moved to the position where the sample to be measured is convenient to replace by an XY two-dimensional guide rail.
And step 3: the plane optical element to be measured is fixed on the two-dimensional rotating system, moves to the position of the integrating sphere sample hole along with the XY two-dimensional guide rail, and adjusts the relative position of the plane optical element to be measured and the integrating sphere in the X/Y/Z direction to enable the center of the standard plate and the center of the sample hole to coincide in the X/Y/Z direction.
And 4, step 4: the detection light beam is projected on the surface of the measured plane optical element, if the surface has no defect characteristics, scattering light is generated by surface roughness and enters an integrating sphere, and if the surface has defect characteristics, scattering light is generated by defects and roughness and enters the integrating sphere; the diffuse light forms uniform light after being diffused and reflected for multiple times in the integrating sphere, the uniform light is measured by the photoelectric detector 2, and the measured signal is recorded as Voe2(ii) a The signal synchronously measured by the photodetector 1 is denoted Voe1。
And 5: the total scattering value of the measured plane optical element surface can be calculated by:
in the formula, TSstIs the total scattering value of the standard plate.
Step 6: and extracting the surface defect grade information of the measured plane optical element according to the total scattering data of the measured surface by using a data processing method.
Further, the detection light beam should be projected on the surface of the measured plane optical element in a full aperture manner, so as to realize the rapid measurement of the total scattering of the surface of the measured plane optical element; if the aperture of the plane optical element to be measured is overlarge, the plane optical element to be measured can move along a specific track through multi-axis linkage of an XY two-dimensional guide rail and a two-dimensional rotating system, so that full-aperture scanning of the surface of the plane optical element with the large aperture to be measured is completed, and X/Y position information of each sampling point during scanning is recorded; the scanning track covers the whole surface of the measured plane optical element, and data processing of the overlapping part of the scanning light spots is considered; if the aperture of the measured plane optical element is too small, the aperture diaphragm can shield the measured plane optical element to reduce the diameter of the detection light, so that the detection light is ensured to be completely projected on the surface of the measured plane optical element.
Further, the data processing method in step 6 is provided based on domestic and foreign standards and scattering theory of surface roughness and surface defects; the domestic and foreign standards specifically comprise ISO13696, MIL-PRF-13830B, GB1185-2006, ISO10110-7, ISO10110-8 and the like; the scattering theory of the roughness comprises Rayleigh-Rice scattering theory, Beckmann-Kirchoff scattering theory, Harvey-Shack scattering theory and the like; the scattering theory of the defects specifically comprises Mie theory, Peterson defect scattering theory and the like.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort.
FIG. 1 is a schematic view of the device for rapidly detecting surface quality of a large-caliber planar optical element according to the present invention.
In the figure:
1. the device comprises a laser light source, 2. a beam splitter, 3. a laser beam expander, 4. an aperture diaphragm, 5. a high reflector, 6. a diffuse reflection plate, 7. a photoelectric detector 1, 8. a Z guide rail, 9. a high reflector, 10. an aperture diaphragm, 11. a light collector, 12. an integrating sphere entrance hole, 13. an integrating sphere exit hole, 14. an integrating sphere, 15. an integrating sphere inner wall, 16. a baffle, 17. an integrating sphere detection hole, 18. a photoelectric detector 2, 19. an integrating sphere sample hole, 20. a large-caliber plane optical element, 21. a two-dimensional rotating system, 22.XY two-dimensional guide rail and 23. a CMOS image sensor.
DETAILED DESCRIPTION OF EMBODIMENT (S) OF INVENTION
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It is to be understood that the described embodiments are merely a few embodiments of the invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, an embodiment of the present invention provides a device for rapidly detecting a surface quality of a planar optical element based on total scattering measurement, which specifically includes a laser light source, a beam splitter, a laser beam expander, an aperture stop, a high-reflectivity mirror, an integrating sphere, a CMOS image sensor, a light collector, a diffuse reflection plate, a photodetector 1, a photodetector 2, an XY two-dimensional guide rail, a two-dimensional rotation system, a Z guide rail, and a planar optical element; the planar optical element is fixed on the two-dimensional rotating system, and the two-dimensional rotating system is arranged on the XY guide rails, so that multi-axis linkage of the planar optical element is realized; the CMOS image sensor is connected to an external image processor and fixed at the bottom of the integrating sphere, the integrating sphere is fixed on the Z-direction guide rail and translates along the Z-direction guide rail along the Z-axis direction, and the photoelectric detector 2 is fixed at a detection hole of the integrating sphere; the photoelectric detector 1 is arranged in a detection light path and is combined with a laser beam splitter to realize real-time monitoring of the energy of a detection light beam.
The detection device provided by the embodiment of the invention is based on the scattering principle of light on an optical surface, and is specifically represented as follows: the detection light beam emitted by the laser light source sequentially passes through the beam splitter, the laser beam expander and the high reflector and is projected on the measured plane optical element through the integrating sphere incident hole to form scattered light; the specular reflection part of the scattered light leaves the integrating sphere through the integrating sphere exit hole/sample hole and is collected by a light collector; the diffusely scattered part of the scattered light is reflected multiple times in the integrating sphere to form uniform light, which is measured by the photodetector 2.
When the embodiment of the invention is used, the light source adopts a continuous single longitudinal mode helium-neon laser to obtain a monochromatic detection light beam with uniform energy distribution; the beam splitter separates 10% of the energy of the detection beam to enter the photoelectric detector 1; the coating on the inner wall of the integrating sphere is made of barium sulfate; the photoelectric detector 2 adopts a photomultiplier tube, and the power supply high voltage is in the range of 250V-1250V.
When the embodiment of the invention is used, the following improvement measures can be carried out: a filter is arranged in the measuring light path to eliminate stray light in the detection light beam; a chopper and a phase-locked amplifier are arranged and connected with the photoelectric detector 1 and the photoelectric detector 2 so as to enhance the reliability of the measuring signal; an attenuator with a power mechanism is arranged to expand the measurable signal range and realize automatic control of the incident energy of the detection beam. In addition, the surface of the optical element to be measured should be carefully cleaned before measurement, so as to avoid the influence of surface dust as much as possible.
When the device is used, the detection light beam is projected on the surface of the measured plane optical element in a full aperture mode so as to realize the rapid measurement of the total scattering of the surface of the measured plane optical element; when the surface roughness of the optical element of the measured plane is known, the surface defect progression can be extracted from the measured total scattering data; because the surface roughness of the planar optical elements made of the same materials and with the same calibers in the same process is similar, the detection device provided by the embodiment of the invention is more suitable for the online primary detection of the surface defect grade number of the planar optical elements made of the same materials and with the same calibers in the industrial large-scale process.
According to the embodiment of the invention, the detection method of the device for rapidly detecting the surface quality of the planar optical element based on the total scattering measurement comprises the following steps:
step 1: the standard plate with the known surface total scattering value moves to a sample hole of the integrating sphere along with an XY guide rail, the relative positions of the standard plate and the integrating sphere in the X/Y/Z direction are adjusted, so that the centers of the standard plate and the sample hole are overlapped in the X/Y/Z direction, and an air gap between the bottom of the integrating sphere and the surface of the standard plate to be detected is observed through a CMOS image sensor, so that physical collision is avoided.
Step 2: the detection light is projected on the surface of the standard plate to generate light scattering, the energy of the detection light and the scattered light is monitored in real time through the photoelectric detector 1 and the photoelectric detector 2 and recorded as Vst1And Vst2(ii) a And then, the integrating sphere is lifted by translating the Z guide rail, and the standard plate is moved to the position where the sample to be measured is convenient to replace by an XY two-dimensional guide rail.
And step 3: the plane optical element to be measured is fixed on the two-dimensional rotating system, moves to the position of the integrating sphere sample hole along with the XY two-dimensional guide rail, and adjusts the relative position of the plane optical element to be measured and the integrating sphere in the X/Y/Z direction to enable the center of the standard plate and the center of the sample hole to coincide in the X/Y/Z direction.
Step (ii) of4: the detection light beam is projected on the surface of the measured plane optical element, if the surface has no defect characteristics, scattering light is generated by surface roughness and enters an integrating sphere, and if the surface has defect characteristics, scattering light is generated by defects and roughness and enters the integrating sphere; the diffuse light forms uniform light after being diffused and reflected for multiple times in the integrating sphere, the uniform light is measured by the photoelectric detector 2, and the measured signal is recorded as Voe2(ii) a The signal synchronously measured by the photodetector 1 is denoted Voe1。
And 5: the total scattering value of the measured plane optical element surface can be calculated by:
in the formula, TSstIs the total scattering value of the standard plate.
Step 6: and extracting the surface defect grade information of the measured plane optical element according to the total scattering data of the measured surface by using a data processing method.
When the detection method is used, the data processing method in the step 6 of the detection method is given based on a Harvey-Shack scattering theory, a Peterson defect scattering theory and a domestic standard GB 1185-2006; before processing the measured total scattering data, firstly acquiring the surface roughness of the measured plane optical element; the surface roughness of the planar optical element can be measured by adopting methods such as a white light interferometer, an AFM (atomic force microscope), a contourgraph and the like; for planar optical elements with the same material and the same caliber in a large batch process, the surface roughness of any number of elements can be measured, and the average value of the surface roughness is taken. After the surface roughness of the measured planar element is known, the method for processing the measured total scattering data specifically comprises the following steps:
step 1: calculating the total scattering caused by the surface roughness of the measured plane optical element by the following formula:
wherein λ is the wavelength of incident light，θiIs the angle of incidence, σsThe surface roughness.
Step 2: the relation between the defect area and the total scattering data of the measured surface is utilized to numerically solve the total area of the defects contained in the surface of the measured plane optical element; the relationship between the defect area and the total scattering value of the measurement surface is as follows:
in the formula, TSdeIs an area of Adeλ is the wavelength of the incident light, θsIs the scattering angle, omega is the scattering space angle, AoeIs the area of the incident light spot, c1And c2The values of (A) are:
wherein D is a defect diameter and D is a probe light diameter.
And step 3: the defect grade number of the surface of the measured plane optical element is equal to the square root of the total area of the defects of the surface of the measured plane optical element.
In the embodiment of the present invention, a surface quality inspection test was performed on 6 silicon substrates having the same processing technique. In the detection, the diameter of a detection beam is phi 20mm, the wavelength is 633nm, and the incident angle is 15 degrees; the silicon wafer is planar and has a diameter of phi 25 mm. The surface roughness of the silicon substrate measured by a white light interferometer is shown in table 1:
TABLE 1 surface roughness of 6 silicon substrates of the same processing technology
| Serial number | σs/nm | Serial number | σs/nm | Serial number | σs/ |
| # | |||||
| 1 | 0.24 | #3 | 0.25 | #5 | 0.25 |
| #2 | 0.25 | #4 | 0.27 | #6 | 0.26 |
As can be seen from Table 1, the surface roughness values of the 6 silicon substrates tested are very close, with an average value of 0.25 nm.
Imaging the silicon wafer to be detected onto CCD with high resolution optical system and computer software to obtain the defect area marked as Ade1(ii) a The surface defect area of the silicon substrate to be detected, which is measured by adopting the detection device and the method thereof of the embodiment of the invention, is recorded as Ade2. A of the silicon substrate to be testedde1And Ade2The sizes are shown in Table 2.
TABLE 2 area of surface defects of 6 silicon substrates of the same lot having the same process
| Serial number | Ade1/mm2 | Ade2/mm2 | Serial number | Ade1/mm2 | Ade2/mm2 | Serial number | Ade1/mm2 | Ade2/mm2 |
| #1 | 0.0092 | 0.0088 | #3 | 0.0055 | 0.0031 | #5 | 0.0037 | 0.0026 |
| #2 | 0.0025 | 0.0017 | #4 | 0.0112 | 0.0107 | #6 | 0.0373 | 0.0318 |
As can be seen from table 2, the total surface defect area obtained by the detection apparatus and method according to the embodiment of the present invention is substantially the same as the result obtained by CCD imaging.
Claims (2)
1. The method for rapidly detecting the surface defect grade of the planar optical element based on the total scattering measurement needs to use: the system comprises a laser light source, a beam splitter, a laser beam expander, an aperture diaphragm, a high reflector, an integrating sphere, a CMOS image sensor, a light collector, a diffuse reflection plate, a photoelectric detector 1, a photoelectric detector 2, an XY two-dimensional guide rail, a two-dimensional rotating system, a Z guide rail and a planar optical element; the planar optical element is fixed on the two-dimensional rotating system, and the two-dimensional rotating system is arranged on the XY guide rails, so that multi-axis linkage of the planar optical element is realized; the CMOS image sensor is connected to an external image processor and fixed at the bottom of the integrating sphere, the integrating sphere is fixed on the Z-direction guide rail and translates along the Z-direction guide rail along the Z-axis direction, and the photoelectric detector 2 is fixed at a detection hole of the integrating sphere; the photoelectric detector 1 is arranged in a detection light path and is combined with a laser beam splitter to realize real-time monitoring of the energy of a detection light beam; in the process of rapidly detecting and detecting the grade of the surface defects, a detection light beam emitted by a laser light source sequentially passes through a beam splitter, a laser beam expander and a high reflector and is projected on the measured plane optical element through an integrating sphere incident hole to form scattered light; the specular reflection part of the scattered light leaves the integrating sphere through the integrating sphere exit hole/sample hole and is collected by a light collector; the diffuse scattering part of the scattered light is reflected for multiple times in the integrating sphere to form uniform light, and the uniform light is measured by the photoelectric detector 2;
the method is characterized by comprising the following steps:
step 1: the standard plate with the known surface total scattering value moves to an integrating sphere sample hole along an XY guide rail, the relative positions of the standard plate and the integrating sphere in the X/Y/Z direction are adjusted, so that the centers of the standard plate and the sample hole are overlapped in the X/Y/Z direction, and an air gap between the bottom of the integrating sphere and the surface of the standard plate to be detected is observed through a CMOS image sensor, so that physical collision is avoided;
step 2: the detection light is projected on the surface of the standard plate to generate light scattering, the energy of the detection light and the scattered light is monitored in real time through the photoelectric detector 1 and the photoelectric detector 2 and recorded as Vst1And Vst2(ii) a The integrating sphere is lifted by translating the Z guide rail, and the standard plate is moved to a position convenient for replacing a sample to be measured by the XY two-dimensional guide rail;
and step 3: the plane optical element to be measured is fixed on the two-dimensional rotating system, moves to the position of the sample hole of the integrating sphere along with the XY two-dimensional guide rail, and adjusts the relative position of the plane optical element to be measured and the integrating sphere in the X/Y/Z direction to ensure that the centers of the standard plate and the sample hole are superposed in the X/Y/Z direction;
and 4, step 4: the detection light beam is projected on the surface of the measured plane optical element, if the surface has no defect characteristics, scattering light is generated by surface roughness and enters an integrating sphere, and if the surface has defect characteristics, scattering light is generated by defects and roughness and enters the integrating sphere; the diffuse light forms uniform light after being diffused and reflected for multiple times in the integrating sphere, the uniform light is measured by the photoelectric detector 2, and the measured signal is recorded as Voe2(ii) a The signal synchronously measured by the photodetector 1 is denoted Voe1；
And 5: the total scattering value of the measured plane optical element surface can be calculated by:
in the formula, TSstIs the total scattering value of the standard plate;
step 6: and extracting the surface defect grade information of the measured plane optical element according to the total scattering data of the measured surface by using a data processing method. The data processing method is given based on Harvey-Shack scattering theory, Peterson defect scattering theory and domestic standard GB 1185-2006; before processing the measured total scattering data, firstly acquiring the surface roughness of the measured plane optical element; the surface roughness of the planar optical element can be measured by adopting white light interferometer, AFM and profilometer methods; for planar optical elements with the same material and the same caliber in a large batch process, the surface roughness of any number of elements can be measured, and the average value of the surface roughness is taken; after the surface roughness of the measured planar element is known, the method for processing the measured total scattering data specifically comprises the following steps:
the data processing method comprises the following steps of 1: calculating the total scattering caused by the surface roughness of the measured plane optical element by the following formula:
where λ is the wavelength of incident light and θiIs the angle of incidence, σsSurface roughness;
step 2 of the data processing method: the relation between the defect area and the total scattering data of the measured surface is utilized to numerically solve the total area of the defects contained in the surface of the measured plane optical element; the relationship between the defect area and the total scattering value of the measurement surface is as follows:
in the formula, TSdeIs an area of Adeλ is the wavelength of the incident light, θsIs the scattering angle, omega is the scattering space angle, AoeIs the area of the incident light spot, c1And c2The values of (A) are:
in the formula, D is the defect diameter, and D is the detection light diameter;
step 3 of the data processing method: the defect grade number of the surface of the measured plane optical element is equal to the square root of the total area of the defects of the surface of the measured plane optical element.
2. The method for rapidly detecting the defect grade of the surface of the plane optical element based on the total scattering measurement as claimed in claim 1, wherein the probe beam is projected on the surface of the plane optical element to be detected in a full aperture mode so as to achieve the rapid measurement of the total scattering of the surface of the plane optical element to be detected; if the aperture of the plane optical element to be measured is overlarge, the plane optical element to be measured can move along a specific track through multi-axis linkage of an XY two-dimensional guide rail and a two-dimensional rotating system, so that full-aperture scanning of the surface of the plane optical element with the large aperture to be measured is completed, and X/Y position information of each sampling point during scanning is recorded; the scanning track covers the whole surface of the measured plane optical element, and data processing of the overlapping part of the scanning light spots is considered; if the aperture of the measured plane optical element is too small, the aperture diaphragm can shield the measured plane optical element to reduce the diameter of the detection light, so that the detection light is ensured to be completely projected on the surface of the measured plane optical element.
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