CN109968551A - Principle pneumatically stable semiconductor crystal wafer cutter device is pressurized based on magnetic pole - Google Patents
Principle pneumatically stable semiconductor crystal wafer cutter device is pressurized based on magnetic pole Download PDFInfo
- Publication number
- CN109968551A CN109968551A CN201910165888.7A CN201910165888A CN109968551A CN 109968551 A CN109968551 A CN 109968551A CN 201910165888 A CN201910165888 A CN 201910165888A CN 109968551 A CN109968551 A CN 109968551A
- Authority
- CN
- China
- Prior art keywords
- magnetic pole
- pneumatically
- axle center
- semiconductor crystal
- weight box
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 24
- 239000004065 semiconductor Substances 0.000 title claims abstract description 23
- 238000005520 cutting process Methods 0.000 claims abstract description 50
- 238000001816 cooling Methods 0.000 claims abstract description 26
- 238000002347 injection Methods 0.000 claims description 12
- 239000007924 injection Substances 0.000 claims description 12
- 239000002994 raw material Substances 0.000 abstract description 13
- 239000002826 coolant Substances 0.000 abstract description 11
- 239000007788 liquid Substances 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 230000001965 increasing effect Effects 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 230000005389 magnetism Effects 0.000 description 4
- 239000010454 slate Substances 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 230000001846 repelling effect Effects 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
- B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
- B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910165888.7A CN109968551B (en) | 2019-03-06 | 2019-03-06 | Pneumatic stable semiconductor wafer cutting device based on magnetic pole pressurization principle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910165888.7A CN109968551B (en) | 2019-03-06 | 2019-03-06 | Pneumatic stable semiconductor wafer cutting device based on magnetic pole pressurization principle |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109968551A true CN109968551A (en) | 2019-07-05 |
CN109968551B CN109968551B (en) | 2021-04-09 |
Family
ID=67077899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910165888.7A Active CN109968551B (en) | 2019-03-06 | 2019-03-06 | Pneumatic stable semiconductor wafer cutting device based on magnetic pole pressurization principle |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN109968551B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020059947A1 (en) * | 2000-11-20 | 2002-05-23 | Dainippon Screen Mfg. Co., Ltd. | Substrate cleaning apparatus |
CN101590669A (en) * | 2008-05-30 | 2009-12-02 | 株式会社迪思科 | Topping machanism |
CN203527673U (en) * | 2013-11-15 | 2014-04-09 | 英利能源(中国)有限公司 | Silicon block slicer |
CN207503921U (en) * | 2017-09-26 | 2018-06-15 | 合肥新汇成微电子有限公司 | A kind of cutter device of semiconductor crystal wafer |
-
2019
- 2019-03-06 CN CN201910165888.7A patent/CN109968551B/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020059947A1 (en) * | 2000-11-20 | 2002-05-23 | Dainippon Screen Mfg. Co., Ltd. | Substrate cleaning apparatus |
CN101590669A (en) * | 2008-05-30 | 2009-12-02 | 株式会社迪思科 | Topping machanism |
CN203527673U (en) * | 2013-11-15 | 2014-04-09 | 英利能源(中国)有限公司 | Silicon block slicer |
CN207503921U (en) * | 2017-09-26 | 2018-06-15 | 合肥新汇成微电子有限公司 | A kind of cutter device of semiconductor crystal wafer |
Also Published As
Publication number | Publication date |
---|---|
CN109968551B (en) | 2021-04-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20210322 Address after: 314000 West floor, 4-7 floor, building 4, Jiaxing photovoltaic technology innovation park, 1288 Kanghe Road, Gaozhao street, Xiuzhou District, Jiaxing City, Zhejiang Province Applicant after: Zhejiang jichengxing Technology Co.,Ltd. Address before: No.30, Shengda Xinghuo Zhongchuang space, Xingxiu Road, Dongyuan Town, Taiwan investment zone, Quanzhou City, Fujian Province, 362100 Applicant before: Open cloud network science service Co.,Ltd. in Quanzhou |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Semiconductor wafer cutting device based on the principle of magnetic pole pressurization Effective date of registration: 20221116 Granted publication date: 20210409 Pledgee: Agricultural Bank of China Limited by Share Ltd. Jiaxing Economic Development Zone sub branch Pledgor: Zhejiang jichengxing Technology Co.,Ltd. Registration number: Y2022330003081 |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right |