CN109932770A - A kind of quantum dot color filter - Google Patents

A kind of quantum dot color filter Download PDF

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Publication number
CN109932770A
CN109932770A CN201711363018.8A CN201711363018A CN109932770A CN 109932770 A CN109932770 A CN 109932770A CN 201711363018 A CN201711363018 A CN 201711363018A CN 109932770 A CN109932770 A CN 109932770A
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quantum dot
gallium
indium
presoma
zinc
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杨一行
聂志文
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TCL Corp
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TCL Corp
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Abstract

The present invention discloses a kind of quantum dot color filter, pixel region in the quantum dot color filter is placed with multiple sub-pixel filter layers, the material of at least one sub-pixel filter layer includes quantum dot and the matrix for dispersing the quantum dot, the quantum dot includes quantum dot core, coat the metal layer of the quantum dot core, coat the semiconductor shell of the metal layer, wherein the metallic element in the metal layer is selected from one of Zn, Hg, Al, Ga and In or a variety of.The present invention has more efficient quanta point material luminous efficiency, the efficiency for realizing different colours light maximizes, the utilization rate of backlight can be improved, while obtaining the coloured light of higher purity, therefore the display device based on quantum dot color filter can be realized the colored display of high colour gamut and low-power consumption.

Description

A kind of quantum dot color filter
Technical field
The present invention relates to quantum dot color filter technical field more particularly to a kind of quantum dot color filters.
Background technique
Quantum dot is a kind of special material for being limited in nanometer scale in three dimensions, this significant Quantum confined effect makes quantum dot be provided with many unique nanometer properties: launch wavelength is continuously adjustable, emission wavelength is narrow, inhales Receive spectral width, luminous intensity height, fluorescence lifetime length and good biocompatibility etc..These features mark quantum dot in biology The fields such as note, FPD, solid-state lighting, photovoltaic solar all have broad application prospect.
The size of quantum dot usually at 20 nanometers hereinafter, therefore the specific surface area of quanta point material is very big, quantum dot Surface characteristic and property influence highly significant for the performance of quantum dot.There is a large amount of dangling bonds for quantum dot surface (dangling bonds), a part is connected to be added in reaction process in these dangling bonds organic ligand (such as it is organic Amine, organic carboxyl acid class, organic phosphine, mercaptan etc.), another part is then exposed to external environment, is easy to occur with external environment anti- It answers, while the dangling bonds of exposure can form defect state and defect level in band gap, this is also that nonradiative transition is caused to lose And the major reason for causing quantum dot light emitting efficiency to reduce.Therefore need to eliminate the suspension of quantum dot surface exposure as much as possible Key.Usually there are two types of methods to eliminate the dangling bonds of quantum dot surface exposure to effectively be passivated quantum dot: first is that by sudden and violent Organic ligand is connected on the dangling bonds of dew;Second is that passing through the continued growth inorganic shell layer outside exposed dangling bonds.Therefore it prepares Quantum dot with core-shell structure has become the scheme for realizing that quantum dot excellent optical property is generallyd use.
Be currently used in photoelectric field semiconductor Colloidal Quantum Dots be mostly by metallorganic pyrolyzing synthesis method come Preparation.In this approach, the reaction system of the presoma of anion and cationic presoma reaches reactant at high temperature Moment supersaturation to occur in the short time at nuclear reaction and subsequent growth response, ultimately form with excellent dimensions list The quantum dot of distributivity.
Liquid crystal display (Liquid Crystal Display, LCD) be current most widely used flat-panel monitor it One, liquid crystal display panel is the core component of liquid crystal display.Liquid crystal display panel is usually by a colored filter substrate (Color Filter Substrate, CF Substrate), a thin-film transistor array base-plate (Thin Film Transistor Array Substrate, TFT Array Substrate) and one it is configured at liquid crystal layer between two substrates (Liquid Crystal Layer) is constituted.The red of conventional color liquid crystal display, green, blue three kinds of three primary colors are benefits It is cast out with white backlight through the colored optical filtering substrates for being formed with red, green, blue color blocking, due to the transmitance of color blocking It is constantly in lower level, this kind colour display mode light source utilization rate is low, and the colour gamut of display is narrow.Using quantum dot Material can use the efficiency conversion that quantum dot conversion layer material realizes different colours light, improve light source as colored filter Utilization rate and white light performance;But transfer efficiency and power consumption of different colours light etc. are close with the luminescent properties of quantum dot itself It is related.
In the semiconductor-quantum-point material system of photoelectric field, cadmium-free quantum dots are due to not only having quantum dot excellent The characteristics of luminescence and simultaneously without heavy metal cadmium (Cd) have the characteristics that environment-friendly and green and more and more attention has been paid to.But in luminous efficiency With in very important Indexes Comparison, the performance of cadmium-free quantum dots is still in the photovoltaic applications such as luminance purity (shine peak width) It significant can lag behind classical cadmium content point system (such as CdSe).What the preparation of cadmium-free quantum dots generallyd use at present is equally Similar metallorganic, which is put, with cadmium content thermally decomposes hot injection method, it is upper similarly using nucleocapsid knot in quantum-dot structure design Color improves the luminous efficiency and stability of material of cadmium-free quantum dots.But as used in cadmium-free quantum dots core, preparation before Body type and activity etc. and difference present in cadmium content point are driven, so that shape of the cadmium-free quantum dots in core-shell structure system To realize that less crystal defect, more evenly the requirements such as size distribution can become more difficult in, this is also to cause current nothing The performance of cadmium quantum dot will lag behind the main reason for cadmium content point system significantly.
Prior art regarding to the issue above to the core-shell structure of cadmium-free quantum dots design and prepare method carried out it is excellent Change.A kind of cadmium-free quantum dots core-shell structure with non-semiconductor buffering shell is disclosed in patent US8,247,073B2, i.e., The chalcogen buffering subshell that one layer of non-semiconductor is inserted between the kernel and shell of cadmium-free quantum dots, can improve The luminescent properties of cadmium-free quantum dots.But the photoluminescence quantum yield of the embodiment effect Green cadmium-free quantum dots in the disclosure patent It is still below 50%, the peak width that shines is between 40-50 nanometers, and (green cadmium content point quantum produces compared to cadmium content point system Rate is generally 70% or more) still there is certain gap.
Therefore need further directed to cadmium-free quantum dots core-shell structure composition, presoma type and in terms of from Body feature, targetedly design is suitable for the core-shell structure and preparation method of cadmium-free quantum dots, continues to lift up cadmium-free quantum dots Luminescent properties, thus promoted the colored filter based on cadmium-free quantum dots performance and application effect.
Summary of the invention
In view of above-mentioned deficiencies of the prior art, the purpose of the present invention is to provide a kind of quantum dot color filters, it is intended to Solve the problems, such as that the luminescent properties of the existing colored filter based on cadmium-free quantum dots material are poor.
Technical scheme is as follows:
A kind of quantum dot color filter, including chromatic filter layer, the chromatic filter layer include multiple pixel regions, the picture Plain region is placed with multiple sub-pixel filter layers, wherein the material of at least one sub-pixel filter layer includes quantum dot and dispersion The matrix of the quantum dot, wherein the quantum dot includes quantum dot core, coats the metal layer of the quantum dot core, coats institute State the semiconductor shell of metal layer, wherein metallic element in the metal layer be selected from one of Zn, Hg, Al, Ga and In or It is a variety of.
The quantum dot color filter, wherein the quantum dot color filter further includes substrate, protective layer and leads Electric layer, on the substrate, the protective layer is covered on the upper surface of the chromatic filter layer, institute for the chromatic filter layer setting State the upper surface that conductive layer is covered on the protective layer;It is provided in the chromatic filter layer for separating sub-picture elements filter layer Black matrix".
The quantum dot color filter, wherein the pixel region is placed with blue subpixels filter layer, the indigo plant Quantum dot in sub-pixels filter layer is blue light quantum point, and the diameter of the quantum dot core is 2-4nm, in the metal layer Metallic element is selected from Zn or Ga.
The quantum dot color filter, wherein the pixel region is placed with red sub-pixel filter layer and green Sub-pixel filter layer, the quantum dot in the red sub-pixel filter layer is red light quantum point, and the partial size of the quantum dot core is 4-6nm, the metallic element in the metal layer are selected from Zn or Ga;Quantum dot in the green sub-pixels filter layer is green light Quantum dot, the partial size of the quantum dot core are 4-6nm, and the metallic element in the metal layer is selected from Zn or Ga.
The quantum dot color filter, wherein the material of the quantum dot core be selected from III-V group semi-conductor material or Alloy semiconductor material composed by III-V group semi-conductor material and Group II-VI semiconductor material.
The quantum dot color filter, wherein the material of the semiconductor shell is Group II-VI semiconductor material;
And/or the Group II-VI semiconductor material of the semiconductor shell be selected from ZnSe, ZnS, ZnTe, ZnSeS, ZnSeTe, One of ZnSTe, HgSe, HgS, HgTe, HgSeS, HgSeTe and HgSTe.
The quantum dot color filter, wherein the material of the quantum dot core is selected from InP or InGaP, the metal Metallic element in layer is selected from Zn or Ga.
The quantum dot color filter, wherein the material of the quantum dot core be III-V group semi-conductor material and The metallic element of alloy semiconductor material composed by Group II-VI semiconductor material, the metal layer is selected from Zn;
And/or alloy semiconductor material composed by the III-V group semi-conductor material and Group II-VI semiconductor material is selected from One of InPZnS, InPZnSe, InPZnSeS, InGaPZnSe, InGaPZnS and InGaPZnSeS.
The quantum dot color filter, wherein the matrix is one of inorganic material, organic material or more Kind.
The quantum dot color filter, wherein the matrix is one of glass, gel, polymer or a variety of.
The utility model has the advantages that the present invention provides a kind of, the semiconductor core-shell quanta dots with metal layer are filtered as quantum dot colour Quantum dot light emitting material in mating plate;The metal layer can be passivated quantum dot core surface effectively to reducing surface defect, And then enhance the luminous efficiency of quantum dot;Meanwhile the metal layer can also effectively reduce the lattice mismatch between nucleocapsid, from And further promote the luminous efficiency and dimensional homogeneity of quantum dot;The quantum dot is due to more efficient quanta point material Luminous efficiency, the efficiency for realizing different colours light maximize, and the utilization rate of backlight can be improved, while obtaining higher purity Coloured light, therefore the display device based on quantum dot color filter can be realized the colored display of high colour gamut and low-power consumption.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of quantum dot color filter of the present invention.
Fig. 2 is the structural schematic diagram in present invention pixel region.
Fig. 3 is a kind of structural schematic diagram of specific embodiment of quantum dot of the present invention.
Fig. 4 is the structural schematic diagram of quantum dot another kind specific embodiment of the present invention.
Specific embodiment
The present invention provides a kind of quantum dot color filter and preparation method, liquid crystal display panel and display device, to make this hair Bright purpose, technical solution and effect are clearer, clear, and the present invention is described in more detail below.It should be appreciated that herein Described specific embodiment is only used to explain the present invention, is not intended to limit the present invention.
Referring to figs. 1 and 2, a kind of quantum dot color filter provided by the invention, including chromatic filter layer 130, The chromatic filter layer 130 includes multiple pixel regions 131, and the pixel region is placed with multiple sub-pixel filter layer (R, G, B Sub-pixel filter layer), wherein the material of at least one sub-pixel filter layer includes quantum dot and the base for dispersing the quantum dot Matter, wherein the quantum dot includes quantum dot core, coats the metal layer of the quantum dot core, coats partly leading for the metal layer Body shell layer, wherein the metallic element in the metal layer is selected from one of Zn, Hg, Al, Ga and In or a variety of.
In the present invention, the pixel region is at least placed with red sub-pixel filter layer and green sub-pixels filter layer;Its Described in the material of red sub-pixel filter layer include quantum dot and the matrix for dispersing the quantum dot, the quantum dot is feux rouges Quantum dot, the partial size of the quantum dot core are 4-6nm, and the metallic element in the metal layer is selected from Zn or Ga;The green The material of sub-pixel filter layer includes quantum dot and the matrix for dispersing the quantum dot, and the quantum dot is green light quantum point, institute The partial size for stating quantum dot core is 4-6nm, and the metallic element in the metal layer is selected from Zn or Ga.The red sub-pixel filters Layer issues feux rouges under the excitation of backlight, and the green sub-pixels filter layer issues green light under the excitation of backlight.
In the present invention, the pixel region is additionally provided with transparent region, and the transparent region corresponds to the color of display backlight.
In the present invention, the pixel region is also placed with blue subpixels filter layer, the blue subpixels filter layer Material includes quantum dot and the matrix for dispersing the quantum dot, and the quantum dot is blue light quantum point, the quantum dot core it is straight Diameter is 2-4nm, and the metallic element in the metal layer is selected from Zn or Ga.The blue subpixels filter layer is under the excitation of backlight Issue blue light.
In the present invention, the pixel region is also placed with white sub-pixels filter layer;The white sub-pixels filter layer Material is quanta point material, and the white sub-pixels filter layer issues white light under the excitation of backlight.
In the present invention, the backlight is blue light.
In the present invention, as shown in Figure 1, the quantum dot color filter further includes substrate 140, protective layer 120 and conduction Layer 110, the chromatic filter layer 130 are arranged on the substrate 140, and the protective layer 120 is covered on the chromatic filter layer 130 upper surface, the conductive layer 110 are covered on the upper surface of the protective layer 120;It is arranged in the chromatic filter layer 130 There is the black matrix" 132 for separating sub-picture elements filter layer (R, G, B sub-pixel filter layer).
In the present invention, the structural unit of the quantum dot includes red quantum dot structural unit, green quantum-dot structure list One of member and blue quantum-dot structure unit are a variety of.
In the present invention, the quantum-dot structure unit of the red sub-pixel filter layer includes red quantum dot structural unit, The quantum-dot structure unit of the green sub-pixels filter layer includes green quantum-dot structure unit.
In the present invention, the quantum-dot structure unit random dispersion or it is dispersed in the matrix.
Specifically, the matrix can be one of inorganic material, organic material etc. or a variety of.
Preferably, the inorganic material can be glass (such as silica glass, ito glass) or gel (such as Silica hydrogel).
Preferably, the organic material can be polymer.As an example, the polymer is melamine resin, phenol Urea formaldehyde, alkyl resin, epoxy resin, polyurethane resin, maleic resin, polyamide, polymethacrylates, Polyacrylate, polycarbonate, polystyrene, polyethylene, pyrrolidones, hydroxyethyl cellulose, one in hydroxymethyl cellulose Kind, or the copolymer that the monomer including aforementioned resin is formed.
Preferably, the organic material can also be photopolymerization resin, and the photopolymerization resin can be olefin(e) acid or methyl The base resin of acryllic acid, active vinyl groups can also be the resin of light cross-coupling, generally comprise Photosensitive group, such as polyethylene cinnamic acid.Certainly, thermosetting resin also can be selected in the organic material.It is specific as wherein one Embodiment, the thermosetting resin can be the resin material comprising some scatterers, and the scatterer is metallic particles, metal One of oxide particle, air bubble, glass, polymer microballoon (solid or hollow) etc. are a variety of.
It also may include that can make the nanocrystalline (quantum dot of alloy semiconductor in the material of the sub-pixel filter layer in the present invention Structural unit) disperse nonpolar liquid therein or polar liquid.
Quantum dot of the present invention is described in detail below.
As preparation cadmium-free quantum dots and cadmium content point used in presoma type and in terms of there are bright Significant difference is different, this makes cadmium-free quantum dots that can have more crystal defects and non-uniform in the formation of core-shell structure system Size distribution, the luminescent properties of cadmium content point material are lagged far behind so as to cause the luminescent properties of cadmium-free quantum dots material.
Quantum dot of the invention, wherein the quantum dot includes quantum dot core, coats or non-fully coat the amount completely The metal layer of son point core, coats the metal layer or coats the semiconductor shell of metal layer and the quantum dot core, wherein is described Metallic element in metal layer is selected from one of Zn, Hg, Al, Ga and In or a variety of.
It is different according to the dosage for the second metal precursor being added during the preparation process, one layer of packet completely can be prepared Cover or non-fully coat the metal layer of the quantum dot core.As shown in figure 3, the quantum dot is radially from the inside to the outside successively Semiconductor shell including quantum dot core 10, the metal layer 20 of the cladding quantum dot core 10 and the cladding metal layer 20 30.The metal layer 20 is in the surface coated density of the quantum dot core 10, because before the second metal for being added during the preparation process It drives the dosage difference of body and has a certain difference, form the structure for being coated completely or non-fully coated by the metal layer, but Do not interfere the metal layer 20 in the formation on 10 surface of quantum dot core.
Preferably, the metal layer is coated on quantum dot core surface, and can be connection with the ligand on quantum dot core surface Tie is bonded with quantum dot nuclear phase, to activate the surface of quantum dot core, promotes the growth response of semiconductor shell;Meanwhile institute The metallic atom and quantum dot core stated in metal layer pass through the above-mentioned crystal structure bonded together to form, can effectively be passivated quantum dot core To reduce its surface defect, the crystal structure can also effectively reduce the crystalline substance between quantum dot core and semiconductor shell on surface Lattice mismatch, to promote the luminous efficiency and dimensional homogeneity of quantum dot.
Preferably, the material of the quantum dot core is III-V group semi-conductor material or III-V group semi-conductor material and II- Alloy semiconductor material composed by VI race semiconductor material;It is further preferred that the material of the quantum dot core is iii-v Semiconductor material, the III-V group semi-conductor material be selected from GaN, GaP, GaAs, InP, InAs, InAsP, GaAsP, InGaP, One of InGaAs, InGaAsP etc., but not limited to this;It is further preferred that the material of the quantum dot core is iii-v Alloy semiconductor material composed by semiconductor material and Group II-VI semiconductor material, the III-V group semi-conductor material are selected from One of GaN, GaP, GaAs, InP, InAs, InAsP, GaAsP, InGaP, InGaAs, InGaAsP etc., the II-VI group Semiconductor material be selected from ZnSe, ZnS, ZnTe, ZnSeS, ZnSeTe, ZnSTe, HgSe, HgS, HgTe, HgSeS, HgSeTe and One of HgSTe.As preferred citing, the alloy semiconductor material is InPZnS, InPZnSe, InPZnSeS, One of InGaPZnSe, InGaPZnS and InGaPZnSeS etc., but not limited to this.
Preferably, the material of the semiconductor shell is Group II-VI semiconductor material.It is further preferred that described partly lead The Group II-VI semiconductor material of body shell layer be selected from ZnSe, ZnS, ZnTe, ZnSeS, ZnSeTe, ZnSTe, HgSe, HgS, HgTe, One of HgSeS, HgSeTe and HgSTe.
Preferably, the glow peak wave-length coverage of the quantum dot is 400-700 nanometers.
Preferably, the peak width at half height range of the glow peak of the quantum dot is 20-100 nanometers.
In a preferred embodiment, the material of the quantum dot core is in InP or InGaP, the metal layer Metallic element be selected from Zn or Ga;Due to Zn the Ga atom in metal layer have with the InP or InGaP of quantum dot core compared with For matched element size and lattice parameter, and stronger with the binding ability of quantum dot core, therefore being capable of effectively passivated surface And reduce lattice mismatch.
It is further preferred that the quantum dot, wherein the material of the semiconductor shell be selected from ZnSe, ZnS and One of ZnSeS.At this point, the reactivity of the precursor reagent of formation semiconductor shell and reacting for the metal layer are lived Property matching it is more preferable, can achieve the effect that more effectively react activation.
In a preferred embodiment, the material of the quantum dot core is III-V group semi-conductor material and II-VI group Alloy semiconductor material composed by semiconductor material, the metallic element in the metal layer are selected from Zn.Due in metal layer Zn atom has alloy semiconductor composed by III-V group semi-conductor material and Group II-VI semiconductor material with quantum dot core The more matched element size of material and lattice parameter, and it is stronger with the binding ability of quantum dot core, therefore can be effectively blunt Change surface and reduces lattice mismatch.
It is further preferred that the quantum dot, wherein the III-V group semi-conductor material and II-VI group semiconductor material Expect composed by alloy semiconductor material be selected from InPZnS, InPZnSe, InPZnSeS, InGaPZnSe, InGaPZnS and One of InGaPZnSeS.
Still more preferably, the quantum dot, wherein the material of the semiconductor shell be selected from ZnSe, ZnS and One of ZnSeS.At this point, the reactivity of the precursor reagent of formation semiconductor shell and reacting for the metal layer are lived Property matching it is more preferable, can achieve the effect that more effectively react activation.
In a preferred embodiment, the partial size of the quantum dot is that 4-8nm is easy to cause when partial size is too big Quantum dot internal stress is too big, makes chemical bond rupture in crystal, forms lattice defect, influences to shine.
It is further preferred that the quantum dot is blue light quantum point, the partial size of the quantum dot core is 2-4nm, the gold The metallic element belonged in layer is selected from Zn or Ga.Precursor reagent due to forming metal layer has high reactivity, uses These precursor reagents can also increase the growth rate of semiconductor shell while generating metal layer, to be quickly generated Semiconductor shell, effectively inhibit quantum dot core grow up and corresponding red shift of wavelength.
It is another it is further preferred that the quantum dot be red light quantum point or green light quantum point, the quantum dot core Partial size is 4-6nm, and the metallic element in the metal layer is selected from Zn or Ga.Precursor reagent due to forming metal layer has Low reactivity, using these precursor reagents while generating metal layer can also slowing down shell growth Rate, to allow quantum dot core to there is the sufficient time to grow up and realize corresponding red shift of wavelength to green or red band.
In a preferred embodiment, quantum dot of the invention, wherein the quantum dot includes quantum dot core, packet The first metal layer for covering the quantum dot core coats the first semiconductor shell of the first metal layer, further includes coating completely The second metal layer of the first semiconductor shell coats the second semiconductor shell of the second metal layer;Wherein, described The metallic element in metallic element and second metal layer in one metal layer is selected from one of Zn, Hg, Al, Ga and In or more Kind.
The metallic element in metallic element and second metal layer in the first metal layer be selected from Zn, Hg, Al, Ga and One of In or a variety of, that is to say, that the first metal layer is identical with material ranges selected by second metal layer.It needs Bright, the first metal layer and the second metal layer can select identical material in above-mentioned material range, can also be with Select material different in above-mentioned material range.
It is different according to the dosage for the second metal precursor being added during the preparation process, it can be prepared the quantum Point core coats completely or non-fully coats the first metal layer.Likewise, according to the second metal front being added during the preparation process The dosage of body is different, and the second metal that the first semiconductor shell is coated completely or non-fully coated can be prepared Layer.As shown in figure 4, the quantum dot radially successively includes quantum dot core 10, the cladding quantum dot core from the inside to the outside 10 the first metal layer 20 and the first semiconductor shell 30, cladding first semiconductor of the cladding the first metal layer 20 The second metal layer 40 of shell 30 and the second semiconductor shell 50 of the cladding second metal layer 40.The first metal layer 20 in the surface coated density of the quantum dot core 10, because the dosage for the second metal precursor being added during the preparation process is different And it has a certain difference, but do not interfere the first metal layer 20 in the formation on 10 surface of quantum dot core.Described second Metal layer 40 is in the surface coated density of the first semiconductor shell 30, because of the second metal front being added during the preparation process The dosage of body is different and has a certain difference, but does not interfere the second metal layer 40 in 30 table of the first semiconductor shell The formation in face.
Preferably, the first metal layer is coated on quantum dot core surface, and can be with the ligand on quantum dot core surface Connection tie is bonded with quantum dot nuclear phase, to activate the surface of quantum dot core, promotes the growth response of the first semiconductor shell; Meanwhile the metallic atom in the first metal layer can bond together to form crystal structure, the crystalline substance by above-mentioned with quantum dot core Body structure can be passivated quantum dot core surface effectively to reduce its surface defect, and the crystal structure can also the amount of effectively reducing Lattice mismatch between son point core and the first semiconductor shell, to promote the luminous efficiency and dimensional homogeneity of quantum dot.Into One step, the second metal layer is coated on outside the first semiconductor shell, and can effectively be passivated the first semiconductor shell table Face enhances the luminous efficiency of quantum dot to reduce its surface defect, and the metallic atom in the second metal layer can also It is enough to pass through chemical bonded refractory with the anion of the first semiconductor shell outer surface and the anion of the second semiconductor shell inner surface Conjunction forms crystal structure, and the crystal structure can further reduce the lattice mismatch between quantum dot nucleocapsid, thus into one Step ground promotes the luminous efficiency and dimensional homogeneity of quantum dot.
Preferably, the material of the quantum dot core is III-V group semi-conductor material or III-V group semi-conductor material and II- Alloy semiconductor material composed by VI race semiconductor material;It is further preferred that the material of the quantum dot core is iii-v Semiconductor material, the III-V group semi-conductor material be selected from GaN, GaP, GaAs, InP, InAs, InAsP, GaAsP, InGaP, One of InGaAs, InGaAsP etc., but not limited to this;It is further preferred that the material of the quantum dot core is iii-v Alloy semiconductor material composed by semiconductor material and Group II-VI semiconductor material, the III-V group semi-conductor material are selected from One of GaN, GaP, GaAs, InP, InAs, InAsP, GaAsP, InGaP, InGaAs, InGaAsP etc., the II-VI group Semiconductor material be selected from ZnSe, ZnS, ZnTe, ZnSeS, ZnSeTe, ZnSTe, HgSe, HgS, HgTe, HgSeS, HgSeTe and One of HgSTe.As preferred citing, the alloy semiconductor material is InPZnS, InPZnSe, InPZnSeS, One of InGaPZnSe, InGaPZnS and InGaPZnSeS etc., but not limited to this.
Preferably, the material of the material of the first semiconductor shell and the second semiconductor shell is selected from II-VI Race's semiconductor material.It is further preferred that the Group II-VI semiconductor material be selected from ZnSe, ZnS, ZnTe, ZnSeS, One of ZnSeTe, ZnSTe, HgSe, HgS, HgTe, HgSeS, HgSeTe and HgSTe.That is, described the first half lead Body shell layer is identical as material ranges selected by the second semiconductor shell.It should be noted that the first semiconductor shell Selected Group II-VI semiconductor material can phase with Group II-VI semiconductor material selected by the second semiconductor shell Together, it can also be different.
Preferably, the glow peak wave-length coverage of the quantum dot is 400-700 nanometers.
Preferably, the peak width at half height range of the glow peak of the quantum dot is 20-100 nanometers.
Preferably, the partial size of the quantum dot is 4-10nm, and selecting the particle size is easy to cause since partial size is too big Quantum dot internal stress is too big, makes chemical bond rupture in crystal, forms lattice defect, influences to shine.
Preferably, the material of the quantum dot core is selected from InP or InGaP, the first metal layer and second metal Metallic element in layer is selected from Zn or Ga;It is further preferred that the quantum dot, wherein the first semiconductor shell The material of material and the second semiconductor shell is selected from one of ZnSe, ZnS and ZnSeS.
Preferably, the material of the quantum dot core is made of III-V group semi-conductor material and Group II-VI semiconductor material Alloy semiconductor material, the metallic element in the first metal layer and the second metal layer is selected from Zn.Further preferably , the quantum dot, wherein alloy composed by the III-V group semi-conductor material and Group II-VI semiconductor material is partly led Body material is selected from one of InPZnS, InPZnSe, InPZnSeS, InGaPZnSe, InGaPZnS and InGaPZnSeS.Into one Step is preferred, the quantum dot, wherein the material of the material of the first semiconductor shell and the second semiconductor shell selects From one of ZnSe, ZnS and ZnSeS.
Preferably, the partial size of the quantum dot is that 4-8nm is easy to cause quantum dot internal stress too big when partial size is too big, Make chemical bond rupture in crystal, forms lattice defect, influence to shine.It is further preferred that the quantum dot is blue light quantum point, The partial size of the quantum dot core is 2-4nm, and the metallic element in the first metal layer and second metal layer is selected from Zn or Ga.It is excellent Choosing, the quantum dot is red light quantum point or green light quantum point, and the partial size of the quantum dot core is 4-6nm, described first Metallic element in metal layer and second metal layer is selected from Zn or Ga.
The present invention also provides a kind of preparation methods of quantum dot, include the following steps:
In the reaction system containing dispersing agent and solvent, make nonmetallic presoma and the first metal front precursor reactant forming amount Point core solution;
The second metal precursor is added into the quantum dot core solution, in quantum dot core forming metal layer on surface;
Semiconductor shell is formed in the layer on surface of metal;
Wherein, second metal precursor be selected from the presoma of Zn element, the presoma of Hg element, Al element presoma, One of presoma of the presoma of Ga element and In element is a variety of.
The quantum dot being prepared using the method for the invention is formed on quantum dot core surface and coats the quantum dot core Metal layer, the metal layer can with the ligand on quantum dot core surface be connection tie be bonded with quantum dot nuclear phase, thus work Change the surface of quantum dot core, promotes the growth response of semiconductor shell;Meanwhile metallic atom and quantum dot in the metal layer Core can be passivated quantum dot core surface effectively to reduce its surface defect by the above-mentioned crystal structure bonded together to form, described The lattice that crystal structure can also effectively reduce between quantum dot core and semiconductor shell is adapted to, to promote shining for quantum dot Efficiency and dimensional homogeneity.
Preferably, the preparation method of the quantum dot, in the layer on surface of metal or the quantum dot core and metal Layer surface was formed in the step of semiconductor shell, and the material of the semiconductor shell is selected from Group II-VI semiconductor material.Further Preferably, the material of the semiconductor shell is selected from one of ZnSe, ZnS and ZnSeS.
Preferably, the preparation method of the quantum dot forms nonmetallic presoma and the first metal front precursor reactant In the step of quantum dot core solution, the nonmetallic presoma is the presoma of V group element, and first metal precursor is The presoma of group-III element.
Specifically, the presoma of the group-III element includes: aluminum phosphate (aluminum phosphate), aluminum acetate (aluminum acetate), aluminium acetylacetonate (aluminum acetylacetonate), silver iodide (aluminum Iodide), aluminium bromide (aluminum bromide), aluminium chloride (aluminum chloride), aluminum fluoride (aluminum Fluoride), aluminium carbonate (aluminum carbonate), cyaniding aluminium (aluminum cyanide), aluminum nitrate (aluminum Nitrate), aluminium oxide (aluminum oxide), peroxidating aluminium (aluminum peroxide), aluminum sulfate (aluminum Sulfate), aluminum oleate (aluminum oleate), aluminum stearate (aluminum stearate), tetradecanoic acid aluminium (aluminum myristate), aluminum palmitate (aluminum palmitate), phosphoric acid gallium (gallium Phosphate), acetic acid gallium (gallium acetate), acetylacetone,2,4-pentanedione gallium (gallium acetylacetonate), gallium iodide (gallium iodide), gallium bromide (gallium bromide), gallium chloride (gallium chloride), gallium fluoride (gallium fluoride), carbonic acid gallium (gallium carbonate), cyaniding gallium (gallium cyanide), gallium nitrate (gallium nitrate), gallium oxide (gallium oxide), peroxidating gallium (gallium peroxide), gallium sulfate (gallium sulfate), oleic acid gallium (gallium oleate), stearic acid gallium (gallium stearate), tetradecanoic acid Gallium (gallium myristate), hexadecanoic acid gallium (gallium palmitate), indium phosphate (indium phosphate), Indium acetate (indium acetate), Indium Tris acetylacetonate (indium acetylacetonate), indium iodide (indium Iodide), indium bromide (indium bromide), inidum chloride (indium chloride), indium (indium Fluoride), carbonic acid indium (indium carbonate), cyaniding indium (indium cyanide), indium nitrate (indium Nitrate), indium oxide (indium oxide), peroxidating indium (indium peroxide), indium sulfate (indium Sulfate), oleic acid indium (indium oleate), stearic acid indium (indium stearate), tetradecanoic acid indium (indium Myristate), at least one of hexadecanoic acid indium (indium palmitate) etc., but not limited to this.
Specifically, the presoma of the V group element includes: tris-trimethylsilyl phosphine, alkyl Phosphines (such as triethyl phosphine, tributyl phosphine, trioctyl phosphine, Triphenyl phosphine, tricyclohexyl phosphine), arsenic iodide (aluminum iodide), arsenic bromide (aluminum bromide), arsenic chloride (arsenic chloride), arsenic oxide arsenoxide (aluminum oxide), arsenic sulfate (aluminum sulfate), nitric oxide (nitric oxide), nitric acid (nitric acid), ammonium nitrate (ammonium At least one of nitrate) etc., but not limited to this.
It is further preferred that the presoma of the V group element is selected from the presoma of N element, the presoma of P element and As member One of presoma of element is a variety of, before the presoma of the group-III element is selected from the presoma and In element of Ga element Drive one or both of body.
Specifically, the presoma of the N element includes: nitric oxide (nitric oxide), nitric acid (nitric acid) At least one of with ammonium nitrate (ammonium nitrate) etc., but not limited to this.The presoma of the P element includes three (trimethyl silicon substrate) phosphate (tris(trimethylsilyl) phosphine) or alkyl phosphine compound (alkyl Phosphines) (such as triethyl phosphine (triethyl phosphine), tributyl phosphorus (tributyl phosphine), three N-octyl phosphorus (trioctyl phosphine), triphenylphosphine (triphenyl phosphine) and tricyclohexyl phosphine (tricyclohexyl phosphine)), but not limited to this.The presoma of the As element includes arsenic iodide (aluminum Iodide), arsenic bromide (aluminum bromide), arsenic chloride (arsenic chloride), arsenic oxide arsenoxide (aluminum Oxide) and at least one of arsenic sulfate (aluminum sulfate) etc., but not limited to this.
Specifically, the presoma of the Ga element includes: phosphoric acid gallium (gallium phosphate), acetic acid gallium (gallium acetate), acetylacetone,2,4-pentanedione gallium (gallium acetylacetonate), gallium iodide (gallium iodide), Gallium bromide (gallium bromide), gallium chloride (gallium chloride), gallium fluoride (gallium fluoride), carbon Sour gallium (gallium carbonate), cyaniding gallium (gallium cyanide), gallium nitrate (gallium nitrate), oxidation Gallium (gallium oxide), peroxidating gallium (gallium peroxide), gallium sulfate (gallium sulfate), oleic acid gallium (gallium oleate), stearic acid gallium (gallium stearate), tetradecanoic acid gallium (gallium myristate) and ten Six alkanoic acid galliums (gallium palmitate), but not limited to this.The presoma of the In element includes indium phosphate (indium Phosphate), indium acetate (indium acetate), Indium Tris acetylacetonate (indium acetylacetonate), indium iodide (indium iodide), indium bromide (indium bromide), inidum chloride (indium chloride), indium (indium Fluoride), carbonic acid indium (indium carbonate), cyaniding indium (indium cyanide), indium nitrate (indium Nitrate), indium oxide (indium oxide), peroxidating indium (indium peroxide), indium sulfate (indium Sulfate), oleic acid indium (indium oleate), stearic acid indium (indium stearate), tetradecanoic acid indium (indium Myristate), at least one of hexadecanoic acid indium (indium palmitate) etc., but not limited to this.
Preferably, the preparation method of the quantum dot forms nonmetallic presoma and the first metal front precursor reactant In the step of quantum dot core solution, the nonmetallic presoma be V group element presoma and VI race element presoma, it is described First metal precursor is the presoma of group-III element and the presoma of II race element.
Specifically, the presoma of the V group element includes: tris-trimethylsilyl phosphine, alkyl Phosphines (such as triethyl phosphine, tributyl phosphine, trioctyl phosphine, Triphenyl phosphine, tricyclohexyl phosphine), arsenic iodide (aluminum iodide), arsenic bromide (aluminum bromide), arsenic chloride (arsenic chloride), arsenic oxide arsenoxide (aluminum oxide), arsenic sulfate (aluminum sulfate), nitric oxide (nitric oxide), nitric acid (nitric acid), ammonium nitrate (ammonium At least one of nitrate) etc., but not limited to this.
Specifically, the presoma of VI race element includes: that Te, Se, S element and some organic matters are formed by chemical combination Object, specially Se-TOP, Se-TBP, Se-TPP, Se-ODE, Se-OA (selenium-oleic acid), Se-ODA (selenium-octadecylamine)、Se-TOA (selenium-trioctylamine)、Se-ODPA (selenium- octadecylphosphonic acid)、Se-OLA (selenium-oleylamine)、Se-OCA (selenium- octylamine)、Te-TOP、Te-TBP、Te-TPP、Te-ODE、Te-OA、Te-ODA、Te-TOA、Te-ODPA、Te-OLA、 Te-OCA, S-TOP, S-TBP, S-TPP, S-ODE, S-OA, S-ODA, S-TOA, S-ODPA, S-OLA, S-OCA, alkyl hydrosulfide (such as hexyl mercaptan (hexanethiol), spicy thioalcohol (octanethiol), decyl mercaptan (decanethiol), lauryl mercaptan (dodecanethiol) and hexadecyl mercaptan (hexadecanethiol)), mercapto propyl silane At least one of (mercaptopropylsilane) etc., but not limited to this.
Specifically, the presoma of the group-III element includes: aluminum phosphate (aluminum phosphate), aluminum acetate (aluminum acetate), aluminium acetylacetonate (aluminum acetylacetonate), silver iodide (aluminum Iodide), aluminium bromide (aluminum bromide), aluminium chloride (aluminum chloride), aluminum fluoride (aluminum Fluoride), aluminium carbonate (aluminum carbonate), cyaniding aluminium (aluminum cyanide), aluminum nitrate (aluminum Nitrate), aluminium oxide (aluminum oxide), peroxidating aluminium (aluminum peroxide), aluminum sulfate (aluminum Sulfate), aluminum oleate (aluminum oleate), aluminum stearate (aluminum stearate), tetradecanoic acid aluminium (aluminum myristate), aluminum palmitate (aluminum palmitate), phosphoric acid gallium (gallium Phosphate), acetic acid gallium (gallium acetate), acetylacetone,2,4-pentanedione gallium (gallium acetylacetonate), gallium iodide (gallium iodide), gallium bromide (gallium bromide), gallium chloride (gallium chloride), gallium fluoride (gallium fluoride), carbonic acid gallium (gallium carbonate), cyaniding gallium (gallium cyanide), gallium nitrate (gallium nitrate), gallium oxide (gallium oxide), peroxidating gallium (gallium peroxide), gallium sulfate (gallium sulfate), oleic acid gallium (gallium oleate), stearic acid gallium (gallium stearate), tetradecanoic acid Gallium (gallium myristate), hexadecanoic acid gallium (gallium palmitate), indium phosphate (indium phosphate), Indium acetate (indium acetate), Indium Tris acetylacetonate (indium acetylacetonate), indium iodide (indium Iodide), indium bromide (indium bromide), inidum chloride (indium chloride), indium (indium Fluoride), carbonic acid indium (indium carbonate), cyaniding indium (indium cyanide), indium nitrate (indium Nitrate), indium oxide (indium oxide), peroxidating indium (indium peroxide), indium sulfate (indium Sulfate), oleic acid indium (indium oleate), stearic acid indium (indium stearate), tetradecanoic acid indium (indium Myristate), at least one of hexadecanoic acid indium (indium palmitate) etc., but not limited to this.
Specifically, the presoma of II race element includes: zinc methide (dimethyl Zinc), diethyl zinc (diethyl Zinc), zinc acetate (Zinc acetate), zinc acetylacetonate (Zinc acetylacetonate), zinc iodide (Zinc iodide), zinc bromide (Zinc bromide), zinc chloride (Zinc chloride), zinc fluoride (Zinc Fluoride), zinc carbonate (Zinc carbonate), zinc cyanide (Zinc cyanide), zinc nitrate (Zinc nitrate), oxygen Change zinc (Zinc oxide), zinc peroxide (Zinc peroxide), zinc perchlorate (Zinc perchlorate), zinc sulfate (Zinc sulfate), zinc oleate (Zinc oleate), zinc stearate (Zinc stearate), dimethylmercury (dimethyl Mercury), dimethylmercury (diethyl mercury), mercuric acetate (mercury acetate), acetylacetone,2,4-pentanedione mercury (mercury Acetylacetonate), mercuric iodixde (mercury iodide), mercuric bromide (mercury bromide), mercury chloride (mercury chloride), mercuric fluoride (mercury fluoride), carbonic acid mercury (mercury carbonate), mercuric nitrate (mercury nitrate), mercury oxide (mercury oxide), mercuric perchlorate (mercury perchlorate), mercuric phosphate (mercury phosphide), mercuric sulfate (mercury sulfate), mercuric oleate (mercury oleate) and mercuric stearte It is one of (mercury stearate) or a variety of, but not limited to this.
It is further preferred that the preparation method of the quantum dot, before the presoma of the V group element is selected from N element Drive one of presoma of body, the presoma of P element and As element or a variety of;The presoma of VI race element is selected from Se member One of presoma of the presoma of element, the presoma of S element and Te element is a variety of;The presoma of the group-III element One or both of presoma and the presoma of In element selected from Ga element;The presoma of II race element is selected from Zn member One of plain presoma of presoma and Hg element is a variety of.
Specifically, the presoma of the N element includes: nitric oxide (nitric oxide), nitric acid (nitric acid) At least one of with ammonium nitrate (ammonium nitrate) etc., but not limited to this.The presoma of the P element includes three (trimethyl silicon substrate) phosphate (tris(trimethylsilyl) phosphine) or alkyl phosphine compound (alkyl Phosphines) (such as triethyl phosphine (triethyl phosphine), tributyl phosphorus (tributyl phosphine), three N-octyl phosphorus (trioctyl phosphine), triphenylphosphine (triphenyl phosphine) and tricyclohexyl phosphine (tricyclohexyl phosphine)), but not limited to this.The presoma of the As element includes arsenic iodide (aluminum Iodide), arsenic bromide (aluminum bromide), arsenic chloride (arsenic chloride), arsenic oxide arsenoxide (aluminum Oxide) and at least one of arsenic sulfate (aluminum sulfate) etc., but not limited to this.
The presoma of the Se element is that Se element and some organic matters are formed by compound, specifically, the Se is first The presoma of element includes Se-TOP, Se-TBP, Se-TPP, Se-ODE, Se-OA (selenium-oleic acid), Se-ODA (selenium-octadecylamine)、Se-TOA (selenium-trioctylamine)、Se-ODPA (selenium- octadecylphosphonic acid)、Se-OLA (selenium-oleylamine)、Se-OCA (selenium- At least one of octylamine) etc., but not limited to this.The presoma of the S element is S element and some organic matter institutes The compound of formation, specifically, the presoma of the S element include S-TOP, S-TBP, S-TPP, S-ODE, S-OA, S-ODA, S-TOA, S-ODPA, S-OLA, S-OCA, alkyl hydrosulfide (such as hexyl mercaptan (hexanethiol), spicy thioalcohol (octanethiol), decyl mercaptan (decanethiol), lauryl mercaptan (dodecanethiol) and hexadecyl mercaptan At least one of (hexadecanethiol)), mercapto propyl silane (mercaptopropylsilane)) etc., but be not limited to This.The presoma of the Te element is that Te element and some organic matters are formed by compound, specifically, before the Te element Driving body includes Te-TOP, Te-TBP, Te-TPP, Te-ODE, Te-OA, Te-ODA, Te-TOA, Te-ODPA, Te-OLA, Te-OCA At least one of Deng, but not limited to this.
Specifically, the presoma of the Ga element includes: phosphoric acid gallium (gallium phosphate), acetic acid gallium (gallium acetate), acetylacetone,2,4-pentanedione gallium (gallium acetylacetonate), gallium iodide (gallium iodide), Gallium bromide (gallium bromide), gallium chloride (gallium chloride), gallium fluoride (gallium fluoride), carbon Sour gallium (gallium carbonate), cyaniding gallium (gallium cyanide), gallium nitrate (gallium nitrate), oxidation Gallium (gallium oxide), peroxidating gallium (gallium peroxide), gallium sulfate (gallium sulfate), oleic acid gallium (gallium oleate), stearic acid gallium (gallium stearate), tetradecanoic acid gallium (gallium myristate) and ten Six alkanoic acid galliums (gallium palmitate), but not limited to this.The presoma of the In element includes indium phosphate (indium Phosphate), indium acetate (indium acetate), Indium Tris acetylacetonate (indium acetylacetonate), indium iodide (indium iodide), indium bromide (indium bromide), inidum chloride (indium chloride), indium (indium Fluoride), carbonic acid indium (indium carbonate), cyaniding indium (indium cyanide), indium nitrate (indium Nitrate), indium oxide (indium oxide), peroxidating indium (indium peroxide), indium sulfate (indium Sulfate), oleic acid indium (indium oleate), stearic acid indium (indium stearate), tetradecanoic acid indium (indium Myristate), at least one of hexadecanoic acid indium (indium palmitate) etc., but not limited to this.
The presoma of the Zn element include zinc methide (dimethyl Zinc), diethyl zinc (diethyl Zinc), Zinc acetate (Zinc acetate), zinc acetylacetonate (Zinc acetylacetonate), zinc iodide (Zinc iodide), bromine Change zinc (Zinc bromide), zinc chloride (Zinc chloride), zinc fluoride (Zinc fluoride), zinc carbonate (Zinc Carbonate), zinc cyanide (Zinc cyanide), zinc nitrate (Zinc nitrate), zinc oxide (Zinc oxide), peroxide Change zinc (Zinc peroxide), zinc perchlorate (Zinc perchlorate), zinc sulfate (Zinc sulfate), zinc oleate At least one of (Zinc oleate), zinc stearate (Zinc stearate) etc., but not limited to this.Before the Hg element Driving body includes dimethylmercury (dimethyl mercury), dimethylmercury (diethyl mercury), mercuric acetate (mercury Acetate), acetylacetone,2,4-pentanedione mercury (mercury acetylacetonate), mercuric iodixde (mercury iodide), mercuric bromide (mercury bromide), mercury chloride (mercury chloride), mercuric fluoride (mercury fluoride), carbonic acid mercury (mercury carbonate), mercuric nitrate (mercury nitrate), mercury oxide (mercury oxide), mercuric perchlorate (mercury perchlorate), mercuric phosphate (mercury phosphide), mercuric sulfate (mercury sulfate), oleic acid At least one of mercury (mercury oleate) and mercuric stearte (mercury stearate) etc., but not limited to this.
In a preferred embodiment, the preparation method of the quantum dot makes nonmetallic presoma and the first gold medal In the step of belonging to forerunner's precursor reactant forming amount point core solution, the nonmetallic presoma is selected from the presoma of P element, and described the One metal precursor is selected from one or both of presoma and presoma of In element of Ga element;It is molten to the quantum dot core The second metal precursor is added in liquid, in quantum dot core forming metal layer on surface step, second metal precursor is selected from The presoma of Zn element or the presoma of Ga element.
Specifically, the presoma of the P element includes: three (trimethyl silicon substrate) phosphate (tris (trimethylsilyl) phosphine) or alkyl phosphine compound (alkyl phosphines) (such as triethyl phosphine (triethyl phosphine), tributyl phosphorus (tributyl phosphine), three n-octyl phosphorus (trioctyl Phosphine), triphenylphosphine (triphenyl phosphine) and tricyclohexyl phosphine (tricyclohexyl Phosphine)), but not limited to this.
Specifically, the presoma of the Ga element includes: phosphoric acid gallium (gallium phosphate), acetic acid gallium (gallium acetate), acetylacetone,2,4-pentanedione gallium (gallium acetylacetonate), gallium iodide (gallium iodide), Gallium bromide (gallium bromide), gallium chloride (gallium chloride), gallium fluoride (gallium fluoride), carbon Sour gallium (gallium carbonate), cyaniding gallium (gallium cyanide), gallium nitrate (gallium nitrate), oxidation Gallium (gallium oxide), peroxidating gallium (gallium peroxide), gallium sulfate (gallium sulfate), oleic acid gallium (gallium oleate), stearic acid gallium (gallium stearate), tetradecanoic acid gallium (gallium myristate) and ten Six alkanoic acid galliums (gallium palmitate), but not limited to this.The presoma of the In element includes indium phosphate (indium Phosphate), indium acetate (indium acetate), Indium Tris acetylacetonate (indium acetylacetonate), indium iodide (indium iodide), indium bromide (indium bromide), inidum chloride (indium chloride), indium (indium Fluoride), carbonic acid indium (indium carbonate), cyaniding indium (indium cyanide), indium nitrate (indium Nitrate), indium oxide (indium oxide), peroxidating indium (indium peroxide), indium sulfate (indium Sulfate), oleic acid indium (indium oleate), stearic acid indium (indium stearate), tetradecanoic acid indium (indium Myristate), at least one of hexadecanoic acid indium (indium palmitate) etc., but not limited to this.
Specifically, the presoma of the Zn element includes: zinc methide (dimethyl Zinc), diethyl zinc (diethyl Zinc), zinc acetate (Zinc acetate), zinc acetylacetonate (Zinc acetylacetonate), zinc iodide (Zinc iodide), zinc bromide (Zinc bromide), zinc chloride (Zinc chloride), zinc fluoride (Zinc Fluoride), zinc carbonate (Zinc carbonate), zinc cyanide (Zinc cyanide), zinc nitrate (Zinc nitrate), oxygen Change zinc (Zinc oxide), zinc peroxide (Zinc peroxide), zinc perchlorate (Zinc perchlorate), zinc sulfate At least one of (Zinc sulfate), zinc oleate (Zinc oleate), zinc stearate (Zinc stearate) etc., but not It is limited to this.
In a preferred embodiment, the preparation method of the quantum dot makes nonmetallic presoma and first In the step of metal front precursor reactant forming amount sub- point core solution, the nonmetallic presoma is presoma, the S element of P element Presoma and Se elemental precursor;First metal precursor be group-III element presoma and Zn element presoma, Wherein the presoma of the group-III element is the presoma of In element or before the presoma of the group-III element is In element Drive the presoma of body and Ga element;The second metal precursor is added into the quantum dot core solution, in quantum dot core surface shape At in metal layer step, second metal precursor is selected from the presoma of Zn element.
Specifically, the presoma of the P element includes: three (trimethyl silicon substrate) phosphate (tris (trimethylsilyl) phosphine) or alkyl phosphine compound (alkyl phosphines) (such as triethyl phosphine (triethyl phosphine), tributyl phosphorus (tributyl phosphine), three n-octyl phosphorus (trioctyl Phosphine), triphenylphosphine (triphenyl phosphine) and tricyclohexyl phosphine (tricyclohexyl Phosphine)), but not limited to this.The presoma of the S element is that S element and some organic matters are formed by compound, is had Body, the presoma of the S element includes S-TOP, S-TBP, S-TPP, S-ODE, S-OA, S-ODA, S-TOA, S-ODPA, S- OLA, S-OCA, alkyl hydrosulfide (such as hexyl mercaptan (hexanethiol), spicy thioalcohol (octanethiol), decyl mercaptan (decanethiol), lauryl mercaptan (dodecanethiol) and hexadecyl mercaptan (hexadecanethiol)), mercapto At least one of propyl silane (mercaptopropylsilane)) etc., but not limited to this.The presoma of the Se element is Se element and some organic matters are formed by compound, specifically, the presoma of the Se element include Se-TOP, Se-TBP, Se-TPP、Se-ODE、Se-OA (selenium-oleic acid)、Se-ODA (selenium-octadecylamine)、 Se-TOA (selenium-trioctylamine)、Se-ODPA (selenium-octadecylphosphonic acid)、 At least one of Se-OLA (selenium-oleylamine), Se-OCA (selenium-octylamine) etc., but not It is limited to this.
Specifically, the presoma of the Zn element includes: zinc methide (dimethyl Zinc), diethyl zinc (diethyl Zinc), zinc acetate (Zinc acetate), zinc acetylacetonate (Zinc acetylacetonate), zinc iodide (Zinc iodide), zinc bromide (Zinc bromide), zinc chloride (Zinc chloride), zinc fluoride (Zinc Fluoride), zinc carbonate (Zinc carbonate), zinc cyanide (Zinc cyanide), zinc nitrate (Zinc nitrate), oxygen Change zinc (Zinc oxide), zinc peroxide (Zinc peroxide), zinc perchlorate (Zinc perchlorate), zinc sulfate At least one of (Zinc sulfate), zinc oleate (Zinc oleate), zinc stearate (Zinc stearate) etc., but not It is limited to this.The presoma of the In element include indium phosphate (indium phosphate), indium acetate (indium acetate), Indium Tris acetylacetonate (indium acetylacetonate), indium iodide (indium iodide), indium bromide (indium Bromide), inidum chloride (indium chloride), indium (indium fluoride), carbonic acid indium (indium Carbonate), cyaniding indium (indium cyanide), indium nitrate (indium nitrate), indium oxide (indium Oxide), peroxidating indium (indium peroxide), indium sulfate (indium sulfate), oleic acid indium (indium Oleate), stearic acid indium (indium stearate), tetradecanoic acid indium (indium myristate), hexadecanoic acid indium At least one of (indium palmitate) etc., but not limited to this.The presoma of the Ga element includes phosphoric acid gallium (gallium phosphate), acetic acid gallium (gallium acetate), acetylacetone,2,4-pentanedione gallium (gallium Acetylacetonate), gallium iodide (gallium iodide), gallium bromide (gallium bromide), gallium chloride (gallium chloride), gallium fluoride (gallium fluoride), carbonic acid gallium (gallium carbonate), cyaniding gallium (gallium cyanide), gallium nitrate (gallium nitrate), gallium oxide (gallium oxide), peroxidating gallium (gallium peroxide), gallium sulfate (gallium sulfate), oleic acid gallium (gallium oleate), stearic acid gallium (gallium stearate), tetradecanoic acid gallium (gallium myristate) and hexadecanoic acid gallium (gallium Palmitate), but not limited to this.
In a preferred embodiment, the preparation method of the quantum dot makes nonmetallic presoma and the first gold medal In the step of belonging to forerunner's precursor reactant forming amount point core solution, the partial size for the quantum dot core being prepared is less than or equal to 4nm;It is described The second metal precursor is added in quantum dot core solution, the quantum dot core forming metal layer on surface the step of in, second gold medal Belong to presoma and be selected from the presoma of Zn element or the presoma of Ga element, the presoma of the Zn element is selected from zinc iodide, acetic acid One of zinc and diethyl zinc are a variety of, the presoma of the Ga element be selected from gallium iodide, gallium chloride and acetic acid gallium it is a kind of or It is a variety of.
In a preferred embodiment, the preparation method of the quantum dot makes nonmetallic presoma and the first gold medal In the step of belonging to forerunner's precursor reactant forming amount point core solution, the partial size for the quantum dot core being prepared is greater than 4nm;The quantum The second metal precursor is added in point core solution, the quantum dot core forming metal layer on surface the step of in, before second metal It drives body and is selected from the presoma of Zn element or the presoma of Ga element, the presoma of the Zn element is selected from zinc chloride and/or oxidation The presoma of zinc, the Ga element is selected from gallium chloride and/or gallium oxide.
In a preferred embodiment, the preparation method of the quantum dot, includes the following steps:
In the reaction system containing dispersing agent and solvent, make nonmetallic presoma and the first metal front precursor reactant forming amount Point core solution;
The second metal precursor is added into the quantum dot core solution, forms the first metal layer on quantum dot core surface;
The first semiconductor shell is formed on the first metal layer surface;
The second metal precursor is added into the quantum dot solution, forms the second metal in the first semiconductor shell layer surface Layer;
The second semiconductor shell is formed on the second metal layer surface;
Wherein, the material of the second metal layer and second metal precursor are selected from the presoma of Zn element, Hg element Presoma, the presoma of Al element, the presoma of Ga element and In element one of presoma or a variety of.Described second The material of metal layer and second metal precursor are selected from the presoma of Zn element, the presoma of Hg element, Al element One of presoma of presoma, the presoma of Ga element and In element is a variety of, that is to say, that the second metal layer and Material ranges selected by the first metal layer are identical.It should be noted that the second metal layer and the first metal layer can be with Identical material in above-mentioned material range is selected, material different in above-mentioned material range can also be selected.
The quantum dot being prepared using the method for the invention is formed on quantum dot core surface and coats the quantum dot core The first metal layer, the first metal layer can be connection tie and quantum dot nuclear phase key with the ligand on quantum dot core surface It closes, to activate the surface of quantum dot core, promotes the growth response of the first semiconductor shell;Meanwhile the gold in the metal layer Belong to atom and quantum dot core by the above-mentioned crystal structure bonded together to form, quantum dot core surface can be passivated effectively to reduce it Surface defect, the crystal structure can also effectively reduce the lattice mismatch between quantum dot core and the first semiconductor shell, from And promote the luminous efficiency and dimensional homogeneity of quantum dot.Further, it is formed described in cladding outside the first semiconductor shell The second metal layer of first semiconductor shell, the second metal layer can be passivated the first semiconductor shell layer surface effectively to subtract Its few surface defect, and then enhance the luminous efficiency of quantum dot, the metallic atom in the second metal layer can also be with first Semiconductor shell and the second semiconductor shell bond together to form crystal structure by above-mentioned, and the crystal structure can be further The lattice adaptation between quantum dot nucleocapsid is reduced, to further promote the luminous efficiency and dimensional homogeneity of quantum dot.
Preferably, the preparation method of the quantum dot forms the first semiconductor shell on the first metal layer surface The step of in, the material of the first semiconductor shell is selected from Group II-VI semiconductor material.It is further preferred that described first The Group II-VI semiconductor material of semiconductor shell is selected from one of ZnSe, ZnS and ZnSeS.
Preferably, the preparation method of the quantum dot forms the second semiconductor shell on the second metal layer surface The step of in, the material of the second semiconductor shell is selected from Group II-VI semiconductor material.It is further preferred that described second The Group II-VI semiconductor material of semiconductor shell is selected from one of ZnSe, ZnS and ZnSeS.That is, described the first half Conductor shell is identical as material ranges selected by the second semiconductor shell.It should be noted that first semiconductor shell Group II-VI semiconductor material selected by Group II-VI semiconductor material selected by layer and the second semiconductor shell can be with It is identical, it can also be different.
Preferably, the preparation method of the quantum dot makes nonmetallic in the reaction system containing dispersing agent and solvent In the step of presoma and the first metal front precursor reactant forming amount sub- point core solution, the nonmetallic presoma is V group element Presoma, first metal precursor be group-III element presoma.The presoma of the specific V group element and described The type of III group semiconductor precursors is hereinbefore documented, and details are not described herein.It is further preferred that the V The presoma of race's element is selected from one of presoma of the presoma of N element, the presoma of P element and As element or a variety of, The presoma of the group-III element is selected from one or both of presoma and presoma of In element of Ga element.Specific institute State the presoma of the presoma of N element, the presoma of P element, the presoma of As element, the presoma of Ga element and In element Type is hereinbefore documented, and details are not described herein.
Preferably, the preparation method of the quantum dot makes nonmetallic in the reaction system containing dispersing agent and solvent In the step of presoma and the first metal front precursor reactant forming amount sub- point core solution, the nonmetallic presoma is V group element Presoma and VI race element presoma, first metal precursor is the presoma and II race element of group-III element Presoma.The specific presoma of the V group element, the presoma of VI race element, the presoma of group-III element and II race element The type of presoma is hereinbefore documented, and details are not described herein.It is further preferred that the preparation side of the quantum dot Method, the presoma of the V group element are selected from one of the presoma of N element, the presoma of P element and presoma of As element Or it is a variety of;In presoma, the presoma of S element and the presoma of Te element of the presoma of VI race element selected from Se element It is one or more;The presoma of the group-III element is selected from one of presoma and presoma of In element of Ga element Or two kinds;The presoma of II race element is selected from one of the presoma of Zn element and the presoma of Hg element or a variety of. The selection of presoma is hereinbefore documented, and details are not described herein.
In a preferred embodiment, the preparation method of the quantum dot makes nonmetallic presoma and the first gold medal In the step of belonging to forerunner's precursor reactant forming amount point core solution, the nonmetallic presoma is selected from the presoma of P element, and described the One metal precursor is selected from one or both of presoma and presoma of In element of Ga element;In quantum dot core surface shape It is neutralized in the step of outer shell layer surface forms the first metal layer at the step of metal layer, second metal precursor is selected from Zn The presoma of element or the presoma of Ga element.The selection of presoma is hereinbefore documented, and details are not described herein.
In a preferred embodiment, the preparation method of the quantum dot makes nonmetallic presoma and first In the step of metal front precursor reactant forming amount sub- point core solution, the nonmetallic presoma is presoma, the S element of P element Presoma and Se elemental precursor;First metal precursor be group-III element presoma and Zn element presoma, Wherein the presoma of the group-III element is the presoma of In element or before the presoma of the group-III element is In element Drive the presoma of body and Ga element;Shell layer surface forms the first gold medal in the quantum dot core forming metal layer on surface the step of and outside In the step of belonging to layer, second metal precursor is selected from the presoma of Zn element.The selection of presoma hereinbefore has in detail It records, details are not described herein.
In a preferred embodiment, the preparation method of the quantum dot, anti-containing dispersing agent and solvent In the step of answering in system, making nonmetallic presoma and the first metal front precursor reactant forming amount sub- point core solution, it is prepared Quantum dot core partial size be less than or equal to 4nm;In the step of quantum dot core surface forms the first metal layer and in the first shell Layer surface was formed in the step of second metal layer, before second metal precursor is selected from the presoma or Ga element of Zn element Body is driven, the presoma of the Zn element is selected from one of zinc iodide, zinc acetate and diethyl zinc or a variety of, the Ga element It is one or more that presoma is selected from gallium iodide, gallium chloride and acetic acid gallium.
In a preferred embodiment, the preparation method of the quantum dot, anti-containing dispersing agent and solvent In the step of answering in system, making nonmetallic presoma and the first metal front precursor reactant forming amount sub- point core solution, it is prepared Quantum dot core partial size be greater than 4nm;In the step of quantum dot core surface forms the first metal layer and in the first outer shell table Face was formed in the step of second metal layer, and second metal precursor is selected from the presoma of Zn element or the forerunner of Ga element Body, the presoma of the Zn element are selected from zinc chloride and/or zinc oxide, the presoma of the Ga element be selected from gallium chloride and/or Gallium oxide.
The present invention also provides a kind of liquid crystal display panels, including quantum dot color filter as described above, further include film crystalline substance Body pipe array substrate (TFT) and the liquid crystal layer that is arranged between quantum dot color filter and thin-film transistor array base-plate. Compared with custom liquid crystals panel, the colour gamut and the efficiency of light energy utilization of the liquid crystal display panel provided by the invention are higher.
The present invention also provides a kind of display devices, including liquid crystal display panel as described above.The display device can be used for The electronic products such as LCD TV, liquid crystal display, Digital Frame, mobile phone, tablet computer, E-book reader.
Below by embodiment, the present invention is described in detail.
Embodiment 1
The preparation of the present embodiment InP quantum dot core, comprising the following steps:
0.14 mmol indium acetate, 0.6 mmol oleic acid and 20 g octadecylenes are added in 100 mL there-necked flasks, and at 150 degree Lower exhaust 30 minutes to remove the water and oxygen in reaction system;
250 degree will be warming up to after the logical full argon gas of reaction system;
0.1 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus) and the mixing of 2 mL octadecylenes are molten Liquid reacts 20 minutes under 250 degree and obtains InP quantum dot core.
Embodiment 2
The preparation of the present embodiment InPZnS quantum dot core, comprising the following steps:
0.18 mmol inidum chloride, 1 mL tetrahydrofuran, 1 mmol zinc acetate, 0.6 mL oleic acid and 9 mL octadecylenes are added to In 100 mL there-necked flasks, and 30 minutes are vented to remove the water and oxygen in reaction system under 150 degree;
280 degree will be warming up to after the logical full argon gas of reaction system;
0.06 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.4 mmol sulphur, 0.5 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reaction obtains InPZnS quantum dot core under 280 degree.
The InPZnS quantum dot core of different emission wavelengths and luminous intensity, example can be obtained according to the difference in reaction time Such as: the emission wavelength of the InPZnS quantum dot core obtained at reaction 20 seconds is 504 nm, luminous efficiency ~ 5%;It is obtained when reacting 5 minutes The emission wavelength of the InPZnS quantum dot core obtained is 512 nm, luminous efficiency ~ 25%;The InPZnS amount obtained when reacting 60 minutes The emission wavelength of son point core is 527 nm, luminous efficiency ~ 30%.
Embodiment 3
The preparation of the present embodiment InPZnSe quantum dot core, comprising the following steps:
0.16 mmol inidum chloride, 1 mL tetrahydrofuran, 1 mmol zinc acetate, 0.6 mL oleic acid and 9 mL octadecylenes are added to In 100 mL there-necked flasks, and 30 minutes are vented to remove the water and oxygen in reaction system under 150 degree;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.12 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.02 mmol selenium, 0.5 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reaction obtains InPZnSe quantum dot core under 300 degree.
The InPZnSe quantum dot core of different emission wavelengths and luminous intensity, example can be obtained according to the difference in reaction time Such as: the emission wavelength of the InPZnSe quantum dot core obtained at reaction 20 seconds is 503 nm, luminous efficiency ~ 8%.
Embodiment 4
The preparation of the present embodiment InGaPZnSe quantum dot core, comprising the following steps:
0.24 mmol indium acetate, 1 mmol zinc acetate, 0.34 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes are added 30 minutes are vented into 50 mL there-necked flasks, and under 150 degree to remove the water and oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.01 mmol selenium, 0.2 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reaction obtains InGaPZnSe quantum dot core under 300 degree.
The InGaPZnSe quantum dot core of different emission wavelengths and luminous intensity can be obtained according to the difference in reaction time, Such as: the emission wavelength of the InGaPZnSe quantum dot core obtained at reaction 20 seconds is 524 nm, luminous efficiency ~ 7%.
Embodiment 5
The preparation of the present embodiment InGaPZnSeS quantum dot core, comprising the following steps:
0.24 mmol indium acetate, 1 mmol zinc acetate, 0.17 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes are added 30 minutes are vented into 50 mL there-necked flasks, and under 150 degree to remove the water and oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.01 mmol selenium, 0.4 The mixed solution of mmol tert-dodecylmercaotan, 0.2 mL tri octyl phosphine (TOP) and 0.5 mL octadecylene, and it is anti-under 300 degree It should obtain InGaPZnSeS quantum dot core.
The InGaPZnSeS quantum dot core of different emission wavelengths and luminous intensity can be obtained according to the difference in reaction time, Further, the high reaction activity of tert-dodecylmercaotan can inhibit the growth of core therefore can obtain compared with bob light wave significantly Long core;Such as: the emission wavelength of the InGaPZnSeS quantum dot core obtained at reaction 20 seconds is 480 nm, luminous efficiency ~ 4%.
Embodiment 6
The preparation of (comparative example of no metal activation layer) InP/ZnSeS quantum dot, comprising the following steps:
0.16 mmol inidum chloride, 1 mL tetrahydrofuran, 0.5 mL oleic acid and 8 mL octadecylenes are added in 50 mL there-necked flasks, And 30 minutes are vented under 150 degree to remove the water and oxygen in reaction system;
280 degree will be warming up to after the logical full argon gas of reaction system;
0.06 mmol P (TMS) is rapidly injected into reaction system3The mixing of (three-trimethyl silicon substrate phosphorus), 0.5 mL octadecylene Solution, and reacted 20 seconds under 280 degree and obtain InP quantum dot core;
In 30 minutes at the uniform velocity by 0.04 mmol Se-TOP predecessor, 1.2 mmol lauryl mercaptans, 2 mmol zinc oleates It is injected into reaction system;
Temperature fall obtains InP/ZnSeS quantum dot after reaction, and emission wavelength is 551 nm, and the peak width that shines is 98 Nm, luminous efficiency ~ 5%.
Embodiment 7
The preparation of the present embodiment InP/Zn/ZnSeS quantum dot, comprising the following steps:
0.16 mmol inidum chloride, 1 mL tetrahydrofuran, 0.2 mmol zinc acetate, 1.0 mL oleic acid and 8 mL octadecylenes are added 30 minutes are vented into 50 mL there-necked flasks, and under 150 degree to remove the water and oxygen in reaction system;
280 degree will be warming up to after the logical full argon gas of reaction system;
0.06 mmol P (TMS) is rapidly injected into reaction system3The mixing of (three-trimethyl silicon substrate phosphorus), 0.5 mL octadecylene Solution, and reacted 5 seconds under 280 degree and obtain InP quantum dot core;
The zinc oleate predecessor that 1.0 mmol zinc acetates and 1 mL elaidin reaction generate is rapidly injected reactant under 280 degree In system and react 30 minutes;
In 30 minutes at the uniform velocity by 0.04 mmol Se-TOP predecessor, 1.2 mmol lauryl mercaptans, 2 mmol zinc oleates It is injected into reaction system;
Temperature fall obtains InP/Zn/ZnSeS quantum dot after reaction, and emission wavelength is 526 nm, and luminous peak width is 66 nm, luminous efficiency ~ 65%.
Embodiment 8
The preparation of the present embodiment InPZnSe/Zn/ZnSeS quantum dot, comprising the following steps:
0.24 mmol indium acetate, 1 mmol zinc acetate, 2.8 mL oleic acid and 4 mL octadecylenes are added in 50 mL there-necked flasks, And 30 minutes are vented under 150 degree to remove the water and oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.02 mmol selenium, 0.2 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reacted 20 seconds under 300 degree and obtain InPZnSe quantum dot core;
1 mmol zinc oleate is injected into reaction system, and is reacted 60 minutes under 300 degree;
0.24 mmol Se-TOP predecessor and 1 mmol zinc oleate are at the uniform velocity injected into reaction system in 60 minutes;
1.2 mmol lauryl mercaptans are at the uniform velocity injected into reaction system in 15 minutes;
Temperature fall obtains InPZnSe/Zn/ZnSeS quantum dot after reaction, and emission wavelength is 607 nm, and shine peak width Degree is 85 nm, luminous efficiency ~ 35%.
Embodiment 9
The preparation of the present embodiment InPZnS/Zn/ZnSeS quantum dot, comprising the following steps:
0.24 mmol indium acetate, 1 mmol zinc chloride, 2.8 mL oleic acid and 4 mL octadecylenes are added in 50 mL there-necked flasks, And 30 minutes are vented under 150 degree to remove the water and oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.4 mmol sulphur, 0.2 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reacted 20 seconds under 280 degree and obtain InPZnS quantum dot core;
1 mmol zinc oleate is injected into reaction system, and is reacted 60 minutes under 300 degree;
0.24 mmol Se-TOP predecessor and 1 mmol zinc oleate are at the uniform velocity injected into reaction system in 60 minutes;
1.2 mmol lauryl mercaptans are at the uniform velocity injected into reaction system in 15 minutes;
Temperature fall obtains InPZnSe/Zn/ZnSeS quantum dot after reaction, and emission wavelength is 590 nm, and shine peak width Degree is 68 nm, luminous efficiency ~ 46%.
Embodiment 10
The preparation of the present embodiment InGaPZnSe/Zn/ZnSeS quantum dot, comprising the following steps:
By 0.24 mmol indium acetate, 0.8 mmol zinc acetate, 0.17 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes It is added in 50 mL there-necked flasks, and is vented 30 minutes under 150 degree to remove the water oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.02 mmol selenium, 0.2 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reacted 20 seconds under 300 degree and obtain InGaPZnSe quantum dot Core;
1 mmol zinc oleate is injected into reaction system, and is reacted 60 minutes under 300 degree;
0.24 mmol Se-TOP predecessor and 1 mmol zinc oleate are at the uniform velocity injected into reaction system in 60 minutes;
1.2 mmol lauryl mercaptans are at the uniform velocity injected into reaction system in 15 minutes;
Temperature fall obtains InGaPZnSe/Zn/ZnSeS quantum dot after reaction, and emission wavelength is 622 nm, glow peak Width is 69 nm, luminous efficiency ~ 60%.
Embodiment 11
The preparation of the present embodiment InGaPZnSeS/Zn/ZnS quantum dot, comprising the following steps:
By 0.24 mmol indium acetate, 1.0 mmol zinc iodides, 0.17 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes It is added in 50 mL there-necked flasks, and is vented 30 minutes under 150 degree to remove the water oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3(three-trimethyl silicon substrate phosphorus), 0.02 mmol selenium, 0.8 The mixed solution of mmol tert-dodecylmercaotan (t-DDT), 2.0 mL octylames and 0.5 mL octadecylene, and reacted under 300 degree Obtain within 20 seconds InGaPZnSeS quantum dot core;
Under 300 degree, 2 mmol zinc oleates are continuously injected into reaction system in 40 minutes;
1.2 mmol lauryl mercaptans and 1 mmol zinc oleate are at the uniform velocity injected into reaction system in 20 minutes;
Temperature fall obtains InGaPZnSeS/Zn/ZnS quantum dot after reaction, and emission wavelength is 466 nm, and shine peak width Degree is 65 nm, luminous efficiency ~ 40%.
Embodiment 12
The preparation of the present embodiment InGaP/Ga/ZnS quantum dot, comprising the following steps:
0.24 mmol indium acetate, 0.5 mmol zinc acetate, 0.17 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes are added Enter into 50 mL there-necked flasks, and is vented 30 minutes under 150 degree to remove the water and oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) is rapidly injected into reaction system3The mixing of (three-trimethyl silicon substrate phosphorus), 0.5 mL octadecylene Solution, and reacted 20 seconds under 300 degree and obtain InGaP quantum dot core;
0.17 mmol gallium chloride, 1 ml octadecylene are injected into reaction system, and reacted 10 minutes under 300 degree;
1.2 mmol lauryl mercaptans, 2 mmol zinc oleates are at the uniform velocity injected into reaction system in 30 minutes;
Temperature fall obtains InGaP/Ga/ZnS quantum dot after reaction, and emission wavelength is 605 nm, and luminous peak width is 62 nm, luminous efficiency ~ 60%.
Embodiment 13
The preparation of the present embodiment InP/Zn/ZnSe/Zn/ZnS quantum dot, comprising the following steps:
0.16 mmol inidum chloride, 1 mL tetrahydrofuran, 0.2 mmol zinc acetate, 1.0 mL oleic acid and 8 mL octadecylenes are added 30 minutes are vented into 50 mL there-necked flasks and under 150 degree to remove the water and oxygen in reaction system;
280 degree will be warming up to after the logical full argon gas of reaction system;
0.06 mmol P (TMS) 3(tri--trimethyl silicon substrate phosphorus is rapidly injected into reaction system), the mixing of 0.5 mL octadecylene Solution, and reacted 5 seconds under 280 degree and obtain InP quantum dot core;
The zinc oleate predecessor that 1.0 mmol zinc acetates and 1 mL elaidin reaction generate is rapidly injected reactant under 280 degree In system and react 30 minutes;
0.04 mmol Se-TOP predecessor, 0.2 mmol zinc oleate are at the uniform velocity injected into reaction system in 20 minutes;
0.5 mmol zinc oleate is disposably injected into reaction system and is reacted 30 minutes;
1.2 mmol lauryl mercaptans, 1.5 mmol zinc oleates are at the uniform velocity injected into reaction system in 30 minutes;
Temperature fall obtains InP/Zn/ZnSe/Zn/ZnS quantum dot after reaction, and emission wavelength is 521 nm, and shine peak width Degree is 63 nm, luminous efficiency 66%.
Embodiment 14
The preparation of the present embodiment InGaPZnSe/Zn/ZnSe/Zn/ZnS quantum dot, comprising the following steps:
By 0.24 mmol indium acetate, 0.8 mmol zinc acetate, 0.17 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes It is added in 50 mL there-necked flasks and is vented 30 minutes under 150 degree to remove the water oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) 3(tri--trimethyl silicon substrate phosphorus is rapidly injected into reaction system), 0.02 mmol selenium, 0.2 mL The mixed solution of tri octyl phosphine (TOP) and 0.5 mL octadecylene, and reacted 20 seconds under 300 degree and obtain InGaPZnSe quantum dot Core;
1 mmol zinc oleate is injected into reaction system, and is reacted 60 minutes under 300 degree;
0.24 mmol Se-TOP predecessor and 1 mmol zinc oleate are at the uniform velocity injected into reaction system in 60 minutes;
0.5 mmol zinc oleate is disposably injected into reaction system and is reacted 30 minutes;
1.2 mmol lauryl mercaptans, 1.5 mmol zinc oleates are at the uniform velocity injected into reaction system in 15 minutes;
Temperature fall obtains InGaPZnSe/Zn/ZnSe/Zn/ZnS quantum dot after reaction, and emission wavelength is 615 nm, hair Photopeak width is 65 nm, luminous efficiency 62%.
Embodiment 15
The preparation of the present embodiment InGaP/Ga/ZnSe/Zn/ZnS quantum dot, comprising the following steps:
By 0.24 mmol indium acetate, 0.5 mmol zinc acetate, 0.17 mmol gallium chloride, 2.8 mL oleic acid and 4 mL octadecylenes It is added in 50 mL there-necked flasks and is vented 30 minutes under 150 degree to remove the water oxygen in reaction system;
300 degree will be warming up to after the logical full argon gas of reaction system;
0.19 mmol P (TMS) 3(tri--trimethyl silicon substrate phosphorus is rapidly injected into reaction system), the mixing of 0.5 mL octadecylene Solution, and reacted 20 seconds under 300 degree and obtain InGaP quantum dot core;
0.17 mmol gallium chloride, 1 ml octadecylene are injected into reaction system, and reacted 10 minutes under 300 degree;
0.12 mmol Se-TOP predecessor and 1 mmol zinc oleate are at the uniform velocity injected into reaction system in 30 minutes;
0.5 mmol zinc oleate is disposably injected into reaction system and is reacted 30 minutes;
1.2 mmol lauryl mercaptans, 1.5 mmol zinc oleates are at the uniform velocity injected into reaction system in 30 minutes;
Temperature fall obtains InGaP/Ga/ZnSe/Zn/ZnS quantum dot after reaction, and emission wavelength is 600 nm, glow peak Width is 60 nm, luminous efficiency 60%.
In conclusion a kind of quantum dot color filter provided by the invention.The present invention provides one kind to have metal layer Semiconductor core-shell quanta dots as the quantum dot light emitting material in quantum dot color filter;The metal layer can be effectively Passivation quantum dot core surface enhances the luminous efficiency of quantum dot to reduce surface defect;Meanwhile the metal layer can also The lattice mismatch between nucleocapsid is enough effectively reduced, to further promote the luminous efficiency and dimensional homogeneity of quantum dot;Institute Quanta point material is stated to maximize due to more efficient quanta point material luminous efficiency, realizing the efficiency of different colours light, The utilization rate of backlight can be improved, while obtaining the coloured light of higher purity, therefore the display based on quantum dot color filter Device can be realized the colored display of high colour gamut and low-power consumption.
It should be understood that the application of the present invention is not limited to the above for those of ordinary skills can With improvement or transformation based on the above description, all these modifications and variations all should belong to the guarantor of appended claims of the present invention Protect range.

Claims (10)

1. a kind of quantum dot color filter, including chromatic filter layer, the chromatic filter layer includes multiple pixel regions, described Pixel region is placed with multiple sub-pixel filter layers, wherein the material of at least one sub-pixel filter layer includes quantum dot and divides Dissipate the matrix of the quantum dot, which is characterized in that the quantum dot includes quantum dot core, coats the metal of the quantum dot core Layer, coats the semiconductor shell of the metal layer, wherein the metallic element in the metal layer is selected from Zn, Hg, Al, Ga and In One of or it is a variety of.
2. quantum dot color filter according to claim 1, which is characterized in that the quantum dot color filter is also wrapped Substrate, protective layer and conductive layer are included, on the substrate, the protective layer is covered on the colour for the chromatic filter layer setting The upper surface of filter layer, the conductive layer are covered on the upper surface of the protective layer;It is provided with and is used in the chromatic filter layer The black matrix" of separating sub-picture elements filter layer.
3. quantum dot color filter according to claim 1, which is characterized in that the pixel region is placed with blue son Pixel filter layer, the quantum dot in the blue subpixels filter layer are blue light quantum point, and the diameter of the quantum dot core is 2- 4nm, the metallic element in the metal layer are selected from Zn or Ga.
4. quantum dot color filter according to claim 1, which is characterized in that the pixel region is placed with red son Pixel filter layer and green sub-pixels filter layer, the quantum dot in the red sub-pixel filter layer is red light quantum point, described The partial size of quantum dot core is 4-6nm, and the metallic element in the metal layer is selected from Zn or Ga;The green sub-pixels filter layer In quantum dot be green light quantum point, the partial size of the quantum dot core is 4-6nm, and the metallic element in the metal layer is selected from Zn Or Ga.
5. quantum dot color filter according to claim 1, which is characterized in that the material of the quantum dot core is selected from Alloy semiconductor material composed by III-V group semi-conductor material or III-V group semi-conductor material and Group II-VI semiconductor material Material.
6. quantum dot color filter according to claim 1, which is characterized in that the material of the semiconductor shell is Group II-VI semiconductor material;
And/or the Group II-VI semiconductor material of the semiconductor shell be selected from ZnSe, ZnS, ZnTe, ZnSeS, ZnSeTe, One of ZnSTe, HgSe, HgS, HgTe, HgSeS, HgSeTe and HgSTe.
7. quantum dot color filter according to claim 1, which is characterized in that the material of the quantum dot core is selected from InP or InGaP, the metallic element in the metal layer are selected from Zn or Ga.
8. quantum dot color filter according to claim 1, which is characterized in that the material of the quantum dot core is III- Alloy semiconductor material composed by V race semiconductor material and Group II-VI semiconductor material, the metallic element choosing of the metal layer From Zn;
And/or alloy semiconductor material composed by the III-V group semi-conductor material and Group II-VI semiconductor material is selected from One of InPZnS, InPZnSe, InPZnSeS, InGaPZnSe, InGaPZnS and InGaPZnSeS.
9. quantum dot color filter according to claim 1, which is characterized in that the matrix is inorganic material, organic One of material is a variety of.
10. quantum dot color filter according to claim 9, which is characterized in that the matrix is glass, gel, gathers Close one of object or a variety of.
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