CN109923477A - Exposure light source modular unit and the exposure device for being provided with the light source module unit - Google Patents

Exposure light source modular unit and the exposure device for being provided with the light source module unit Download PDF

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Publication number
CN109923477A
CN109923477A CN201780067960.1A CN201780067960A CN109923477A CN 109923477 A CN109923477 A CN 109923477A CN 201780067960 A CN201780067960 A CN 201780067960A CN 109923477 A CN109923477 A CN 109923477A
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CN
China
Prior art keywords
light
unit
light source
collector lens
panel
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Granted
Application number
CN201780067960.1A
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Chinese (zh)
Other versions
CN109923477B (en
Inventor
赵南稙
印致亿
朴钟沅
宋友莉
丁海一
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Lankelay Corp
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Lankelay Corp
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Publication of CN109923477A publication Critical patent/CN109923477A/en
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Publication of CN109923477B publication Critical patent/CN109923477B/en
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

A kind of exposure light source modular unit is disclosed.Disclosed exposure light source modular unit includes: light source panel comprising the multiple ultraviolet ray emitting elements formed with array structure；Optic panel, it includes multiple unit collector lenses to be formed from position corresponding with unit light-emitting component respectively for key light axially past the array structure of the matrix shape of the state of arbitrary reference center's axis eccentricity at the center of ultraviolet ray emitting element array, multiple unit collector lenses are integrated with one-piece type array arrangement architecture in the light penetrating panel for the light emitting side for being configured at light-emitting component, unit collector lens has following constitute: light incident surface is formed as from plane, any one form selected in concave surface with the curvature (R) within (-) 0.15 and the convex surface with the curvature (R) within (+) 0.15, simultaneously, light emergence face is formed as convex lens, the spacing distance (C1) of ultraviolet ray emitting element and unit collector lens is arranged as meeting C relative to the diameter (d) of collector lens The value of 1/d < 0.5.

Description

Exposure light source modular unit and the exposure for being provided with the light source module unit Device
Technical field
The present invention relates to a kind of exposure light sources, are related to a kind of exposure ultraviolet ray emitting element (UV in more detail LED) light source module unit is used in light to form fine circuit pattern in semiconductor transistor elements or image display panel etc. (Photolithography) technique is carved, in particular, being related to a kind of exposure ultraviolet ray emitting element (UV LED) light source module list Member and the exposure device for being provided with the light source module unit, are improved in the form of following: with the module of optimal combination To constitute as ultraviolet ray emitting element (UV LED) array (array) arrangement architecture of light source and with one-piece type integrated in saturating The shape and array arrangement architecture of the collector lens of optic panel, can by optical output power (power) and Illumination Distribution maximization While effectively to promote exposure performance and exposure efficiency, existing exposure can easily be replaced to fill with unit (cell) form The light source module centered, so that cost performance (cost performance ratio) can be improved.
Background technique
For example, as electric/electronic device main component and built-in semiconductor element or circuit board (PCB) and class It is similar to liquid crystal display (LCD, Liquid Crystal Display) or Organic Light Emitting Diode (OLED, Organic Light Emitting Diod) and plasma display panel (PDP, Plasma Display Panel) image display panel, its manufacture It is micro- to be formed and being referred to as the light micrometer-nanometer processing technology of photoetching (Photolithography) in exposure technology in the process The form of thin circuitous pattern is manufactured.
In general, the exposure light source being used in existing exposure technology mainly uses extra-high-pressure mercury vapour lamp or halogen Lamp, but truth is, as everyone knows as, existing exposure light source as described above is exposed due to low service life and height The efficiency for consuming poor efficiency caused by electric power and the exposure technology as caused by high cost, moreover, in terms of environment Expose many problems.
In particular, recently in the display for being manufactured similarly to liquid crystal display (LCD) or Organic Light Emitting Diode (OLED) etc. When the thin film transistor (TFT) (TFT, Thin Film Transistor) or manufacture filter (CF, Color Filter) in device field, Market is more urgent for the demand for realizing ultra high-definition using the miniaturization technology of exposure figure, nevertheless, due to utilizing The technical restriction of the micro-gasification process of the exposure figure of existing exposure light source (Hg Lamp, mercury vapor lamp), although unfortunately, it is existing It is in fact the ultra high-definition that cannot achieve the core technology of the miniaturization and display industry as exposure figure.
Further, since miniaturization and high capacity and highly integrated and densification for nearest semiconductor element Trend, the requirement of miniaturization and high precision to exposure figure is continuously increased, therefore is had problems in that, is being utilized Existing exposure light source has limitation when the requirement to current miniaturization figure to realize.
As a result, recently in active progress such as similar to exposure technique new immersion exposure or deep uv exposure Exploitation, in particular, ultraviolet ray emitting element (UV LED) as low consumption electric power and service life long, Single wavelength selectivity use and The exposure light source that short wavelength and environmental protection can be used, in being attracted the attention of millions of people as the trend of the substitute of existing exposure light source.
Fig. 1 is to be shot for an example of the existing exposure light source modular unit that ultraviolet ray emitting element is used as light source Photo and the figure shown, the light source panel (not shown) for being set to the rear of optic panel 10 are configured to, multiple unit ultraviolet lights Light-emitting component is installed to be the array structure of matrix shape on circuit substrate, and is loaded into support panel.
Also, the optic panel 10 have lens panel 11 and each unit collector lens 12 with multiple unit holes phase In conjunction with the composition that is arranged of form, lens panel 11 is fitly configured at light-emitting component in the form facing with light source panel Light emitting side, multiple unit hole perforation are formed in the lens panel 11.
For the existing exposure light source modular unit as light source by ultraviolet ray emitting element as described above, it is The heat dissipation effect for being provided with the lens panel 11 of collector lens 12 is improved, for example, mainly using brass or aluminium or stainless steel etc. Non-light transmittance metal decking.Therefore, because being caused by the light loss generated from the non-transparent portion between each unit collector lens Light gathering efficiency reduce, so in whole optical output power and Illumination Distribution figure have limitation, thus have be difficult to pass through exposure The problem of ultra high-definition, is realized in the miniaturization of light figure.
In addition, the heat dissipation performance of the non-light transmittance metal decking of existing exposure light source modular unit has limitation, because This, driving fever is accumulated and concentrates on non-light transmittance metal decking, so that driving time more increases, thermalization more gradually, therefore have Have because of the problem of reduction of optical output power and Illumination Distribution figure causes exposure quality to decline.Therefore, because frequent optics The replacement of panel has so that the problem of decline of exposure technology productivity and expense rise.
Also, for existing exposure light source modular unit, in perforation in being formed by non-light transmittance metal decking Setting unit collector lens 12 has because of such group technology so that in manufacturing cost one by one on the hole of lens panel 11 The problem of liter, productivity decline.
Therefore, for ultraviolet ray emitting element (UV LED) is used as the exposure device of light source, truth is an urgent demand It can be by making the composition of the light path of light loss reduction or Illumination Distribution figure and the power of light output improve and exposure figure Miniaturization realize ultra high-definition, develop for minimizing, the efficient new light sources (UV of high capacity and densification etc. LED), while developing optical component, module, unit etc..
The present invention be it is derived under technical background as described above, the problem of background technique be the applicant in order to Export is of the invention and has, or as the content for regaining and ensuring in export process of the invention, must not claim For before application of the invention to content well known to general public.
Summary of the invention
The present invention is that the exposure light source under background technique as described above in view of existing exposure device is had The problem of and proposed to improve described problem, it is an object of the invention to for provide a kind of low consumption electric power type ultraviolet Line light-emitting component (UV LED) light source module unit and the exposure device for setting the unit to light source, pass through so that With the integrated minimum optical losses generated between multiple unit collector lenses of light penetrating panel of one-piece type array arrangement architecture Come so that light gathering efficiency maximizes.
It is another object of the present invention to for providing a kind of ultraviolet ray emitting element (UV LED) light source module unit And set the unit to the exposure device of light source, it utilizes integrated in light penetrating panel with one-piece type array arrangement architecture Multiple unit collector lenses make light gathering efficiency maximize, to improve Illumination Distribution and optical output power, accordingly, pass through exposure Ultrahigh resolution can be achieved in the miniaturization of figure.
Of the invention and another purpose is, provides a kind of ultraviolet ray emitting element (UV LED) light source module of economy Unit and the exposure device for setting the unit to light source, in order to by by each unit collector lens with one-piece type array Arrangement architecture is integrated to form optic panel assembling body unit in light penetrating panel, and removal is used to support each unit collector lens Lens panel reduce manufacturing cost to improve assemblability and productivity.
Another purpose again of the invention is, provides a kind of exposure improved with ultraviolet ray emitting element (UV LED) Light source module unit and the exposure device for being provided with the light source module unit, easily with unit (cell) form come generation For the light source module being arranged in existing exposure device, so that cost performance (cost performance ratio) can be improved.
In order to realize the purpose, exposure light source modular unit according to the present invention includes light source panel and optical surface Plate, light source panel are set as multiple unit ultraviolet ray emitting elements and are installed on circuit board with the array structure of matrix shape, and It is loaded into support panel, optic panel is configured at the luminous member to be assembled to the light projected from the light-emitting component The light emitting side of part, the exposure light source modular unit be characterized in that, the optic panel with the light source panel phase The form faced includes that light penetrating panel and multiple unit collector lenses, the light penetrating panel are configured at the light emission of the light-emitting component Side out, the multiple unit collector lens is integrated in the light penetrating panel with one-piece type array arrangement architecture, and the unit is poly- Optical lens is arranged as from position corresponding with the light-emitting component respectively for key light axially past positioned at the light source panel On ultraviolet ray emitting element array center arbitrary reference center's axis eccentricity state matrix shape array junctions Structure.
Also, in order to realize the purpose, exposure device according to the present invention includes exposure desk, driving device, exposure use Light source module unit, optical system and control device, exposure desk are used to support the substrate for exposure coated with emulsion, driving dress Set be used for so that the exposure desk on X-Y plane coordinate with moveable state-driven, the setting of exposure light source modular unit To issue illumination light to the mask for the exposure figure for being used to form the substrate, optical system is set to the substrate and exposure is used Between light source module unit, control device carries out Collaborative Control, institute to the driving of the driving device and exposure light source unit It states exposure device to be characterized in that, the exposure light source modular unit includes: light source panel, and it is ultraviolet to be set as multiple units Line light-emitting component is installed on circuit board with the array structure of matrix shape, and is loaded into support panel；And optic panel, In order to the light projected from the light-emitting component be assembled and is configured at the light emitting side of the light-emitting component, the optical surface Plate includes light penetrating panel and multiple unit collector lenses, the light penetrating panel configuration in the form facing with the light source panel In the light emitting side of the light-emitting component, the multiple unit collector lens is integrated in described with one-piece type array arrangement architecture Light penetrating panel, the unit collector lens are arranged as axially passing through from position corresponding with the light-emitting component respectively for key light Cross the state of arbitrary reference center's axis eccentricity of the ultraviolet ray emitting element array center on the light source panel Matrix shape array structure.
A side according to the present invention, it is preferable that the unit collector lens with adjacent unit collector lens phase The form of contact is set as convex lens, and it is that hemispheric light emission goes out that convex lens, which has protrusion in the light emergence face of the light penetrating panel, Face, the light incident surface of the unit collector lens are formed as from plane, the concave surface with the curvature within (-) 0.15 and have Any one form selected in the convex surface of curvature within (+) 0.15, the unit ultraviolet ray emitting element and the unit The spacing distance of collector lens is arranged as meeting the value of C1/d < 0.5 relative to the diameter of unit collector lens.
Another side according to the present invention, the unit collector lens is to be in contact with adjacent unit collector lens Form makes light incident surface be formed as hexagonal structure to generally form honeycomb structure, meanwhile, light emergence face is to be set as The form of convex lens has the shared perpendicular walls formed between the light incident surface and hemispheric light emergence face of hexagon, Convex lens the light penetrating panel light emergence face protrusion be hemispherical, the light incident surface of the unit collector lens be formed as from It is selected in plane, the concave surface with the curvature R within (-) 0.15 and the convex surface with the curvature R within (+) 0.15 any one The spacing distance of kind form, the unit ultraviolet ray emitting element and the unit collector lens is arranged as relative to unit optically focused The diameter of lens meets the value of C1/d < 0.5.
For the present invention, the curvature R of convex lens is defined as (+), and the curvature R of concavity lens is defined as (-).
The shape and structure of the unit collector lens is formed as into hemispherical or light incident surface is formed as into hexagonal structure It is described to constitute so that the void space between unit collector lens minimizes or is formed as to be integrally formed as honeycomb structure " zero (0) " state accordingly, is used for so that light output efficiency maximizes so that light penetrates minimization of loss.
According to the present invention and another side can have following composition: the unit collector lens with adjacent list The form that position collector lens is in contact makes light incident surface and light emergence face be formed as the block being made of quadrilateral structure, together When, light emergence face is formed as the convex lens roundly heaved, to be set as being located at until the edge termination portion of light penetrating panel is Only.According to the composition, the unit collector lens is formed with being located at the form until the edge termination portion of light penetrating panel, To which void space becomes zero (0) state between constituent parts collector lens.Accordingly, it effectively prevent on the side for being located at light penetrating panel The light occurred between the unit collector lens of edge position makes light through minimization of loss through loss, so that light Delivery efficiency maximization.
In accordance with the present invention it is preferred that the diameter of the unit collector lens of first optic panel or the unit optically focused The external diameter of a circle of hexagon light incident surface of lens is formed as relative to the unit ultraviolet ray emitting element and described first The spacing distance of the unit collector lens of optic panel meets the value of 2.8 < d/C1 < 5.8.
In addition, according to the present invention and another side can have following composition: being additionally provided with the second optic panel, institute State the light emitting side that the second optic panel is fitly arranged in first optic panel.For the composition, described Multiple unit collector lenses that two optic panels, light incident surface and light emergence face are respectively formed as convex lens be set as from respectively with The corresponding position of the light-emitting component is for key light axially past the ultraviolet ray emitting element battle array being located on the light source panel The array structure of the matrix shape of the state of arbitrary reference center's axis eccentricity at column center.
For there is the exposure light source modular unit according to the present invention constituted as described above, it is preferable that have It constitutes below: the interval of the unit collector lens of the unit collector lens of first optic panel and second optic panel Distance C2 is arranged as meeting the value of C2/d2 < 0.8 relative to the diameter of the unit collector lens of second optic panel.
And, it is preferable that the diameter of the unit collector lens of second optic panel is formed as relative to described first The diameter of the unit collector lens of optic panel meets the value of 0.7 < d2/d < 1.2.
In addition, according to the present invention and another side, the unit collector lens is set as from by being located at the light source Arbitrary reference center's axis side of ultraviolet ray emitting element array center on panel gradually separates and configures closer to edge More so that being directed to the array structure of the increased matrix shape of eccentricity of the primary optical axis of corresponding unit ultraviolet ray emitting element, It is thus configured to be set in exposure device so that irradiating the diffusion light come from each unit ultraviolet ray emitting element and being gathered in The light area of optical system.
For as described above constitute, it is preferable that for until the ultraviolet ray emitting element to light area It is set in the optical distance " a " of optical system, from the ultraviolet ray emitting element array center by being located on the light source panel The spaced apart ultraviolet ray emitting element in reference center's axis side spacing distance " b ", the ultraviolet ray emitting element and optically focused Spacing distance " c ", the central axis of each ultraviolet ray emitting element and the center of collector lens in the facing face of lens The relationship of the diameter " t " of eccentric distance " x " and light area (A) between axis is set as, the eccentric distance " x " of collector lens Benchmark meets " x=b*c/a ", and the range of " x " is set as meeting " bc (2b-t)/2ab < x <bc (2b+t)/2ab ".
As soon as according to the present invention side can be in unit circuit plate previous column for the ultraviolet ray emitting element It is installed as the LED light source of encapsulation form above.Accordingly, multiple envelopes be can have on the support panel for constituting the light source panel The LED light source of dress form is separately mounted to the composition on multiple unit circuit plates.
Another side according to the present invention, the ultraviolet ray emitting element can be installed as encapsulation shape on single circuit board The LED light source of state.
According to the present invention and another side, the ultraviolet ray emitting element can be with one chip or multiple chip forms LED light source is installed to be on single or multiple circuit board.
Furthermore it is preferred that the light source panel and the optic panel obtain the support of shell, and with dismountable single First state is set to exposure device, can have and be additionally provided with heat-releasing device around the light source panel and the optic panel Composition.
According to the exposure light source modular unit of the invention with the composition, following function and effect can be obtained.
First, so that multiple unit collector lenses are integrated on light penetrating panel to be integrated type array arrangement architecture, thus It can make the minimum optical losses generated between multiple unit collector lenses.Thus, it is possible to provide one kind makes light gathering efficiency Low consumption electric power type ultraviolet ray emitting element (UV LED) the light source module unit of maximization and light is set by the unit The exposure device in source,.
Second, utilization to gather with the integrated multiple unit collector lenses in light penetrating panel of one-piece type array arrangement architecture The exposure figure more miniaturizeing may be implemented by improving Illumination Distribution and optical output power accordingly in light efficiency maximization.By This, can provide a kind of ultraviolet ray emitting element (UV LED) the light source module unit that can be realized ultrahigh resolution and will be described Unit is set as the exposure device of light source.
Third, in order to by by each unit collector lens with one-piece type array arrangement architecture it is integrated in light penetrating panel and It forms optic panel and assembles body unit, removal is used to support the lens panel of each unit collector lens, so as to prevent While the accumulation aggregation of driving fever, the assemblability and productivity of optic panel are improved, manufacturing cost is reduced.It is possible thereby to mention Economic ultraviolet ray emitting element (UV LED) light source module unit and by list while for a kind of raising exposure performance Member is set as the exposure device of light source.
4th, the light source module for being set to existing exposure device can be easily replaced with element form.Thus, it is possible to root According to needing freely, to be selectively therefore capable of providing using the single wavelength and the ultraviolet of short wavelength of high efficiency height output Cost performance (cost performance ratio) is high and not only practical but also economical while a kind of exposure can be realized high quality Exposure ultraviolet ray emitting element (UV LED) light source module unit and be provided with the exposure device of the light source module unit.
5th, by the use of low consumption electric power, the reduction of replacing light source expense, the raising of exposure device operating time and Solution of environmental problem etc. can expect the reduction effect of significant maintenance cost.
Detailed description of the invention
Fig. 1 is the figure that an example of existing exposure light source modular unit is shot for photo and is shown.
Fig. 2 is the outline separation stereogram for showing exposure light source modular unit according to the present invention.
Fig. 3 is the flat light source and condenser lens array knot in order to illustrate exposure light source modular unit according to the present invention Structure and the approximate stereogram schematically shown.
Fig. 4 is schematically to show the ultraviolet light being made of the flat light source of exposure light source modular unit according to the present invention The general view of the array structure of light-emitting component.
Fig. 5 is the optic panel for choosing exposure light source modular unit according to the present invention and the approximate stereogram shown.
Fig. 6 is the list for being chosen at the optic panel setting of exposure light source modular unit according to the present invention shown in fig. 5 Position lens a part and amplify the summary sectional view shown.
Fig. 7 is to choose the optic panel of another example of exposure light source modular unit according to the present invention and show General view.
Fig. 8 is the list for being chosen at the optic panel setting of exposure light source modular unit according to the present invention shown in Fig. 7 Position lens a part and amplify the summary sectional view shown.
Fig. 9 is the optic panel for the still another embodiment for choosing exposure light source modular unit according to the present invention and shows General view out.
Figure 10 is the list for being chosen at the optic panel setting of exposure light source modular unit according to the present invention shown in Fig. 9 Position lens a part and amplify the summary sectional view shown.
Figure 11 and Figure 12 is the flat light source in order to illustrate exposure light source modular unit according to the present invention respectively and gathers The eccentric array structure of optical lens and the ideograph shown.
Figure 13 and Figure 14 is in order to illustrate the unit collector lens of exposure light source modular unit according to the present invention respectively Light incident surface curvature R range and the outline section constitution figure that schematically shows.
Figure 15 to Figure 17 is measured by the unit collector lens of exposure light source modular unit according to the present invention respectively Photoirradiated surface (the Target that light incident surface curvature R is determined；Plane of exposure) illumination and the figure shown in chart.
Figure 18 is the outline separation stereogram for showing exposure light source modular unit according to another embodiment of the present invention.
Figure 19 is in order to illustrate the exposure light source modular unit shown in Figure 18 according to another embodiment of the present invention Flat light source and condenser lens array structure and the approximate stereogram schematically shown.
Figure 20 is in order to illustrate the exposure light source module shown in Figure 18 and Figure 19 according to another embodiment of the present invention The optical configuration of unit collector lens and the relationship of ordered state of unit and the outline section constitution figure schematically shown.
Figure 21 and Figure 22 is measured as the exposure shown in Figure 18 and Figure 19 according to another embodiment of the present invention respectively The photoirradiated surface that the optical configuration of unit collector lens and the relationship of ordered state of light light source module unit are determined (Target；Plane of exposure) illumination and the figure that is indicated with chart.
Figure 23 be probability the appearance that exposure light source modular unit according to the present invention is built in the state of shell is shown Perspective view.
Figure 24 is to by exposure light source modular unit according to the present invention and as the mercury of existing exposure light source The mian part for the circuitous pattern that lamp (Hg Lamp) is respectively formed in wafer carries out shooting and to the CD value according to mask linewidths of measurement The result figure that compares and indicate.
Figure 25 is to by exposure light source modular unit according to the present invention and as the mercury of existing exposure light source The CD value measurement result that lamp (Hg Lamp) is respectively formed in the mask linewidths of the circuitous pattern of wafer compare and use chart into The figure that row indicates.
Figure 26 is the mian part and schematically for choosing the exposure device for being applicable in exposure light source modular unit according to the present invention The schematic configuration diagram shown.
Specific embodiment
Hereinafter, exposure light source modular unit according to the present invention is described in detail referring to attached drawing.It is described below Content and attached drawing are only to be illustrated based on the preferred embodiment of the present invention, and record in non-limiting claims Exposure light source modular unit of the invention.
Fig. 2 is the outline separation stereogram for showing exposure light source modular unit according to the present invention, Fig. 3 be in order to illustrate Flat light source and the condenser lens array structure of exposure light source modular unit according to the present invention and the outline schematically shown Perspective view.
Referring to Fig. 2 and Fig. 3, exposure light source modular unit 100 according to the present invention, comprising: light source panel 110 is set Multiple unit ultraviolet ray emitting elements (UV LED) 111 are set to be installed on circuit board 112 with the array structure of matrix shape, and It is loaded into support panel 113；Optic panel 120 is configured to be assembled to the light projected from the light-emitting component 111 In the light emitting side of the light-emitting component 111, the optic panel 120 with the facing form of the light source panel 110 to have There is the composition including light penetrating panel 121 and multiple unit collector lenses 122, the light penetrating panel 121 is configured at the luminous member The light emitting side of part 111, the multiple unit collector lens 122 are integrated in the light transmission with one-piece type array arrangement architecture Panel 121.
Also, with the integrated multiple unit collector lenses 122 in the light penetrating panel 121 of one-piece type array arrangement architecture It is set as from the interval position p corresponding with the interval p of 111 array of light-emitting component respectively for key light axially past being located at Arbitrary reference center's axis side of 111 array center O of ultraviolet ray emitting element (referring to Fig. 3) on the light source panel 110 The matrix array structure of eccentric state e1, e2.
For there is the exposure light source modular unit 100 according to the present invention constituted as described above, by multiple lists Position collector lens 122 is with the light incident surface of matrix array structure integrated optical arrangement structure and constituent parts collector lens 122 And the shape and structure of outgoing plane is set as array (array) structure combined with optimum state, multiple 122 needles of unit collector lens Ultraviolet ray emitting element (UV LED) as light source is set on the light penetrating panel 121 for constituting optic panel 120 with one-piece type It sets, accordingly, exposure performance and exposure efficiency is effectively promoted by the maximization of optical output power and Illumination Distribution, so as to Realize the miniaturization and high-resolution of exposure figure.
Therefore, the unit ultraviolet light of the light source as exposure light source modular unit 100 according to the present invention is sent out below The optical arrangement structure and light of optical element (UV LED) and the unit collector lens integrated with arrangement architecture corresponding thereto The specific composition of the range of the curvature R of the plane of incidence and outgoing plane is described in detail.
According to the present invention, for the ultraviolet ray emitting element 111, as shown in Figure 2, it is preferable that in band-like unit More than 112 previous column of circuit board be installed as project 100nm wavelength band to 410nm wavelength band ultraviolet chip, envelope The LED light source of dress or chip and the mixed style of encapsulation.
Therefore, in the light source panel 110, multiple band-like unit circuit plates 112 are abreast filled respectively with array status It is loaded in support panel 113, the ultraviolet ray emitting element 111 for being installed on each unit circuit plate 112 is formed as square in x-y coordinate The array module of formation state.
On the other hand, the ultraviolet ray emitting element 111 is in order in the biggish formation of single circuit board 112 rectangular of area The array structure of state, it is mountable for project the chip of ultraviolet of the 100nm wavelength band to 410nm wavelength band, encapsulation or The LED light source of chip and package hybrid form.
Fig. 4 is the purple for schematically showing the flat light source for being configured to exposure light source modular unit 100 according to the present invention The general view of the array structure of outside line light-emitting component.
Referring to Fig. 4, exposure light source modular unit 100 according to the present invention is set as, on the light source panel 110 The center O of 111 array of ultraviolet ray emitting element be on the x-y rectangular co-ordinate of origin, multiple ultraviolet ray emitting elements 111 are constituted The array structure of the matrix shape of configuration is separated for P in certain intervals.
In addition, the support panel 113 is illustrated as the panel of quadrangle, but the shape design of such support panel 113 It is shown by one embodiment, does not limit exposure light source modular unit 100 according to the present invention.
Therefore, exposure light source modular unit 100 according to the present invention it is applicable be deformed into it is more such as disc panel The embodiment of the shape design of sample.
In other words, exposure light source modular unit 100 according to the present invention can be deformed into variform, so as to according to work For the specification or composition or exposure object or exposure figure etc. of the mounted exposure device of light source, sent out so that being arranged with ultraviolet light The shape design of the support panel 113 of optical element 111 is used with optimum state.
As soon as according to the present invention side, as shown in figure 4, the ultraviolet ray emitting element 111 support panel 113 with Odd number (9) row and column arrangement structure for, the center O of the ultraviolet ray emitting element array of the light source panel 110 can Allocation unit ultraviolet ray emitting element 111.
In addition, for the ultraviolet ray emitting element 111 is in the structure that support panel 113 is arranged with even number row and column, Center O with the ultraviolet ray emitting element array in the light source panel 110 excludes allocation unit ultraviolet ray emitting element 111 Array structure.
In other words, the center O of the ultraviolet ray emitting element array on the light source panel 110 and pass through collector lens 121 light areas that the diffusion light irradiated from each unit ultraviolet ray emitting element is assembled are (referring to the attached drawing of Fig. 3 and Fig. 4 Label " A ") center configuration on coaxial, become determines each unit collector lens 121 eccentricity (reference Fig. 2's and Fig. 4 E1, e2, en) benchmark.
The light area (drawing reference numeral " A " of 1 and Figure 12 referring to Fig.1) is set as hole (aperture) form, so as to It forms the reflecting mirror Jing Guo the unshowned optical system for being set to exposure device and to focus the optically focused target that light passes through (target)。
Exposure light source modular unit 100 according to the present invention is so that from each unit ultraviolet ray emitting element as a result, The diffusion light of 111 irradiations assembles the optically focused target (target) for reflecting and passing through as light area by collector lens 121 And the form in the hole (aperture) formed carries out optically focused.
In other words, for exposure light source modular unit 100 according to the present invention, it is located at the light source panel 110 On 111 array of ultraviolet ray emitting element center O and lens panel 120 center configuration on coaxial, from by described Any reference center's axis side of heart O gradually separates and leans on the collector lens 122 of proximal edge configuration to be directed to corresponding thereto The form configuration that the distance of the axial reference center's axis eccentricity of the key light of ultraviolet ray emitting element 111 gradually increases.
In short, collector lens 121 relative to ultraviolet light in exposure light source modular unit 100 according to the present invention to send out The form of the key light eccentric shaft of optical element 111 configures, if executing the effect of deflection (strabismus) lens for metaphor And function.It is played as a result, so that the light gathering efficiency of the diffusion light irradiated from each unit ultraviolet ray emitting element 111 is maximized Effect.
In addition, the outline that Fig. 5 is the optic panel for choosing exposure light source modular unit according to the present invention and shows is vertical Body figure, Fig. 6 are that the unit for the optic panel setting for being chosen at exposure light source modular unit according to the present invention shown in fig. 5 is saturating A part of mirror and amplify the summary sectional view shown.
Referring to Fig. 5 and Fig. 6, the optic panel 120 includes transparent surface in the form facing with the light source panel 110 Plate 121 and multiple unit collector lenses 122, the light penetrating panel 121 are configured at the light emitting side of the light-emitting component 111, institute It is integrated in the light penetrating panel 121 with one-piece type array arrangement architecture to state multiple unit collector lenses 122.
In the present invention, for the optic panel 120, for example, utilizing glass or quartz and crystal or synthetic resin Deng known general optical lens material so that plate light penetrating panel 121 and the light penetrating panel 121 light emergence face with And/or there is light incident surface the unit collector lens 122 of plane or convex surface or concave surface to be formed as one type, thus with array Structure.
A side according to the present invention, the unit collector lens 122 can have with saturating with adjacent unit optically focused The form that mirror is in contact is set as in the light emergence face protrusion of the light penetrating panel 121 being hemispheric composition.As described above The shape and structure of unit collector lens 122 is used for the void space minimum so that being formed between constituent parts collector lens 122, So that light penetrates minimization of loss, accordingly light output efficiency is maximized.
Fig. 7 is to choose the optic panel of another example of exposure light source modular unit according to the present invention and show General view, Fig. 8 are to be chosen at the optic panel of exposure light source modular unit according to the present invention shown in Fig. 7 to be arranged A part of unit lenses and amplify the summary sectional view shown.
Referring to Fig. 7 and Fig. 8, as variant embodiment of the invention, the unit collector lens 122 with adjacent unit The form that collector lens is in contact makes light incident surface be formed as hexagonal structure to generally form honeycomb structure.Also, Light emergence face is set as convex lens, and convex lens is hemispherical in the light emergence face protrusion of the light penetrating panel 121.Therefore, described Unit collector lens 122, which has, is formed with face contact sharing between the light incident surface and hemispheric light emergence face of hexagon Perpendicular walls stereochemical structure.According to the shape and structure of unit collector lens 122 as described above, there is shared vertical wall Structure of the face contact between constituent parts collector lens 122, therefore, void space become zero (0) state.It accordingly, can be effective The light generated between the constituent parts collector lens 122 of existing light source module unit is prevented through loss and is minimized it, from And realize the maximization of light output efficiency.
Fig. 9 is the optic panel for the still another embodiment for choosing exposure light source modular unit according to the present invention and shows General view out, Figure 10 are the optic panels for being chosen at exposure light source modular unit according to the present invention shown in Fig. 9 A part of the unit lenses of setting and amplify the summary sectional view shown.
Referring to Fig. 9 grade Figure 10, as another variant embodiment again of the invention, the unit collector lens 122 with phase The form that adjacent unit collector lens is in contact makes light incident surface and light emergence face be formed as the block being made of quadrilateral structure Body, meanwhile, light emergence face is formed as the convex lens roundly heaved.Therefore, the unit collector lens 122 is to be located at until saturating Form until the edge termination portion of optic panel 121 is formed, so that void space becomes zero (0) state.Accordingly, can effectively prevent The light only generated between the unit collector lens 122 for being located at the edge of light penetrating panel 121 is through minimization of loss and makes It is minimized, to realize the maximization of light output efficiency.
In short, for exposure light source modular unit 100 according to the present invention, with facing with light source panel 110 The light penetrating panel 121 of the form light emitting side that is configured at light-emitting component 111 turn to one for multiple unit collector lenses 122 are integrated Figure array arrangement architecture is thus configured to have between constituent parts collector lens 122 so that the knot that void space minimizes Therefore structure can make the light generated between constituent parts collector lens 122 through minimization of loss, so as to realize light Delivery efficiency maximizes.
In other words, according to the exposure light source modular unit 100 according to the present invention with structure as described above, in order to The light gathering efficiency of the diffusion light irradiated from each unit ultraviolet ray emitting element 111 can be made to maximize, each unit optically focused Lens 122 are arranged in the form of the key light eccentric shaft relative to ultraviolet ray emitting element 111, below to its specific composition and effect It is described in detail.
Figure 11 and Figure 12 is in order to illustrate the collector lens 12 of exposure light source modular unit 100 according to the present invention respectively Relative to the key light eccentric shaft of ultraviolet ray emitting element 111 array structure and the ideograph that shows.
In Figure 11 and Figure 12, " a " is indicated from the ultraviolet ray emitting element 111 to being set to as optically focused target Optical distance until the hole of light area A.
Also, " b " indicate with from by the light source panel 110 ultraviolet ray emitting element array center O benchmark The spacing distance of the ultraviolet ray emitting element 111 for the form configuration that central axis line side is spaced.
In addition, " c " indicates the spacing distance in the facing face of ultraviolet ray emitting element 111 and collector lens 121, " x " Indicate that the eccentric distance between the central axis of ultraviolet ray emitting element 111 and the central axis of collector lens 121, " t " indicate light The diameter of region A.
1 and Figure 12 referring to Fig.1, it is preferable that for exposure light source modular unit 100 according to the present invention, for from Optical distance " a " of the ultraviolet ray emitting element 111 until being set to as the hole of the light area A of optically focused target, The relationship of " b " and " c ", " x " and " t " are set as being defined according to following formula.
In other words, the benchmark of the eccentric distance " x " of collector lens 121 is set as meeting " x=b*c/a ", " x's " Range is set as meeting " bc (2b-t)/2ab < x <bc (2b+t)/2ab ".
Below to for make exposure light source modular unit 100 according to the present invention optical output power (power) and The range and function and effect of the curvature R of the light incident surface and outgoing plane of the unit collector lens 121 of Illumination Distribution maximization carries out It explains in detail.
Figure 13 and Figure 14 is in order to illustrate the unit collector lens of exposure light source modular unit according to the present invention respectively Light incident surface curvature R range and the outline section constitution figure that schematically shows.
3 and Figure 14 referring to Fig.1, for exposure light source modular unit 100 according to the present invention, in order to enable from described The light gathering efficiency for the diffusion light that ultraviolet ray emitting element 111 irradiates maximizes, the light incident surface shape of the unit collector lens 121 As what is selected from plane, the concave surface with the curvature R within (-) 0.15 and the convex surface with the curvature R within (+) 0.15 While any one form, light emergence face is formed as convex lens.
And, it is preferable that the spacing distance of the unit ultraviolet ray emitting element 111 and the unit collector lens 121 C1 is arranged as meeting the value of C1/d < 0.5 relative to the diameter d of unit collector lens 121.
Here, the curvature R of convex lens is defined as (+), and the curvature R of concavity lens is defined as (-).
In the present invention, for the range of the light incident surface curvature R of unit collector lens 121 as described above, for institute State the spacing distance C1 of the unit collector lens 121 of the unit ultraviolet ray emitting element 111 and diameter d of unit collector lens 121 Relationship be arranged as meeting the composition of the value of C1/d < 0.5, be set as following condition: will practical " C1/d " value by between certain In the state of setting, photoirradiated surface (Target is measured；Plane of exposure) illumination, by making from the ultraviolet ray emitting element The light gathering efficiency of the diffusion light of 111 irradiations maximizes, to can get effective and advantageous optimal illumination.
Figure 15 to Figure 17 is measured by the unit collector lens of exposure light source modular unit according to the present invention respectively Photoirradiated surface (the Target that light incident surface curvature R is determined；Plane of exposure) illumination and the figure shown in chart.
5 it has been confirmed that the case where light incident surface of the unit collector lens 121 is formed as plane referring to Fig.1, according to this The exposure light source modular unit 100 of invention is in photoirradiated surface (Target；Plane of exposure) formed maximum value 1 illumination mode Output.
Furthermore it is possible to confirm, the light incident surface of the unit collector lens 121 is respectively formed as the song with (-) 0.15 The concave surface of rate R and there is the case where convex surface of curvature R of (+) 0.15, photoirradiated surface (Target；Plane of exposure) illumination to be formed The mode of about 90% or so illumination of maximum value 1 exports.
Exposure light source modular unit 100 according to the present invention is configured to as a result, in order to make photoirradiated surface (Target；It exposes Smooth surface) illumination maximize, the light incident surface curvature R of unit collector lens 121 is set as the model of (-) 0.15 < R < (+) 0.15 It encloses.
6 it has been confirmed that when the diameter d of unit collector lens 121 is formed to have the specification of certain size referring to Fig.1, needle To the setting relationship C1/d value of the spacing distance C1 of the unit ultraviolet ray emitting element 111 0.3 or so in photoirradiated surface (Target；Plane of exposure) formed maximum value 1 illumination form output.
And it is possible to confirm, for the setting relationship C1/d of the spacing distance C1 of the unit ultraviolet ray emitting element 111 In the case that value is less than 0.5, so that each photoirradiated surface (Target；Plane of exposure) illumination formed maximum value 1 about 80% The mode of the illumination of left and right exports.
Therefore, exposure light source modular unit 100 according to the present invention is configured to, for the unit luminescence-utraviolet member The relation value of the diameter d of the spacing distance C1 and unit collector lens 121 of the unit collector lens 121 of part 111 is arranged as meeting The range of C1/d < 0.5.
7 can confirm referring to Fig.1, for the interval distance of the unit collector lens 121 of the unit ultraviolet ray emitting element 111 When being arranged in the form of the value being set to be constant from C1, the spacing distance C1 of the unit collector lens 121 and the unit are poly- The relationship d/C1 value of the diameter d of optical lens 121 is 4.0 to 6.0 or so in photoirradiated surface (Target；Plane of exposure) form maximum The form of the illumination of value 1 exports.
And it is possible to confirm, the spacing distance C1 of the unit collector lens 121 and the unit collector lens 121 The relationship d/C1 value of diameter d is 2.8 or so so that photoirradiated surface (Target；Plane of exposure) illumination formed maximum value 1 pact The mode of 80% or so illumination exports.
Therefore, exposure light source modular unit 100 according to the present invention is configured to, in order to by making to send out from the ultraviolet light The light gathering efficiency for the diffusion light that optical element 111 irradiates maximizes to guide to can get maximum illumination, the unit The relationship d/C1 value of the diameter d of the spacing distance C1 of collector lens 121 and the unit collector lens 121 be arranged as satisfaction 2.8 < The value of d/C1 < 6.0.
Figure 18 is the outline separation stereogram for indicating exposure light source modular unit according to other embodiments of the invention, Figure 19 is in order to illustrate the flat light source of the exposure light source modular unit shown in Figure 18 according to another embodiment of the present invention The approximate stereogram schematically indicated with condenser lens array structure.
8 and Figure 19 referring to Fig.1, exposure light source modular unit 100 according to another embodiment of the present invention further include Two optic panels 130, the second optic panel 130 in the light emitting side of the first optic panel 120 form arranged in parallel to be arranged.
In second optic panel 130, multiple units that light incident surface and light emergence face are respectively formed as convex lens are poly- Optical lens 131 is set as described axially past being located at relative to key light from position corresponding with the light-emitting component 111 respectively The rectangular of the state of arbitrary reference center's axis eccentricity of ultraviolet ray emitting element array center on light source panel 110 The array structure of state.
In other words, the unit collector lens 131 of second optic panel 130 is for the light source panel 110 The form of the key light eccentric shaft of unit ultraviolet ray emitting element 111 configures, if executing deflection for metaphor (strabismus) thus the effect and function of lens is played so that the expansion irradiated from each unit ultraviolet ray emitting element 111 The light gathering efficiency of astigmatism maximumlly acts on.As described above, the unit collector lens 131 with the second optic panel 130 is eccentric Array arrangement architecture composition, it is inclined with the unit collector lens 121 by the first optic panel 120 illustrated by Fig. 3 and Fig. 4 The array arrangement architecture of the heart is substantially the same, therefore omits the detailed description for constituting and acting on to it.
Figure 20 is in order to illustrate the exposure light source module shown in Figure 18 and Figure 19 according to another embodiment of the present invention The optical configuration of unit collector lens and the relationship of ordered state of unit and the outline section constitution figure schematically indicated.
Referring to Figure 20, exposure light source modular unit 100 according to another embodiment of the present invention has as described below Array structure: the unit optically focused of the unit collector lens 121 of first optic panel 120 and second optic panel 130 The spacing distance C2 of lens 131 is arranged as full relative to the diameter d2 of the unit collector lens 131 of second optic panel 130 The value of sufficient C2/d2 < 0.8.
Also, the diameter d2 of the unit collector lens 131 of second optic panel 130 is formed as relative to described first The diameter d1 of the unit collector lens 121 of optic panel 120 meets the value of 0.7 < d2/d < 1.2.
The spacing distance C2 and diameter d2 of the unit collector lens 131 of second optic panel 130 as described above are arranged respectively The composition for being classified as the value for meeting C2/d2 < 0.8 and 0.7 < d2/d < 1.2 is set as following condition: pressing by the value of practical " d2/d " In the state of certain intervals setting, photoirradiated surface (Target is measured；Plane of exposure) illumination, by make from the ultraviolet light send out The light gathering efficiency for the diffusion light that optical element 111 irradiates, which maximizes, can get effective and advantageous optimal illumination.
Figure 21 and Figure 22 is that the exposure measured as shown in Figure 18 and Figure 19 according to another embodiment of the present invention is used respectively The illumination for the photoirradiated surface that the light incident surface shape design and ordered state of the unit collector lens of light source module unit determine is simultaneously The figure being indicated with chart.
Referring to Figure 21 it has been confirmed that the diameter d2 of the unit collector lens 131 of second optic panel 130 is formed as one When fixed value, the unit optically focused of the unit collector lens 121 of first optic panel 120 and second optic panel 130 The relation value C2/ of the diameter d2 of the unit collector lens 131 of the spacing distance C2 of lens 131 and second optic panel 130 In photoirradiated surface (Target when d2 is 0.1；Plane of exposure) formed maximum value 1 illumination, be then gradually reduced illumination 0.8 or so To 90% or so of maximum value 1.
Therefore, exposure light source modular unit 100 according to another embodiment of the present invention is configured to, in order to by make from The light gathering efficiency for the diffusion light that the ultraviolet ray emitting element 111 irradiates maximizes to guide to can get maximum photograph Degree, the spacing distance C2 and diameter d2 of the unit collector lens 131 of second optic panel 130 meet C2/d2 < 0.8 respectively Value.
Referring to Figure 22 it has been confirmed that the diameter d of the unit collector lens 121 of first optic panel 120 and described the The relation value d2/d of the diameter d2 of the unit collector lens 131 of two optic panels 130 is at 1.2 or so in photoirradiated surface (Target；Plane of exposure) formed maximum value 1 illumination, then 0.7 or so be gradually reduced illumination to maximum value 1 90% a left side It is right.
Therefore, exposure light source modular unit 100 according to other embodiments of the invention is configured to, in order to by make from The light gathering efficiency for the diffusion light that the ultraviolet ray emitting element 111 irradiates maximizes to guide to can get maximum photograph Degree, the unit collector lens of the diameter d of the unit collector lens 121 of the first optic panel 120 and second optic panel 130 The relation value d2/d of 131 diameter d2 meets the condition of 0.7 < d2/d < 1.2.
In addition, according to having exposure light source modular unit 100 according to the present invention formed as described above, such as Figure 23 institute Show, light source panel 110 and optic panel 120 have with built in the form that is supported by shell 140 and the composition of blocking.
It therefore, can with the exposure light source modular unit 100 of the invention for being installed on the form blocking of the shell 140 To be used as the light source of exposure device (not shown) with the state that can be dismantled.Accordingly, existing exposure is mainly installed as by removal The mercury or halogen lamp of the light source of device have the compatibility that can partially replace improvement, so as to provide cost performance it is high and Practical, economic exposure device.
In addition, for exposure light source modular unit 100 according to the present invention, in the light source panel 110 and optics In the state that panel 120,130 combines in the form of being formed as one group, the branch by being set to exposure device may be alternatively provided as The light source that the structure of frame or flange etc. is supported.
Also, exposure light source modular unit 100 according to the present invention further includes heat-releasing device, and heat-releasing device is to be set to Form around light source panel 110 and optic panel 120 is set to the shell 140.
As shown in figure 23, the water-cooled heat release connecting with cooling device (chiller) can be set in the heat-releasing device Device recycles cooling water will pass through cooling water inflow entrance 141 and outflux 142.
Also, for example, the heat-releasing device may be provided with cooling fin, cooling fin is to load the light source panel 110 and light The form for learning panel 120 is built in the shell 140.
It is filled in addition, the heat-releasing device may be provided with using the air-cooled type heat release of fan or air blower for air circulation It sets, may be alternatively provided as the state that air-cooled type heat-releasing device and water-cooled heat-releasing device merge.
Other sides according to the present invention, for exposure light source modular unit 100 according to the present invention, although passing through Attached drawing does not exemplify, but may be configured as that there is the ultraviolet ray emitting element 111 and collector lens 121,131 to be arranged as circle Array structure.The case where circular array structure as described above, it is compared to the advantages of quadrangular array structure, can excludes From the light loss being arranged in the generation of the ultraviolet ray emitting element 111 of the angle part of center O spaced furthest.
In addition, Figure 24 is to exposure light source modular unit 100 according to the present invention formed as described above and work For the mercury vapor lamp (Hg Lamp) of existing exposure light source exposure performance carry out test and by comparison result be shot for photo and into The figure that row indicates.
Shown test result is in Figure 24, coated in 3.5 inches of wafers 1.5um thickness photoresist (PR: DTFR-JC800), after setting mask linewidths with the spacing of 0.2 (or 0.3um) respectively within the scope of 1.0 to 3.5um and exposing, Developed with tetramethylammonium hydroxide (TMAH, tetramethylammonium hydroxide) 2.38wt% developer, and To the fine circuit pattern formed by the photoetching process utilized in common LCD manufacturing process in the form of photograph taking Critical line width fine sizes (CD；Critical Demension) it is measured.
Following fact can be confirmed referring to Figure 24: using achievable fine as the mercury vapor lamp of existing exposure light source The boundary of the critical line width fine sizes (CD) of circuitous pattern is 2.0um or so, on the contrary, utilizing exposure light according to the present invention The critical line width fine sizes (CD) of the achievable fine circuit pattern of source module unit can be 1.4um or so.
Also, Figure 25 be to be able to pass through in Figure 24 the critical line width fine sizes (CD) that are measured of photograph taking with Ideal critical line width fine sizes (CD) are compared and the figure that is arranged and indicated with chart.
Following fact can be confirmed referring to Figure 25: can be realized using exposure light source modular unit 100 according to the present invention Fine circuit pattern critical line width fine sizes (CD) compared to using can as the mercury vapor lamp of existing exposure light source The critical line width fine sizes (CD) of the fine circuit pattern of realization, by being more nearly ideal critical line width fine sizes (CD) Figure formed.
Thus, it is possible to confirm, the fine circuits formed using exposure light source modular unit 100 according to the present invention Line of the line width of figure compared to the circuitous pattern formed using the mercury vapor lamp (Hg Lamp) as existing exposure light source Width can be formed in finer and accurate form.Exposure light source modular unit according to the present invention is in exposure work as a result, Significant high-resolution can be achieved in skill.
Figure 26 is the mian part and schematically for extracting the exposure device for being applicable in exposure light source modular unit according to the present invention The schematic configuration diagram shown.Here, reference numeral identical with the reference numeral of previously shown attached drawing indicates identical structure At element.
Referring to Figure 26, exposure device 200 according to the present invention includes: exposure desk 250, is used to support coated with emulsion Exposure glass substrate 10；Driving device (no drawing reference numeral) is used for so that the exposure desk 250 is in X-Y plane coordinate On with moveable state-driven；Exposure light source modular unit 100 is set as projecting exposure use to the glass substrate 10 Illumination light；Optical system 210~230 is set between the glass substrate 10 and exposure light source modular unit 100；With And control device (no drawing reference numeral), Collaborative Control is carried out to the driving of the driving device and exposure light source unit 100. Here, undeclared drawing reference numeral 240 indicates the exposure mask for being formed with exposure figure.
The glass substrate 10 applies on the incident face of the illumination light irradiated from the exposure light source modular unit 100 It is covered with emulsion, and is formed with the mask 240 of figure identical with the photosensitive figure of photosurface is formed in across air layer In the state of be exposed platform 250 support form setting.The illumination light projected as a result, from exposure light source modular unit 100 While aggregation by optical system 210~230, by mask 240 and it is irradiated to the photosurface of glass substrate 10, thereby executing Be formed in mask 240 exposure figure be transferred in glass substrate 10 photosurface exposure technology.
The exposure desk 250 is sat by driving device in X-Y plane according to the relative size of glass substrate 10 and mask 240 Movement is put on, while executing exposure technology in the state of making the aligned in position of glass substrate 10 and mask 240.
In addition, for exposure device 200 according to the present invention, although illustrating the glass substrate 10 and mask 240 Be spaced form setting composition, but it is described composition and the non-limiting present invention.
On the other hand, can have so that mask 240 is tightly attached to the composition of the form setting of the photosurface of glass substrate 10. In the case where the composition, the photosurface of glass substrate 10 is exposed in the form being close to, so that the figure of mask 240 transfers In photosurface.
In addition, by expanding the gap (gap) between glass substrate 10 and mask 240 come so that reduced projection lens are embedded in Between glass substrate 10 and mask 240, the pattern reduction projection for being formed in mask 240 is enabled to expose by the composition Light is in the photosurface of glass substrate 10.
Also, the optical system 210~230 be in order to enable illumination light is effectively gathered in mask 240 and is arranged, Include: reflecting mirror 210, is used for so that the illumination light irradiated from exposure light source modular unit 100 is by being set as light The form of the hole A in region is reflected；Fly's-eye lens (flyeye lens) 221, condenser (condense lens) 222 and Plano lens (plate lens) 223,224, for being reflected by reflecting mirror 230, reflecting mirror 230 makes through the hole The illumination light of A is gathered in mask 240.The composition of optical system 210~230 and non-limiting exposure according to the present invention as described above Electro-optical device 200 can also be applicable in the composition of the deformation of variform according to exposure object and the specification of mask etc..
Composition of the exposure light source modular unit 100 as the feature of prominent exposure device 200 according to the present invention Element, according to fig. 2 to as described in the detailed description of Figure 25, comprising: light source panel 110 is set as multiple unit ultraviolet light hairs Optical element (UV LED) 111 is installed on circuit board 112 with the array structure of matrix shape, and is loaded into support panel 113；Light Panel 120 is learned, is formed in the form facing with the light source panel 110, light penetrating panel 121 is configured at the ultraviolet light hair The light emitting side of optical element 111, in light penetrating panel 121, multiple unit collector lenses 122 are with one-piece type array arrangement architecture shape At, be set as from respectively with 111 array of ultraviolet ray emitting element interval P it is corresponding interval P position relative to master Optical axis direction passes through the arbitrary of the 111 array center O of ultraviolet ray emitting element (referring to Fig. 3) being located on the light source panel 110 The array structure of the matrix shape of state e1, e2 of reference center's axis eccentricity.
Also, there is following composition: the unit optically focused with exposure light source modular unit 100 formed as described above The light incident surface of lens 122 is formed as from plane, the concave surface with the curvature R within (-) 0.15 and has within (+) 0.15 Any one form selected in the convex surface of curvature R, meanwhile, light emergence face is formed as convex lens, the unit luminescence-utraviolet The spacing distance C1 of element 111 and unit collector lens 121 is arranged as meeting C1/ relative to the diameter d of unit collector lens 121 The value of d < 0.5.
Exposure device 200 according to the present invention, as shown in Fig. 2 to Figure 18, it is preferable that with regard to the ultraviolet ray emitting element For 111, it is installed as projecting 100nm wavelength band more than band-like 112 previous column of unit circuit plate to 410nm wavelength band Ultraviolet chip, encapsulation or chip and encapsulation mixed style LED light source.
It is combination optical panel with exposure light source modular unit 100 formed as described above and is formed, optical surface Plate is formed and collector lens is gathered in light penetrating panel with one-piece type array arrangement architecture, so as to be directed to The light gathering efficiency of light source panel as multiple ultraviolet ray emitting elements (UV LED) array module maximizes, according to fig. 2 to figure 25 are described in detail, because constituting documented by the claim 1 to 14 with claims, omit it in detail Explanation.
For example, exposure device 200 according to the present invention relative to existing common exposure device, has described in replacement Exposure light source modular unit 100 form setting composition, so as to by the use of low consumption electric power, replacing light source takes Reduction, the promotion of exposure device operating time and solution of environmental problem etc. come expect significant maintenance cost reduction effect Fruit moreover can especially realize high output and high efficiency, advantage exists accordingly by the Single wavelength and short wavelength of ultraviolet light In realizing the miniaturization and significant high-resolution of exposure figure by effectively improving exposure performance and exposure efficiency.
It is not limited present invention as described above by the specific preferred embodiment, in not departing from claims In the case where the gist of the invention of request, if it is the technology people in technical field belonging to the present invention with general knowledge Member, then anyone can carry out various deformation embodiment, and change as described above belongs in documented Claims scope.
INDUSTRIAL APPLICABILITY
The present invention relates to a kind of exposure light source, it is directed to for fine circuit pattern to be formed in semiconductor transistor elements or figure Exposure ultraviolet ray emitting element (the UV used in photoetching (Photolithography) technique as display panel etc. LED) light source module unit and it is provided with the exposure device of the light source module unit.

Claims (27)

1. a kind of exposure light source modular unit, including light source panel (110) and optic panel (120), light source panel (110) are set It is set to multiple unit ultraviolet ray emitting elements (111) to be installed on circuit board (112) with the array structure of matrix shape, and loads In support panel (113), optic panel (120) is configured to be assembled to the light projected from the light-emitting component (111) In the light emitting side of the light-emitting component (111), the exposure light source modular unit is characterized in that,
The optic panel (120) in the form facing with the light source panel (110) includes light penetrating panel (121) and multiple Unit collector lens (122), the light penetrating panel (121) is configured at the light emitting side of the light-emitting component (111), the multiple Unit collector lens (122) is integrated in the light penetrating panel (121) with one-piece type array arrangement architecture,
The unit collector lens (122) is arranged as from position corresponding with the light-emitting component (111) respectively for key light Axially past the arbitrary reference center's axis side for the ultraviolet ray emitting element array center being located on the light source panel (110) The array structure of the matrix shape of eccentric state.
2. exposure light source modular unit according to claim 1, which is characterized in that
The unit collector lens (122) is set as convex lens, convex lens in the form being in contact with adjacent unit collector lens It is hemispheric light emergence face that mirror, which has protrusion in the light emergence face of the light penetrating panel (121),
The light incident surface of the unit collector lens (121) is formed as from plane, with the recessed of the curvature (R) within (-) 0.15 Any one form selected in face and convex surface with the curvature (R) within (+) 0.15,
The spacing distance (C1) of the unit ultraviolet ray emitting element (111) and the unit collector lens (121) is arranged as phase Meet the value of C1/d < 0.5 for the diameter (d) of unit collector lens (121).
3. exposure light source modular unit according to claim 2, which is characterized in that
The light incident surface diameter (d) of the unit collector lens (121) is formed as relative to the unit ultraviolet ray emitting element (111) and the spacing distance (C1) of the unit collector lens (121) meet 2.8 < d/C1 < 5.8 value.
4. exposure light source modular unit according to claim 1, which is characterized in that
The unit collector lens (122) is formed as light incident surface in the form being in contact with adjacent unit collector lens Hexagonal structure to generally forming honeycomb structure, meanwhile, light emergence face has in the form of being set as convex lens on six sides The shared perpendicular walls formed between the light incident surface of shape and hemispheric light emergence face, convex lens is in the light penetrating panel (121) light emergence face protrusion is hemispherical,
The light incident surface of the unit collector lens (121) is formed as from plane, with the recessed of the curvature (R) within (-) 0.15 Any one form selected in face and convex surface with the curvature (R) within (+) 0.15,
The spacing distance (C1) of the unit ultraviolet ray emitting element (111) and the unit collector lens (121) is arranged as phase Meet the value of C1/d < 0.5 for the diameter (d) of unit collector lens (121).
5. exposure light source modular unit according to claim 4, which is characterized in that
The external diameter of a circle (d) of hexagon light incident surface of the unit collector lens (121) is formed as relative to the unit The value of the spacing distance (C1) of ultraviolet ray emitting element (111) and the unit collector lens (121) satisfaction 2.8 < d/C1 < 5.8.
6. exposure light source modular unit according to claim 1, which is characterized in that
The unit collector lens (122) makes light incident surface and light emission in the form being in contact with adjacent unit collector lens Be formed as the block being made of quadrilateral structure, meanwhile, light emergence face is formed as the convex lens roundly heaved, and is located at straight Until the edge termination portion of light penetrating panel (121),
The light incident surface of the unit collector lens (121) is formed as from plane, with the recessed of the curvature (R) within (-) 0.15 Any one form selected in face and convex surface with the curvature (R) within (+) 0.15,
The spacing distance (C1) of the unit ultraviolet ray emitting element (111) and the unit collector lens (121) is arranged as phase Meet the value of C1/d < 0.5 for the diameter (d) of unit collector lens (121).
7. exposure light source modular unit according to claim 6, which is characterized in that
The external diameter of a circle (d) of quadrangle light incident surface of the unit collector lens (121) is formed as relative to the unit The value of the spacing distance (C1) of ultraviolet ray emitting element (111) and the unit collector lens (121) satisfaction 2.8 < d/C1 < 5.8.
8. exposure light source modular unit according to claim 1, which is characterized in that further include:
Second optic panel (130) is arranged in the form of separating certain intervals in the light emergence face of the optic panel (120) For neat state,
In second optic panel (130), light incident surface and light emergence face are respectively formed as multiple unit optically focused of convex lens Lens (131) are set as described axially past being located at for key light from position corresponding with the light-emitting component (111) respectively The matrix of the state of arbitrary reference center's axis eccentricity of ultraviolet ray emitting element array center on light source panel (110) The array structure of form.
9. exposure light source modular unit according to claim 8, which is characterized in that
The unit collector lens (121) of the optic panel (120) and the unit collector lens of second optic panel (130) (131) spacing distance (C2) is arranged as the diameter of the unit collector lens (131) relative to second optic panel (130) (d2) meet the value of C2/d2 < 0.8.
10. exposure light source modular unit according to claim 8 or claim 9, which is characterized in that
The diameter (d2) of the unit collector lens (131) of second optic panel (130) is formed as relative to first light The diameter (d) for learning the unit collector lens (121) of panel (120) meets the value of 0.7 < d2/d < 1.2.
11. exposure light source modular unit according to claim 8 or claim 9, which is characterized in that
The unit collector lens (121), (131) are set as from the ultraviolet ray emitting element by being located on the light source panel Arbitrary reference center's axis side of array center gradually separates and closer to edge configuration more so that for corresponding unit The array structure of the increased matrix shape of the eccentricity of the primary optical axis of ultraviolet ray emitting element, and make ultraviolet from each unit Line light-emitting component irradiates the diffusion light come and is gathered in the light area for being set in the optical system of exposure device.
12. exposure light source modular unit as claimed in any of claims 1 to 9, which is characterized in that
For the optical distance " a " until the ultraviolet ray emitting element to light area (A), from by being located at the light source The interval of reference center's axis side of ultraviolet ray emitting element array center (O) on panel ultraviolet ray emitting element spaced apart The spacing distance " c " in the facing face of the collector lens of distance " b ", the ultraviolet ray emitting element and the optic panel, Eccentric distance between the central axis of the collector lens of the central axis and optic panel of each ultraviolet ray emitting element The relationship of the diameter " t " of " x " and light area (A) is set as, the eccentric distance " x " of the collector lens of first optic panel Benchmark meet " x=b*c/a ", the range of " x " be set as meet " bc (2b-t)/2ab < x <bc (2b+t)/2ab ".
13. exposure light source modular unit as claimed in any of claims 1 to 9, which is characterized in that
The ultraviolet ray emitting element is installed to be any one selected from chip or encapsulation in band-like unit circuit plate The LED light source of form or both mixed style.
14. exposure light source modular unit as claimed in any of claims 1 to 9, which is characterized in that
The light source panel and the optic panel are supported by shell, and with dismountable state and with blocking Form is set to exposure device.
15. exposure light source modular unit as claimed in any of claims 1 to 9, which is characterized in that
Heat-releasing device is additionally provided with around the light source panel and the optic panel.
16. a kind of exposure device, including exposure desk, driving device, exposure light source modular unit, optical system and control dress It sets, exposure desk is used to support the substrate for exposure coated with emulsion, and driving device is used for so that the exposure desk is in X-Y plane With moveable state-driven on coordinate, exposure light source modular unit is set as to the exposure figure for being used to form the substrate Mask issue illumination light, optical system is set between the substrate and exposure light source modular unit, and control device is to institute The driving for stating driving device and exposure light source unit carries out Collaborative Control, and the exposure device is characterized in that,
The exposure light source modular unit (100), comprising:
Light source panel (110) is set as multiple unit ultraviolet ray emitting elements (111) and is installed with the array structure of matrix shape In on circuit board (112), and it is loaded into support panel (113)；And
Optic panel (120) is configured at described shine in order to be assembled to the light projected from the light-emitting component (111) The light emitting side of element (111),
The optic panel (120) in the form facing with the light source panel (110) includes light penetrating panel (121) and multiple Unit collector lens (122), the light penetrating panel (121) is configured at the light emitting side of the light-emitting component (111), the multiple Unit collector lens (122) is integrated in the light penetrating panel (121) with one-piece type array arrangement architecture,
The unit collector lens (122) is arranged as from position corresponding with the light-emitting component (111) respectively for key light Axially past the arbitrary reference center's axis side for the ultraviolet ray emitting element array center being located on the light source panel (110) The array structure of the matrix shape of eccentric state.
17. exposure device according to claim 16, which is characterized in that
The unit collector lens (122) is set as convex lens, convex lens in the form being in contact with adjacent unit collector lens It is hemispheric light emergence face that mirror, which has protrusion in the light emergence face of the light penetrating panel (121),
The light incident surface of the unit collector lens (121) is formed as from plane, with the recessed of the curvature (R) within (-) 0.15 Any one form selected in face and convex surface with the curvature (R) within (+) 0.15,
The spacing distance (C1) of the unit ultraviolet ray emitting element (111) and the unit collector lens (121) is arranged as phase Meet the value of C1/d < 0.5 for the diameter (d) of unit collector lens (121).
18. exposure device according to claim 16, which is characterized in that
The light incident surface diameter (d) of the unit collector lens (121) is formed as relative to the unit ultraviolet ray emitting element (111) and the spacing distance (C1) of the unit collector lens (121) meet 2.8 < d/C1 < 5.8 value.
19. exposure device according to claim 16, which is characterized in that
The unit collector lens (122) is formed as light incident surface in the form being in contact with adjacent unit collector lens Hexagonal structure to generally forming honeycomb structure, meanwhile, light emergence face has in the form of being set as convex lens on six sides The shared perpendicular walls formed between the light incident surface of shape and hemispheric light emergence face, convex lens is in the light penetrating panel (121) light emergence face protrusion is hemispherical,
The light incident surface of the unit collector lens (121) is formed as from plane, with the recessed of the curvature (R) within (-) 0.15 Any one form selected in face and convex surface with the curvature (R) within (+) 0.15,
The spacing distance (C1) of the unit ultraviolet ray emitting element (111) and the unit collector lens (121) is arranged as phase Meet the value of C1/d < 0.5 for the diameter (d) of unit collector lens (121).
20. exposure device according to claim 19, which is characterized in that
The external diameter of a circle (d) of hexagon light incident surface of the unit collector lens (121) is formed as relative to the unit The value of the spacing distance (C1) of ultraviolet ray emitting element (111) and the unit collector lens (121) satisfaction 2.8 < d/C1 < 5.8.
21. exposure device according to claim 16, which is characterized in that further include:
Second optic panel (130) is fitly arranged in the light emitting side of the optic panel (120),
In second optic panel (130), multiple unit collector lenses (131) be set as from respectively with the light-emitting component (111) corresponding position is for key light axially past the ultraviolet ray emitting element array being located on the light source panel (110) The array structure of the matrix shape of the state of arbitrary reference center's axis eccentricity at center,
The unit collector lens (121) of first optic panel (120) and the unit optically focused of second optic panel (130) The spacing distance (C2) of lens (131) is arranged as the unit collector lens (131) relative to second optic panel (130) Diameter (d2) meets the value of C2/d2 < 0.8.
22. exposure device described in any one of 6 to 21 according to claim 1, which is characterized in that
The unit collector lens (121), (131) are set as from the ultraviolet ray emitting element array by the light source panel Arbitrary reference center's axis side of the heart gradually separates and closer to edge configuration more so that for corresponding unit ultraviolet light The array structure of the increased matrix shape of the eccentricity of the primary optical axis of light-emitting component, and make from each unit luminescence-utraviolet Element irradiates the diffusion light come and is gathered in the light area for being set in the optical system of exposure device.
23. exposure device described in any one of 6 to 21 according to claim 1, which is characterized in that
For the optical distance " a " until the ultraviolet ray emitting element to light area (A), from by being located at the light source Between the ultraviolet ray emitting element that reference center's axis side at the center (O) of the ultraviolet ray emitting element array on panel is spaced The spacing distance in the facing face of collector lens of the gauge from " b ", the ultraviolet ray emitting element and the first optic panel Bias between the central axis of the collector lens of " c ", the central axis of each ultraviolet ray emitting element and the first optic panel The relationship of the diameter " t " of distance " x " and light area (A) is set as, the eccentric distance of the collector lens of the first optic panel The benchmark of " x " meets " x=b*c/a ", and the range of " x " meets " bc (2b-t)/2ab < x <bc (2b+t)/2ab ".
24. exposure device described in any one of 6 to 21 according to claim 1, which is characterized in that
The ultraviolet ray emitting element is installed to be any one selected from chip or encapsulation in band-like unit circuit plate The LED light source of form or both mixed style.
25. exposure device described in any one of 6 to 21 according to claim 1, which is characterized in that
The ultraviolet ray emitting element is installed to be any one form selected from chip or encapsulation in single circuit board Or both mixed style LED light source.
26. exposure device described in any one of 6 to 21 according to claim 1, which is characterized in that
The light source panel and the optic panel are supported by shell, and with dismountable state and with blocking Form is set to exposure device.
27. exposure device described in any one of 6 to 21 according to claim 1, which is characterized in that
Heat-releasing device is additionally provided with around the light source panel and the optic panel.
CN201780067960.1A 2016-09-27 2017-09-27 Light source module unit for exposure and exposure device provided with same Active CN109923477B (en)

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KR10-2016-0124076 2016-09-27
KR1020160124076A KR101848072B1 (en) 2016-09-27 2016-09-27 UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same
PCT/KR2017/010739 WO2018062861A1 (en) 2016-09-27 2017-09-27 Light source module unit for exposure and exposure device having same

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