CN109890123A - 一种回旋加速器离子源位置校正工具及方法 - Google Patents
一种回旋加速器离子源位置校正工具及方法 Download PDFInfo
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- CN109890123A CN109890123A CN201910028114.XA CN201910028114A CN109890123A CN 109890123 A CN109890123 A CN 109890123A CN 201910028114 A CN201910028114 A CN 201910028114A CN 109890123 A CN109890123 A CN 109890123A
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110708855A (zh) * | 2019-11-12 | 2020-01-17 | 中国工程物理研究院流体物理研究所 | 回旋加速器内刚性离子源的位置调节机构及其调节方法 |
CN114414655A (zh) * | 2022-01-26 | 2022-04-29 | 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) | 一种电子元器件表面腐蚀层厚度的检测方法 |
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CN1450412A (zh) * | 2002-02-15 | 2003-10-22 | Asml荷兰有限公司 | 光刻装置、对准方法和器件制造方法 |
CN1575436A (zh) * | 2001-08-30 | 2005-02-02 | 3M创新有限公司 | 投影图像显示系统的光学元件安装和对准的装置和方法 |
CN1816243A (zh) * | 2004-12-16 | 2006-08-09 | 通用电气公司 | 离子源设备和方法 |
CN1897217A (zh) * | 2005-03-17 | 2007-01-17 | 安捷伦科技有限公司 | 用于离子源的激光对准 |
CN101162679A (zh) * | 2006-10-11 | 2008-04-16 | 日新离子机器株式会社 | 离子注入机 |
CN201262942Y (zh) * | 2008-08-29 | 2009-06-24 | 华中科技大学 | 一种用于回旋加速器的离子源球管 |
RU95429U1 (ru) * | 2010-01-29 | 2010-06-27 | Федеральное государственное унитарное предприятие "Российский Федеральный ядерный центр - Всероссийский научно-исследовательский институт экспериментальной физики" - ФГУП "РФЯЦ-ВНИИЭФ" | Установка для ядерного микроанализа материалов |
CN202871738U (zh) * | 2012-10-08 | 2013-04-10 | 上海华力微电子有限公司 | 一种注入机束流引出电极水平校准系统 |
CN203674158U (zh) * | 2014-01-13 | 2014-06-25 | 中芯国际集成电路制造(北京)有限公司 | 一种校准装置 |
CN104299871A (zh) * | 2013-07-16 | 2015-01-21 | 上海凯世通半导体有限公司 | 离子源系统和离子束流系统 |
US20160148775A1 (en) * | 2013-06-12 | 2016-05-26 | General Plasma, Inc. | Anode layer slit ion source |
CN108848606A (zh) * | 2018-07-13 | 2018-11-20 | 中国原子能科学研究院 | 用于回旋加速器内部离子源的位置调节方法 |
CN209748882U (zh) * | 2019-01-11 | 2019-12-06 | 陕西正泽生物技术有限公司 | 一种回旋加速器离子源位置校准工具 |
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- 2019-01-11 CN CN201910028114.XA patent/CN109890123B/zh active Active
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CN1575436A (zh) * | 2001-08-30 | 2005-02-02 | 3M创新有限公司 | 投影图像显示系统的光学元件安装和对准的装置和方法 |
CN1450412A (zh) * | 2002-02-15 | 2003-10-22 | Asml荷兰有限公司 | 光刻装置、对准方法和器件制造方法 |
CN1816243A (zh) * | 2004-12-16 | 2006-08-09 | 通用电气公司 | 离子源设备和方法 |
CN1897217A (zh) * | 2005-03-17 | 2007-01-17 | 安捷伦科技有限公司 | 用于离子源的激光对准 |
CN101162679A (zh) * | 2006-10-11 | 2008-04-16 | 日新离子机器株式会社 | 离子注入机 |
CN201262942Y (zh) * | 2008-08-29 | 2009-06-24 | 华中科技大学 | 一种用于回旋加速器的离子源球管 |
RU95429U1 (ru) * | 2010-01-29 | 2010-06-27 | Федеральное государственное унитарное предприятие "Российский Федеральный ядерный центр - Всероссийский научно-исследовательский институт экспериментальной физики" - ФГУП "РФЯЦ-ВНИИЭФ" | Установка для ядерного микроанализа материалов |
CN202871738U (zh) * | 2012-10-08 | 2013-04-10 | 上海华力微电子有限公司 | 一种注入机束流引出电极水平校准系统 |
US20160148775A1 (en) * | 2013-06-12 | 2016-05-26 | General Plasma, Inc. | Anode layer slit ion source |
CN104299871A (zh) * | 2013-07-16 | 2015-01-21 | 上海凯世通半导体有限公司 | 离子源系统和离子束流系统 |
CN203674158U (zh) * | 2014-01-13 | 2014-06-25 | 中芯国际集成电路制造(北京)有限公司 | 一种校准装置 |
CN108848606A (zh) * | 2018-07-13 | 2018-11-20 | 中国原子能科学研究院 | 用于回旋加速器内部离子源的位置调节方法 |
CN209748882U (zh) * | 2019-01-11 | 2019-12-06 | 陕西正泽生物技术有限公司 | 一种回旋加速器离子源位置校准工具 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110708855A (zh) * | 2019-11-12 | 2020-01-17 | 中国工程物理研究院流体物理研究所 | 回旋加速器内刚性离子源的位置调节机构及其调节方法 |
CN110708855B (zh) * | 2019-11-12 | 2024-05-31 | 中国工程物理研究院流体物理研究所 | 回旋加速器内刚性离子源的位置调节机构及其调节方法 |
CN114414655A (zh) * | 2022-01-26 | 2022-04-29 | 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) | 一种电子元器件表面腐蚀层厚度的检测方法 |
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