CN109881406B - Water washing equipment and regulation and control method thereof - Google Patents
Water washing equipment and regulation and control method thereof Download PDFInfo
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- CN109881406B CN109881406B CN201810457037.5A CN201810457037A CN109881406B CN 109881406 B CN109881406 B CN 109881406B CN 201810457037 A CN201810457037 A CN 201810457037A CN 109881406 B CN109881406 B CN 109881406B
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 121
- 238000005406 washing Methods 0.000 title claims abstract description 118
- 238000000034 method Methods 0.000 title claims abstract description 29
- 230000033228 biological regulation Effects 0.000 title abstract description 8
- 238000004140 cleaning Methods 0.000 claims abstract description 161
- 239000000243 solution Substances 0.000 claims description 121
- 239000007788 liquid Substances 0.000 claims description 53
- 239000004744 fabric Substances 0.000 claims description 51
- 238000002347 injection Methods 0.000 claims description 16
- 239000007924 injection Substances 0.000 claims description 16
- 230000001276 controlling effect Effects 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 6
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 230000003750 conditioning effect Effects 0.000 claims description 2
- 238000009990 desizing Methods 0.000 description 61
- 239000002585 base Substances 0.000 description 21
- 238000010586 diagram Methods 0.000 description 8
- 230000000875 corresponding effect Effects 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000009991 scouring Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012089 stop solution Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- Control Of Washing Machine And Dryer (AREA)
- Detail Structures Of Washing Machines And Dryers (AREA)
- Accessory Of Washing/Drying Machine, Commercial Washing/Drying Machine, Other Washing/Drying Machine (AREA)
Abstract
A water washing device and a regulation and control method thereof. The water washing device comprises a washing tank, a first buffer tank, a first channel, a first overflow hole and a first acid-base sensor. The first buffer tank is arranged below the cleaning tank. The first channel is connected with the cleaning tank and the first buffer tank. The first overflow hole is arranged on the first channel and is positioned in the cleaning tank. The first acid-base sensor is arranged in the first buffer tank and is used for detecting the acid-base value of the solution in the first buffer tank. Through the configuration, when the concentration of the solution in the cleaning tank changes, the acid-base sensor cannot generate misjudgment, so that the regulation and control accuracy of the water washing equipment can be maintained.
Description
Technical Field
The invention relates to a washing device and a regulation and control method thereof.
Background
With the improvement of the standard of living, consumers have new requirements for the functions of the fabrics, and therefore, the demands of the fabrics are increasing. In the mass production process of the fabric, the fabric material as the fabric material is first cleaned and dried. In the cleaning process, the cloth can be placed in a water washing machine and soaked in liquid, so that the cloth can be subjected to a water washing procedure in the water washing machine. However, during the water washing process, the liquid properties within the water washer may vary as the water washing process proceeds over time. Therefore, it has become the focus of the related art to make corresponding adjustments for these liquid property changes.
Disclosure of Invention
One embodiment of the present invention provides a washing apparatus, which is capable of desizing and washing a fabric, and comprises a washing tank, a buffer tank, a channel, a pipeline, and an acid-base sensor for detecting an acid-base value of a solution. The cleaning tank and the buffer tank can be used for containing solution for desizing and washing, wherein the cleaning tank and the buffer tank can be connected through a channel and a pipeline, and the solution can circulate between the cleaning tank and the buffer tank. The cloth for desizing and washing is located in the washing tank, and the acid-base sensor is located in the buffer tank. Since the solution circulates between the cleaning tank and the buffer tank, the pH value detected by the pH sensor can represent the average pH value of the whole solution. Through the configuration, when the concentration of the solution in the cleaning tank changes, the acid-base sensor cannot generate misjudgment, so that the regulation and control accuracy of the water washing equipment can be maintained.
An embodiment of the invention provides a water washing apparatus, which includes a washing tank, a first buffer tank, a first channel, a first overflow hole, and a first acid-base sensor. The first buffer tank is arranged below the cleaning tank. The first channel is connected with the cleaning tank and the first buffer tank. The first overflow hole is arranged on the first channel and is positioned in the cleaning tank. The first acid-base sensor is arranged in the first buffer tank and is used for detecting the acid-base value of the solution in the first buffer tank.
In some embodiments, the water washing apparatus further includes a first pipeline, a first pump, and a controller. The first pipeline is connected with the cleaning tank and the first buffer tank. The first pump is arranged in the first buffer tank and is connected with the first pipeline. The controller is electrically connected to the first pH sensor and is used for controlling the operation state of the first pump according to the pH value.
In some embodiments, the water washing apparatus further comprises a water inlet. The water inlet is arranged on the first pipeline and is positioned in the cleaning tank, wherein the height of the water inlet relative to the first buffer tank is greater than that of the first overflow hole relative to the first buffer tank.
In some embodiments, the water washing apparatus further comprises a second buffer tank, a second channel, a second overflow hole, a second acid/alkali sensor, a second pipeline, and a second pump. The second buffer tank is adjacent to the first buffer tank. The second channel is connected with the cleaning tank and the second buffer tank. The second overflow hole is arranged on the second channel and is positioned in the cleaning tank. The second acid-base sensor is arranged in the second buffer tank and electrically connected with the controller, wherein the second acid-base sensor is used for detecting the acid-base value of the solution in the second buffer tank. The second pipeline is connected with the cleaning tank and the second buffer tank. The second pump is arranged in the second buffer tank and is connected with the second channel, wherein the second pump is electrically connected with the controller, and the controller is used for controlling the respective operation states of the first pump and the second pump according to the pH value.
In some embodiments, the volume of the cleaning tank below the first overflow hole is smaller than the volume of the first buffer tank.
In some embodiments, the washing apparatus further comprises a turbidity sensor and a controller. The turbidity sensor is arranged in the cleaning tank and used for detecting the turbidity of the solution in the cleaning tank. The controller is electrically connected with the turbidity sensor and used for judging whether to inject liquid into the cleaning tank or not according to the turbidity.
In some embodiments, the water washing apparatus further comprises a water filling device and a stopper. The water injection device is electrically connected with the controller and is used for injecting liquid into the cleaning tank. The terminator is electrically connected with the controller and used for judging whether the water injection state of the water injection device is interrupted or not according to the turbidity.
One embodiment of the present invention provides a method for controlling a water washing apparatus, which includes the following steps. The cloth is guided to enter the cleaning groove, and the cloth passing through the cleaning groove is guided to leave from the cleaning groove. The solution in the cleaning tank is circulated between the cleaning tank and the first buffer tank. The pH of the solution in the first buffer tank is detected. And judging whether to process the circulating solution or not according to the pH value of the solution.
In some embodiments, when the solution in the circulation is judged to be treated, the regulation method further comprises the following steps. The stop solution is circulated between the cleaning tank and the first buffer tank. Removing the solution in the cleaning tank, and circulating the other solution in the second buffer tank between the cleaning tank and the second buffer tank.
In some embodiments, the method further comprises the following steps. The turbidity of the solution in the wash tank is detected. Setting a turbidity interval of the solution in the cleaning tank, wherein when the turbidity is larger than the turbidity interval, the liquid is injected into the cleaning tank.
Drawings
FIG. 1 is a schematic configuration diagram of a water washing apparatus according to a first embodiment of the present disclosure;
FIG. 2 is a schematic diagram of a desizing water wash process through the water wash apparatus of FIG. 1;
FIG. 3 is a flow chart of a method of regulating the water washing apparatus of FIG. 1;
FIG. 4 is a graph showing the relationship between the turbidity and the desizing rate of a cloth in a desizing water washing process according to an exemplary embodiment of the present disclosure;
FIG. 5 is a graph showing the relationship between the turbidity and the desizing rate of a cloth in a desizing water washing process according to another example of the present disclosure;
FIG. 6 is a schematic diagram illustrating a desizing and washing process performed by a washing apparatus according to a second embodiment of the present disclosure;
FIG. 7 is a flow chart of a method of regulating the water washing apparatus of FIG. 6;
FIG. 8 is a schematic diagram illustrating a desizing and washing process performed by a washing apparatus according to a third embodiment of the disclosure.
Detailed Description
In the following description, for purposes of explanation, numerous implementation details are set forth in order to provide a thorough understanding of the various embodiments of the present invention. It should be understood, however, that these implementation details are not to be interpreted as limiting the invention. That is, in some embodiments of the invention, such implementation details are not necessary. In addition, for the sake of simplicity, some conventional structures and elements are shown in the drawings in a simplified schematic manner.
The electrical connection herein may include through a wireless connection or through a wired connection. For example, when the electrical connection is a wireless connection, the wireless connection can be implemented by a bluetooth transmission device, an infrared transmission device, a WIFI wireless network transmission device, a WT radio wave transmission device, an NFC near field communication device, an ANT + near field communication device, or a Zigbee wireless communication device (Zigbee). When the electrical connection is a wired connection, the wired connection can be realized through a physical cable, wherein the connection manner of the physical cable can include a High Definition Multimedia Interface (HDMI), a controller area network (CANbus), RS-232, or an ethernet control automation technology (etherCAT).
Referring to fig. 1, fig. 1 is a schematic configuration diagram of a water washing apparatus 100 according to a first embodiment of the disclosure. The water washing apparatus 100 may be, for example, a desizing water washing machine, which can be used for performing a desizing water washing procedure and includes a washing tank 110, a cloth inlet 112, a cloth outlet 114, a guiding device 116, a water injection device 118, a water outlet 120, a turbidity sensor 122, a first buffer tank 130, a first channel 132, a first overflow hole 134, a first pipeline 136, a first pump 138, a first water inlet 140, a first acid/alkali sensor 142, a controller 150, and a stopper 152.
The cleaning tank 110 can be used for loading a liquid (not shown), so that the water washing apparatus 100 can perform desizing and water washing on a cloth (not shown) through the liquid loaded in the cleaning tank 110. Cloth inlet 112 and cloth outlet 114 are disposed at two opposite sides of cleaning tank 110, and guiding device 116 is disposed in cleaning tank 110, and guiding device 116 may include a roller set. During the desizing and washing process, the cloth can be guided by the roller set of the guiding device 116, and then enters the washing tank 110 through the cloth inlet 112, and then leaves the washing tank 110 from the washing tank 110 through the cloth outlet 114.
The turbidity sensor 122 is disposed in the cleaning tank 110 and is used for detecting turbidity of the liquid loaded in the cleaning tank 110. Specifically, when the water washing apparatus 100 performs the desizing water washing process through the liquid in the washing tank 110, the turbidity sensor 122 is disposed below the liquid level of the liquid, so as to detect the turbidity of the liquid.
The first buffer tank 130 is disposed below the cleaning tank 110, that is, the horizontal height of the cleaning tank 110 is greater than the horizontal height of the first buffer tank 130. The first channel 132 is connected to the cleaning tank 110 and the first buffer tank 130, and the first overflow hole 134 is located in the cleaning tank 110 and disposed on the first channel 132. The first overflow hole 134 may be regarded as an inlet hole of the first channel 132, and specifically, when the liquid loaded in the cleaning tank 110 has a higher level than the first overflow hole 134, the liquid having a level exceeding the first overflow hole 134 enters the first channel 132 through the first overflow hole 134 and flows into the first buffer tank 130 along the first channel 132. Likewise, the height of the first overflow aperture 134 may also be adjusted depending on the overall design of the water wash apparatus 100.
The first pump 138 is disposed in the first buffer tank 130 and connected to the first pipeline 136, wherein the first pipeline 136 is connected to the cleaning tank 110 and the first buffer tank 130. The first water inlet 140 is located in the cleaning tank 110 and is disposed on the first pipeline 136. The liquid in the first buffer tank 130 can be pressurized by a first pump 138, then sent to the cleaning tank 110 through a first pipeline 136, and enter the cleaning tank 110 through a first water inlet 140 from the first pipeline 136.
By providing the first passage 132 and the first pipeline 136, the liquid loaded in the cleaning tank 110 and the first buffer tank 130 can be circulated between the cleaning tank 110 and the first buffer tank 130. In addition, the height of the first water inlet 140 relative to the first buffer slot 130 may be greater than the height of the first overflow hole 134 relative to the first buffer slot 130, that is, when the washing apparatus 100 performs a desizing and washing process through the liquid in the washing tank 110, the position of the first water inlet 140 is above the liquid level of the liquid, so as to prevent the liquid in the washing tank 110 from flowing to the first buffer slot 130 through the first pipeline 136, and also prevent the load factor of the first pump 138 from being too high.
The first ph sensor 142 is disposed in the first buffer tank 130 and is used for detecting the ph of the liquid loaded in the first buffer tank 130. Specifically, the first pH sensor 142 is disposed below the liquid level of the liquid expected to be loaded in the first buffer tank 130, so as to detect the pH of the liquid, for example.
The controller 150 is electrically connected to the water injection device 118, the on-off valve of the water outlet 120, the turbidity sensor 122, the first pump 138 and the first acid-base sensor 142. The controller 150 can adjust the operation status of each device through the turbidity detected by the turbidity sensor 122 and the pH value detected by the first pH sensor 142. For example, controller 150 may control the operation of water injector 118 based on the turbidity detected by turbidity sensor 122 such that water injector 118 transitions from a non-water-filled state to a water-filled state. In addition, the controller 150 can also control the operation status of the first pump 138 according to the ph detected by the first ph sensor 142, so that the first pump 138 stops pressurizing.
The stopper 152 is electrically connected to the water filling device 118 and the controller 150. The terminator 152 receives the turbidity detected by the turbidity sensor 122 from the controller 150, and determines whether to terminate the water filling state of the water filling device 118 according to the turbidity. Specifically, the stopwatch 152 may be configured to determine whether to stop the water filling apparatus 118 from filling water according to the turbidity after the water filling apparatus 118 is driven by the controller 150 to switch from the non-water filling state to the water filling state.
Through the above configuration, when the water washing apparatus 100 performs the desizing water washing through the liquid in the washing tank 110, the liquid in the washing tank 110 and the first buffer tank 130 can continuously circulate between the washing tank 110 and the first buffer tank 130 through the first pipeline 136 and the first passage 132, and thus, the states and properties of the liquid in the washing tank 110 and the first buffer tank 130 are substantially the same. That is, the ph detected by the first ph sensor 142 can be regarded as the ph of the liquid in the cleaning tank 110.
Through the above circulation system and detection mechanism, the accuracy of determining the ph of the liquid in the cleaning tank 110 can be improved. Specifically, when the liquid is injected into the cleaning tank 110 through the water injection device 118, the concentration distribution of the liquid in the cleaning tank 110 may be uneven. Therefore, through the circulation system, the liquid convection efficiency in the cleaning tank 110 can be improved, and the concentration gradient can be reduced. In addition, since the first buffer tank 130 does not directly perform the water washing process, the concentration difference and the pH difference are smaller than those of the washing tank 110, and therefore, the first acid-base sensor 142 for detecting the acid-base value is disposed in the first buffer tank 130, so that the determination accuracy can be improved.
Referring to fig. 2 and fig. 3 again, fig. 2 is a schematic diagram illustrating a desizing and washing process performed by the washing apparatus 100 of fig. 1, and fig. 3 is a flowchart illustrating a control method of the washing apparatus 100 of fig. 1, wherein the control method includes steps S100-S160. Before the desizing and washing process, a desizing solution can be prepared, wherein the desizing solution can be prepared by permeating liquid alkali, a scouring agent and a chelating dispersant. After the conditioning is complete, the solution is then added to the wash tank 110 and the first buffer tank 130, as shown by solution 102.
When the desizing and washing process is performed by the washing apparatus 100, the method for controlling the washing apparatus 100 can be started from step S100, in which step S100 is to guide the fabric 104 into the washing tank 110. Specifically, after the solution 102 is added into the cleaning tank 110 and the first buffer tank 130, the roller set of the guiding device 116 can be used to guide the cloth 104, so that the cloth 104 can enter the cleaning tank 110 through the cloth inlet 112 and leave the cleaning tank 110 through the cloth outlet 114. In the traveling path of the cloth 104, a part of the path is located below the liquid level of the solution 102, that is, the cloth 104 located in the part of the path can be soaked in the solution 102 and be washed by the solution 102.
Step S110 may be continued after step S100, wherein step S110 is to circulate the solution 102 in the cleaning tank 110 between the cleaning tank 110 and the first buffer tank 130. When the cleaning tank 110 and the first buffer tank 130 are both loaded with the solution 102, the controller 150 can send a signal to the first pump 138 to drive the first pump 138 to start pressurizing the solution 102 in the first buffer tank 130. After driving the first pump 138, the solution 102 in the first buffer tank 130 can enter the cleaning tank 110 through the first pipeline 136 and the first water inlet 140. Then, after the solution 102 starts to be sent from the first buffer tank 130 to the cleaning tank 110, the liquid level in the cleaning tank 110 also gradually rises, and when the liquid level in the cleaning tank 110 is higher than the first overflow hole 134, the solution 102 in the cleaning tank 110 enters the first channel 132 through the first overflow hole 134 and then flows into the first buffer tank 130.
Through the above mechanism, the solution 102 can circulate between the cleaning tank 110 and the first buffer tank 130. During the cycle, the cloth 104 continues to travel through the cleaning tank 110 via the guiding device 116. That is, the desizing and washing of the cloth 104 and the circulation of the solution 102 are performed simultaneously. During the circulation, the controller 150 controls the water filling state of the water filling device 118 and the opening/closing valve of the drain port 120.
Step S120 may be continued after step S110, wherein step S120 is to detect the turbidity of the solution 102 in the cleaning tank 110. When the turbidity sensor 122 in the cleaning tank 110 detects the turbidity of the solution 102, the turbidity value is transmitted back to the controller 150.
Step S130 may be continued after step S110, wherein step S130 is to determine whether to inject the liquid into the cleaning tank 110. Since the turbidity of the solution 102 gradually increases during the process of desizing and washing the fabric 104, the turbidity of the solution 102 has a correlation with the desizing rate of the fabric 104, for example, when the turbidity of the solution 102 is too high, the desizing rate of the fabric 104 is affected to some extent. Therefore, the turbidity interval of the solution 102 can be preset so that the desizing rate of the desizing and water washing process can be still maintained within the allowable range. The turbidity interval of the solution 102 can be set according to expert system, that is, different turbidity intervals can be set according to the material, weight and fiber fineness of the cloth 104 to be subjected to the desizing and washing process.
In this regard, when the turbidity detected by the turbidity sensor 122 is greater than the set turbidity range, the controller 150 can send a signal to the water injector 118 to start the water injector 118 to inject the liquid into the washing tank 110, wherein the injected liquid can be the solvent of the solution 102, such as water or an organic solvent. In addition, while the controller 150 sends a signal to the water filling device 118, the controller 150 may also send a signal to the on-off valve of the water outlet 120 to control the on-off valve of the water outlet 120 to be in an open state. Further, when the water injection device 118 injects the liquid into the cleaning tank 110, the solution 102 in the cleaning tank 110 is also discharged through the water discharge opening 120, so that the volume of the solution 102 in the cleaning tank 110 is in dynamic balance. On the other hand, if the turbidity detected by the turbidity sensor 122 is smaller than the turbidity interval, the cloth 104 is continuously washed by the desizing water in the original state, and the turbidity sensor 122 also continuously detects the turbidity of the solution 102 in the washing tank 110.
Step S140 may be continued after step S130, in which step S140 is to determine whether to stop injecting the liquid into the cleaning tank 110. When a liquid is injected into the cleaning tank 110 through the water injection device 118 and the solution 102 is discharged from the cleaning tank 110 through the water discharge port 120, the turbidity of the solution 102 in the cleaning tank 110 starts to decrease. At this time, when the turbidity of the solution 102 in the cleaning tank 110 is reduced to be less than the turbidity interval, the stopper 152 sends a signal to the water filling device 118 to stop the water filling state of the water filling device 118, and the opening and closing valve of the water outlet 120 is also controlled to be closed by the controller 150.
By the above mechanism, the water injection device 118 injects the liquid when the turbidity is greater than the turbidity range, and stops the water injection state when the turbidity is less than the turbidity range, so that the water consumption for the desizing and washing process can be reduced, and the cost can be reduced. In addition, since the turbidity interval is set by the expert system, the desizing rate of the desizing and washing cloth 104 can still have a certain quality. For example, please see fig. 4 and 5, respectively. FIG. 4 is a graph showing the relationship between the turbidity and the desizing rate of a cloth in a desizing water washing process according to an experimental example of the present disclosure, and FIG. 5 is a graph showing the relationship between the turbidity and the desizing rate of a cloth in a desizing water washing process according to another experimental example of the present disclosure.
In fig. 4, the cloth used is a polyester cloth. The horizontal axis in the graph is time in minutes. The vertical axis in the graph indicates the desizing rate and the turbidity. The desizing rate is in units of percentage and line C1 is the corresponding desizing rate. Turbidity is in ntu (nephelometric turbidity unit) and line C2 corresponds to turbidity. As shown in fig. 4, when the turbidity is controlled to be between about 1400NTU and about 1600NTU, the desizing rate of the cloth can be approximately 95% or more.
In fig. 5, the cloth used is nylon cloth. The horizontal axis in the graph is time in minutes. The vertical axis in the graph indicates the desizing rate and the turbidity. The desizing rate is in units of percentage and line C3 is the corresponding desizing rate. Turbidity is in NTU units and line C4 is the corresponding turbidity. As shown in fig. 5, when the turbidity is controlled to be between about 2200NTU and about 2400NTU, the desizing rate of the cloth can be correspondingly exhibited to be more than about 95%.
As can be seen from fig. 4 and 5, when the turbidity of the solution in the cleaning tank is maintained in the turbidity range, the desizing rate of the fabric washed by the desizing water can still have a certain quality.
Please refer to fig. 2 and fig. 3 again. Step S150 may be continued after step S110, wherein step S150 is to detect the ph of the solution 102 in the first buffer tank 130, and step S150 and step S120 may be performed simultaneously. When the first pH sensor 142 in the cleaning tank 110 detects the pH of the solution 102, the pH is transmitted back to the controller 150. Since the solution 102 circulates between the cleaning tank 110 and the first buffer tank 130, the ph detected by the first ph sensor 142 may substantially represent the ph of the whole solution 102, or the ph detected by the first ph sensor 142 may approach the average ph of the whole solution 102.
Step S160 may be continued after step S150, wherein step S160 is to determine whether to increase the concentration of the solution 102. Since the ph of the solution 102 is correlated with the concentration thereof, when the ph detected by the first ph sensor 142 is transmitted back to the controller 150, the controller 150 can know the concentration change of the solution 102 according to the detected ph.
After the liquid is injected into the cleaning tank 110 through the water injector 118 by performing the step S130, the concentration of the solution 102 may be decreased. At this time, when the concentration of the solution 102 is lower than the expected concentration due to the decrease, the controller 150 may send a signal to the first pump 138, thereby stopping the operation of the first pump 138. Then, a corresponding drug may be added to the first buffer tank 130, thereby increasing the concentration of the solution 102 in the first buffer tank 130. After the concentration of the solution 102 in the first buffer tank 130 is raised, the controller 150 sends a signal for driving the first pump 138 again, so as to send the solution 102 in the first buffer tank 130 to the cleaning tank 110. In addition, the corresponding chemicals may be added to the first buffer tank 130 in a state where the first pump 138 is continuously operated.
In some embodiments, the volume of the cleaning tank 110 below the first overflow hole 134 may be smaller than the volume of the first buffer tank 130. With this configuration, after the operation state of the first pump 138 is stopped, the solution 102 in the cleaning tank 110 is removed through the drain opening 120, and then the solution 102 in the first buffer tank 130 is sent into the cleaning tank 110, and since the volume of the first buffer tank 130 is larger than the volume of the cleaning tank 110 below the first overflow hole 134, the solution 102 in the first buffer tank 130 can be sufficiently supplemented to the cleaning tank 110. In addition, although the volume of the cleaning tank 110 from the position below the first overflow hole 134 is smaller than the volume of the first buffer tank 130, the volume of the cleaning tank 110 may be larger than the volume of the first buffer tank 130, so as to accommodate other components through the cleaning tank 110.
By this mechanism, in addition to preventing the ph of the solution 102 from being erroneously determined, since the chemical is added to the first buffer tank 130, the added chemical is prevented from adhering to the upper surface of the cloth 104, thereby preventing the cloth 104 separated from the cleaning tank 110 from being stained with an unexpected substance.
Referring to fig. 6 again, fig. 6 is a schematic diagram illustrating a desizing and washing process performed by the washing apparatus 200 according to a second embodiment of the disclosure. At least one difference between the present embodiment and the first embodiment is that the water washing apparatus 200 of the present embodiment further includes a second buffer tank 260, a second channel 262, a second overflow hole 264, a second pipeline 266, a second pump 268, a second water inlet 270, and a second acid-base sensor 272.
The second buffer tank 260 is disposed below the cleaning tank 210 and adjacent to the first buffer tank 230, and similarly, the horizontal height of the cleaning tank 210 is greater than the horizontal height of the second buffer tank 260. The second channel 262 is connected to the cleaning tank 210 and the second buffer tank 260, and the second overflow hole 264 is located in the cleaning tank and disposed on the second channel 262, so that the solution 202 in the cleaning tank 210 can enter the second channel 262 through the second overflow hole 264 and flow into the second buffer tank 260 when the water level is higher than the second overflow hole 264. In addition, the volume of the second buffer tank 260 may be greater than the volume of the cleaning tank 210 from below the second overflow hole 264.
The second pump 268 is disposed in the second buffer tank 260 and connected to the second pipeline 266, wherein the second pipeline 266 is connected to the cleaning tank 210 and the second buffer tank 260. The second pump 268 can be electrically connected to the controller 250, however, the connection between the second pump 268 and the controller 250 is not shown in FIG. 6 so as not to unduly complicate the drawing. A second water inlet 270 is located in the cleaning tank 210 and is disposed on the second line 266. The solution 202 in the second buffer tank 260 can be pressurized by the second pump 268, then sent to the cleaning tank 210 through the second pipeline 266, and then enter the cleaning tank 210 through the second pipeline 266 via the second water inlet 270. Similarly, through the above configuration, the solution 202 can be circulated between the cleaning tank 210 and the second buffer tank 260.
The second acid/base sensor 272 is disposed in the second buffer tank 260 and is used for detecting the pH of the solution 202 in the second buffer tank 260. Specifically, the second acid/base sensor 272 may be disposed below the liquid level of the solution 202 in the second buffer tank 260 to detect the acid/base value of the solution 202.
In this embodiment, the first overflow hole 234 and the second overflow hole 264 may include switch valves (not shown), and the controller 250 may electrically connect the switch valve of the first overflow hole 234 and the switch valve of the second overflow hole 264 and control the on-off state of each switch valve.
For example, when the solution 202 is set to circulate between the cleaning tank 210 and the first buffer tank 230, the controller 250 can turn off the second pump 268 and also turn off the switch valve of the second overflow hole 264, so that the solution 202 in the cleaning tank 210 does not flow into the second buffer tank 260 and the solution 202 in the second buffer tank 260 is not sent to the cleaning tank 210.
Alternatively, when the solution 202 is set to circulate between the cleaning tank 210 and the second buffer tank 260, the controller 250 may close the first pump 238 and close the valve of the first overflow hole 234, so that the solution 202 in the cleaning tank 210 does not flow into the first buffer tank 230, and the solution 202 in the first buffer tank 230 is not sent to the cleaning tank 210.
Through the above configuration, the controller 250 can be configured to control the respective operation states of the first pump 238 and the second pump 268 according to the ph value, so as to switch the usage states of the first buffer tank 230 and the second buffer tank 260, for example, the second buffer tank 260 can be used as a spare tank for the first buffer tank 230, thereby more efficiently replacing the solution 202 in the cleaning tank 210.
Referring to fig. 6 and 7, fig. 7 is a flowchart illustrating a control method of the water washing apparatus 200 of fig. 6, wherein the control method may include steps S200-S260 shown in fig. 7, and the steps S200, S210, S220, S230, S240, and S250 of fig. 7 may be performed in the same manner as steps S100, S110, S120, S130, S140, and S150 of fig. 6, which is not repeated herein.
At least one difference between the control method of the present embodiment and the control method of the first embodiment is that, in the control method of the present embodiment, after the ph of the solution 202 in the first buffer tank 230 is detected in step S250, the process may proceed to step S260, where step S260 is to determine whether to use the second buffer tank 260.
Specifically, when the solution 202 circulates between the cleaning tank 210 and the first buffer tank 230 and the liquid is injected into the cleaning tank 210 through the water injection device 218 in step S230, the concentration of the solution 202 in the cleaning tank 210 may be reduced. At this time, if the concentration of the solution 202 in the cleaning tank 210 and the first buffer tank 230 is lower than the expected concentration, the controller 250 may send a signal to the first pump 238 and the switch valve of the first overflow hole 234, so as to stop the operation of the first pump 238 and close the switch valve of the first overflow hole 234, and thus the solution 202 will stop circulating between the cleaning tank 210 and the first buffer tank 230.
Then, the controller 250 can send a signal to the open/close valve of the drain outlet 220, so that the open/close valve of the drain outlet 220 is opened, and the solution 202 in the cleaning tank 210 is drained through the drain outlet 220, thereby removing the solution 202 in the cleaning tank 210. After the solution 202 in the cleaning tank 210 is discharged, the controller 250 can send a signal to the second pump 268 and the switch valve of the second overflow hole 264, so as to drive the operation state of the second pump 268 and open the switch valve of the second overflow hole 264. Since the volume of the second buffer tank 260 is larger than the volume of the cleaning tank 210 from the position below the second overflow hole 264, the solution 202 in the second buffer tank 260 can be sufficiently used to supplement the cleaning tank 210, so that the desizing and water-washing process can be continued. At this time, the solution 202 in the cleaning tank 210 is supplied from the second buffer tank 260, and the solution 202 supplied from the second buffer tank 260 can circulate between the cleaning tank 210 and the second buffer tank 260.
While the solution 202 is supplied from the second buffer tank 260 to the cleaning tank 210, the solution 202 in the first buffer tank 230 may be replaced to meet the expected concentration, and when the desizing and water-washing process is performed for a while and the concentration of the solution 202 in the cleaning tank 210 is again lower than the expected concentration, the solution may be supplied from the first buffer tank 230 to the cleaning tank 210 and the solution 202 in the second buffer tank 260 may be replaced. Therefore, by the above configuration, the standby time of the water washing apparatus 200 can be shortened, thereby performing the desizing water washing process more efficiently.
Referring to fig. 8 again, fig. 8 is a schematic diagram illustrating a desizing and washing process performed by the washing apparatus 300 according to a third embodiment of the disclosure. At least one difference between the present embodiment and the second embodiment is that the second buffer tank 360 of the present embodiment does not use a passage and a pipeline is connected to the cleaning tank 310.
More specifically, the first buffer tank 330 is connected to the cleaning tank through the first passage 332 and the first pipeline 336, and the second buffer tank 360 is disposed beside the first buffer tank 330, wherein the second buffer tank 360 can contain the solution for the desizing and water-washing process. During the desizing and washing process using the washing tank 310 and the first buffer tank 330, when the solution 302 in the washing tank 310 needs to be replaced, the desizing and washing process may be suspended first, and the solution 302 in the washing tank 310 and the solution 302 in the first buffer tank 330 may be removed. Then, the solution in the second buffer tank 360 is sent into the first buffer tank 330, so that the desizing and washing process can be continued. However, the usage of the second buffer tank 360 is not limited thereto, and in other embodiments, after the desizing and water washing process is suspended, the second buffer tank 360 can be replaced to the position of the first buffer tank 330, and the solution in the second buffer tank 360 is circulated between the cleaning tank 310 and the second buffer tank 360, so that the desizing and water washing process can be continued.
In summary, the washing apparatus of the present invention can perform desizing and washing on cloth, and includes a washing tank, a buffer tank, a channel, a pipeline, and an acid-base sensor for detecting the acid-base value of a solution. The cleaning tank and the buffer tank can be used for containing solution for desizing and washing, wherein the cleaning tank and the buffer tank can be connected through a channel and a pipeline, and the solution can circulate between the cleaning tank and the buffer tank. The cloth for desizing and washing is located in the washing tank, and the acid-base sensor is located in the buffer tank. Since the solution circulates between the cleaning tank and the buffer tank, the pH value detected by the pH sensor can represent the average pH value of the whole solution. Through the configuration, when the concentration of the solution in the cleaning tank changes, the acid-base sensor cannot generate misjudgment, so that the regulation and control accuracy of the water washing equipment can be maintained. In addition, the number of the buffer tanks of the water washing equipment can be more than one, and the buffer tanks can be used as spare tanks, so that the standby time of the water washing equipment when the concentration of the solution is adjusted is shortened.
While the present invention has been described with reference to the preferred embodiments, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (9)
1. A water washing apparatus, comprising:
a cleaning tank;
the first buffer tank is arranged below the cleaning tank;
a first channel connecting the cleaning tank and the first buffer tank;
the first overflow hole is arranged on the first channel and is positioned in the cleaning tank;
the first acid-base sensor is arranged in the first buffer tank and is used for detecting the acid-base value of the solution in the first buffer tank;
the turbidity sensor is arranged in the cleaning tank and used for detecting the turbidity of the solution in the cleaning tank;
a first pipeline connecting the cleaning tank and the first buffer tank;
the first pump is arranged in the first buffer tank and is connected with the first pipeline; and
and the controller is electrically connected with the first acid-base sensor and is used for controlling the operation state of the first pump according to the acid-base value.
2. The water washing apparatus according to claim 1, further comprising:
the water inlet is arranged on the first pipeline and is positioned in the cleaning tank, wherein the height of the water inlet relative to the first buffer tank is greater than the height of the first overflow hole relative to the first buffer tank.
3. The water washing apparatus according to claim 1, further comprising:
a second buffer bin adjacent to the first buffer bin;
a second channel connecting the cleaning tank and the second buffer tank;
the second overflow hole is arranged on the second channel and is positioned in the cleaning tank;
the second acid-base sensor is arranged in the second buffer tank and is electrically connected with the controller, wherein the second acid-base sensor is used for detecting the acid-base value of the solution in the second buffer tank;
a second pipeline connecting the cleaning tank and the second buffer tank; and
and the second pump is arranged in the second buffer tank and is connected with the second pipeline, wherein the second pump is electrically connected with the controller, and the controller is used for controlling the respective operation states of the first pump and the second pump according to the pH value.
4. The water washing apparatus as claimed in claim 1, wherein a volume of the washing tank from below the first overflow hole is smaller than a volume of the first buffer tank.
5. The washing apparatus as claimed in claim 1, wherein the controller is electrically connected to the turbidity sensor for determining whether to fill the washing tank with the liquid according to the turbidity.
6. The water washing apparatus according to claim 5, further comprising:
the water injection device is electrically connected with the controller and is used for injecting liquid into the cleaning tank; and
and the terminator is electrically connected with the controller and is used for judging whether the water injection state of the water injection device is interrupted or not according to the turbidity.
7. A method for controlling a water washing apparatus according to any one of claims 1 to 6, comprising:
guiding the cloth to enter a cleaning groove, and guiding the cloth passing through the cleaning groove to leave from the cleaning groove;
circulating the solution in the cleaning tank between the cleaning tank and a first buffer tank;
detecting the pH value of the solution in the first buffer tank;
judging whether to process the circulating solution according to the pH value of the solution; and
detecting turbidity of the solution within the cleaning tank.
8. The method for conditioning of claim 7, wherein when it is determined that the solution in circulation is to be treated, the method further comprises:
stopping the circulation of the solution between the cleaning tank and the first buffer tank; and
removing the solution in the cleaning tank, and circulating the other solution in the second buffer tank between the cleaning tank and the second buffer tank.
9. The method for regulating and controlling according to claim 7, further comprising:
setting a turbidity interval of the solution of the cleaning tank, wherein when the turbidity is greater than the turbidity interval, injecting liquid into the cleaning tank.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106142788 | 2017-12-06 | ||
| TW106142788A TWI660091B (en) | 2017-12-06 | 2017-12-06 | Washing apparatus and adjusting method for the same |
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| CN109881406A CN109881406A (en) | 2019-06-14 |
| CN109881406B true CN109881406B (en) | 2022-05-27 |
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| CN110970199A (en) * | 2019-11-06 | 2020-04-07 | 大连第二互感器集团有限公司 | Capacitive voltage divider oiling device and oiling method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN202157191U (en) * | 2011-07-13 | 2012-03-07 | 江苏赛格纺织机械有限公司 | Automatic alkali concentration control system |
| CN102535098B (en) * | 2012-02-20 | 2016-11-23 | 青岛海尔洗衣机有限公司 | There is clothes washing method and the washing machine thereof that Turbidity measurement judges |
| CN103924419B (en) * | 2014-05-04 | 2017-01-18 | 青岛华恩洗涤机械有限公司 | Washing solution online detection method and washing device |
| CN104652064A (en) * | 2015-02-04 | 2015-05-27 | 晋江富联漂染印花工业有限公司 | Dyeing and finishing production line |
| CN105386263B (en) * | 2015-10-19 | 2017-12-01 | 广东溢达纺织有限公司 | Dyeing course monitoring method |
| CN105483963A (en) * | 2015-12-24 | 2016-04-13 | 嵊州市意海电机配件厂 | Desizing washing after-treatment equipment |
| CN105903264A (en) * | 2016-05-30 | 2016-08-31 | 苏州东展羽绒服饰有限公司 | Circulating water filtering device of washing box of desizing machine for spinning |
| CN105887393A (en) * | 2016-06-08 | 2016-08-24 | 晋江万兴隆染织实业有限公司 | Efficient desizing machine |
| CN106757898A (en) * | 2016-12-29 | 2017-05-31 | 鲁泰纺织股份有限公司 | Yarn atomizing quetsch |
-
2017
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| CN109881406A (en) | 2019-06-14 |
| TWI660091B (en) | 2019-05-21 |
| TW201925570A (en) | 2019-07-01 |
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