CN109881180B - Rapid-circulation atomic layer deposition equipment for micro-nano particles - Google Patents
Rapid-circulation atomic layer deposition equipment for micro-nano particles Download PDFInfo
- Publication number
- CN109881180B CN109881180B CN201910095421.XA CN201910095421A CN109881180B CN 109881180 B CN109881180 B CN 109881180B CN 201910095421 A CN201910095421 A CN 201910095421A CN 109881180 B CN109881180 B CN 109881180B
- Authority
- CN
- China
- Prior art keywords
- precursor
- micro
- atomic layer
- layer deposition
- nano particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Abstract
The invention belongs to the field of manufacturing of coating equipment and discloses rapid-circulation atomic layer deposition equipment for micro-nano particles, which is formed into a closed oval shape by connecting two linear motion devices and two rotary motion devices end to end, wherein each linear motion device comprises a linear vibration motor, a first water cooling plate, a first supporting plate, a first heating plate and a trough which are sequentially connected from bottom to top in the vertical direction, one end of each trough is an atomic layer deposition reaction area, and a precursor spray head is arranged above each area; the rotary motion device comprises a rotary vibration motor, a second water cooling plate, a second supporting plate, a second heating plate and a rotary motion trough which are sequentially connected from bottom to top along the vertical direction. The invention can realize the circulation movement of particles in the trough at a stable movement speed, and realize the control of the thickness of the film on the surface of the micro-nano particles by controlling the times of the micro-nano particles passing through the atomic layer deposition reaction area.
Description
Technical Field
The invention belongs to the field of manufacturing of coating equipment, and particularly relates to rapid-circulation atomic layer deposition equipment for micro-nano particles.
Background
Atomic layer deposition is a method of growing a thin film on a substrate surface by a vapor phase chemical reaction. In the atomic layer deposition reaction, two or more precursor reactants reach the surface of a substrate in a time isolation or space isolation mode and react with chemical groups on the surface of the substrate to grow a thin film. Because of the limited number of chemical groups on the substrate surface, only one precursor reactant will adsorb to the substrate surface in saturation, a property known as "self-limiting" for atomic layer deposition reactions, and thus thin films can grow as monolayers during atomic layer deposition. The film grown by atomic layer deposition has the advantages of accurate and controllable thickness, good uniformity and conformality and the like. At present, the atomic layer deposition technology has been widely used in the fields of catalytic materials, energetic materials, medical materials and the like.
However, the atomic layer deposition technology for micro-nano particles at the present stage still has the defects of limitation by vacuum conditions, low production efficiency, high cost and the like, and cannot realize rapid proceeding of atomic layer deposition reaction on the surfaces of the micro-nano particles, thereby influencing further application of atomic layer deposition in micro-nano materials. In view of the technical problem, it is found that, patent publication No. CN107099784A discloses a showerhead for growing a thin film on a planar substrate by using a spatially isolated atomic layer deposition technique, and although this method can achieve uniform growth of the thin film on the planar substrate, it cannot grow a continuous and complete thin film on the surface of the micro-nano particles having a larger specific surface. The patent with publication number CN108359960A discloses a method of growing a film on the surface of micro-nano particles by combining a vibration motor and a spatial isolation nozzle, which has the disadvantages that a particle conveying trough is in a continuous vibration process in the atomic layer deposition process, the spatial isolation nozzle is in a static state, the relative distance between the two is in a continuous change, the film growth on the surface of particles is affected by the vibration of the particle conveying trough, and the method of realizing the multilayer film deposition on the surface of particles by increasing the number of nozzles and the length of the trough in the patent publication lacks practical operability, and cannot realize the cyclic continuous deposition of micro-nano particles.
Disclosure of Invention
Aiming at the defects or improvement requirements of the prior art, the invention provides rapid cycle atomic layer deposition equipment for micro-nano particles, wherein a linear motion device and a rotary motion device are connected end to form a closed oval, and the structures and specific arrangement modes of key components of the equipment, such as a trough and a precursor spray head, are researched and designed, so that the problem of continuous and complete growth of a film on the surface of the micro-nano particles can be effectively solved, and the equipment is particularly suitable for the application occasions of atomic layer deposition of the micro-nano particles.
In order to achieve the purpose, the invention provides rapid cycle atomic layer deposition equipment for micro-nano particles, which is characterized by comprising two linear motion devices and two rotary motion devices, wherein the linear motion devices are connected with the rotary motion devices end to form a closed oval shape, and the equipment comprises:
the linear motion device comprises a linear vibration motor, a first water cooling plate, a first supporting plate, a first heating plate and a trough which are sequentially connected from bottom to top along the vertical direction, wherein the linear vibration motor is used for providing periodic vibration, the first water cooling plate is used for reducing the temperature of the linear vibration motor, the first supporting plate separates the first water cooling plate from the first heating plate, the first heating plate is fixedly arranged at the back of the trough and heats the trough in a heat conduction mode so as to heat micro-nano atomic layers in the trough, one end of the trough is a deposition reaction area, a precursor enters the deposition reaction area of the atomic layer along the horizontal direction through a precursor channel on the side wall of the trough, a precursor spray head is arranged above the deposition reaction area, and a precursor inlet is arranged on the side wall of the precursor spray head, a precursor outlet is arranged at the bottom of the reaction chamber and used for introducing a precursor into the atomic layer deposition reaction region along the vertical direction, a penetrating exhaust groove is formed between the precursor outlets, and a nozzle extraction hood is fixed above the precursor nozzle and used for extracting by-products and residual precursors in the reaction process;
the rotary motion device includes rotary vibration motor, second water cooling plate, second backup pad, second heating plate and rotary motion silo that connect gradually along vertical direction from the bottom up, wherein rotary vibration motor is used for providing periodic rotary vibration, the second water cooling plate is used for reducing rotary vibration motor's temperature, the second backup pad will the second water cooling plate separates with the second heating plate, the second heating plate fixed mounting be in rotary motion silo back heats this rotary motion silo through heat-conducting mode, and then heats micro-nano granule wherein, and this micro-nano granule is followed thereby the direction of rotary motion silo advances to get into in linear motion device's the silo.
As a further preferred, the first support plate comprises a first horizontal support plate, a first vertical support plate and a first heating plate support plate which are sequentially connected from bottom to top along the vertical direction; the second supporting plate comprises a second horizontal supporting plate, a second vertical supporting plate and a second heating plate supporting plate which are sequentially connected from bottom to top along the vertical direction.
As a further preferred, the precursor channel on the side wall of the material tank is composed of a cylindrical gas inlet part and a triangular prism gas outlet part, the gas inlet part is located on the outer side of the side wall, the gas outlet part is located on the inner side of the side wall, and the height of the gas outlet part is the same as the distance from the precursor spray head to the bottom of the material tank.
Preferably, the precursor inlets of the precursor shower head are symmetrically arranged on the side walls of the two sides, and the precursor outlets corresponding to each pair of precursor inlets are a plurality of rectangular air outlets arranged at equal intervals along the direction of the precursor inlets.
Preferably, the atomic layer deposition reaction area of the material tank comprises at least five groups of precursor channels, so that the introduced precursors of different types are isolated by inert gas, and the precursors are isolated from the atmosphere by inert gas; the precursor channels and the precursor inlets are arranged in a one-to-one correspondence manner in the vertical direction, and precursors or inert isolation gases with the same kind are introduced into the corresponding precursor channels and precursor inlets.
More preferably, the distance between the precursor shower head and the bottom of the material groove is preferably 0.7mm to 1.5 mm.
More preferably, the width of the precursor outlet of the precursor shower head and the width of the gas outlet of the material tank are both preferably 8mm to 15 mm.
Preferably, the moving speeds of the micro-nano particles on the linear motion device and the rotary motion device are the same, and are preferably 0.5cm/s to 10 cm/s.
Further preferably, the velocity of the water flow in the first water-cooled plate and the second water-cooled plate is preferably 0.4m/s to 1 m/s.
Generally, compared with the prior art, the above technical solution conceived by the present invention mainly has the following technical advantages:
1. according to the invention, the distance between the precursor nozzle and the material groove is kept constant in the movement process of the micro-nano particles by fixedly connecting the precursor nozzle and the material groove, so that the influence of the vibration of the material groove on the distribution of the precursor in an atomic layer deposition reaction area is avoided, and the stable transmission of the precursor on the surface of the micro-nano particles in the vibration process of the material groove is realized;
2. in addition, the precursor channel is arranged on the side wall of the material groove, the precursor reactant is introduced into the atomic layer deposition reaction area along the horizontal direction, the concentration of the precursor reactant in the area is increased, dead angles are avoided by setting the height of the gas outlet part to be the same as the distance from the precursor nozzle to the bottom of the material groove, and the precursor reactant is ensured to be uniformly distributed, so that a semi-reaction area which is uniformly filled with the precursor reactant is formed in the atomic layer deposition reaction area, and uniform and consistent films grow on the surface of micro-nano particles after the micro-nano particles pass through the semi-reaction area formed by two different precursors;
3. meanwhile, the linear motion device and the rotary motion device are connected end to form the closed elliptical trough, particles can circularly move in the trough at a stable movement speed when the linear motion device and the rotary motion device are at the same vibration frequency, and the thickness of the film on the surface of the micro-nano particles is controlled by controlling the times that the micro-nano particles pass through the atomic layer deposition reaction area.
Drawings
Fig. 1 is a schematic perspective view of a rapid cycle atomic layer deposition apparatus for micro-nano particles constructed according to an embodiment of the present invention;
fig. 2 is a top view of a rapid cycle atomic layer deposition apparatus for micro-nano particles constructed in accordance with an embodiment of the present invention;
FIG. 3 is an exploded view of a linear motion device constructed in accordance with an embodiment of the present invention;
FIG. 4 is a front view of a linear motion device constructed in accordance with an embodiment of the present invention;
FIG. 5 is a left side view of a linear motion device constructed in accordance with an embodiment of the invention;
FIG. 6 is an enlarged partial view of a region of a deposition reaction of a seed layer in a linear motion device constructed in accordance with an embodiment of the present invention;
FIG. 7 is an exploded view of a swivel motion device constructed in accordance with an embodiment of the present invention;
FIG. 8 is a front view of a swivel motion device constructed in accordance with an embodiment of the present invention;
FIG. 9 is a cross-sectional view of a first water cooled plate constructed in accordance with an embodiment of the invention;
FIG. 10 is a cross-sectional view of a second water cooled panel constructed in accordance with an embodiment of the present invention;
FIG. 11 is a top view of a precursor showerhead constructed in accordance with an embodiment of the invention;
FIG. 12 is a bottom view of a precursor showerhead constructed in accordance with an embodiment of the invention;
FIG. 13 is a cross-sectional view taken along the line A-A in FIG. 12;
FIG. 14 is a cross-sectional view taken along line B-B of FIG. 13;
fig. 15 is a perspective view of a trough constructed in accordance with an embodiment of the invention;
fig. 16 is a top view of a trough constructed in accordance with an embodiment of the invention;
FIG. 17 is a cross-sectional view taken along plane C-C of FIG. 16;
fig. 18 is a schematic diagram of a showerhead plenum constructed in accordance with an embodiment of the invention, wherein (a) is a perspective view, (b) is a top view, and (c) is a bottom view.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention. In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.
As shown in fig. 1-2, the present invention provides a rapid cycle atomic layer deposition apparatus for micro-nano particles, which includes two linear motion devices (devices in a first square frame) and two rotary motion devices (devices in a second square frame), wherein the linear motion devices and the rotary motion devices are connected end to form a closed ellipse, and wherein:
as shown in fig. 3 to 6, the linear motion device includes a linear vibration motor 1, a first water cooling plate 2, a first supporting plate, a first heating plate 6 and a trough 7, which are sequentially connected from bottom to top along a vertical direction, wherein the linear vibration motor 1 is used for providing periodic vibration, and the vibration can be decomposed into periodic vibration in the vertical direction and a horizontal direction, so as to provide power for throwing motion of micro-nano particles in the trough 7, so that the micro-nano particles rotate while advancing, and the surfaces of the micro-nano particles can be completely coated by a film; as shown in fig. 9, the first water cooling plate 2 is used to prevent heat of the first heating plate 6 from being transferred to the linear vibration motor 1, thereby preventing normal operation of the linear vibration motor 1 from being affected by excessive temperature; the first water cooling plate 2 is separated from the first heating plate 6 by the first supporting plate, so that the heating effect of the first heating plate 6 is prevented from being influenced; the first heating plate 6 is fixedly arranged at the back of the material tank 7, and heats the material tank 7 in a heat conduction mode so as to heat micro-nano particles in the material tank; one end of the material tank 7 is an atomic layer deposition reaction area, and a precursor enters the atomic layer deposition reaction area along the horizontal direction through a precursor channel on the side wall of the material tank 7; a precursor nozzle 8 is installed above the atomic layer deposition reaction region, a precursor inlet is formed in the side wall of the precursor nozzle 8, a precursor outlet is formed in the bottom of the precursor nozzle and used for introducing a precursor into the atomic layer deposition reaction region along the vertical direction, a penetrating exhaust groove is formed between the precursor outlets, and as shown in (a) to (c) of fig. 18, a nozzle exhaust hood 10 is fixed above the precursor nozzle 8 and sealed by a sealing ring 9; the micro-nano particles move forward along the direction of the material groove 7, and react with the precursor to realize the growth of a surface film when passing through the atomic layer deposition reaction area, and meanwhile, the nozzle air extraction cover 10 extracts by-products and residual precursors in the reaction process through the air exhaust groove;
as shown in fig. 7 to 8, the rotary motion device includes a rotary vibration motor 11, a second water cooling plate 12, a second supporting plate, a second heating plate 16 and a rotary motion trough 17 which are sequentially connected from bottom to top along a vertical direction, wherein the rotary vibration motor 11 is used for providing periodic rotary vibration, and the vibration can be decomposed into periodic vibration in the vertical direction and a horizontal direction, so as to provide power for throwing motion of particles in the rotary motion trough 17, so that micro-nano particles rotate while advancing, and the surfaces of the micro-nano particles can be completely coated by a film; as shown in fig. 10, the second water cooling plate 12 is used to prevent the temperature of the second heating plate 16 from being transferred to the rotary vibration motor, thereby preventing the normal operation of the rotary vibration motor 11 from being affected by the excessive temperature; the second support plate separates the second water cooling plate 12 from the second heating plate 16, so as to avoid influencing the heating effect of the second heating plate 16; the second heating plate 16 is fixedly arranged at the back of the rotary motion trough 17, and heats the rotary motion trough 17 in a heat conduction manner, so as to heat the micro-nano particles in the rotary motion trough; the micro-nano particles advance along the direction of the rotary motion trough 17 and then enter the trough 7 of the linear motion device.
Further, the first support plate comprises a first horizontal support plate 3, a first vertical support plate 4 and a first heating plate support plate 5 which are sequentially connected from bottom to top along the vertical direction; the second support plate comprises a second horizontal support plate 13, a second vertical support plate 14 and a second heating plate support plate 15 which are sequentially connected from bottom to top along the vertical direction.
Further, as shown in fig. 15 to 17, the precursor channel on the side wall of the material tank 7 is composed of a cylindrical gas inlet part and a triangular prism-shaped gas outlet part, the gas inlet part is located on the outer side of the side wall, and the gas outlet part is located on the inner side of the side wall and is in a long and narrow rectangular shape; and the rectangular height of the air outlet part is the same as the distance from the precursor spray head 8 to the bottom of the material groove 7, so that a dead angle is prevented from being formed in an area below the precursor spray head 8, and the concentration of the precursor in the area is uniform.
Further, as shown in fig. 11 to 14, the precursor inlets of the precursor shower head 8 are symmetrically arranged on the side walls of both sides, and the precursor outlets corresponding to each pair of precursor inlets are a plurality of slit-shaped rectangular outlets arranged at equal intervals along the direction of the precursor inlet.
Further, the atomic layer deposition reaction area of the material tank 7 comprises at least five groups of precursor channels, so that the introduced precursors of different types are isolated by inert gas, and the precursors are isolated from the atmosphere by inert gas; the precursor channels and the precursor inlets are arranged in a one-to-one correspondence manner in the vertical direction, and precursors or inert isolation gases with the same kind are introduced into the corresponding precursor channels and precursor inlets;
more specifically, according to a preferred embodiment of the present invention, the atomic layer deposition reaction area has five groups of precursor channels and precursor inlets, and the inert isolation gas, the precursor reactant 1, the inert isolation gas, the precursor reactant 2, and the inert isolation gas are sequentially introduced along the moving direction of the micro-nano particles, wherein the precursor reactant 1 and the precursor reactant 2 form two "half-reaction" areas, the micro-nano particles can complete chemical adsorption when passing through the "half-reaction" areas, and can complete the growth of a layer of film on the surface of the micro-nano particles when passing through two different "half-reaction" areas; therefore, the thickness of the film on the surface of the micro-nano particles can be controlled by the number of the precursor channels in each atomic layer deposition reaction area or the times of the micro-nano particles passing through the atomic layer deposition reaction area.
Further, the distance between the precursor nozzle 8 and the bottom of the material tank 7 is preferably 0.7 mm-1.5 mm, and if the distance is too large, the precursor will participate in the reaction before reaching the surface of the micro-nano particles, and the atomic layer deposition reaction on the surface of the micro-nano particles cannot be realized.
Further, the width of the precursor outlet of the precursor nozzle 8 and the width of the air outlet part of the material groove 7 are preferably 8-15 mm, the moving speeds of the micro-nano particles on the linear motion device and the rotary motion device are the same, and are preferably 0.5-10 cm/s, so that the precursor can be adsorbed on the surfaces of the micro-nano particles in a saturated mode.
Further, the velocity of the water flow in the first water-cooled plate 2 and the second water-cooled plate 12 is preferably 0.4m/s to 1 m/s.
The working process of the rapid cycle atomic layer deposition equipment for micro-nano particles provided by the invention is explained below.
Heating and drying the micro-nano particles, and setting the temperatures of the first heating sheet 6 and the second heating sheet 16 so as to heat the material groove 7 and the rotary motion material groove 17;
when the temperatures of the material tank 7 and the rotary motion material tank 17 reach the set temperature, respectively introducing nitrogen into the precursor channels on the side walls of the precursor sprayer 8 and the material tank 7 for purging, and removing air in the pipelines; after purging is finished, respectively introducing inert isolation gas, a precursor reactant 1, inert isolation gas, a precursor reactant 2 and inert isolation gas into the precursor channel and the precursor inlet, and ensuring that the types of the gases introduced into the corresponding precursor channel and the precursor inlet are the same;
the linear vibration motor 1 and the rotary vibration motor 11 are started, the voltage and the frequency of the linear vibration motor and the rotary vibration motor are adjusted to be consistent, so that the speed of the micro-nano particles on the material groove 7 and the rotary motion material groove 17 is consistent, the micro-nano particles are placed into the material groove 7, the micro-nano particles are enabled to continuously enter the atomic layer deposition reaction area in the oval closed space, the rapid and continuous growth of the film on the surface of the micro-nano particles is achieved, and the thickness of the film on the surface of the micro-nano particles is controlled by controlling the frequency of the micro-nano particles passing.
It will be understood by those skilled in the art that the foregoing is only a preferred embodiment of the present invention, and is not intended to limit the invention, and that any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (9)
1. The utility model provides a quick circulation atomic layer deposition equipment for micro-nano granule which characterized in that, this equipment includes two linear motion device and two rotary motion device, linear motion device with rotary motion device end to end constitutes a confined ellipse, wherein:
the linear motion device comprises a linear vibration motor (1), a first water cooling plate (2), a first supporting plate, a first heating sheet (6) and a trough (7) which are sequentially connected from bottom to top along the vertical direction, wherein the linear vibration motor (1) is used for providing periodic vibration, the first water cooling plate (2) is used for reducing the temperature of the linear vibration motor (1), the first supporting plate separates the first water cooling plate (2) from the first heating sheet (6), the first heating sheet (6) is fixedly installed at the back of the trough (7), the trough (7) is heated in a heat conduction mode to further heat micro-nano particles in the trough, one end of the trough (7) is an atomic layer deposition reaction area, and precursors enter the atomic layer deposition reaction area along the horizontal direction through a precursor channel on the side wall of the trough (7), a precursor nozzle (8) is installed above the atomic layer deposition reaction area, a precursor inlet is formed in the side wall of the precursor nozzle (8), a precursor outlet is formed in the bottom of the precursor nozzle and used for introducing a precursor into the atomic layer deposition reaction area along the vertical direction, a penetrating exhaust groove is formed between the precursor outlets, and a nozzle exhaust hood (10) is fixed above the precursor nozzle (8) and used for exhausting byproducts and residual precursors in the reaction process;
the rotary motion device comprises a rotary vibration motor (11), a second water cooling plate (12), a second supporting plate, a second heating plate (16) and a rotary motion trough (17) which are sequentially connected from bottom to top along the vertical direction, wherein the rotary vibration motor (11) is used for providing periodic rotary vibration, the second water cooling plate (12) is used for reducing the temperature of the rotary vibration motor (11), the second support plate separates the second water cooling plate (12) from a second heating sheet (16), the second heating plate (16) is fixedly arranged at the back of the rotary motion trough (17), the rotary motion trough (17) is heated in a heat conduction way, so as to heat the micro-nano particles in the trough, the micro-nano particles advance along the direction of the rotary motion trough (17) and then enter the trough (7) of the linear motion device.
2. The rapid cycle atomic layer deposition equipment for micro-nano particles according to claim 1, wherein the first support plate comprises a first horizontal support plate (3), a first vertical support plate (4) and a first heating plate support plate (5) which are sequentially connected from bottom to top along a vertical direction; the second support plate comprises a second horizontal support plate (13), a second vertical support plate (14) and a second heating plate support plate (15) which are sequentially connected from bottom to top along the vertical direction.
3. The rapid cycle atomic layer deposition equipment for micro-nano particles according to claim 1 or 2, wherein the precursor channel on the side wall of the material tank (7) is composed of a cylindrical gas inlet part and a triangular prism gas outlet part, the gas inlet part is positioned at the outer side of the side wall, the gas outlet part is positioned at the inner side of the side wall, and the height of the gas outlet part is the same as the distance from the precursor nozzle (8) to the bottom of the material tank (7).
4. The rapid cycle atomic layer deposition apparatus for micro-nano particles according to claim 1, wherein the precursor inlets of the precursor showerhead (8) are symmetrically arranged on the sidewalls of both sides, and the precursor outlets corresponding to each pair of the precursor inlets are a plurality of rectangular outlets arranged at equal intervals along the direction of the precursor inlet.
5. The rapid cycle atomic layer deposition equipment for micro-nano particles according to claim 1, wherein the atomic layer deposition reaction area of the material tank (7) comprises at least five groups of precursor channels, so as to ensure that the introduced precursors of different types are isolated by inert gas, and the precursors are isolated from the atmosphere by inert gas; the precursor channels and the precursor inlets are arranged in a one-to-one correspondence manner in the vertical direction, and precursors or inert isolation gases with the same kind are introduced into the corresponding precursor channels and precursor inlets.
6. The rapid cycle atomic layer deposition equipment for micro-nano particles according to claim 1, wherein the distance between the precursor nozzle (8) and the bottom of the material tank (7) is preferably 0.7mm to 1.5 mm.
7. The rapid cycle atomic layer deposition apparatus for micro-nano particles according to claim 1, wherein the width of the precursor outlet of the precursor nozzle (8) and the width of the gas outlet of the material tank (7) are preferably 8mm to 15 mm.
8. The rapid cycle atomic layer deposition equipment for micro-nano particles according to claim 1, wherein the micro-nano particles on the linear motion device and the rotary motion device have the same motion speed, preferably 0.5cm/s to 10 cm/s.
9. The rapid cycle atomic layer deposition apparatus for micro-nano particles according to claim 1, wherein the speed of the water flow in the first water-cooled plate (2) and the second water-cooled plate (12) is preferably 0.4m/s to 1 m/s.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910095421.XA CN109881180B (en) | 2019-01-31 | 2019-01-31 | Rapid-circulation atomic layer deposition equipment for micro-nano particles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910095421.XA CN109881180B (en) | 2019-01-31 | 2019-01-31 | Rapid-circulation atomic layer deposition equipment for micro-nano particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109881180A CN109881180A (en) | 2019-06-14 |
| CN109881180B true CN109881180B (en) | 2020-07-07 |
Family
ID=66927675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910095421.XA Active CN109881180B (en) | 2019-01-31 | 2019-01-31 | Rapid-circulation atomic layer deposition equipment for micro-nano particles |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109881180B (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6878206B2 (en) * | 2001-07-16 | 2005-04-12 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |
| CN104046958B (en) * | 2014-06-06 | 2016-08-17 | 华中科技大学 | A kind of apparatus and method modified for micro-nano granules surface |
| US10094018B2 (en) * | 2014-10-16 | 2018-10-09 | Lam Research Corporation | Dynamic precursor dosing for atomic layer deposition |
| WO2016205242A1 (en) * | 2015-06-15 | 2016-12-22 | Ald Nanosolutions, Inc. | Continuous spatial atomic layer deposition process and apparatus for applying films on particles |
| CN206319062U (en) * | 2017-01-06 | 2017-07-11 | 合肥鑫晟光电科技有限公司 | A kind of atomic layer deposition apparatus and its shower nozzle module |
| CN106917074B (en) * | 2017-03-28 | 2019-02-19 | 华中科技大学 | A kind of circulation takeup type atomic layer deposition apparatus |
| CN108359960B (en) * | 2018-03-30 | 2020-02-14 | 华中科技大学 | Quick atomic layer deposition equipment of micro-nano granule |
-
2019
- 2019-01-31 CN CN201910095421.XA patent/CN109881180B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN109881180A (en) | 2019-06-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7479303B2 (en) | Method for chemical vapor deposition (CVD) with showerhead and method thereof | |
| KR101645262B1 (en) | Gas dispersion apparatus | |
| TWI791100B (en) | MOCVD reactor | |
| KR100849929B1 (en) | Apparatus of chemical vapor deposition with a showerhead regulating the injection velocity of reactive gases positively and a method thereof | |
| KR102014519B1 (en) | Atomic layer deposition apparatus | |
| US20070148348A1 (en) | Evaporation source and method of depositing thin film using the same | |
| CN108359960B (en) | Quick atomic layer deposition equipment of micro-nano granule | |
| EP2187709B1 (en) | Vapor emission device, organic thin-film vapor deposition apparatus and method of organic thin-film vapor deposition | |
| TW201343957A (en) | Gas treatment apparatus with surrounding spray curtains | |
| US9427762B2 (en) | Gas injector and cover plate assembly for semiconductor equipment | |
| CN102365712A (en) | Web substrate deposition system | |
| TWI606137B (en) | Substrate processing apparatus | |
| TW201404925A (en) | Atomic layer deposition with rapid thermal treatment | |
| CN109881180B (en) | Rapid-circulation atomic layer deposition equipment for micro-nano particles | |
| CN112695302A (en) | MOCVD reactor | |
| KR101887192B1 (en) | A roll-to-roll type apparatus for depositing a atomic layer | |
| JP2006514161A5 (en) | ||
| TWI755956B (en) | Gas distribution module and vacuum coating device | |
| KR20090088056A (en) | Gas supplying unit and chemical vapor deposition apparatus | |
| KR20040034907A (en) | Chemical Vapor Deposition Apparatus which deposition-speed control is possible | |
| JP2003282556A (en) | Apparatus and method for supplying solid organic metal material | |
| KR100824339B1 (en) | Three-dimensional chemical vapor deposition apparatus and deposition methods using the same | |
| KR101694750B1 (en) | Nozzle for spray pyrolysis deposition and film forming apparatus having the same | |
| EP3722458B1 (en) | Film forming device | |
| JP5302834B2 (en) | Plasma processing equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |