CN109841257A - 存储器的阈值电压的恢复方法及装置 - Google Patents
存储器的阈值电压的恢复方法及装置 Download PDFInfo
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1591693A (zh) * | 2003-04-29 | 2005-03-09 | 戴洛格半导体公司 | 预检测数据丢失的闪速存储器 |
US20080181002A1 (en) * | 2007-01-31 | 2008-07-31 | Fujitsu Limited | Charge loss restoration method and semiconductor memory device |
US20140108747A1 (en) * | 2012-10-17 | 2014-04-17 | Samsung Electronics Co., Ltd. | Method of determining deterioration state of memory device and memory system using the same |
CN106205722A (zh) * | 2016-07-07 | 2016-12-07 | 北京兆易创新科技股份有限公司 | 一种非易失性存储器的恢复方法和装置 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1591693A (zh) * | 2003-04-29 | 2005-03-09 | 戴洛格半导体公司 | 预检测数据丢失的闪速存储器 |
US20080181002A1 (en) * | 2007-01-31 | 2008-07-31 | Fujitsu Limited | Charge loss restoration method and semiconductor memory device |
US20140108747A1 (en) * | 2012-10-17 | 2014-04-17 | Samsung Electronics Co., Ltd. | Method of determining deterioration state of memory device and memory system using the same |
CN106205722A (zh) * | 2016-07-07 | 2016-12-07 | 北京兆易创新科技股份有限公司 | 一种非易失性存储器的恢复方法和装置 |
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Effective date of registration: 20201010 Address after: 2301, 23rd floor, East Building, building B, Tengfei Kehui City, Singapore, No.88 Tiangu 7th Road, hi tech Zone, Xi'an City, Shaanxi Province Applicant after: XI'AN GEYI ANCHUANG INTEGRATED CIRCUIT Co.,Ltd. Applicant after: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. Applicant after: HEFEI GEYI INTEGRATED CIRCUIT Co.,Ltd. Address before: 100083 Beijing City, Haidian District Xueyuan Road No. 30, large industrial building A block 12 layer Applicant before: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. Applicant before: HEFEI GEYI INTEGRATED CIRCUIT Co.,Ltd. |
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Address after: 2301, 23rd floor, East Building, building B, Tengfei Kehui City, Singapore, No.88 Tiangu 7th Road, hi tech Zone, Xi'an City, Shaanxi Province Patentee after: XI'AN GEYI ANCHUANG INTEGRATED CIRCUIT Co.,Ltd. Patentee after: Zhaoyi Innovation Technology Group Co.,Ltd. Patentee after: HEFEI GEYI INTEGRATED CIRCUIT Co.,Ltd. Address before: 2301, 23rd floor, East Building, building B, Tengfei Kehui City, Singapore, No.88 Tiangu 7th Road, hi tech Zone, Xi'an City, Shaanxi Province Patentee before: XI'AN GEYI ANCHUANG INTEGRATED CIRCUIT Co.,Ltd. Patentee before: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. Patentee before: HEFEI GEYI INTEGRATED CIRCUIT Co.,Ltd. |