CN109835081A - A kind of double coating water developments exempt from processing CTP editions - Google Patents
A kind of double coating water developments exempt from processing CTP editions Download PDFInfo
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- CN109835081A CN109835081A CN201910070987.7A CN201910070987A CN109835081A CN 109835081 A CN109835081 A CN 109835081A CN 201910070987 A CN201910070987 A CN 201910070987A CN 109835081 A CN109835081 A CN 109835081A
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Abstract
The invention discloses a kind of double coating water developments to exempt from processing CTP editions.Whether the CTP editions can to manually check image in use wrong, whether site is normal, blind version is avoided to cause the waste in material and working hour, and effectively increase final product quality, protective layer can shield, effectively completely cut off the oxygen in air, reaction of the alkaline air such as CO2 to free radical, to guarantee that reason does not produce plate sensitivity, exposure reduces in air in storage and operation, simultaneously, the CTP editions is developed by water, the problem of avoiding environmental pollution brought by the discharge of chemical development liquid and the discharge of development flushing water, also reduce use cost.
Description
Technical field
The present invention relates to printing technologies, and in particular to a kind of double coating water developments exempt from processing CTP editions.
Background technique
Domestic traditional CT P editions need alkaline-based developer to develop, and thus bring waste developing solution discharge and development is rinsed
The problem of environmental pollution brought by the discharge of water.The unprocessed discharge of waste developing solution has been forbidden in many cities at present, it is necessary to
It is recycled through qualified department.Thus add additional use cost.
Instantly occurring a large amount of flushing-free version in the market, flushing-free version is exactly no development flushing link, after plate exposure,
Without development, directly upper printing machine develops to image under the action of developer solution and ink, shows the part got off by paper tape
It walks.Development link is thus eliminated, certainly without developer solution, less there is the discharge of developer solution, there are no environmental pollutions to ask
Topic.
But flushing-free version still has larger problem in printing process, i.e., in the inspection that can not carry out site and image
It surveys, is easy to ignore blind version and scumming, in turn results in material and artificial waste, not can guarantee product quality, Er Qiezao not only
At biggish cost consumption.
Summary of the invention
It is an object of the present invention in view of the above shortcomings of the prior art, propose that a kind of double coating water developments exempt to handle CTP
Version, is developed by water, has stable high sensitivity and higher press resistance rate.
The present invention proposes that a kind of double coating water developments exempt from processing CTP editions, including a version base, and is successively set to from the inside to the outside
The heat-sensitive layer and protective layer of one side surface of version base, the heat-sensitive layer include 25-35 parts of heat cross-linking resin, light friendship by mass parts
Resin 20-28 parts of connection, 12-18 parts of performed polymer, 8-15 parts of polyfunctional monomer, 10-16 parts of infrared absorbing agents and photoinitiator 5-8
Part.
Further, the version base is aluminum substrate.
Further, it is the aluminium of 99.1-99.5%, the iron of 0.2-0.4%, 0.05- that the aluminum substrate, which includes mass percent,
0.1% silicon, the magnesium of 0.1-0.13%, the manganese of 0.01-0.03%, the chromium of 0.01-0.03% and the zinc of 0.1-0.12%.
Further, by 9-15 containing PVAC polyvinylalcohol parts of mass parts, degree of hydrolysis 80-100%, molecular weight 1500-2000,
Coating amount is 2.8-3.2g/ ㎡.
Further, the heat cross-linking resin is styrene, methacrylonitrile, amino unsaturated double-bond and contains branched hydrophilic
Group multi-component copolymer generates.
Wherein styrol structural unit controls glass transition temperature, and amino unsaturated double-bond structural unit realizes light-exposed part parent
Aqueous to become lipophilic, group containing branched hydrophilic then enhances development effect.
Further, the optical cross-linked resin is that alkenes unsaturated group and sulfonic acid group copolymerization generate.Sulfonic acid group can
To guarantee having preferable water solubility, when being convenient for water development, better effect can be obtained.
Further, the performed polymer is esters of acrylic acid, Epoxy Acrylates, polyurethane acrylates, polyethers
One of esters of acrylic acid and organic silicon.
Further, the polyfunctional monomer is methacryloyloxyethyl acetoacetic ester and ethoxy trimethylolpropane tris third
One of olefin(e) acid ester.
Since polyurethanyl group tool has good wearability, so the present invention preferentially selects.
Further, the infrared absorbing agents are phthalocyanine dye.Phthalocyanine dye has absorption maximum in 780-850 range, more
Added with the excitation for being conducive to heat-sensitive layer;Phthalocyanine dye has good water-soluble and system compatibility simultaneously.
Further, the initiator is hexafluorophosphoric acid diphenyl iodnium.
A kind of double coating water developments provided by the invention exempt from processing CTP editions, and the CTP editions can manually examine in use
Whether wrong look into image, whether site is normal, avoids blind version from causing the waste in material and working hour, and effectively increase finished product
Quality, protective layer can shield, and effectively completely cut off the reaction of oxygen, alkalinity air such as CO2 to free radical in air, thus
Guarantee that reason does not produce plate sensitivity, exposure reduces in air in storage and operation, meanwhile, the CTP editions is carried out by water
It the problem of developing, avoiding environmental pollution brought by the discharge of chemical development liquid and the discharge of development flushing water, also reduces
Use cost.
Specific embodiment
For present invention will be further explained below with reference to specific examples.It should be understood that these embodiments are merely to illustrate this hair
It is bright rather than limit the scope of the invention.In addition, various changes or modification that those skilled in the art make the present invention, this
A little equivalent forms are equally fallen in the application range claimed.Proportion in the embodiment of the present invention is by weight.
Embodiment 1
Version base processing: using the aluminum substrate (surface roughness 0.4um is not necessarily to electrochemistry subsequent processing) of 0.4mm, first it is with concentration
18% NaOH solution is rinsed aluminium plate primary surface, and washing time is controlled in 35-45s;After flushing, with water to version base surface
It is rinsed, rinsing to pH value is neutral (being detected with pH test paper);Using concentration again is 20% nitric acid solution to aluminium plate base table
Face is rinsed, and washing time is controlled in 25-30s;After flushing, version base surface is rinsed with water, rinses to pH value and is
Property (being detected with pH test paper), finally carry out drying and processing, drying temperature will be 90-110 DEG C, drying time 45-55s.
Version base coating: the coating of photosensitive layer, coating weight 1.3-2.0g/m are carried out using coating machine to version base2, photosensitive layer presses
Mass parts include 25 parts of heat cross-linking resin, 20 parts of optical cross-linked resin, 12 parts of urethane acrylate, methacryloyloxyethyl acid second
8 parts of ester, 10 parts of phthalocyanine dye and 5 parts of hexafluorophosphoric acid diphenyl iodnium;After drying, drying, protected in photosensitive layer surface
Layer coating, 9 parts of PVAC polyvinylalcohol are coated, coating amount be 2.5-3.0g/ ㎡ to get arrive a kind of double coating water developments
Exempt from processing CTP editions.
The styrene nano-micro level particle branch introducing used in the specific embodiment of the invention has hydrophobic group-CH3;Heat cross-linking
Resin is that styrene, methacrylonitrile, amino unsaturated double-bond and the multi-component copolymer of group containing branched hydrophilic generate;Alkenes are unsaturated
Group and sulfonic acid group copolymerization generate.
Embodiment 2
Version base processing: using the aluminum substrate (surface roughness 0.4um is not necessarily to electrochemistry subsequent processing) of 0.4mm, first it is with concentration
18% NaOH solution is rinsed aluminium plate primary surface, and washing time is controlled in 35-45s;After flushing, with water to version base surface
It is rinsed, rinsing to pH value is neutral (being detected with pH test paper);Using concentration again is 20% nitric acid solution to aluminium plate base table
Face is rinsed, and washing time is controlled in 25-30s;After flushing, version base surface is rinsed with water, rinses to pH value and is
Property (being detected with pH test paper), finally carry out drying and processing, drying temperature will be 90-110 DEG C, drying time 45-55s.
Version base coating: carrying out the coating of photosensitive layer, coating weight 1.3-2.0g/m2 to version base using coating machine, and photosensitive layer is pressed
Mass parts include 30 parts of heat cross-linking resin, 24 parts of optical cross-linked resin, 15 parts of urethane acrylate, methacryloyloxyethyl acid second
11 parts of ester, 13 parts of phthalocyanine dye and 6 parts of hexafluorophosphoric acid diphenyl iodnium;After drying, drying, protected in photosensitive layer surface
The coating of layer, 12 parts of PVAC polyvinylalcohol are coated, and coating amount is 2.5-3.0g/ ㎡ to get aobvious to a kind of double coating water
Shadow exempts from processing CTP editions.
The styrene nano-micro level particle branch introducing used in the specific embodiment of the invention has hydrophobic group-CH3;Heat cross-linking
Resin is that styrene, methacrylonitrile, amino unsaturated double-bond and the multi-component copolymer of group containing branched hydrophilic generate;Alkenes are unsaturated
Group and sulfonic acid group copolymerization generate.
Embodiment 3
Version base processing: using the aluminum substrate (surface roughness 0.4um is not necessarily to electrochemistry subsequent processing) of 0.4mm, first it is with concentration
18% NaOH solution is rinsed aluminium plate primary surface, and washing time is controlled in 35-45s;After flushing, with water to version base surface
It is rinsed, rinsing to pH value is neutral (being detected with pH test paper);Using concentration again is 20% nitric acid solution to aluminium plate base table
Face is rinsed, and washing time is controlled in 25-30s;After flushing, version base surface is rinsed with water, rinses to pH value and is
Property (being detected with pH test paper), finally carry out drying and processing, drying temperature will be 90-110 DEG C, drying time 45-55s.
Version base coating: carrying out the coating of photosensitive layer, coating weight 1.3-2.0g/m2 to version base using coating machine, and photosensitive layer is pressed
Mass parts include 35 parts of heat cross-linking resin, 28 parts of optical cross-linked resin, 18 parts of urethane acrylate, methacryloyloxyethyl acid second
15 parts of ester, 16 parts of phthalocyanine dye and 8 parts of hexafluorophosphoric acid diphenyl iodnium;After drying, drying, protected in photosensitive layer surface
The coating of layer, 15 parts of PVAC polyvinylalcohol are coated, and coating amount is 2.5-3.0g/ ㎡ to get aobvious to a kind of double coating water
Shadow exempts from processing CTP editions.
The styrene nano-micro level particle branch introducing used in the specific embodiment of the invention has hydrophobic group-CH3;Heat cross-linking
Resin is that styrene, methacrylonitrile, amino unsaturated double-bond and the multi-component copolymer of group containing branched hydrophilic generate;Alkenes are unsaturated
Group and sulfonic acid group copolymerization generate.
Evaluation:
Sensitivity detection: sensitivity is the energy that photosensitive layer obtains extraneous excitation in unit area, i.e., photosensitive layer is in the excitation energy
Radiation issues heat and melts thermoplastic cross-linking reaction, unit mj/cm2, numerical value is smaller to be illustrated sensitivity higher (sensitivity is too low, then needs
The laser power of platemaking machine is excessively high, impairs laser service life;It also be easy to cause and is wanted because obtained energy is not achieved simultaneously
Derivation causes the coating degree of cross linking not enough press resistance rate to be caused to reduce), irradiated area (i.e. version base effective area) is 100-400cm2, spoke
According to source strength 10-60W, irradiation intensity is unitary variant when detection, in incrementally detecting, and records each sample sensitivity;
The detection of resistance to printing amount: within the scope of the printing quality of rule, maximum printing amount that printing plate can reach;
Stablize timeliness: i.e. under naturally occurring state, guaranteeing the maximum conserving time limit under 95% resistance to printing amount;
Using Screen 8600M-S type CTP platemaking machine.
Embodiment 1, embodiment 2 and embodiment 3 and commercially available Agfa Azura editions progress above data are detected,
Testing result is shown in Table 1:
Table 1
By table 1 it is found that embodiment 1, embodiment 2 and embodiment 3 in the present invention are marked with commercially available famous brand Agfa Azura editions
Quasi- data are very close, and have biggish advantage, especially stable timeliness in sensitivity, resistance to printing amount and stable timeliness data
Difference, compare Agfa Azura edition, product of the invention take it is resistance to store 3 months, not only reduce purchase cost, while also mentioning
The high stability of product quality, the present invention have stronger home brands competitiveness.
Exemplary illustration is carried out to the embodiment of the present invention above, but the content is only preferable implementation of the invention
Example, should not be considered as limiting the scope of the invention.All the changes and improvements etc. of all application ranges according to the present invention,
It should all fall within the scope of the patent of the present invention.
Claims (10)
1. a kind of double coating water developments exempt from processing CTP editions, it is characterised in that: be set to from the inside to the outside including a version base, and successively
The heat-sensitive layer and protective layer of one side surface of version base, the heat-sensitive layer include 25-35 parts of heat cross-linking resin, light friendship by mass parts
Resin 20-28 parts of connection, 12-18 parts of performed polymer, 8-15 parts of polyfunctional monomer, 10-16 parts of infrared absorbing agents and photoinitiator 5-8
Part.
2. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the version base is aluminium plate
Base.
3. a kind of double coating water developments as claimed in claim 2 exempt from processing CTP editions, it is characterised in that: the aluminum substrate includes
Mass percent is the aluminium of 99.1-99.5%, the iron of 0.2-0.4%, the silicon of 0.05-0.1%, the magnesium of 0.1-0.13%, 0.01-
The zinc of 0.03% manganese, the chromium of 0.01-0.03% and 0.1-0.12%.
4. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the protective layer presses matter
Part 9-15 containing PVAC polyvinylalcohol parts, degree of hydrolysis 80-100%, molecular weight 1500-2000 of amount, coating amount are 2.8-3.2g/ ㎡.
5. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the heat cross-linking resin
For the generation of styrene, methacrylonitrile, amino unsaturated double-bond and the multi-component copolymer of group containing branched hydrophilic.
6. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the optical cross-linked resin
It is generated for alkenes unsaturated group and sulfonic acid group copolymerization.
7. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the performed polymer is third
One of olefin(e) acid esters, Epoxy Acrylates, polyurethane acrylates, polyoxyalkylene acrylate esters and organic silicon.
8. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the polyfunctional monomer
For one of methacryloyloxyethyl acetoacetic ester and ethoxy trimethylolpropane trimethacrylate.
9. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the infrared absorbing agents
For phthalocyanine dye.
10. a kind of double coating water developments as described in claim 1 exempt from processing CTP editions, it is characterised in that: the initiator is six
Fluorophosphoric acid diphenyl iodnium.
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Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1800976A (en) * | 2005-12-26 | 2006-07-12 | 高丽生 | Method for manufacturing thermal sensitive CTP plate |
CN101573662A (en) * | 2006-11-06 | 2009-11-04 | 东丽株式会社 | Precursor for waterless lithographic printing plate |
CN101881929A (en) * | 2010-06-22 | 2010-11-10 | 刘华礼 | Method for preparing rinse-free negative image CTP plate |
CN102540709A (en) * | 2010-12-30 | 2012-07-04 | 乐凯华光印刷科技有限公司 | Infrared sensitive chemistry-free light-sensing composition and lithographic printing plate made from same |
CN102902161A (en) * | 2012-10-31 | 2013-01-30 | 乐凯华光印刷科技有限公司 | Negative image photosensitive composition and lithograph plate manufactured from same |
CN102912192A (en) * | 2012-09-03 | 2013-02-06 | 浙江中金铝业有限公司 | 1050 alloy CTO (computer-to-plate) substrate and preparation method thereof |
CN103173701A (en) * | 2013-03-28 | 2013-06-26 | 江苏凯华铝业有限公司 | Production method of magnesium silicon alloy glaze quenched aluminum plate |
CN104730865A (en) * | 2013-12-19 | 2015-06-24 | 乐凯华光印刷科技有限公司 | Negative image treatment-free lithograph plate |
CN104742557A (en) * | 2013-12-30 | 2015-07-01 | 乐凯华光印刷科技有限公司 | Water-developable chemistry-free thermosensitive board and preparation method thereof |
CN105372935A (en) * | 2014-08-29 | 2016-03-02 | 乐凯华光印刷科技有限公司 | Processless thermal sensitive plate used for direct printing on printer |
CN106054525A (en) * | 2016-06-23 | 2016-10-26 | 成都新图新材料股份有限公司 | Chemistry-free negative image photosensitive composite suitable for UV-CTP |
-
2019
- 2019-01-25 CN CN201910070987.7A patent/CN109835081A/en active Pending
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1800976A (en) * | 2005-12-26 | 2006-07-12 | 高丽生 | Method for manufacturing thermal sensitive CTP plate |
CN101573662A (en) * | 2006-11-06 | 2009-11-04 | 东丽株式会社 | Precursor for waterless lithographic printing plate |
CN101881929A (en) * | 2010-06-22 | 2010-11-10 | 刘华礼 | Method for preparing rinse-free negative image CTP plate |
CN102540709A (en) * | 2010-12-30 | 2012-07-04 | 乐凯华光印刷科技有限公司 | Infrared sensitive chemistry-free light-sensing composition and lithographic printing plate made from same |
CN102912192A (en) * | 2012-09-03 | 2013-02-06 | 浙江中金铝业有限公司 | 1050 alloy CTO (computer-to-plate) substrate and preparation method thereof |
CN102902161A (en) * | 2012-10-31 | 2013-01-30 | 乐凯华光印刷科技有限公司 | Negative image photosensitive composition and lithograph plate manufactured from same |
CN103173701A (en) * | 2013-03-28 | 2013-06-26 | 江苏凯华铝业有限公司 | Production method of magnesium silicon alloy glaze quenched aluminum plate |
CN104730865A (en) * | 2013-12-19 | 2015-06-24 | 乐凯华光印刷科技有限公司 | Negative image treatment-free lithograph plate |
CN104742557A (en) * | 2013-12-30 | 2015-07-01 | 乐凯华光印刷科技有限公司 | Water-developable chemistry-free thermosensitive board and preparation method thereof |
CN105372935A (en) * | 2014-08-29 | 2016-03-02 | 乐凯华光印刷科技有限公司 | Processless thermal sensitive plate used for direct printing on printer |
CN106054525A (en) * | 2016-06-23 | 2016-10-26 | 成都新图新材料股份有限公司 | Chemistry-free negative image photosensitive composite suitable for UV-CTP |
Non-Patent Citations (2)
Title |
---|
万裕全,朱梅生: "《胶印晒版原理》", 31 December 1990, 上海交通大学出版社 * |
岳德茂等: "《实用感光材料及版材技术指南》", 30 March 2007, 印刷工业出版社 * |
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Address after: 242200 No. 37, Pengju Road, Guangde Economic Development Zone, Xuancheng City, Anhui Province Applicant after: Anhui Qiangbang New Material Co.,Ltd. Address before: 242200 No. 37, Pengju Road, Guangde Economic Development Zone, Xuancheng City, Anhui Province Applicant before: ANHUI STRONG STATE PRINTING MATERIAL Co.,Ltd. |
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Application publication date: 20190604 |