CN109822452A - Porous metal matrix diamond lap polishing plate - Google Patents
Porous metal matrix diamond lap polishing plate Download PDFInfo
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- CN109822452A CN109822452A CN201910252362.2A CN201910252362A CN109822452A CN 109822452 A CN109822452 A CN 109822452A CN 201910252362 A CN201910252362 A CN 201910252362A CN 109822452 A CN109822452 A CN 109822452A
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- metal matrix
- polishing plate
- porous
- porous metal
- metallic substrate
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Abstract
The present invention provides a kind of porous metal matrix diamond lap polishing plate, including porous metallic substrate, the bortz powder on porous metallic substrate, fixed diamond powder in the coating on porous metallic substrate.Porous metal matrix diamond lap polishing plate of the present invention; with elasticity; be conducive to that workpiece is protected not to be hit in grinding; and internal capillary can promote heat dissipation and discharge when grinding to grind waste; it is polished suitable for ceramic grinding; and all there is bortz powder due to whole, it can all use, reduce cost.
Description
Technical field
The present invention relates to grinding technique more particularly to a kind of porous metal matrix diamond lap polishing plates.
Background technique
Ceramic material is widely used in every field.According to ceramic product difference, the manufacture craft that ceramic material is used
Also different.Usual ceramic preparation method includes two producing extensively step, first is that production green body, second is that sintering.
The ceramic product being made into after sintering is polished directly as needed.However, existing grinding and polishing plate rigidity is too
By force, big to damage caused by during ceramic grinding, and it is bad to conduct hot property, is easy to produce hot concentration, leads to ceramic product
Deformation, or even cracking.
Therefore, it is existing insufficient to solve ceramic grinding polishing, is the problem not being solved for a long time.
Summary of the invention
The purpose of the present invention is to provide a kind of porous metal matrix diamond lap polishing plates, throw suitable for ceramic grinding
Light, and reduce cost.
To achieve the above object, the present invention provides a kind of porous metal matrix diamond lap polishing plate, including porous metals
Substrate, the bortz powder on porous metallic substrate, fixed diamond powder are in the coating on porous metallic substrate.
The porous metallic substrate is foamed aluminium board, foam copper sheet or stainless steel foam.
The inside of the porous metallic substrate has multiple micropores, is in spongelike structure.
The quantity of the micropore of the porous metallic substrate is 20-200/cm2, aperture is 0.1mm to 2mm.
The quantity of the micropore 22 is 40-180/cm2, aperture is 0.3mm to 1.8mm.
The bortz powder is stained on the surface of the porous metallic substrate and micro-pore wall, the coating is located at described more
The surface of mesoporous metal substrate to, to fix bortz powder is corresponding, the bortz powder in micropore is not filled out with coating on micro-pore wall
The full micropore.
The partial size of the bortz powder is 1-50 microns.
The partial size of the bortz powder is 5-30 microns.
The coating plates nickel plating by water and is formed, and thickness of coating is 1-20 microns.
It is described with a thickness of 5-18 microns.
Beneficial effects of the present invention: porous metal matrix diamond lap polishing plate of the present invention has elasticity, is conducive to protect
Workpiece is not hit in grinding, and internal capillary can promote heat dissipation and discharge when grinding to grind waste, suitable for pottery
Porcelain grinding and polishing, and all there is bortz powder due to whole, it can all use, reduce cost.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the diagrammatic cross-section of porous metal matrix diamond lap polishing plate of the present invention.
Specific embodiment
Further to illustrate that the present invention is to realize the technical means and efficacy taken of predetermined purpose, please referring to following has
Detailed description and accompanying drawings of the present invention for pass, it is believed that thus the purpose of the present invention, feature and feature can should be goed deep into and specific
Understanding.
As shown in Figure 1, the present invention provides a kind of porous metal matrix diamond lap polishing plate, including porous metallic substrate 2,
Bortz powder 4, fixed diamond powder 4 on porous metallic substrate 2 is in the coating 6 on porous metallic substrate 2.
The porous metallic substrate 2 can be foamed aluminium board, foam copper sheet or stainless steel foam, the porous metallic substrate
2 the inside has multiple micropores 22, is in spongelike structure.The quantity of the micropore 22 of the porous metallic substrate 2 be 20-200/
cm2, aperture is 0.1mm to 2mm.Preferably, the quantity of micropore 22 is 40-180/cm2, aperture is 0.3mm to 1.8mm.It is more excellent
Selection of land, the quantity of micropore 22 are 70-150/cm2, aperture is 0.6mm to 1.5mm.
The bortz powder 4 is stained on the surface of the porous metallic substrate 2 and 22 wall of micropore.The bortz powder
Partial size is 1-50 microns, it is therefore preferable to 5-30 microns, more preferably 10-20 microns.
The coating 6 be located at the surface of the porous metallic substrate 2 on 22 wall of micropore with bortz powder 4 is corresponding solid
It is fixed.The coating 6 plates nickel plating by water and is formed, and coating 6 is with a thickness of 1-20 microns, it is therefore preferable to and 5-18 microns, more preferably
10-15 microns.
Bortz powder 4 and the unfilled micropore 22 of coating 6 in micropore 22 is to retain gap as heat dissipation and discharge
Grind the channel of waste, it is preferable that bortz powder 4 and coating 6 in micropore 22 fill 22 space of micropore and be lower than three points
One of, more preferably less than a quarter.There are gaps in micropore 22 grinds waste to promote to radiate and be discharged.
Porous metallic substrate 2 is flexible, is conducive to that workpiece is protected not to be hit in grinding, throws suitable for ceramic grinding
Light, and be distributed in the micropore 22 of 2 the inside of porous metallic substrate due to bortz powder 4, the porous metallic substrate 2 is not limited to table
Face uses, and can all use, reduce cost.
In conclusion porous metal matrix diamond lap polishing plate of the present invention, has elasticity, be conducive to that workpiece is protected to grind
It is not hit when mill, and internal capillary can promote heat dissipation and discharge when grinding to grind waste, throw suitable for ceramic grinding
Light, and all there is bortz powder due to whole, it can all use, reduce cost.
The above, only presently preferred embodiments of the present invention for those of ordinary skill in the art can bases
Technical solution of the present invention and technical concept make other various corresponding changes and modifications, and all these change and modification are all
It should belong to the protection scope of the claims in the present invention.
Claims (10)
1. a kind of porous metal matrix diamond lap polishing plate, which is characterized in that including porous metallic substrate (2), set on porous
Bortz powder (4), fixed diamond powder (4) on metal substrate (2) is in the coating (6) on porous metallic substrate (2).
2. porous metal matrix diamond lap polishing plate as described in claim 1, which is characterized in that the porous metallic substrate
It (2) is foamed aluminium board, foam copper sheet or stainless steel foam.
3. porous metal matrix diamond lap polishing plate as described in claim 1, which is characterized in that the porous metallic substrate
(2) the inside has multiple micropores (22), is in spongelike structure.
4. porous metal matrix diamond lap polishing plate as claimed in claim 3, which is characterized in that the porous metallic substrate
(2) quantity of micropore (22) is 20-200/cm2, aperture is 0.1mm to 2mm.
5. porous metal matrix diamond lap polishing plate as claimed in claim 4, which is characterized in that the quantity of the micropore 22
For 40-180/cm2, aperture is 0.3mm to 1.8mm.
6. porous metal matrix diamond lap polishing plate as claimed in claim 3, which is characterized in that the porous metallic substrate
(2) it is stained with the bortz powder (4) on surface and micropore (22) wall, the coating (6) is located at the porous metallic substrate
(2) surface and the bortz powder (4) that with bortz powder (4) are corresponding fixed, is located in micropore (22) on micropore (22) wall with
The unfilled micropore (22) of coating (6).
7. porous metal matrix diamond lap polishing plate as described in claim 1, which is characterized in that the grain of the bortz powder
Diameter is 1-50 microns.
8. porous metal matrix diamond lap polishing plate as claimed in claim 7, which is characterized in that the grain of the bortz powder
Diameter is 5-30 microns.
9. porous metal matrix diamond lap polishing plate as described in claim 1, which is characterized in that the coating (6) passes through
Water plating nickel plating is formed, and coating (6) is with a thickness of 1-20 microns.
10. porous metal matrix diamond lap polishing plate as claimed in claim 9, which is characterized in that described with a thickness of 5-18
Micron.
Priority Applications (1)
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CN201910252362.2A CN109822452B (en) | 2019-03-29 | 2019-03-29 | Porous metal-based diamond grinding and polishing plate |
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CN201910252362.2A CN109822452B (en) | 2019-03-29 | 2019-03-29 | Porous metal-based diamond grinding and polishing plate |
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CN109822452A true CN109822452A (en) | 2019-05-31 |
CN109822452B CN109822452B (en) | 2020-04-03 |
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CN108179448A (en) * | 2018-01-11 | 2018-06-19 | 河南工业大学 | It is a kind of to improve the plating diamond coat of metal and the method for diamond interface bond strength |
CN109015339A (en) * | 2017-06-12 | 2018-12-18 | 中国砂轮企业股份有限公司 | Grinding tool and method for manufacturing the same |
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2019
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Publication number | Priority date | Publication date | Assignee | Title |
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JPH0671568A (en) * | 1992-08-26 | 1994-03-15 | Honda Motor Co Ltd | Grinding wheel |
US6416560B1 (en) * | 1999-09-24 | 2002-07-09 | 3M Innovative Properties Company | Fused abrasive bodies comprising an oxygen scavenger metal |
WO2007137453A1 (en) * | 2006-05-29 | 2007-12-06 | Kerong Ruan | Diamond sand cloth and method of making it |
WO2010004601A1 (en) * | 2008-07-11 | 2010-01-14 | Power-Tech Srl | Abrasive member like abrasive sheet, strip, roll or belt for surface finishing or surface preparation of manufactured articles. |
CN203077113U (en) * | 2013-01-29 | 2013-07-24 | 上海馨锋超硬工具科技有限公司 | Grinding block for grinding surfaces of steel and iron materials |
CN103465177A (en) * | 2013-09-26 | 2013-12-25 | 秦皇岛星晟科技有限公司 | Formula and processing method of metal-based diamond grinding wheel |
CN204943007U (en) * | 2015-07-02 | 2016-01-06 | 辽宁融达新材料科技有限公司 | A kind of perforation foam aluminium plate |
CN205817622U (en) * | 2016-04-25 | 2016-12-21 | 珠海大象磨料磨具有限公司 | A kind of electroplated diamond napping sheet of band chip-removal hole |
CN109015339A (en) * | 2017-06-12 | 2018-12-18 | 中国砂轮企业股份有限公司 | Grinding tool and method for manufacturing the same |
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CN107866753A (en) * | 2017-12-08 | 2018-04-03 | 清华大学 | With random cellular structure metals binding agent sand wheel, device and preparation technology |
CN108179448A (en) * | 2018-01-11 | 2018-06-19 | 河南工业大学 | It is a kind of to improve the plating diamond coat of metal and the method for diamond interface bond strength |
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