CN109817558A - 一种用于匹配光学焦深范围的晶圆表面姿态简易调节结构及其调节方法 - Google Patents
一种用于匹配光学焦深范围的晶圆表面姿态简易调节结构及其调节方法 Download PDFInfo
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111243996A (zh) * | 2020-03-23 | 2020-06-05 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 晶圆清洗设备中的定位装置 |
CN114290549A (zh) * | 2021-12-21 | 2022-04-08 | 江苏京创先进电子科技有限公司 | 划片机工作台的调平机构及调平方法 |
Citations (6)
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CN1677238A (zh) * | 2005-04-27 | 2005-10-05 | 上海微电子装备有限公司 | 一种调焦调平检测装置 |
CN101733561A (zh) * | 2009-11-04 | 2010-06-16 | 中国科学院长春光学精密机械与物理研究所 | 激光修调薄膜电阻中快速精确调整焦面的方法 |
US20120205878A1 (en) * | 2008-01-15 | 2012-08-16 | Lerner Alexander N | High temperature vacuum chuck assembly |
CN102680477A (zh) * | 2012-04-24 | 2012-09-19 | 浙江大学 | 大尺寸光学元件高精度调平方法与装置 |
US20120261395A1 (en) * | 2005-04-13 | 2012-10-18 | Dean Jennings | Annealing apparatus using two wavelengths of continuous wave laser radiation |
CN107665821A (zh) * | 2016-07-29 | 2018-02-06 | 上海微电子装备(集团)股份有限公司 | 一种激光退火装置及方法 |
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- 2019-01-21 CN CN201910053363.4A patent/CN109817558B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120261395A1 (en) * | 2005-04-13 | 2012-10-18 | Dean Jennings | Annealing apparatus using two wavelengths of continuous wave laser radiation |
CN1677238A (zh) * | 2005-04-27 | 2005-10-05 | 上海微电子装备有限公司 | 一种调焦调平检测装置 |
US20120205878A1 (en) * | 2008-01-15 | 2012-08-16 | Lerner Alexander N | High temperature vacuum chuck assembly |
CN101733561A (zh) * | 2009-11-04 | 2010-06-16 | 中国科学院长春光学精密机械与物理研究所 | 激光修调薄膜电阻中快速精确调整焦面的方法 |
CN102680477A (zh) * | 2012-04-24 | 2012-09-19 | 浙江大学 | 大尺寸光学元件高精度调平方法与装置 |
CN107665821A (zh) * | 2016-07-29 | 2018-02-06 | 上海微电子装备(集团)股份有限公司 | 一种激光退火装置及方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111243996A (zh) * | 2020-03-23 | 2020-06-05 | 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) | 晶圆清洗设备中的定位装置 |
CN114290549A (zh) * | 2021-12-21 | 2022-04-08 | 江苏京创先进电子科技有限公司 | 划片机工作台的调平机构及调平方法 |
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Effective date of registration: 20211221 Address after: 100176 floor 2, building 2, yard 19, Kechuang 10th Street, Beijing Economic and Technological Development Zone, Daxing District, Beijing (Yizhuang group, high-end industrial area of Beijing Pilot Free Trade Zone) Patentee after: BEIJING U-PRECISION TECH Co.,Ltd. Patentee after: Hangzhou Tianrui Precision Technology Co.,Ltd. Address before: 100176 1802, 18 / F, building 41, yard 1, Disheng North Street, economic and Technological Development Zone, Daxing District, Beijing Patentee before: BEIJING U-PRECISION TECH Co.,Ltd. |
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Address after: 311300 room 801-14, building 1, No. 958, Dayuan Road, Qingshanhu street, Lin'an District, Hangzhou City, Zhejiang Province Patentee after: Hangzhou Tianrui Precision Technology Co.,Ltd. Country or region after: China Patentee after: BEIJING U-PRECISION TECH Co.,Ltd. Address before: 100176 floor 2, building 2, yard 19, Kechuang 10th Street, Beijing Economic and Technological Development Zone, Daxing District, Beijing (Yizhuang group, high-end industrial area of Beijing Pilot Free Trade Zone) Patentee before: BEIJING U-PRECISION TECH Co.,Ltd. Country or region before: China Patentee before: Hangzhou Tianrui Precision Technology Co.,Ltd. |