CN109778142A - A kind of reaction solution automatic recovery system and method - Google Patents
A kind of reaction solution automatic recovery system and method Download PDFInfo
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- CN109778142A CN109778142A CN201711122358.1A CN201711122358A CN109778142A CN 109778142 A CN109778142 A CN 109778142A CN 201711122358 A CN201711122358 A CN 201711122358A CN 109778142 A CN109778142 A CN 109778142A
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- bottle
- reaction solution
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Abstract
The invention discloses a kind of reaction solution automatic recovery system and method, reaction solution automatic recovery system includes: source bottle, is used for storage reaction liquid；Intake line, for being passed through carrier gas into source bottle；Output pipe, for being passed through the saturated vapor of reaction solution in the source bottle carried by carrier gas to reaction chamber in state of the art；Recovery pipe, one end are connected on the output pipe, for recycling the saturated vapor in the output pipe in non-process state.When reaction chamber does not need reactive material, reaction solution will be stored in holding bottle, can be efficiently used the reactant in the bottle of source, be avoided wasting, to reduce production cost；When reaction solution has used in the bottle of source, the new bottle for filling reaction solution is changed without source bottle is removed, the reaction solution being stored in holding bottle need to only be pushed back again to source bottle, to extend the source bottle PM period, improves the uptime.
Description
Technical field
The present invention relates to semi-conductor device technology fields, more particularly, to a kind of reaction solution automatic recovery system and side
Method.
Background technique
In recent years, semiconductor equipment is quickly grown, and is related to semiconductor, integrated circuit, solar panel, plane and is shown
Device, microelectronics, light emitting diode etc., and these devices are mainly the film different by several layers of material thickness formed on a substrate
Composition.Atomic layer deposition (ALD) technology is increasingly becoming a kind of advanced technology necessary to microelectronic component manufacturing field.
A kind of typical process of ALD can be as shown in Figure 1, comprising:
Step 1: being passed through predecessor；
Step 2: chamber purging；
Step 3: being passed through reactant reaction and generate film；
Step 4: chamber purging.
Above-mentioned steps are recyclable to be carried out, until reaching predetermined thin film thickness, technique terminates.
For predecessor or reactant, it usually needs some substances with special characteristics are used, to be stored in gas cabinet
(gasbox) in source bottle.The temperature of voltage input bottle makes these predecessors or reactant is positively retained at liquid, but can produce simultaneously
The gas of saturated vapor pressure；Quality controller (MFC) is reused to control the flow of carrier gas (carry gas), these are reacted
Gas is brought into chamber.
As shown in Fig. 2, being pipeline structure schematic diagram when using source bottle in a kind of existing ALD technique.Reaction solution storage
In source bottle 5；Source bottle is equipped with temperature control system (not shown), to maintain the temperature of reaction solution in the bottle of source.In primary depositing
In the process, the MFC1 in pipeline and valve 9-13 are opened, the reactive material that will be gasified in source bottle 5 by carrier gas (carry gas)
It brings out.It is typically provided with a liquidometer 4 in the bottle of source, for the liquid level of predecessor or reactant in detection source bottle, to determine to be
It is no to need replacing source bottle.For ALD, no matter the substance in the bottle of source is reactant or predecessor, in process cycles only
There is a step to need to be passed into chamber 6.Rapidly switch gas in order to steady, valve 2 and valve 3 are also devised in pipeline；
Wherein, the pipeline of ALD reaction chamber 6 is led in the control of valve 3, and valve 2 controls the pipeline for leading directly to pump-line (Pump Line) 7,
And fallen by vacuum pump emission treatment.When needing reactive material being passed through chamber, valve 3 is opened, while valve 2 is closed；Conversely, working as
When not needing reactive material and being passed through chamber, valve 2 is opened, and valve 3 is closed.It is all usually in the prior art using this bypass
(bypass) working method.
However, but there is following disadvantages for the above-mentioned prior art:
1, when reaction chamber does not need reactive material, reactive material will directly be taken away by vacuum pump, generate waste, from
And improve production cost.
2, it when reaction solution has used in the bottle of source, needs to remove in source bottle, rechanges the new bottle for filling reaction solution.The mistake
Journey needs are purged work repeatedly, are taken a long time, are affected board uptime (uptime).
Summary of the invention
It is an object of the invention to overcome at least one drawbacks described above of the existing technology, it is automatic to provide a kind of reaction solution
Recovery system and method.
To achieve the above object, technical scheme is as follows:
The present invention provides a kind of reaction solution automatic recovery system, the reaction solution automatic recovery system includes:
Source bottle, the source bottle are used for storage reaction liquid；
Intake line, the intake line are connect with the source bottle, for being passed through carrier gas into the source bottle；
Output pipe, the output pipe connect the source bottle and reaction chamber, are used in state of the art to reaction chamber
Room is passed through the saturated vapor of reaction solution in the source bottle carried by carrier gas；And
Recovery pipe, one end of the recovery pipe are connected on the output pipe, for returning in non-process state
Receive the saturated vapor in the output pipe.
Further, the recovery pipe is equipped with condenser and holding bottle, and the condenser is used for the recovery tube
Saturated vapor in road becomes the reaction solution of liquid；The holding bottle brings reaction solution therein by the carrier gas for collecting
Saturated vapor becomes the reaction solution of liquid.
Further, further includes: gas exhaust piping, be connected to the holding bottle and the reaction chamber pump-line it
Between, the carrier gas for being discharged in the holding bottle.
Further, further includes: replenishing line and pressure piping, the replenishing line are connected to the holding bottle and described
Between the bottle of source, for the reaction solution in the holding bottle to be inputted in the source bottle in non-process state, the pressure piping
For being passed through gas into the holding bottle, the reaction solution in the holding bottle is pressed into the source bottle.
Further, further includes: pressure relief pipe, the pressure relief pipe are connected on the source bottle.
The present invention also provides a kind of reaction solution automatic recovery methods, comprising:
When reaction solution automatic recovery system is in non-process state, intake line is kept to open, stopped from output pipe
The saturated vapor carried to reaction chamber delivery of carrier gas, and recovery pipe is opened, the saturation for carrying the carrier gas in output pipe
Steam enters the recovery pipe, recycles the saturated vapor in the output pipe.
Further, further includes: the carrier gas flowed through in the recovery pipe is discharged into the pump-line of reaction chamber.
Further, further includes:
When reaction solution automatic recovery system is in non-process state, intake line, output pipe and recovery pipe are closed,
Replenishing line is opened, it will be in the reaction solution indentation source bottle in holding bottle.
Further, further includes: gas is passed through into holding bottle by pressure piping, it will be in holding bottle to pass through pressure
Reaction solution squeezes back in the bottle of source.
Further, further includes: released by pressure relief pipe with the raising of liquid level, gas volume reduction production in the bottle of source
Raw pressure.
The invention has the following advantages that
1) when reaction chamber, which does not need reactive material, to be passed through, reaction solution will be stored in holding bottle, can be efficiently used
Reactant in the bottle of source, avoids wasting, thereby reduces production cost.
2) when reaction solution is used up in the bottle of source, the new bottle for filling reaction solution is changed without source bottle is removed, need to will only be saved
Reaction solution in holding bottle pushes back source bottle again, to extend the source bottle PM period, improves the uptime.
Detailed description of the invention
Fig. 1 is a kind of existing ALD process flow chart；
Fig. 2 is a kind of existing ALD equipment pipe-line system structural schematic diagram；
Fig. 3 is that one of a kind of reaction solution automatic recovery system structure and its working condition of a preferred embodiment of the present invention are shown
It is intended to；
Fig. 4 is two schematic diagrames of the working condition of the reaction solution automatic recovery system of Fig. 3；
Fig. 5 is three schematic diagrames of the working condition of the reaction solution automatic recovery system of Fig. 3；
1. quality controllers (MFC) in figure, 2. the 7th valves, 3. the 6th valves, 4. first liquid level gauges, 5. sources bottle, 6. is anti-
Answer chamber, 7. pump-lines, 8. intake lines, 9. first valves, 10. second valves, 11. third valves, 12. the 4th valves,
13. the 5th valve, 14. holding bottles, 15. the 9th valves, 16. the tenth valves, 17. second liquid level gauges, 18. the 11st valves, 19.
13rd valve, 20. the 8th valves, 21. condensers, 22. the 14th valves, 23. the 12nd valves, 24. output pipes, 25.
Recovery pipe, 26. gas exhaust pipings, 27. replenishing lines, 28. pressure pipings, 29. pressure relief pipes.
Specific embodiment
With reference to the accompanying drawing, specific embodiments of the present invention will be described in further detail.
It should be noted that in following specific embodiments, when describing embodiments of the invention in detail, in order to clear
Ground indicates structure of the invention in order to illustrate, spy does not draw to the structure in attached drawing according to general proportion, and has carried out part
Amplification, deformation and simplified processing, therefore, should be avoided in this, as limitation of the invention to understand.
In specific embodiment of the invention below, referring to Fig. 3, Fig. 3 is one kind of a preferred embodiment of the present invention
One of reaction solution automatic recovery system structure and its working condition schematic diagram.As shown in figure 3, a kind of reaction solution of the invention is automatic
Recovery system, comprising: source bottle 5, intake line 8, output pipe 24, the structures such as recovery pipe 25.Intake line 8 connects source bottle,
For being passed through carrier gas into source bottle.Source bottle connects reaction chamber 6 by output pipe；Source bottle is used for storage reaction liquid, reaction solution
Refer to the liquid form of the various technique substances including predecessor and reactant.Output pipe is used in state of the art
The saturated vapor that reaction solution in the source bottle carried by carrier gas is passed through to reaction chamber, which carries out such as ALD thin film deposition processes, (please join
It examines background technology part to understand the introduction of the prior art).
The first valve 9, the second valve 10 and third valve 11 can be equipped on the intake line 8, it can also be in the first valve 9
Fixing quality control device (MFC) 1 before, for controlling.The 4th valve 12, the 5th valve 13 can be equipped on the output pipe 24
With the 6th valve 3.
Please refer to Fig. 3.One end of recovery pipe 25 is connected on the output pipe 24, specially the one of recovery pipe 25
End is connected on the output pipe between source bottle and reaction chamber, for recycling in the output pipe in non-process state
Saturated vapor, i.e., during process cycles, when reaction chamber does not need reactive material, by it is non-be passed through reaction chamber when
Reaction solution saturated vapor, which is carried by carrier gas and condenses to be passed through in holding bottle 14, is recycled that (existing way is to be passed through reaction chamber for non-
Reaction solution saturated vapor when room is passed directly into the pump-line of reaction chamber by carrier gas carrying).Thus can by script from
The reaction solution lost in vain in pump-line is stored in holding bottle, and the reactant being effectively utilized in the bottle of source avoids wave
Take, to reduce production cost.
In order to which the reaction solution saturated vapor of the recovered pipeline of convection current is preferably recycled, can also pacify in the recovery pipe
Fill condenser 21.
The 7th valve 2 (being equivalent to the valve 2 in Fig. 2) can be equipped in recovery pipe between condenser 21 and output pipe,
Recovery pipe between condenser and holding bottle is equipped with the 8th valve 20, the 9th valve 15.
Please refer to Fig. 3.The present invention may also include gas exhaust piping 26；Gas exhaust piping 26 is connected to holding bottle 14 and reaction chamber
Pump-line (Pump Line) 7 between, for when recycling reaction solution, recovery pipe will be flowed through enter the carrier gas of holding bottle
It is discharged by pump-line, and is deposited in condensation in holding bottle as the reaction solution after liquid again.
The tenth valve 16 can be equipped on the gas exhaust piping.
Please continue to refer to Fig. 3.The present invention may also include replenishing line 27 and pressure piping 28.Wherein, replenishing line 27 connects
It connects between holding bottle 14 and source bottle 5, is carried out for the reaction solution recycled in holding bottle to be added in the bottle of source with press mode
Fluid infusion again.The replacement that can need not thus carry out new source bottle, only need to push back again source for the reaction solution being stored in holding bottle
Bottle improves the uptime to extend the source bottle PM period.The 11st valve can be equipped on the replenishing line
18.Pressure piping 28 is for being passed through pressurized carrier gas into holding bottle 14.The 12nd can be successively arranged on the pressure piping
Valve 23, the 13rd valve 19 and the 9th valve 15, i.e. pressure piping can access the 8th valve 20 and the 9th in recovery pipe
Between valve, so as to share the incoming end for entering holding bottle with recovery pipe.
The present invention may also include pressure relief pipe 29；Pressure relief pipe 29 is connected on source bottle 5, for carrying out fluid infusion to source bottle
When, release with the pressure that the raising of liquid level in the bottle of source, gas volume reduce and generate.The tenth can be equipped on the pressure relief pipe
Four valves 22.Pressure relief pipe can lead to factory service air draft (To Exhaust)；It is of course also possible to be directly connected on pump-line 7.
Below by way of specific embodiment and attached drawing, two kinds of reaction solution automatic recovery methods of the invention are carried out specifically
It is bright.
The first reaction solution automatic recovery method of the invention, can be used above-mentioned reaction solution automatic recovery system, comprising:
Please refer to Fig. 3.When carrying out such as ALD technique, when reaction chamber need reactive material (such as Fig. 1 step 1,
When step 3), opening intake line 8, i.e., the MFC1 in opening intake line 8 and the first valve to third valve 9-11, to source bottle
In be passed through carrier gas (carry Gas), close recovery pipe 25 on the 7th valve 2, condenser 21, the 8th valve 20, the 9th valve
Door 15, and the 6th valve 3 on output pipe 24 is opened, the reaction solution in the source bottle 5 carried by carrier gas is passed through to reaction chamber 6
Saturated vapor carry out such as ALD technique (the pipeline path for please referring to overstriking in Fig. 3).
It can carry out the liquid level of predecessor or reactant in detection source bottle, by the first liquid level gauge 4 being equipped in the bottle of source to determine
Whether fluid infusion is needed.
Please refer to Fig. 4.When reaction solution automatic recovery system is in non-process state, that is, when reaction chamber does not need
Reactive material, i.e. when source bottle work is in bypass (bypass) when, such as purged (such as step 2, the step of Fig. 1
4) it when, keeps MFC1 and the first valve in intake line 8 to open to third valve 9-11, closes the 6th on output pipe 24
Valve 3 stops saturated vapor from output pipe to reaction chamber delivery of carrier gas that carry from, and open in recovery pipe 25 the 7th
Valve 2, condenser 21, the 8th valve 20, the 9th valve 15, described in the saturated vapor that carries the carrier gas in output pipe enters
Recovery pipe recycles the saturated vapor in the output pipe, i.e., carries the saturated vapor of reaction solution in source bottle 5 simultaneously by carrier gas
Become liquid again after condenser condenses, is passed through in holding bottle 14 and is recycled.
In above-mentioned removal process, the carrier gas flowed through in recovery pipe and holding bottle can be by opening on gas exhaust piping 26
Tenth valve 16 makes carrier gas be discharged into the pump-line 7 of reaction chamber (the pipeline path for please referring to overstriking in Fig. 4).
It can be by the second liquid level gauge 17 that is equipped in holding bottle 14, to detect the predecessor or reactant that recycle in holding bottle
Liquid level, with determine a need for source bottle 5 in fluid infusion.
Second of reaction solution automatic recovery method of the invention, equally can be used above-mentioned reaction solution automatic recovery system,
Include:
Please refer to Fig. 3.When carrying out such as ALD technique, when reaction chamber need reactive material (such as Fig. 1 step 1,
When step 3), opening intake line 8, i.e., the MFC1 in opening intake line 8 and the first valve to third valve 9-11, to source bottle
In be passed through carrier gas (carry Gas), close recovery pipe 25 on the 7th valve 2, condenser 21, the 8th valve 20, the 9th valve
Door 15, and the 4th valve on output pipe 24 is opened to the 6th valve 12,13,3, it is passed through to reaction chamber 6 and is carried by carrier gas
Source bottle 5 in reaction solution saturated vapor carry out such as ALD technique (the pipeline path for please referring to overstriking in Fig. 3).
It can carry out the liquid level of predecessor or reactant in detection source bottle, by the first liquid level gauge 4 being equipped in the bottle of source to determine
Whether fluid infusion is needed.
Please refer to Fig. 4.When reaction solution automatic recovery system is in non-process state, that is, when reaction chamber does not need
Reactive material, i.e. when source bottle work is in bypass (bypass) when, such as purged (such as step 2, the step of Fig. 1
4) it when, keeps MFC1 and the first valve in intake line 8 to open to third valve 9-11, closes the 6th on output pipe 24
Valve 3 stops saturated vapor from output pipe to reaction chamber delivery of carrier gas that carry from, and open in recovery pipe 25 the 7th
Valve 2, condenser 21, the 8th valve 20, the 9th valve 15, described in the saturated vapor that carries the carrier gas in output pipe enters
Recovery pipe recycles the saturated vapor in the output pipe, i.e., carries the saturated vapor of reaction solution in source bottle 5 simultaneously by carrier gas
Become liquid again after condenser condenses, is passed through in holding bottle 14 and is recycled.
In above-mentioned removal process, the carrier gas flowed through in recovery pipe and holding bottle can be by opening on gas exhaust piping 26
Tenth valve 16 makes carrier gas be discharged into the pump-line 7 of reaction chamber (the pipeline path for please referring to overstriking in Fig. 4).At this point, making
13rd valve 19, the 14th valve 22 are in close state.
It can be by the second liquid level gauge 17 that is equipped in holding bottle 14, to detect the predecessor or reactant that recycle in holding bottle
Liquid level, with determine a need for source bottle 5 in fluid infusion.
Please refer to Fig. 5.When the liquid level in the source bottle 5 that first liquid level gauge 4 detects is too low lower than the first limit, i.e. liquid level
When or the holding bottle 14 that detects of second liquid level gauge 17 in liquid level be higher than the second limit, when i.e. liquid level is excessively high, then can be mended
Liquid.At this point, board should be at non-process state, and close the MFC1 in intake line 8 and the first valve to third valve 9-11,
Close the 4th valve to the 6th valve 12,13,3 on output pipe 24, the 7th valve 2, condensation in closing recovery pipe 25
Device 21, the 8th valve 20 close the tenth valve 16 on gas exhaust piping 26, open the 11st valve 18 on replenishing line 27,
And the 12nd valve 23, the 13rd valve 19 and the 9th valve 15 on opening pressure piping 28, increasing is passed through into holding bottle
Carrier gas after pressure is squeezed back the reaction solution in holding bottle 14 in source bottle 5 by pressure as make-up gas (refill gas).
At this point, can lead to factory service air draft (To Exhaust), use by opening the 14th valve 22 on pressure relief pipe 29
To release as the pressure that the raising of liquid level, gas volume reduce and generate in the bottle of source (please refers to the pipeline road of overstriking in Fig. 5
Diameter).
Needle-valve can be used in 12nd valve 23, for adjusting the tolerance of make-up gas (refill gas)；It can also increase
Increase pressure regulator valve on pressure pipe road 28, to adjust speed when fluid infusion.
When detecting that the liquid level in the bottle of source is up to standard, or when detecting that liquid level in holding bottle is too low, fluid infusion terminates；This
When, close the valve of associated pipe.
Above-described to be merely a preferred embodiment of the present invention, the patent that the embodiment is not intended to limit the invention is protected
Range is protected, therefore all with the variation of equivalent structure made by specification and accompanying drawing content of the invention, similarly should be included in
In protection scope of the present invention.
Claims (10)
1. a kind of reaction solution automatic recovery system, which is characterized in that the reaction solution automatic recovery system includes:
Source bottle, the source bottle are used for storage reaction liquid；
Intake line, the intake line are connect with the source bottle, for being passed through carrier gas into the source bottle；
Output pipe, the output pipe connect the source bottle and reaction chamber, for logical to reaction chamber in state of the art
Enter the saturated vapor of reaction solution in the source bottle carried by carrier gas；And
Recovery pipe, one end of the recovery pipe are connected on the output pipe, for recycling institute in non-process state
State the saturated vapor in output pipe.
2. reaction solution automatic recovery system according to claim 1, which is characterized in that the recovery pipe is equipped with condensation
Device and holding bottle, the condenser are used to become the saturated vapor in the recovery pipe reaction solution of liquid；The storage
Bottle is for collecting the reaction solution for becoming liquid from the saturated vapor that reaction solution therein is brought in the carrier gas into.
3. reaction solution automatic recovery system according to claim 2, which is characterized in that further include: gas exhaust piping, connection
Carrier gas between the holding bottle and the pump-line of the reaction chamber, for being discharged in the holding bottle.
4. reaction solution automatic recovery system according to claim 2, which is characterized in that further include: replenishing line and pressurization
Pipeline, the replenishing line are connected between the holding bottle and source bottle, are used for the storage in non-process state
Reaction solution in bottle inputs in the source bottle, and the pressure piping is for being passed through gas into the holding bottle, by the storage
Reaction solution in bottle is pressed into the source bottle.
5. reaction solution automatic recovery system according to claim 4, which is characterized in that further include: pressure relief pipe, it is described to let out
Pressure pipe road is connected on the source bottle.
6. a kind of reaction solution automatic recovery method characterized by comprising
When reaction solution automatic recovery system is in non-process state, intake line is kept to open, stopped from output pipe to anti-
The saturated vapor for answering chamber delivery of carrier gas to carry, and recovery pipe is opened, the saturated vapor for carrying the carrier gas in output pipe
Into the recovery pipe, the saturated vapor in the output pipe is recycled.
7. reaction solution automatic recovery method according to claim 6, which is characterized in that further include: by the recovery pipe
In the carrier gas that flows through be discharged into the pump-line of reaction chamber.
8. reaction solution automatic recovery method according to claim 6, which is characterized in that further include:
When reaction solution automatic recovery system is in non-process state, intake line, output pipe and recovery pipe are closed, is opened
Replenishing line, will be in the reaction solution indentation source bottle in holding bottle.
9. reaction solution automatic recovery method according to claim 8, which is characterized in that further include: by pressure piping to
Gas is passed through in holding bottle, to squeeze back the reaction solution in holding bottle in the bottle of source by pressure.
10. reaction solution automatic recovery method according to claim 9, which is characterized in that further include: it is let out by pressure relief pipe
Fall with the pressure that the raising of liquid level in the bottle of source, gas volume reduce and generate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201711122358.1A CN109778142A (en) | 2017-11-14 | 2017-11-14 | A kind of reaction solution automatic recovery system and method |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201711122358.1A CN109778142A (en) | 2017-11-14 | 2017-11-14 | A kind of reaction solution automatic recovery system and method |
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| CN109778142A true CN109778142A (en) | 2019-05-21 |
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| CN201711122358.1A Withdrawn CN109778142A (en) | 2017-11-14 | 2017-11-14 | A kind of reaction solution automatic recovery system and method |
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| CN114622188A (en) * | 2020-12-10 | 2022-06-14 | 中国科学院微电子研究所 | Precursor circulation system, supplement method and semiconductor equipment |
| CN115074706A (en) * | 2022-06-17 | 2022-09-20 | 北京北方华创微电子装备有限公司 | Source bottle liquid supplementing method of semiconductor process equipment and semiconductor process equipment |
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