CN109671653A - 一种半导体晶圆清洗装置 - Google Patents
一种半导体晶圆清洗装置 Download PDFInfo
- Publication number
- CN109671653A CN109671653A CN201811598277.3A CN201811598277A CN109671653A CN 109671653 A CN109671653 A CN 109671653A CN 201811598277 A CN201811598277 A CN 201811598277A CN 109671653 A CN109671653 A CN 109671653A
- Authority
- CN
- China
- Prior art keywords
- fixed block
- water
- water tank
- semiconductor crystal
- water pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- 239000004065 semiconductor Substances 0.000 title claims abstract description 29
- 239000013078 crystal Substances 0.000 title claims abstract description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 121
- 239000007921 spray Substances 0.000 claims abstract description 63
- 230000000694 effects Effects 0.000 claims abstract description 31
- 238000004064 recycling Methods 0.000 claims abstract description 29
- 239000010410 layer Substances 0.000 claims description 28
- 239000003651 drinking water Substances 0.000 claims description 12
- 235000020188 drinking water Nutrition 0.000 claims description 12
- 238000011084 recovery Methods 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000002344 surface layer Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 7
- 230000003749 cleanliness Effects 0.000 abstract description 6
- 230000001681 protective effect Effects 0.000 abstract description 4
- 230000002787 reinforcement Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 description 6
- 239000008213 purified water Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000013475 authorization Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811598277.3A CN109671653B (zh) | 2018-12-26 | 2018-12-26 | 一种半导体晶圆清洗装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811598277.3A CN109671653B (zh) | 2018-12-26 | 2018-12-26 | 一种半导体晶圆清洗装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109671653A true CN109671653A (zh) | 2019-04-23 |
CN109671653B CN109671653B (zh) | 2020-10-20 |
Family
ID=66147586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811598277.3A Active CN109671653B (zh) | 2018-12-26 | 2018-12-26 | 一种半导体晶圆清洗装置 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN109671653B (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112122201A (zh) * | 2020-08-26 | 2020-12-25 | 江苏黄金屋光学眼镜有限公司 | 一种抗蓝光近视镜片生产用清洗装置 |
CN112435918A (zh) * | 2020-12-10 | 2021-03-02 | 江西舜源电子科技有限公司 | 一种半导体材料的清洗装置 |
CN112768375A (zh) * | 2020-12-30 | 2021-05-07 | 江苏亚电科技有限公司 | 一种高效晶圆片的清洗装置 |
CN112838030A (zh) * | 2020-12-30 | 2021-05-25 | 江苏亚电科技有限公司 | 一种用于晶圆的清洗装置 |
CN113035744A (zh) * | 2021-02-25 | 2021-06-25 | 无锡亚电智能装备有限公司 | 一种半导体晶圆清洗装置 |
CN113035743A (zh) * | 2021-02-25 | 2021-06-25 | 无锡亚电智能装备有限公司 | 一种逐步抬升晶圆的晶圆清洗方法 |
CN113245275A (zh) * | 2021-05-12 | 2021-08-13 | 四川雅吉芯电子科技有限公司 | 一种外延片清洗装置 |
CN113562485A (zh) * | 2021-06-03 | 2021-10-29 | 河北邯峰发电有限责任公司 | 一种用于消除运煤火车霜冻蒸汽装置 |
CN113798247A (zh) * | 2021-09-28 | 2021-12-17 | 京东方科技集团股份有限公司 | 镀后清洗风干机构、系统、方法及电化学沉积设备 |
CN114308842A (zh) * | 2022-03-14 | 2022-04-12 | 智程半导体设备科技(昆山)有限公司 | 一种半导体晶圆槽式清洗机用自动清洗槽 |
CN114618827A (zh) * | 2022-03-22 | 2022-06-14 | 江苏医药职业学院 | 一种生物医药试管自动化清洗装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2717547Y (zh) * | 2004-06-07 | 2005-08-17 | 河北省自动化研究所 | 多工位清洗机 |
CN205576306U (zh) * | 2016-04-27 | 2016-09-14 | 南昌华骏汽车配件有限公司 | 一种用于汽车配件的电泳漆后期处理设备 |
CN107799393A (zh) * | 2017-09-26 | 2018-03-13 | 合肥新汇成微电子有限公司 | 一种半导体晶圆的清洗方法 |
-
2018
- 2018-12-26 CN CN201811598277.3A patent/CN109671653B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2717547Y (zh) * | 2004-06-07 | 2005-08-17 | 河北省自动化研究所 | 多工位清洗机 |
CN205576306U (zh) * | 2016-04-27 | 2016-09-14 | 南昌华骏汽车配件有限公司 | 一种用于汽车配件的电泳漆后期处理设备 |
CN107799393A (zh) * | 2017-09-26 | 2018-03-13 | 合肥新汇成微电子有限公司 | 一种半导体晶圆的清洗方法 |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112122201A (zh) * | 2020-08-26 | 2020-12-25 | 江苏黄金屋光学眼镜有限公司 | 一种抗蓝光近视镜片生产用清洗装置 |
CN112435918A (zh) * | 2020-12-10 | 2021-03-02 | 江西舜源电子科技有限公司 | 一种半导体材料的清洗装置 |
CN112768375A (zh) * | 2020-12-30 | 2021-05-07 | 江苏亚电科技有限公司 | 一种高效晶圆片的清洗装置 |
CN112838030A (zh) * | 2020-12-30 | 2021-05-25 | 江苏亚电科技有限公司 | 一种用于晶圆的清洗装置 |
CN112768375B (zh) * | 2020-12-30 | 2022-06-10 | 江苏亚电科技有限公司 | 一种高效晶圆片的清洗装置 |
CN113035743B (zh) * | 2021-02-25 | 2022-01-25 | 无锡亚电智能装备有限公司 | 一种逐步抬升晶圆的晶圆清洗方法 |
CN113035744A (zh) * | 2021-02-25 | 2021-06-25 | 无锡亚电智能装备有限公司 | 一种半导体晶圆清洗装置 |
CN113035743A (zh) * | 2021-02-25 | 2021-06-25 | 无锡亚电智能装备有限公司 | 一种逐步抬升晶圆的晶圆清洗方法 |
CN113035744B (zh) * | 2021-02-25 | 2021-12-03 | 无锡亚电智能装备有限公司 | 一种半导体晶圆清洗装置 |
CN113245275A (zh) * | 2021-05-12 | 2021-08-13 | 四川雅吉芯电子科技有限公司 | 一种外延片清洗装置 |
CN113562485A (zh) * | 2021-06-03 | 2021-10-29 | 河北邯峰发电有限责任公司 | 一种用于消除运煤火车霜冻蒸汽装置 |
CN113562485B (zh) * | 2021-06-03 | 2022-12-16 | 河北邯峰发电有限责任公司 | 一种用于消除运煤火车霜冻蒸汽装置 |
CN113798247A (zh) * | 2021-09-28 | 2021-12-17 | 京东方科技集团股份有限公司 | 镀后清洗风干机构、系统、方法及电化学沉积设备 |
CN114308842A (zh) * | 2022-03-14 | 2022-04-12 | 智程半导体设备科技(昆山)有限公司 | 一种半导体晶圆槽式清洗机用自动清洗槽 |
CN114618827A (zh) * | 2022-03-22 | 2022-06-14 | 江苏医药职业学院 | 一种生物医药试管自动化清洗装置 |
Also Published As
Publication number | Publication date |
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CN109671653B (zh) | 2020-10-20 |
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PB01 | Publication | ||
PB01 | Publication | ||
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GR01 | Patent grant | ||
GR01 | Patent grant | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: A semiconductor wafer cleaning device Effective date of registration: 20221204 Granted publication date: 20201020 Pledgee: Huai'an Guosheng Financing Guarantee Co.,Ltd. Pledgor: JIANGSU NEPES SEMICONDUCTOR Co.,Ltd. Registration number: Y2022980024889 |
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PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Granted publication date: 20201020 Pledgee: Huai'an Guosheng Financing Guarantee Co.,Ltd. Pledgor: JIANGSU NEPES SEMICONDUCTOR Co.,Ltd. Registration number: Y2022980024889 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right |