CN109661614A - 激光修复方法和激光修复设备 - Google Patents

激光修复方法和激光修复设备 Download PDF

Info

Publication number
CN109661614A
CN109661614A CN201780053942.8A CN201780053942A CN109661614A CN 109661614 A CN109661614 A CN 109661614A CN 201780053942 A CN201780053942 A CN 201780053942A CN 109661614 A CN109661614 A CN 109661614A
Authority
CN
China
Prior art keywords
impurity
peripheral position
substrate
laser
residual impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201780053942.8A
Other languages
English (en)
Inventor
张耀宇
王小文
王彤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Royole Technologies Co Ltd
Original Assignee
Shenzhen Royole Technologies Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Royole Technologies Co Ltd filed Critical Shenzhen Royole Technologies Co Ltd
Publication of CN109661614A publication Critical patent/CN109661614A/zh
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting

Abstract

一种激光修复方法和设备，用于去除基板(20)上的杂质(30)，激光修复方法包括步骤：获取一个杂质(30)在基板(20)上的初始位置(S1)；轰击位于初始位置的杂质(30)(S2)；以初始位置为中心检测基板(20)的周缘位置是否有残留杂质(32)(S3)，周缘位置环绕初始位置；若周缘位置有残留杂质(32)，则轰击位于周缘位置的残留杂质(32)(S4)。

Description

PCT国内申请，说明书已公开。

Claims (16)

  1. PCT国内申请，权利要求书已公开。
CN201780053942.8A 2017-08-04 2017-08-04 激光修复方法和激光修复设备 Pending CN109661614A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2017/096035 WO2019024091A1 (zh) 2017-08-04 2017-08-04 激光修复方法和激光修复设备

Publications (1)

Publication Number Publication Date
CN109661614A true CN109661614A (zh) 2019-04-19

Family

ID=65233206

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201780053942.8A Pending CN109661614A (zh) 2017-08-04 2017-08-04 激光修复方法和激光修复设备

Country Status (2)

Country Link
CN (1) CN109661614A (zh)
WO (1) WO2019024091A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113857610A (zh) * 2021-09-27 2021-12-31 苏州科韵激光科技有限公司 一种激光拆焊方法和装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110842367A (zh) * 2019-10-09 2020-02-28 大族激光科技产业集团股份有限公司 一种激光修复微型led的装置和方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090038637A1 (en) * 2007-08-09 2009-02-12 Rav, Llc Apparatus and method for indirect surface cleaning
CN101564795A (zh) * 2008-04-22 2009-10-28 奥林巴斯株式会社 校正装置、校正方法以及控制装置
CN102626829A (zh) * 2011-08-16 2012-08-08 北京京东方光电科技有限公司 基板的激光修复装置以及激光修复方法
CN103698970A (zh) * 2013-12-19 2014-04-02 无锡中微掩模电子有限公司 集成电路用掩模版金属残留缺陷修补方法
TW201422320A (zh) * 2012-12-03 2014-06-16 Gudeng Prec Industral Co Ltd 光罩之吹氣清潔系統及其清潔方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6829035B2 (en) * 2002-11-12 2004-12-07 Applied Materials Israel, Ltd. Advanced mask cleaning and handling
CN101226337A (zh) * 2007-01-17 2008-07-23 台湾积体电路制造股份有限公司 除去位于被护膜覆盖的掩模上的杂质的装置及方法
US20080264441A1 (en) * 2007-04-30 2008-10-30 Yoji Takagi Method for removing residuals from photomask
KR101461437B1 (ko) * 2013-05-27 2014-11-18 에이피시스템 주식회사 포토마스크 세정 장치 및 이를 이용한 포토마스크 세정 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090038637A1 (en) * 2007-08-09 2009-02-12 Rav, Llc Apparatus and method for indirect surface cleaning
CN101564795A (zh) * 2008-04-22 2009-10-28 奥林巴斯株式会社 校正装置、校正方法以及控制装置
CN102626829A (zh) * 2011-08-16 2012-08-08 北京京东方光电科技有限公司 基板的激光修复装置以及激光修复方法
TW201422320A (zh) * 2012-12-03 2014-06-16 Gudeng Prec Industral Co Ltd 光罩之吹氣清潔系統及其清潔方法
CN103698970A (zh) * 2013-12-19 2014-04-02 无锡中微掩模电子有限公司 集成电路用掩模版金属残留缺陷修补方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113857610A (zh) * 2021-09-27 2021-12-31 苏州科韵激光科技有限公司 一种激光拆焊方法和装置

Also Published As

Publication number Publication date
WO2019024091A1 (zh) 2019-02-07

Similar Documents

Publication Publication Date Title
KR101469403B1 (ko) 하전 입자선 장치
US7315359B2 (en) Method for monitoring micro-lens curvature in-line
CN109661614A (zh) 激光修复方法和激光修复设备
US20120070089A1 (en) Method of manufacturing a template matching template, as well as a device for manufacturing a template
EP1040334A1 (en) Method and apparatus for the automatic inspection of optically transmissive objects having a lens portion
JP2015206642A (ja) 欠陥観察方法及びその装置
KR20090018711A (ko) 무한 보정 현미경의 자동 포커싱을 위한 방법 및 장치
JP5764592B2 (ja) 基板処理装置、基板処理装置の監視装置及び基板処理装置の監視方法
JP5393797B2 (ja) 荷電粒子線装置の信号処理方法、及び信号処理装置
JP2014095728A (ja) 試料の検査，測定方法、及び荷電粒子線装置
US20150241680A1 (en) Image Measurement Device
JP2010203776A (ja) 表面検査装置及びその校正方法
JP6122711B2 (ja) 位置合わせ装置、真空装置、位置合わせ方法
JP2012220558A (ja) 顕微鏡装置
KR20180045045A (ko) 멀티빔 암시야 이미징
TWI805875B (zh) 使用淺層深度學習的差值濾波器及孔徑選擇之系統與方法
JP5015552B2 (ja) パターン修正装置
US11181883B2 (en) Processing apparatus and processing method
CN109839061B (zh) 一种镜头模组检测方法和系统
JPH07243831A (ja) 紡糸口金自動検査装置及び検査方法
JP2008014646A (ja) 基板検査方法
JP2021085815A (ja) 光照射装置、検査システム、及び、光照射方法
JP5349978B2 (ja) 荷電粒子線を用いた寸法計測方法、および寸法計測装置
JP2014232082A (ja) パターン検査方法及びパターン検査装置
JP5544700B2 (ja) 検査装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
CB02 Change of applicant information

Address after: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province

Applicant after: Shenzhen Ruoyu Technology Co.,Ltd.

Address before: Building 43, Dayun software Town, No. 8288 Longgang Avenue, Henggang street, Longgang District, Shenzhen City, Guangdong Province

Applicant before: SHENZHEN ROYOLE TECHNOLOGIES Co.,Ltd.

CB02 Change of applicant information
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20190419

WD01 Invention patent application deemed withdrawn after publication