CN109594047B - Preparation method of chiral metal micro-nano spiral structure - Google Patents
Preparation method of chiral metal micro-nano spiral structure Download PDFInfo
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Abstract
The invention relates to the field of preparation of chiral metal micro-nano structures, in particular to a preparation method of a chiral metal micro-nano spiral structure. The preparation method is simple and easy to operate, the requirement on experimental equipment is low, and the prepared chiral metal micro-nano spiral structure has strong circular dichroism signals.
Description
Technical Field
The invention belongs to the field of preparation of chiral metal micro-nano structures, and particularly relates to a preparation method of a chiral metal micro-nano spiral structure.
Background
Chirality refers to the property of a structure that is not completely coincident with its mirror enantiomer. Chirality is a fundamental feature of life processes, and most of organic molecules constituting a living body are chiral molecules. Circular dichroism is an important means to study chirality.
The circular dichroism signal of chiral molecules in nature is very weak, which is not favorable for the practical signal detection and application of biomedicine and pharmacology. Since metals interact more strongly with light, metal nanostructures have stronger circular dichroism due to surface plasmon effects, as in the literature "mario hentschel, martin schaferling, thomas weiss, naiu, and haraldgiessen.three-dimensional chiral plasmon ohigomers. nanolett.2012,12, 2542-; and the preparation time period is long by using an electron beam exposure system, the sample area is small (30 mu m multiplied by 30 mu m), the Au evaporation with the thickness of 100nm in the text is still used for evaporating a metal layer by using an electron beam vacuum evaporation system (or a magnetron sputtering system), the circular dichroism spectrum signal of the structure is still relatively weak, the spectrum signal acquisition method is also limited, the acquisition condition is harsh, and a high-price micro-area spectrum system needs to be built for detection.
The existing preparation method for preparing the metal spiral structure is complex and expensive, and the circular dichroism signal is weak, so that the signal acquisition and detection are limited.
Disclosure of Invention
In order to solve the problem that the preparation process of the metal micro-nano spiral structure is complicated in the prior art, the invention provides a preparation method of a chiral metal micro-nano spiral structure.
The technical problem to be solved by the invention is realized by the following technical scheme:
a preparation method of a chiral metal micro-nano spiral structure is characterized in that a polystyrene pellet is used as a substrate, insulating materials are obliquely evaporated on the substrate in a clockwise or anticlockwise circulating rotation mode to form a spiral structure, and metal materials are vertically evaporated on the spiral structure to form the metal spiral structure.
Further, the insulating material is silicon dioxide, and the metal material is gold or silver.
A preparation method of a chiral metal micro-nano spiral structure comprises the following steps:
preparing a single-layer polystyrene bead template;
adhering the prepared single-layer polystyrene bead template on a substrate by using a double faced adhesive tape, putting the single-layer polystyrene bead template on a sample table of a vacuum coating machine, closing an electron beam evaporation coating instrument, and vacuumizing;
setting the deposition angle to be 4 degrees, evaporating the insulating material, rotating the azimuth angle in a clockwise or anticlockwise direction, and circularly evaporating the insulating material for multiple times;
setting the deposition angle to 90 degrees, and evaporating the metal material to obtain a metal spiral structure;
and step five, cooling the instrument, filling nitrogen, and taking out the sample.
Further, the third specific film coating process comprises:
firstly, setting a deposition angle to be 4 degrees, evaporating and plating an insulating material for 5nm at the position No. 1, then rotating an azimuth angle 120 degrees anticlockwise each time, and evaporating and plating the insulating material for 5nm, wherein 5 times of circulation is performed, namely, 5 times of circulation evaporation and plating are performed respectively in the sequence of the positions No. 2-3-1-2-3, the evaporation and plating of the first layer are completed, and a similar triangular structure with connected end points is formed;
continuing evaporation on the basis of the first layer, rotating the azimuth angle anticlockwise to 240 degrees, evaporating an insulating material at the position No. 2 for 5nm, rotating the azimuth angle anticlockwise to 120 degrees, and evaporating an insulating material at the position No. 3 for 5 nm; the evaporation process is circulated once again, namely, the azimuth angles are rotated anticlockwise by 240 degrees and 120 degrees in sequence, the insulating materials are evaporated at the positions 2-3 for 5nm respectively, and the evaporation of the second layer is finished to form a step-shaped semi-spiral structure;
and then continuing to perform evaporation on the basis of the second layer, respectively evaporating an insulating material for 5nm at the position 3, and performing evaporation twice to finally form a spiral structure.
Further, the third specific film coating process comprises:
firstly, setting a deposition angle to be 4 degrees, evaporating and plating an insulating material for 5nm at the position No. 1, then rotating the azimuth angle clockwise for 120 degrees each time, evaporating and plating the insulating material for 5nm, and circulating for 5 times in such a way, namely, circularly evaporating and plating for 5 times respectively in the sequence of the positions No. 3-2-1-3-2, finishing the evaporation of the first layer, and forming a similar triangular structure with connected end points;
continuing evaporation on the basis of the first layer, rotating the azimuth angle clockwise to 240 degrees, evaporating an insulating material at the position No. 3 for 5nm, rotating the azimuth angle clockwise to 120 degrees, and evaporating an insulating material at the position No. 2 for 5 nm; the evaporation process is circulated once again, namely, the azimuth angles are rotated clockwise by 240 degrees and 120 degrees in sequence, the insulating materials are evaporated at the positions 3-2 by 5nm respectively, and the evaporation of the second layer is finished to form a step-shaped semi-spiral structure;
and then continuing evaporation on the basis of the second layer, respectively evaporating an insulating material for 5nm at the position No. 2, and evaporating twice to finally form a spiral structure.
Further, the coating process in the fourth step is as follows: and on the basis of the spiral structure after evaporation, adjusting the deposition angle to 90 degrees, and vertically evaporating the metal material by 20 nm.
Further, the beam evaporation rate of the evaporation insulation material is
The beam evaporation rate of the evaporated metal material is
Further, the starting condition of the coating in the third step is that the pressure of the cavity of the vacuum coating machine in the second step is lower than 3 multiplied by 10 < -6 > Torr.
Further, the process for preparing the monolayer polystyrene bead template in the first step is as follows:
step 1: preparing a glass sheet a and two glass sheets b, wherein the widths of the glass sheet a and the glass sheet b are not more than 1cm, and the glass sheets a and the glass sheets b are cleaned, and the cleaning process comprises the following steps: cleaning the glass sheet with a detergent, performing ultrasonic treatment on the glass sheet with acetone for 15 minutes, washing the glass sheet with deionized water, performing ultrasonic treatment on the glass sheet with alcohol for 15 minutes, washing the glass sheet with the deionized water to clean the alcohol, and storing the glass sheet in the deionized water for later use;
step 2: stacking the two cleaned glass sheets b and placing the stacked glass sheets b into a culture dish, and injecting deionized water into the culture dish, wherein the liquid level of the deionized water is lower than the upper surface of the glass sheet b;
and step 3: mixing the polystyrene small ball suspension with alcohol, loading into a sample tube, performing ultrasonic treatment for 3 minutes,
obtaining a mixed solution of polystyrene spheres and alcohol, wherein the diameter of the polystyrene spheres is 600nm, and the volume ratio of the suspension of the polystyrene spheres to the alcohol is 1: 1-5: 1;
and 4, step 4: slowly injecting a mixed solution of polystyrene spheres and alcohol onto the surfaces of the two glass sheets by using a needle tube, wherein the solution of the polystyrene spheres can diffuse on the surface of the deionized water solution to form a single-layer polystyrene sphere film, and continuously and slowly injecting the solution until the whole liquid level is full of the single-layer polystyrene spheres;
and 5: slowly injecting deionized water into the deionized water solution obtained in the step (4) to improve the liquid level of the solution;
step 6: polymerizing the monolayer polystyrene bead film on the deionized water liquid level formed in the step 4 by using Tx100 solution;
and 7: and (3) placing the glass sheet a in the area without the single-layer polystyrene bead film, which is treated in the step (6), adjusting the position of the glass sheet to be below the single-layer polystyrene film, then lifting the glass sheet a by using tweezers, and placing the glass sheet a with the single-layer polystyrene bead film in an oven at 40 ℃ for baking to obtain the single-layer polystyrene bead template.
Compared with the prior art, the invention has the beneficial effects that:
(1) according to the method for coating the film by electron beam evaporation, the insulating material is evaporated and plated as a medium in a multi-cycle rotating mode through controlling parameters of the electron beam evaporation coating, and the metal is vertically evaporated and plated for one time, so that the metal micro-nano spiral structure with chirality is obtained;
(2) the situation of uneven arrangement of the polystyrene spheres is easily caused in the preparation process of the polystyrene spheres, and the chiral structure prepared by the prior art can be manually offset in different characteristic directions, so that the chirality of the whole structure is small. However, the chiral metal micro-nano spiral structure prepared by the preparation method of the embodiment of the application is slightly affected by the uneven arrangement of the small spheres, and the chirality of a single structure is the same in different characteristic directions of the array structure, so that the inherent chirality of the whole structure is large.
(3) According to the embodiment of the application, the method that the insulating material is evaporated to form the spiral structure and then the metal is evaporated is adopted, so that the preparation process is simplified, and the preparation cost of the chiral metal structure is reduced;
(4) the method for preparing the metal spiral structure in the embodiment of the application adopts multiple times of circulating rotation evaporation of the insulating material, so that the step effect is reduced, and the preparation process is more accurate;
(5) the chiral metal helical structure prepared by the scheme of the embodiment of the application has a good chiral effect, and can be applied to biological monitoring, an antipodal sensor, polarization conversion and a photoelectronic circular polarizer.
Drawings
Fig. 1 is a scanning electron microscope picture of a single structure of a metal helical structure prepared by a method for preparing a chiral metal micro-nano helical structure in example 1 of the present application;
fig. 2 is a scanning electron microscope picture of a metal helical structure array prepared by the method for preparing a chiral metal micro-nano helical structure in example 1 of the present application;
fig. 3 is a circular dichroism spectrum of a metal helical structure prepared by a method for preparing a chiral metal micro-nano helical structure in example 1 of the present application;
wherein, in fig. 1: 1. position No. 1; 2. position No. 2; 3. position No. 3.
Detailed Description
In order to solve the problem that the preparation method of the chiral metal spiral structure in the prior art is complicated, the invention provides the preparation method of the chiral metal spiral structure.
The present invention will be described in further detail with reference to specific examples, but the embodiments of the present invention are not limited thereto.
Example 1:
a preparation method of a chiral metal micro-nano spiral structure is characterized by comprising the following steps: the metal micro-nano spiral structure takes polystyrene spheres as a substrate, insulating materials are obliquely evaporated on the substrate in a clockwise or anticlockwise circulating rotation mode to form a spiral structure, and metal materials are vertically evaporated on the spiral structure to form the metal spiral structure. The insulating material is silicon dioxide, and the metal material is gold or silver.
The preparation method of the chiral metal micro-nano spiral structure comprises the following steps:
preparing a single-layer polystyrene bead template;
adhering the prepared single-layer polystyrene bead template on a substrate by using a double faced adhesive tape, putting the single-layer polystyrene bead template on a sample table of a vacuum coating machine, closing an electron beam evaporation coating instrument, and vacuumizing;
specifically, the method comprises the following steps: when the pressure of the cavity of the vacuum film plating machine is lower than 3 multiplied by 10 < -6 > Torr, the next film plating work is carried out.
Setting the deposition angle to be 4 degrees, evaporating the insulating material, rotating the azimuth angle in a clockwise or anticlockwise direction, and circularly evaporating the insulating material for multiple times;
specifically, the method comprises the following steps: firstly, setting a deposition angle to be 4 degrees, evaporating and plating an insulating material for 5nm at the position No. 1, then rotating an azimuth angle 120 degrees anticlockwise each time, and evaporating and plating the insulating material for 5nm, wherein 5 times of circulation is performed, namely, 5 times of circulation evaporation and plating are performed respectively in the sequence of the positions No. 2-3-1-2-3, the evaporation and plating of the first layer are completed, and a similar triangular structure with connected end points is formed;
continuing evaporation on the basis of the first layer, rotating the azimuth angle anticlockwise to 240 degrees, evaporating an insulating material at the position No. 2 for 5nm, rotating the azimuth angle anticlockwise to 120 degrees, and evaporating an insulating material at the position No. 3 for 5 nm; the evaporation process is circulated once again, namely, the azimuth angles are rotated anticlockwise by 240 degrees and 120 degrees in sequence, the insulating materials are evaporated at the positions 2-3 for 5nm respectively, and the evaporation of the second layer is finished to form a step-shaped semi-spiral structure;
and then continuing to perform evaporation on the basis of the second layer, respectively evaporating an insulating material for 5nm at the position 3, and performing evaporation twice to finally form a spiral structure.
Setting the deposition angle to 90 degrees, and evaporating the metal material to obtain a metal spiral structure;
specifically, the method comprises the following steps: and on the basis of the spiral structure after evaporation, adjusting the deposition angle to 90 degrees, and vertically evaporating the metal material by 20 nm.
And step five, cooling the instrument, filling nitrogen, and taking out the sample.
Specifically, the method comprises the following steps:
the used instrument of coating by vaporization in this application embodiment is electron beam evaporation coating film appearance, and its angle of rotation and the speed and the time of coating film can all be adjusted through control panel.
The deposition angle in the embodiment of the application is defined as an included angle between the sample stage and the beam direction, and the azimuth angle is defined as an angle of the sample stage rotating by taking a normal line passing through the center of a circle as an axis.
In the embodiment of the present application, the evaporation rate of the beam of the evaporation insulation material is
The beam evaporation rate of the evaporated metal material is
By controlling the beam evaporation rate in the preparation process, the shape of the prepared spiral structure can be ensured.
As shown in fig. 1, which is an SEM image of a metal micro-nano spiral structure prepared by the preparation method according to the embodiment of the present application, a complete single structure is shown in the SEM image, and reference numerals 1, 2, and 3 in fig. 1 are position No. 1, position No. 2, and position No. 3, respectively, during evaporation in step three. From the structural plan view of the preparation, the structure is similar to a triangular structure, but due to the fact that the heights of the positions 1, 2 and 3 in the circulating evaporation mode are different, a three-dimensional spiral metal micro-nano structure is formed, wherein the heights of the three-dimensional spiral metal micro-nano structure are sequentially increased from the position 1 to the position 3 from the position 2, and the structure has chirality.
As shown in fig. 2, which is an SEM image of the metal micro-nano spiral structure prepared by the preparation method according to the embodiment of the present application, a metal micro-nano spiral structure array is shown in the SEM image, and it can be seen from the SEM image that the metal micro-nano spiral structure prepared according to the embodiment of the present application is a spiral structure with a six-close-packed periodic arrangement.
The structure prepared by the preparation method of the embodiment of the application is measured by a normal incidence or oblique incidence method of light to obtain circular dichroism, the spectral line of a circular dichroism signal is shown in figure 3, and the signal reaches 300mdeg at the maximum.
Example 2:
the preparation steps of this embodiment are substantially the same as those of embodiment 1, and the difference is only the coating method in step three, and the specific coating process in step three in the preparation method of this embodiment is as follows:
firstly, setting a deposition angle to be 4 degrees, evaporating and plating an insulating material for 5nm at the position No. 1, then rotating the azimuth angle clockwise for 120 degrees each time, evaporating and plating the insulating material for 5nm, and circulating for 5 times in such a way, namely, circularly evaporating and plating for 5 times respectively in the sequence of the positions No. 3-2-1-3-2, finishing the evaporation of the first layer, and forming a similar triangular structure with connected end points;
continuing evaporation on the basis of the first layer, rotating the azimuth angle clockwise to 240 degrees, evaporating an insulating material at the position No. 3 for 5nm, rotating the azimuth angle clockwise to 120 degrees, and evaporating an insulating material at the position No. 2 for 5 nm; the evaporation process is circulated once again, namely, the azimuth angles are rotated clockwise by 240 degrees and 120 degrees in sequence, the insulating materials are evaporated at the positions 3-2 by 5nm respectively, and the evaporation of the second layer is finished to form a step-shaped semi-spiral structure;
and then continuing evaporation on the basis of the second layer, respectively evaporating an insulating material for 5nm at the position No. 2, and evaporating twice to finally form a spiral structure.
The chiral metal micro-nano spiral structure prepared by the preparation method of the embodiment of the application is a chiral isomer of the chiral metal micro-nano structure prepared in the embodiment 1, and circular dichroism signals of the two structures have the same size and opposite signs.
The circular dichroism of the prepared structure is measured by a normal incidence or oblique incidence method of light.
Example 3
The preparation method of the chiral metal micro-nano spiral structure provided in the embodiments 1 and 2, wherein the process of preparing the monolayer polystyrene bead template in the first step is as follows:
step 1: preparing a glass sheet a and two glass sheets b, wherein the widths of the glass sheet a and the glass sheet b are not more than 1cm, and the glass sheets a and the glass sheets b are cleaned, and the cleaning process comprises the following steps: cleaning the glass sheet with a detergent, performing ultrasonic treatment on the glass sheet with acetone for 15 minutes, washing the glass sheet with deionized water, performing ultrasonic treatment on the glass sheet with alcohol for 15 minutes, washing the glass sheet with the deionized water to clean the alcohol, and storing the glass sheet in the deionized water for later use;
step 2: stacking the two cleaned glass sheets b and placing the stacked glass sheets b into a culture dish, and injecting deionized water into the culture dish, wherein the liquid level of the deionized water is lower than the upper surface of the glass sheet b;
and step 3: mixing the polystyrene small ball suspension with alcohol, loading into a sample tube, performing ultrasonic treatment for 3 minutes,
obtaining a mixed solution of polystyrene spheres and alcohol, wherein the diameter of the polystyrene spheres is 600nm, and the volume ratio of the suspension of the polystyrene spheres to the alcohol is 1: 1-5: 1;
and 4, step 4: slowly injecting a mixed solution of polystyrene spheres and alcohol onto the surfaces of the two glass sheets by using a needle tube, wherein the solution of the polystyrene spheres can diffuse on the surface of the deionized water solution to form a single-layer polystyrene sphere film, and continuously and slowly injecting the solution until the whole liquid level is full of the single-layer polystyrene spheres;
and 5: slowly injecting deionized water into the deionized water solution obtained in the step (4) to improve the liquid level of the solution;
step 6: polymerizing the monolayer polystyrene bead film on the deionized water liquid level formed in the step 4 by using Tx100 solution;
and 7: and (3) placing the glass sheet a in the area without the single-layer polystyrene bead film, which is treated in the step (6), adjusting the position of the glass sheet to be below the single-layer polystyrene film, then lifting the glass sheet a by using tweezers, and placing the glass sheet a with the single-layer polystyrene bead film in an oven at 40 ℃ for baking to obtain the single-layer polystyrene bead template.
Specifically, the method comprises the following steps:
when the single-layer polystyrene bead template is prepared, polystyrene beads with different diameters can be used, and the distance between the finally prepared metal micro-nano spiral single structures and the screw pitch of the single spiral structure are determined by the diameters of the polystyrene beads. The small sphere template prepared by the preparation method provided by the embodiment is a single-layer small sphere template arranged in a six-close-packed mode and is used as a template for subsequently preparing a metal micro-nano structure.
Example 4
The procedure of this example is essentially the same as in examples 1 and 2, except that the insulating material used is silicon dioxide.
The circular dichroism of the prepared structure is measured by a normal incidence or oblique incidence method of light.
Example 5
The preparation procedure of this example is substantially the same as that of example 4 except that the metal material used is gold.
The circular dichroism of the prepared structure is measured by a normal incidence or oblique incidence method of light.
Example 6
The procedure of this example is substantially the same as in example 5 except that the noble metal material used is silver.
The circular dichroism of the prepared structure is measured by a normal incidence or oblique incidence method of light.
The metal micro-nano spiral structure prepared by the method has large internal chirality and is less influenced by external factors in the preparation process. The situation of uneven arrangement of the polystyrene spheres is easily caused in the preparation process of the polystyrene spheres, and the chiral structure prepared by the prior art can be manually offset in different characteristic directions, so that the chirality of the whole structure is small. However, the chiral metal micro-nano spiral structure prepared by the preparation method of the embodiment of the application is slightly affected by the uneven arrangement of the small spheres, and the chirality of a single structure is the same in different characteristic directions of the array structure, so that the chirality of the whole structure is large, and the chiral metal micro-nano spiral structure can be applied to biological monitoring, an antipodal sensor, polarization conversion and a photoelectronic circular polarizer.
In addition, the embodiment of the application adopts a method of circularly and rotatably evaporating the insulating material for multiple times to form the spiral structure and then evaporating the metal, so that the preparation process is simplified, the step effect is reduced, the preparation process is more accurate, and the preparation cost of the chiral metal structure is also reduced.
The foregoing is a more detailed description of the invention in connection with specific preferred embodiments and it is not intended that the invention be limited to these specific details. For those skilled in the art to which the invention pertains, several simple deductions or substitutions can be made without departing from the spirit of the invention, and all shall be considered as belonging to the protection scope of the invention.
Claims (5)
1. A preparation method of a chiral metal micro-nano spiral structure is characterized by comprising the following steps: the metal micro-nano spiral structure takes polystyrene spheres as a substrate, insulating materials are obliquely evaporated and plated on the substrate in a clockwise or anticlockwise circulating rotation mode to form a spiral structure, and metal materials are vertically evaporated on the spiral structure to form a metal spiral structure;
the insulating material is silicon dioxide, and the metal material is gold or silver;
the method comprises the following steps:
preparing a single-layer polystyrene bead template;
adhering the prepared single-layer polystyrene bead template on a substrate by using a double faced adhesive tape, putting the single-layer polystyrene bead template on a sample table of a vacuum coating machine, closing an electron beam evaporation coating instrument, and vacuumizing;
setting the deposition angle to be 4 degrees, evaporating the insulating material, rotating the azimuth angle in a clockwise or anticlockwise direction, and circularly evaporating the insulating material for multiple times;
setting the deposition angle to 90 degrees, and evaporating the metal material to obtain a metal spiral structure;
step five, cooling the instrument, filling nitrogen, and taking out a sample;
the third specific film coating process comprises the following steps:
firstly, setting a deposition angle to be 4 degrees, evaporating and plating an insulating material for 5nm at the position No. 1, then rotating an azimuth angle 120 degrees anticlockwise each time, and evaporating and plating the insulating material for 5nm, wherein 5 times of circulation is performed, namely, 5 times of circulation evaporation and plating are performed respectively in the sequence of the positions No. 2-3-1-2-3, the evaporation and plating of the first layer are completed, and a similar triangular structure with connected end points is formed;
continuing evaporation on the basis of the first layer, rotating the azimuth angle anticlockwise to 240 degrees, evaporating an insulating material at the position No. 2 for 5nm, rotating the azimuth angle anticlockwise to 120 degrees, and evaporating an insulating material at the position No. 3 for 5 nm; the evaporation process is circulated once again, namely, the azimuth angles are rotated anticlockwise by 240 degrees and 120 degrees in sequence, the insulating materials are evaporated at the positions 2-3 for 5nm respectively, and the evaporation of the second layer is finished to form a step-shaped semi-spiral structure;
and then continuing to perform evaporation on the basis of the second layer, respectively evaporating an insulating material for 5nm at the position 3, and performing evaporation twice to finally form a spiral structure.
2. The method for preparing the chiral metal micro-nano spiral structure according to claim 1, wherein the coating process of the fourth step is as follows:
and on the basis of the spiral structure after evaporation, adjusting the deposition angle to 90 degrees, and vertically evaporating the metal material by 20 nm.
3. The method for preparing the chiral metal micro-nano spiral structure according to claim 2, which is characterized in that: the beam evaporation rate of the evaporation insulation material is
The beam evaporation rate of the evaporated metal material is
4. The preparation method of the chiral metal micro-nano spiral structure according to claim 3, which is characterized in that: the starting condition of the film coating in the third step is that the pressure intensity of the cavity of the vacuum film coating machine in the second step is lower than 3 multiplied by 10-6Torr。
5. The preparation method of the chiral metal micro-nano spiral structure according to claim 4, wherein the method comprises the following steps: the process for preparing the monolayer polystyrene bead template in the first step is as follows:
step 1: preparing a glass sheet a and two glass sheets b, wherein the widths of the glass sheet a and the glass sheet b are not more than 1cm, and the glass sheets a and the glass sheets b are cleaned, and the cleaning process comprises the following steps: cleaning the glass sheet with a detergent, performing ultrasonic treatment on the glass sheet with acetone for 15 minutes, washing the glass sheet with deionized water, performing ultrasonic treatment on the glass sheet with alcohol for 15 minutes, washing the glass sheet with the deionized water to clean the alcohol, and storing the glass sheet in the deionized water for later use;
step 2: stacking the two cleaned glass sheets b and placing the stacked glass sheets b into a culture dish, and injecting deionized water into the culture dish, wherein the liquid level of the deionized water is lower than the upper surface of the glass sheet b;
and step 3: mixing the polystyrene small ball suspension with alcohol, loading into a sample tube, performing ultrasonic treatment for 3 minutes,
obtaining a mixed solution of polystyrene spheres and alcohol, wherein the diameter of the polystyrene spheres is 600nm, and the volume ratio of the suspension of the polystyrene spheres to the alcohol is 1: 1-5: 1;
and 4, step 4: slowly injecting a mixed solution of polystyrene spheres and alcohol onto the surfaces of the two glass sheets by using a needle tube, wherein the solution of the polystyrene spheres can diffuse on the surface of the deionized water solution to form a single-layer polystyrene sphere film, and continuously and slowly injecting the solution until the whole liquid level is full of the single-layer polystyrene spheres;
and 5: slowly injecting deionized water into the deionized water solution obtained in the step (4) to improve the liquid level of the solution;
step 6: polymerizing the monolayer polystyrene bead film on the deionized water liquid level formed in the step 4 by using Tx100 solution;
and 7: and (3) placing the glass sheet a in the area without the single-layer polystyrene bead film, which is treated in the step (6), adjusting the position of the glass sheet to be below the single-layer polystyrene film, then lifting the glass sheet a by using tweezers, and placing the glass sheet a with the single-layer polystyrene bead film in an oven at 40 ℃ for baking to obtain the single-layer polystyrene bead template.
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