CN109590824B - Excircle polishing equipment of high-purity copper rotary target - Google Patents
Excircle polishing equipment of high-purity copper rotary target Download PDFInfo
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- CN109590824B CN109590824B CN201910118898.5A CN201910118898A CN109590824B CN 109590824 B CN109590824 B CN 109590824B CN 201910118898 A CN201910118898 A CN 201910118898A CN 109590824 B CN109590824 B CN 109590824B
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- sliding groove
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- rotary target
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B5/00—Machines or devices designed for grinding surfaces of revolution on work, including those which also grind adjacent plane surfaces; Accessories therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/06—Work supports, e.g. adjustable steadies
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- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The invention discloses an excircle polishing device of a high-purity copper rotary target, which belongs to the field of rotary target processing equipment and is used for solving the problem that the polishing device is inconvenient to polish steps at a port of the rotary target, and comprises a frame, a clamping mechanism and a polishing mechanism, wherein the frame consists of a first supporting seat and a second supporting seat, the clamping mechanism is slidably arranged on the first supporting seat, the polishing mechanism is slidably arranged on the second supporting seat, the clamping mechanism comprises a first base, a rotary cylinder and a threaded block ejector rod, the polishing mechanism comprises two groups of polishing groups, a second base, a swing arm and a screw rod, the clamping mechanism can fix the rotary targets with different lengths, the polishing mechanism can automatically polish the whole rotary target, and when the polishing mechanism moves to the port of the rotary target, the polishing mechanism can polish the steps at the port of the rotary target through the adjustment of a lifting wheel, the participation of workers can be reduced, the labor intensity of the workers is reduced, and the working efficiency is improved.
Description
Technical Field
The invention relates to the field of rotating target processing equipment, in particular to excircle polishing equipment for a high-purity copper rotating target.
Background
The surface roughness of the target of the rotary target greatly affects the film forming speed and uniformity of magnetron sputtering, and at present, the surface of the target of the rotary target is generally polished by workers manually, so that the problems of high labor intensity, uneven polishing, low polishing precision and low polishing efficiency exist, and particularly, precision polishing equipment aiming at the rotary target with longer length is lacked, so improvement is needed;
the patent with the application number of 201820425795.4 discloses an excircle polishing device for a high-purity copper rotary target, which comprises a frame, a clamping device and a polishing device, wherein the clamping device and the polishing device are respectively arranged on the frame, the polishing device comprises a sliding base and a transverse driving mechanism, the sliding base is slidably arranged on the frame, the transverse driving mechanism is in transmission connection with the sliding base, the upper part of the sliding base is rotatably provided with a swing arm, the swing arm is provided with a polishing belt which can be replaced, the polishing device with a transverse adjusting function is arranged on the swing arm, the whole-tube polishing of the rotary target material with longer length is realized, the clamping device arranged on the swing arm can clamp a part of rotary target when the rotary target is clamped, so that the part of rotary target can not be polished, workers are required to participate in polishing, the workers need to re-clamp the rotary target when polishing, the polishing is very troublesome, and the port of a common rotary, the polishing equipment is inconvenient to polish the port steps, workers are also required to polish the port steps, and the working efficiency is reduced.
Disclosure of Invention
The invention provides an excircle polishing device for a high-purity copper rotary target, which can solve the problem that some polishing devices are inconvenient to polish steps of ports of the rotary target.
The utility model provides an excircle polishing equipment of rotatory target of high-purity copper, includes the frame, is used for two clamping mechanisms and the polishing mechanism of the rotatory target of clamping, the frame comprises first supporting seat and second supporting seat, one of them clamping mechanism slidable ground sets up on the first supporting seat, another clamping mechanism fixed mounting is in on the first supporting seat, polishing mechanism slidable ground sets up on the second supporting seat.
Preferably, the two clamping mechanisms respectively comprise a first base, a rotating cylinder rotatably arranged on the first base, a thread block in threaded connection with the rotating cylinder and a plurality of push rods for fixing the rotating target, a first motor is arranged in the first supporting seat, a abdicating groove for abdicating the mandril is arranged on the rotating cylinder, one end of the ejector rod is abutted against the thread block, the other end of the ejector rod penetrates through the abdicating groove and extends out of the rotating cylinder, a guide inclined plane for guiding the ejector rod is also arranged in the rotating cylinder, a rotating wheel for rotating the thread block is fixedly arranged at one end of the thread block far away from the ejector rod, the outer side of the rotating cylinder is further provided with a baffle ring used for blocking the rotating target, and an output shaft of the first motor is in transmission connection with the rotating cylinder of one of the clamping mechanisms through a belt transmission mechanism.
Preferably, the two clamping mechanisms are respectively arranged on two sides of the first supporting seat, and an output shaft of the first motor is in transmission connection with the rotating cylinder of the clamping mechanism fixed on the first supporting seat through a belt transmission mechanism.
Preferably, the first supporting seat is fixedly provided with a sliding rail, and the bottom of the first base is provided with a rail groove matched with the sliding block.
Preferably, the polishing mechanism comprises two groups of polishing groups, a second base, a swing arm and a screw rod, a groove is formed in the top of the second supporting seat, one end of the screw rod is rotatably arranged in the groove, the other end of the screw rod extends out of the second supporting seat, a second motor is further arranged in the second supporting seat, an output shaft of the second motor is in transmission connection with the screw rod through a belt transmission mechanism, a connecting block is fixedly connected to the bottom of the second base, one part of the connecting block is positioned in the groove and is in threaded connection with the screw rod, one end of the swing arm is hinged to the second base, a supporting rod for supporting the swing arm is further arranged on the second base, and the two groups of polishing groups are respectively arranged on two sides of the swing arm;
the polishing group comprises a third motor arranged on the second base, a driving wheel arranged on an output shaft of the third motor, an adjusting wheel, a lifting wheel, a plurality of driving wheels and a polishing belt, the driving wheels are rotatably arranged on one side of the swing arm, the lifting wheel and one of the driving wheels are positioned on one side, away from the second base, of the rotating cylinder, the polishing belt is arranged on the driving wheel, the adjusting wheel, the lifting wheel and the plurality of driving wheels, and the driving wheel is used for driving the driving wheel, the adjusting wheel and the lifting wheel to drive the polishing belt to circularly move.
Preferably, the swing arm is provided with a first chute in the horizontal direction, and is further provided with a second chute which is perpendicular to the first chute and is communicated with the first chute, a first slide block is arranged in the first chute, a second slide block is arranged in the second chute, a spring for pulling the first slide block outwards is arranged in the first chute, a spring for pushing the second slide block upwards into the first chute is arranged in the second chute, the second slide block can be arranged in the second chute in a vertically sliding manner, the lifting wheel is rotatably arranged on the second slide block, the first slide block can be arranged in the first chute in a horizontally sliding manner, one end of the first slide block is contacted with one end of the second slide block extending into the first chute, and the position where the second slide block is contacted with the first slide block is provided with a guide inclined plane, the other end of the first sliding block extends out of the first sliding groove.
Preferably, two first bases are respectively provided with a top block for pushing the first sliding block of the two polishing groups into the first sliding groove, and the contact positions of the top block and the first sliding block are both provided with a guide inclined plane.
Preferably, a third sliding groove is further formed in the swing arm, a third sliding block is rotatably arranged in the third sliding groove, the adjusting wheel is rotatably arranged on the third sliding block, and a spring pushing the third sliding block upwards is also arranged in the third sliding groove.
Preferably, the first slide block of one of the polishing groups is higher than the first slide block of the other polishing group, and the positions of the two top blocks respectively correspond to the positions of the adjacent first slide blocks.
Preferably, one side of the abdicating groove is provided with an annular groove, the annular groove is internally provided with a fixed pipe which is abutted against the ejector rod, and the annular groove is internally provided with a spring which is used for pushing the fixed pipe to the ejector rod.
Compared with the prior art, the invention has the beneficial effects that: according to the invention, the rotary targets with different lengths can be fixed through the clamping mechanism, the polishing mechanism can move along the length direction of the rotary targets while polishing, the rotary targets can be polished integrally, when the polishing mechanism moves to the ports of the rotary targets, the corresponding polishing groups can enable the polishing mechanism to polish the steps of the ports of the rotary targets through the adjustment of the lifting wheels, so that the participation of workers can be reduced, the labor intensity of the workers is reduced, and the working efficiency is improved.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a cross-sectional view taken at A-A of FIG. 1 in accordance with the present invention;
FIG. 3 is an enlarged view of a portion of the present invention at B of FIG. 2;
FIG. 4 is a cross-sectional view taken at E-E of FIG. 3 in accordance with the present invention;
FIG. 5 is a top view of the clamping mechanism of the present invention;
FIG. 6 is a cross-sectional view taken at C-C of FIG. 5 of the present invention;
FIG. 7 is an enlarged view of a portion of the present invention at D of FIG. 6;
FIG. 8 is a cross-sectional view of the present invention at the support pole;
FIG. 9 is a top view of the first and second supports of the present invention;
fig. 10 is a schematic view of the structure of the top block and the first slider according to the present invention.
Description of reference numerals:
1-a frame, 101-a first support seat, 102-a second support seat, 103-a slide rail, 104-a rail groove, 105-a pulley, 2-a rotating target, 11-a first base, 12-a rotating cylinder, 13-a thread block, 14-a top rod, 15-a first motor, 16-a yielding groove, 161-a ring groove, 17-a rotating wheel, 18-a baffle ring, 19-a fixed pipe, 21-a second base, 22-a swing arm, 23-a lead screw, 24-a groove, 25-a second motor, 26-a connecting block, 27-a supporting rod, 28-an inserting cylinder, 31-a third motor, 32-a driving wheel, 33-a regulating wheel, 34-a lifting wheel, 35-a driving wheel, 36-a polishing belt, 37-a first chute and 38-a second chute, 39-first slide, 310-second slide, 311-top block, 312-third runner, 313-third slide.
Detailed Description
An embodiment of the present invention will be described in detail below with reference to the accompanying drawings, but it should be understood that the scope of the present invention is not limited to the embodiment.
As shown in fig. 1 to 10, the cylindrical polishing apparatus for a high purity copper rotary target according to an embodiment of the present invention includes a frame 1, two chucks for chucking rotary targets 2, and a polishing mechanism, where the frame 1 is composed of a first support seat 101 and a second support seat 102, one chuck is slidably disposed on the first support seat 101, the other chuck is fixedly mounted on the first support seat 101, and the polishing mechanism is slidably disposed on the second support seat 102;
the two clamping mechanisms respectively comprise a first base 11, a rotating cylinder 12 which is rotatably arranged on the first base 11, a thread block 13 which is in threaded connection with the rotating cylinder 12 and a plurality of ejector rods 14 which are used for fixing the rotating target 2, a first motor 15 is arranged in the first supporting seat 101, an abdicating groove 16 which is used for abdicating the ejector rods 14 is formed in the rotating cylinder 12, one end of each ejector rod 14 is abutted to the thread block 13, the other end of each ejector rod 14 penetrates through the abdicating groove 16 and extends out of the rotating cylinder 12, a guide inclined plane which is used for guiding the ejector rods 14 is further arranged in the rotating cylinder 12, a rotating wheel 17 which is used for rotating the thread block 13 is fixedly arranged at one end, far away from the ejector rod 14, of the thread block 13, and a retaining ring 18 which is used for retaining the rotating target 2 is further arranged on the outer side of the;
the two clamping mechanisms are respectively arranged at two sides of the first supporting seat 101, and an output shaft of the first motor 15 is in transmission connection with the rotating cylinder 12 of the clamping mechanism fixed on the first supporting seat 101 through a belt transmission mechanism;
a sliding rail 103 is fixedly installed on the first supporting seat 101, and a rail groove 104 matched with the sliding block 103 is formed at the bottom of the first base 11;
the polishing mechanism comprises two groups of polishing groups, a second base 21, a swing arm 22 and a lead screw 23, a groove 24 is formed in the top of the second support seat 102, one end of the lead screw 23 is rotatably arranged in the groove 24, the other end of the lead screw extends out of the second support seat 102, a second motor 25 is further arranged in the second support seat 102, an output shaft of the second motor 25 is in transmission connection with the lead screw 23 through a belt transmission mechanism, the bottom of the second base 21 is fixedly connected with a connecting block 26, one part of the connecting block 26 is arranged in the groove 24 and is in threaded connection with the lead screw 23, one end of the swing arm 22 is hinged on the second base 21, a supporting rod 27 for supporting the swing arm 22 is further arranged on the second base 21, and the two groups of polishing groups are respectively arranged on two sides of the swing arm 22;
the polishing group comprises a third motor 31 arranged on the second base 21, a driving wheel 32 arranged on an output shaft of the third motor 31, an adjusting wheel 33, a lifting wheel 34, a plurality of driving wheels 35 and a polishing belt 36, wherein the plurality of driving wheels 35 are rotatably arranged on one side of the swing arm 22, the lifting wheel 34 and one of the driving wheels 35 are positioned on one side of the rotating cylinder 12 far away from the second base 21, the polishing belt 36 is arranged on the driving wheel 32, the adjusting wheel 33, the lifting wheel 34 and the plurality of driving wheels 35, and the driving wheel 32 is used for driving the driving wheel 35, the adjusting wheel 33 and the lifting wheel 34 to drive the polishing belt 36 to circularly move;
the swing arm 22 is provided with a first chute 37 in the horizontal direction, and is further provided with a second chute 38 which is perpendicular to the first chute 37 and is communicated with the first chute 37, the first chute 37 is internally provided with a first slide block 39, the second chute 38 is internally provided with a second slide block 310, the first chute 37 is internally provided with a spring for pulling the first slide block 39 outwards, the second chute 38 is internally provided with a spring for pushing the second slide block 310 upwards into the first chute 37, the second slide block 310 is arranged in the second chute 38 in a vertically sliding manner, the lifting wheel 34 is rotatably arranged on the second slide block 310, the first slide block 39 is arranged in the first chute 37 in a horizontally sliding manner, and one end of the first slide block 39 is in contact with one end of the second slide block 310 extending into the first chute 37, The contact position of the second sliding block 310 and the first sliding block 39 is provided with a guide inclined plane, and the other end of the first sliding block 39 extends out of the first sliding groove 37;
the two first bases 11 are respectively provided with a top block 311 for pushing the first sliding block 39 of the two polishing groups into the first sliding groove 38, and the top block 311 and the first sliding block 38 are both provided with a guide inclined surface at the contact position.
The belt transmission mechanism comprises two belt pulleys and a transmission belt, the two belt pulleys are arranged on a shaft needing transmission, and the transmission belt is arranged on the corresponding two belt pulleys.
The push rod 14 is pushed inwards when the thread block 13 rotates, one end of the push rod 14 is pushed outwards under the action of a guide inclined plane in the rotating cylinder 12, the rotating target 2 is fixed by abutting against the inner wall of the rotating target 2, so that polishing can be completed when polishing is carried out, the outer diameter of the rotating cylinder 12 is not larger than the inner diameter of the rotating target 2 to be polished, the top of the baffle ring 18 on the rotating cylinder 12 is lower than the step of the port of the rotating target 2, the polishing belt 36 is prevented from being polished to the baffle ring 18 when polishing is carried out, the top block 311 on the first base 11 is fixed through bolts, and the position is convenient to disassemble and replace;
the swing arm 22 is hinged on the second base 21, and the rotating center of the swing arm is positioned on the axis of the output shaft of the third motor 31; the polishing groups on the two sides of the swing arm 22 can polish the rotary target 2, so that the polishing efficiency is higher;
the bottom of the first base 11 is provided with a pulley 105 to reduce friction force and facilitate moving the first base 11, and the first base 11 is further provided with a fixing bolt for fixing the first base 11 on the first supporting seat 101;
the supporting rod 27 is used for supporting the swing arm 22, in order to be suitable for the rotating targets 2 with different specifications, the rotating targets can be used by adjusting the angle of the swing arm 22, the bottom of the supporting rod 27 is inserted into an inserting cylinder 28 fixedly installed on the second base 21, a fixing bolt is connected to the inserting cylinder 28 in a threaded manner, and one end of the fixing bolt extending into the inserting cylinder 28 is abutted to the supporting rod 27;
the rotating drum 12 is fixed by an external tool when the rotating wheel 17 is rotated, so that the rotating drum 12 is prevented from being driven to rotate when the rotating wheel 17 is rotated;
fig. 10 is a schematic structural view of the top block 311 and the first slide block 39, and fig. 10 is mainly for showing the guide slopes of the top block 311 and the first slide block 39, and the driving wheel 35 and the lifting wheel 34 on the swing arm 22 are not shown.
The length of the top block 311 is the distance from the end face of the rotary target 2 with the step removed to the first support base 11;
as shown in fig. 2, a portion of the polishing belt 36 is located at the lower side of the lifting wheel 34 and the transmission wheel 35 at the right side thereof, and the polishing belt 36 is used for polishing the outer ring of the rotary target 2, and when the lifting wheel 34 is lowered, the polishing belt 36 is pressed downward, and then the polishing can be performed at the step of the port of the rotary target 2;
when the polishing mechanism is to move to any one end of the rotating target 2, the top block 311 installed on the first base 11 pushes the first slider 39 into the first sliding groove 37, because the contact surface between the first slider 39 and the second slider 310 is an inclined surface, the second slider 310 is pushed downward, the lifting wheel 34 descends along with the second slider 310, and the lifting wheel 34 presses the polishing belt 36 downward to polish the step of the port of the rotating target 2.
In an initial state, the polishing mechanism is located at one end of the rotary target 2, at this time, the first sliding block 39 of one polishing group is already pushed into the first sliding groove 37 by the pushing block 311 on the adjacent first base 11, that is, the polishing tape 36 of one polishing group is located on the outer circular surface of the step of the rotary target 2, the polishing tape 36 of the other polishing group is located on the outer circular surface of the main body of the rotary target 2, after the second motor 25 is started, the polishing mechanism polishes the step at one end, then polishes the main body, and then polishes the step at the other end;
when the lifting wheel 34 descends, the polishing belt 36 may be torn, although the polishing belt 36 itself has a certain toughness, it is inconvenient for the lifting wheel 34 to press down, further, the swing arm 22 is further provided with a third sliding groove 312, a third sliding block 313 is rotatably disposed in the third sliding groove 312, the adjusting wheel 33 is rotatably disposed on the third sliding block 313, and a spring pushing up the third sliding block 313 is also disposed in the third sliding groove 312, so that when the lifting wheel 34 presses down, the adjusting wheel 33 may retract along the direction of the third sliding groove 312, thereby allowing the lifting wheel 34 to press down more cleanly.
To prevent the top block 311 on the first base 11 from simultaneously pushing against the two first sliders 39, further, the first slider 39 of one of the polishing groups is positioned higher than the first slider 39 of the other polishing group, and the two top blocks 311 are respectively positioned corresponding to the positions of the first sliders 39 close thereto.
Furthermore, both sides of the second supporting seat 102 are 30cm longer than both sides of the first supporting seat 103, that is, the polishing length of the polishing mechanism is longer than the distance between the clamping mechanisms, so that the rotating target 2 can be completely polished.
In order to return the push rod 14 to the initial position after the fixing of the rotary target 2 is released, further, a ring groove 161 is opened on one side of the abdicating groove 16, a fixed pipe 19 abutting on the push rod 14 is arranged in the ring groove 161, a spring for pushing the fixed pipe 19 to the push rod 14 is further arranged in the ring groove 161, and the fixed pipe 19 pushes the push rod 14 back to the fixed cylinder 12 under the action of the spring.
The working principle is as follows: when clamping, firstly, the distance between the two clamping mechanisms is pulled apart according to the length of the rotary target 2, two ends of the rotary target 2 are respectively inserted on the two rotary cylinders 12, the movable clamping mechanism is pushed to prop the rotary target 2, then the movable clamping mechanism is fixed through the fixing bolt, then the rotary wheels 17 on the two clamping mechanisms are simultaneously rotated, when the rotary wheels 17 are rotated, the rotary cylinders 12 are fixed through an external tool, the rotary wheels 17 drive the thread block 13 to rotate and push the ejector rod 14 inwards, the ejector rod 14 extends out of the abdicating groove 16 under the guide of the guide inclined plane and props against the inner wall of the rotary target 2 to complete the fixation of the rotary target 2, in an initial state, the polishing mechanism is positioned at one end of the rotary target 2, then the height of the support rod 27 is reduced, so that the polishing belt 36 of the polishing group abuts against the rotary target 2, the first motor 15 is started, the first motor 15 drives the rotary cylinders 12 to rotate, namely, the rotary target 2 is, then the third motor 31 is started, the third motor 31 drives the rotating wheel 32 to rotate, so that the polishing belt 36 rotates circularly, then the second motor 25 is started, the second motor 25 drives the lead screw 23 to rotate, because the lead screw 23 is in threaded connection with the connecting block 26, the polishing mechanism translates along the length direction of the lead screw 23, when the polishing mechanism polishes to the other end of the rotating target 2, the second motor 25 is closed or the second motor 25 is controlled to rotate reversely and polish again, after polishing is completed, the first motor 15, the second motor 25 and the third motor 31 are closed, the height of the supporting rod 27 is increased, the swing arm 22 is jacked up, then the clamping mechanism is loosened, and the polished rotating target 2 is taken down.
The above disclosure is only for a few specific embodiments of the present invention, however, the present invention is not limited to the above embodiments, and any variations that can be made by those skilled in the art are intended to fall within the scope of the present invention.
Claims (6)
1. The excircle polishing equipment for the high-purity copper rotary target comprises a rack, two clamping mechanisms and a polishing mechanism, wherein the two clamping mechanisms and the polishing mechanism are used for clamping the rotary target;
the two clamping mechanisms respectively comprise a first base, a rotating cylinder which is rotatably arranged on the first base, a thread block which is in threaded connection with the rotating cylinder and a plurality of ejector rods which are used for fixing rotating targets, a first motor is arranged in the first supporting seat, a abdicating groove which is used for abdicating the ejector rods is formed in the rotating cylinder, one end of each ejector rod is abutted against the thread block, the other end of each ejector rod penetrates through the abdicating groove and extends out of the rotating cylinder, a guide inclined plane which is used for guiding the ejector rods is further arranged in the rotating cylinder, a rotating wheel which is used for rotating the thread block is fixedly arranged at one end, away from the ejector rods, of the thread block, and a retaining ring which is used for retaining the rotating targets is further arranged on the outer side of the rotating cylinder;
the two clamping mechanisms are respectively arranged at two sides of the first supporting seat, and an output shaft of the first motor is in transmission connection with the rotating cylinder of the clamping mechanism fixed on the first supporting seat through a belt transmission mechanism;
a sliding rail is fixedly mounted on the first supporting seat, and a rail groove matched with the sliding rail is formed in the bottom of the first base;
the polishing mechanism comprises two groups of polishing groups, a second base, a swing arm and a lead screw, a groove is formed in the top of the second supporting seat, one end of the lead screw is rotatably arranged in the groove, the other end of the lead screw extends out of the second supporting seat, a second motor is further arranged in the second supporting seat, an output shaft of the second motor is in transmission connection with the lead screw through a belt transmission mechanism, a connecting block is fixedly connected to the bottom of the second base, one part of the connecting block is positioned in the groove and is in threaded connection with the lead screw, one end of the swing arm is hinged to the second base, a supporting rod for supporting the swing arm is further arranged on the second base, and the two groups of polishing groups are respectively arranged on two sides of the swing arm;
the polishing group comprises a third motor arranged on the second base, a driving wheel arranged on an output shaft of the third motor, an adjusting wheel, a lifting wheel, a plurality of driving wheels and a polishing belt, the driving wheels are rotatably arranged on one side of the swing arm, the lifting wheel and one of the driving wheels are positioned on one side, away from the second base, of the rotating cylinder, the polishing belt is arranged on the driving wheel, the adjusting wheel, the lifting wheel and the plurality of driving wheels, and the driving wheel is used for driving the driving wheel, the adjusting wheel and the lifting wheel to drive the polishing belt to circularly move.
2. The cylindrical polishing apparatus for a high purity copper rotary target according to claim 1, wherein the swing arm has a first sliding groove extending in a horizontal direction and a second sliding groove extending perpendicularly to the first sliding groove and communicating with the first sliding groove, the first sliding groove has a first slider disposed therein, the second sliding groove has a second slider disposed therein, the first sliding groove has a spring disposed therein for pulling the first slider outward, the second sliding groove has a spring disposed therein for pushing the second slider upward into the first sliding groove, the second slider is slidably disposed in the second sliding groove upward and downward, the elevating wheel is rotatably disposed on the second slider, the first slider is slidably disposed in the first sliding groove in a left-right direction, and one end of the first slider contacts with one end of the second slider extending into the first sliding groove, And the contact position of the second sliding block and the first sliding block is provided with a guide inclined plane, and the other end of the first sliding block extends out of the first sliding groove.
3. The cylindrical polishing apparatus for a high purity copper rotary target according to claim 2, wherein two of said first bases are respectively provided with an ejector for ejecting said first slide blocks of two of said polishing groups into said first slide grooves, and said ejector and said first slide blocks are each provided with a guide slope at a position where they are in contact.
4. The cylindrical polishing device for the high-purity copper rotating target according to claim 3, wherein a third sliding groove is further formed in the swing arm, a third sliding block is rotatably arranged in the third sliding groove, the adjusting wheel is rotatably arranged on the third sliding block, and a spring which pushes the third sliding block upwards is also arranged in the third sliding groove.
5. The cylindrical polishing apparatus of a high purity copper rotary target according to claim 4, wherein said first slide of one of said polishing groups is located higher than said first slide of the other of said polishing groups, and the positions of both of said top blocks correspond to the positions of the adjacent ones of said first slides, respectively.
6. The cylindrical polishing apparatus for the high purity copper rotary target according to claim 1, wherein a ring groove is formed at one side of the receding groove, a fixed tube abutting against the push rod is disposed in the ring groove, and a spring for pushing the fixed tube to the push rod is further disposed in the ring groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910118898.5A CN109590824B (en) | 2019-01-26 | 2019-01-26 | Excircle polishing equipment of high-purity copper rotary target |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910118898.5A CN109590824B (en) | 2019-01-26 | 2019-01-26 | Excircle polishing equipment of high-purity copper rotary target |
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| Publication Number | Publication Date |
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| CN109590824A CN109590824A (en) | 2019-04-09 |
| CN109590824B true CN109590824B (en) | 2020-10-20 |
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| CN201910118898.5A Active CN109590824B (en) | 2019-01-26 | 2019-01-26 | Excircle polishing equipment of high-purity copper rotary target |
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| CN113478369B (en) * | 2021-09-07 | 2022-02-01 | 徐州路帮德制造有限公司 | Stainless steel valve rod polishing machine |
| CN115284140B (en) * | 2022-08-17 | 2023-11-17 | 昆山新莱洁净应用材料股份有限公司 | BPE sanitary pipe fitting batch polishing device and polishing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| GB673452A (en) * | 1950-03-27 | 1952-06-04 | J M Nash Company | Sanding machines |
| CN202240825U (en) * | 2011-09-29 | 2012-05-30 | 厦门映日光电科技有限公司 | Grinding device for rotary target |
| CN105458917A (en) * | 2015-12-17 | 2016-04-06 | 重庆慧团商贸有限公司 | Fixing device for sealing cover polishing |
| CN206105614U (en) * | 2016-07-26 | 2017-04-19 | 北京冶科纳米科技有限公司 | A cylindrical grinding anchor clamps for rotatory target |
| CN208100042U (en) * | 2018-03-28 | 2018-11-16 | 东莞市欧莱溅射靶材有限公司 | A kind of excircle polishing equipment of high purity copper rotary target |
| CN108621011A (en) * | 2018-06-04 | 2018-10-09 | 芜湖市晨曦新型建材科技有限公司 | A kind of water purifier burnishing device |
| CN109048435B (en) * | 2018-08-24 | 2019-12-13 | 上海宁远精密机械股份有限公司 | multi-station parallel clamping jaw mechanism |
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