CN109581558A - A kind of preparation method and multifocal diffractive element of multifocal diffractive element - Google Patents

A kind of preparation method and multifocal diffractive element of multifocal diffractive element Download PDF

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Publication number
CN109581558A
CN109581558A CN201811597506.XA CN201811597506A CN109581558A CN 109581558 A CN109581558 A CN 109581558A CN 201811597506 A CN201811597506 A CN 201811597506A CN 109581558 A CN109581558 A CN 109581558A
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diffractive element
multifocal diffractive
multifocal
focus
etching depth
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CN109581558B (en
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王孝坤
张海东
张学军
薛栋林
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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Changchun Institute of Optics Fine Mechanics and Physics of CAS
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012Optical design, e.g. procedures, algorithms, optimisation routines

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Eyeglasses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

This application involves a kind of preparation method of multifocal diffractive element and multifocal diffractive elements, comprising: obtains the basic parameter of multifocal diffractive element;According to the corresponding step etching depth of each coke section of the Parameter Calculation;Simulation experiments are carried out according to the step etching depth to obtain the multifocal diffractive element.Multifocal diffractive element provided by the present application reduces the size of multifocal diffractive element, avoids the alignment issues between multiple optical elements, keeps its usage scenario more flexible extensively.Above-mentioned multifocal diffractive element can generate equidistant multifocal, peak energy uniformity, point spread function consistency between each focus can be transferred through optimization and obtain good result, it can be used as the important beam splitter in high-precision micro/nano processing system, and have highly important effect for increasing depth of focus in certain specific imaging optical systems.

Description

A kind of preparation method and multifocal diffractive element of multifocal diffractive element
Technical field
This application involves optical element technology field, in particular to the preparation method of a kind of multifocal diffractive element and multifocal Point diffraction element.
Background technique
Multifocal optical element comprising enables to a branch of directional light in axial multiple focal points while converging, this special light Learning attribute is widely used in multifocal optical element comprising in various modern optical manufacturing and imaging system.Such as swash in femtosecond When light cuts thick transparent material, due to being affected to transparent material cutting separation by material thickness using single laser spot, With the increase of transparent material thickness, at laser spot induction generate fire check in a thickness direction move towards uncontrolled, from And cause cutting section face shape irregular, or even phenomena such as surface chipping occur, the physical attribute of material surface is seriously affected, is limited It has made femtosecond laser and has cut the application in thick transparent material.Laser beam is pooled axially using multifocal optical element comprising Multiple focuses make it be evenly distributed on the different location on transparent material thickness direction, and the cutting of high-flatness is obtained with this Surface;Such as compound eye structural has many characteristics, such as that high sensitive receives extensively to moving object due to the property of wide visual field again General concern and research can use chip multi-focal optical lens array to expand depth of focus of the bionic compound eyes structure in imaging To realize.
Usually there are two types of implementations for traditional multifocal optical element comprising.One kind is Zigzag type optical device, such as Fig. 1 institute Show.The common form of this kind of optical element are as follows: the lens group that is made of multi-disc lens is made of the high-precision reflecting mirror of two panels Optics multiple reflections system, not only volume is larger for this multifocal optical device, is not easy to the adjustment of optical path, strongly limits Its application scenarios;And the optical element in system usually all needs to be made into hollow structure, is not easy to process.Second is to utilize to spread out Optical device is penetrated to realize multifocal, but this traditional multifocal diffractive element has three big disadvantages: 1. conventional multifocal point spreads out Penetrate the refraction/diffraction mixed optical device that element is made of two parts element actually: a traditional convex lens and diffraction optics member Part.This mode also limits the use of its function to a certain extent, such as when for bionic compound eyes structure, two optics members The alignment of part is just at urgent problem to be solved.2. due to designing intrinsic problem, this traditional diffractive multifocal optics member Part cannot form equidistant multifocal.3. point spread function is inconsistent between each focus, cause the peak energy of each focus strong Degree and halfwidth are all inconsistent, to influence the image quality of each focal plane.
Summary of the invention
In view of this, the application provides the preparation method and multifocal diffractive element of a kind of multifocal diffractive element, with solution The certainly above problem.
The first aspect of the embodiment of the present application provides a kind of preparation method of multifocal diffractive element, the preparation method Include:
Obtain multifocal diffractive element basic parameter, wherein the multifocal be etc. step widths focus;
According to the corresponding step etching depth of each coke section of the Parameter Calculation;
Simulation experiments are carried out according to the step etching depth to obtain the multifocal diffractive element.
It is optionally, described according to the corresponding step etching depth of each coke section of the Parameter Calculation, comprising:
It is planned according to the number of focus of the multifocal diffractive element and calculates the step etching position for needing to etch and platform Rank etching depth;
The step etching depth is integrated, the step etching depth of corresponding radial width is successively arranged according to burnt section Sequence, to finally obtain orderly step etching depth.
Optionally, the step etching depth is calculated by the following formula to obtain:
Wherein, HiFor etching depth, fiTo design focal length, n is Refractive Index of Material, r be each step of diffraction element it is radial away from From λ is design wavelength, and m is number of focus.
Optionally, described that simulation experiments are carried out to obtain the multifocal diffractive member according to the step etching depth Part includes:
After carrying out step etching according to the step etching depth, the peak energy for verifying each focus is corresponding Whether the half-breadth height of energy peak is consistent;
If inconsistent, caused by the peak energy that the number of steps of the corresponding burnt section of increase and decrease adjusts each focus corresponding In the high difference to specified range of the half-breadth of energy peak, to finally obtain the multifocal diffractive element.
Optionally, the peak energy that the number of steps by the corresponding burnt section of increase and decrease adjusts each focus causes corresponding Include: in the high difference to specified range of the half-breadth of energy peak
Change the utilization rate of each focus by the number of steps of the corresponding burnt section of increase and decrease;
By changing the corresponding step width of each burnt section, the point spread function region for adjusting each focal point is consistent, from And in the difference to specified range for making the peak energy of each focus cause the half-breadth of corresponding energy peak high.
The second aspect of the embodiment of the present application provides a kind of multifocal diffractive element, and the multifocal diffractive element passes through Method described in any one of preparation method of above-mentioned multifocal diffractive element is prepared.
The beneficial effects of the present invention are: multifocal diffractive member in the preparation method of multifocal diffractive element provided by the present application Setting is based on multiple focuses in part, can be achieved in the case where not needing condenser lens merely with a piece of diffraction element Multifocal distribution.Compared to traditional multifocal diffractive element, multifocal diffractive element provided by the present application is further reduced The size of multifocal diffractive element, and the alignment issues between multiple optical elements are avoided, so that its usage scenario is more Flexibly extensively;Secondly, multifocal diffractive element provided by the present application can generate equidistant multifocal, and the peak between each focus Value energy uniformity, point spread function consistency can be transferred through optimization and obtain adding as a result, can be used as high-precision micro-nano well Important beam splitter in work system, and have for increasing depth of focus in certain specific imaging optical systems highly important Effect.
Detailed description of the invention
It in order to more clearly explain the technical solutions in the embodiments of the present application, below will be to embodiment or description of the prior art Needed in attached drawing be briefly described, it should be apparent that, the accompanying drawings in the following description is only some of the application Embodiment for those of ordinary skill in the art without any creative labor, can also be according to these Attached drawing obtains other attached drawings.
Fig. 1 is the multifocal diffractive element provided in the prior art;
Fig. 2 is the flow diagram of the preparation method for the multifocal diffractive element that this Shen embodiment please provide;
Fig. 3 is the step etching depth design diagram that this Shen embodiment please provide;
Fig. 4 is the peak value energy of diffraction element made from the multifocal diffractive element that this Shen embodiment please provide and conventional method Measure difference in distribution schematic diagram;
Specific embodiment
In being described below, for illustration and not for limitation, the tool of such as particular system structure, technology etc is proposed Body details, so as to provide a thorough understanding of the present application embodiment.However, it will be clear to one skilled in the art that there is no these specific The application also may be implemented in the other embodiments of details.In other situations, it omits to well-known system, device, electricity The detailed description of road and method, so as not to obscure the description of the present application with unnecessary details.
Fig. 2 shows the preparation methods of multifocal diffractive element provided by the present application, and details are as follows: the preparation method packet It includes:
Step S21, obtain multifocal diffractive element basic parameter, wherein the multifocal be etc. step widths coke Point.
In embodiment provided by the present application, when preparing multifocal diffractive element, it is first determined multifocal diffractive element Basic parameter, such as number of focus, each focus, initial step width, step periodicity.Multifocal provided by the present application is spread out Penetrate the focus that multiple focuses in element such as are at the step widths.
Step S22, according to the corresponding step etching depth of each coke section of the Parameter Calculation.
It is optionally, described according to the corresponding step etching depth of each coke section of the Parameter Calculation, comprising:
It is planned according to the number of focus of the multifocal diffractive element and calculates the step etching position for needing to etch and platform Rank etching depth;
The step etching depth is integrated, the step etching depth of corresponding radial width is successively arranged according to burnt section Sequence, to finally obtain orderly step etching depth.
Optionally, the step etching depth is calculated by the following formula to obtain:
Wherein, HiFor etching depth, fiTo design focal length, n is Refractive Index of Material, r be each step of diffraction element it is radial away from From λ is design wavelength, and m is number of focus.
The application provide in each focus is carried out etc. step widths diffraction element design, the platform etched needed for calculating Rank height.As shown in Figure 2.
Calculation formula is as follows:
Wherein, HiFor etching depth, fiTo design focal length, n is Refractive Index of Material, r be each step of diffraction element it is radial away from From λ is design wavelength, and m is number of focus.With this, the corresponding step etching depth of each burnt section has been obtained.
Then the integration for carrying out step etching depth again successively arranges the etching depth of corresponding radial width according to burnt section Column, final etching depth such as Fig. 2.
H=[h1 h2 ... hi h1 h2 ... hi ... h1 h2 ... hi]
Step S23 carries out simulation experiments according to the step etching depth to obtain the multifocal diffractive element.
Optionally, described that simulation experiments are carried out to obtain the multifocal diffractive member according to the step etching depth Part includes: after carrying out step etching according to the step etching depth, and the peak energy for verifying each focus is corresponding Whether the half-breadth height of energy peak is consistent.
If inconsistent, caused by the peak energy that the number of steps of the corresponding burnt section of increase and decrease adjusts each focus corresponding In the high difference to specified range of the half-breadth of energy peak, to finally obtain the multifocal diffractive element.
Optionally, the peak energy that the number of steps by the corresponding burnt section of increase and decrease adjusts each focus causes corresponding Include: in the high difference to specified range of the half-breadth of energy peak
Change the utilization rate of each focus by the number of steps of the corresponding burnt section of increase and decrease;
By changing the corresponding step width of each burnt section, the point spread function region for adjusting each focal point is consistent, from And in the difference to specified range for making the peak energy of each focus cause the half-breadth of corresponding energy peak high.
Specifically, peak energy and half-breadth height through each focus of multifocal diffractive element prepared by the above process are not Unanimously, this is because the corresponding effective R/# of each focus is not identical at this time causes.It also needs to make respectively by subsequent Optimization Steps The peak energy intensity and half-breadth height of a focus are reached an agreement.
Specific optimization method is as follows:
According to formulaGuarantee the corresponding R/# of each focus by increasing and decreasing the corresponding numbers of steps of each burnt section It is equal, change the capacity usage ratio of each focus with this, then again by changing the corresponding step width of each burnt section, to make The point spread function for obtaining each focal point reaches unanimity, and finally makes the peak energy of each focus similar with halfwidth holding, this mistake Journey needs successive ignition.Design and the detailed process of optimization are as shown in Figure 3.
As shown in figure 4, distinguishing focusing using conventional multifocal point diffraction element design method and design method of the invention The design of bifocal diffractive element is carried out for 40mm and 50mm, the diameter of the two is 2.2mm.It is designed using traditional design method Peak energy (normalization) of the bifocal optical element at bifocal be respectively 1/0.64, halfwidth (normalization) is respectively 0.63/1;And using the bifocal diffractive element of the invention peak energy (normalization) at bifocal is respectively 1/0.97, half High width (normalization) is respectively 0.89/1.Peak energy uniformity promotes 51%, and halfwidth homogeneity promotes 41%.It can be seen that Multifocal diffractive Design Method of Fixture Elements of the invention is with the obvious advantage.
Setting is based on multiple cokes in multifocal diffractive element in the preparation method of multifocal diffractive element provided by the present application Point can be achieved with multifocal distribution merely with a piece of diffraction element in the case where not needing condenser lens.Compared to biography The multifocal diffractive element of system, multifocal diffractive element provided by the present application further reduce the ruler of multifocal diffractive element It is very little, and the alignment issues between multiple optical elements are avoided, so that its usage scenario is more flexible extensively;Secondly, this Shen The multifocal diffractive element that please be provided can generate equidistant multifocal, and the peak energy uniformity between each focus, point expand Scattered function consistency can be transferred through optimization and obtain well as a result, can be used as the important light splitting in high-precision micro/nano processing system Element, and have highly important effect for increasing depth of focus in certain specific imaging optical systems.
Mode the above is only the implementation of the present invention is not intended to limit the scope of the invention, all to utilize this Equivalent structure or equivalent flow shift made by description of the invention and accompanying drawing content, it is relevant to be applied directly or indirectly in other Technical field is included within the scope of the present invention.

Claims (6)

1. a kind of preparation method of multifocal diffractive element, which is characterized in that the preparation method includes:
Obtain multifocal diffractive element basic parameter, wherein the multifocal be etc. step widths focus;
According to the corresponding step etching depth of each coke section of the Parameter Calculation;
Simulation experiments are carried out according to the step etching depth to obtain the multifocal diffractive element.
2. the preparation method of multifocal diffractive element according to claim 1, which is characterized in that described according to described basic Parameter calculates the corresponding step etching depth of each burnt section, comprising:
It is planned according to the number of focus of the multifocal diffractive element and calculates the step etching position for needing to etch and step quarter Lose depth;
The step etching depth is integrated, the step etching depth of corresponding radial width is successively sorted according to burnt section, To finally obtain orderly step etching depth.
3. the preparation method of multifocal diffractive element according to claim 1, which is characterized in that the step etching depth It is calculated by the following formula to obtain:
Wherein, HiFor etching depth, fiTo design focal length, n is Refractive Index of Material, and r is the radial distance of each step of diffraction element, λ For design wavelength, m is number of focus.
4. the preparation method of multifocal diffractive element according to claim 1, which is characterized in that described according to the step Etching depth carries out simulation experiments to obtain the multifocal diffractive element
After carrying out step etching according to the step etching depth, the corresponding energy of the peak energy of each focus is verified Whether the half-breadth height at peak is consistent;
If inconsistent, corresponding energy is caused by the peak energy that the number of steps of the corresponding burnt section of increase and decrease adjusts each focus In the high difference to specified range of the half-breadth at peak, to finally obtain the multifocal diffractive element.
5. the preparation method of multifocal diffractive element according to claim 4, which is characterized in that described to be corresponded to by increase and decrease The difference that the peak energy that the number of steps of burnt section adjusts each focus causes the half-breadth of corresponding energy peak high is to specified range Inside include:
Change the utilization rate of each focus by the number of steps of the corresponding burnt section of increase and decrease;
By changing the corresponding step width of each burnt section, the point spread function region for adjusting each focal point is consistent, to make In the difference to specified range that the peak energy for obtaining each focus causes the half-breadth of corresponding energy peak high.
6. a kind of multifocal diffractive element, which is characterized in that the multifocal diffractive element is any by the claim 1-5 Method described in is prepared.
CN201811597506.XA 2018-12-26 2018-12-26 Preparation method of multifocal diffraction element and multifocal diffraction element Active CN109581558B (en)

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Cited By (3)

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Publication number Priority date Publication date Assignee Title
CN110989062A (en) * 2019-12-17 2020-04-10 中国科学院长春光学精密机械与物理研究所 Multi-focus optical element and design method thereof
CN111007664A (en) * 2019-12-18 2020-04-14 中国科学院光电技术研究所 Design method of diffractive optical element with high diffraction efficiency and low speckle noise
CN111673269A (en) * 2020-07-01 2020-09-18 中国工程物理研究院激光聚变研究中心 Focal spot rapid movement regulation and control system based on surface type reflector set and regulation and control method thereof

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US20130201445A1 (en) * 2012-02-02 2013-08-08 Kamal K. Das Apodized hybrid diffractive-refractive IOL for pseudo-accommodation
CN107976732A (en) * 2017-11-15 2018-05-01 中国科学院长春光学精密机械与物理研究所 One kind becomes step diffraction element and preparation method thereof

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110989062A (en) * 2019-12-17 2020-04-10 中国科学院长春光学精密机械与物理研究所 Multi-focus optical element and design method thereof
CN111007664A (en) * 2019-12-18 2020-04-14 中国科学院光电技术研究所 Design method of diffractive optical element with high diffraction efficiency and low speckle noise
CN111673269A (en) * 2020-07-01 2020-09-18 中国工程物理研究院激光聚变研究中心 Focal spot rapid movement regulation and control system based on surface type reflector set and regulation and control method thereof
CN111673269B (en) * 2020-07-01 2022-05-31 中国工程物理研究院激光聚变研究中心 Focal spot rapid movement regulation and control system based on surface type reflector set and regulation and control method thereof

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