CN109564176A - Method and apparatus for x-ray microexamination - Google Patents
Method and apparatus for x-ray microexamination Download PDFInfo
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- CN109564176A CN109564176A CN201780045768.2A CN201780045768A CN109564176A CN 109564176 A CN109564176 A CN 109564176A CN 201780045768 A CN201780045768 A CN 201780045768A CN 109564176 A CN109564176 A CN 109564176A
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Abstract
The present disclosure presents use the array of the microbeam with micro-scale or nanoscale beam intensity profile to provide the x-ray microscope inspection system of the microcosmos area of object or the elective irradiation of nano-area.The each pixel of detector that array detector is located such that only detects x-ray corresponding with single microcosmic beam or nanometer beam.This allows the signal for resulting from each x-ray detector pixel identified in the case where specific limited micro-scale or illuminated nanoscale region, so that object can be generated in the transmission image of the sampling on micro-scale or nanoscale when using the detector of the pixel with biggish size and scale.Therefore detector with the sub- efficiency of higher amount can be used, because lateral resolution is only provided by the size of microcosmic beam or nanometer beam.Array type x-ray source or one group of Talbot interference fringe can be used to generate micro-scale or nanoscale beam.
Description
Cross reference to related applications
Present patent application is entitled " the X-RAY TECHNIQUES USING submitted on June 5th, 2016
Shen is continued in the continuation-in-part application of the U.S. Patent application 15/173,711 of STRUCTURED ILLUMINATION ", the part
Please case require entitled " the X-RAY TECHNIQUES USING STRUCTURED that submits on June 5th, 2015
Entitled " the X-RAY that the U.S. Provisional Patent Application No.62/171,377 of ILLUMINATION " and on May 31st, 2016 submit
MICRODIFFRACTION WITH STRUCTURED ILLUMINATION FOR STRAIN MEASUREMENTIN
The U.S. Provisional Patent Application No.62/343 of NANOELECTRONICS ", 594 equity are all these to apply all entirely
It is incorporated herein by reference.
In addition application 15/173,711 is entitled " the X-RAY METHOD FOR submitted on May 15th, 2015
The United States Patent (USP) Shen of MEASUREMENT, CHARACTERIZATION, AND ANALYSIS OF PERIODIC STRUCTURES "
Please 14/712,917 continuation-in-part application, which is the entitled " X- submitted on April 29th, 2015 again
The continuation-in-part application of the U.S. Patent application 14/700,137 of RAY INTERFEROMETRIC IMAGING SYSTEM ",
The two continuation-in-part applications are all entirely incorporated herein by reference.
In addition the application also requires the equity of following U.S. Provisional Patent Application: on September 28th, the 16 entitled " X- submitted
The U.S. Provisional Patent Application of RAY MEASUREMENT TECHNIQUES USING MULTIPLE MICRO-BEAMS "
No.62/401,164；Entitled " the METHOD FOR TALBOT X-RAY MICROSCOPY's " submitted on December 2nd, 2016
U.S. Provisional Patent Application No.62/429,760；And entitled " the TALBOT X-RAY that on April 15th, 17 submits
The U.S. Provisional Patent Application No.62/485 of MICROSCOPE ", 916, all these applications all hereby entirely by reference simultaneously
Enter.
Technical field
The embodiment of the present invention disclosed herein is related to the microscope inspection system using x-ray, more particularly to making
With periodical microbeam system irradiation object to determine the various structural properties of the object and measurement, characterization and the analysis of chemical property
System.
Background technique
Using the conventional x-ray microscope of image forming optics generally by x-ray optical device (for example, zone plate)
The limitation of the resolution ratio of the pixel size of resolution ratio and/or detector.For the system based on projection, resolution ratio is by x-ray source
Size and detector limited pixel size limitation.Although the x-ray microscope system using zone plate of some commercializations
Uniting has the resolution ratio for being less than 100nm, but such system has extremely limited visual field.X-ray based on projection is micro-
Mirror provides the reasonable visual field with the resolution ratio for being better than 1 micron really, but tends to for the acquisition time of reasonable signal-to-noise ratio
In growing very much, so that the technology is useless in practice for many applications.Therefore, there is resolution ratio less than 1 micron, same
When also there is the x-ray microexamination of big visual field to be difficult to be enough to make the integrating time generation figure of the technical application with being so short that
Picture.
Therefore it needs not only provide high-resolution but also the high resolution microscope for providing big visual field checks system.
Summary of the invention
The present disclosure presents use the array of the microbeam with micro-scale or nanoscale beam intensity profile to provide
The x-ray microscope inspection system of the elective irradiation of the microcosmos area or nano-area of object.Array detector is positioned as
So that each pixel of detector only detects x-ray corresponding with individually microcosmic beam, so that resulting from x-ray detection
The signal of device can be identified in the case where specific limited micro-scale or illuminated nanoscale region.In inspection
The transmission image of sampling of the object on micro-scale or nanoscale therefore can be using with biggish size and scale
Pixel detector when generate.
In some embodiments, micro-scale or nanoscale can be provided by generating one group of Talbot interference fringe
Beam, this group of Talbot interference fringe can create the tiny x-ray microbeam of one group propagated in space.In some embodiments
In, the array of microcosmic beam or nanometer beam can be by conventional x-ray source and x-ray image-forming component (for example, x-ray lens)
Array provide.
In some embodiments, detector and object are both placed on the identical restriction of one group of Talbot antinode
" depth of focus " (DOF) range in.In some embodiments, object is positioned in the x allowed perpendicular to the x-ray beam direction of propagation
On the pedestal of direction and the translation on the direction y, so that " scanned " transmission image on micro-scale can be assembled.
In some embodiments, object is positioned in permission and the x-ray beam direction of propagation is at an angle, encloses the pedestal rotated about the axis
On, so that the data acquisition system on micro-scale can be used for layer radiography or tomographic image reconstruction.
In some embodiments, additional masking layer can be inserted in course of the beam to stop the micro- of selected quantity
Beam, so that the comparatively cheap detector with biggish pixel size is used for remaining microbeam.In some realities
It applies in example, the use of masking layer makes it also possible to the detector of the detection efficiency with raising being used for remaining microbeam.In this way
Masking layer can be placed on before object to be examined, between object and detector, or be designed to detector
A part of structure itself.
Detailed description of the invention
Figure 1A illustrates the x-ray imaging of the offer microbeam array as can be used in some embodiments of the invention
The schematic diagram of system.
Figure 1B illustrates the sectional view of the x-ray imaging system of Figure 1A.
Fig. 2 is illustrated from the 1:1 duty ratio absorption grating G's for being used as the microbeam array for the embodiment of the present invention
The use of Talbot interference fringe pattern.
Fig. 3 A illustrates the schematic diagram of microbeam, object as used in some embodiments of the present invention and detector.
Fig. 3 B illustrates the schematic sectional view of the microbeam of the embodiment of Fig. 3 A, object and detector.
Fig. 3 C illustrates the schematic sectional view of the microbeam of the modification of the embodiment of Fig. 3 A and 3B, object and detector,
In the figure, the part of detector array is functional element, and other parts do not act on.
Fig. 4 is illustrated using beam-splitting optical grating G1The signal of the microscopic system of microbeam is generated from Talbto interference fringe
Figure.
Fig. 5 is illustrated as the micro- of certain beam-splitting optical gratings formation as used in some embodiments of the present invention can be used
The sectional view of beam intensity pattern.
Fig. 6 A illustrates the view such as a pair of of the phase-shifted grating that can be used in some embodiments of the invention.
Fig. 6 B illustrates effective phase shift of a pair of of phase-shifted grating by generation of Fig. 6 A.
Fig. 7 illustrates the view such as the π phase-shifted grating that can be used in some embodiments of the invention.
Fig. 8 illustrates the aobvious of the exposure mask of embodiment according to the present invention having before the object being placed in inspection
The schematic diagram of micro mirror.
Fig. 9 A illustrates the schematic diagram of the microbeam of the embodiment of Fig. 8, object and detector.
Fig. 9 B illustrates the schematic sectional view of the microbeam of the embodiment of Fig. 8, object and detector.
Figure 10 illustrates the schematic cross-sectional of the microbeam of the embodiment including scintillator detector, object and detector
Figure.
Figure 11 illustrates showing for the microbeam of the embodiment including scintillator and scintillator imaging system, object and detector
Meaning property sectional view.
Figure 12 illustrates having for embodiment according to the present invention and is placed between object and detector in checking
The microscopical schematic diagram of exposure mask.
Figure 13 A illustrates the schematic diagram of the microbeam of the embodiment of Figure 12, object and detector.
Figure 13 B illustrates the schematic sectional view of the microbeam of the embodiment of Figure 12, object and detector.
Figure 14 illustrates showing for the microbeam of the embodiment of exposure mask and scintillator at including detector, object and detector
Meaning property sectional view.
Figure 15 illustrate the embodiment of exposure mask at including detector, scintillator and scintillator imaging system microbeam,
The schematic sectional view of object and detector.
Figure 16 illustrates the schematic cross-sectional of the microbeam of the embodiment for including multiple detectors, object and detector
Figure.
One of the step of method for being used to collect microexamination data of embodiment according to the present invention is presented in Figure 17 A
Point.
The step of the method for collecting microexamination data of Figure 17 A of embodiment according to the present invention is presented in Figure 17 B
Rapid continuation part.
Note: the diagram in attached drawing disclosed herein is intended to only illustrate the principle of the present invention and its function,
And not it is shown to scale.Size in relation to the element about various embodiments is (for example, x-ray Source size a, grating are all
Phase property p0、p1、p2Deng) and the relationship between them any specific details, please refer to the description in the text of specification.
Specific embodiment
1. using the imaging of microbeam array
Figure 1A illustrates the simple embodiment of the formation including microbeam array of the invention.Array type source 004 includes electricity
Sub- transmitter 011, electronic emitter 011 generate electronics 111, and electronics 111 bombards target 1000, and target 1000 includes region 1001, area
Domain 1001 includes the structure that x-ray generates material 704.In this illustration, four material structures 704 of the component of x array are shown
To be disposed in an array, but target may include any amount of source point, and in these source points, any quantity can be used.
Four structures that x-ray generates material 704 generate the x-ray 888 propagated far from target when being bombarded by electronics 111.
In embodiment as shown, these x-rays 888 enter x-ray optical system 3300, and x-ray optical system 3300 is by waveform
The x-ray 888-F of focusing is converted to, forms x-ray array at the presumptive area 2001 of the x-ray 888-F of focusing in space
The image in region 1001.Such optical system can be the simple x-ray concentrating element (hair such as with interior secondary surface
Tubule) or more complicated multicomponent imaging system.In this case, for four x-ray source points, image will include four
Spot 282-F, each enlargement ratio with the size and optical system 3300 that generate source point to original x-ray radiation are relevant straight
Diameter, and there is the length that limits of depth of focus by optical system, the length generally with x-ray wavelength and x-ray optical system
Square correlation of numerical aperture (NA).
Figure 1B illustrates the sectional view for assembling x-ray field 888-F, this illustrates the microbeam at this point in space
The formation of 888-M.It is placed by object 240-W that will be to be examined at this position in space, microbeam 888-M will be in spy
Object is irradiated at the fixed point 282-F spatially limited, point 282-F has the diameter of microbeam 888-M, which is penetrated by original x
Property (the NA, enlargement ratio) determination of the size, x-ray wavelength and optical system 3300 of line source point.There is pixel by placing
291 x-ray detector 290, pixel 291 have with the position in the spacing and depth of focus of the pitch match of microbeam 888-M, each
Therefore the x-ray of pixel detection is only to be provided by a microbeam.Therefore the entire signal generated only indicates much smaller irradiation
The x-ray of spot 282-F transmits.As an example, the microbeam diameter for 1 micron, the detector pixel to 25 microns can be with greatly
Information about the only single micron diameter spot when the spacing between microbeam is greater than or equal to detector pixel spacing is provided.
Such system will indicate a group pattern type point of the sampled point from each microbeam from detector maturation.For some
Using this sampling by the x-ray transmission of object may be enough.In other cases, object and microbeam array it
Between relative position scanned " figure " of object can be scanned to generate on x dimension and y-dimension.Because of each data point
Indicate the information that lesser microbeam generates, it is possible to realize the high-definition picture for using low resolution pixel detectors.
Entitled " the X-RAY TECHNIQUES that such scanning technique for structuring irradiation has been submitted on June 5th, 16
The Co-pending U.S. Patent Application No.15/173,711 of USING STRUCTURED ILLULMINATION " and entitled
The U.S. Provisional Patent Application of " X-RAY MEASUREMENT TECHNIQUES USING MULTIPLE MICRO-BEAMS "
It is in addition described in 62/401,164, this two applications are all entirely incorporated by reference into hereby.
Example above presents a kind of side to form the microbeam array using array type x-ray source and image forming optics
Formula.Although for show principle be it is practical, such method is limited by the visual field of x-ray optical system, and this
Creation can be used for irradiating any of the micro-scale of object or the array of nanoscale beam in the various embodiments of invention
The technology of quantity.
2. the Talbot striped as microcosmic beam array
Talbot interference fringe can be the efficient method that x-ray is directed to effective microbeam array.Talbot wave
Effective lateral dimensions of abdomen (region for being usually defined as constructive interference) can be by using being suitable for establishing the beam splitting of striped
Grating and be made into small to 20nm, and the entire interference field of Talbot interference pattern can cover several cm2Area.Talbot
Interference pattern for irradiate transmission in investigation in object when provide can be used array detector detection and analysis from
The array of scattered microcosmic probe or nm probe.
As above for described in imaging system, when detector be chosen to have it is opposite with the spacing of Talbot striped
The pixel size answered, and object and detector be both placed on Talbot striped effective " depth of focus " it is interior when, each
The x-ray of the transmission of single one of the pixel detection in microbeam.This to irradiate spot size and Pixel Dimensions solution
The advantages of coupling, can be achieved, and Talbot interference phenomenon forms the array of effective microbeam over a large area.
Talbot interference fringe using structuring x-ray source is always other all patent Shens of present inventor
Theme please, including sequence number U.S.14/527,523, US14/700,137,14/712,917, US14/943,445 and 15/
173,711, all these applications are all incorporated by reference into hereby.
Talbot interference always for low resolution be imaged, especially have the time for match imaging (see, for example,
Biomedical Mathematics:Promising Directions in Imaging,Therapy Planning,and
Inverse Problems (editor Y.Censor, M.Jiang and G.Wang) (Medical Physics Publishing,
Madison, WI, 2009 year) Atsushi Momose, Wataru Yashiro and Yoshihiro in the 281-320 pages
" the X-ray Phase Imaging with Talbot Interferometry " of Takeda and bibliography therein).This
The system of sample is usually using diffraction grating (usually phase-shifted grating) Lai Shengcheng Talbot interference pattern, then with the second grating
And/or array x-ray detector analyzes gained pattern.
Fig. 2 illustrates the generation that the absorption grating G with 50/50 duty ratio and spacing p is generated when by plane wave illumination
The section of table Talbot interference pattern.Striped in the diagram is adapted from Elements of Modern X-ray
Physics, Second Edition, Jens Als-Nielsen and Des McMorrow (John Wiley&Sons Ltd,
Chichester, West Sussex, UK, 2011 year) in Section 9.3 " Phase Contrast Imaging " Figure 19
(a).The purpose of this being merely to illustrate that property and present；The use of the certain illustrative should not imply the pact of the scope of the present invention
Beam or limitation.
As shown in Fig. 2, interference pattern is generating below in absorption grating.Light with spacing p and 50/50 duty ratio
Grid appear in Talbot distance D from pictureTPlace, DTIt is provided by following equation:
Wherein, p is the period of beam-splitting optical grating, and n is integer, and λ is x-ray wavelength.What wherein destructive interference occurred is darker
Region be commonly referred to as " node " of interference pattern, and the bright region of constructive interference is commonly referred to as interference pattern
" antinode ".
As x-ray illuminator, Talbot interference pattern can pass through the conjunction of the beam-splitting optical grating with micro-meter scale feature
It is suitable to select to generate the interference pattern to the bright antinode in antinode size with corresponding micro-meter scale.For having
The x-ray of the energy of 24.8keV, wavelength are λ=0.05nm, so for the absorption with 50/50 duty ratio and 1 micron of spacing
Grating, first (n=1) Talbot distance are DT=4cm.Therefore, the scale in the direction x and the direction y of the striped in the diagram of Fig. 2
It is entirely different, wherein micron-scale dimensions direction of propagation perpendicular to shown in, but centimeter scale size is along propagation
What direction used.
Stripe at various score Talbot distances in bright striped and dark striped can in turn, and
And the size of bright (antinode) striped at various score Talbot distances may be actually smaller than the big of original grating feature
It is small.Therefore these antinodes may be used as multiple microbeams for irradiating object.
When using Talbot interference phenomenon, there are specific presumptive areas in Talbot interference pattern, in these areas
On domain, bright striped keeps some intensity microbeam profile.Such region (wherein several to see in the example in figure 2)
" depth of focus " range with more conventional imaging system is comparable, and the Talbot pattern for being arranged as array, these are right
The presumptive area answered will form microbeam array.It the region of " depth of focus " can also be relative to Talbot distance DTIt limits.For example, scheming
In 2 diagram, the region of the formation microbeam of antinode is illustrated as having about 1/16DTLength.By object 240-W and have
The detector 290 of pixel 291, which is placed in the scheduled anti-nodal region, makes the signal from much bigger pixel 291 can be with table
Show the transmission in the wherein much smaller region 282 of antinode irradiation object.
Pattern shown in Fig. 2 indicates non-diverging Talbot interference pattern, but in some embodiments, Talbot interference pattern
Sample will include the x-ray dissipated from common x-ray source.
In many examples, the beam-splitting diffraction grating for being used to form Talbot pattern can be low absorption but generate
Sizable x-ray phase of value (integral multiple of such as pi/2) that pi/2 or π radian or some others are specified or scheduled
The phase grating of shifting.These gratings can also include one-dimensional or two-dimensional grating pattern.
As noted above, according to the size of beam-splitting optical grating, by the appropriate selection of suitably tiny beam-splitting optical grating,
These probe sizes may diminish to 20nm.Co-pending U.S. Patent Application and US provisional patent Shen as mentioned above
Please in, on x dimension and y-dimension scan object micro-scale or nanoscale probe beam are moved above object
So that the complete high-resolution " figure " of the transmission of object can be obtained with the relatively low detector of resolution ratio.
The schematic diagram that the embodiment that system is used together can be formed with any microbeam is illustrated in Fig. 3 A and 3B.Work as shape
At with spacing pwMicrobeam 888-M array when, object 240 to be examined also have spacing pwDiscrete phase interaction
It is illuminated at array with position 282.As indicated, the x-ray spacing on x and y is identical and is equal to pw, but wherein x is tieed up
Spending the other embodiments different with the spacing on y-dimension can also be used.Pitch difference is also likely to be due to Talbot pattern
Caused by diverging property.Fig. 3 C illustrates the use of detector 290-A, in detector 290-A, acts on pixel 291-P
Pixel 291-A is not acted on is both present in detector the certain microbeams only selected for detection.
Positioner 245 can be used and scan object on the x dimension and y-dimension of the direction of propagation perpendicular to microbeam
Position, and array detector 290 can detecte the x-ray 888-T of the transmission as caused by the interaction of microbeam and object.
In this embodiment, array detector 290 has spacing p3, in this example embodiment, spacing p3It is also equal to pw.This meaning
Detector will be aligned so that each pixel of array detector will be positioned as only collecting it is corresponding with single microbeam
X-ray.By and by the use of multiple microbeams and with the pitch match with microbeam be also aligned so that each pixel
The detector for only detecting the pel spacing of the x-ray of the interaction of the single microbeam of the given position on object is matched
It is right, 10 can be created2To 104The equivalent of parallel microbeam detection system.With smaller pixel, plurality of pixel detection
Other detectors of the x-ray of single microbeam can also be used, as long as all transmission x-rays of each pixel detection
With their origin from single microbeam.
As before, then object can be scanned on x coordinate and y-coordinate.This is generated " figure " parallel with the property of object, but
It is that motion range can reduce the spacing for corresponding only to microbeam (although some overlapping between scanned region may be suitable for
There is provided relative calibration).
Then " figure " that each pixel can be generated digitally is stitched together " macro with the large scale of product volume property
Figure ", while corresponding data collection time being made to shorten multiple relevant to the quantity of microbeam (for example, up to 104Multiple).
In order to realize the tomographic analysis of some degree, the limited angle adjustment of object can also be added to movement
Agreement, as long as x-ray is both kept with the interaction of the area-of-interest in object and corresponding detector pixel
In the region that the depth of focus by all multiple microbeams limits.Realize the rotary stand 248 of the purpose in figure 3 a also
Through a part for being illustrated as the pedestal for object 240.In some embodiments, 5 axis pedestals or angular instrument may be used to
Obtaining can translate and rotate from the same installation system.In some embodiments, object can be remain stationary, and can be opposite
Form the mechanism of Talbot striped in object translation or rotation (together with the detector of alignment).
Although periodicity Talbot pattern can pass through hand described in bibliography as referenced before and patent application
Any one of section is formed, but the already shown innovation use for making it possible to more highly x-ray power is according to week
Phase property pattern A0The x-ray source of composition.Fig. 4 illustrates the embodiment with construction shown in Fig. 3 A and 3B, but in the reality
It applies in example, x-ray microbeam array 888-M is shape by using such periodical x-ray source generation Talbot interference pattern
At.
In this construction as shown, x-ray source 002 includes the electron beam 111 of bombardment x-ray target 100, x-ray target
100 include region 1001, and region 1001 includes that the x-ray being embedded in substrate 1000 generates the structure 700 of material.As shown
Structure 700 is by with period p0Periodical 2-D pattern arrangement size a unified element.When being bombarded by electronics 111,
These are generated in period p0Non-periodic pattern x-ray 888.
The structure 700 that material is generated including x-ray may include multiple discrete more tiny micro-structures.X-ray generates
Structure can usually be arranged in one or two dimension by non-periodic pattern.X-ray source using such structuring target exists
(the U.S. submitted on the 19th of September in 2014 U.S. Patent application " X-RAY SOURCES USING LINEAR ACCUMULATION "
Patent application 14/490,672, now by as United States Patent (USP) 9,390,881 issue), " X-RAY SOURCES USING
LINEAR ACCUMULATION " (U.S. Patent application 14/999,147 submitted on April 1st, 2016) and " DIVERGING
X-RAY SOURCES USING LINEAR the ACCUMULATION " (U.S. Patent application 15/ that on May 27th, 2016 submits
166,274), it is required together with these patents and co-pending patent application to have in any provisional application of equity more sufficiently
Description, all these applications are all entirely incorporated by reference into hereby.
The element commonly used in x-ray source: high voltage source 010 is also shown in Fig. 4, is mentioned by electrical lead 021 and 022
The acceleration voltage powered between beamlet transmitter 011 and target 100.Detector 290 is shown to have its period p3Equal to pwArray
GD, so that each microbeam is actually uniquely detected by a detector pixel.However, as discussed above, detector
290 are aligned so that each detector pixel corresponds to the x-ray for being only from single microbeam.In order to promote this, detector can
In addition also to have the register control 255 that will test device pixel and be aligned with single microbeam.
X-ray 888 comes from array type source, which is as being placed on from array type x-ray source A0Distance L
The beam-splitting optical grating G at place1The array of 210-2D, being individually spatially concerned with but mutually incoherent irradiation component.It will
By with spacing pwThe position of object 240 of microbeam array irradiation be placed in from beam-splitting optical grating G1The farther distance D of 210-2D
Place.In order to ensure A0In each x-ray component mutually long contribution, the geometry of the arrangement made to image formation processing answer
Meet the following conditions:
Wherein for pi/2 grating, q=1, for π grating, q=0.5.
The construction is referred to as Talbot-Lau interferometer；[referring to " Phase of Franz Pfeiffer et al.
retrieval and differential phase-contrast imaging with low-brilliance X-ray
Sources ", Nature Physics volume 2, the 258-261 pages, 2006 years；In publication on 2 15th, 2011
It is also retouched in Christian David, Franz Pfeiffer and all United States Patent (USP) 7,889,838 of Timm Weitkamp
State], it was confirmed in the past by using unified x-ray source and masking pattern creation x-ray source array.
It should be noted that array type x-ray source can also use unified x-ray material and masked in some embodiments
Grating provide, which allows x-ray to be only from dimension a and period p0Array in the specified point arranged.However,
Array type x-ray source disclosed above can have the sizable advantage of system better than such prior art, because discrete
Source uses the x-ray for making all generations that can contribute to image formation processing.Array type x-ray source can also be with
Material progress selectivity bombardment is generated to x-ray by using patterned electricity beamlet to provide.What such source was quoted in front
It is described in more detail in the U.S. Patent application being incorporated herein by reference.
The x-ray energy spectrum of microbeam may be used by x-ray filter (or other means well known by persons skilled in the art)
In the limitation of limitation x-ray bandwidth used.The system of Fig. 4 is illustrated as encountering beam splitting in the x-ray 888 that x-ray source 002 generates
They are filtered using such filter 388 before grating 210-2D.This can enable realize preferably interference comparison
Degree.For some embodiments, make mean x-ray energies E0E is generated between 5keV and 100keV and using x-ray filter0
± 10% or E0± 15% energy bandwidth may be desired.The region (the usually center of microbeam) of maximum intensity and most dark
Intensity region (generally completely between microbeam) between contrast be preferably at least 50%, but be greater than 20%,
The signal that even 10% contrast obtains under some cases may be acceptable.
Fig. 5 illustrates the mould that a part of two-dimentional x-ray intensity pattern of Talbot interference fringe creation can be used
Quasi- example.If beam-splitting optical grating has the matched period on x dimension and y-dimension, pattern such as shown in fig. 5 can be
It is replicated at each " depth of focus " region of Talbot striped.
Beam-splitting optical grating can be any amount of phase shift pattern, or in some embodiments, a pair of of grating can be used
To be formed.The typical combination of phase-shifter can use 0, pi/2 or π radian phase shift in each region of grating.1-D pattern or 2-D
The combination of pattern can also be used.
In some embodiments, two 1-D gratings and they are installed orthogonally with respect to one another more complicated to create are made
2-D pattern may be easier.For these embodiments, grating G shown in Fig. 41It may alternatively be and be installed together
A pair of of grating GAAnd GB.Table I shows various transmission values and the phase shift of the such combination that can be used for 50/50 duty ratio grating.
The value of t and φ respectively indicates the transmissivity and phase shift of two parts for each grating.Grating part with t=0 indicates
Transmission grating is absorbed, the phase shift of opaque section is unrelated.
Table I: the grating construction that two 1-D 50/50 intersect
A pair of of grating (the pi/2 phase shift grating of two intersections) for option 1 (is wherein used for GASpacing paBe used for GB
Spacing pbIt is identical) it shows in fig. 6, the result of the grating of intersection is shown in fig. 6b.In embodiment as Fig. 4
Phase-shifted grating such a pair of cross grating will be formed pattern shown in fig. 5 shape antinode pattern, wherein px=py
=pa=pb.Schemed using the Talbot that 1/2 spacing of the spacing with pi/2 phase shift grating can be generated in other options of π phase shift
Sample.
Some single grating can be used also to make in these constructions.For example, the π phase-shifted grating of the intersection of option 2
The single checkerboard pattern of the phase shift with 0, π and 2 π=0 is formed, which will generate and the illustrated single π phase of Fig. 7
Move the identical phase shift of chessboard grating.This should also form Talbot interference strength pattern shown in fig. 5.Similarly, it is as previously mentioned
Patent application and the application in described in other Talbot bibliography for mentioning, π or pi/2 phase shift and/or absorption grating
Other 1-D or 2-D non-periodic patterns can also be used.
In order to ensure object 240 to be examined is irradiated by the non-periodic pattern of x-ray microbeam 888-M, grating and object
The distance between D should correspond to score Talbot distance in one, it may be assumed that
Wherein n is nonzero integer.If grating is absorption grating, π phase-shifted grating or pi/2 phase shift grating, n's is suitable
Value can be different.
For diverging/amplification striped more generally situation wherein can be used, which can be extended to:
Another equation used in Talbot-Lau system is by Talbot grating G1Spacing p1It is penetrated with the x in array type source
The size a of line generating element is related:
Most of embodiment of the invention is using the interferometer system for wherein meeting the condition presented in equation 2-5.
It should be noted that these embodiments as shown are not in proportion, because of the diverging of Talbot interference pattern, collimation
Or assemble will depend on factor such as below: x-ray energy, the degree of collimation of x-ray beam and object be placed on from
How far locate in source.
3. detector considers
As disclosed herein, detector spacing is by the pitch match with multiple Talbot stripeds so that each pixel quilt
It is positioned as only detecting the x-ray of the interaction from object Yu single microbeam, and due to pixel caused by adjacent microbeam
Between crosstalk minimization.Then, in the case where knowing that the completely different signal from each pixel is not necessarily to deconvolute, object
The data collection of " figure " of the property of body and final reconstruct can continue.
If there are crosstalk (for example, being caused) due to scattering or fluorescence between microbeam and pixel, if it can be with
It is appropriately calibrated, then additional image analysis can remove some in crosstalk.Energy resolution array detector can also
For separating signal with the x-ray of transmission, the x-ray of refraction, the x-ray of scattering and fluorescent x rays.
If detector spacing is that 1:1 is matched with the spacing of microbeam, which most realizes straight from the shoulder, that is,
Each beam has corresponding single pixel in a detector, and detector is placed by adjacent object and microbeam.
3.1 more tiny detector spacing
In some embodiments, as the whole score of the spacing of microbeam, (for example, the 3x of spacing reduces, this will indicate 9 pictures
Element exist be used to detect x-ray corresponding with each microbeam) detector spacing can also be used.If just detected
X-ray have some space structure, such as, if it is desired to x-ray signal it is related to the small angle scattering from object, then this can
To provide some advantages.It is then possible to the certain pixels that will test device are aligned to the x-ray for only detecting scattering, and it is unscattered
Beam can be by different pixel collections, or the pixels block being simply blocked.
3.2 bigger detector spacing
In other embodiments, it can be used greater than the detector pixel of the spacing of microbeam.Detector therefore can be more
Cheaply, but still " high-resolution " signal is generated (because spatial resolution is the interaction by Talbot striped and object
What volume rather than detector pixel size determined).
One of the technology the disadvantage is that, there was only 1 in 4 microbeams for detecting, other microbeams are then blocked.Pixel more
In the case where big, bigger detection efficiency can be realized to the microbeam of detection.
Fig. 8-15 illustrates the use of the biggish pixel in some embodiments of the present invention.Fig. 8 is illustrated and Fig. 4
System it is similar but be wherein placed on before object 240 with the exposure mask 270 in several apertures 272 to hinder
Keep off the schematic diagram of the embodiment of the system of the microbeam of some quantity.As indicated, 3 microbeams in every 4 microbeams are blocked, every 4
Only have 1 beam to continue to irradiate object, be then detected by device detection in a beam.This means that if the x-ray at exposure mask is penetrated
The spacing of beam is pw, then the spacing for irradiating the beam of object is 2pw.Detector spacing pDTherefore it can be set to be also equal to
2pw, greater than the detector spacing for the construction in Fig. 4.As indicated, 3 beams are blocked in 4 beams, but any number
The beam of amount can be blocked according to any amount of preset pattern for various applications.
Fig. 9 A and 9B illustrate such embodiment in more detail, and the figure similar with those of Fig. 3 A and 3B diagram is presented
Show.It is can be seen that by the comparison of Fig. 3 A and 3B because only that the microbeam of some quantity is used, so the beam at detector
Spacing it is obviously much larger, and can be used with the cheaper detector 290-L of bigger pixel size.
As shown in this moment, x-ray detector is to generate the direct battle array of electric signal in the absorption of x-ray in response
What column detector was presented.Direct flat plate detector (FPD), the Shimadzu of such as kyoto, Japan can be used in some embodiments
Corp. Safire FPD.Complementary metal oxide semiconductor (CMOS) imager can be used in some embodiments.Some implementations
Energy resolution array detector can be used in example.
In other embodiments, the flashing for emitting visible light or ultraviolet light when being exposed to x-ray can be used in detector
Body.The x-ray detection zone (detector sensor) of effect can be for example by providing scintillator (such as doped with the iodate of thallium
Caesium (CsI:Tl)) or by providing the scintillator of the masking layer with low Z materials (for example, golden (Au)) at top for detector
Uniform coating limit.
Figure 10 illustrate the embodiment of Fig. 9 B, but use the detector combined with fluorescent screen or scintillator 280
The modification of 290-S.Scintillator 280 includes the material for emitting optical photon and/or UV photon when x-ray is absorbed, detector
290-S detects these optical photons and/or UV photon.Typical scintillator material includes the CsI for adulterating thallium, the oxidation for adulterating Eu
Lutetium (Lu2O3: Eu), yttrium-aluminium-garnet (YAG) or sulphoxylic acid gadolinium (GOS).
The light quantity that scintillator efficiency depends on the fraction for the x-ray that scintillator absorbs and scintillator generates.For high score
Resolution, light should minimize flashing intracorporal laterally expand, this is usually required using can limit x-ray absorption, therefore
The thin scintillator of detection efficiency.
In conventional imaging system, the detector that the scintillator type of adjacent object can be used obtains high resolution graphics
Picture, but the overall thickness of scintillator and electronic component must be sufficiently thin to collect each detector pixel only and the pixel phase
Corresponding x-ray.This may further specify that the use of thinner scintillator, to reduce final sensitivity.
However, spatial resolution is by the size of microbeam 888-M rather than examines in this application in disclosed embodiment
Survey what device pixel size limited.This allow bigger pixel, use with higher efficiency to thicker scintillator material,
Because each photon generated from bigger pixel will be known to be from predetermined microbeam.
Figure 11 illustrates the other modification in the system using scintillator, in this variant, from scintillator 280
Visible light/UV light 890 is collected by visible/UV optical system 320, and is imaged on detector 290-SI.It can be seen that/UV optics
System may include the optical device of the image of other amplification scintillator.When using the image of relay optics and amplification,
Electronic detectors are not necessarily to include high resolution sensor itself, commercial CCD detector inexpensively or have such as 1024 ×
Complementary metal oxide semiconductor (CMOS) sensor array of 1024 pixels (each 24 μm squares of 24 μ m) can be made
With.
Thicker scintillator can also be used in some embodiments with relay optics, to improve sensitivity.
However, detection is limited to the visual field of x-ray optical device collection, and the visual field is in some cases when using relay optics
Hundreds of microns may be only about.The data on biggish region are collected only in image by from when exposing " suture " several times together
Just it may be implemented.
Figure 12,13A and 13B indicate that wherein the shelter 297 with aperture 292 is placed on object 240 and detector
Additional embodiment between 290-M.For the embodiment, all available microbeam 888-M irradiate object 240, but by example
The masking layer 297 as made of golden (Au) prevents 3 beams in every 4 beams from entering detector 290-M.This also makes detector
290-M can have bigger pixel, reduce the cost for being used for direct detector again, for using the embodiment of scintillator,
Improve potential detector efficiency.
Figure 14 illustrate the embodiment of Figure 10,11A and 11B, but x-ray detection use thicker scintillator
The additional variations that 280-S and visible light/UV photodetector 290-S are realized.
Figure 15 illustrates the additional variations in the system using scintillator, in this variant, from scintillator 280 can
Light-exposed/UV light 890 is collected by visible/UV optical system 320, and is imaged on detector 290-SI.
Commercial Flat digital x-ray sensor (wherein put by the neighbouring conventional optical image sensor of scintillator material layer
Set (or being even applied on conventional optical image sensor)) by such as California Paro Austria more than Varian Inc. and
General Electric, the Inc. manufacture blocked in the Bill of Massachusetts.The imaging sensor of other constructions may be ability
Known to field technique personnel.
Although the scintillator as shown in Figure 10,11,14 and 15 is shown as including uniform scintillator layers, pattern is used
The embodiment (the wherein top that scintillator material is only placed on a part of pixel) for changing scintillator material can also be used.
Scintillator material may be used as selecting certain microbeams to be examined using masking layer in the selectivity placement of the upper of detector
The alternative solution of survey.
Detector in each pixel with additional structure can also be used.For example, if typical detector picture
Element is 2.5 microns × 2.5 microns (6.25 microns2Area), but microbeam diameter is only 1 micron, then can create scintillator
The center " spot " of material is slightly larger than 1 micron and is positioned as corresponding to the detector pixel of the position of microbeam.Pass through the structure
It makes, all x-rays from microbeam should be all detected, while if the entire area of detector pixel will be used, be subtracted
The detection of few scattering that otherwise will cause spurious signal or diffraction x-ray.
Similarly, wherein detector structure (such as scintillator material) is only positioned on the exterior section of pixel, for example
It can be used for some embodiments with the x-ray of small angle scattering, without detecting the pixel of the beam directly transmitted only to detect.
Similarly, although the exposure mask 297 in Figure 13 and 14 is illustrated as shifting from scintillator 280, some embodiments can
So that exposure mask 297 is deposited directly on scintillator 280.Other embodiments for patterning scintillator may be art technology
Known to personnel.
3.3 detector modifications
Certain parts that above description discloses wherein detector, which are not used in, stops some quantity by using masking layer
Microbeam detects the embodiment of x-ray.Similar masking effect can carry out some constructions real by using array detector
Existing, in the array detector, certain pixels, which are simply made into, not to be acted on or the pixel by never acting on removes function
Rate, so they do not generate signal or by using any signal for ignoring or eliminating the generation of " not acting on " pixel.Such as Fig. 3 C
Shown, it is identical that these " do not act on " space that pixel plays the role of between pixel 291-A.
The zone of action is not also possible to the region transparent for x-ray for these, so that in some embodiments can be with
Use multiple detectors.In such embodiments, each detector is positioned as only detecting the x-ray beam of selected quantity.
This can be carried out by using the detector with following pixel, these pixels are designed to only detect penetrating for predetermined quantity
Beam allows other beams to pass through detector simultaneously.
Such construction illustrates in Figure 16.First detector 290-1 is that detection and list are formulated to size
The pixel of the x-ray of the corresponding all transmissions of a microbeam, the array detector for having transmission region between the pixels.It is incident on
Then microbeam on these transmission regions passes through detector 290-1, and fall on the second detector 290-2, the second detector
290-2, which has, to be aligned to detect the pixel of the x-ray microbeam of these substitutions.
In some embodiments, the first detector 290-1 can be transmission for high energy x-ray in whole region
, the first detector 290-1 is used to detect the x-ray compared with low energy, and the second detector 290-2 is for detecting higher-energy
X-ray.Such construction may include two, three or more detector, how many pixel this depends in the first inspection
It is activated in survey device and how many microbeam is allowed through the first detector to be detected or by the second detector.
This method, which is better than the advantages of covering method, is that each x-ray microbeam is finally detected, and can be to the number of last collection
It contributes according to set.
The method of 4.0 microscope datas acquisition
The processing step according to the embodiment that image is formed using microbeam is illustrated in Figure 17 A and 18B, below at these
Reason step is described.
In the first step 4210, the area of space that will wherein pass through microbeam array testing technologies object is determined.The region can be
By the region defined above for " depth of focus " that microbeam discusses, or can be defined as and the Talbot pattern for giving
Talbot distance DTThe relevant region of fraction, or the region that any criterion by being suitable for desired measurement defines.
In step 4220, the microbeam array with spacing p is formed in predetermined areas.Such microbeam can pass through institute
The formation of any one of disclosed method, including interfere now by using x-ray imaging system or by using Talbot
As.In some embodiments, such as when interference field is formed by Talbot interference pattern, the region can be defined as have with
Score Talbot distance is (for example, 1/8DTOr 1/16DT) relevant length region.
Microbeam in the region can have the shape of rounded beam or the array with rectangular or rectangular profile beam
The lateral pattern of formula.Microbeam array will generally be propagated on single direction (being designated generally as the direction " z "), just with the direction of propagation
The spacing p between microbeam on the direction (direction " x " and the direction " y ") of friendship is 20-50 microns or smaller.
In some embodiments, as discussed above, which can be used for some in insertion removal microbeam
Additional mask.
Once microbeam region has been set up, 4230 be to place to have pel spacing p in next stepdDetector, between pixel
Away from pdEqual to the non-zero integer multiples of microbeam spacing p.Detector can be any one of detector as described above.Inspection
This Sensor section for surveying device is placed in the region selected in back.Exist in the accurate positionin of detector certain
Flexibility, as long as detector each pixel generate only signal corresponding with single microbeam (in microbeam or detector pixel
Between there is no crosstalk).In general, by selection, wherein each microbeam has a corresponding pixel or one group of pixel
Detector；However, in some embodiments, detector can only detect the subset of corresponding microbeam.
In in next step 4240, the area-of-interest (ROI) of object to be examined is placed on choosing also including microbeam
Determine in region, before x-ray source and detector between.This generally by proximity detector so that object and detector this two
Person is in " depth of focus " region of microbeam.In general, x-ray beam when object is by positioning and alignment otherwise will be blocked or
It will be closed, x-ray is turned on after object has been placed.
In in next step 4250, the x-ray of each microbeam transmission of corresponding pixel detection on detector, and record pair
The electronic signal answered.These signals can indicate the x-ray intensity in count detector, and can also include that energy resolution is examined
Survey the energy in device.
In in next step 4256, the decision how to continue is made.If only it is expected individual data point set, do not have
The step of more data needs are collected, and the method continues to " B " in Figure 17 A and 17B instruction.If another party
Face, additional data need to be collected the 1-D or 2-D " figure " of the property for constructing object, then decision tree delivering is for from attached
Add the request of the data of position.
In in next step 4260, the relative position of object and microbeam is changed into preset distance on x dimension and/or y-dimension,
And the method returns to step 4250, and in step 4250, data are collected now for new position.The system will be all over
Go through step 4250,4256 and 4260 this decision tree circulation, until data be directed to specify for inspection entire 1-D or
Until the region 2-D is collected, this moment, the method continues to the step of " B " in Figure 17 A and 17B is indicated.
As soon as the system will use in step 4266 and 4276 once a 2-D scan data set has been collected
Algorithm relevant to layer radiography or tomography will be constructed or whether need additional letter to determine whether only 2-D " figure "
It ceases to generate the 3-D of object and indicate.
If you do not need to the information other than the information obtained, then the method continues analysis to the end
Step 4290.If data about 1D or 2D figure in front the step of in obtain, be then used in generally in the art
It is known that being used to synthesize the various images " seam of the x-ray transmission/absorption 1-D or 2-D intensity " figure " for the ROI for indicating object
Conjunction " technology carrys out the data using accumulation.
If on the other hand, it is expected that 3-D information makes the decision on how to continue then in next step 4276.
If decision tree delivering is for from additional there is still a need for collecting additional data to construct the 3-D data acquisition system of the property of object
The request of the data of angle.
The method then proceedes to step 4280 (in step 4280, by object relative to z-axis line at predetermined angle
Spend, enclose rotate about the axis predetermined angular increment), then the method continue to " A " in Figure 17 A and 17B instruction step
Suddenly, control is transferred back to the circulation of step 4250,4256 and 4260 to receive in the rotation position that this is substituted from x-ray detector
Collect data acquisition system.
The system will traverse these steps 4250,4256,4260, also 4266,4276 and 4280 circulations by preparatory
The position of programming and rotatable sequence collect x-ray information, until complete data acquisition system is collected.This moment, all
After data collection is completed, then the system will continue the data that analytical procedure 4290 to the end is accumulated with acquisition,
In this case, it is penetrated using the x that well-known various image 3-D analytical technologies carry out synthetic body ROI generally in the art
Line transmission/absorption 3-D is indicated.
The modification of the above method can also try out.For example, be not first at fixed rotation position in x dimension and
Data gathering cycle is executed on y-dimension, changes rotary setting then to collect additional data, but wherein object is in x position and y
The embodiment that position setting is rotated when being kept fixed can also be performed.Object can also be provided around the rotation of z-axis line can
With the additional information in being merged for image slices.
5. limitation and extension
By the application, several embodiments of the present invention have been disclosed, the optimal mode imagined including inventor.It will recognize
Know, although specific embodiment can be presented, can also be applied only for the element that some embodiments are discussed in detail
In other embodiments.In addition, be described as be in details and various elements in the prior art can also be applied to it is of the invention
Various embodiments.
Although elaborated specific material, design, construction and making step describe the present invention and preferred embodiment,
But such description is not intended to be limitation.Modifications and changes may be it will be apparent that simultaneously for those skilled in the art
And it is intended to the present invention and is limited only by the scope of the following claims.
Claims (32)
1. a kind of method for checking object with x-ray, comprising:
The cyclic array for creating the x-ray microbeam propagated from common x-ray source in predetermined areas, wherein the fate
Each x-ray microbeam in domain has the axis by the common x-ray source, and in addition have be greater than 10% from institute
State microbeam the measures perpendicularly to the axis, x-ray intensity along the microbeam axis and the periodicity equal to the x-ray microbeam
The contrast between x-ray intensity at 1/2 distance in the period of array；
X-ray pixel array detector system is positioned so as to the x-ray sensor of detector in the presumptive area simultaneously
And the pixel of detector is alignment so that each pixel detection x-ray corresponding with not more than one x-ray microbeam；
Object is placed on before the x-ray array detector, and the object is determined detected a part
Position is in the presumptive area；
The part of the object is irradiated with the cyclic array of the x-ray microbeam；And
Record the signal that the x-ray array detector generates.
2. according to the method described in claim 1, wherein,
The cyclic array of the x-ray microbeam is created by forming the Talbot interference phenomenon of Talbot interference pattern；
And the x-ray microbeam corresponds to the array of the constructive interference part of the Talbot interference pattern.
3. according to the method described in claim 2, additionally including:
The absorption masking component for having periodical transmissive portion is located in the presumptive area, the periodicity transmissive portion
Only transmit the predetermined subset of the x-ray microbeam；Wherein
Period on the transmissive portion is lateral at two is equal to the period of the Talbot interference pattern multiplied by positive integer N；
It and further include being aligned the absorption masking component so that the transmissive portion is centered on every n-th microbeam.
4. according to the method described in claim 1, additionally including:
Absorption masking component with transmissive portion is placed in the presumptive area, the transmissive portion is positioned as only thoroughly
Penetrate the predetermined subset of the x-ray microbeam.
5. according to the method described in claim 4, wherein,
The lateral dimensions of the transmissive portion is less than the 3/ of the period of the cyclic array of the x-ray microbeam in the presumptive area
4。
6. according to the method described in claim 1, additionally including:
The x-ray pixel array detector system is positioned so as to two or more pixel detections and the same x-ray
The corresponding x-ray of microbeam.
7. according to the method described in claim 1, wherein,
The signal corresponds to transmission of the x-ray microbeam by the object.
8. according to the method described in claim 1, wherein,
The signal corresponds to the interaction phenomenon of the x-ray microbeam and the object, and the interaction phenomenon is selected from
The group being made of following phenomenon: absorption, refraction, x-ray fluorescence and small angle scattering.
9. according to the method described in claim 1, additionally including:
Absorption masking component with transmissive portion is placed in the presumptive area, the transmissive portion is positioned as only thoroughly
Penetrate the predetermined subset of the x-ray microbeam.
10. according to the method described in claim 1, wherein,
The x-ray pixel array detection system includes the first x-ray detector with the periodical x-ray zone of action, institute
It states the periodical x-ray zone of action to be positioned as detecting x-ray and generate signal corresponding with the x-ray, and by not
The zone of action does not separate the x-ray of generation signal；
Wherein the period of the periodical x-ray zone of action is selected as only detecting the predetermined subset of the x-ray microbeam.
11. according to the method described in claim 10, wherein,
The x-ray not zone of action transmission x-ray；And
The x-ray pixel array detection system additionally includes the second x-ray detector, the second x-ray detector quilt
It is positioned as the x-ray that detection is transmitted through first x-ray detector.
12. according to the method described in claim 1, wherein,
The period of the cyclic array of x-ray microbeam in the presumptive area is less than 50 microns.
13. according to the method described in claim 1, wherein
The length of each x-ray microbeam along the axis in the presumptive area is greater than 1 millimeter.
14. according to the method described in claim 1, additionally including:
The laterally displaced object and described at least one direction perpendicular to one axis in the x-ray microbeam
The relative position of the cyclic array of x-ray microbeam is one or many；
Every time it is laterally displaced have occurred and that after record the signal that the x-ray array detector generates；And
Two dimensional image is generated using the signal of the record.
15. according to the method for claim 14, wherein
The step of relative position of the cyclic array of the laterally displaced object and the x-ray microbeam is by laterally displaced
The object is performed.
16. according to the method described in claim 1, additionally including:
By the relative angular orientation of the object and the cyclic array of the x-ray microbeam it is one or many change 0.5 degree or
Bigger angle；
The signal that the x-ray array detector generates is recorded after each relative angular orientation changes and has occurred and that；And
3-D image is generated using the signal of the record.
17. according to the method for claim 16, wherein
The step of changing the relative angular orientation of the cyclic array of the object and the x-ray microbeam is by described in rotation
Object is performed.
18. according to the method described in claim 1, wherein,
The contrast is greater than 20%.
19. according to the method described in claim 1, wherein,
The common x-ray source includes the array that x-ray generates micro-structure.
20. a kind of x-ray microscopic system, comprising:
X-ray irradiates beam generation system, and the x-ray irradiation beam generation system includes:
X-ray source；And
The component of the cyclic array of x-ray microbeam is formed in presumptive area；
At least part of object to be examined is located in the component in the presumptive area；
At least one x-ray pixel array detector, at least one described x-ray pixel array detector be positioned as detection by
X-ray caused by the cyclic array of the x-ray microbeam and the interaction of the object, and generate and the detection
At least one corresponding signal of x-ray, wherein the detector is aligned any single pixel so that the detector
The x-ray of detection corresponds only to one in the x-ray microbeam in the cyclic array of the x-ray microbeam.
21. x-ray microscopic system according to claim 20, wherein
The component of the cyclic array for forming x-ray microbeam additionally includes the component for limiting the bandwidth of the x-ray.
22. x-ray microscopic system according to claim 21, wherein
The component of the bandwidth of the limitation x-ray, which generates, has average energy E0And E0The x-ray frequency of energy bandwidth in ± 15%
Spectrum.
23. x-ray microscopic system according to claim 21, wherein
The component of the bandwidth of the limitation x-ray is x-ray filter.
24. x-ray microscopic system according to claim 20, wherein
The component of the cyclic array for forming x-ray microbeam includes the optical grating construction for generating Talbot interference pattern, and
Wherein the cyclic array of the x-ray microbeam corresponds to the x-ray antinode of the Talbot interference pattern, and
The contrast that the presumptive area corresponds to wherein between the Talbot antinode and adjacent Talbot node is greater than
10% region.
25. x-ray microscopic system according to claim 24, wherein
The sensor of object and x-ray pixel array detector to be examined both is positioned in the presumptive area
It is interior.
26. x-ray microscopic system according to claim 24, wherein
The pedestal translates the object in 2 orthogonal directions；
And it additionally includes:
The component of the object is rotated in the presumptive area.
27. x-ray microscopic system according to claim 24, wherein
The optical grating construction for generating Talbot interference pattern includes one of the following or multiple:
Absorption grating, pi/2 phase shift grating, π phase-shifted grating, the 1-D array of optical grating construction, the 2-D array of optical grating construction, grid knot
Structure and chessboard phase grating structure.
28. x-ray microscopic system according to claim 24, wherein
The size of the optical grating construction is chosen to the period of the Talbot interference pattern less than 50 microns.
29. x-ray microscopic system according to claim 20, additionally includes:
Exposure mask, the exposure mask are positioned as stopping the x-ray irradiation beam of predetermined quantity.
30. x-ray microscopic system according to claim 20, wherein
The x-ray pixel array detector is energy resolution pixel array detector.
31. x-ray microscopic system according to claim 20, additionally includes:
Data collection and analysis system, the data collection and analysis system analyze the x-ray signal.
32. x-ray microscopic system according to claim 20, wherein
The x-ray source includes:
Vacuum chamber；
Electron beam emitter；And
Electric target, the electric target include:
Substrate, the substrate include the first selected material；And
At least multiple discrete topologies being embedded in the substrate, the multiple discrete topology include for its x-ray generation property
Matter and the second material selected.
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| PCT/US2017/035800 WO2017213996A1 (en) | 2016-06-05 | 2017-06-02 | Method and apparatus for x-ray microscopy |
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| EP3465182A1 (en) | 2019-04-10 |
| JP2019523871A (en) | 2019-08-29 |
| KR20190015531A (en) | 2019-02-13 |
| JP6775035B2 (en) | 2020-10-28 |
| EP3465182A4 (en) | 2020-03-18 |
| WO2017213996A1 (en) | 2017-12-14 |
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