CN109541754A - A kind of optical coupling structure and its manufacturing method - Google Patents
A kind of optical coupling structure and its manufacturing method Download PDFInfo
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- CN109541754A CN109541754A CN201710867704.2A CN201710867704A CN109541754A CN 109541754 A CN109541754 A CN 109541754A CN 201710867704 A CN201710867704 A CN 201710867704A CN 109541754 A CN109541754 A CN 109541754A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/262—Optical details of coupling light into, or out of, or between fibre ends, e.g. special fibre end shapes or associated optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
Abstract
The present invention discloses a kind of optical coupling structure and its manufacturing method.Wherein, the optical coupling structure includes: sloping optical fiber and silicon substrate raster unit, the upper surface of the silicon substrate raster unit is arranged in the sloping optical fiber, the sloping optical fiber includes inclined end face, the upper surface of the inclined end face and the silicon substrate raster unit is in predetermined angle, the silicon substrate raster unit includes silicon substrate grating and silicon substrate output waveguide, and the silicon substrate output waveguide is Coupled Passive Waveguide Structure；Wherein, multi-layer film structure is set on the inclined end face, for the multi-layer film structure for being totally reflected to the laser beam in the sloping optical fiber, the laser beam by total reflection is irradiated to the silicon substrate grating, and is coupled and exported by the silicon substrate output waveguide.Optical coupling structure provided by the invention and its manufacturing method, improve coupling efficiency.
Description
Technical field
The present invention relates to photoelectron technical fields, and in particular to a kind of optical coupling structure and its manufacturing method.
Background technique
Silicon-based semiconductor is the foundation stone of modern microelectronic industry, but its development has been approached physics limit, especially in interconnection side
Face.And photoelectron technology is then in the high speed development stage, present light emitting semiconductor device utilizes compound-material to prepare more,
It is incompatible with silicon microelectronic technique, therefore, photon technology and microelectric technique are gathered, develop silicon based opto-electronics scarabaeidae with
Technical meaning is great.
Silicon-based photonics integration is due to using extensive silicon-based technology, such as complementary metal oxide semiconductor
(Complementary Metal Oxide Semiconductor, hereinafter referred to as CMOS) technique, and device cost may make to drop
It is low.Silicon substrate phased-array radar is the photon integrated chip that a kind of pair of beam direction is controlled, it and traditional mechanical radar phase
Than without mechanical part, scanning speed is fast.Hybrid integrated is generally taken in the light source part of the photon integrated chip, most common
It is to be imported light by optical fiber, waveguide is then converted by grating or special hot spot and is coupled.Hot spot transformation coupling needs
90nm CMOS technology below, and processing step is complicated, and manufacturing cost is higher.And silicon substrate surface grating coupling technique compares into
It is ripe, but be the largest problem be generally required with grating coupled optical fiber stand with grating planar on a certain special angle, no
It easily fixes, is not able to satisfy the requirement of Planar integration.
Therefore, a kind of optical coupling structure how is proposed, to improve the coupling efficiency of the light source part of photon integrated chip
The important topic urgently to be resolved as industry.
Summary of the invention
For the defects in the prior art, the present invention provides a kind of optical coupling structure and its manufacturing method.
On the one hand, the present invention proposes a kind of optical coupling structure, comprising:
The upper surface of the silicon substrate raster unit, institute is arranged in sloping optical fiber and silicon substrate raster unit, the sloping optical fiber
Stating sloping optical fiber includes inclined end face, and the upper surface of the inclined end face and the silicon substrate raster unit is in predetermined angle, described
Silicon substrate raster unit includes silicon substrate grating and silicon substrate output waveguide, and the silicon substrate output waveguide is Coupled Passive Waveguide Structure；
Wherein, multi-layer film structure is set on the inclined end face, and the multi-layer film structure is used for the inclined-plane
Laser beam in optical fiber is totally reflected, and the laser beam by total reflection is irradiated to the silicon substrate grating, and by described
The coupling output of silicon substrate output waveguide.
Wherein, the sloping optical fiber is adhered to the upper surface of the silicon substrate raster unit.
Wherein, the length direction of the sloping optical fiber is vertical with the slit length direction of the silicon substrate grating.
Wherein, the silicon substrate grating is made of period slit, and the period of the period slit meets Bragg condition, described
Period slit is linear or curved shape.
Wherein, the surface setting anti-reflective film or anti-reflection film of the silicon substrate grating.
Wherein, the silicon substrate output waveguide is that one end of the silicon substrate grating is formed curved groove by two.
Wherein, the multi-layer film structure is alternately arranged by silicon dioxide layer and titanium dioxide layer and is constituted, the titanium dioxide
Silicon layer and the titanium dioxide layer respectively have 6 layers.
Wherein, the silicon substrate raster unit is made of silicon-on-insulator.
Wherein, the sandwich layer doped germanium of the sloping optical fiber.
On the other hand, the present invention provides a kind of manufacturing method of optical coupling structure, comprising:
Inclined end face is produced in one end of optical fiber, forms sloping optical fiber；
Alternating growth silicon dioxide layer and titanium dioxide layer on the inclined end face form multi-layer film structure；
Silicon substrate grating is made on the surface silicon layer of silicon (SOI) on insulator, and is made in one end of the silicon substrate grating
Silicon substrate output waveguide；
The sloping optical fiber is adhered on the silicon layer, so that into the laser beam of the sloping optical fiber, by described
The total reflection of the multi-layer film structure on inclined end face is irradiated to the silicon substrate grating, and passes through the silicon substrate output wave
Lead coupling output.
Optical coupling structure provided by the invention and its manufacturing method, since silicon substrate raster unit is arranged in sloping optical fiber
Upper surface, the inclined end face of sloping optical fiber and the upper surface of silicon substrate raster unit are in predetermined angle, and are arranged on inclined end face
Multi-layer film structure, multi-layer film structure is totally reflected to by the laser beam in sloping optical fiber, by described in total reflection
Laser beam is irradiated to the silicon substrate grating, and is coupled and exported by the silicon substrate output waveguide, improves coupling efficiency.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is this hair
Bright some embodiments for those of ordinary skill in the art without creative efforts, can be with root
Other attached drawings are obtained according to these attached drawings.
Fig. 1 is the structural schematic diagram of one embodiment of the invention optical coupling structure；
Fig. 2 is the flow diagram of the manufacturing method of one embodiment of the invention optical coupling structure；
Description of symbols:
1- silicon substrate raster unit；2- sloping optical fiber；
11- silicon substrate grating；12- silicon substrate output waveguide；
13- surface silicon layer；14- insulating layer；
15- substrate layer；21- multi-layer film structure.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with attached in the embodiment of the present invention
Figure, technical solution in the embodiment of the present invention are explicitly described, it is clear that described embodiment is a part of the invention
Embodiment, instead of all the embodiments.Based on the embodiments of the present invention, those of ordinary skill in the art are not making wound
Every other embodiment obtained under the premise of the property made labour, shall fall within the protection scope of the present invention.
Fig. 1 is the structural schematic diagram of one embodiment of the invention optical coupling structure, as shown in Figure 1, optocoupler provided by the invention
Close structure, comprising:
The upper surface of silicon substrate raster unit 1, flat inclined light is arranged in sloping optical fiber 2 and silicon substrate raster unit 1, sloping optical fiber 2
Fibre 2 includes inclined end face, and the upper surface of the inclined end face and silicon substrate raster unit 1 is in predetermined angle, and silicon substrate raster unit 1 is wrapped
Silicon substrate grating 11 and silicon substrate output waveguide 12 are included, silicon substrate output waveguide 12 is Coupled Passive Waveguide Structure；
Wherein, multi-layer film structure 21 is set on the inclined end face, and multi-layer film structure 21 is used for sloping optical fiber 2
In laser beam be totally reflected, the laser beam by total reflection is irradiated to silicon substrate grating 11, and passes through silicon substrate output wave
Lead 12 couplings output.
Silicon substrate raster unit 1 can be made of silicon-on-insulator (Silicon-On-Insulator, hereinafter referred to as SOI)
It forming, SOI includes substrate layer 15, insulating layer 14 and surface silicon layer 13, wherein substrate layer 15 is made by single crystal silicon material,
Insulating layer 14 is located on substrate layer 15, and surface silicon layer 13 is located on insulating layer 14.Silicon substrate grating 11 is made on surface silicon layer 13,
And output waveguide 12 is made in one end of silicon substrate grating 11, silicon substrate output waveguide 12 is Coupled Passive Waveguide Structure, to form laser light
The coupling of beam exports.
The specific structure of silicon substrate grating 11 depends on needing coupled wavelength, the bandwidth, transmission direction of the laser beam passed through
And efficiency requirements, it is configured according to the actual situation, the embodiment of the present invention is without limitation.In order to meet big bandwidth needs, silicon substrate
The screen periods of grating 11 need to be made into certain distribution, such as are fabricated to Chirp Bragg light grating or apodization Prague light
Grating, to adapt to light field matching, i.e. the screen periods of silicon substrate grating 11 are not uniform, by certain functional form gradual change.
The size of silicon substrate grating 11 and the spot size of incident laser beam match, and the coverage area of silicon substrate grating 11 is in laser beam
The direction of propagation is several microns and arrives millimeter magnitude, is micron to millimeter magnitude in the direction of propagation perpendicular to laser beam.Silicon substrate output
There are many 12 structures of waveguide, can be grading structure or straight wave guide structure, such as produce two and form silicon substrate to curved groove
Output waveguide 12, the width of silicon substrate output waveguide 12 is between 0.5 micron to 3 microns, and specific value is according to rear end cascade device
Part is required and is determined.
The upper surface of silicon substrate raster unit 1 is arranged in sloping optical fiber 2, is in contact with silicon substrate raster unit 1, in sloping optical fiber
The upper surface of 2 one end setting inclined end face, the inclined end face and silicon substrate raster unit 1 is in predetermined angle, described pre-
If angle according to the structure of the silicon substrate grating, coupled wavelength, bandwidth, transmission direction and the efficiency requirements of the laser beam and
It determines, the embodiment of the present invention is without limitation.Multi-layer film structure 21 is set on the inclined end face, for sloping optical fiber 2
In laser beam be totally reflected, be irradiated within the coverage area of silicon substrate grating 11 by the laser beam of total reflection.
At work, the laser beam enters the sloping optical fiber 2 by one end of sloping optical fiber 2, and in setting institute
The other end for stating inclined end face is totally reflected due to multi-layer film structure 21, and optical fiber itself has certain convergence to radial light
Effect, is conducive to the efficient coupling of the laser beam.It is irradiated to silicon substrate grating 11 by the laser beam of total reflection, and is passed through
The coupling output of silicon substrate output waveguide 12.
Optical coupling structure provided by the invention, since sloping optical fiber to be arranged in the upper surface of silicon substrate raster unit, inclined-plane
The inclined end face of optical fiber and the upper surface of silicon substrate raster unit are in predetermined angle, and plural layers knot is arranged on inclined end face
Structure, multi-layer film structure are totally reflected to by the laser beam in sloping optical fiber, the laser beam irradiation by total reflection
It to the silicon substrate grating, and is coupled and is exported by the silicon substrate output waveguide, improve coupling efficiency.Light provided by the invention
Coupled structure integrates in a plane, saves coupled room.
On the basis of the above embodiments, further, sloping optical fiber 2 is adhered to the upper surface of silicon substrate raster unit 1.Example
Such as, sloping optical fiber 2 lies against the upper surface of silicon substrate raster unit 1, by being adhesively fixed in silicon substrate raster unit 1.
On the basis of the various embodiments described above, further, the length direction of sloping optical fiber 2 and the slit of silicon substrate grating 11
Length direction is vertical.
On the basis of the various embodiments described above, further, silicon substrate grating 11 is made of period slit, the period slit
Period meet Bragg condition, the period slit is linear or curved shape.
Specifically, silicon substrate grating 11 is made on the surface silicon layer 13 of silicon substrate raster unit 1, it can be on surface silicon layer 13
Fabrication cycle slit forms silicon substrate grating 11, and the period of the period slit meets Bragg condition, utilizes 1 rank to higher order gratings
Design, the period is in nanometer to tens micron ranges, such as the period is 1 micron, the range of duty ratio 0.1 to
0.9, the period slit can be linear or curved shape.The specific structure of silicon substrate grating 11 depends on the laser for needing to pass through
Coupled wavelength, bandwidth, transmission direction and the efficiency requirements of light beam, are configured, the embodiment of the present invention is not done according to the actual situation
It limits.
On the basis of the various embodiments described above, further, anti-reflective film is arranged in the surface of silicon substrate grating 11.In order to increase
The antireflection ability on the surface of silicon substrate grating 11 needs that anti-reflective film, the anti-reflective film is arranged on the surface of silicon substrate grating 11
It is made of silicon nitride or silica.It will be appreciated that the part that sloping optical fiber 2 and silicon substrate raster unit 1 are in contact is that do not have
The anti-reflective film.
On the basis of the various embodiments described above, further, silicon substrate output waveguide 12 is that one end of silicon substrate grating 11 passes through
Two form curved groove.The curvature to curved groove is configured according to the actual situation, and the embodiment of the present invention is without limitation.
On the basis of the various embodiments described above, further, multi-layer film structure 21 is by silicon dioxide layer and titanium dioxide
Layer is alternately arranged composition, and the silicon dioxide layer has 6 layers, and the titanium dioxide layer has 6 layers.Above-mentioned multi-layer film structure can be real
Now to the total reflection of the laser beam.
On the basis of the various embodiments described above, further, silicon substrate raster unit 1 is made of silicon-on-insulator.
Specifically, silicon substrate raster unit 1 can be made using SOI, as shown in Figure 1, SOI includes substrate layer 15, absolutely
Edge layer 14 and surface silicon layer 13, wherein substrate layer 15 is made by single crystal silicon material, and thickness is greater than 50 microns, insulating layer 14
On substrate layer 15, with a thickness of 1 to 3 micron, surface silicon layer 13 is located on insulating layer 14, with a thickness of 0.2-1 microns.On surface
Silicon substrate grating 11 is made on silicon layer 13, and makes output waveguide 12 in one end of silicon substrate grating 11, and silicon substrate output waveguide 12 is coupling
Multiplex guide structure, to form the coupling output of the laser beam.
On the basis of the various embodiments described above, further, the sandwich layer doped germanium of sloping optical fiber 2, to realize high refractive index,
Reduce the energy loss of the laser beam.
Fig. 2 is the flow diagram of the manufacturing method of one embodiment of the invention optical coupling structure, as shown in Fig. 2, of the invention
The manufacturing method of the optical coupling structure of offer, comprising:
Silicon substrate grating is made on the surface silicon layer of S201, on insulator silicon, and is made in one end of the silicon substrate grating
Silicon substrate output waveguide；
Specifically, obtain the SOI of customization structure, SOI includes substrate layer, insulating layer and surface silicon layer, the substrate layer by
Single crystal silicon material is made, and thickness is greater than 50 microns, and the insulating layer is located on substrate layer, described with a thickness of 1 to 3 micron
Surface silicon layer is located on the insulating layer, with a thickness of 0.2-1 microns.Silicon is made on the surface silicon layer of SOI by photoetching corrosion
Base grating, and silicon substrate output waveguide is made by photoetching corrosion in one end of the silicon substrate grating, the silicon substrate output waveguide can
Think grading structure or straight wave guide structure, such as tool can be produced there are two to the silicon substrate output waveguide of curved groove.
Wherein, the specific structure of the silicon substrate grating depend on the coupled wavelength of laser beam for needing to pass through, bandwidth, transmission direction and
Efficiency requirements are configured according to actual needs, and the embodiment of the present invention is without limitation.
S202, inclined end face is produced in one end of optical fiber, forms sloping optical fiber；
Specifically, an end face of optical fiber is polished directly, produces the smooth end face of certain tilt angle, that is, inclines
Angled end-face, the optical fiber with the inclined end face form sloping optical fiber, and manufacture craft is standard fiber grinding technics, utilize light
Fine grinder and special fixture can be realized.Wherein, the tilt angle of the inclined end face according to the structure of the silicon substrate grating,
Coupled wavelength, bandwidth, transmission direction and the efficiency requirements of the laser beam and determine；The optical fiber is standard single mode or multimode
Silica fibre, the optical fiber include sandwich layer and covering, and sandwich layer diameter is 9 to 100 microns, and cladding outer diameter is 125 microns, the core
Layer doped germanium, to realize high refractive index.
S203, alternating growth silicon dioxide layer and titanium dioxide layer on the inclined end face form multi-layer film structure；
Specifically, thermal evaporation either magnetron sputtering apparatus alternating growth silicon dioxide layer is utilized on the inclined end face
And titanium dioxide layer, such as 6 layers of silicon dioxide layer of alternating growth and 6 layers of titanium dioxide layer are used for forming multi-layer film structure
To being totally reflected for laser beam；
S204, the sloping optical fiber is adhered on the surface silicon layer, so that into the laser beam of the sloping optical fiber,
By the total reflection of the multi-layer film structure on the inclined end face, it is irradiated to the silicon substrate grating, and passes through the silicon
The coupling output of base output waveguide.
Specifically, the sloping optical fiber with the multi-layer film structure is subjected to beam alignment coupling, i.e., it will be described
Sloping optical fiber is lain on the surface silicon layer, by adjusting position and side of the sloping optical fiber on the surface silicon layer
To so that by the laser beam that the sloping optical fiber is totally reflected, alignment is coupled to the silicon substrate grating, in the completion light
After the alignment coupling of beam, the upper surface for tilting optical fiber and the surface silicon layer is bonded together, thus by the sloping optical fiber
It is fixed on the surface silicon layer.
The manufacturing method of optical coupling structure provided by the invention, since the upper of silicon substrate raster unit is arranged in sloping optical fiber
Surface, the inclined end face of sloping optical fiber and the upper surface of silicon substrate raster unit are in predetermined angle, and setting is more on inclined end face
Layer film structure, multi-layer film structure are totally reflected to by the laser beam in sloping optical fiber, and described by total reflection swashs
Light beam is irradiated to the silicon substrate grating, and is coupled and exported by the silicon substrate output waveguide, improves coupling efficiency.The present invention
The manufacturing method of the optical coupling structure of offer, manufacturing cost are low, it is easy to accomplish.
Finally, it should be noted that the above embodiments are merely illustrative of the technical solutions of the present invention, rather than its limitations；Although
Present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that: it still may be used
To modify the technical solutions described in the foregoing embodiments or equivalent replacement of some of the technical features；
And these are modified or replaceed, technical solution of various embodiments of the present invention that it does not separate the essence of the corresponding technical solution spirit and
Range.
Claims (10)
1. a kind of optical coupling structure characterized by comprising
Sloping optical fiber and silicon substrate raster unit, the upper surface of the silicon substrate raster unit is arranged in the sloping optical fiber, described oblique
Face optical fiber includes inclined end face, and the upper surface of the inclined end face and the silicon substrate raster unit is in predetermined angle, the silicon substrate
Raster unit includes silicon substrate grating and silicon substrate output waveguide, and the silicon substrate output waveguide is Coupled Passive Waveguide Structure；
Wherein, multi-layer film structure is set on the inclined end face, and the multi-layer film structure is used for the sloping optical fiber
In laser beam be totally reflected, the laser beam by total reflection is irradiated to the silicon substrate grating, and passes through the silicon substrate
Output waveguide coupling output.
2. optical coupling structure according to claim 1, which is characterized in that the sloping optical fiber is adhered to the silicon substrate grating
The upper surface of unit.
3. optical coupling structure according to claim 1, which is characterized in that the length direction of the sloping optical fiber and the silicon
The slit length direction of base grating is vertical.
4. optical coupling structure according to claim 1, which is characterized in that the silicon substrate grating is made of period slit, institute
The period for stating period slit meets Bragg condition, and the period slit is linear or curved shape.
5. optical coupling structure according to claim 1, which is characterized in that antireflection is arranged in the surface of the silicon substrate grating
Film.
6. optical coupling structure according to claim 1, which is characterized in that the silicon substrate output waveguide is the silicon substrate grating
One end curved groove is formed by two.
7. optical coupling structure according to claim 1, which is characterized in that the multi-layer film structure by silicon dioxide layer and
Titanium dioxide layer is alternately arranged composition, and the silicon dioxide layer and the titanium dioxide layer respectively have 6 layers.
8. optical coupling structure according to claim 1, which is characterized in that the silicon substrate raster unit uses silicon-on-insulator
It is made.
9. optical coupling structure according to any one of claims 1 to 8, which is characterized in that the sandwich layer of the sloping optical fiber is mixed
Miscellaneous germanium.
10. a kind of manufacturing method of optical coupling structure characterized by comprising
Silicon substrate grating is made on the surface silicon layer of silicon on insulator, and makes silicon substrate output wave in one end of the silicon substrate grating
It leads；
Inclined end face is produced in one end of optical fiber, forms sloping optical fiber；
Alternating growth silicon dioxide layer and titanium dioxide layer on the inclined end face form multi-layer film structure；
The sloping optical fiber is adhered on the surface silicon layer, so that into the laser beam of the sloping optical fiber, by described
The total reflection of the multi-layer film structure on inclined end face is irradiated to the silicon substrate grating, and passes through the silicon substrate output wave
Lead coupling output.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710867704.2A CN109541754A (en) | 2017-09-22 | 2017-09-22 | A kind of optical coupling structure and its manufacturing method |
| PCT/CN2018/085440 WO2019056757A1 (en) | 2017-09-22 | 2018-05-03 | Optical coupling structure and fabrication method therefor |
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| CN201710867704.2A CN109541754A (en) | 2017-09-22 | 2017-09-22 | A kind of optical coupling structure and its manufacturing method |
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| JP6532748B2 (en) * | 2015-04-30 | 2019-06-19 | 株式会社フジクラ | Multicore fiber |
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| CN102741721A (en) * | 2009-11-24 | 2012-10-17 | 康宁股份有限公司 | Planar waveguide and optical fiber coupling |
| CN101813807A (en) * | 2010-03-10 | 2010-08-25 | 中国科学院半导体研究所 | Silicon-based grating coupler on insulator and manufacturing method thereof |
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| WO2019056757A1 (en) | 2019-03-28 |
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