CN109536914A - A kind of the vapor deposition film thickness set composite and its working method of detection molecules evaporation capacity - Google Patents
A kind of the vapor deposition film thickness set composite and its working method of detection molecules evaporation capacity Download PDFInfo
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- CN109536914A CN109536914A CN201910024005.0A CN201910024005A CN109536914A CN 109536914 A CN109536914 A CN 109536914A CN 201910024005 A CN201910024005 A CN 201910024005A CN 109536914 A CN109536914 A CN 109536914A
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- film thickness
- vapor deposition
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- vacuum chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention discloses the vapor deposition film thickness set composite and its working method of a kind of detection molecules evaporation capacity, which includes device framework, vacuum chamber, substrate rotational structure, film thickness detection structure, flange lifting structure；Vacuum chamber, substrate rotational structure, film thickness detection structure, flange lifting structure integrated installation are on device framework；Substrate rotational structure includes rotating stepper motor, shaft coupling, magnet fluid sealing axis, and rotating stepper motor passes through shaft coupling and magnet fluid sealing axis connection, rotating stepper motor, shaft coupling, the coaxial arrangement of magnet fluid sealing axis.The device is under the variables such as mutually synthermal, vacuum degree, the Thickness Variation of the different organic test materials of test, it is acquired by data and generates the functional relation between thickness and temperature, vacuum degree, stroke according to the thickness change in vapor deposition area, thus the vapor deposition film thickness rate of change of different materials is obtained, the OLED film for preparing different-thickness for industrialization provides process parameters.
Description
Technical field
The present invention relates to diode preparation technical fields, and in particular to a kind of vapor deposition film thickness of detection molecules evaporation capacity is compound
Device and its working method.
Background technique
Present colleges, research institutions and enterprise are when prepared by the scientific research and small lot for carrying out film new material, using vacuum
Coating system realizes the growth of multiclass thin-film material, mainly there is metal evaporation, organic vapor deposition equipment.Organic vapor deposition equipment is main
For organic electroluminescent technical study, the research of organic illumination device technology, organic solar batteries technical study and organic half
Semiconductor process research, work efficiency is high, has the effect of getting twice the result with half the effort.
The mainstream preparation process of Organic Light Emitting Diode (OLED) is evaporation coating technique at present, using thermal evaporation organic material
Principle, i.e., organic material insert vapor deposition component in, under vacuum conditions heating heating, make tank body organic material molten volatilize or
Person distils to form gaseous state, and gas stream deposits on glass substrate, forms organic film from level to level, is prepared into OLED component.
Current evaporated device includes vapor deposition component, and vapor deposition component includes crucible and crucible nozzle, and nozzle is in uneven heating
When be easy to cause blocking, small organic molecule is easy to gather generation part on vacuum cabin head substrate after evaporation uneven existing
As, while in order to grope the evaporation rate of different materials under the same conditions in laboratory, it needs to explore organic small molecule material
Technique producing line early period is deposited, to provide effective reference value for industrial scale film.
Considered based on above-mentioned factor, the present invention can be industry by the vapor deposition film thickness rate of change of test different materials
Change prepare different-thickness OLED film provide process parameters, convenient for relevant enterprise make rational planning for producing line layout.
Summary of the invention
In order to solve the above technical problems, the purpose of the present invention is to provide a kind of evaporation films of detection molecules evaporation capacity
Thick set composite and its working method, by vacuum chamber, substrate rotational structure, film thickness detection structure, the integrated peace of flange lifting structure
On device framework, under the variables such as mutually synthermal, vacuum degree, the Thickness Variation of the different organic test materials of test passes through
Data acquisition simultaneously generates the functional relation between thickness and temperature, vacuum degree, stroke according to the thickness change in vapor deposition area, thus
To the vapor deposition film thickness rate of change of different materials, the OLED film for preparing different-thickness for industrialization provides process parameters.
The purpose of the present invention can be achieved through the following technical solutions:
The present invention provides a kind of vapor deposition film thickness set composites of detection molecules evaporation capacity, comprising: device framework, vacuum
Cabin, substrate rotational structure, film thickness detection structure, flange lifting structure；Vacuum chamber, substrate rotational structure, film thickness detection structure, method
Blue lifting structure integrated installation is on device framework；
The substrate rotational structure includes rotating stepper motor, shaft coupling, magnet fluid sealing axis, and rotating stepper motor passes through
Shaft coupling and magnet fluid sealing axis connection, rotating stepper motor, shaft coupling, the coaxial arrangement of magnet fluid sealing axis；
The flange lifting structure includes: upper flange, lower flange, and the top of vacuum chamber passes through O-ring seal and upper flange
The bottom of connection, vacuum chamber is connect by O-ring seal with lower flange, and magnet fluid sealing axis passes through upper flange and protrudes into vacuum chamber
It is interior to be connect with upper heating plate；
The upper flange is connect by the first vacuum electrode with upper heating plate；The side wall of lower flange is connected with molecular pump and true
Sky rule；The top of lower flange is equipped with lower heating plate, and lower heating plate is coaxially connected with rotating disc, rotating disc reserve it is jagged, it is lower plus
Hot plate, rotating disc are connect by the second vacuum electrode with lower flange；The junction of lower flange and vacuum chamber is equipped with thermocouple.
As a further solution of the present invention, the vacuum chamber is in hollow cylindrical, and the cylindric wall portion of vacuum chamber is equipped with
Observation window offers vacuum cabin door on observation window.
As a further solution of the present invention, the upper portion side wall of device framework is equipped with control panel, and middle part of sliding channel is equipped with electricity
Gas installation region.
As a further solution of the present invention, the film thickness detection structure includes film thickness gauge, and installation is offered on upper flange
Hole, film thickness gauge passes through mounting hole and its probe protrudes into vacuum chamber.
It is including following the present invention also provides a kind of working method of the vapor deposition film thickness set composite of detection molecules evaporation capacity
Step:
1) upper substrate, lower substrate are respectively placed in upper heating plate and lower heating plate, are placed on lower substrate to be deposited
Material, starting molecular pump vacuumize vacuum chamber；
2) reach target value 10 to vacuum degree-3When Pa or less, upper heating plate, lower heating plate are respectively by upper substrate, lower substrate
100 DEG C, 235 DEG C are heated to, the material to be deposited on lower substrate is after heated, and gasification escapes from surface for molecule or atom, is formed
The steam stream of plating material is incident on upper substrate surface, sublimates to form solid film；
3) it is popped one's head in by film thickness gauge and acquires film thickness data, thermocouple temperature collection data, vacuum meter detects vacuum degree, obtains
The thickness change in area to be deposited generates the relationship between thickness and temperature, vacuum degree, stroke, it follows that different materials are in different items
Vapor deposition film thickness rate of change under part is converted to deposition molecular weight of the different materials to be deposited under identical external condition.
Beneficial effects of the present invention:
1, vapor deposition film thickness set composite of the invention, is realized partially sealed by rotating disc, and evaporation material is through lower heating
Upper substrate deposition is diffused upward into after plate heating from the future insufficiency of rotating disc, the blocking of crucible nozzle is avoided, in upper substrate
Rotating stepper motor is connected to drive upper substrate to rotate by shaft coupling, is avoided the local cluster of evaporation material and is generated film thickness not
Uniform phenomenon.
2, the present invention is fixed in upper and lower base plate progress stroke, and under the variables such as mutually synthermal, vacuum degree, test is different organic
The Thickness Variation of test material is acquired by data and generates thickness and temperature, vacuum degree, row according to the thickness change in vapor deposition area
Thus functional relation between journey obtains the vapor deposition film thickness rate of change of different materials, prepare different-thickness for industrialization
OLED film provides process parameters.
Detailed description of the invention
The present invention will be further described below with reference to the drawings.
Fig. 1 is the structural schematic diagram of the vapor deposition film thickness set composite of detection molecules evaporation capacity of the present invention.
In figure: 1, device framework；2, rotating stepper motor；3, the first vacuum electrode；4, upper heating plate；5, electrical installing zone
Domain；6, vacuum chamber；7, molecular pump；8, control panel；9, magnet fluid sealing axis；10, film thickness gauge；11, observation window；12, vacuum chamber
Door；13, lower heating plate；14, thermocouple；15, the second vacuum electrode；16, shaft coupling；17, upper flange；18, lower flange；19, turn
Moving plate.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts all other
Embodiment shall fall within the protection scope of the present invention.
Refering to Figure 1, present embodiments providing a kind of vapor deposition film thickness set composite of detection molecules evaporation capacity, the dress
Set includes: device framework 1, vacuum chamber 6, substrate rotational structure, film thickness detection structure, flange lifting structure；Vacuum chamber 6, substrate
Rotational structure, film thickness detection structure, flange lifting structure integrated installation are on device framework 1.The upper portion side wall of device framework 1 is set
There is control panel 8, middle part of sliding channel is equipped with electrical installation region 5.Vacuum chamber 6 is in hollow cylindrical, the cylindric wall portion of vacuum chamber 6
Equipped with observation window 11, vacuum cabin door 12 is offered on observation window 11.
Specifically, substrate rotational structure includes rotating stepper motor 2, shaft coupling 16, magnet fluid sealing axis 9, rotates stepping
Motor 2 is connect by shaft coupling 16 with magnet fluid sealing axis 9, and rotating stepper motor 2, shaft coupling 16, magnet fluid sealing axis 9 are coaxial
Setting.
Flange lifting structure includes: upper flange 17, lower flange 18, and the top of vacuum chamber 6 passes through O-ring seal and upper flange
The bottom of 17 connections, vacuum chamber 6 is connect by O-ring seal with lower flange 18, and magnet fluid sealing axis 9 passes through upper flange 17 and stretches
Enter and is connect in vacuum chamber 6 with upper heating plate 4.By the rotation of rotating stepper motor 2, shaft coupling 16, magnetic fluid can be driven close
Seal the synchronous rotation of axis 9, upper heating plate 4.Upper flange 17 is connect by the first vacuum electrode 3 with upper heating plate 4.Lower flange 18
Side wall is connected with molecular pump 7 and vacuum gauge.The top of lower flange 18 is equipped with lower heating plate 13, and lower heating plate 13, which is coaxially connected with, to be turned
Moving plate 19, rotating disc 19 is reserved with rectangular distillation notch and the size of rotating disc 19 is much larger than evaporation molybdenum boat size, so that steaming
Plating material can only be evaporated from the rectangular distillation notch of rotating disc.Lower heating plate 13, rotating disc 19 by the second vacuum electrode 15 with
Lower flange 18 connects.The junction of lower flange 18 and vacuum chamber 6 is equipped with thermocouple 14, and thermocouple is used to directly measure temperature, and
Temperature signal is converted into thermo-electromotive force signal, the temperature of measured medium is converted by electric meter.
Film thickness detection structure includes film thickness gauge 10, offers mounting hole on upper flange 17, film thickness gauge 10 pass through mounting hole and
Its probe protrudes into vacuum chamber 6.
The working method of the vapor deposition film thickness set composite of the detection molecules evaporation capacity is as follows:
1) upper substrate, lower substrate are respectively placed in upper heating plate 4 in lower heating plate 13, placed on lower substrate wait steam
Material is plated, starting molecular pump 7 vacuumizes vacuum chamber 6；
2) reach target value 10 to vacuum degree-3When Pa or less, upper heating plate 4, lower heating plate 13 are respectively by upper substrate, lower base
Plate is heated to 100 DEG C, 235 DEG C, and the material to be deposited on lower substrate is after heated, and gasification escapes from surface for molecule or atom, shape
It is incident on upper substrate surface at the steam stream of plating material, sublimates to form solid film；
3) film thickness data, 14 temperature collection data of thermocouple being acquired by the probe of film thickness gauge 10, vacuum meter detects vacuum degree,
The relationship between the thickness change generation thickness in area to be deposited and temperature, vacuum degree, stroke is obtained, it follows that different materials are not
Vapor deposition film thickness rate of change under the conditions of is converted to deposition molecule of the different materials to be deposited under identical external condition
Amount.
In the description of this specification, the description of reference term " one embodiment ", " example ", " specific example " etc. means
Particular features, structures, materials, or characteristics described in conjunction with this embodiment or example are contained at least one implementation of the invention
In example or example.In the present specification, schematic expression of the above terms may not refer to the same embodiment or example.
Moreover, particular features, structures, materials, or characteristics described can be in any one or more of the embodiments or examples to close
Suitable mode combines.
Above content is only citing made for the present invention and explanation, affiliated those skilled in the art are to being retouched
The specific embodiment stated does various modifications or additions or is substituted in a similar manner, and without departing from invention or surpasses
More range defined in the claims, is within the scope of protection of the invention.
Claims (5)
1. a kind of vapor deposition film thickness set composite of detection molecules evaporation capacity characterized by comprising device framework (1), vacuum chamber
(6), substrate rotational structure, film thickness detection structure, flange lifting structure；Vacuum chamber (6), substrate rotational structure, film thickness detection knot
Structure, flange lifting structure integrated installation are on device framework (1)；
The substrate rotational structure includes rotating stepper motor (2), shaft coupling (16), magnet fluid sealing axis (9), rotation stepping electricity
Machine (2) is connect by shaft coupling (16) with magnet fluid sealing axis (9), and rotating stepper motor (2), shaft coupling (16), magnetic fluid are close
Seal axis (9) coaxial arrangement；
The flange lifting structure includes: upper flange (17), lower flange (18), the top of vacuum chamber (6) by O-ring seal with
The bottom of upper flange (17) connection, vacuum chamber (6) is connect by O-ring seal with lower flange (18), and magnet fluid sealing axis (9) is worn
It crosses upper flange (17) and protrudes into vacuum chamber (6) and connect with upper heating plate (4)；
The upper flange (17) is connect by the first vacuum electrode (3) with upper heating plate (4)；The side wall of lower flange (18) is connected with
Molecular pump (7) and vacuum gauge；The top of lower flange (18) is equipped with lower heating plate (13), and lower heating plate (13) is coaxially connected with rotation
Disk (19), rotating disc (19) reserve it is jagged, lower heating plate (13), rotating disc (19) pass through the second vacuum electrode (15) and laxative remedy
Blue (18) connection；The junction of lower flange (18) and vacuum chamber (6) is equipped with thermocouple (14).
2. the vapor deposition film thickness set composite of detection molecules evaporation capacity according to claim 1, which is characterized in that the vacuum
Cabin (6) is in hollow cylindrical, and the cylindric wall portion of vacuum chamber (6) is equipped with observation window (11), and observation window offers vacuum on (11)
Hatch door (12).
3. the vapor deposition film thickness set composite of detection molecules evaporation capacity according to claim 1, which is characterized in that device framework
(1) upper portion side wall is equipped with control panel (8), and middle part of sliding channel is equipped with electrical installation region (5).
4. the vapor deposition film thickness set composite of detection molecules evaporation capacity according to claim 1, which is characterized in that the film thickness
Detection structure includes film thickness gauge (10), mounting hole is offered on upper flange (17), film thickness gauge (10) passes through mounting hole and it is popped one's head in
It protrudes into vacuum chamber (6).
5. a kind of working method of the vapor deposition film thickness set composite of detection molecules evaporation capacity, which comprises the following steps:
1) upper substrate, lower substrate are respectively placed on upper heating plate (4) and lower heating plate (13), are placed on lower substrate wait steam
Material is plated, starting molecular pump (7) vacuumizes vacuum chamber (6)；
2) reach target value 10 to vacuum degree-3When Pa or less, upper heating plate (4), lower heating plate (13) are respectively by upper substrate, lower base
Plate is heated to 100 DEG C, 235 DEG C, and the material to be deposited on lower substrate is after heated, and gasification escapes from surface for molecule or atom, shape
It is incident on upper substrate surface at the steam stream of plating material, sublimates to form solid film；
3) film thickness data, thermocouple (14) temperature collection data being acquired by film thickness gauge (10) probe, vacuum meter detects vacuum degree,
The relationship between the thickness change generation thickness in area to be deposited and temperature, vacuum degree, stroke is obtained, it follows that different materials are not
Vapor deposition film thickness rate of change under the conditions of is converted to deposition molecule of the different materials to be deposited under identical external condition
Amount.
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| CN201910024005.0A CN109536914A (en) | 2019-01-10 | 2019-01-10 | A kind of the vapor deposition film thickness set composite and its working method of detection molecules evaporation capacity |
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| CN201910024005.0A CN109536914A (en) | 2019-01-10 | 2019-01-10 | A kind of the vapor deposition film thickness set composite and its working method of detection molecules evaporation capacity |
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Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03206910A (en) * | 1990-01-08 | 1991-09-10 | Matsushita Electric Ind Co Ltd | Film-thickness measuring apparatus |
| CN1431339A (en) * | 2003-01-28 | 2003-07-23 | 吉林大学 | Crucible type evaporator source used for film plating machines in organic electrofluorescence type |
| CN1854332A (en) * | 2005-03-09 | 2006-11-01 | 三星Sdi株式会社 | Multiple vacuum evaporation coating device and method for controlling the same |
| CN1891850A (en) * | 2005-07-04 | 2007-01-10 | 精工爱普生株式会社 | Vacuum evaporation apparatus and method of producing electro-optical device |
| CN103993269A (en) * | 2014-05-19 | 2014-08-20 | 上海和辉光电有限公司 | Coating device and coating method |
| CN204608148U (en) * | 2015-02-13 | 2015-09-02 | 安徽贝意克设备技术有限公司 | The heating evaporation mechanism of the infrared vacuum unit of a kind of adjustable compound evaporation coating |
| CN105018884A (en) * | 2015-07-30 | 2015-11-04 | 苏州方昇光电装备技术有限公司 | Small vacuum evaporation instrument |
| CN107400860A (en) * | 2017-09-08 | 2017-11-28 | 霍尔果斯迅奇信息科技有限公司 | High-frequency induction heating vaporising device |
| CN207062369U (en) * | 2017-07-23 | 2018-03-02 | 杰莱特（苏州）精密仪器有限公司 | A kind of vacuum workpiece high speed rotating unit |
| CN209508398U (en) * | 2019-01-10 | 2019-10-18 | 合肥百思新材料研究院有限公司 | A kind of vapor deposition film thickness set composite of detection molecules evaporation capacity |
-
2019
- 2019-01-10 CN CN201910024005.0A patent/CN109536914A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03206910A (en) * | 1990-01-08 | 1991-09-10 | Matsushita Electric Ind Co Ltd | Film-thickness measuring apparatus |
| CN1431339A (en) * | 2003-01-28 | 2003-07-23 | 吉林大学 | Crucible type evaporator source used for film plating machines in organic electrofluorescence type |
| CN1854332A (en) * | 2005-03-09 | 2006-11-01 | 三星Sdi株式会社 | Multiple vacuum evaporation coating device and method for controlling the same |
| CN1891850A (en) * | 2005-07-04 | 2007-01-10 | 精工爱普生株式会社 | Vacuum evaporation apparatus and method of producing electro-optical device |
| CN103993269A (en) * | 2014-05-19 | 2014-08-20 | 上海和辉光电有限公司 | Coating device and coating method |
| CN204608148U (en) * | 2015-02-13 | 2015-09-02 | 安徽贝意克设备技术有限公司 | The heating evaporation mechanism of the infrared vacuum unit of a kind of adjustable compound evaporation coating |
| CN105018884A (en) * | 2015-07-30 | 2015-11-04 | 苏州方昇光电装备技术有限公司 | Small vacuum evaporation instrument |
| CN207062369U (en) * | 2017-07-23 | 2018-03-02 | 杰莱特（苏州）精密仪器有限公司 | A kind of vacuum workpiece high speed rotating unit |
| CN107400860A (en) * | 2017-09-08 | 2017-11-28 | 霍尔果斯迅奇信息科技有限公司 | High-frequency induction heating vaporising device |
| CN209508398U (en) * | 2019-01-10 | 2019-10-18 | 合肥百思新材料研究院有限公司 | A kind of vapor deposition film thickness set composite of detection molecules evaporation capacity |
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