CN109536913A - A kind of cleaning device for exempting to change crystal-vibration-chip - Google Patents
A kind of cleaning device for exempting to change crystal-vibration-chip Download PDFInfo
- Publication number
- CN109536913A CN109536913A CN201811618566.5A CN201811618566A CN109536913A CN 109536913 A CN109536913 A CN 109536913A CN 201811618566 A CN201811618566 A CN 201811618566A CN 109536913 A CN109536913 A CN 109536913A
- Authority
- CN
- China
- Prior art keywords
- vibration
- chip
- laser generator
- crystal
- cleaning device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
The invention discloses a kind of cleaning devices for exempting to change crystal-vibration-chip, the cleaning device is set in vapor deposition chamber, including laser generator, cylindrical lens and drainage line, the laser generator is set to the indoor positioning disk of the vapor deposition chamber away from the crystal-vibration-chip side, through-hole is provided with on the positioning disk of the laser generator opposite position, the cylindrical lens are provided between the laser generator and the through-hole, described drainage line one end is connected to the space between the laser generator and the through-hole, and the other end connects aspiration pump.Cleaning device of the invention generates laser by laser generator and forms strip light through cylindrical lens, it is acted on crystal-vibration-chip across through-hole, after organic material absorbs laser energy, evaporation is detached from crystal-vibration-chip Gold plated Layer, then it is taken away from drainage line by aspiration pump, has achieved the purpose that effective cleaning crystal-vibration-chip.
Description
Technical field
The present invention relates to a kind of cleaning devices for exempting to change crystal-vibration-chip.
Background technique
In vacuum chamber, when starting plated film, part organic material can deposit to crystal-vibration-chip Gold plated Layer, and crystal-vibration-chip is with this
To detect plated film rate.With the increase of crystal-vibration-chip Gold plated Layer organic material, vibration frequency changes, under crystal oscillator piece performance
Drop, needs replacing crystal-vibration-chip.Present circumstances, in daily production, crystal-vibration-chip service life is short, and crystal-vibration-chip replacement is cumbersome time-consuming, and
Crystal-vibration-chip is expensive to cause cost to increase.
Summary of the invention
In order to solve the above-mentioned technical problem, the object of the present invention is to provide a kind of cleaning device for exempting to change crystal-vibration-chip,
Do not reduce and clean crystal-vibration-chip surface organic material in the case where crystal oscillator piece performance, extend crystal-vibration-chip service life, save the time,
Manpower, cost.
In order to solve the above technical problems, the present invention adopts the following technical scheme:
A kind of cleaning device for exempting to change crystal-vibration-chip, the cleaning device are set in vapor deposition chamber, including laser generator,
Cylindrical lens and drainage line, the laser generator are set to the indoor positioning disk of the vapor deposition chamber away from the crystal-vibration-chip one
Through-hole is provided on side, with the positioning disk of the laser generator opposite position, the laser generator leads to described
The cylindrical lens, the space between described drainage line one end and the laser generator and the through-hole are provided between hole
Connection, the other end connect aspiration pump.
Further, the laser generator is the KrF excimer laser generator of wavelength 248nm, wavelength 308nm
XeCl excimer laser generator, the ArF excimer laser generator of wavelength 193nm, Nd:YAG solid laser generator, CO2
Laser generator or semiconductor laser generator.
Further, on the setting position of the through-hole and the positioning disk original from positional symmetry with holes.
Further, the drainage line is the pipeline that high temperature resistant and inner wall do not adhere to organic material easily.
Further, the drainage line includes stainless steel tube, and the stainless steel inside pipe wall is coated with polytetrafluoroethylene (PTFE).
Further, the aspiration pump is vacuum pump or dry pump.
Further, the drainage line is connected between the cylindrical lens and the through-hole.
Further, the drainage line is situated so as to absorb organic material close to the through-hole.
Compared with prior art, advantageous effects of the invention:
Laser generator generates laser and forms strip light by cylindrical lens, acts on crystal-vibration-chip across through-hole, organic
After material absorbs laser energy, evaporation is detached from crystal-vibration-chip Gold plated Layer, is then taken away from drainage line by aspiration pump, having reached has
The purpose of effect cleaning crystal-vibration-chip.
Detailed description of the invention
The invention will be further described for explanation with reference to the accompanying drawing.
Fig. 1 is that the present invention exempts to change the structural schematic diagram of the cleaning device of crystal-vibration-chip；
Fig. 2 is distribution schematic diagram of the crystal-vibration-chip in crystal-vibration-chip turntable；
Description of symbols: 1- laser generator；2- cylindrical lens；3- drainage line；4- drainage line；5- positioning disk；
6- crystal-vibration-chip；7- crystal-vibration-chip turntable.
Specific embodiment
As illustrated in fig. 1 and 2, a kind of cleaning device for exempting to change crystal-vibration-chip, the cleaning device are set in vapor deposition chamber, packet
Laser generator 1, cylindrical lens 2 and drainage line 4 are included, the laser generator 1 is set to the indoor positioning disk 5 of vapor deposition chamber and carries on the back
It is described from being provided with through-hole 3 on 6 side of crystal-vibration-chip, with the positioning disk 5 of 1 opposite position of laser generator
The cylindrical lens 2 are provided between laser generator 1 and the through-hole 3, described 4 one end of drainage line and the laser occur
Space between device 1 and the through-hole 3 is connected to, and the other end connects aspiration pump.
In the present embodiment, the laser generator 1 is KrF excimer laser generator, the wavelength 308nm of wavelength 248nm
XeCl excimer laser generator, the ArF excimer laser generator of wavelength 193nm, Nd:YAG solid laser generator,
CO2Laser generator or semiconductor laser generator.Original is from holes on the setting position of the through-hole 3 and the positioning disk 5
Positional symmetry.The drainage line 4 is the pipeline that high temperature resistant and inner wall do not adhere to organic material easily, if drainage line 4 is not
Rust steel pipe and the stainless steel inside pipe wall are coated with polytetrafluoroethylene (PTFE), and drainage line 4 is vacuum pipe.The aspiration pump is vacuum pump
Or dry pump.The drainage line 4 be connected between the cylindrical lens 2 and the through-hole 3 and close to the through-hole 3 be arranged so as to
In absorption organic material.
Under vacuum condition, a new crystal-vibration-chip frequency 6MHZ, vital values 0, active value 820, use a period of time
Afterwards, crystal-vibration-chip frequency becomes 5.8MHZ, vital values 6, active value 650.It is demonstrated experimentally that by after laser cleaning, crystal-vibration-chip
Crystal-vibration-chip frequency becomes 5.995, and vital values become 1, and active value 800, performance obviously improves.
Action process of the invention is as follows:
Laser generator 1 generates laser and forms strip light by 2 cylindrical lens, acts on crystal-vibration-chip 6 through through-hole 3,
Temperature can be set to 300 DEG C, and after organic material absorbs laser energy, evaporation is detached from crystal-vibration-chip Gold plated Layer, and (golden fusing point is very
It is high), then taken away by aspiration pump by drainage line 4, and the technique that crystal-vibration-chip self-temperature is carried in original evaporation coating device is cold
But under the action of water and compressed air, temperature remains at 60 DEG C or less.It, can be one by one with the rotation of crystal-vibration-chip turntable 7
Clean each crystal-vibration-chip 6.
Embodiment described above is only that preferred embodiment of the invention is described, and is not carried out to the scope of the present invention
It limits, without departing from the spirit of the design of the present invention, those of ordinary skill in the art make technical solution of the present invention
Various changes and improvements, should all fall into claims of the present invention determine protection scope in.
Claims (8)
1. a kind of cleaning device for exempting to change crystal-vibration-chip, it is characterised in that: including laser generator (1), cylindrical lens (2) and row
Pipe material (4), the laser generator (1) are set to positioning disk (5) away from the crystal-vibration-chip (6) side, send out with the laser
It is provided with through-hole (3) on the positioning disk (5) of raw device (1) opposite position, the laser generator (1) and the through-hole
(3) it is provided between the cylindrical lens (2), described drainage line (4) one end and the laser generator (1) and the through-hole
(3) the space connection between, the other end connect aspiration pump.
2. the cleaning device according to claim 1 for exempting to change crystal-vibration-chip, it is characterised in that: the laser generator (1)
For the KrF excimer laser generator of wavelength 248nm, the XeCl excimer laser generator of wavelength 308nm, wavelength 193nm
ArF excimer laser generator, Nd:YAG solid laser generator, CO2Laser generator or semiconductor laser generator.
3. the cleaning device according to claim 1 for exempting to change crystal-vibration-chip, it is characterised in that: the setting of the through-hole (3)
Original is from positional symmetry with holes on position and the positioning disk (5).
4. the cleaning device according to claim 1 for exempting to change crystal-vibration-chip, it is characterised in that: the drainage line (4) is
High temperature resistant and inner wall do not adhere to the pipeline of organic material easily.
5. the cleaning device according to claim 1 for exempting to change crystal-vibration-chip, it is characterised in that: the aspiration pump is vacuum
Pump.
6. the cleaning device according to claim 1 for exempting to change crystal-vibration-chip, it is characterised in that: the drainage line (4) is even
It is connected between the cylindrical lens (2) and the through-hole (3).
7. the cleaning device according to claim 6 for exempting to change crystal-vibration-chip, it is characterised in that: the drainage line (4) is leaned on
The nearly through-hole (3) is situated so as to absorb organic material.
8. the cleaning device according to claim 4 for exempting to change crystal-vibration-chip, it is characterised in that: drainage line (4) packet
Stainless steel tube is included, the stainless steel inside pipe wall is coated with polytetrafluoroethylene (PTFE).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811618566.5A CN109536913A (en) | 2018-12-28 | 2018-12-28 | A kind of cleaning device for exempting to change crystal-vibration-chip |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811618566.5A CN109536913A (en) | 2018-12-28 | 2018-12-28 | A kind of cleaning device for exempting to change crystal-vibration-chip |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109536913A true CN109536913A (en) | 2019-03-29 |
Family
ID=65857458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811618566.5A Pending CN109536913A (en) | 2018-12-28 | 2018-12-28 | A kind of cleaning device for exempting to change crystal-vibration-chip |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN109536913A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202155335U (en) * | 2011-07-15 | 2012-03-07 | 重庆工商职业学院 | Laser cleaning device |
| CN103264228A (en) * | 2013-04-26 | 2013-08-28 | 常州大学 | QCM (quartz crystal microbalance) quartz crystal frequency correction method based on femtosecond laser technology |
| US20170285071A1 (en) * | 2014-12-23 | 2017-10-05 | Imt Co., Ltd. | Wafer inspection equipment having laser cleaning function |
| CN209227054U (en) * | 2018-12-28 | 2019-08-09 | 湖畔光电科技（江苏）有限公司 | A kind of cleaning device for exempting to change crystal-vibration-chip |
-
2018
- 2018-12-28 CN CN201811618566.5A patent/CN109536913A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202155335U (en) * | 2011-07-15 | 2012-03-07 | 重庆工商职业学院 | Laser cleaning device |
| CN103264228A (en) * | 2013-04-26 | 2013-08-28 | 常州大学 | QCM (quartz crystal microbalance) quartz crystal frequency correction method based on femtosecond laser technology |
| US20170285071A1 (en) * | 2014-12-23 | 2017-10-05 | Imt Co., Ltd. | Wafer inspection equipment having laser cleaning function |
| CN209227054U (en) * | 2018-12-28 | 2019-08-09 | 湖畔光电科技（江苏）有限公司 | A kind of cleaning device for exempting to change crystal-vibration-chip |
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