CN109518152A - 金属源剩余量检测装置及检测方法、蒸镀设备 - Google Patents
金属源剩余量检测装置及检测方法、蒸镀设备 Download PDFInfo
- Publication number
- CN109518152A CN109518152A CN201811566662.XA CN201811566662A CN109518152A CN 109518152 A CN109518152 A CN 109518152A CN 201811566662 A CN201811566662 A CN 201811566662A CN 109518152 A CN109518152 A CN 109518152A
- Authority
- CN
- China
- Prior art keywords
- source metal
- solenoid
- vapor deposition
- induction intensity
- magnetic induction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 130
- 239000002184 metal Substances 0.000 title claims abstract description 130
- 238000001514 detection method Methods 0.000 title claims abstract description 20
- 238000007740 vapor deposition Methods 0.000 claims abstract description 72
- 230000006698 induction Effects 0.000 claims abstract description 67
- 230000004308 accommodation Effects 0.000 claims abstract description 12
- 230000004907 flux Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 13
- 229910052571 earthenware Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 35
- 238000012360 testing method Methods 0.000 abstract description 9
- 230000000694 effects Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000945 filler Substances 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 239000007769 metal material Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000010025 steaming Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- HVMJUDPAXRRVQO-UHFFFAOYSA-N copper indium Chemical compound [Cu].[In] HVMJUDPAXRRVQO-UHFFFAOYSA-N 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- QNWMNMIVDYETIG-UHFFFAOYSA-N gallium(ii) selenide Chemical compound [Se]=[Ga] QNWMNMIVDYETIG-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811566662.XA CN109518152A (zh) | 2018-12-19 | 2018-12-19 | 金属源剩余量检测装置及检测方法、蒸镀设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811566662.XA CN109518152A (zh) | 2018-12-19 | 2018-12-19 | 金属源剩余量检测装置及检测方法、蒸镀设备 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN109518152A true CN109518152A (zh) | 2019-03-26 |
Family
ID=65795575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811566662.XA Pending CN109518152A (zh) | 2018-12-19 | 2018-12-19 | 金属源剩余量检测装置及检测方法、蒸镀设备 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN109518152A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112146729A (zh) * | 2019-06-28 | 2020-12-29 | 北京铂阳顶荣光伏科技有限公司 | 坩埚内原料剩余量的检测装置及检测方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1057797A (fr) * | 1949-09-24 | 1954-03-10 | Eastman Kodak Co | Procédé et appareil pour le dépôt dans le vide de couches de revêtement |
SU932705A1 (ru) * | 1980-01-29 | 1988-04-30 | Институт проблем литья АН УССР | Способ определени уровн металла в тигле магнитодинамического насоса |
JPH0770739A (ja) * | 1993-09-07 | 1995-03-14 | Mitsubishi Heavy Ind Ltd | 蒸着用るつぼの温度制御装置 |
JP2004162155A (ja) * | 2002-11-15 | 2004-06-10 | Matsushita Electric Ind Co Ltd | 磁性金属物の蒸着方法及び蒸着装置 |
KR20140083847A (ko) * | 2012-12-26 | 2014-07-04 | 에이유 오프트로닉스 코퍼레이션 | 증착 장치 |
KR20180062892A (ko) * | 2016-12-01 | 2018-06-11 | 주식회사 파인에바 | 가열 어셈블리 |
-
2018
- 2018-12-19 CN CN201811566662.XA patent/CN109518152A/zh active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1057797A (fr) * | 1949-09-24 | 1954-03-10 | Eastman Kodak Co | Procédé et appareil pour le dépôt dans le vide de couches de revêtement |
SU932705A1 (ru) * | 1980-01-29 | 1988-04-30 | Институт проблем литья АН УССР | Способ определени уровн металла в тигле магнитодинамического насоса |
JPH0770739A (ja) * | 1993-09-07 | 1995-03-14 | Mitsubishi Heavy Ind Ltd | 蒸着用るつぼの温度制御装置 |
JP2004162155A (ja) * | 2002-11-15 | 2004-06-10 | Matsushita Electric Ind Co Ltd | 磁性金属物の蒸着方法及び蒸着装置 |
KR20140083847A (ko) * | 2012-12-26 | 2014-07-04 | 에이유 오프트로닉스 코퍼레이션 | 증착 장치 |
JP2014125681A (ja) * | 2012-12-26 | 2014-07-07 | Au Optronics Corp | 蒸着装置 |
KR20180062892A (ko) * | 2016-12-01 | 2018-06-11 | 주식회사 파인에바 | 가열 어셈블리 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112146729A (zh) * | 2019-06-28 | 2020-12-29 | 北京铂阳顶荣光伏科技有限公司 | 坩埚内原料剩余量的检测装置及检测方法 |
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PB01 | Publication | ||
PB01 | Publication | ||
CB02 | Change of applicant information |
Address after: 100076 6015, 6th floor, building 8, 9 Yingshun Road, Yinghai Town, Daxing District, Beijing Applicant after: Beijing Dingrong Photovoltaic Technology Co.,Ltd. Address before: 100176 Beijing Daxing District Beijing economic and Technological Development Zone Rongchang East Street 7 hospital 6 Building 3001 room. Applicant before: BEIJING APOLLO DING RONG SOLAR TECHNOLOGY Co.,Ltd. |
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TA01 | Transfer of patent application right |
Effective date of registration: 20210412 Address after: 518054 Room 201, building A, 1 front Bay Road, Shenzhen Qianhai cooperation zone, Shenzhen, Guangdong Applicant after: Shenzhen Zhengyue development and Construction Co.,Ltd. Address before: 100076 6015, 6th floor, building 8, 9 Yingshun Road, Yinghai Town, Daxing District, Beijing Applicant before: Beijing Dingrong Photovoltaic Technology Co.,Ltd. |
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TA01 | Transfer of patent application right |
Effective date of registration: 20210916 Address after: 201203 3rd floor, no.665 Zhangjiang Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai Applicant after: Shanghai zuqiang Energy Co.,Ltd. Address before: 518054 Room 201, building A, 1 front Bay Road, Shenzhen Qianhai cooperation zone, Shenzhen, Guangdong Applicant before: Shenzhen Zhengyue development and Construction Co.,Ltd. |
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WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190326 |
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