CN109482570A - Improve the method and device of ultrasonic cleansing rate - Google Patents

Improve the method and device of ultrasonic cleansing rate Download PDF

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Publication number
CN109482570A
CN109482570A CN201710817378.4A CN201710817378A CN109482570A CN 109482570 A CN109482570 A CN 109482570A CN 201710817378 A CN201710817378 A CN 201710817378A CN 109482570 A CN109482570 A CN 109482570A
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China
Prior art keywords
wave
ultrasonic
cleaning solution
liquid level
cleaning
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Pending
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CN201710817378.4A
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Chinese (zh)
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朱学军
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Individual
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Individual
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Priority to CN201710817378.4A priority Critical patent/CN109482570A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

The invention discloses a kind of method and devices for improving ultrasonic cleansing rate, including rinse bath (1), it ultrasonic generator (2) and makes unrestrained device (3), rinse bath is provided with the cleaning solution of excessively not cleaned workpiece, apply ultrasound field from bottom of rinse bath to cleaning solution, unrestrained device is made simultaneously to blow to cleaning solution surface, blow afloat liquid level wave, the mirror-reflection for changing liquid level is diffusing reflection, to which dynamic changes the ultrasonic wave direction being reflected back in cleaning solution from liquid level, greatly reduce the generation of standing wave, and node few in number is made to generate displacement on space-time, it is no longer motionless in standing, prevent dirt accumulation, to eliminate adverse effect of the standing wave to ultrasonic cleaning, greatly improve clean rate.

Description

Improve the method and device of ultrasonic cleansing rate
Technical field
The present invention relates to ultrasonic cleaning technology fields.
Background technique
Ultrasonic wave has good rectilinear propagation properties, and the ultrasonic wave that irradiation comes up from bottom is most of by horizontal plane It is reflected back in cleaning solution, ultrasonic wave identical with two downward beam frequencies meets vertically upward, when compact part is just superimposed with part of rarefaction When, it cancels out each other, generates standing wave, and lose cleaning force.Existing ultrasonic cleaning technology is dispersed in cleaning due to the presence of standing wave Dirt in liquid condenses upon at node due to being made power by ultra sonic machinery power, causes dirt accumulation, cannot be scattered in liquid phase In, leverage clean rate.If standing wave node can stick in cleaned work close to cleaned workpiece surface, the dirt of accumulation On part surface, and under the TRANSIENT HIGH TEMPERATURE environment caused by the cavitation nuclear disruption of periphery, penetrated deep into cleaned inside workpiece, shape At irreversible permanent spot, or even cause economic loss.On the other hand, ultrasonic cavitation core is always grown in negative pressuren zone, It is collapsed in zone of positive pressure, causes the cleaning force uneven distribution between positive and negative pressure area, thus generate color in cleaned workpiece surface Difference, local surfaces are deteriorated because of overclean, other local surfaces influence cleanliness because cleaning is insufficient.Ultrasonic cleaning Technology is due in the presence of the above both sides defect, it is difficult to guarantee cleaning uniformity, cause clean rate lower, the degree of automation is not It is high.The method that existing cleaning technique mostly uses rotation or lifts cleaned workpiece changes the space-time position of cleaned workpiece to keep away The problem of opening standing wave node, not can effectively solve standing wave node accumulation dirt.
Summary of the invention
The present invention provides a kind of method and device for improving ultrasonic cleansing rate, it is intended to by manufacturing liquid on cleaning solution surface Surface wave wave reduces the generation of standing wave node, and dynamic changes the space-time position of node, eliminates the dirt accumulation generated by standing wave Phenomenon mentions high-detergency, while dynamic changes the space-time position of cavitation nuclear disruption, improves the uniformity of ultrasonic cleaning, shortens Scavenging period, reduction are deteriorated.
The present invention provides a kind of ultrasonic cleaning equipment, and described device includes: rinse bath (1), ultrasonic generator (2), unrestrained device (3) are made.
The present invention further provides a kind of method for suppersonic cleaning, is cleaned using above-mentioned ultrasonic cleaning equipment, It the described method comprises the following steps:
Workpiece to be cleaned is placed in rinse bath (1) by step 1;
Step 2 injects cleaning solution to rinse bath (1), until submerging workpiece to be cleaned;
Step 3 opens ultrasonic generator (2) to cleaning solution and applies ultrasound field;
Step 4 makes unrestrained device (3) manufacture liquid level wave with the unlatching of step San Tong method.
In conclusion using above technical scheme, the present invention is at least had the following beneficial effects:
One, dirt accumulation phenomenon is eliminated, high-detergency is mentioned
By manufacturing liquid level wave, the form on cleaning solution surface is changed, becomes uniform plane configuration as wavy curved form State, with the ups and downs of unrestrained wave, the reflection behavior of surface of cleaning solution becomes diffusing reflection, vertical directive liquid level by mirror-reflection Ultrasonic wave no longer reflected back by former road, but as the variation of wave curved surface is scattered to from all directions, thus greatly It is superimposed and generate the probability of standing wave to reduce frequency is identical, contrary two beam ultrasonic waves, the two beams ultrasound occurred once in a while The node that the amplitude that the compact part and part of rarefaction of wave are superimposed and generate is zero, also because wherein a branch of ultrasonic wave is dissipated by liquid level wave It is emitted back towards and, it is indefinite that the space-time position of direction and compact part and part of rarefaction all converts, therefore the node generated once in a while is also in space-time Up conversion is indefinite, cause dirt in cleaning solution can not aggregately stacked, can be scattered in cleaning solution, greatly improve well Ultrasonic cleansing rate.
Two, cleaning speed is improved, scavenging period is shortened, reduces energy consumption
By the irreflexive ultrasonic wave of liquid surface wave wave, only 1/180 is vertically reflected, and is overlapped mutually with the former ultrasonic wave of injection Standing wave is generated, the overwhelming majority is sideling reflected back cleaning solution, cleaning workpiece twice work doing is treated, equivalent to increase one second Ultrasound source just compensates for the deficiency that the workpiece in the first ultrasound source shadow region cannot be cleaned effectively, improves clear Speed is washed, scavenging period is shortened, reduces energy consumption.
Three, improve cleaning uniformity
Ultrasonic cleaning is mainly to utilize the cavitation of ultrasonic wave, and cavitation nucleus is drawn high power growth in negative pressuren zone (part of rarefaction), And be squeezed power in zone of positive pressure (compact part) and be closed, so cavitation nuclear disruption only occurs in a certain time point of zone of positive pressure (compact part) Position, therefore the relative distance of two adjacent vacant nuclear disruptions is approximately equal to the distance of two adjacent compact parts, that is, is equal to ultrasonic wavelength.By In the centre of two adjacent compact parts there are one part of rarefaction, which can become compact part in next cycle and generate collapsing for cavitation nucleus It bursts, so the distance of two adjacent vacant cores of alternation collapse is half wavelength (λ/2).It follows that the time point of cavitation nuclear disruption Position is the integral multiple apart from ultrasound source λ/2, when the position of ultrasound source immobilizes, the space-time position of cavitation nuclear disruption It is to stay to stand motionless (not flowing assuming that homogeneous cleaning solution is static), the strong and weak position of this ultrasonic cleaning power immobilizes just Cleaning force uneven distribution is caused, and this uneven distribution is far apart, with common 28KHZ ultrasonic wave, aqueous clear For washing lotion (C=1450m/s), λ/2=C/2f=1450/2*28000=0.026m=2.6cm.Just because of ultrasonic cleaning power Uneven distribution, and strong and weak position is apart from each other, thus be easy to generate color difference in cleaned workpiece surface, local surfaces are because of cleaning Excessively deteriorate, other local surfaces influence cleanliness because cleaning is insufficient.The present invention manufactures liquid level on cleaning solution surface Wave, peaks and troughs generate upward pulling force and downward pressure to cleaning solution respectively, until making the density of cleaning solution vertical Density alternation occurs on direction, causes ultrasonic propagation velocity C speed alternation, by formula f=C/ λ it is found that frequency f is constant normal Number, speed C alternation cause wavelength X alternation, so that the time point position of cavitation nuclear disruption be made accordingly to generate upper and lower displacement, expand most The sphere of action of strong impact force improves cleaning uniformity.In addition, when more than two workpiece are cleaned simultaneously, from workpiece one The ultrasonic wave reflected back is possible to generate standing wave on two surface of workpiece, forms dirt accumulation, if applying the present invention, Can solve this problem, alternately variation causes the space-time position of ultrasonic wave compact part and part of rarefaction also checker to wavelength X, thus It can not be formed to stay and found motionless node, eliminate standing wave influence, this is multiple for cleaning a large amount of small workpieces or surface shape simultaneously Miscellaneous changeable workpiece is particularly effective.
The invention will be further described combined with specific embodiments below, but not as a limitation of the invention.
Embodiment 1
It blows to cleaning solution surface, manufactures liquid level wave.As shown in Fig. 2, with blower (13) perpendicular to liquid level or with certain angle It dries to liquid level, it is possible to produce the wave as ripples is spread apart round and round outward using central point as the center of circle.
Embodiment 2
Mechanical beating manufactures liquid level wave.As shown in figure 3, regularly being clapped by swing motor (23) connection mechanical arm (25) Beat cleaning liquid level, it is possible to produce the wave as wave, the waves behind drive on those before, pushing ahead by rows.
Embodiment 3
Swinging wave plate, simulation liquid surface wave wave.As shown in figure 4, the method is suitable for manufacturing wave diffusing reflection in cleaning solution side, When ultrasound source is placed on the side wall of rinse bath, wave-shape board (35) (waveform curved slab) can be set on cell wall over there, Connect swing motor (33), make wave-shape board do it is rhythmical swing back and forth, to reach the irreflexive effect of manufacture liquid surface wave wave.
Detailed description of the invention
Fig. 1: described device schematic diagram and Figure of abstract
Fig. 2: 1 schematic diagram of embodiment
Fig. 3: 2 schematic diagram of embodiment
Fig. 4: 3 schematic diagram of embodiment
1, rinse bath, 2, ultrasonic generator, 3, make unrestrained device, 4, cleaning solution, 13, blower, 23, swing motor, 25, mechanical Arm, 33, swing motor, 35, wave-shape board.

Claims (4)

1. improving the method and device of ultrasonic cleansing rate, described device includes: rinse bath (1), ultrasonic generator (2), Make unrestrained device (3);It the described method comprises the following steps: workpiece to be cleaned being immersed in the cleaning solution of rinse bath (1), opened super Sound wave generating device (2) applies ultrasound field to cleaning solution, while opening and making unrestrained device (3) manufacture liquid level wave;Its feature exists In: with unrestrained device (3) manufacture liquid level wave is made, dynamic changes ultrasonic reflections angle and spread speed, decreases or even eliminates and stay Wave.
2. improving the method and device of ultrasonic cleansing rate as described in claim 1, it is characterised in that: described to make unrestrained device packet It includes but is not limited to: blowing to cleaning solution surface, pat liquid level using mechanical arm, stir cleaning solution, mobile wave-shape board with wave pump is made Device and combination etc. various manufacture waves.
3. improving the method and device of ultrasonic cleansing rate as described in claim 1, it is characterised in that: the liquid level is liquid Surface, including but not limited to: upper surface, lower surface, side surface, outer surface, inner surface etc..
4. improving the method and device of ultrasonic cleansing rate as described in claim 1, it is characterised in that: the dynamic changes super Sound wave angle of reflection and spread speed can be individually dynamic and change ultrasonic reflections angle, is also possible to individually dynamic and changes ultrasound Velocity of wave propagation can also be the two combination.
CN201710817378.4A 2017-09-12 2017-09-12 Improve the method and device of ultrasonic cleansing rate Pending CN109482570A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710817378.4A CN109482570A (en) 2017-09-12 2017-09-12 Improve the method and device of ultrasonic cleansing rate

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Application Number Priority Date Filing Date Title
CN201710817378.4A CN109482570A (en) 2017-09-12 2017-09-12 Improve the method and device of ultrasonic cleansing rate

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CN109482570A true CN109482570A (en) 2019-03-19

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110935686A (en) * 2019-11-27 2020-03-31 北京工业大学 Suspension type ultrasonic-low frequency vibration combined cleaning method and device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11179305A (en) * 1997-12-18 1999-07-06 Sony Corp Ultrasonic washing method
JP2003001205A (en) * 2001-06-25 2003-01-07 Honda Electronic Co Ltd Ultrasonic cleaning apparatus
US6619305B1 (en) * 2000-01-11 2003-09-16 Seagate Technology Llc Apparatus for single disc ultrasonic cleaning
CN101384381A (en) * 2006-02-17 2009-03-11 弗劳恩霍弗应用技术研究院 Ultrasound actuator for cleaning objects
CN206334912U (en) * 2016-12-21 2017-07-18 中物功能材料研究院有限公司 A kind of stirring and washing device
CN206474467U (en) * 2017-01-18 2017-09-08 浙江倪氏徽章有限公司 A kind of supersonic wave cleaning machine

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11179305A (en) * 1997-12-18 1999-07-06 Sony Corp Ultrasonic washing method
US6619305B1 (en) * 2000-01-11 2003-09-16 Seagate Technology Llc Apparatus for single disc ultrasonic cleaning
JP2003001205A (en) * 2001-06-25 2003-01-07 Honda Electronic Co Ltd Ultrasonic cleaning apparatus
CN101384381A (en) * 2006-02-17 2009-03-11 弗劳恩霍弗应用技术研究院 Ultrasound actuator for cleaning objects
CN206334912U (en) * 2016-12-21 2017-07-18 中物功能材料研究院有限公司 A kind of stirring and washing device
CN206474467U (en) * 2017-01-18 2017-09-08 浙江倪氏徽章有限公司 A kind of supersonic wave cleaning machine

Non-Patent Citations (1)

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Title
蔡守允等编著: "《水利工程模型试验量测技术》", 31 December 2008, 海洋出版社 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110935686A (en) * 2019-11-27 2020-03-31 北京工业大学 Suspension type ultrasonic-low frequency vibration combined cleaning method and device
CN110935686B (en) * 2019-11-27 2021-03-23 北京工业大学 Suspension type ultrasonic-low frequency vibration combined cleaning method

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