CN109459814A - Lithographic method of light guide plate and preparation method thereof - Google Patents
Lithographic method of light guide plate and preparation method thereof Download PDFInfo
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- CN109459814A CN109459814A CN201910042869.5A CN201910042869A CN109459814A CN 109459814 A CN109459814 A CN 109459814A CN 201910042869 A CN201910042869 A CN 201910042869A CN 109459814 A CN109459814 A CN 109459814A
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- substrate
- light guide
- plastic plate
- circular cone
- guide plate
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0065—Manufacturing aspects; Material aspects
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/004—Scattering dots or dot-like elements, e.g. microbeads, scattering particles, nanoparticles
- G02B6/0043—Scattering dots or dot-like elements, e.g. microbeads, scattering particles, nanoparticles provided on the surface of the light guide
Abstract
The invention belongs to field of display technology, and in particular to a kind of lithographic method of light guide plate and preparation method thereof.The lithographic method includes the following steps: that offer substrate, the substrate are made of unorganic glass；Plastic plate is provided, the plastic plate is provided with multiple circular cone holes across the plastic plate；The plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole is adjacent with the substrate；Etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching processing to the substrate surface.The lithographic method can be easy the defect fallen to avoid printing net-point, and inorganic glass materials are cheap, opposite ink printing environment-friendly, at low cost.
Description
Technical field
The invention belongs to field of display technology, and in particular to a kind of lithographic method of light guide plate and preparation method thereof.
Background technique
In the electronics industry, backlight is a kind of form of illumination, be commonly used for LCD (Liquid Crystal Display,
Liquid crystal display) in display.The backlight display technology of current liquid crystal display such as television set and its similar products, is substantially
Linear light source is converted to using point light source, then area source is converted to by light guide plate, finally through liquid crystal display glass liquid crystal at
As technology, flat display products are formed, to be applied to every field.
The material of light guide plate mainly has PMMA, and (poly (methyl methacrylate), polymethyl methacrylate is referred to as
Or acryl), MS (Styrene-methyl methacrylate copolymer, styrene methyl methacrylate copolymerization
Object) and three kinds of unorganic glass, respectively correspond PMMA light guide plate, MS light guide plate and unorganic glass light guide plate.Currently, above-mentioned three kinds of materials
The maturation method of guide-lighting board finished product made of material has: the printing technology of PMMA material, laser get technology and steel plate hot pressing ready
Technology；The printing technology of MS material, laser get technology and steel plate hot-pressing technique ready；And the printing skill of inorganic glass materials
Art.PMMA and MS material is all the other plastic cement material of optical grade, and hardness is not good enough, and expensive and subsequent in the presence of dirty
Dye, and the ink ink site of printing (such as unorganic glass) that prints is subsequent has the risk to fall off in use, is easy to lead
The different defect of backlight display is caused, so that the display quality for forming product is abnormal.
Therefore, the prior art has much room for improvement.
Summary of the invention
The purpose of the present invention is to provide lithographic methods of a kind of light guide plate and preparation method thereof, it is intended to solve existing leaded light
The site of plate printing is easy to fall off, so as to cause the undesirable technical problem of display effect.
For achieving the above object, The technical solution adopted by the invention is as follows:
One aspect of the present invention provides a kind of lithographic method of light guide plate, includes the following steps:
Substrate is provided, the substrate is made of unorganic glass；
Plastic plate is provided, the plastic plate is provided with multiple circular cone holes across the plastic plate；
The plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole is adjacent with the substrate；
Etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching processing to the substrate surface.
Optionally, multiple circular cone holes are in array distribution on the plastic plate.
Optionally, the step that etching liquid is placed in the circular cone hole includes:
The etching liquid is adsorbed with cavernous body, then the cavernous body is covered on the circular cone hole of the plastic plate,
Pressure processing is carried out to the cavernous body, squeezes into the etching liquid in the circular cone hole.
Optionally, the hardness of the cavernous body is 35-40HB；And/or
The pressure of the pressure processing is 45-55N；And/or
The time of the pressure processing is 1-3s.
Optionally, the etching liquid is selected from hydrofluoric acid solution.
Optionally, the mass percentage of the hydrofluoric acid in the hydrofluoric acid solution is 70-80%；And/or
Contain ammonium fluoride in the hydrofluoric acid solution；And/or
The time that the hydrofluoric acid solution performs etching processing to the substrate surface is 12-18s.
Optionally, the substrate with a thickness of 1-2mm；And/or
The plastic plate with a thickness of 1-2mm.
Optionally, the unorganic glass is selected from quartz glass, vagcor, soda-lime glass, lead silicate glass, aluminium silicon
At least one of silicate glass and borosilicate glass；And/or
The material of the plastic plate be selected from polyethylene, polypropylene, polyvinyl chloride, polystyrene, polyformaldehyde, polycarbonate,
At least one of polyamide, polymethyl methacrylate and acrylonitrile-butadiene-styrene copolymer.
The lithographic method of light guide plate provided by the invention is a kind of using inorganic glass materials as the lithographic method of substrate, the quarter
Etching method utilizes the plastic plate equipped with circular cone hole to be covered on substrate surface, and then etching liquid is packed into circular cone hole, into
And so that etching liquid is flowed to substrate surface from the tip of circular cone hole and perform etching, so that substrate surface is formed etching point, so as to
The dispersion effect of light is adjusted, such lithographic method can be easy the defect fallen, and unorganic glass material to avoid printing net-point
Expect it is cheap, it is opposite ink printing environment-friendly, at low cost.
Another aspect of the present invention provides a kind of preparation method of light guide plate, includes the following steps:
Substrate is provided, the substrate is made of unorganic glass；
Plastic plate is provided, the plastic plate is provided with multiple circular cone holes across the plastic plate；
The plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole is adjacent with the substrate；
Etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching processing to the substrate surface；
Substrate after the etching processing is subjected to tempering processing, obtains light guide plate.
Optionally, using ion-exchange, tempering processing is carried out to by the substrate after the etching processing；And/or
Before the step of substrate after the etching processing is carried out tempering processing, further including will be after the etching processing
Substrate the step of being cleaned.
The preparation method of light guide plate provided by the invention, first with the distinctive lithographic method of the present invention by inorganic glass materials
Substrate perform etching, then by after etching substrate carry out tempering processing, obtain light guide plate；What such preparation method obtained
Light guide plate not only has good hardness, while the defect fallen can be easy to avoid printing net-point, and inorganic glass materials
It is cheap, it is opposite ink printing environment-friendly, at low cost.
Detailed description of the invention
It in order to more clearly explain the technical solutions in the embodiments of the present application, below will be to embodiment or description of the prior art
Needed in attached drawing be briefly described, it should be apparent that, the accompanying drawings in the following description is only some of the application
Embodiment for those of ordinary skill in the art without creative efforts, can also be attached according to these
Figure obtains other attached drawings.
Fig. 1 is the lithographic method flow chart of the light guide plate in one embodiment of the invention；
Fig. 2 is the preparation method flow chart of the light guide plate in one embodiment of the invention；
Fig. 3 is the flow diagram for carrying out light guide plate preparation in one embodiment of the invention on the operational platform.
Specific embodiment
In order to which technical problems, technical solutions and advantageous effects to be solved by the present invention are more clearly understood, below in conjunction with
Embodiment, the present invention will be described in further detail.It should be appreciated that specific embodiment described herein is only used to explain
The present invention is not intended to limit the present invention.
On the one hand, the embodiment of the invention provides a kind of lithographic methods of light guide plate, as shown in Figure 1, the lithographic method packet
Include following steps:
S01: providing substrate, and the substrate is made of unorganic glass；
S02: providing plastic plate, and the plastic plate is provided with multiple circular cone holes across the plastic plate；
S03: the plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole and the substrate
It is adjacent；
S04: etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching place to the substrate surface
Reason.
The lithographic method of light guide plate provided in an embodiment of the present invention is a kind of using inorganic glass materials as the etching side of substrate
Method, the lithographic method utilize the plastic plate equipped with circular cone hole to be covered on substrate surface, etching liquid are then packed into conical bore
In hole, and then so that etching liquid is flowed to substrate surface from the tip of circular cone hole and perform etching, substrate surface is made to form etching point, from
And the dispersion effect of adjustable light, such lithographic method can be easy the defect fallen to avoid printing net-point, and inorganic
Glass material is cheap, opposite ink printing environment-friendly, at low cost.
In above-mentioned steps S01, the material of substrate is inorganic glass materials, has at low cost, the spy of the liquid that can be etched etching
Point.The optional siliceous unorganic glass of unorganic glass, optionally, the unorganic glass are selected from quartz glass, vagcor, sodium calcium
At least one of glass, lead silicate glass, alumina silicate glass and borosilicate glass.Optionally, the thickness of the substrate
Degree is 1-3mm, such as 1mm, 1.5mm, 2mm, 3mm.
In above-mentioned steps S02, the material selection of plastic plate is not etched the plastic material of corrosion, optionally, plastic plate
Material be selected from PE (Polyethylene, polyethylene), PP (Polypropylene, polypropylene), PVC (Polyvinyl
Chloride, polyvinyl chloride), PS (Polystyrene, polystyrene), ABS (Acrylonitrile Butadiene
Styrene copolymers, acrylonitrile-butadiene-styrene copolymer), PMMA (poly (methyl
Methacrylate), polymethyl methacrylate), POM (Paraformaldehyde, polyformaldehyde), PC
At least one of materials such as (Polycarbonate, polycarbonate), PA (Polyamide, polyamide).Optionally, the modeling
Offset plate with a thickness of 1-2mm, such as 1mm, 1.5mm, 2mm.
Above-mentioned plastic plate is provided with multiple circular cone holes across the plastic plate, which can be regarded as plastic plate
On hole in cone, and the rounded one side of multiple circular cone holes is at the same face of plastic plate, the tip of circular cone hole
In the another side of plastic plate, then such etching liquid flows into substrate table from tip out of rounded one side merging circular cone hole
Face and then etching." multiple circular cone holes " can be two or more, particular number according to the points for needing to etch on substrate and
The effect of light modulation is configured, and can be tens, enters 50-90, is also possible to several hundred, such as 500-900, is also possible to
Thousands of etc..In etching, circular cone hole can store a certain amount of etching liquid for being used to corrode unorganic glass substrate, simultaneously
Hot spot can be made sufficiently small, in favor of equally distributed optical effect.
Optionally, multiple circular cone hole is in array distribution, the circular cone hole of such array distribution on the plastic plate
Light can preferably be adjusted to etch to form equally distributed etching site in substrate surface by forming an equally distributed net
Display effect.
Optionally, in above-mentioned steps S04, the step that etching liquid is placed in the circular cone hole includes: to use sponge
Body adsorbs the etching liquid, and then the cavernous body is covered on the circular cone hole of the plastic plate, to the cavernous body into
The processing of row pressure, squeezes into the etching liquid in the circular cone hole.It is adsorbed and is squeezed with cavernous body (such as foam plastics foam)
Etching liquid is filled in circular cone hole, is similar to the effect that official seal is affixed one's seal.
After etching liquid is inhaled into cavernous body, can by etch come effect test, then again to etching liquid
Usage amount suitably adjusted, need to adjust at this time to cavernous body carry out pressure processing amount of pressure and the time.It is a tune
The process of section.Optionally, the hardness of the cavernous body is 35-40HB (Brinell hardness unit).Optionally, the pressure is handled
Pressure is 45-55N (pressure unit)；The time of the pressure processing is 1-3s (second).It, can in above-mentioned pressure and time range
Preferably adjust the amount of etching liquid.
Optionally, in above-mentioned steps S04, the etching liquid is selected from hydrofluoric acid solution.Hydrofluoric acid can be preferably to siliceous
Organic glass perform etching, reaction equation are as follows: Si+4HF=SiF4↑+2H2↑。
For the concentration that hf etching liquid specifically needs, need in use, according to the depth of etching point, reflection
The effect of light is constantly debugged, without fixed value.Optionally, the quality hundred of the hydrofluoric acid in the hydrofluoric acid solution
Dividing content is 70-80%；It is more optional, be with the time that above-mentioned hydrofluoric acid solution performs etching processing to the substrate surface
12-18s.Within the scope of the etch period, etching point can be formed in substrate surface.
Optionally, at least one of ammonium fluoride and nitric acid are contained in the hydrofluoric acid solution.Ammonium fluoride as catalyst,
It can be further catalyzed etching effect, and nitric acid can also reinforce the effect of catalysis as oxidant.The hydrofluoric acid reaction of nitric acid is added
Formula are as follows: 3Si+4HNO3+ 18HF=3H2SiF6+4NO↑+8H2O。
On the other hand, the embodiment of the invention also provides a kind of preparation methods of light guide plate, as shown in Fig. 2, the preparation side
Method includes the following steps:
E01: providing substrate, and the substrate is made of unorganic glass；
E02: providing plastic plate, and the plastic plate is provided with multiple circular cone holes across the plastic plate；
E03: the plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole and the substrate
It is adjacent；
E04: etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching place to the substrate surface
Reason；
E05: the substrate after the etching processing is subjected to tempering processing, obtains light guide plate.
The preparation method of light guide plate provided in an embodiment of the present invention, will first with the distinctive lithographic method of the embodiment of the present invention
The substrate of inorganic glass materials performs etching, and the substrate after etching is then carried out tempering processing, obtains light guide plate；Such system
The light guide plate that Preparation Method obtains not only has good hardness, while the defect fallen can be easy to avoid printing net-point, and
Inorganic glass materials are cheap, opposite ink printing environment-friendly, at low cost.
Specifically, step E01-E04 and the embodiment of the present invention in the preparation method for the light guide plate that inventive embodiments provide
Light guide plate lithographic method in step S01-S04 correspond, therefore, the selection and technique of material in step E01-E04
The selection of parameter is identical as above-mentioned steps S01-S04, and this will not be detailed here.
Optionally, using ion-exchange, tempering processing is carried out to by the substrate after the etching processing.The present invention is implemented
In example, chemical tempering process is used to the tempering processing method of unorganic glass substrate, chemical tempering process refers to be changed by chemical method
Unorganic glass substrate surface component increases surface laminated stress, to increase the mechanical strength of unorganic glass and the steel of thermal stability
Change method.Since it is to make glass strengthening by ion exchange, so also known as ion-exchange, this method are spread according to ion
Mechanism change the surface composition of unorganic glass substrate, unorganic glass substrate is immersed in high-temperature molten salt at a certain temperature
In, the alkali metal ion in alkali metal ion and fused salt in glass is exchanged with each other because of diffusion, " jammed " phenomenon is generated,
Glass surface is set to generate compression stress, to improve the intensity of glass.According to the temperature of the type of exchange ion and ion exchange
The ion-exchange lower than transition point degree and the ion-exchange higher than knee pointy temperature can be divided into again.
It optionally, further include by the quarter before the step of substrate after the etching processing is carried out tempering processing
Erosion treated the step of substrate cleaned.The liquid of cleaning can be diluted using pure water, by the circle on plastic plate
Etching liquid in taper hole hole carries out clean and reuse reuse.
Specifically, the embodiment of the invention provides a kind of methods for carrying out light guide plate preparation on the operational platform, such as Fig. 3 institute
Show, includes the following steps:
1: unorganic glass is fabricated to the substrate of certain thickness flat shape using traditional handicraft.
2: placing a substrate on the operating platform of production line, position, fix.
3: certain thickness plastic plate being lain on substrate, positions, fixes；The plastic plate uses laser to carve in advance
It carves or the good equally distributed site of numerical controlled carving, site needs to punch according to inverted conical shape and (form circular cone hole).
4: using certain density unorganic glass etching solution (ammonium fluoride+hydrofluoric acid), be filled into the inverted conical shape of plastic plate
In site.
5: etching liquid being sucked into cavernous body, the circular cone hole being then uniformly pressed into sponge intracorporal etching solution in plastic plate
Interior, adjustment pressure appropriate provides certain etch period etching.
6: being flow at spray cleaning by assembly line.Unorganic glass substrate and plastic plate are separated；Divide after separation
It is not cleaned by service sink.
7: the substrate for having etched site being subjected to tempering processing, the light guide plate of the unorganic glass of tempering can be obtained.
The present invention successively carried out test of many times, and it is further detailed as reference pair invention progress now to lift A partial experiment result
Thin description, is described in detail combined with specific embodiments below.
In one embodiment
A kind of lithographic method of light guide plate, the lithographic method include the following steps:
Step 1: providing substrate, and the substrate is made of quartz glass；
Step 2: providing plastic plate, and the plastic plate is provided with multiple circular cone holes across the plastic plate, shown modeling
The material of offset plate is selected from PE；
Step 3: the plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole and the base
Plate is adjacent；
Step 4: adsorbing hf etching liquid (containing nitric acid) with cavernous body, is then covered on the cavernous body described
On the circular cone hole of plastic plate, pressure processing is carried out to the cavernous body, the hf etching liquid is made to squeeze into the conical bore
Processing is performed etching to the substrate surface in hole.
In one embodiment
A kind of lithographic method of light guide plate, the lithographic method include the following steps:
Step 1: providing substrate, and the substrate is made of alumina silicate glass；
Step 2: providing plastic plate, and the plastic plate is provided with multiple circular cone holes across the plastic plate, shown modeling
The material of offset plate is selected from PP；
Step 3: the plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole and the base
Plate is adjacent；
Step 4: hf etching liquid (containing ammonium fluoride) is adsorbed with cavernous body, the cavernous body is then covered on institute
It states on the circular cone hole of plastic plate, pressure processing is carried out to the cavernous body, the hf etching liquid is made to squeeze into the circular cone
Processing is performed etching to the substrate surface in hole.
In one embodiment
A kind of preparation method method of light guide plate, the lithographic method include the following steps:
Step 1: providing substrate, and the substrate is made of quartz glass；
Step 2: providing plastic plate, and the plastic plate is provided with multiple circular cone holes across the plastic plate, shown modeling
The material of offset plate is selected from PE；
Step 3: the plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole and the base
Plate is adjacent；
Step 4: adsorbing hf etching liquid (containing nitric acid) with cavernous body, is then covered on the cavernous body described
On the circular cone hole of plastic plate, pressure processing is carried out to the cavernous body, the hf etching liquid is made to squeeze into the conical bore
Processing is performed etching to the substrate surface in hole.
Step 5: plastic plate is separated with substrate, then the substrate after the etching processing is cleaned, is finally used
Ion-exchange carries out tempering processing to by the substrate after the etching processing.
In one embodiment
A kind of lithographic method of light guide plate, the lithographic method include the following steps:
Step 1: providing substrate, and the substrate is made of alumina silicate glass；
Step 2: providing plastic plate, and the plastic plate is provided with multiple circular cone holes across the plastic plate, shown modeling
The material of offset plate is selected from PP；
Step 3: the plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole and the base
Plate is adjacent；
Step 4: hf etching liquid (containing ammonium fluoride) is adsorbed with cavernous body, the cavernous body is then covered on institute
It states on the circular cone hole of plastic plate, pressure processing is carried out to the cavernous body, the hf etching liquid is made to squeeze into the circular cone
Processing is performed etching to the substrate surface in hole.
Step 5: plastic plate is separated with substrate, then the substrate after the etching processing is cleaned, is finally used
Ion-exchange carries out tempering processing to by the substrate after the etching processing.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Made any modifications, equivalent replacements, and improvements etc., should all be included in the protection scope of the present invention within mind and principle.
Claims (10)
1. a kind of lithographic method of light guide plate, which comprises the steps of:
Substrate is provided, the substrate is made of unorganic glass；
Plastic plate is provided, the plastic plate is provided with multiple circular cone holes across the plastic plate；
The plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole is adjacent with the substrate；
Etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching processing to the substrate surface.
2. the lithographic method of light guide plate as described in claim 1, which is characterized in that multiple circular cone holes are in the plastic cement
It is in array distribution on plate.
3. the lithographic method of light guide plate as described in claim 1, which is characterized in that described that etching liquid is placed in the conical bore
Step in hole includes:
The etching liquid is adsorbed with cavernous body, then the cavernous body is covered on the circular cone hole of the plastic plate, to institute
It states cavernous body and carries out pressure processing, squeeze into the etching liquid in the circular cone hole.
4. the lithographic method of light guide plate as claimed in claim 3, which is characterized in that the hardness of the cavernous body is 35-40HB；
And/or
The pressure of the pressure processing is 45-55N；And/or
The time of the pressure processing is 1-3s.
5. the lithographic method of light guide plate as described in claim 1, which is characterized in that the etching liquid is selected from hydrofluoric acid solution.
6. such as the lithographic method for the light guide plate that claim 5 is stated, which is characterized in that the matter of the hydrofluoric acid in the hydrofluoric acid solution
Amount percentage composition is 70-80%；And/or
Contain at least one of ammonium fluoride and nitric acid in the hydrofluoric acid solution；And/or
The time that the hydrofluoric acid solution performs etching processing to the substrate surface is 12-18s.
7. the lithographic method of light guide plate as claimed in any one of claims 1 to 6, which is characterized in that the substrate with a thickness of 1-
3mm；And/or
The plastic plate with a thickness of 1-2mm.
8. the lithographic method of light guide plate as claimed in any one of claims 1 to 6, which is characterized in that the unorganic glass is selected from stone
At least one in English glass, vagcor, soda-lime glass, lead silicate glass, alumina silicate glass and borosilicate glass
Kind；And/or
The material of the plastic plate is selected from polyethylene, polypropylene, polyvinyl chloride, polystyrene, polyformaldehyde, polycarbonate, polyamides
At least one of amine, polymethyl methacrylate and acrylonitrile-butadiene-styrene copolymer.
9. a kind of preparation method of light guide plate, which comprises the steps of:
Substrate is provided, the substrate is made of unorganic glass；
Plastic plate is provided, the plastic plate is provided with multiple circular cone holes across the plastic plate；
The plastic plate is covered on the substrate surface, wherein the tip of the circular cone hole is adjacent with the substrate；
Etching liquid is placed in the circular cone hole, the etching liquid is made to perform etching processing to the substrate surface；
Substrate after the etching processing is subjected to tempering processing, obtains light guide plate.
10. the preparation method of light guide plate as claimed in claim 9, which is characterized in that ion-exchange is used, to by the quarter
Erosion treated substrate carries out tempering processing；And/or
It further include by the base after the etching processing before the step of substrate after the etching processing is carried out tempering processing
The step of plate is cleaned.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110456443A (en) * | 2019-06-25 | 2019-11-15 | 盐城华旭光电技术有限公司 | A kind of backlight source light conducting plate production printing etching all-in-one machine |
| WO2020199015A1 (en) * | 2019-03-29 | 2020-10-08 | 京东方科技集团股份有限公司 | Collimation backlight module and manufacturing method therefor, and display device |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000141379A (en) * | 1998-11-06 | 2000-05-23 | Stanley Electric Co Ltd | Manufacture of mold for light guide plate |
| JP2001232645A (en) * | 2000-02-25 | 2001-08-28 | Starlite Co Ltd | Method for producing mold for molding light guide plate and method for producing light guide plate |
| CN1327161A (en) * | 2000-06-07 | 2001-12-19 | 明碁电脑股份有限公司 | Sand blast process for producing light equalizing pattern of back lighting board |
| CN201654450U (en) * | 2010-04-19 | 2010-11-24 | 潘宇强 | Metal mask applied to SMT |
| CN103707622A (en) * | 2012-09-28 | 2014-04-09 | 乐金显示有限公司 | Light guide plate, and apparatus and method for manufacturing the same |
| CN107207333A (en) * | 2015-01-20 | 2017-09-26 | 旭硝子株式会社 | Chemically reinforced glass and its manufacture method |
| CN108611882A (en) * | 2016-12-12 | 2018-10-02 | 宁波市东盛纺织有限公司 | A kind of figuratum cloth processing method of band |
| CN109143456A (en) * | 2018-11-08 | 2019-01-04 | 惠州安嵘光电产品有限公司 | Light guide plate and preparation method thereof |
-
2019
- 2019-01-17 CN CN201910042869.5A patent/CN109459814A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000141379A (en) * | 1998-11-06 | 2000-05-23 | Stanley Electric Co Ltd | Manufacture of mold for light guide plate |
| JP2001232645A (en) * | 2000-02-25 | 2001-08-28 | Starlite Co Ltd | Method for producing mold for molding light guide plate and method for producing light guide plate |
| CN1327161A (en) * | 2000-06-07 | 2001-12-19 | 明碁电脑股份有限公司 | Sand blast process for producing light equalizing pattern of back lighting board |
| CN201654450U (en) * | 2010-04-19 | 2010-11-24 | 潘宇强 | Metal mask applied to SMT |
| CN103707622A (en) * | 2012-09-28 | 2014-04-09 | 乐金显示有限公司 | Light guide plate, and apparatus and method for manufacturing the same |
| CN107207333A (en) * | 2015-01-20 | 2017-09-26 | 旭硝子株式会社 | Chemically reinforced glass and its manufacture method |
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