CN109449305A - Laminated film, flexible display panels and preparation method thereof - Google Patents
Laminated film, flexible display panels and preparation method thereof Download PDFInfo
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- CN109449305A CN109449305A CN201811011957.0A CN201811011957A CN109449305A CN 109449305 A CN109449305 A CN 109449305A CN 201811011957 A CN201811011957 A CN 201811011957A CN 109449305 A CN109449305 A CN 109449305A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
- H10K77/10—Substrates, e.g. flexible substrates
- H10K77/111—Flexible substrates
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
This application discloses a kind of laminated film, flexible display panels and preparation method thereof, the laminated film includes: organic layer, including the first side being disposed opposite to each other and second side；First inorganic layer, positioned at first side of the organic layer；Second inorganic layer, positioned at described second side of the organic layer；Third inorganic layer is located in the organic layer, and the third inorganic layer is pattern structure.By the above-mentioned means, the application can reduce inorganic layer and organic layer intensity and flexible sex differernce.
Description
Technical field
This application involves field of display technology, more particularly to a kind of laminated film, flexible display panels and its preparation side
Method.
Background technique
Organic electroluminescent LED OLED display panel has self-luminous, contrast is high, thickness is thin, visual angle is wide and reaction
The advantages that speed is fast, increasingly by the high praise of industry, and flexible OLED display panel is one of important trend.
Flexible OLED display panel is for extreme sensitivities such as water, oxygen, to avoid water, oxygen etc. to flexible OLED display surface
The influence of plate generally uses encapsulation technology being packaged flexible OLED display panel；Wherein, more commonly used packaged type
Including laminated film encapsulation technology, for example, it is inorganic to form inorganic layer-organic layer-on the luminescent layer of flexible OLED display panel
Three layers of laminated film of layer are to form encapsulated layer.
Present inventor has found in long-term R&D process, due to inorganic layer and has in above-mentioned three layers of laminated film
There are larger differences for the intensity and flexibility of machine layer, and in flexible OLED display panel bending process, inorganic layer is easily broken,
And then flexible OLED display panel is made to fail.
Summary of the invention
The application mainly solving the technical problems that provide a kind of laminated film, flexible display panels and preparation method thereof,
Can reduce inorganic layer and organic layer intensity and flexible sex differernce.
In order to solve the above technical problems, the technical solution that the application uses is: a kind of laminated film is provided, it is described multiple
Closing film includes: organic layer, including the first side being disposed opposite to each other and second side；First inorganic layer, positioned at the institute of the organic layer
State the first side；Second inorganic layer, positioned at described second side of the organic layer；Third inorganic layer is located in the organic layer, and
The third inorganic layer is pattern structure.
In order to solve the above technical problems, another technical solution that the application uses is: a kind of flexible display panels are provided,
The flexible display panels include: flexbile base；Luminescent layer is located at the flexbile base side；Institute in any of the above-described embodiment
The laminated film stated is located at the luminescent layer far from the flexbile base side, wherein the laminated film is described for encapsulating
Luminescent layer.
In order to solve the above technical problems, another technical solution that the application uses is: providing a kind of flexible display panels
Preparation method, which comprises provide flexbile base；Luminescent layer is formed in the side of the flexbile base；In the hair
Photosphere forms laminated film described in above-described embodiment far from the side of the flexbile base, wherein the laminated film is used
In the encapsulation luminescent layer.
The beneficial effect of the application is: being in contrast to the prior art, laminated film provided herein includes the
The structure of the-the second inorganic layer of one inorganic layer-organic layer, and third inorganic layer is provided in organic layer, and third inorganic layer is figure
Case structure, third inorganic layer are equivalent to the skeleton structure in organic layer after being patterned, can reduce the flexibility of organic layer,
Improve organic layer hardness, and then reconcile laminated film in organic layer and the first inorganic layer, the second inorganic layer mechanical matching, contract
Small organic layer and the first inorganic layer, the second inorganic layer intensity and flexibility between difference, improve the bendability of laminated film
Can, reduce the first inorganic layer, the probability that the second inorganic layer is broken.
Detailed description of the invention
In order to more clearly explain the technical solutions in the embodiments of the present application, make required in being described below to embodiment
Attached drawing is briefly described, it should be apparent that, the drawings in the following description are only some examples of the present application, for
For those of ordinary skill in the art, without creative efforts, it can also be obtained according to these attached drawings other
Attached drawing.Wherein:
Fig. 1 is the structural schematic diagram of one embodiment of the application laminated film；
Fig. 2 is the structural schematic diagram of another embodiment of the application laminated film；
Fig. 3 is the structural schematic diagram of another embodiment of the application laminated film；
Fig. 4 is the overlooking structure diagram of one embodiment of third inorganic layer in Fig. 1 or Fig. 2 or Fig. 3；
Fig. 5 a is the structural schematic diagram of another embodiment of third inorganic layer in Fig. 4 between adjacent hollowed out area；
Fig. 5 b is the structural schematic diagram of the another embodiment of third inorganic layer in Fig. 4 between adjacent hollowed out area；
Fig. 6 is the overlooking structure diagram of another embodiment of third inorganic layer in Fig. 1 or Fig. 2 or Fig. 3；
Fig. 7 is the structural schematic diagram of one embodiment of the application flexible display panels；
Fig. 8 is the flow diagram of one embodiment of preparation method of the application flexible display panels；
Fig. 9 is the flow diagram of mono- embodiment of step S103 in Fig. 8；
Figure 10 is the structural schematic diagram of corresponding one embodiment of flexible display panels of Fig. 9；
Figure 11 is the flow diagram of another embodiment of step S103 in Fig. 8；
Figure 12 is the structural schematic diagram of corresponding one embodiment of flexible display panels of Figure 11；
Figure 13 is the flow diagram of another embodiment of step S103 in Fig. 8；
Figure 14 is the structural schematic diagram of corresponding one embodiment of flexible display panels of Figure 13；
Figure 15 is the structural schematic diagram of one embodiment of the application flexible display.
Specific embodiment
Below in conjunction with the attached drawing in the embodiment of the present application, technical solutions in the embodiments of the present application carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of embodiments of the present application, rather than whole embodiments.Based on this
Embodiment in application, those of ordinary skill in the art are obtained every other under the premise of not making creative labor
Embodiment shall fall in the protection scope of this application.
Referring to Fig. 1, Fig. 1 is the structural schematic diagram of one embodiment of the application laminated film, which includes:
Organic layer 10, including the first side 100 being disposed opposite to each other and second side 102；In the present embodiment, the material of organic layer 10
Matter is acrylic acid series (for example, polymethyl methacrylate etc.), organic silicon-type (for example, poly- methyl list phenylethylene radical siloxane
Deng), at least one of epoxy (for example, epoxy resin etc.) organic material, in other embodiments, the material of organic layer 10
It can also be other, for example, polyimides etc., the application is not construed as limiting this.
First inorganic layer 12, positioned at the first side 100 of organic layer 10；In the present embodiment, the material of the first inorganic layer 12
For at least one of nonmetal oxide or metal oxide, nonmetal oxide is silicon nitride, in silica, silicon oxynitride
At least one；Metal oxide is at least one of aluminium oxide, zirconium oxide, titanium oxide.In other embodiments, the first nothing
The material of machine layer 12 can also be other, and the application is not construed as limiting this.
Second inorganic layer 14, positioned at second side 102 of organic layer 10；In the present embodiment, the material of the second inorganic layer 14
For at least one of nonmetal oxide or metal oxide, nonmetal oxide is silicon nitride, in silica, silicon oxynitride
At least one；Metal oxide is at least one of aluminium oxide, zirconium oxide, titanium oxide.In other embodiments, the second nothing
The material of machine layer 14 can also be other, and the application is not construed as limiting this.In addition, in the present embodiment, the first inorganic layer 12 and
The material of two inorganic layers 14 may be the same or different.
Third inorganic layer 16 is located in organic layer 10, and third inorganic layer 16 is pattern structure；In the present embodiment,
The material of third inorganic layer 16 is at least one of nonmetal oxide or metal oxide, and nonmetal oxide is nitridation
At least one of silicon, silica, silicon oxynitride；Metal oxide is at least one of aluminium oxide, zirconium oxide, titanium oxide.
In other embodiments, the material of third inorganic layer 16 can also be other, and the application is not construed as limiting this.In the present embodiment,
The mode that third inorganic layer 16 is patterned can be the photoetching process of intermediate tone mask technique or routine.
To sum up, laminated film 1 provided herein includes first inorganic layer 12- organic layer the second inorganic layer of 10-
14 structure, and third inorganic layer 16 is provided in organic layer 10, third inorganic layer 16 is pattern structure, third inorganic layer 16
The skeleton structure being equivalent in organic layer 10 after being patterned can reduce the flexibility of organic layer 10, improve organic layer 10
Hardness, and then reconcile the mechanical matching of organic layer 10 and the first inorganic layer 12, the second inorganic layer 14 in laminated film 1, diminution has
Machine layer 10 and the first inorganic layer 12, the second inorganic layer 14 intensity and flexibility between difference, improve the bending of laminated film 1
Performance reduces the first inorganic layer 12, the probability that the second inorganic layer 14 is broken.
In one embodiment, please continue to refer to Fig. 1, third inorganic layer 16 is located in organic layer 10 and is had in Fig. 1
Machine layer 16 is fully wrapped around, and the material of third inorganic layer 16 can phase with the material of the first inorganic layer 12 or the second inorganic layer 14 at this time
It is same or different.
In another embodiment, as shown in Fig. 2, third inorganic layer 16a to may be alternatively located at organic layer 10a and first inorganic
Between layer 12a, in the present embodiment, the material of third inorganic layer 16a can be identical as the material of the first inorganic layer 12a, so that
Binding force enhancing between the organic layer 10a and the first inorganic layer 12a on the both sides third inorganic layer 16a.Certainly, in other realities
It applies in example, the material of third inorganic layer 16a can also be different from the material of the first inorganic layer 12a.
In another embodiment, as shown in figure 3, third inorganic layer 16b to may be alternatively located at organic layer 10b and second inorganic
Between layer 14b, in the present embodiment, the material of third inorganic layer 16b can be identical as the material of the second inorganic layer 14b, so that
Binding force enhancing between the organic layer 10b and the second inorganic layer 14b on the both sides third inorganic layer 16b.Certainly, in other realities
It applies in example, the material of third inorganic layer 16b can also be different from the material of the second inorganic layer 14b.
In another embodiment, referring to Fig. 4, Fig. 4 is one embodiment of third inorganic layer in Fig. 1 or Fig. 2 or Fig. 3
Overlooking structure diagram.Third inorganic layer 16 (or 16a or 16b) is netted pattern structure, has hollowed out area 160；?
In laminated film 1 shown in Fig. 1, third inorganic layer 16 is fully wrapped around by organic layer 10；Laminated film 1a shown in Fig. 2
In, third inorganic layer 16a is embedded in organic layer 10a adjacent to mono- side surface the first inorganic layer 12a, i.e. organic layer 10a extends into third
The hollowed out area inorganic layer 16a 160；In laminated film 1b shown in Fig. 3, third inorganic layer 16b is embedded in organic layer 10b adjacent to the
Mono- side surface two inorganic layer 14b, i.e. organic layer 10b extend into the hollowed out area 160 of third inorganic layer 16b.
In an application scenarios, as shown in figure 4, the shape of above-mentioned hollowed out area 160 is diamond shape, in other application scenarios
In, the shape of hollowed out area 160 can also be other polygons, for example, rectangle, hexagon etc.；Certainly, hollowed out area 160
Shape can also be curl shape, at least one side of curl shape is arc, for example, the shape of hollowed out area 160 is round, oval
Shape, sector etc..
In another application scenarios, the size of above-mentioned hollowed out area 160 is the bending performance as required by specific product
It determines, the factors such as specific product (for example, flexible cover plate, flexible display panels etc.) can be taken into consideration, pass through Mechanics Simulation
It is provided after design.For example, the hollowed out area 160 of polygon has the first diagonal L 1 and the second diagonal line please continue to refer to Fig. 4
L2, and the first diagonal L 1 and the second diagonal L 2 are orthogonal, wherein the length of the first diagonal L 1 is more than or equal to second pair
The length of linea angulata L2, the first diagonal L 1 are directlyed proportional to the ratio of the second diagonal L 2 to the length-width ratio of flexible display panels, i.e.,
The length-width ratio of flexible display panels is bigger, and the ratio of above-mentioned first diagonal L 1 and the second diagonal L 2 is also bigger.In certain feelings
Under condition, the hollowed out area of polygon may not have mutually perpendicular first diagonal line and the second diagonal line, for example, hollowed out area
For rectangle, the length-width ratio of hollowed out area can be designed directly proportional to the length-width ratio of flexible display panels at this time.In addition, when engraving
When empty region is curl shape, such as when ellipse, hollowed out area includes mutually perpendicular long axis and short axle, the ratio of long axis and short axle
Value is designed directly proportional to the length-width ratio of flexible display panels.
In another application scenarios, please continue to refer to Fig. 4, to further reduce organic layer 10 (or 10a, 10b) and the
Intensity and flexible difference between one inorganic layer 12 (or 12a, 12b), the second inorganic layer 14 (or 14a, 14b), can also be
Third inorganic layer 16 (or 16a, 16b) is provided with perforative hole 162, organic layer 16 in vertical direction and also extends into hole 162
In.The section of hole 162 can be round, oval, rectangular etc.；The size set-up mode of hole 162 is referred to above-mentioned engrave
The mode that empty region 160 is arranged, details are not described herein.In the present embodiment, vertical direction is defined as perpendicular to organic layer 10
The direction on the surface of the first side 100.In the present embodiment, multiple holes 162 are uniform on third inorganic layer 16 (or 16a, 16b)
Setting, for example, the interval between multiple holes 162 is equal.Certainly, in other embodiments, multiple holes 162 can also be in third
Non-homogeneous setting on inorganic layer 16 (or 16a, 16b), for example, multiple holes 162 are greater than non-bending in bending region density of setting
Region.
Third inorganic layer part please continue to refer to Fig. 4, as shown in dotted line frame in Fig. 4, between adjacent hollowed out area 162
It is placed with a column hole 162 in the direction of the width.Certainly, in other embodiments, as shown in figure 5, Fig. 5 a is adjacent in Fig. 4 engraves
The structural schematic diagram of another embodiment of third inorganic layer between empty region, Fig. 5 b is between adjacent hollowed out area in Fig. 4
The structural schematic diagram of the another embodiment of third inorganic layer.Third inorganic layer part between adjacent hollowed out area 162 is in width
At least two column (for example, two column, three column, four column etc.) hole is placed on degree direction.Above-mentioned at least two column holes are in its width side
(as shown in Figure 5 a) can be set with side by side parallel upwards, i.e., in the direction of the width, adjacent holes are in the same horizontal line；Certainly,
Above-mentioned at least two column holes can also shift to install (as shown in Figure 5 b), i.e., in the direction of the width, adjacent holes in the width direction
Hole is not in the same horizontal line.
It In yet another embodiment, can also be netted other outer shapes after the inorganic pattern layers of third in above-described embodiment
Shape, for example, chain (as shown in Figure 6) etc., the application is not construed as limiting this, may also set up on the third inorganic layer of chain similar upper
State the hole in embodiment.
Laminated film provided herein can be used for the fields such as flexible cover plate, flexible display panels encapsulated layer.Below
It is used for the encapsulated layer of flexible display panels with laminated film, laminated film is described further.Referring to Fig. 7, Fig. 7 is this Shen
Please one embodiment of flexible display panels structural schematic diagram, which includes:
Flexbile base 20；Specifically, which can be the materials such as polyimides and is formed.
Luminescent layer 22 is located at 20 side of flexbile base；Specifically, which includes the picture formed in each pixel
Plain circuit and Organic Light Emitting Diode OLED.
Laminated film 1 in any of the above-described embodiment is located at luminescent layer 22 far from 20 side of flexbile base；Specifically, multiple
For details, reference can be made to above-described embodiments for the structure of conjunction film 1, and details are not described herein, wherein the laminated film 1 is used for encapsulating light emitting layer
22。
Referring to Fig. 8, Fig. 8 is the flow diagram of one embodiment of preparation method of the application flexible display panels；It should
Method includes:
S101: flexbile base is provided；
S102: luminescent layer is formed in the side of flexbile base；Specifically, which can be used any in the prior art
Mode realizes that this will not be detailed here.
S103: laminated film is formed far from the side of flexbile base in luminescent layer, wherein the laminated film is for encapsulating hair
Photosphere；Specifically, in the present embodiment, the first side second, opposite, side of organic layer is close or far from luminescent layer, the application couple
This is not construed as limiting.
In an application scenarios, third inorganic layer is netted pattern structure, has hollowed out area, third inorganic layer
Organic layer is embedded in adjacent to one side surface of the first inorganic layer, please refers to Fig. 9 and Figure 10, Fig. 9 is mono- embodiment of step S103 in Fig. 8
Flow diagram, Figure 10 be corresponding one embodiment of flexible display panels of Fig. 9 structural schematic diagram, above-mentioned steps S103 tool
Body includes:
S201: primary inorganic layer 3 is formed far from the side of flexbile base 20 in luminescent layer 22；
S202: primary inorganic layer 3 is patterned far from the side of luminescent layer 22, wherein schemed primary inorganic layer 3
The part of case is defined as third inorganic layer 32, and the part that primary inorganic layer 3 is not patterned is defined as the first inorganic layer 30；
In the present embodiment, intermediate tone mask or photoetching process can be used to pattern above-mentioned primary inorganic layer 3.
S203: organic layer 34 is formed far from the side of luminescent layer 22 in third inorganic layer 32；In the present embodiment, at least portion
Organic layer 34 is divided to be packed into the low-lying place in third inorganic layer 32, low-lying place, that is, third inorganic layer 32 hollowed out area.
S204: the second inorganic layer 36 is formed far from 22 side of luminescent layer in organic layer 34.
Certainly, the third inorganic layer 32 in above-described embodiment also may be separately formed, i.e. above-mentioned steps S201-S202 can be with
It is: forms the first inorganic layer far from the side of flexible base board in luminescent layer；It is formed in the first inorganic layer far from the side of luminescent layer
Patterned third inorganic layer.
In another application scenarios, third inorganic layer is netted pattern structure, has hollowed out area, and third is inorganic
Layer insertion organic layer please refers to Figure 11 and Figure 12 adjacent to one side surface of the second inorganic layer, and Figure 11 is another reality of step S103 in Fig. 8
The flow diagram of mode is applied, Figure 12 is the structural schematic diagram of corresponding one embodiment of flexible display panels of Figure 11, above-mentioned step
Rapid S103 is specifically included:
S301: the first inorganic layer 40 is formed far from the side of flexbile base 20 in luminescent layer 22.
S302: organic layer 42 is formed far from the side of luminescent layer 22 in the first inorganic layer 40.
S303: organic layer 42 is patterned far from 22 side of luminescent layer；Specifically, can be used intermediate tone mask or
Photoetching process patterns organic layer 42.
S304: primary inorganic layer 44 is formed far from 22 side of luminescent layer in organic layer 42, wherein prolong primary inorganic layer 44
The low-lying place part protruded into organic layer 42 is defined as third inorganic layer 46, and right with the organic layer 42 of 46 same layer of third inorganic layer
The region answered is the hollowed out area of third inorganic layer 46.The part that primary inorganic layer 44 does not extend into organic layer 42 is defined as
Second inorganic layer 48.
Certainly, the third inorganic layer 46 in above-described embodiment also may be separately formed, i.e. above-mentioned steps S303-S304 can be with
It is: forms patterned third inorganic layer far from the side of flexible base board in luminescent layer；In third inorganic layer far from luminescent layer
Side forms the second inorganic layer.
In another application scenarios, third inorganic layer is netted pattern structure, has hollowed out area, and third is inorganic
Layer is located at fully wrapped around by organic layer in organic layer, and organic layer includes the first sub- organic layer and the positioned at third inorganic layer two sides
Two sub- organic layers；Figure 13 and Figure 14 are please referred to, Figure 13 is the flow diagram of another embodiment of step S103 in Fig. 8, Figure 14
For the structural schematic diagram of corresponding one embodiment of flexible display panels of Figure 13, above-mentioned steps S103 is specifically included:
S401: the first inorganic layer 50 is formed far from the side of flexbile base 20 in luminescent layer 22；
S402: the first sub- organic layer 52 is formed far from the side of luminescent layer 22 in the first inorganic layer 50；
S403: third inorganic layer 54 is formed far from 22 side of luminescent layer in the first sub- organic layer 52, and to third inorganic layer
54 are patterned；
S404: the second sub- organic layer 56 is formed far from 22 side of luminescent layer in third inorganic layer 54；Wherein, the first son is organic
Layer is 52 same or different with the material of the second sub- organic layer 56, and to be packed into third inorganic for at least partly second sub- organic layer 56
Low-lying place in layer 54.Low-lying place, that is, third inorganic layer 54 hollowed out area.
S405: the second inorganic layer 58 is formed far from 22 side of luminescent layer in the second sub- organic layer 56.
Certainly, the third inorganic layer 54 in above-described embodiment can also be used other modes and be formed, i.e. above-mentioned steps S403-
S404, which may also is that, patterns the first sub- organic layer far from luminescent layer side, in the patterned first sub- organic layer
Deposition forms third inorganic layer in groove；The second sub- organic layer is formed far from the side of luminescent layer in third inorganic layer.
Figure 15 is please referred to, Figure 15 is the structural schematic diagram of one embodiment of the application flexible display, the flexible display 3
It can be flexible OLED display, such as displayer, which includes driving circuit 60 and any of the above-described reality
Apply the flexible display panels 2 in example, wherein driving circuit 60 is used to provide driving voltage to flexible display panels 2.In addition,
In the present embodiment, which further includes flexible cover plate corresponding with above-mentioned flexible display panels 2, wherein flexible cover plate
On may also set up laminated film in any of the above-described embodiment.
The foregoing is merely presently filed embodiments, are not intended to limit the scope of the patents of the application, all to utilize this
Equivalent structure or equivalent flow shift made by application specification and accompanying drawing content, it is relevant to be applied directly or indirectly in other
Technical field similarly includes in the scope of patent protection of the application.
Claims (10)
1. a kind of laminated film, which is characterized in that the laminated film includes:
Organic layer, including the first side being disposed opposite to each other and second side；
First inorganic layer, positioned at first side of the organic layer；
Second inorganic layer, positioned at described second side of the organic layer；
Third inorganic layer is located in the organic layer, and the third inorganic layer is pattern structure.
2. laminated film according to claim 1, which is characterized in that
The third inorganic layer is netted pattern structure, has hollowed out area, and the third inorganic layer insertion is described organic
Neighbouring first inorganic layer, one side surface of layer, alternatively, the organic layer is embedded in adjacent to one side surface of the second inorganic layer, or
Person is located at fully wrapped around by the organic layer in the organic layer.
3. laminated film according to claim 2, which is characterized in that the shape of the hollowed out area is polygon, described
Polygon has the first diagonal line and the second diagonal line, and first diagonal line and second diagonal line are orthogonal, wherein
First cornerwise length is more than or equal to described second cornerwise length, and first diagonal line is diagonal with described second
The ratio of line is directly proportional to the length-width ratio of the flexible display panels.
4. laminated film according to claim 2, which is characterized in that
The shape of the hollowed out area is curl shape, and at least one side of the curl shape is arc.
5. laminated film according to claim 2, which is characterized in that the third between the adjacent hollowed out area
Inorganic layer part is placed with an at least column hole in the direction of the width.
6. laminated film according to claim 1, which is characterized in that
The third inorganic layer is identical as the first inorganic layer material；Alternatively, the third inorganic layer and described second inorganic
Layer material is identical.
7. laminated film according to claim 1, which is characterized in that first inorganic layer, second inorganic layer, institute
The material for stating third inorganic layer is at least one of nonmetal oxide or metal oxide, and the nonmetal oxide is nitrogen
At least one of SiClx, silica, silicon oxynitride；The metal oxide be aluminium oxide, zirconium oxide, in titanium oxide at least
It is a kind of；
And/or the material of the organic layer is at least one of acrylic acid series, organic silicon-type, epoxy organic material.
8. a kind of flexible display panels, which is characterized in that the flexible display panels include:
Flexbile base；
Luminescent layer is located at the flexbile base side；
The described in any item laminated films of claim 1-7 are located at the luminescent layer far from the flexbile base side, wherein
The laminated film is for encapsulating the luminescent layer.
9. a kind of preparation method of flexible display panels, which is characterized in that the described method includes:
Flexbile base is provided；
Luminescent layer is formed in the side of the flexbile base；
Laminated film described in claim 1 is formed far from the side of the flexbile base in the luminescent layer, wherein described multiple
Film is closed for encapsulating the luminescent layer.
10. preparation method according to claim 9, which is characterized in that it is described in the luminescent layer far from the flexible base
The side of layer forms the laminated film
Primary inorganic layer is formed far from the side of the flexbile base in the luminescent layer；
The primary inorganic layer is patterned far from the side of the luminescent layer, wherein schemed the primary inorganic layer
The part of case is defined as third inorganic layer, and the part that the primary inorganic layer is not patterned is defined as the first inorganic layer；
The organic layer is formed far from the side of the luminescent layer in the third inorganic layer, wherein at least partly described organic
Layer is packed into the low-lying place in the third inorganic layer；
Second inorganic layer is formed far from the luminescent layer side in the organic layer；
Wherein, described that the primary inorganic layer is patterned far from the side of the luminescent layer, comprising: to be covered using halftoning
Film or photoetching process pattern the primary inorganic layer far from the side of the luminescent layer；
Alternatively, described the laminated film is formed far from the side of the flexbile base in the luminescent layer include:
The first inorganic layer is formed far from the side of the flexbile base in the luminescent layer；
The organic layer is formed far from the side of the luminescent layer in first inorganic layer；
The organic layer is patterned far from the luminescent layer side；
Primary inorganic layer is formed far from the luminescent layer side in the organic layer, wherein extends into the primary inorganic layer
Low-lying place part in the organic layer is defined as third inorganic layer, and the primary inorganic layer is not extended into the organic layer
Part be defined as the second inorganic layer；
Alternatively, described the laminated film is formed far from the side of the flexbile base in the luminescent layer include:
The first inorganic layer is formed far from the side of the flexbile base in the luminescent layer；
The first sub- organic layer is formed far from the side of the luminescent layer in first inorganic layer；
The third inorganic layer is formed far from the luminescent layer side in the described first sub- organic layer, and to the third inorganic layer
It is patterned；
The described second sub- organic layer is formed far from the luminescent layer side in the third inorganic layer, at least partly described second son
Organic layer is packed into the low-lying place in the third inorganic layer；
The second inorganic layer is formed far from the luminescent layer side in the described second sub- organic layer.
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Application publication date: 20190308 Assignee: Bazhou Yungu Electronic Technology Co., Ltd.|Kunshan Institute of technology new flat panel display technology center Co., Ltd.|Kunshan Guoxian photoelectric Co., Ltd Assignor: The valley (Guan) Technology Co. Ltd. Contract record no.: X2019990000155 Denomination of invention: Composite thin film, flexible display panel and fabrication method of flexible display panel License type: Common License Record date: 20191030 |
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