CN109449103B - Full-automatic amorphous manufacture procedure wax removing system - Google Patents

Full-automatic amorphous manufacture procedure wax removing system Download PDF

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Publication number
CN109449103B
CN109449103B CN201811336133.0A CN201811336133A CN109449103B CN 109449103 B CN109449103 B CN 109449103B CN 201811336133 A CN201811336133 A CN 201811336133A CN 109449103 B CN109449103 B CN 109449103B
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Prior art keywords
wax
heating
processing unit
liquid
dropping
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CN201811336133.0A
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CN109449103A (en
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肖迪
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Jiangsu Lilong Semiconductor Technology Co ltd
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Jiangsu Lilong Semiconductor Technology Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Devices For Use In Laboratory Experiments (AREA)

Abstract

The invention relates to a wax discharging system, which comprises: a processing unit, a heating device and a liquid feeding device; the heating device is provided with a plurality of heating grooves, and the heating grooves are suitable for placing ceramic discs with wax-bonded non-wafers; the processing unit is suitable for controlling the heating device to heat the heating groove, and controlling the liquid feeding device to spray wax dropping liquid to the surface of the amorphous sheet so as to enable the amorphous sheet to fall off the ceramic disc; the wax-dropping device realizes the function of automatically controlling the dropping of wax, overcomes the problems that the traditional wax-sticking amorphous sheet needs to be manually carried and manually torn off, saves manpower and material resources and improves the wax-dropping efficiency.

Description

Full-automatic amorphous manufacture procedure wax removing system
Technical Field
The invention relates to the field of amorphous manufacturing, in particular to a wax dropping system.
Background
The traditional wax removal method adopts a soaking hot water solvent, and has the disadvantages of long time, low efficiency, high cost and serious pollution.
Therefore, it is desirable to develop a wax dropping system to solve the above problems.
Disclosure of Invention
The invention aims to provide a full-automatic wax feeding system for an amorphous process.
In order to solve the above technical problem, the present invention provides a wax removing system, which includes: a processing unit, a heating device and a liquid feeding device; the heating device is provided with a plurality of heating grooves, and the heating grooves are suitable for placing ceramic discs with wax-bonded non-wafers; and the processing unit is suitable for controlling the heating device to heat the heating groove and controlling the liquid feeding device to spray wax dropping liquid to the surface of the amorphous sheet so as to enable the amorphous sheet to fall off the ceramic disc.
Further, the wax dropping system comprises: the temperature sensor is electrically connected with the processing unit; the temperature sensor is suitable for collecting the temperature in the heating tank, a temperature threshold value is preset in the processing unit, and when the temperature exceeds the temperature threshold value, the processing unit controls the heating device to stop heating.
Further, the liquid feeding device comprises: the water pump is electrically connected with the processing unit, the liquid storage bin and the nozzles are arranged beside the heating grooves; the liquid storage bin is suitable for storing wax liquid, the liquid storage bin is connected with the nozzles through guide pipes, and the processing unit is suitable for controlling the water pump to pump the wax liquid in the liquid storage bin and spray the wax liquid into the corresponding heating groove through the nozzles.
Further, the wax dropping system comprises: a vacuum adsorption tray disposed in the heating tank; the vacuum adsorption disc is suitable for adsorbing the ceramic disc in the heating groove.
Further, the wax dropping system comprises: a scanning device; the scanning device is suitable for collecting the serial number of the ceramic disc for placing the wax-pasted non-wafer, the serial number of the corresponding heating groove for placing the ceramic disc and the damage information before and after wax dropping of the non-wafer, and sending the damage information to the processing unit.
Further, wax system still includes down: a cooling device; the cooling device is suitable for cooling the ceramic disc after wax is discharged.
Further, the cooling device is suitable for adopting a heat radiation fan.
Furthermore, the bottom of the heating groove is provided with a through hole so as to enable the liquid to flow out.
The wax-removing device has the beneficial effects that the wax-removing device realizes the function of automatically controlling wax removal, overcomes the traditional problem that the wax-attached amorphous sheet needs to be manually carried and manually removed, saves manpower and material resources, and improves the wax-removing efficiency.
Drawings
The invention is further illustrated with reference to the following figures and examples.
FIG. 1 is a functional block diagram of a wax dispensing system according to the present invention;
FIG. 2 is a block diagram of a wax removal system according to the present invention.
In the figure: a heating device 1, a heating groove 101, a vacuum adsorption disc 102 and a through hole 103;
liquid feeding device 2, water pump 201, liquid storage bin 202 and nozzle 203.
Detailed Description
The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic views illustrating only the basic structure of the present invention in a schematic manner, and thus show only the constitution related to the present invention.
Example 1
FIG. 1 is a functional block diagram of a wax dispensing system according to the present invention;
FIG. 2 is a block diagram of a wax removal system according to the present invention.
In this embodiment, as shown in fig. 1 and 2, the present embodiment provides a wax dropping system for a full-automatic amorphous process, which includes: a processing unit, a heating device 1, and a liquid feeding device 2; the heating device 1 is provided with a plurality of heating grooves 101, and the heating grooves 101 are suitable for placing ceramic discs with wax-bonded non-wafers; and the processing unit is suitable for controlling the heating device 1 to heat the interior of the heating groove 101, and controlling the liquid feeding device 2 to spray wax dropping liquid to the surface of the amorphous piece so as to enable the amorphous piece to fall off from the ceramic disc.
In the embodiment, the wax feeding device realizes the function of automatically controlling wax feeding, overcomes the problems that the wax-coated amorphous sheet needs to be manually carried and manually torn off in the prior art, saves manpower and material resources, and improves the wax feeding efficiency.
For controlling heating, the wax removal system comprises: the temperature sensor is electrically connected with the processing unit; the temperature sensor is suitable for collecting the temperature in the heating tank 101, the processing unit is preset with a temperature threshold, and when the temperature exceeds the temperature threshold, the processing unit controls the heating device 1 to stop heating.
In this embodiment, the processing unit may be, but is not limited to, an STM32 single chip microcomputer.
In order to spray the wax liquid into the heating tank 101, the liquid feeding device 2 includes: a water pump 201 electrically connected with the processing unit, a liquid storage bin 202 and nozzles 203 arranged beside each heating groove 101; the liquid storage bin 202 is suitable for storing wax liquid, the liquid storage bin 202 is connected with the nozzles 203 through guide pipes, and the processing unit is suitable for controlling the water pump 201 to pump the wax liquid in the liquid storage bin 202 and spray the wax liquid into the corresponding heating groove 101 through the nozzles 203.
In the present embodiment, as shown in fig. 2, the connection between the nozzle 203 and the internal pipe of the water pump 201 is omitted for the sake of convenience of the overall structure.
In order to adsorb the ceramic disks in the heating bath 101, the wax dropping system includes: a vacuum adsorption tray 102 disposed in the heating bath 101; the vacuum adsorption tray 102 is adapted to adsorb a ceramic tray in the heating bath 101.
In order to facilitate statistical management, the wax dropping system comprises: a scanning device; the scanning device is suitable for collecting the serial number of the ceramic disc for placing the wax-pasted non-wafer, the serial number of the heating groove 101 for correspondingly placing the ceramic disc, and damage information before and after wax dropping of the non-wafer, and sending the damage information to the processing unit.
In order to cool the ceramic disks, the wax dropping system further includes: a cooling device; the cooling device is suitable for cooling the ceramic disc after wax is discharged.
In particular, the cooling device is suitable for adopting a cooling fan.
In this example, the ceramic disk after wax removal was removed with a heat insulating glove and then cooled in a cooling device.
In order to maintain the liquid level in the heating tank 101, a through hole 103 is opened at the bottom of the heating tank 101 to allow the liquid to flow out.
This embodiment still provides a working process of wax system down, and it includes: heating the ceramic tray with the wax-bonded non-wafer; and spraying wax dropping liquid to the surface of the amorphous sheet.
Further, the wax dropping system comprises: a processing unit, a heating device 1, and a liquid feeding device 2; the heating device 1 is provided with a plurality of heating grooves 101, and the heating grooves 101 are suitable for placing ceramic discs with wax-bonded non-wafers; and the processing unit is suitable for controlling the heating device 1 to heat the interior of the heating groove 101, and controlling the liquid feeding device 2 to spray wax dropping liquid to the surface of the amorphous piece so as to enable the amorphous piece to fall off from the ceramic disc.
In conclusion, the automatic wax feeding control device has the advantages that the automatic wax feeding control function is realized, the traditional problem that the wax-coated amorphous sheet needs to be manually carried and manually torn off is solved, the manpower and material resources are saved, and the wax feeding efficiency is improved; the temperature in the heating tank is collected in real time, the temperature is controlled within a certain range, the wax feeding effect is guaranteed, and the electric quantity is saved; the ceramic disc and the heating groove are managed by collecting the serial number of the ceramic disc for placing the wax-pasted non-wafer, the serial number of the heating groove for correspondingly placing the ceramic disc and the damage information before and after the non-wafer is waxed, so that the information of each link is analyzed; the ceramic disc is cooled after wax is removed, so that the time is saved; by the wax feeding system, pollution caused by long-time soaking of the amorphous sheet in the solution is avoided.
In light of the foregoing description of the preferred embodiment of the present invention, many modifications and variations will be apparent to those skilled in the art without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.

Claims (4)

1. A wax dispensing system, comprising:
a processing unit, a heating device and a liquid feeding device; wherein
The heating device is provided with a plurality of heating grooves, and the heating grooves are suitable for placing ceramic discs with wax-bonded non-wafers; and
the processing unit is suitable for controlling the heating device to heat the heating groove, and controlling the liquid feeding device to spray wax dropping liquid to the surface of the amorphous sheet so as to enable the amorphous sheet to fall off the ceramic disc; the bottom of the heating groove is provided with a through hole so as to enable liquid to flow out;
the wax removal system comprises: a vacuum adsorption tray disposed in the heating tank;
the vacuum adsorption disc is suitable for adsorbing the ceramic disc in the heating groove;
the liquid feeding device comprises: the water pump is electrically connected with the processing unit, the liquid storage bin and the nozzles are arranged beside the heating grooves;
the liquid storage bin is suitable for storing wax removing liquid, the liquid storage bin is connected with each nozzle through a guide pipe, and the processing unit is suitable for controlling the water pump to pump the wax removing liquid in the liquid storage bin and spray the wax removing liquid into the corresponding heating groove through each nozzle;
the wax removal system comprises: a scanning device;
the scanning device is suitable for collecting the serial number of the ceramic disc for placing the wax-pasted non-wafer, the serial number of the corresponding heating groove for placing the ceramic disc and the damage information before and after wax dropping of the non-wafer, and sending the damage information to the processing unit.
2. The wax removal system of claim 1,
the wax removal system comprises: the temperature sensor is electrically connected with the processing unit;
the temperature sensor is suitable for collecting the temperature in the heating tank, a temperature threshold value is preset in the processing unit, and when the temperature exceeds the temperature threshold value, the processing unit controls the heating device to stop heating.
3. The wax removal system of claim 1,
the wax system also includes: a cooling device;
the cooling device is suitable for cooling the ceramic disc after wax is discharged.
4. The wax removal system of claim 3,
the cooling device is suitable for adopting a heat radiation fan.
CN201811336133.0A 2018-11-12 2018-11-12 Full-automatic amorphous manufacture procedure wax removing system Active CN109449103B (en)

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Application Number Priority Date Filing Date Title
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CN109449103B true CN109449103B (en) 2021-01-05

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109216246A (en) * 2018-11-13 2019-01-15 江苏利泷半导体科技有限公司 The working method of wax system under full-automatic amorphous processing procedure
CN116351644B (en) * 2023-03-17 2023-10-20 江苏晶工半导体设备有限公司 Semiconductor wafer waxing machine

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN204052290U (en) * 2014-08-22 2014-12-31 衢州飞瑞特种陶瓷有限公司 A kind of unified piece paraffin removal rinsing table
CN204159598U (en) * 2014-10-15 2015-02-18 易德福 A kind of automatic flushing device having wax ceramic disk
CN105344658A (en) * 2015-12-03 2016-02-24 江苏吉星新材料有限公司 Ceramic plate cleaning device and cleaning method thereof
CN205308860U (en) * 2016-01-05 2016-06-15 苏州普锐晶科技有限公司 Wax device is washed to wafer
CN108723007A (en) * 2018-05-25 2018-11-02 大连天禄机电设备制造有限公司 Cake wax on-line continuous automatic flushing device and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105070680A (en) * 2015-08-15 2015-11-18 天津市信拓电子科技有限公司 Wafer dewaxing device and dewaxing method
CN206332005U (en) * 2016-12-30 2017-07-14 江苏晶瑞半导体有限公司 LED chip removes wax rinse bath
CN107910246A (en) * 2017-11-10 2018-04-13 北京鼎泰芯源科技发展有限公司 Lower wall method for inp wafer

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN204052290U (en) * 2014-08-22 2014-12-31 衢州飞瑞特种陶瓷有限公司 A kind of unified piece paraffin removal rinsing table
CN204159598U (en) * 2014-10-15 2015-02-18 易德福 A kind of automatic flushing device having wax ceramic disk
CN105344658A (en) * 2015-12-03 2016-02-24 江苏吉星新材料有限公司 Ceramic plate cleaning device and cleaning method thereof
CN205308860U (en) * 2016-01-05 2016-06-15 苏州普锐晶科技有限公司 Wax device is washed to wafer
CN108723007A (en) * 2018-05-25 2018-11-02 大连天禄机电设备制造有限公司 Cake wax on-line continuous automatic flushing device and method

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