CN204159598U - A kind of automatic flushing device having wax ceramic disk - Google Patents
A kind of automatic flushing device having wax ceramic disk Download PDFInfo
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- CN204159598U CN204159598U CN201420596588.7U CN201420596588U CN204159598U CN 204159598 U CN204159598 U CN 204159598U CN 201420596588 U CN201420596588 U CN 201420596588U CN 204159598 U CN204159598 U CN 204159598U
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- ceramic disk
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- wax
- spray
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Abstract
The utility model discloses a kind of automatic flushing device having wax ceramic disk, be included in base plate sets gradually ceramic disk loading part, ultrasonic wave circulating slot, multiple overflow tank, spray dry groove and ceramic disk uninstalling portion.Whole cleaning process is carried out at normal temperatures, and the wax on ceramic disk surface is non-volatile, can not endanger atmospheric environment and affect employee healthy.Adopt and ultrasonicly involve multiple tracks overflow launder cleaning, cleaning more comprehensively, can not cause wax to remain, affect again the flatness of polished wafer.Employing high temperature compressed air dries up, and can not cause water stain residual.Full automatic working, compared to manual operation, greatly saves scavenging period, enhances productivity.And this appliance arrangement takes up room much smaller than traditional handicraft, greatly saves production cost.
Description
Technical field
The utility model relates to semiconductor clean technologies field, relates to a kind of automatic flushing device having wax ceramic disk specifically.
Background technology
Along with the development of semicon industry in China and the requirement to semiconductor wafer, the future development that wafer is large towards size, thickness is thin, in order to make, wafer surface is smooth, not damaged, and adopt has the technology of wax polishing to carry out polishing more.After adopting this mode polishing, ceramic disk surface easily residual solids wax, affects next polished wafer flatness, and easily damages wafer.
The cleaning way of current ceramic disk surface wax is mainly artificial by after the ceramic disk high-temperature heating of band wax, is wiped clean by the wax on surface with alcohol and non-dust cloth.The major defect of these class methods has: 1. after high-temperature heating, wax easily volatilizees, and affects the healthy of operative employee; 2., after the wax on ceramic disk surface melts, the efficiency of manual wipping dewaxing is comparatively slow, and everyone every wiped clean one dish at least needs 20 minutes; 3. wiping dewaxing efficiency is low, can not completely wiping ceramic disk surface, cause the wax of ceramic disk to remain, the solid wax after cooling easily makes next polishing have wax wafer to cause wafer bump, thus affects wafer flatness.
Therefore, inventor of the present utility model needs a kind of new technology of design badly to improve its problem.
Utility model content
The utility model aims to provide a kind of automatic flushing device having wax ceramic disk, and it is enhanced productivity under can ensureing the prerequisite that employee is healthy and ensures wafer flatness.
For solving the problems of the technologies described above, the technical solution of the utility model is:
A kind of automatic flushing device having wax ceramic disk, be included in base plate sets gradually ceramic disk loading part, ultrasonic wave circulating slot, N number of overflow tank, spray dry groove and ceramic disk uninstalling portion, liquid is provided with in described ultrasonic wave circulating slot, pure water is equipped with in overflow tank described in each, be provided with compressed air in the dry groove of described spray, N be greater than or equal to 1 integer.
Wherein said ultrasonic wave circulating slot comprises inside groove and water jacket, and by circulating medical solution pipeline communication between described inside groove and described water jacket, the cross-sectional area of described inside groove is less than the cross-sectional area of described water jacket; Be provided with a pair spray system above described inside groove, described spray system and described circulating medical solution pipeline communication, the inside of described inside groove is provided with liquid, is provided with ultrasonic vibrator room below described inside groove; Filter and drainage is provided with below described water jacket.
Further, the dry groove of described spray comprises the dry groove cell body of spray, is provided with gas ejecting system and water back, is provided with drainage pipeline below the dry groove cell body of described spray above the dry groove cell body of described spray.
Further, overflow tank described in each includes the first cell body and the second cell body, and the cross-sectional area of described first cell body is less than the cross-sectional area of described second cell body; Be provided with a pair water injection system above described first cell body, in described first cell body, be provided with pure water, below described second cell body, be provided with drainage system.
Further, described ultrasonic wave circulating slot also comprises heating system.
Further, described ultrasonic wave circulating slot also comprises circulating pump, is pumped in described inside groove and described spray system by the liquid after described metre filter by described circulating pump.
Further, described heating system is heater.
Further, described compressed-air actuated temperature is between 40-60 DEG C.
Adopt technique scheme, the utility model at least comprises following beneficial effect:
The automatic flushing device having wax ceramic disk described in the utility model, cleaning process is carried out at normal temperatures, and the wax on ceramic disk surface is non-volatile, can not endanger atmospheric environment and affect employee healthy.Adopt and ultrasonicly involve multiple tracks overflow launder cleaning, cleaning more comprehensively, can not cause wax to remain, affect again the flatness of polished wafer.Employing high temperature compressed air dries up, and can not cause water stain residual.Full automatic working, compared to manual operation, greatly saves time, enhances productivity.And this appliance arrangement takes up room much smaller than traditional handicraft, greatly saves production cost.
Accompanying drawing explanation
Fig. 1 is the schematic diagram having the automatic flushing device of wax ceramic disk described in the utility model;
Fig. 2 is the front view of ultrasonic wave circulating slot described in the utility model;
Fig. 3 is the top view of ultrasonic wave circulating slot described in the utility model;
Fig. 4 is the front view of the dry groove of spray described in the utility model;
Fig. 5 is the front view of overflow tank described in the utility model;
Fig. 6 is the top view of overflow tank described in the utility model.
Wherein: 1. ceramic disk loading part, 2. ultrasonic wave circulating slot, 3. overflow tank, 4. dry groove is sprayed, 5. ceramic disk uninstalling portion, 21. inside grooves, 22. water jackets, 23. circulating medical solution pipelines, 24. spray systems, 25. ultrasonic vibrator rooms, 27. filters, 28. drainages, 29. heating systems, 20. circulating pumps, 31. first cell bodies, 32. second cell bodies, 33. pure water pipelines, 34. water injection systems, 35. drainage systems, the dry groove cell body of 41. spray, 42. gas ejecting systems, 43. water backs, 44. drainage pipelines.
Detailed description of the invention
Below in conjunction with drawings and Examples, the utility model is further illustrated.
As shown in Figures 1 to 6, for meeting a kind of automatic flushing device having wax ceramic disk of the present utility model, be included in base plate sets gradually ceramic disk loading part 1, ultrasonic wave circulating slot 2, N number of overflow tank 3, spray dry groove 4 and ceramic disk uninstalling portion 5, liquid is provided with in described ultrasonic wave circulating slot 2, pure water is equipped with in overflow tank described in each, be provided with compressed air in the dry groove 4 of described spray, N be greater than or equal to 1 integer.Wherein be communicated with preferably by pure water pipeline 33 between every two described overflow tanks 3, namely described overflow tank 3 uses the pure water in a described overflow tank 3 next above, so can ensure making full use of of whose resource, and can save production cost to a certain extent.Certain those skilled in the art can act as one sees fit according to the user demand of reality completely, and the present embodiment does not limit this.Described ceramic disk loading part 1 and described ceramic disk uninstalling portion 5 are preferably ceramic disk locker room, and described liquid is preferably organic solvent, and the routine techniques being those skilled in the art due to it is selected, so place repeats no more.
Wherein said ultrasonic wave circulating slot 2 comprises inside groove 21 and water jacket 22, is communicated with between described inside groove 21 and described water jacket 22 by circulating medical solution pipeline 23, and the cross-sectional area of described inside groove 21 is less than the cross-sectional area of described water jacket 22; Be provided with a pair spray system 24 above described inside groove 21, described spray system 24 is communicated with described circulating medical solution pipeline 23, and the inside of described inside groove 21 is provided with liquid, is provided with ultrasonic vibrator room 25 below described inside groove 21; Filter 27 and drainage 28 is provided with below described water jacket 22.Described water jacket 22 is spilt into after wherein said inside groove 21 Chinese medicine hydroful, liquid in described water jacket 22 warp after the filtration of described filter 27 is pumped in described inside groove 21 and described spray system 24 by described circulating medical solution pipeline 23, major part liquid directly gets back to described inside groove 21 through the filtration rear section of described filter 27, and part accesses in described spray system 24.
The operation principle of the present embodiment is: at described ceramic disk loading part 1, have after wax ceramic disk loaded, be transported to described ultrasonic wave circulating slot 2 by mechanical arm, under liquid and hyperacoustic acting in conjunction, got rid of by the wax on ceramic disk surface, the liquid in this groove after cleaning can be recycled.Meanwhile, can after liquid decreased effectiveness the weak effect liquid of discharge section, add part fresh liquor, be beneficial to reach optimum cleaning performance.And liquid pumps into described inside groove 21 and described spray system 24 after filtering, to remove impurity in liquid, ensure cleaning performance.The ceramic disk removed after wax is transported to multiple described overflow tank 3 successively, through the repeatedly flushing of pure water, the surface washing of ceramic disk is clean, remains, ensure the flatness of follow-up polished wafer without wax.Ceramic disk after repeatedly cleaning is transported to the dry groove 4 of described spray, and under the purging effect of described heat of compression air, purged by the globule on ceramic disk surface clean fast, then be transported to ceramic disk uninstalling portion 5 by mechanical arm, the ceramic disk after unloading can come into operation.Wherein all transhipment work preferably uses mechanical arm to complete, and those skilled in the art should know.
The dry groove of described spray 4 comprises the dry groove cell body 41 of spray, is provided with gas ejecting system 42 and water back 43, is provided with drainage pipeline 44 below the dry groove cell body 41 of described spray above the dry groove cell body 41 of described spray.Wherein preferably described water back 43 is built-in with temperature sensor, can ensure the precision of heating-up temperature.Described water back 43 effectively can control described compressed-air actuated temperature, utilizes high temperature compressed air to dry up, and can not cause water stain residual, production efficiency is high.
Overflow tank 3 described in each includes the first cell body 31 and the second cell body 32, the cross-sectional area of described first cell body 31 is less than the cross-sectional area of described second cell body 32, so directly can spill in described second cell body 32 after the water in described first cell body 31 is full, be unlikely to drench ground; Be provided with a pair water injection system 34 above described first cell body 31, in described first cell body 31, be provided with pure water; Drainage system 35 is provided with below described second cell body 32.Preferably also be provided with conducting pump and conducting pipeline below described second cell body 32, for the pure water in described second cell body 32 is imported in described water injection system 34 through described conducting pipeline under the driving of described conducting pump, and then pure water is imported in described first cell body 31, so can realize recycling of water resource.Unmarked in described conducting pump and conducting pipeline accompanying drawing, those skilled in the art should know.
Described ultrasonic wave circulating slot 2 also comprises heating system 29, and described heating system 29, for ensureing the temperature of described liquid in groove, makes it be beneficial to cleaning and can not cause again actual bodily harm to staff.
Described ultrasonic wave circulating slot 2 also comprises circulating pump 20, is pumped in described inside groove 21 and described spray system 24 by described liquid, is beneficial to resource circulation utilization by described circulating pump 20.
Described heating system 29 is preferably heater.
Described compressed-air actuated temperature is between 40-60 DEG C.Employing high temperature compressed air dries up, and can not cause water stain residual.
The quantity of described overflow tank 3 is preferably 2.Certain those skilled in the art can adjust accordingly according to the quantity of the user demand of reality to described overflow tank 3, and the present embodiment does not limit this.
This device each technology groove running time and temperature range as shown in table 1.
Table 1
| Technology groove title | Medium in groove | Process temperature ranges DEG C | Process time (min) |
| Ultrasonic wave circulating slot | Liquid | Normal temperature | 3-5 |
| Overflow tank | Pure water | Normal temperature | 3-5 |
| Overflow tank | Pure water | Normal temperature | 3-5 |
| Spray dry groove | Compressed air | 40-60 | 3-5 |
As can be seen from the above table, in per pass technology groove, running time is about 3-5min, cleaning can be completed under normal temperature, whole process does not need manual operation, and 6 can be cleaned at every turn simultaneously and have wax ceramic disk, the cleaning efficiency of whole cleaning process is about 0.5-1min/ dish, compared with original 20min/ dish, substantially increases cleaning efficiency.
Adopt the automatic flushing device having wax ceramic disk described in the present embodiment, cleaning process is carried out at normal temperatures, and the wax on ceramic disk surface is non-volatile, can not endanger atmospheric environment and affect employee healthy.Adopt and ultrasonicly involve multiple tracks overflow launder cleaning, cleaning more comprehensively, can not cause wax to remain, affect again the flatness of polished wafer.Employing high temperature compressed air dries up, and can not cause water stain residual.Full automatic working, compared to manual operation, greatly saves time, enhances productivity.And this appliance arrangement takes up room much smaller than traditional handicraft, greatly saves production cost.
Above an embodiment of the present utility model has been described in detail, but described content is only the preferred embodiment that the utility model is created, and can not be considered to for limiting practical range of the present utility model.All any equivalent variations done according to the utility model application range, all should still be within patent covering scope of the present utility model.
Claims (7)
1. one kind has the automatic flushing device of wax ceramic disk, it is characterized in that, be included in base plate sets gradually ceramic disk loading part, ultrasonic wave circulating slot, N number of overflow tank, spray dry groove and ceramic disk uninstalling portion, liquid is provided with in described ultrasonic wave circulating slot, pure water is equipped with in overflow tank described in each, be provided with compressed air in the dry groove of described spray, N be greater than or equal to 1 integer;
Wherein said ultrasonic wave circulating slot comprises inside groove and water jacket, and by circulating medical solution pipeline communication between described inside groove and described water jacket, the cross-sectional area of described inside groove is less than the cross-sectional area of described water jacket; Be provided with a pair spray system above described inside groove, described spray system and described circulating medical solution pipeline communication, the inside of described inside groove is provided with liquid, is provided with ultrasonic vibrator room below described inside groove; Filter and drainage is provided with below described water jacket.
2. there is the automatic flushing device of wax ceramic disk as claimed in claim 1, it is characterized in that: the dry groove of described spray comprises the dry groove cell body of spray, is provided with gas ejecting system and water back, is provided with drainage pipeline below the dry groove cell body of described spray above the dry groove cell body of described spray.
3. have the automatic flushing device of wax ceramic disk as claimed in claim 2, it is characterized in that: overflow tank described in each includes the first cell body and the second cell body, the cross-sectional area of described first cell body is less than the cross-sectional area of described second cell body; Be provided with a pair water injection system above described first cell body, in described first cell body, be provided with pure water, below described second cell body, be provided with drainage system.
4. there is the automatic flushing device of wax ceramic disk as claimed in claim 2 or claim 3, it is characterized in that: described ultrasonic wave circulating slot also comprises heating system.
5. there is the automatic flushing device of wax ceramic disk as claimed in claim 4, it is characterized in that: described ultrasonic wave circulating slot also comprises circulating pump, by described circulating pump, the liquid after described metre filter is pumped in described inside groove and described spray system.
6. there is the automatic flushing device of wax ceramic disk as claimed in claim 5, it is characterized in that: described heating system is heater.
7. there is the automatic flushing device of wax ceramic disk as claimed in claim 6, it is characterized in that: described compressed-air actuated temperature is between 40-60 DEG C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420596588.7U CN204159598U (en) | 2014-10-15 | 2014-10-15 | A kind of automatic flushing device having wax ceramic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420596588.7U CN204159598U (en) | 2014-10-15 | 2014-10-15 | A kind of automatic flushing device having wax ceramic disk |
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| Publication Number | Publication Date |
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| CN204159598U true CN204159598U (en) | 2015-02-18 |
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|---|---|---|---|
| CN201420596588.7U Expired - Fee Related CN204159598U (en) | 2014-10-15 | 2014-10-15 | A kind of automatic flushing device having wax ceramic disk |
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Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105344658A (en) * | 2015-12-03 | 2016-02-24 | 江苏吉星新材料有限公司 | Ceramic plate cleaning device and cleaning method thereof |
| CN108723007A (en) * | 2018-05-25 | 2018-11-02 | 大连天禄机电设备制造有限公司 | Cake wax on-line continuous automatic flushing device and method |
| CN109216246A (en) * | 2018-11-13 | 2019-01-15 | 江苏利泷半导体科技有限公司 | The working method of wax system under full-automatic amorphous processing procedure |
| CN109365391A (en) * | 2018-10-10 | 2019-02-22 | 中国电子科技集团公司第十研究所 | A kind of cleaning method of pair of InSb wafer polishing ceramic disk |
| CN109449103A (en) * | 2018-11-12 | 2019-03-08 | 江苏利泷半导体科技有限公司 | Wax system under a kind of full-automatic amorphous processing procedure |
| CN109701936A (en) * | 2019-01-14 | 2019-05-03 | 上海釜川自动化设备有限公司 | A kind of circulation trough body structure |
| CN110404874A (en) * | 2019-06-25 | 2019-11-05 | 盐城华旭光电技术有限公司 | Integrated circuit board productive power plates Wafer Cleaning drying device |
| CN113579158A (en) * | 2021-07-30 | 2021-11-02 | 广东利元亨智能装备股份有限公司 | Device and method for removing 3D printing edge material |
| CN117066449A (en) * | 2023-09-11 | 2023-11-17 | 洛阳易普特智能科技有限公司 | Sand cleaning device and sand cleaning method for sand mold 3D printing |
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2014
- 2014-10-15 CN CN201420596588.7U patent/CN204159598U/en not_active Expired - Fee Related
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105344658A (en) * | 2015-12-03 | 2016-02-24 | 江苏吉星新材料有限公司 | Ceramic plate cleaning device and cleaning method thereof |
| CN108723007A (en) * | 2018-05-25 | 2018-11-02 | 大连天禄机电设备制造有限公司 | Cake wax on-line continuous automatic flushing device and method |
| CN109365391A (en) * | 2018-10-10 | 2019-02-22 | 中国电子科技集团公司第十研究所 | A kind of cleaning method of pair of InSb wafer polishing ceramic disk |
| CN109449103A (en) * | 2018-11-12 | 2019-03-08 | 江苏利泷半导体科技有限公司 | Wax system under a kind of full-automatic amorphous processing procedure |
| CN109449103B (en) * | 2018-11-12 | 2021-01-05 | 江苏利泷半导体科技有限公司 | Full-automatic amorphous manufacture procedure wax removing system |
| CN109216246A (en) * | 2018-11-13 | 2019-01-15 | 江苏利泷半导体科技有限公司 | The working method of wax system under full-automatic amorphous processing procedure |
| CN109701936A (en) * | 2019-01-14 | 2019-05-03 | 上海釜川自动化设备有限公司 | A kind of circulation trough body structure |
| CN110404874A (en) * | 2019-06-25 | 2019-11-05 | 盐城华旭光电技术有限公司 | Integrated circuit board productive power plates Wafer Cleaning drying device |
| CN110404874B (en) * | 2019-06-25 | 2022-02-01 | 深圳市荣之鑫科技有限公司 | Cleaning and drying device for electroplated silicon wafers for integrated circuit board production |
| CN113579158A (en) * | 2021-07-30 | 2021-11-02 | 广东利元亨智能装备股份有限公司 | Device and method for removing 3D printing edge material |
| CN117066449A (en) * | 2023-09-11 | 2023-11-17 | 洛阳易普特智能科技有限公司 | Sand cleaning device and sand cleaning method for sand mold 3D printing |
| CN117066449B (en) * | 2023-09-11 | 2024-04-09 | 洛阳易普特智能科技有限公司 | Sand cleaning device and sand cleaning method for sand mold 3D printing |
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Effective date of registration: 20151124 Address after: 344000 Jiangxi city of Fuzhou province high tech Zone gold Ni Road No. 198 incubator Park A7 building 3 floor Patentee after: JIANGXI DEYI SEMICONDUCTOR TECHNOLOGY Co.,Ltd. Address before: 100000 Beijing city Haidian District Shangyuan village of 3 homes and 2003 Graduate School of Mechatronics Patentee before: Yi Defu |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150218 Termination date: 20211015 |
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| CF01 | Termination of patent right due to non-payment of annual fee |